JP4342861B2 - Semiconductor wafer processing equipment - Google Patents

Description

  The present invention relates to a semiconductor wafer processing apparatus such as a cutting apparatus for dividing a semiconductor wafer into individual semiconductor chips.

  For example, in a semiconductor device manufacturing process, circuits such as ICs and LSIs are formed in a large number of regions arranged in a lattice pattern on the surface of a semiconductor wafer that is a substantially disk-shaped plate, and the circuits are formed. Individual semiconductor chips are manufactured by dividing each region by a dicing device along a planned cutting line called a street. Such division of the semiconductor wafer is generally performed by a cutting device as a dicing device. The cutting apparatus includes a cassette mounting mechanism having a cassette mounting table for mounting a cassette storing a semiconductor wafer, and a semiconductor wafer stored in the cassette mounted on the cassette mounting table. A loading / unloading mechanism for loading a semiconductor wafer into the cassette; a chuck table for holding the semiconductor wafer unloaded by the loading / unloading mechanism; and a processing mechanism for processing the semiconductor wafer held by the chuck table. .

  The semiconductor wafer is housed in a cassette in a state where it is adhered to the surface of a protective tape attached to an annular frame so as not to fall apart when divided into individual chips. However, a cutting groove having a predetermined depth is formed along the street without being completely divided into individual chips by a cutting apparatus, and then the back surface of the semiconductor wafer is ground until the cutting groove is exposed. In a dividing method called so-called tip dicing, which is divided into chips, the semiconductor wafer accommodated in the cassette of the cutting apparatus does not need to be supported on the frame via a protective tape, and may be a single semiconductor wafer.

  As described above, the semiconductor wafer supported on the frame via the protective tape has a crystal orientation mark attached to a predetermined position of the frame, and the frame supporting the semiconductor wafer is placed in the cassette in a predetermined direction. Can be stored. Therefore, by carrying the frame to a predetermined position in the temporary placement region, the center position of the semiconductor wafer supported by the frame is automatically aligned with the position indicating the crystal orientation. On the other hand, when a single semiconductor wafer is cut, the single semiconductor wafer is stored in a cassette. However, since the semiconductor wafer is formed in a substantially disc shape, it is difficult to align the center position and crystal orientation when being stored in the cassette and unloaded from the cassette.

  In order to solve the above-described problem, the present applicant provided a temporary placement area for temporarily placing the semiconductor wafer carried out from the cassette placed on the cassette placement table, and provided an alignment mechanism in the temporary placement area. A cutting device was proposed as Japanese Patent Application No. 2001-363068.

  Some semiconductor wafers have ID marks on which dimensional information such as the thickness of the semiconductor wafer and the distance between streets, processing conditions, and the like are recorded on the outer periphery of the front or back surface of the semiconductor wafer.

  Thus, with respect to the semiconductor wafer on which the ID mark is formed, the ID mark is read by the ID reader when it is stored in the cassette and is input to the control means of the processing apparatus, which requires time and labor.

  The present invention has been made in view of the above-mentioned facts, and its main technical problem is to provide a semiconductor wafer processing apparatus provided with means capable of reading an ID mark formed on a semiconductor wafer carried out from a cassette. There is.

In order to solve the main technical problem, according to the present invention, a cassette mounting mechanism including a cassette mounting table for mounting a cassette containing a single semiconductor wafer, and the cassette mounting mechanism mounted on the cassette mounting table. A workpiece loading / unloading mechanism for unloading the semiconductor wafer contained in the cassette and loading the semiconductor wafer into the cassette; a workpiece conveying mechanism for conveying the semiconductor wafer unloaded by the workpiece loading / unloading mechanism; In a semiconductor wafer processing apparatus comprising: a chuck table mechanism including a chuck table that holds a semiconductor wafer transferred by the workpiece transfer mechanism; and a processing mechanism that processes a semiconductor wafer held on the chuck table. ,
A center table on which a semiconductor wafer is mounted and configured to be rotatable, a center alignment member that acts on the outer peripheral surface of the semiconductor wafer, and a crystal orientation provided on the outer periphery of the semiconductor wafer mounted on the center table. An ID mark reading mechanism including a semiconductor wafer crystal orientation detecting means for detecting a mark to be displayed and an ID reader for reading an ID mark formed on the outer periphery of the front or back surface of the semiconductor wafer is provided below the cassette mounting table. is disposed,
The cassette mounting mechanism includes a first loading / unloading position in which the cassette mounted on the cassette loading table is located in a loading / unloading area of the workpiece loading / unloading mechanism, and the ID mark reading mechanism is the workpiece There is provided a semiconductor wafer processing apparatus comprising elevating means positioned at a second workpiece loading / unloading position located in a loading / unloading region of a material loading / unloading mechanism.

