JP4344797B2 - Disinfection / cleaning water ejection device - Google Patents
Disinfection / cleaning water ejection device Download PDFInfo
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- JP4344797B2 JP4344797B2 JP2000090860A JP2000090860A JP4344797B2 JP 4344797 B2 JP4344797 B2 JP 4344797B2 JP 2000090860 A JP2000090860 A JP 2000090860A JP 2000090860 A JP2000090860 A JP 2000090860A JP 4344797 B2 JP4344797 B2 JP 4344797B2
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- JP
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- Prior art keywords
- water
- hypochlorous acid
- ejection device
- ultraviolet rays
- water ejection
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
【０００１】
【発明の属する技術分野】
この発明は、次亜塩素酸（HClO）を含む除菌・洗浄水を噴出状態で得るための装置に関する。
【０００２】
【従来の技術】
上記除菌・洗浄水は、農産物、生活用品、医療器具などの除菌や精密機器の有機物による汚れの洗浄などに用いられている。次亜塩素酸を含む水は、食塩水などの塩素イオンを含む水を電気分解して得られることが知られており、従来は専らこの電解水が用いられている。
【０００３】
【発明が解決しようとする課題】
ところが、従来、除菌・洗浄水を対象物に噴射して除菌あるいは洗浄効果を上げようとして、電解水を噴霧あるいは高い圧力で吐出（これらをまとめて噴出というものとする。）すると、不安定な次亜塩素酸が分解して濃度が１／３以下に低下してしまい、結果として十分な除菌あるいは洗浄効果が得られないという問題があった。また、次亜塩素酸の分解により、塩素が発生する危険もある。
この発明は、次亜塩素酸を分解させることなく除菌・洗浄水を対象物に噴射できるようにして、除菌・洗浄効果の向上を図ることを課題とするものである。
【０００４】
【課題を解決するための手段】
この発明は、次亜塩素酸を含む水を噴出させるのではなく、噴出した水に次亜塩素酸を生成させるようにして、上記課題を解決するものである。すなわち、この発明は、塩化ナトリウムまたは塩化カリウム水溶液を噴出させる手段と、この噴出水に紫外線を照射する手段とからなり、前記紫外線の照射により前記噴出水中に次亜塩素酸を生成させるものとする（請求項1）。この請求項１によれば、すでに噴出された水中で次亜塩素酸が生成するため、噴出時に次亜塩素酸が分解することがない。
【０００５】
前記紫外線の照射手段としては、ＡｒＦエキシマレーザーを用い（請求項２）、あるいは低圧水銀ランプを用いることができる（請求項３）。
【０００６】
【発明の実施の形態】
図1及び図２は、石英セル1中にイオン交換水から得た塩化ナトリウム（ＮａＣｌ）水溶液を４cc投入し、ＡｒＦエキシマレーザー２(図1)及び低圧水銀ランプ３（図２）を光源として紫外線を照射し、次亜塩素酸の生成を行った実験装置を示すものである。セル内のＮａＣｌ（ａｑ）濃度は0.2％と20％の２種類とし、紫外線の照射時間はそれぞれ0.5分,1分,5分,10分,１５分とした。装置の実験条件は下記の通りである。
ＡｒＦエキシマレーザー
発振波長：193nm
ビームサイズ：２×２mm
最大パルスエネルギー：5mj
最大平均出力：0.5W
発振周波数：50Hz
低圧水銀ランプ（石英封印）
管径：4.0mm
管長：80mm
有効放電長：45mm
管電圧：280v
管電流：5.0mA
入力電力：1.3W
波長254nmの強度（測定距離10mm）：2.8W/cm2
光源と石英セルとの距離：50mm
石英セルと光源の雰囲気：大気
実験結果を表１及び表２に示す。表１はセル内のＮａＣｌ（ａｑ）濃度が0.2％の場合、表２は同じく20％の場合である。
【０００７】
【表１】
【表２】
上記の通り、塩素イオンを含む水溶液に紫外線を照射することにより、次亜塩素酸濃度が上昇した。これは次のようなプロセスによるものである。すなわち、紫外線の照射により、水溶液中の塩素イオンは溶媒である水の中に電子を放出し、還元されて塩素となり（２Ｃｌ-→Ｃｌ2+２ｅ）、その塩素は直ちに溶媒である水と反応して次亜塩素酸を生成する（Ｃｌ2+Ｈ2Ｏ→ＨＣｌＯ+Ｈ++Ｃｌ-）。
そこで、次は図３に示すように、同じ塩素イオンを含む水溶液を噴霧器４を用いて噴霧状に放出し、その噴霧水に紫外線を照射した。光源は図１及び図２のものと同じで、噴霧水溶液のＮａＣｌ（ａｑ）濃度も0.2％及び20％の２種類とした。噴霧水の流量は、それぞれ毎秒、10ml,7.5ml,５ml,2.5ml,１ml、また光源２,３と噴霧水との距離Ｌは100mmとした。そして、霧状の水溶液を回収したところ、紫外線照射後は次亜塩素酸濃度が上昇していた。
【００１０】
実験結果を表３及び表４に示す。表３はセル内のＮａＣｌ（ａｑ）濃度が0.2％の場合、表４は同じく20％の場合である。次いで、紫外線を照射しながら噴霧水溶液で有機物による汚れを洗浄したところ、次亜塩素酸濃度に応じた除菌及び洗浄効果が得られることが判明した。
【００１１】
【表３】
【表４】
上記実験から判明したところから、塩素イオンを含む噴出水に紫外線を照射することにより、この噴出水中に次亜塩素酸を生成させることが可能であり、この噴出水を有機物で汚染された対象物に噴射することにより、その除菌あるいは洗浄を行うことができる。なお、上記実験において、光源としてＡｒＦエキシマレーザー及び低圧水銀ランプを用いた例を示したが、それらに限定されるものではない。塩素イオンは波長180nm付近において大きな紫外線吸収特性を示すので、この付近の波長成分の多いものがよく、ハロゲンランプ、ＡｒＦエキシマランプ、Ａｒイオンレーザーのような気体レーザー、高圧あるいは超高圧水銀ランプなども使用可能である。また、塩素イオンを含む水溶液は食塩水に限らず、ＫＣｌ溶液なども使用可能である。
【００１４】
【発明の効果】
この発明によれば、噴出水中に次亜塩素酸を生成させることにより、次亜塩素酸を含む水を次亜塩素酸を分解させることなく対象物に噴射することができ、高い除菌あるいは洗浄効果が得られるとともに、その分、次亜塩素酸濃度のレベルを下げることができるので、洗浄後の除菌・洗浄後のすすぎ水量の減量や排水処理の負担の軽減が同時に実現する。
