JP4355507B2 - Suction plate device - Google Patents

Suction plate device Download PDF

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Publication number
JP4355507B2
JP4355507B2 JP2003095250A JP2003095250A JP4355507B2 JP 4355507 B2 JP4355507 B2 JP 4355507B2 JP 2003095250 A JP2003095250 A JP 2003095250A JP 2003095250 A JP2003095250 A JP 2003095250A JP 4355507 B2 JP4355507 B2 JP 4355507B2
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Japan
Prior art keywords
substrate
support
protrusions
plate body
auxiliary
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Expired - Fee Related
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JP2003095250A
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Japanese (ja)
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JP2004303961A (en
Inventor
本 信 成 灘
水 敏 清
田 晶 甘
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Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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Publication of JP2004303961A publication Critical patent/JP2004303961A/en
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  • Jigs For Machine Tools (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は、カラーフィルター基板等を製造するための製造ラインで用いられる吸着プレート装置に係り、とりわけ、基板を真空チャック方式で保持する吸着プレート装置に関する。
【0002】
【従来の技術】
吸着プレート装置としては例えば、基板を冷却する冷却プレート装置が知られている。このような冷却プレート装置は一般に、水冷機構等により一定の低温に保たれたプレート本体を有し、このプレート本体の表面上に基板を真空チャック方式で全面密着させることにより当該基板の冷却を行っている。
【0003】
【発明が解決しようとする課題】
しかしながら、上述した従来の吸着プレート装置では、プレート本体の表面上に基板を全面密着させるので、プレート本体と基板との間の接触面積が大きくなり基板が帯電しやすい。このため、基板をプレート本体から取り外して次工程の別の処理装置等に移載させる際に、プレート本体から基板が剥がれにくくなり、最悪の場合には基板が割れてしまうおそれがあるという問題がある。また、基板が帯電してしまうことから、基板を次工程の別の処理装置等に移載させる際に、アーク放電等が発生し、基板の外観不良等を引き起こすおそれがあるという問題がある。
【0004】
本発明はこのような点を考慮してなされたものであり、基板の帯電を最小限に抑えて移載時に基板が容易に剥がれるようにし、かつ帯電に起因した基板の外観不良等の発生を効果的に防止することができる、吸着プレート装置を提供することを目的とする。
【0005】
【課題を解決するための手段】
本発明は、基板が載置される載置面を有するプレート本体と、基板を支持するよう前記プレート本体の前記載置面上に形成された複数の支持突起とを備え、前記各支持突起には前記基板を真空吸着するための真空吸引孔が形成され、前記各支持突起のうち前記基板に接触する頂部端面は、前記真空吸引孔により前記基板を真空吸引した際に前記基板と密着するような平滑性を有することを特徴とする吸着プレート装置を提供する。
【0006】
なお、本発明において、前記各支持突起の前記頂部端面は、JIS B0601により規定される算術平均粗さRaが0<Ra≦1.6μmである表面粗さを有することが好ましい。
【0007】
また、本発明において、前記各支持突起は、前記プレート本体の前記載置面内にて格子状に配置されていることが好ましい。
【0008】
さらに、本発明においては、前記各支持突起とともに前記基板を支持するよう前記プレート本体の前記載置面上に形成された複数の補助突起をさらに備えることが好ましい。
【0009】
さらにまた、本発明において、前記プレート本体は基板を冷却するものであることが好ましい。
【0010】
本発明によれば、載置面上に形成された複数の支持突起により基板を支持するプレート本体において、各支持突起に形成された真空吸引孔により基板を真空吸着するとともに、各支持突起の頂部端面が、真空吸引孔により基板を真空吸引した際に基板と密着するような平滑性を有しているので、各支持突起の頂部端面上で基板を吸着保持した場合でも、各支持突起以外の部分に位置する載置面と基板との間の空間から空気が排気されることがなく、各支持突起により支持された基板をフラットな状態に保つことができる。このため、各支持突起以外の部分で基板が載置面に接触してしまうことを効果的に防止することができ、基板の帯電を最小限に抑えて移載時に基板が容易に剥がれるようにし、かつ帯電に起因した基板の外観不良等の発生を効果的に防止することができる。特に、本発明によれば、各支持突起により支持された基板をフラットな状態に保つことができるので、各支持突起の高さを低くしてプレート本体の載置面と基板との間の間隔を小さくすることができ、プレート本体により基板を冷却するような場合において、プレート本体の冷却効率を十分に確保することができる。