The central positioning member is desirably provided with a plurality of position regulating portion corresponding to the size of the semiconductor wafer.

Machining apparatus according to the present invention is constructed as described above, ID mark reading mechanism having an ID reader for reading the ID mark formed in the outer peripheral portion of the surface or back surface of the semiconductor wafer placed on the Center table Therefore, when storing a semiconductor wafer in a cassette, the ID mark is read by an ID reader, and the ID mark information can be used effectively during processing without being input to the control means of the processing apparatus. it can. Since the ID mark reading mechanism is located under the cassette mounting base of the cassette mounting mechanism, the space under the cassette mounting base that was previously left without being effectively used is effective. Therefore, since the ID mark reading mechanism is provided, the entire processing apparatus is not excessively increased in volume. In addition, the cassette loading mechanism includes a first loading / unloading position in which the cassette loaded on the cassette loading table by the lifting / lowering means is located in a loading / unloading area of the workpiece loading / unloading mechanism, and an ID mark reading mechanism. Since it is positioned at the second workpiece loading / unloading position located in the loading / unloading area of the workpiece loading / unloading mechanism, the workpiece loading / unloading mechanism is effectively used for loading / unloading the semiconductor wafer to / from the ID mark reading mechanism. In addition, it is not necessary to additionally provide a new conveying means due to the provision of the ID mark reading mechanism.

  DESCRIPTION OF EMBODIMENTS Hereinafter, a preferred embodiment of a processing apparatus configured according to the present invention will be described in detail with reference to the accompanying drawings.

FIG. 1 is a perspective view of a cutting device as a processing device configured according to the present invention.
The cutting device in the illustrated embodiment includes a stationary base 2. A cassette mounting mechanism 3 is disposed on the side surface of the stationary base 2. The cassette mounting mechanism 3 includes a cassette mounting table 32 slidably disposed on two guide rails 31, 31 provided vertically on the side surface of the stationary base 2, and a lower side of the cassette mounting table 32. The ID mark reading mechanism 4 that reads an ID mark formed on a semiconductor wafer that is a workpiece to be processed, and the cassette mounting table 32 and the ID mark reading mechanism 4 are moved vertically along the guide rails 31 and 31 (arrows). Elevating means 33 for moving in the direction indicated by Z) is provided.

  In the illustrated embodiment, the cassette mounting table 32 and the housing 41 of the ID mark reading mechanism 4 are integrally formed. That is, as shown in FIGS. 2 and 3, the cassette mounting table 32 is configured to function as the upper wall of the housing 41. On the upper surface of the cassette mounting table 32, a cassette 10 for storing a semiconductor wafer as a workpiece is placed. The cassette 10 is provided with a workpiece loading / unloading opening 101 for loading / unloading a semiconductor wafer as a workpiece, and a plurality of racks for mounting the semiconductor wafer on inner surfaces of both side walls 102, 102. A shelf 102a is provided facing the vertical direction. A semiconductor wafer 11 which is a workpiece to be stored in the cassette 10 is formed in a disk shape, and IC, LSI, etc. are formed in a number of regions partitioned by streets 11a and 11b formed in a lattice shape on the surface thereof. Circuit 111 is formed. A notch 112 representing the crystal orientation of the semiconductor wafer is provided on the outer periphery of the semiconductor wafer 11 thus configured. An ID mark 113 is formed on the surface of the outer peripheral portion of the semiconductor wafer 11 to record dimensional information such as the thickness of the semiconductor wafer, the interval between streets, processing conditions, and the like at a position displaced 180 degrees from the notch 112.

  The ID mark reading mechanism 4 disposed on the lower side of the cassette mounting table 32 includes a housing 41 in which the cassette mounting table 32 forms an upper wall. The housing 41 is provided with a workpiece loading / unloading opening 411 for loading / unloading the semiconductor wafer 11 as a workpiece on the right side in FIGS. A center table 42 on which the semiconductor wafer 11 is placed is disposed in the housing 41. The center table 42 is appropriately rotated by a pulse motor 43 as a rotating means. The center table 42 is connected to a negative pressure control means (not shown) so that a negative pressure is appropriately applied.

  The ID mark reading mechanism 4 in the illustrated embodiment has a center alignment member 44 on the left side of the center table 42 in FIGS. Is arranged. As shown in FIGS. 4 and 5, the center alignment member 44 moves up and down two arcuate surfaces 441 and 442 as position restricting portions that contact a part of the outer peripheral surface of the semiconductor wafer 11 on the side surface on the center table 42 side. In preparation. The upper arc surface 441 has a radius corresponding to, for example, the radius of an 8-inch semiconductor wafer, and the lower arc surface 442 has a radius corresponding to, for example, the radius of a 12-inch semiconductor wafer. The center alignment member 44 formed in this way is disposed so that the arc surfaces 441 and 442 are concentric with the center of rotation of the center table 42. The center alignment member 44 is moved up and down by the air cylinders 45 and 45.

