KR100611826B1 - 플라즈마 펌핑 셀 및 이온 펌핑 방법 - Google Patents

플라즈마 펌핑 셀 및 이온 펌핑 방법 Download PDF

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Publication number
KR100611826B1
KR100611826B1 KR1020007014821A KR20007014821A KR100611826B1 KR 100611826 B1 KR100611826 B1 KR 100611826B1 KR 1020007014821 A KR1020007014821 A KR 1020007014821A KR 20007014821 A KR20007014821 A KR 20007014821A KR 100611826 B1 KR100611826 B1 KR 100611826B1
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KR
South Korea
Prior art keywords
conduit
region
plasma
pumping cell
ions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020007014821A
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English (en)
Korean (ko)
Other versions
KR20010053216A (ko
Inventor
댄들라파엘에이
게스트가레스
존슨웨인엘
Original Assignee
동경 엘렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 동경 엘렉트론 주식회사 filed Critical 동경 엘렉트론 주식회사
Publication of KR20010053216A publication Critical patent/KR20010053216A/ko
Application granted granted Critical
Publication of KR100611826B1 publication Critical patent/KR100611826B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32834—Exhausting
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B17/00—Pumps characterised by combination with, or adaptation to, specific driving engines or motors
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
    • F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
    • H01J41/14—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of thermionic cathodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/54—Plasma accelerators

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  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Electron Tubes For Measurement (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
KR1020007014821A 1998-06-29 1999-06-29 플라즈마 펌핑 셀 및 이온 펌핑 방법 Expired - Fee Related KR100611826B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US9104198P 1998-06-29 1998-06-29
US60/091,041 1998-06-29

Publications (2)

Publication Number Publication Date
KR20010053216A KR20010053216A (ko) 2001-06-25
KR100611826B1 true KR100611826B1 (ko) 2006-08-11

Family

ID=22225599

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020007014821A Expired - Fee Related KR100611826B1 (ko) 1998-06-29 1999-06-29 플라즈마 펌핑 셀 및 이온 펌핑 방법

Country Status (5)

Country Link
US (1) US6422825B2 (enExample)
EP (1) EP1095217A4 (enExample)
JP (1) JP4385360B2 (enExample)
KR (1) KR100611826B1 (enExample)
WO (1) WO2000000741A1 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6592709B1 (en) * 2000-04-05 2003-07-15 Applied Materials Inc. Method and apparatus for plasma processing
US6873113B2 (en) * 2000-04-13 2005-03-29 Tokyo Electron Limited Stand alone plasma vacuum pump
WO2002103745A1 (en) * 2001-06-14 2002-12-27 Tokyo Electron Limited Ion momentum transfer plasma pump
AU2002257299A1 (en) 2001-06-19 2003-01-02 Toky0 Electron Limited A closed-drift hall effect plasma vacuum pump for process reactors
WO2003005406A1 (en) 2001-07-03 2003-01-16 Tokyo Electron Limited Plasma pump with inter-stage plasma source
US6729850B2 (en) 2001-10-31 2004-05-04 Tokyo Electron Limited Applied plasma duct system
CN1671884A (zh) * 2002-07-31 2005-09-21 东京毅力科创株式会社 小体积、高流导的处理室
JP4724880B2 (ja) * 2005-03-03 2011-07-13 独立行政法人産業技術総合研究所 プラズマ媒質電池
DE102006036461A1 (de) * 2006-08-04 2008-02-21 Johann Wolfgang Goethe-Universität Vorrichtung und Verfahren zur Steuerung eines Gasflusses
WO2013070179A1 (en) * 2011-11-09 2013-05-16 Freeze Brent Method and apparatus for compressing plasma to a high energy state
US9679751B2 (en) * 2012-03-15 2017-06-13 Lam Research Corporation Chamber filler kit for plasma etch chamber useful for fast gas switching
US20140360670A1 (en) * 2013-06-05 2014-12-11 Tokyo Electron Limited Processing system for non-ambipolar electron plasma (nep) treatment of a substrate with sheath potential
US10037869B2 (en) 2013-08-13 2018-07-31 Lam Research Corporation Plasma processing devices having multi-port valve assemblies
US10455683B2 (en) * 2016-05-31 2019-10-22 Agilent Technologies, Inc. Ion throughput pump and method
US11205562B2 (en) 2018-10-25 2021-12-21 Tokyo Electron Limited Hybrid electron beam and RF plasma system for controlled content of radicals and ions
US12014901B2 (en) 2018-10-25 2024-06-18 Tokyo Electron Limited Tailored electron energy distribution function by new plasma source: hybrid electron beam and RF plasma

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3005931A (en) * 1960-03-29 1961-10-24 Raphael A Dandl Ion gun
US3453469A (en) * 1965-05-20 1969-07-01 Xerox Corp Multi-level vacuum pumping system for plasma containment device
US3416722A (en) * 1967-04-05 1968-12-17 Varian Associates High vacuum pump employing apertured penning cells driving ion beams into a target covered by a getter sublimator
US3746474A (en) * 1971-04-02 1973-07-17 W Lloyd Ionic vacuum pump
JPS6011422B2 (ja) * 1977-11-24 1985-03-26 株式会社日立製作所 差動排気用イオンポンプ
US4397611A (en) * 1981-07-06 1983-08-09 The Perkin-Elmer Corp. Particle beam instrumentation ion pump
US4641060A (en) 1985-02-11 1987-02-03 Applied Microwave Plasma Concepts, Inc. Method and apparatus using electron cyclotron heated plasma for vacuum pumping
US5475354A (en) * 1993-06-21 1995-12-12 Societe Europeenne De Propulsion Plasma accelerator of short length with closed electron drift
US5646488A (en) * 1995-10-11 1997-07-08 Warburton; William K. Differential pumping stage with line of sight pumping mechanism
US6229264B1 (en) * 1999-03-31 2001-05-08 Lam Research Corporation Plasma processor with coil having variable rf coupling

Also Published As

Publication number Publication date
US20010016166A1 (en) 2001-08-23
EP1095217A1 (en) 2001-05-02
JP4385360B2 (ja) 2009-12-16
KR20010053216A (ko) 2001-06-25
US6422825B2 (en) 2002-07-23
WO2000000741A1 (en) 2000-01-06
JP2002519827A (ja) 2002-07-02
EP1095217A4 (en) 2006-08-02

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