【0011】
【発明の実施の形態】
以下、図面を参照して本発明の実施の形態について説明する。
【0012】
まず、図1により、本発明の一実施の形態に係る吸着プレート装置の全体構成について説明する。なお、本実施の形態においては、吸着プレート装置の一例として、冷却プレート装置を例に挙げて説明する。
【0013】
図1に示すように、冷却プレート装置10は、冷却対象となる基板20が載置されるプレート本体11を備えている。
【0014】
ここで、プレート本体11の内部には冷却機構15が設けられており、プレート本体11の載置面12上に載置される基板20を冷却することができるようになっている。なお、冷却機構15には温度制御装置16が接続されており、プレート本体11の載置面12の温度を一定の低温に保つことができるようになっている。
【0015】
また、プレート本体11の載置面12上には、図2及び図3に示すように、複数の支持突起13及び複数の補助突起14が形成されており、これらの各支持突起13及び各補助突起14の頂部端面13a,14aにより基板20を支持することができるようになっている。
【0016】
ここで、図2及び図3に示すように、各支持突起13には基板20を真空吸着するための真空吸引孔13bが形成されており、真空吸引孔13bに接続された真空吸引機構17(図1参照)により真空引きを行うことにより各支持突起13と基板20とを互いに密着させることができるようになっている。なお、各支持突起13のうち基板20に接触する頂部端面13aは、真空吸引孔13bにより基板20を真空吸引した際に基板20と密着するような平滑性を有していることが好ましい。具体的には、各支持突起13の頂部端面13aは、JIS(Japanese Industrial Standards) B0601により規定される算術平均粗さRaが0<Ra≦1.6μmである表面粗さを有していることが好ましい。
【0017】
一方、各補助突起14のうち基板20の下面に接触する頂部端面14aは、各支持突起13の真空吸引孔13bにより基板20を真空吸引した際でも基板20と密着しないような平滑性を有していることが好ましい。
【0018】
ここで、各支持突起13及び各補助突起14は、例えば図2に示すような形態で、プレート本体11の載置面12内にて格子状に配置されていることが好ましい。
【0019】
なお、各支持突起13及び各補助突起14の配置間隔及び寸法は、基板20を各支持突起13及び各補助突起14により支持した際に基板20の自重による撓みにより基板20の下面がプレート本体11の載置面12に接触しないような範囲で任意に設定することができる。具体的には例えば、載置面12の大きさが1300mm×1300mmであるプレート本体11上に、1100mm×1250mmの大きさのカラーフィルター基板を載置する場合であれば、各支持突起13及び各補助突起14の間隔a及びbはそれぞれ、100mm、50mm程度に設定することが好ましい。また、各支持突起13は、その頂部端面13aの直径φ1を3mm程度、高さh1を50μm程度に設定することが好ましい。さらに、各補助突起14は、その頂部端面14aの直径φ2を2mm程度、高さh2を50μm程度に設定することが好ましい。なお、各支持突起13及び各補助突起14の高さh1及びh2は等しいことが好ましい。
【0020】
次に、このような構成からなる冷却プレート装置10の作用について説明する。
【0021】
まず、冷却プレート装置10において、プレート本体11の内部に設けられた冷却機構15及びそれに接続された温度制御装置16を稼働させ、プレート本体11の載置面12の温度を一定の低温に保つ。
【0022】
この状態で、プレート本体11の上方に基板20を移動させ、プレート本体11の載置面12上に基板20を載置する。このとき、基板20は、載置面12上に形成された複数の支持突起13及び複数の補助突起14により支持される。
【0023】
その後、真空吸引機構17を稼働させると、各支持突起13の真空吸引孔13bにより基板20が真空吸引され、基板20が各支持突起13及び各補助突起14の頂部端面13a,14a上で吸着保持される。このとき、各支持突起13の頂部端面13aと基板20とは互いに密着し、当該頂部端面13aと基板20との間に局所的な真空吸着状態が形成される。なお、この状態では、各支持突起13以外の部分に位置する載置面12と基板20との間の空間から空気が排気されることがないので、各支持突起13により支持された基板20はフラットな状態に保たれる。
【0024】
この状態で、プレート本体11により基板20が十分に冷却された後、基板20がプレート本体11から取り外され、次工程の別の処理装置等に移載される。
【0025】
このように本実施の形態によれば、載置面12上に形成された複数の支持突起13により基板20を支持するプレート本体11において、各支持突起13に形成された真空吸引孔13bにより基板20を真空吸着するとともに、各支持突起13の頂部端面13aが、真空吸引孔13bにより基板20を真空吸引した際に基板20と密着するような平滑性を有しているので、各支持突起13の頂部端面13a上で基板20を吸着保持した場合でも、各支持突起13以外の部分に位置する載置面12と基板20との間の空間から空気が排気されることがなく、各支持突起13により支持された基板20をフラットな状態に保つことができる。このため、各支持突起13以外の部分で基板20が載置面12に接触してしまうことを効果的に防止することができ、基板20の帯電を最小限に抑えて移載時に基板20が容易に剥がれるようにし、かつ帯電に起因した基板20の外観不良等の発生を効果的に防止することができる。特に、本実施の形態によれば、各支持突起13により支持された基板20をフラットな状態に保つことができるので、各支持突起13の高さh1を低くしてプレート本体11の載置面12と基板20との間の間隔を小さくすることができ、プレート本体11の冷却効率を十分に確保することができる。