  The ID mark reading mechanism 4 in the illustrated embodiment includes a semiconductor wafer crystal orientation detecting means 46 disposed at a position displaced by 90 degrees from an intermediate position between the arcuate surfaces 441 and 442 provided on the center alignment member 44. is doing. The semiconductor wafer crystal orientation detection means 46 includes, for example, a light emitting element 461a and a light receiving element 461b for an 8-inch semiconductor wafer, and a light emitting element 462a and a light receiving element 462b for a 12 inch semiconductor wafer, for example. Further, the ID mark reading mechanism 4 includes an ID reader 47 disposed at a position displaced 180 degrees from the semiconductor wafer crystal orientation detection means 46, that is, at a position facing the semiconductor wafer crystal orientation detection means 46 with the center table 42 interposed therebetween. It has. The ID reader 47 includes a front side reading reader 471 and a back side reading reader 472. The front side reading reader 471 and the back side reading reader 472 are 8 inch semiconductor wafer readers 471a, 472a and 12 inch, respectively. Semiconductor wafer readers 471b and 472b are provided. The ID reader 47 configured as described above reads the ID mark 113 formed on the outer peripheral surface or the back surface of the semiconductor wafer 11 held on the center table 42, and sends the read ID information to a control means (not shown). . As described above, in the illustrated embodiment, since the ID mark reading mechanism 4 is disposed below the cassette mounting table 32 constituting the cassette mounting mechanism 3, the ID mark reading mechanism 4 is arranged in a plane adjacent to the cassette mounting table. There is no need to provide the mark reading mechanism 4, and the processing apparatus can be downsized.

The ID mark reading mechanism 4 configured as described above is fixed on the support base 34 on which the bottom wall 412 of the housing 41 is lifted and lowered by the lifting means 33 as shown in FIGS.
The elevating means 33 in the illustrated embodiment includes a male screw rod 331 that is disposed between the guide rails 31 and 31 in the vertical direction and is rotatably supported, and a forward and reverse pulse that rotates the male screw rod 331. A motor 332 is formed, and a female screw hole 341 provided at a base end portion of the support base 34 is screwed into the male screw rod 331. A guided portion 342 that is guided along the guide rails 31 and 31 is provided at the base end portion of the support base 34. Therefore, when the pulse motor 332 is rotationally driven in one direction, the support base 34 is raised along the male screw rod 331 and the guide rails 31 and 31, and when the pulse motor 332 is rotationally driven in the other direction, the support base 34 is It is lowered along the guide rails 31, 31. As shown in FIG. 2, the support table 34 that is lifted and lowered in this way is a first where the cassette 10 mounted on the cassette mounting table 32 faces a hand that is a loading / unloading area of a workpiece loading / unloading mechanism described later. As shown in FIG. 3, the ID mark reading mechanism 4 is positioned at a second loading / unloading position facing the hand which is a loading / unloading area of the workpiece loading / unloading mechanism, which will be described later. In the first carry-in / out position, the lifting / lowering means 33 adjusts the position corresponding to the accommodation position of the semiconductor wafer accommodated in the cassette 10 placed on the cassette placement table 32.

  Returning to FIG. 1 and continuing the description, the processing apparatus in the illustrated embodiment unloads the semiconductor wafer 11 which is a workpiece stored in the cassette 10 mounted on the cassette mounting table 32 and cassette. 10 includes a workpiece carry-in / out mechanism 5 for loading the semiconductor wafer 11 into and from the ID mark reading mechanism 4. The workpiece carry-in / out mechanism 5 moves the hand 51 that holds the semiconductor wafer 11, the hand support member 52 that supports the hand 51, and the hand 51 that is supported by the hand support member 52 in the direction indicated by the arrow Y. It consists of a hand moving means 53 for staking. The hand 51 is formed in a fork shape with a thin plate material, and a suction holding hole 511 communicating with a passage (not shown) formed therein is formed on the surface of the hand 51. The suction holding hole 511 passes through the passage (not shown). The suction control means (not shown) is communicated. The hand moving means 53 is provided with a male screw rod 531 that extends in the direction indicated by the arrow Y on the front surface of the stationary base 2 and is rotatably supported, and can be rotated forward and backward to rotate the male screw rod 531. A pulse motor 532 is formed, and a female screw hole 521 provided at a proximal end portion of the hand support member 52 is screwed into the male screw rod 531. Therefore, when the pulse motor 532 is rotationally driven in one direction, the hand 51 supported by the hand support member 52 is moved in the direction indicated by the arrow Y1, and when the pulse motor 532 is rotationally driven in the other direction, it is supported by the hand support member 52. The hand 51 is moved in the direction indicated by the arrow Y2. That is, the hand moving means 53 includes an entry position where the hand 51 enters the cassette 10 on which the cassette placing table 32 is placed and the ID mark reading mechanism 4, and a workpiece placement area of the chuck table which will be described later. Are moved to an unloading position that is an upper position of the unloading position, and a retracted position that is retracted from the unloading position.

