JP4385360B2 - プラズマ真空ポンプセル - Google Patents

プラズマ真空ポンプセル Download PDF

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Publication number
JP4385360B2
JP4385360B2 JP2000557077A JP2000557077A JP4385360B2 JP 4385360 B2 JP4385360 B2 JP 4385360B2 JP 2000557077 A JP2000557077 A JP 2000557077A JP 2000557077 A JP2000557077 A JP 2000557077A JP 4385360 B2 JP4385360 B2 JP 4385360B2
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JP
Japan
Prior art keywords
region
conduit
plasma
pump cell
ions
Prior art date
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Expired - Fee Related
Application number
JP2000557077A
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English (en)
Japanese (ja)
Other versions
JP2002519827A5 (enExample
JP2002519827A (ja
Inventor
ダンドル、ラファエル・エー
ゲスト、ガレス
ジョンソン、ウェイン・エル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
James P Gallagher
Original Assignee
James P Gallagher
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by James P Gallagher filed Critical James P Gallagher
Publication of JP2002519827A publication Critical patent/JP2002519827A/ja
Publication of JP2002519827A5 publication Critical patent/JP2002519827A5/ja
Application granted granted Critical
Publication of JP4385360B2 publication Critical patent/JP4385360B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32834—Exhausting
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B17/00—Pumps characterised by combination with, or adaptation to, specific driving engines or motors
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
    • F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
    • H01J41/14—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of thermionic cathodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/54—Plasma accelerators

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  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Electron Tubes For Measurement (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP2000557077A 1998-06-29 1999-06-29 プラズマ真空ポンプセル Expired - Fee Related JP4385360B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US9104198P 1998-06-29 1998-06-29
US60/091,041 1998-06-29
PCT/US1999/012827 WO2000000741A1 (en) 1998-06-29 1999-06-29 Plasma vacuum pumping cell

Publications (3)

Publication Number Publication Date
JP2002519827A JP2002519827A (ja) 2002-07-02
JP2002519827A5 JP2002519827A5 (enExample) 2009-09-10
JP4385360B2 true JP4385360B2 (ja) 2009-12-16

Family

ID=22225599

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000557077A Expired - Fee Related JP4385360B2 (ja) 1998-06-29 1999-06-29 プラズマ真空ポンプセル

Country Status (5)

Country Link
US (1) US6422825B2 (enExample)
EP (1) EP1095217A4 (enExample)
JP (1) JP4385360B2 (enExample)
KR (1) KR100611826B1 (enExample)
WO (1) WO2000000741A1 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6592709B1 (en) 2000-04-05 2003-07-15 Applied Materials Inc. Method and apparatus for plasma processing
US6873113B2 (en) * 2000-04-13 2005-03-29 Tokyo Electron Limited Stand alone plasma vacuum pump
WO2002103745A1 (en) * 2001-06-14 2002-12-27 Tokyo Electron Limited Ion momentum transfer plasma pump
WO2002104085A2 (en) * 2001-06-19 2002-12-27 Toky0 Electron Limited A closed-drift hall effect plasma vacuum pump for process reactors
WO2003005406A1 (en) 2001-07-03 2003-01-16 Tokyo Electron Limited Plasma pump with inter-stage plasma source
US6729850B2 (en) 2001-10-31 2004-05-04 Tokyo Electron Limited Applied plasma duct system
AU2003253689A1 (en) * 2002-07-31 2004-02-16 Tokyo Electron Limited Reduced volume, high conductance process chamber
JP4724880B2 (ja) * 2005-03-03 2011-07-13 独立行政法人産業技術総合研究所 プラズマ媒質電池
DE102006036461A1 (de) * 2006-08-04 2008-02-21 Johann Wolfgang Goethe-Universität Vorrichtung und Verfahren zur Steuerung eines Gasflusses
JP2015501918A (ja) * 2011-11-09 2015-01-19 ブレント フリーゼ， プラズマを高エネルギー状態に圧縮するための方法および装置
US9679751B2 (en) * 2012-03-15 2017-06-13 Lam Research Corporation Chamber filler kit for plasma etch chamber useful for fast gas switching
US20140360670A1 (en) * 2013-06-05 2014-12-11 Tokyo Electron Limited Processing system for non-ambipolar electron plasma (nep) treatment of a substrate with sheath potential
US10037869B2 (en) 2013-08-13 2018-07-31 Lam Research Corporation Plasma processing devices having multi-port valve assemblies
US10455683B2 (en) * 2016-05-31 2019-10-22 Agilent Technologies, Inc. Ion throughput pump and method
US12014901B2 (en) 2018-10-25 2024-06-18 Tokyo Electron Limited Tailored electron energy distribution function by new plasma source: hybrid electron beam and RF plasma
US11205562B2 (en) 2018-10-25 2021-12-21 Tokyo Electron Limited Hybrid electron beam and RF plasma system for controlled content of radicals and ions

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3005931A (en) * 1960-03-29 1961-10-24 Raphael A Dandl Ion gun
US3453469A (en) * 1965-05-20 1969-07-01 Xerox Corp Multi-level vacuum pumping system for plasma containment device
US3416722A (en) * 1967-04-05 1968-12-17 Varian Associates High vacuum pump employing apertured penning cells driving ion beams into a target covered by a getter sublimator
US3746474A (en) * 1971-04-02 1973-07-17 W Lloyd Ionic vacuum pump
JPS6011422B2 (ja) * 1977-11-24 1985-03-26 株式会社日立製作所 差動排気用イオンポンプ
US4397611A (en) * 1981-07-06 1983-08-09 The Perkin-Elmer Corp. Particle beam instrumentation ion pump
US4641060A (en) 1985-02-11 1987-02-03 Applied Microwave Plasma Concepts, Inc. Method and apparatus using electron cyclotron heated plasma for vacuum pumping
UA27921C2 (uk) * 1993-06-21 2000-10-16 Сосьєте Національ Д`Етюд Ет Де Конструкцьон Де Мотер Д`Авіацьон (С.Н.Е.К.М.А.) Плазмовий двигун зменшеної довжини з замкненим дрейфом електронів
US5646488A (en) * 1995-10-11 1997-07-08 Warburton; William K. Differential pumping stage with line of sight pumping mechanism
US6229264B1 (en) * 1999-03-31 2001-05-08 Lam Research Corporation Plasma processor with coil having variable rf coupling

Also Published As

Publication number Publication date
US20010016166A1 (en) 2001-08-23
EP1095217A1 (en) 2001-05-02
EP1095217A4 (en) 2006-08-02
JP2002519827A (ja) 2002-07-02
KR20010053216A (ko) 2001-06-25
US6422825B2 (en) 2002-07-23
WO2000000741A1 (en) 2000-01-06
KR100611826B1 (ko) 2006-08-11

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