JP4385360B2 - プラズマ真空ポンプセル - Google Patents

プラズマ真空ポンプセル Download PDF

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Publication number
JP4385360B2
JP4385360B2 JP2000557077A JP2000557077A JP4385360B2 JP 4385360 B2 JP4385360 B2 JP 4385360B2 JP 2000557077 A JP2000557077 A JP 2000557077A JP 2000557077 A JP2000557077 A JP 2000557077A JP 4385360 B2 JP4385360 B2 JP 4385360B2
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JP
Japan
Prior art keywords
region
conduit
plasma
pump cell
ions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000557077A
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English (en)
Japanese (ja)
Other versions
JP2002519827A (ja
JP2002519827A5 (https=
Inventor
ダンドル、ラファエル・エー
ゲスト、ガレス
ジョンソン、ウェイン・エル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
James P Gallagher
Original Assignee
James P Gallagher
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by James P Gallagher filed Critical James P Gallagher
Publication of JP2002519827A publication Critical patent/JP2002519827A/ja
Publication of JP2002519827A5 publication Critical patent/JP2002519827A5/ja
Application granted granted Critical
Publication of JP4385360B2 publication Critical patent/JP4385360B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32834—Exhausting
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B17/00—Pumps characterised by combination with, or adaptation to, specific driving engines or motors
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
    • F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
    • H01J41/14—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of thermionic cathodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/54—Plasma accelerators

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  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Electron Tubes For Measurement (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP2000557077A 1998-06-29 1999-06-29 プラズマ真空ポンプセル Expired - Fee Related JP4385360B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US9104198P 1998-06-29 1998-06-29
US60/091,041 1998-06-29
PCT/US1999/012827 WO2000000741A1 (en) 1998-06-29 1999-06-29 Plasma vacuum pumping cell

Publications (3)

Publication Number Publication Date
JP2002519827A JP2002519827A (ja) 2002-07-02
JP2002519827A5 JP2002519827A5 (https=) 2009-09-10
JP4385360B2 true JP4385360B2 (ja) 2009-12-16

Family

ID=22225599

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000557077A Expired - Fee Related JP4385360B2 (ja) 1998-06-29 1999-06-29 プラズマ真空ポンプセル

Country Status (5)

Country Link
US (1) US6422825B2 (https=)
EP (1) EP1095217A4 (https=)
JP (1) JP4385360B2 (https=)
KR (1) KR100611826B1 (https=)
WO (1) WO2000000741A1 (https=)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6592709B1 (en) 2000-04-05 2003-07-15 Applied Materials Inc. Method and apparatus for plasma processing
US6873113B2 (en) * 2000-04-13 2005-03-29 Tokyo Electron Limited Stand alone plasma vacuum pump
WO2002103745A1 (en) * 2001-06-14 2002-12-27 Tokyo Electron Limited Ion momentum transfer plasma pump
WO2002104085A2 (en) * 2001-06-19 2002-12-27 Toky0 Electron Limited A closed-drift hall effect plasma vacuum pump for process reactors
WO2003005406A1 (en) * 2001-07-03 2003-01-16 Tokyo Electron Limited Plasma pump with inter-stage plasma source
US6729850B2 (en) 2001-10-31 2004-05-04 Tokyo Electron Limited Applied plasma duct system
AU2003253689A1 (en) * 2002-07-31 2004-02-16 Tokyo Electron Limited Reduced volume, high conductance process chamber
JP4724880B2 (ja) * 2005-03-03 2011-07-13 独立行政法人産業技術総合研究所 プラズマ媒質電池
DE102006036461A1 (de) * 2006-08-04 2008-02-21 Johann Wolfgang Goethe-Universität Vorrichtung und Verfahren zur Steuerung eines Gasflusses
EP2777047A4 (en) * 2011-11-09 2015-06-17 Brent Freeze METHOD AND APPARATUS FOR COMPRESSING PLASMA TO A HIGH ENERGY STATE
US9679751B2 (en) * 2012-03-15 2017-06-13 Lam Research Corporation Chamber filler kit for plasma etch chamber useful for fast gas switching
US20140360670A1 (en) * 2013-06-05 2014-12-11 Tokyo Electron Limited Processing system for non-ambipolar electron plasma (nep) treatment of a substrate with sheath potential
US10037869B2 (en) 2013-08-13 2018-07-31 Lam Research Corporation Plasma processing devices having multi-port valve assemblies
US10455683B2 (en) * 2016-05-31 2019-10-22 Agilent Technologies, Inc. Ion throughput pump and method
US11205562B2 (en) 2018-10-25 2021-12-21 Tokyo Electron Limited Hybrid electron beam and RF plasma system for controlled content of radicals and ions
US12014901B2 (en) 2018-10-25 2024-06-18 Tokyo Electron Limited Tailored electron energy distribution function by new plasma source: hybrid electron beam and RF plasma

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3005931A (en) * 1960-03-29 1961-10-24 Raphael A Dandl Ion gun
US3453469A (en) * 1965-05-20 1969-07-01 Xerox Corp Multi-level vacuum pumping system for plasma containment device
US3416722A (en) * 1967-04-05 1968-12-17 Varian Associates High vacuum pump employing apertured penning cells driving ion beams into a target covered by a getter sublimator
US3746474A (en) * 1971-04-02 1973-07-17 W Lloyd Ionic vacuum pump
JPS6011422B2 (ja) * 1977-11-24 1985-03-26 株式会社日立製作所 差動排気用イオンポンプ
US4397611A (en) * 1981-07-06 1983-08-09 The Perkin-Elmer Corp. Particle beam instrumentation ion pump
US4641060A (en) 1985-02-11 1987-02-03 Applied Microwave Plasma Concepts, Inc. Method and apparatus using electron cyclotron heated plasma for vacuum pumping
EP0662195B1 (fr) * 1993-06-21 1996-08-28 Societe Europeenne De Propulsion Moteur a plasma de longueur reduite a derive fermee d'electrons
US5646488A (en) * 1995-10-11 1997-07-08 Warburton; William K. Differential pumping stage with line of sight pumping mechanism
US6229264B1 (en) * 1999-03-31 2001-05-08 Lam Research Corporation Plasma processor with coil having variable rf coupling

Also Published As

Publication number Publication date
JP2002519827A (ja) 2002-07-02
KR20010053216A (ko) 2001-06-25
US6422825B2 (en) 2002-07-23
WO2000000741A1 (en) 2000-01-06
EP1095217A1 (en) 2001-05-02
US20010016166A1 (en) 2001-08-23
KR100611826B1 (ko) 2006-08-11
EP1095217A4 (en) 2006-08-02

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