  The machining apparatus in the illustrated embodiment includes a chuck table mechanism 6 that holds the semiconductor wafer carried out by the workpiece carry-in / out mechanism 5, and a cutting mechanism 7 that cuts the workpiece held by the chuck table mechanism 6. A cleaning mechanism 8 for cleaning the workpiece cut by the cutting mechanism 7, and a semiconductor wafer carried out by the workpiece carrying-in / out mechanism 5 is conveyed to a chuck table (to be described later) of the chuck table mechanism 6 and A workpiece transfer mechanism 9 for transferring the processed semiconductor wafer held on the chuck table to the cleaning mechanism 8 is provided.

  The chuck table mechanism 6 includes a support base 61 fixed on the stationary base 2, two guide rails 62 and 62 disposed on the support base 61 in parallel along the direction indicated by the arrow X, A chuck table 63 is provided as a workpiece holding means for holding a workpiece arranged on the guide rails 62 and 62 so as to be movable in the direction indicated by the arrow X. The chuck table 63 includes a suction chuck support base 631 movably disposed on the guide rails 62 and 62, and a suction chuck 632 mounted on the suction chuck support base 631. The suction chuck 632 is connected to a negative pressure control means (not shown) so that a negative pressure is appropriately applied. Therefore, the semiconductor wafer, which is a workpiece placed on the suction chuck 632, is sucked and held on the suction chuck 632 by operating a negative pressure control means (not shown).

  The chuck table mechanism 6 in the illustrated embodiment includes a chuck table moving means 64 for moving the chuck table 63 along the two guide rails 62 and 62 in the direction indicated by the arrow X. The chuck table moving means 64 includes a male screw rod 641 disposed in parallel between the two guide rails 62 and 62 and a female screw block (not shown) that is mounted on the suction chuck support base 631 and screwed into the male screw rod 641. And a drive source such as a pulse motor (not shown) for rotationally driving the male screw rod 641. Therefore, the chuck table 63 is moved in the direction indicated by the arrow X by rotating the male screw rod 641 by a pulse motor (not shown). That is, the chuck table 63 can move between the workpiece placement area 6a and the machining area 6b. The chuck table mechanism 6 includes a rotation mechanism (not shown) that rotates the suction chuck 632.

Next, the cutting mechanism 7 will be described.
The cutting mechanism 7 includes a gate-shaped support base 71 fixed on the stationary base 2. The gate-shaped support base 71 is disposed so as to straddle the cutting region 6b. Two guide rails 711 and 711 arranged in parallel along the direction indicated by the arrow Y are provided on the side wall of the support base 71, and in parallel between the two guide rails 711 and 711. Two male screw rods 721a and 721b are provided. Along the guide rails 711 and 711, a first base portion 73a and a second base portion 73b are disposed so as to be slidable in the directions indicated by arrows Y, respectively. The first base 73a and the second base 73b are provided with drive female screw blocks (not shown) that are screwed into the male screw rods 72a and 72b, respectively. The drive female screw blocks are rotated by pulse motors 722a and 722b. Thus, the first base 73a and the second base 73b can be moved along the guide rails 711 and 711 in the direction indicated by the arrow Y.

  A pair of guide rails 731a and 731b are provided in the first base portion 73a and the second base portion 73b, respectively, along the cutting feed direction indicated by an arrow Z, and the first base rails 731a and 731b are provided along the first guide rails 731a and 731b. The suspension bracket 74a and the second suspension bracket 74b are slidably disposed in the cutting feed direction indicated by the arrow Z, respectively. The first base portion 73a and the second base portion 73b are provided with male screw rods (not shown) that are rotated by driving sources such as pulse motors 75a and 75b, respectively, and the first support portion 74a and the second support portion are provided. Each part 74b is provided with a female screw block that is screwed into the male screw rod. Therefore, by rotating a male screw rod (not shown) by the pulse motors 75a and 75b, the first suspension bracket 74a and the second suspension bracket 74b are held along the guide rails 731a and 731b by the workpiece of the suction chuck 632. It can be moved in the cutting feed direction indicated by the arrow Z perpendicular to the surface.