【0026】
また、本実施の形態によれば、各支持突起13とともに各補助突起14により基板20を支持するようにしているので、基板20の自重による撓みをより効果的に防止して、各支持突起13以外の部分で基板20が載置面12に接触してしまうことをより効果的に防止することができる。このため、各支持突起13及び各補助突起14の高さh1及びh2を低くしてプレート本体11の載置面12と基板20との間の間隔をより小さくすることができ、プレート本体11の冷却効率をより向上させることができる。
【0027】
さらに、本実施の形態によれば、各補助突起14の頂部端面14aが、各支持突起13の真空吸引孔13bにより基板20を真空吸引した際でも基板20と密着しないような平滑性を有するようにすることにより、各補助突起14に起因した基板20の帯電を最小限に抑えて移載時に基板20がより容易に剥がれるようにすることができる。
【0028】
【発明の効果】
以上説明したように本発明によれば、吸着プレート装置において、基板の帯電を最小限に抑えて移載時に基板が容易に剥がれるようにし、かつ帯電に起因した基板の外観不良等の発生を効果的に防止することができる。
【図面の簡単な説明】
【図1】本発明の一実施の形態に係る冷却プレート装置(吸着プレート装置)の全体構成を示す図。
【図2】図1に示す冷却プレート装置(吸着プレート装置)のプレート本体の表面の構成を示す斜視図。
【図3】図2に示すプレート本体のIII−III線に沿った断面図。
【符号の説明】
10 冷却プレート装置(吸着プレート装置)
11 プレート本体
12 載置面
13 支持突起
13a 頂部端面
13b 真空吸引孔
14 補助突起
14a 頂部端面
15 冷却機構
16 温度制御装置
17 真空吸引機構
20 基板
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a suction plate device used in a production line for manufacturing a color filter substrate and the like, and more particularly to a suction plate device that holds a substrate in a vacuum chuck system.
[0002]
[Prior art]
As a suction plate device, for example, a cooling plate device for cooling a substrate is known. Such a cooling plate apparatus generally has a plate body maintained at a constant low temperature by a water cooling mechanism or the like, and cools the substrate by closely contacting the substrate on the surface of the plate body by a vacuum chuck method. ing.
[0003]
[Problems to be solved by the invention]
However, in the above-described conventional suction plate device, the entire surface of the substrate is brought into close contact with the surface of the plate body, so that the contact area between the plate body and the substrate becomes large and the substrate is easily charged. For this reason, when removing a board | substrate from a plate main body and transferring it to another processing apparatus etc. of the next process, it becomes difficult to peel off a board | substrate from a plate main body, and there is a possibility that a board | substrate may break in the worst case. is there. In addition, since the substrate is charged, there is a problem that when the substrate is transferred to another processing apparatus or the like in the next process, arc discharge or the like may occur, resulting in a defective appearance of the substrate.
[0004]
The present invention has been made in consideration of the above points, and minimizes the charging of the substrate so that the substrate can be easily peeled off during transfer, and causes the appearance of the substrate to be defective due to the charging. An object of the present invention is to provide a suction plate device that can be effectively prevented.