【図面の簡単な説明】
【図１】 塩素イオンを含む水溶液にＡｒＦエキシマレーザーから紫外線を照射する実験装置を示す原理図である。
【図２】 塩素イオンを含む水溶液に低圧水銀ランプから紫外線を照射する実験装置を示す原理図である。
【図３】 塩素イオンを含む噴出水に紫外線を照射する実験装置を示す原理図である。
【符号の説明】
１ 石英セル
２ ＡｒＦエキシマレーザー
３ 低圧水銀ランプ
４ 噴霧器[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an apparatus for obtaining sterilized / washed water containing hypochlorous acid (HClO) in an ejected state.
[0002]
[Prior art]
The sterilization / washing water is used for sterilization of agricultural products, daily necessities, medical instruments, etc., and cleaning of dirt caused by organic matter in precision instruments. It is known that water containing hypochlorous acid can be obtained by electrolyzing water containing chlorine ions such as saline, and this electrolyzed water is conventionally used exclusively.
[0003]
[Problems to be solved by the invention]
However, conventionally, when the sterilization / cleaning water is sprayed onto the object to increase the sterilization or cleaning effect, the electrolyzed water is sprayed or discharged at a high pressure (collectively referred to as jetting). There was a problem that stable hypochlorous acid was decomposed and the concentration was lowered to 1/3 or less, and as a result, sufficient sterilization or cleaning effect could not be obtained. In addition, there is a danger that chlorine is generated due to decomposition of hypochlorous acid.
An object of the present invention is to improve the sterilization / cleaning effect by allowing the sterilization / cleaning water to be sprayed onto an object without decomposing hypochlorous acid.
[0004]
[Means for Solving the Problems]
The present invention solves the above problem by generating hypochlorous acid in the ejected water rather than ejecting water containing hypochlorous acid. That is, the present invention comprises means for ejecting sodium chloride or a potassium chloride aqueous solution and means for irradiating the jet water with ultraviolet rays, and hypochlorous acid is generated in the jet water by the irradiation of the ultraviolet rays. (Claim 1). According to the first aspect, hypochlorous acid is generated in the already jetted water, so that hypochlorous acid is not decomposed at the time of jetting.
[0005]
As the ultraviolet irradiation means, an ArF excimer laser can be used (Claim 2), or a low-pressure mercury lamp can be used (Claim 3).
[0006]
DETAILED DESCRIPTION OF THE INVENTION
1 and 2 show that 4 cc of sodium chloride (NaCl) aqueous solution obtained from ion-exchanged water is put into a quartz cell 1 and ultraviolet light is emitted using ArF excimer laser 2 (FIG. 1) and low-pressure mercury lamp 3 (FIG. 2) as light sources. 1 shows an experimental apparatus in which hypochlorous acid was generated by irradiating. The concentration of NaCl (aq) in the cell was 0.2% and 20%, and the irradiation time of ultraviolet rays was 0.5 minutes, 1 minute, 5 minutes, 10 minutes, and 15 minutes, respectively. The experimental conditions of the apparatus are as follows.