  A first spindle unit 76a as a first cutting means and a second spindle unit 76b as a second cutting means are mounted on the first suspension bracket 74a and the second suspension bracket 74b. The first spindle unit 76a and the second spindle unit 76b will be described with reference to FIG. 6 shown in a simplified manner. The first spindle unit 76a and the second spindle unit 76b include a first spindle housing 761a and a second spindle housing 761b fixed to the first suspension bracket 74a and the second suspension bracket 74b, respectively. A first rotating spindle 762a and a second rotating spindle 762b rotatably supported by one spindle housing 751a and a second spindle housing 761b, respectively, and the first rotating spindle 762a and the second rotating spindle 762b. It consists of a first cutting blade 763a and a second cutting blade 763b attached to one end. The first spindle unit 76a and the second spindle unit 76b configured as described above are arranged such that the first cutting blade 763a and the second cutting blade 763b face each other. In other words, the first spindle unit 76a and the second spindle unit 76b are arranged in a straight line so that the shaft cores face the indexing feed direction indicated by the arrow Y, respectively. As shown in FIG. 1, the first spindle unit 76a and the second spindle unit 76b configured as described above include a first imaging unit 77a and a second imaging unit respectively configured by a microscope, a CCD camera, or the like. 77b is provided. The first imaging means 77a is fixed to the first spindle housing 761a, and the second imaging means 77b is fixed to the second spindle housing 761b.

  The cleaning mechanism 8 is disposed on an extension line connecting the cassette mounting table 32 and the workpiece mounting area 6 a of the chuck table 63, and includes a known spinner cleaning / drying means having a spinner table 81. Yes. The workpiece transport mechanism 9 includes a Bernoulli pad 91 that sucks and holds the upper surface of a semiconductor wafer that is a workpiece, a pad support member 92 that supports the Bernoulli pad 91, and a Bernoulli supported by the pad support member 92. It comprises pad moving means 93 for moving the pad 91 in the direction indicated by the arrow Y. The Bernoulli pad 91 is connected to an air supply means (not shown), and a negative pressure is generated by allowing air to flow along the inner surface of the conical pad 911, and the semiconductor wafer as a workpiece is caused by this negative pressure. It is configured to hold by suction. The pad support member 92 supports the Bernoulli pad 91 movably in the vertical direction by an air cylinder 921. The pad moving means 93 has a male threaded rod 931 that extends in the direction indicated by the arrow Y and is rotatably supported on the gate-shaped support base 71, and can be rotated forward and backward to rotate the male threaded rod 931. And a female screw hole 922 provided at the base end portion of the pad support member 92 is screwed into the male screw rod 931. Accordingly, when the pulse motor 932 is rotationally driven in one direction, the Bernoulli pad 91 supported by the pad support member 92 is moved in the direction indicated by the arrow Y1, and when the pulse motor 932 is rotationally driven in the other direction, the pad support member 92 supports the Bernoulli pad 91. The Bernoulli pad 91 thus moved is moved in the direction indicated by the arrow Y2.

Next, the cutting processing operation of the above-described cutting apparatus will be described mainly based on FIG.
Prior to starting the cutting process, the cassette 10 storing a predetermined number of semiconductor wafers 11 before processing is placed on the workpiece loading / unloading opening 101 (see FIGS. 2 and 3) on the cassette mounting table 32. Mounted toward the region 6a side. When a cutting start switch (not shown) is turned on, the lifting / lowering means 33 of the cassette mounting mechanism 3 is operated to move the cassette 10 mounted on the cassette mounting table 32 into the first carry-out shown in FIG. Position in the entry position. When the cassette 10 is positioned at the first loading / unloading position shown in FIG. 2, the workpiece loading / unloading mechanism 5 is operated to move the hand 51 in the direction indicated by the arrow Y <b> 1, so that the cassette 10 enters the cassette 10. Position. As a result, the hand 51 is positioned along the lower surface of the semiconductor wafer 11 placed on a predetermined shelf of the cassette 10. Next, the semiconductor wafer 11 is sucked and held on the upper surface of the hand 51 by operating a suction control means (not shown) and applying a negative pressure to the suction holding hole 511 formed on the upper surface of the hand 51. As described above, when the semiconductor wafer 11 is sucked and held on the upper surface of the hand 51, the workpiece carrying-in / out mechanism 5 is operated to move the hand 51 in the direction indicated by the arrow Y 2, and the hand 51 holding the semiconductor wafer 11. Is positioned at the unloading position above the workpiece placement area 6a shown in FIG. During this time, the lifting / lowering means 33 of the cassette mounting mechanism 3 is operated to position the alignment mechanism 4 at the second loading / unloading position shown in FIG.