[0005]
[Means for Solving the Problems]
The present invention includes a plate body having a placement surface on which a substrate is placed, and a plurality of support protrusions formed on the placement surface of the plate body so as to support the substrate. Is formed with a vacuum suction hole for vacuum-adsorbing the substrate, and the top end surface of the support projections contacting the substrate is in close contact with the substrate when the substrate is vacuum-sucked by the vacuum suction hole. Provided is a suction plate device characterized by having smoothness.
[0006]
In the present invention, it is preferable that the top end surface of each support protrusion has a surface roughness with an arithmetic average roughness Ra defined by JIS B0601 of 0 <Ra ≦ 1.6 μm.
[0007]
Moreover, in this invention, it is preferable that each said support protrusion is arrange | positioned in the grid | lattice form within the said mounting surface of the said plate main body.
[0008]
Furthermore, in the present invention, it is preferable to further include a plurality of auxiliary protrusions formed on the mounting surface of the plate body so as to support the substrate together with the support protrusions.
[0009]
In the present invention, the plate body preferably cools the substrate.
[0010]
According to the present invention, in the plate body that supports the substrate by the plurality of support protrusions formed on the mounting surface, the substrate is vacuum-sucked by the vacuum suction holes formed in each support protrusion, and the top of each support protrusion Since the end surface has such smoothness that it adheres to the substrate when the substrate is vacuum-sucked by the vacuum suction hole, even when the substrate is sucked and held on the top end surface of each support projection, Air is not exhausted from the space between the mounting surface located in the portion and the substrate, and the substrate supported by each support protrusion can be kept flat. For this reason, it is possible to effectively prevent the substrate from coming into contact with the mounting surface at portions other than the supporting protrusions, and to minimize the charging of the substrate so that the substrate can be easily peeled off during transfer. In addition, it is possible to effectively prevent the occurrence of poor appearance of the substrate due to charging. In particular, according to the present invention, the substrate supported by each support protrusion can be kept flat, so that the height of each support protrusion can be reduced and the distance between the mounting surface of the plate body and the substrate. In the case where the substrate is cooled by the plate body, the cooling efficiency of the plate body can be sufficiently ensured.
[0011]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the drawings.
[0012]
First, the overall configuration of the suction plate device according to an embodiment of the present invention will be described with reference to FIG. In the present embodiment, a cooling plate device will be described as an example of the suction plate device.
[0013]
As shown in FIG. 1, the cooling plate device 10 includes a plate body 11 on which a substrate 20 to be cooled is placed.
[0014]
Here, a cooling mechanism 15 is provided inside the plate main body 11 so that the substrate 20 placed on the placement surface 12 of the plate main body 11 can be cooled. A temperature control device 16 is connected to the cooling mechanism 15 so that the temperature of the mounting surface 12 of the plate body 11 can be kept at a constant low temperature.
[0015]
Further, as shown in FIGS. 2 and 3, a plurality of support protrusions 13 and a plurality of auxiliary protrusions 14 are formed on the mounting surface 12 of the plate main body 11. The substrate 20 can be supported by the top end faces 13a, 14a of the protrusions 14.
[0016]
Here, as shown in FIGS. 2 and 3, each support projection 13 is formed with a vacuum suction hole 13b for vacuum suction of the substrate 20, and a vacuum suction mechanism 17 (connected to the vacuum suction hole 13b) ( Each support protrusion 13 and the substrate 20 can be brought into close contact with each other by evacuating according to FIG. In addition, it is preferable that the top part end surface 13a which contacts the board | substrate 20 among each support protrusion 13 has the smoothness which closely_contact | adheres to the board | substrate 20 when the board | substrate 20 is vacuum-sucked by the vacuum suction hole 13b. Specifically, the top end surface 13a of each support protrusion 13 has a surface roughness with an arithmetic average roughness Ra defined by JIS (Japanese Industrial Standards) B0601 of 0 <Ra ≦ 1.6 μm. Is preferred.
[0017]
On the other hand, the top end surface 14 a that contacts the lower surface of the substrate 20 among the auxiliary protrusions 14 has a smoothness that does not adhere to the substrate 20 even when the substrate 20 is vacuum-sucked by the vacuum suction holes 13 b of the support protrusions 13. It is preferable.
[0018]
Here, it is preferable that the support protrusions 13 and the auxiliary protrusions 14 are arranged in a lattice shape within the mounting surface 12 of the plate body 11 in the form shown in FIG. 2, for example.