ArF excimer laser oscillation wavelength: 193nm
Beam size: 2x2mm
Maximum pulse energy: 5mj
Maximum average output: 0.5W
Oscillation frequency: 50Hz
Low pressure mercury lamp (quartz seal)
Tube diameter: 4.0mm
Tube length: 80mm
Effective discharge length: 45mm
Tube voltage: 280v
Tube current: 5.0mA
Input power: 1.3W
Intensity at a wavelength of 254 nm (measurement distance 10 mm): 2.8 W / cm 2
Distance between light source and quartz cell: 50mm
Quartz cell and light source atmosphere: air Tables 1 and 2 show the experimental results. Table 1 shows the case where the concentration of NaCl (aq) in the cell is 0.2%, and Table 2 shows the case where the concentration is 20%.
[0007]
[Table 1]
[Table 2]
As described above, the hypochlorous acid concentration was increased by irradiating the aqueous solution containing chlorine ions with ultraviolet rays. This is due to the following process. That is, by irradiation with ultraviolet rays, chlorine ions in the aqueous solution release electrons into the solvent water and are reduced to chlorine (2Cl − → Cl 2 + 2e), which immediately reacts with the solvent water. Thus, hypochlorous acid is produced (Cl 2 + H 2 O → HClO + H + + Cl − ).
Therefore, next, as shown in FIG. 3, an aqueous solution containing the same chlorine ions was discharged in a spray form using the sprayer 4, and the spray water was irradiated with ultraviolet rays. The light source was the same as that shown in FIGS. 1 and 2, and the NaCl (aq) concentration of the spray aqueous solution was set to two types of 0.2% and 20%. The flow rate of spray water was 10 ml, 7.5 ml, 5 ml, 2.5 ml and 1 ml, respectively, and the distance L between the
[0010]
The experimental results are shown in Tables 3 and 4. Table 3 shows the case where the NaCl (aq) concentration in the cell is 0.2%, and Table 4 shows the case where the concentration is 20%. Next, when organic stains were washed with an aqueous spray solution while irradiating ultraviolet rays, it was found that sterilization and cleaning effects according to hypochlorous acid concentration were obtained.
[0011]
[Table 3]
[Table 4]
From the results of the above experiments, it is possible to generate hypochlorous acid in the squirt water by irradiating the squirt water containing chlorine ions with ultraviolet rays, and this squirt water is contaminated with organic matter. The sterilization or washing can be carried out by spraying on the surface. In the above experiment, an example in which an ArF excimer laser and a low-pressure mercury lamp are used as the light source has been described. However, the present invention is not limited thereto. Chlorine ions show a large ultraviolet absorption characteristic near the wavelength of 180 nm, so those with many wavelength components in the vicinity are preferable, such as halogen lamps, ArF excimer lamps, gas lasers such as Ar ion lasers, high-pressure or ultrahigh-pressure mercury lamps, etc. It can be used. Further, the aqueous solution containing chlorine ions is not limited to the saline solution, and a KCl solution or the like can also be used.
[0014]
【The invention's effect】
According to the present invention, by generating hypochlorous acid in the erupted water, water containing hypochlorous acid can be jetted onto an object without decomposing hypochlorous acid, and high sterilization or washing can be performed. As well as being effective, the level of hypochlorous acid concentration can be lowered accordingly, so that sterilization after washing, rinsing water after washing and reduction of wastewater treatment can be realized at the same time.
[Brief description of the drawings]
FIG. 1 is a principle diagram showing an experimental apparatus for irradiating an aqueous solution containing chlorine ions with ultraviolet rays from an ArF excimer laser.
FIG. 2 is a principle view showing an experimental apparatus for irradiating an aqueous solution containing chlorine ions with ultraviolet rays from a low-pressure mercury lamp.
FIG. 3 is a principle diagram showing an experimental apparatus for irradiating ultraviolet water to jet water containing chlorine ions.
[Explanation of symbols]
1
Claims (3)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000090860A JP4344797B2 (en) | 2000-03-29 | 2000-03-29 | Disinfection / cleaning water ejection device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000090860A JP4344797B2 (en) | 2000-03-29 | 2000-03-29 | Disinfection / cleaning water ejection device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001276842A JP2001276842A (en) | 2001-10-09 |
| JP4344797B2 true JP4344797B2 (en) | 2009-10-14 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000090860A Expired - Fee Related JP4344797B2 (en) | 2000-03-29 | 2000-03-29 | Disinfection / cleaning water ejection device |
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| Country | Link |
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| JP (1) | JP4344797B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109133261B (en) * | 2018-10-29 | 2023-08-22 | 浙江钻邦水处理设备有限公司 | Ultraviolet sterilization filter based on injection structure |
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- 2000-03-29 JP JP2000090860A patent/JP4344797B2/en not_active Expired - Fee Related
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| Publication number | Publication date |
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| JP2001276842A (en) | 2001-10-09 |
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