  Next, the workpiece carry-in / out mechanism 5 is actuated again to move the hand 51 in the direction indicated by the arrow Y1 to be positioned at the carry-in / out position. As a result, the fork-like hand 51 holding the semiconductor wafer 11 enters the alignment mechanism 4 and enters the state where the center table 42 is sandwiched as shown in FIG. 5, and the semiconductor wafer 11 held on the upper surface of the hand 51 is moved. Positioned on the center table 42. At this time, a part of the outer peripheral surface of the semiconductor wafer 11 is brought into contact with the arc surface 441 or 442 of the center alignment member 44 to perform center alignment. That is, when the semiconductor wafer 11 is 8 inches, the center position restricting plate 44 is positioned at a position indicated by a solid line in FIG. 5, and when the semiconductor wafer 11 is 12 inches, the center alignment member 44 is located in FIG. A part of the outer peripheral surface of the semiconductor wafer 11 is in contact with the circular arc surface 441 or 442. The suction holding of the semiconductor wafer 11 by the hand 51 is released immediately before a part of the outer peripheral surface of the semiconductor wafer 11 abuts on the arc surface 441 or 442. In this way, when the center position of the semiconductor wafer 11 is aligned, the negative pressure control means (not shown) is operated to suck and hold the semiconductor wafer 11 on the center table 42. In the illustrated embodiment, the center position restricting plate 44 is configured to be movable in the vertical direction. However, the center position restricting plate 44 is fixed at a predetermined position, and the hand 51 is made the size of the semiconductor wafer 11. Accordingly, it may be moved in the vertical direction.

  Next, the ID mark reading mechanism 4 executes alignment of the crystal orientation of the semiconductor wafer 11. That is, the ID mark reading mechanism 4 shown in FIG. 4 rotates and drives the electric motor 43 to rotate the center table 42, and the semiconductor wafer crystal orientation detection means disposed at a position corresponding to the size of the semiconductor wafer 11. 46 (light emitting element 461a and light receiving element 461b or light emitting element 462a and light receiving element 462b) detects the notch 112 (see FIG. 2) indicating the crystal orientation provided on the outer periphery of the semiconductor wafer, and drives the electric motor 43. By stopping, the position of the crystal orientation of the semiconductor wafer 11 is aligned. When the mark indicating the crystal orientation of the semiconductor wafer 11 is the orientation flat, both ends of the orientation flat are detected by the semiconductor wafer crystal orientation detection means 46, and a control means (not shown) detects based on this detection signal. The crystal orientation of the semiconductor wafer 11 can be aligned by calculating the angle between the two end portions and inverting the center table 42 by half the angle between the two end portions.

  In this manner, the crystal orientation of the semiconductor wafer 11 is aligned, that is, the notch 112 representing the crystal orientation provided on the outer periphery of the semiconductor wafer is positioned at the position where the semiconductor wafer crystal orientation detecting means 46 is disposed. The ID mark 113 formed on the outer peripheral surface (or back surface) of the semiconductor wafer 11 is positioned at a position facing the ID reader 47. Therefore, simultaneously with the alignment of the crystal orientation of the semiconductor wafer 11, the ID reader 47 can read the ID mark 113 formed on the outer peripheral surface (or the back surface) of the semiconductor wafer 11. That is, when the ID mark 113 is formed on the surface of the 8-inch semiconductor wafer, the ID mark 113 is formed on the surface of the 12-inch semiconductor wafer by reading with the 8-inch semiconductor wafer reader 471a of the front-side reading reader 471. If it is read, it is read by the reader 471b for 12-inch semiconductor wafer of the reader 471 for reading on the front side. On the other hand, when the ID mark 113 is formed on the back surface of the 8-inch semiconductor wafer, the ID mark 113 is formed on the back surface of the 12-inch semiconductor wafer by reading by the 8-inch semiconductor wafer reader 472a of the back-side reader 472. If it is read, it is read by the reader 472b for 12 inch semiconductor wafer of the reader 472 for reading on the front side. The reading of the ID mark 113 by the ID reader 47 may be performed when the semiconductor wafer 11 is rotated to a state where the crystal orientation is aligned. The ID reader 47 that has read the ID mark 113 in this way sends the read ID mark information to a control means (not shown). And the ID mark information sent to the control means which is not illustrated is utilized for the cutting work mentioned later.

