JP4351545B2 - 気相成長装置の基板ホルダ - Google Patents
気相成長装置の基板ホルダ Download PDFInfo
- Publication number
- JP4351545B2 JP4351545B2 JP2004019804A JP2004019804A JP4351545B2 JP 4351545 B2 JP4351545 B2 JP 4351545B2 JP 2004019804 A JP2004019804 A JP 2004019804A JP 2004019804 A JP2004019804 A JP 2004019804A JP 4351545 B2 JP4351545 B2 JP 4351545B2
- Authority
- JP
- Japan
- Prior art keywords
- peripheral member
- substrate
- outer peripheral
- susceptor
- inner peripheral
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 title claims description 76
- 238000001947 vapour-phase growth Methods 0.000 title claims description 17
- 230000002093 peripheral effect Effects 0.000 claims description 86
- 239000002994 raw material Substances 0.000 claims description 7
- 239000010409 thin film Substances 0.000 claims description 7
- 239000012808 vapor phase Substances 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 5
- 238000009826 distribution Methods 0.000 description 6
- 239000010408 film Substances 0.000 description 5
- 239000010453 quartz Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000007723 transport mechanism Effects 0.000 description 4
- 238000009413 insulation Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
Images
Landscapes
- Chemical Vapour Deposition (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
Claims (1)
- 加熱手段により加熱されるサセプタの上面に基板を支持した基板ホルダを載置し、前記基板を加熱しながら気相原料を供給して基板上に薄膜を堆積させる気相成長装置の基板ホルダにおいて、該基板ホルダは、基板支持部を有し、かつ、前記サセプタよりも小さな外径の円盤状の内周部材と、該内周部材の外周に配置される環状の外周部材とに分割形成され、前記外周部材は、前記サセプタの外周面を覆う鉛直方向の円筒部と、該円筒部の上端から水平方向に内方に屈曲して前記サセプタの外周部上面に載置される載置部とで形成され、前記内周部材は、外径を前記載置部の内径よりも小さく設定されるとともに該内周部材の外周面の上部側から水平方向の突出片を複数個設け、前記外周部材は、前記載置部から前記円筒部の上部にわたる切欠部が前記突出片に対応して設けられ、前記内周部材を前記外周部材に配置させたときの、内周部材と外周部材との間にリング状の断熱空間が形成され、かつ、前記内周部材を前記サセプタ上に載置させたときに、前記突出片と前記切欠部との間に前記リング状の断熱空間とは別の断熱空間が形成されることを特徴とする気相成長装置の基板ホルダ。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004019804A JP4351545B2 (ja) | 2004-01-28 | 2004-01-28 | 気相成長装置の基板ホルダ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004019804A JP4351545B2 (ja) | 2004-01-28 | 2004-01-28 | 気相成長装置の基板ホルダ |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005217018A JP2005217018A (ja) | 2005-08-11 |
JP4351545B2 true JP4351545B2 (ja) | 2009-10-28 |
Family
ID=34903918
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004019804A Expired - Lifetime JP4351545B2 (ja) | 2004-01-28 | 2004-01-28 | 気相成長装置の基板ホルダ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4351545B2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3718395A1 (en) | 2019-04-01 | 2020-10-07 | S+dB B.V. | Process for preparing a seed support |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070234955A1 (en) * | 2006-03-29 | 2007-10-11 | Tokyo Electron Limited | Method and apparatus for reducing carbon monoxide poisoning at the peripheral edge of a substrate in a thin film deposition system |
JP7147551B2 (ja) * | 2018-12-27 | 2022-10-05 | 株式会社Sumco | 気相成長装置及びこれに用いられるキャリア |
-
2004
- 2004-01-28 JP JP2004019804A patent/JP4351545B2/ja not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3718395A1 (en) | 2019-04-01 | 2020-10-07 | S+dB B.V. | Process for preparing a seed support |
Also Published As
Publication number | Publication date |
---|---|
JP2005217018A (ja) | 2005-08-11 |
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