[0019]
In addition, the arrangement | positioning space | interval and dimension of each support protrusion 13 and each auxiliary | assistant protrusion 14 are the bottom surfaces of the board | substrate 20 by the bending by the dead weight of the board | substrate 20 when the board | substrate 20 is supported by each support protrusion 13 and each auxiliary protrusion 14. It can be arbitrarily set within a range that does not come into contact with the mounting surface 12. Specifically, for example, when a color filter substrate having a size of 1100 mm × 1250 mm is placed on the plate body 11 having a size of the placement surface 12 of 1300 mm × 1300 mm, each support protrusion 13 and each The distances a and b of the auxiliary protrusions 14 are preferably set to about 100 mm and 50 mm, respectively. Each support protrusion 13 preferably has a diameter φ1 of the top end face 13a of about 3 mm and a height h1 of about 50 μm. Further, each auxiliary projection 14 preferably has a diameter φ2 of the top end face 14a of about 2 mm and a height h2 of about 50 μm. In addition, it is preferable that the heights h1 and h2 of each support protrusion 13 and each auxiliary protrusion 14 are equal.
[0020]
Next, the operation of the cooling plate device 10 having such a configuration will be described.
[0021]
First, in the cooling plate apparatus 10, the cooling mechanism 15 provided in the plate main body 11 and the temperature control apparatus 16 connected thereto are operated to keep the temperature of the mounting surface 12 of the plate main body 11 at a constant low temperature.
[0022]
In this state, the substrate 20 is moved above the plate body 11 and the substrate 20 is placed on the placement surface 12 of the plate body 11. At this time, the substrate 20 is supported by the plurality of support protrusions 13 and the plurality of auxiliary protrusions 14 formed on the placement surface 12.
[0023]
Thereafter, when the vacuum suction mechanism 17 is operated, the substrate 20 is vacuum-sucked by the vacuum suction holes 13b of the support protrusions 13, and the substrate 20 is sucked and held on the top end surfaces 13a and 14a of the support protrusions 13 and the auxiliary protrusions 14. Is done. At this time, the top end surface 13 a of each support protrusion 13 and the substrate 20 are in close contact with each other, and a local vacuum suction state is formed between the top end surface 13 a and the substrate 20. In this state, since air is not exhausted from the space between the mounting surface 12 and the substrate 20 located at portions other than the support protrusions 13, the substrate 20 supported by the support protrusions 13 is Keep flat.
[0024]
In this state, after the substrate 20 is sufficiently cooled by the plate body 11, the substrate 20 is detached from the plate body 11 and transferred to another processing apparatus or the like in the next process.
[0025]
As described above, according to the present embodiment, in the plate body 11 that supports the substrate 20 by the plurality of support protrusions 13 formed on the mounting surface 12, the substrate is formed by the vacuum suction holes 13 b formed in the support protrusions 13. 20 is vacuum-sucked, and the top end face 13a of each support projection 13 has such a smoothness that it adheres to the substrate 20 when the substrate 20 is vacuum-sucked by the vacuum suction hole 13b. Even when the substrate 20 is sucked and held on the top end surface 13a, air is not exhausted from the space between the mounting surface 12 and the substrate 20 located in a portion other than the support projections 13, and each support projection The substrate 20 supported by 13 can be kept flat. For this reason, it can prevent effectively that the board | substrate 20 contacts the mounting surface 12 in parts other than each support protrusion 13, and the board | substrate 20 carries out the transfer at the time of transfer by suppressing the charging of the board | substrate 20 to the minimum. It can be easily peeled off, and the occurrence of defects in the appearance of the substrate 20 due to charging can be effectively prevented. In particular, according to the present embodiment, the substrate 20 supported by each support protrusion 13 can be kept flat, so that the height h1 of each support protrusion 13 is lowered and the mounting surface of the plate body 11 is placed. The space between the substrate 12 and the substrate 20 can be reduced, and the cooling efficiency of the plate body 11 can be sufficiently ensured.
[0026]
In addition, according to the present embodiment, since the substrate 20 is supported by the auxiliary protrusions 14 together with the support protrusions 13, it is possible to more effectively prevent the substrate 20 from bending due to its own weight, and to support the support protrusions 13. It can prevent more effectively that the board | substrate 20 contacts the mounting surface 12 in parts other than. For this reason, the heights h1 and h2 of the support protrusions 13 and the auxiliary protrusions 14 can be reduced to reduce the distance between the mounting surface 12 of the plate body 11 and the substrate 20, and the plate body 11 The cooling efficiency can be further improved.