  As described above, when the alignment of the crystal orientation of the semiconductor wafer 11 and the reading of the ID mark 113 are performed, the center table 42 is rotated 90 degrees to release the suction holding of the semiconductor wafer 11. Then, the semiconductor wafer 11 is sucked and held on the hand 51 of the workpiece carry-in / out mechanism 5. Next, the workpiece carry-in / out mechanism 5 is operated to move the hand 51 in the direction indicated by the arrow Y2, and the hand 51 holding the semiconductor wafer 11 is above the workpiece placement area 6a shown in FIG. Position it at the unloading position. Then, the suction holding of the semiconductor wafer 11 by the hand 51 is released. During this time, the pad moving means 93 of the workpiece transport mechanism 9 is operated to position the Bernoulli pad 91 above the workpiece placement area 6a. As a result, the semiconductor wafer 11 supported on the hand 51 positioned at the unloading position is positioned below the Bernoulli pad 91 positioned in the workpiece placement region 6a. Next, the air cylinder 921 of the workpiece conveyance mechanism 9 is operated to lower the Bernoulli pad 91 to a position where it contacts the semiconductor wafer 11. A negative pressure is generated by operating air supply means (not shown) to flow out air along the inner surface of the pad 911, and the semiconductor wafer 11 is sucked and held by this negative pressure. If the semiconductor wafer 11 is sucked and held by the Bernoulli pad 91, the workpiece carry-in / out mechanism 5 is operated to move the hand 51 in the direction indicated by the arrow Y2, and the hand 51 is retracted in which the cleaning mechanism 8 is disposed. Position to position. Next, the air cylinder 921 of the workpiece transport mechanism 9 is operated to lower the Bernoulli pad 91 that sucks and holds the semiconductor wafer 11, and the semiconductor wafer 11 is positioned in the workpiece placement area 6a. Place on the chuck table 63 of the mechanism 6. Then, the suction and holding of the semiconductor wafer 11 by the Bernoulli pad 91 is released and the suction control means (not shown) is operated to suck and hold the semiconductor wafer 11 on the chuck table 63.

  If the semiconductor wafer 11 is sucked and held on the chuck table 63, the chuck table 63 is moved in the direction of arrow X, and the first spindle unit 76a and the second spindle unit 76b are mounted as shown in FIG. The first base 73a and the second base 73b to which the first suspension bracket 74a and the second suspension bracket 74b are attached are moved in the arrow Y direction, and the semiconductor wafer 11 on the chuck table 63 is moved to the first imaging means. 77a and the second imaging means 77b. Then, the surface of the semiconductor wafer 11 is imaged by the first imaging means 77a and the second imaging means 77b, and at least one of the streets formed on the surface of the semiconductor wafer 11 is detected and detected. The alignment of the first street with the first cutting blade 763a and the second cutting blade 763b in the arrow Y direction is performed. At this time, in the illustrated embodiment, the positions of the first base portion 73a and the second base portion 73b in the direction of the arrow Y are precisely controlled based on the measurement value by one linear scale 78 disposed on the support base 71. Is done. In the illustrated embodiment, since the first base 73a and the second base 73b are shared by one linear scale, the control in the arrow Y direction is performed on the same scale. The accuracy is improved compared to the case where scales are provided individually.

  Thereafter, the first suspension bracket 74a and the second suspension bracket 74b supporting the first spindle unit 76a and the second spindle unit 76b are lowered to the cutting position, and the chuck table 63 holding the semiconductor wafer 11 by suction is cut. By moving to the machining area 6b in the direction of arrow X, which is the feed direction, the first cutting blade 763a and the second cutting blade 763b that rotate at high speed receive the action detected along the street as described above. Thus, a cutting groove having a predetermined depth is formed. In this way, the first base portion 73a and the second base portion 73b to which the first suspension bracket 74a and the second suspension bracket 74b to which the first spindle unit 76a and the second spindle unit 76b are attached are attached. By repeatedly performing indexing movement in the direction of arrow Y and cutting feed in the direction of arrow X of the chuck table 63 that holds the semiconductor wafer 11 by suction, the street 11a formed in the first direction formed in the semiconductor wafer 11 (FIG. 2), a cutting groove having a predetermined depth is formed. When a cutting groove having a predetermined depth is formed along the street 11a formed in the first direction formed on the semiconductor wafer 11, the suction chuck 63 holding the semiconductor wafer 11 by suction is rotated by 90 degrees. By performing the same cutting operation as described above, a cutting groove having a predetermined depth is formed along the street 11b (see FIG. 2) formed in the second direction formed in the semiconductor wafer 11.

  When the cutting operation is completed as described above, the chuck table 63 positioned in the processing region 6b shown in FIG. 1 is moved to the workpiece placement region 6a, and the suction holding of the semiconductor wafer 11 is released. Then, the workpiece conveyance mechanism 9 is operated, the semiconductor wafer 11 is sucked and held by the Bernoulli pad 91, and is conveyed onto the spinner table 81 of the cleaning mechanism 8. During this time, the hand 51 of the workpiece carry-in / out mechanism 5 is positioned at the carry-out position above the workpiece placement region 6a. The processed semiconductor wafer 11 conveyed on the spinner table 81 is cleaned and dried here. When the semiconductor wafer 11 is cleaned and dried in this way, the workpiece transport mechanism 9 is operated to suck and hold the semiconductor wafer 11 by the Bernoulli pad 91, and the unloading above the workpiece placement area 6a. It is positioned above the hand 51 of the workpiece loading / unloading mechanism 5 positioned at the position. Then, the Bernoulli pad 91 is lowered to place the semiconductor wafer 11 on the hand 51, the suction and holding of the semiconductor wafer 11 by the Bernoulli pad 91 is released, and the semiconductor wafer 11 is sucked and held on the upper surface of the hand 51. Next, the workpiece carrying-in / out mechanism 5 is operated, and the processed semiconductor wafer 11 held by the hand 51 is stored in a predetermined storage chamber of the cassette 10.

  As mentioned above, although this invention was demonstrated based on embodiment of illustration, this invention is not limited only to embodiment. That is, in the illustrated embodiment, an example in which the present invention is applied to a cutting apparatus having two cutting mechanisms has been shown. However, the present invention is applied to a cutting apparatus having one commonly used cutting mechanism. However, the same effect is obtained.

The perspective view of the cutting device which is a processing apparatus comprised according to this invention. Explanatory drawing which shows the 1st operation state of the cassette mounting mechanism with which the cutting apparatus shown in FIG. 1 is equipped. Explanatory drawing which shows the 2nd operation state of the cassette mounting mechanism with which the cutting apparatus shown in FIG. 1 is equipped. The perspective view of the ID mark reading mechanism with which the cutting apparatus shown in FIG. 1 is equipped. FIG. 3 is a cross-sectional view of a main part of the ID mark reading mechanism shown in FIG. 2. Explanatory drawing which simplifies and shows the 1st spindle unit and the 2nd spindle unit which comprise the cutting apparatus shown in FIG.

Explanation of symbols

2: Stationary base 3: Cassette mounting mechanism 31: Guide rail 32: Cassette mounting table 33: Driving means 4: ID mark reading mechanism 41: Housing 42: Center table 43: Pulse motor 44: Center alignment members 441, 442 : Arc surface (Position restriction part)
45: Air cylinder 46: Semiconductor wafer crystal orientation detection means 5: Workpiece carry-in / out mechanism 51: Hand 52: Hand support member 53: Hand moving means 6: Chuck table mechanism 61: Support base 62: Guide rail 63: Chuck table 64: chuck table moving means 7: cutting mechanism 71: support base 711: guide rail 73a: first base 73b: second base 74a: first suspension bracket 74b: second suspension bracket 75a: pulse motor 75b: Pulse motor 76a: first spindle unit 76b: second spindle unit 77a: first optical means 77b: second optical means 78: linear scale 8: cleaning mechanism 81: spinner table 9: workpiece conveying mechanism 91 : Bernoulli pad 92: Pad support member 93: Pa De moving means 10: Cassette 11: semiconductor wafer

Claims (3)

A cassette mounting mechanism having a cassette mounting table for mounting a cassette containing a single semiconductor wafer, and a semiconductor wafer stored in the cassette mounted on the cassette mounting table, and a semiconductor wafer in the cassette A workpiece carry-in / out mechanism for carrying in the workpiece, a workpiece carrying mechanism for carrying the semiconductor wafer carried out by the workpiece carry-in / out mechanism, and a chuck for holding the semiconductor wafer carried by the workpiece carrying mechanism In a semiconductor wafer processing apparatus comprising: a chuck table mechanism having a table; and a processing mechanism for processing a semiconductor wafer held on the chuck table.
A center table on which a semiconductor wafer is mounted and configured to be rotatable, a center alignment member that acts on the outer peripheral surface of the semiconductor wafer, and a crystal orientation provided on the outer periphery of the semiconductor wafer mounted on the center table. An ID mark reading mechanism including a semiconductor wafer crystal orientation detecting means for detecting a mark to be displayed and an ID reader for reading an ID mark formed on the outer periphery of the front or back surface of the semiconductor wafer is provided below the cassette mounting table. is disposed,
The cassette mounting mechanism includes a first loading / unloading position in which the cassette mounted on the cassette loading table is located in a loading / unloading area of the workpiece loading / unloading mechanism, and the ID mark reading mechanism is the workpiece An apparatus for processing a semiconductor wafer, comprising elevating means positioned at a second workpiece loading / unloading position located in a loading / unloading area of the workpiece loading / unloading mechanism.   The semiconductor wafer processing apparatus according to claim 1, wherein the center alignment member includes a plurality of position restricting portions corresponding to the size of the semiconductor wafer. The chuck table mechanism includes a chuck table moving means for moving the chuck table between a workpiece placement area and a machining area.
The workpiece carry-in / out mechanism includes a hand for holding the semiconductor wafer on the upper surface, the cassette placed on the cassette placing table, the entry position for entering the ID mark reading mechanism, and the workpiece loading A hand moving means that operates to a carry-out position that is an upper position of the placement area and a retreat position that retreats from the carry-out position;
The workpiece conveying mechanism includes a Bernoulli pad that holds a semiconductor wafer, holds the semiconductor wafer held by the Bernoulli pad and carried out to the unloading position, and holds the held semiconductor wafer on the workpiece. The semiconductor wafer processing apparatus according to claim 1, wherein the semiconductor wafer processing apparatus is transported onto the chuck table positioned in the mounting area.

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