[0027]
Further, according to the present embodiment, the top end surface 14a of each auxiliary projection 14 has such a smoothness that it does not adhere to the substrate 20 even when the substrate 20 is vacuum-sucked by the vacuum suction hole 13b of each support projection 13. Thus, it is possible to minimize the charging of the substrate 20 caused by each auxiliary protrusion 14 and to more easily peel the substrate 20 during transfer.
[0028]
【The invention's effect】
As described above, according to the present invention, in the suction plate device, it is possible to minimize the charging of the substrate so that the substrate can be easily peeled off at the time of transfer, and to prevent the appearance of the substrate from being defective due to the charging. Can be prevented.
[Brief description of the drawings]
FIG. 1 is a diagram showing an overall configuration of a cooling plate device (suction plate device) according to an embodiment of the present invention.
2 is a perspective view showing the configuration of the surface of the plate body of the cooling plate device (suction plate device) shown in FIG. 1. FIG.
3 is a cross-sectional view taken along the line III-III of the plate body shown in FIG.
[Explanation of symbols]
10 Cooling plate device (Suction plate device)
DESCRIPTION OF SYMBOLS 11 Plate main body 12 Mounting surface 13 Support protrusion 13a Top end surface 13b Vacuum suction hole 14 Auxiliary protrusion 14a Top end surface 15 Cooling mechanism 16 Temperature control device 17 Vacuum suction mechanism 20 Substrate

Claims (2)

基板が載置される載置面を有するプレート本体と、
前記基板を支持するよう前記プレート本体の前記載置面上に形成され、上方に延びる円筒形状を有する複数の支持突起と、
前記各支持突起とともに前記基板を支持するよう前記プレート本体の前記載置面上に形成され、上方に延びる円筒形状を有する複数の補助突起と、を備え、
前記各支持突起には前記基板を真空吸着するための真空吸引孔が形成され、前記各支持突起のうち前記基板に接触する頂部端面は、前記真空吸引孔により前記基板を真空吸引した際に前記基板と密着するような平滑性を有し、
前記各補助突起のうち前記基板に接触する頂部端面は、前記各支持突起の前記真空吸引孔により前記基板を真空吸引した際でも前記基板と密着しないような平滑性を有し、
前記各支持突起および前記各補助突起は、前記プレート本体の前記載置面内にて格子状に配置され、
前記支持突起のみからなる支持突起の列と、前記補助突起のみからなる補助突起の列とが構成され、
前記支持突起の列と前記補助突起の列が交互に配置され
前記各支持突起の前記頂部端面は、JIS B0601により規定される算術平均粗さRaが0<Ra≦1.6μmである表面粗さを有する、ことを特徴とする吸着プレート装置。
A plate body having a mounting surface on which a substrate is mounted;
A plurality of support protrusions formed on the mounting surface of the plate body to support the substrate and having a cylindrical shape extending upward;
A plurality of auxiliary protrusions formed on the mounting surface of the plate body so as to support the substrate together with the supporting protrusions and having a cylindrical shape extending upward;
A vacuum suction hole for vacuum-adsorbing the substrate is formed in each of the support protrusions, and a top end surface of the support protrusion that contacts the substrate is formed when the substrate is vacuum-sucked by the vacuum suction hole. It has smoothness so that it is in close contact with the substrate,
The top end surface of each auxiliary projection that contacts the substrate has a smoothness so that it does not adhere to the substrate even when the substrate is vacuum-sucked by the vacuum suction hole of each support projection,
The support protrusions and the auxiliary protrusions are arranged in a lattice pattern within the mounting surface of the plate body,
A row of support projections consisting only of the support projections and a row of auxiliary projections consisting only of the auxiliary projections are configured,
The rows of support projections and the rows of auxiliary projections are alternately arranged ,
The top end face of each of the support protrusions has a surface roughness with an arithmetic average roughness Ra defined by JIS B0601 of 0 <Ra ≦ 1.6 μm .
前記プレート本体は基板を冷却するものであることを特徴とする、請求項1に記載の吸着プレート装置。The suction plate apparatus according to claim 1, wherein the plate body cools the substrate.
JP2003095250A 2003-03-31 2003-03-31 Suction plate device Expired - Fee Related JP4355507B2 (en)

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JPH0831515B2 (en) * 1988-06-21 1996-03-27 株式会社ニコン Substrate suction device
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