JP4341432B2 - 研磨装置および研磨加工方法 - Google Patents
研磨装置および研磨加工方法 Download PDFInfo
- Publication number
- JP4341432B2 JP4341432B2 JP2004064248A JP2004064248A JP4341432B2 JP 4341432 B2 JP4341432 B2 JP 4341432B2 JP 2004064248 A JP2004064248 A JP 2004064248A JP 2004064248 A JP2004064248 A JP 2004064248A JP 4341432 B2 JP4341432 B2 JP 4341432B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- injection nozzle
- gas
- polishing liquid
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005498 polishing Methods 0.000 title claims description 223
- 238000003672 processing method Methods 0.000 title 1
- 238000002347 injection Methods 0.000 claims description 96
- 239000007924 injection Substances 0.000 claims description 96
- 239000007788 liquid Substances 0.000 claims description 85
- 239000000463 material Substances 0.000 claims description 38
- 239000005871 repellent Substances 0.000 claims description 30
- 239000007921 spray Substances 0.000 claims description 12
- 229910001220 stainless steel Inorganic materials 0.000 claims description 5
- 239000010935 stainless steel Substances 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 3
- 239000007789 gas Substances 0.000 description 20
- 230000003287 optical effect Effects 0.000 description 18
- 238000010586 diagram Methods 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 238000007517 polishing process Methods 0.000 description 9
- 239000012530 fluid Substances 0.000 description 6
- 238000005507 spraying Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000005286 illumination Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 230000002940 repellent Effects 0.000 description 3
- 230000000087 stabilizing effect Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 150000003377 silicon compounds Chemical class 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910001374 Invar Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Images
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
[発明の実施の形態1]
[発明の実施の形態2]
[発明の実施の形態3]
[発明の実施の形態4]
1a 外筒
1b 内筒
1c 基材
1d 圧送路
1e 下端部
1f 内壁面
1g 外壁面
1h 撥水表面部
2 気体
3 研磨液
4 研磨対象物
5、6 液滴
7 気泡
8 駆動装置
9 中心軸
10 研磨装置
11 研磨液槽
30 露光装置
Claims (7)
- 研磨液槽内の研磨液に研磨対象物を浸し、前記研磨液に噴射ノズルの先端が浸漬された状態で当該噴射ノズルから前記研磨対象物の表面に気体を噴射することによって前記表面の研磨加工を行う研磨装置であって、
前記噴射ノズル全体は、撥水性の材質で形成されていることを特徴とする研磨装置。 - 研磨液槽内の研磨液に研磨対象物を浸し、前記研磨液に噴射ノズルの先端が浸漬された状態で当該噴射ノズルから前記研磨対象物の表面に気体を噴射することによって前記表面の研磨加工を行う研磨装置であって、
前記噴射ノズルの外壁側又は内壁側は撥水性の材質で形成されていることを特徴とする研磨装置。 - 前記撥水性の材質はフッ素樹脂であることを特徴とする請求項1又は請求項2に記載の研磨装置。
- 研磨液槽内の研磨液に研磨対象物を浸し、前記研磨液に噴射ノズルの先端が浸漬された状態で当該噴射ノズルから前記研磨対象物の表面に気体を噴射することによって前記表面の研磨加工を行う研磨装置であって、
前記噴射ノズルの外壁又は内壁に、撥水性の材質をコートしたことを特徴とする研磨装置。 - 前記噴射ノズルの基材の材質はステンレス鋼、前記撥水性の材質はフッ素樹脂であることを特徴とする請求項4に記載の研磨装置。
- 前記噴射ノズルをその中心軸を中心として回転駆動させる駆動装置を設けたことを特徴とする請求項1乃至請求項5のいずれか一つに記載の研磨装置。
- 請求項1乃至請求項6のいずれか一つに記載の研磨装置を用いて前記研磨対象物の研磨加工を行うことを特徴とする研磨加工方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004064248A JP4341432B2 (ja) | 2004-03-08 | 2004-03-08 | 研磨装置および研磨加工方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004064248A JP4341432B2 (ja) | 2004-03-08 | 2004-03-08 | 研磨装置および研磨加工方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005246588A JP2005246588A (ja) | 2005-09-15 |
JP4341432B2 true JP4341432B2 (ja) | 2009-10-07 |
Family
ID=35027558
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004064248A Expired - Lifetime JP4341432B2 (ja) | 2004-03-08 | 2004-03-08 | 研磨装置および研磨加工方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4341432B2 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007260818A (ja) * | 2006-03-28 | 2007-10-11 | Topcon Corp | 研磨方法及び研磨工具 |
TW201102765A (en) | 2009-07-01 | 2011-01-16 | Nikon Corp | Grinding device, grinding method, exposure device and production method of a device |
JP6749287B2 (ja) * | 2017-06-26 | 2020-09-02 | 株式会社東芝 | 処理システム |
-
2004
- 2004-03-08 JP JP2004064248A patent/JP4341432B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2005246588A (ja) | 2005-09-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US9343339B2 (en) | Coating method and coating apparatus | |
CN1635949A (zh) | 用于微涂布多种流体材料的装置 | |
KR101956913B1 (ko) | 유체 노즐 | |
US6294020B1 (en) | Device for applying photoresist to a base body surface | |
JP4341432B2 (ja) | 研磨装置および研磨加工方法 | |
KR100283443B1 (ko) | 현상장치및현상방법 | |
JP2009262058A (ja) | 液体塗布装置および液体塗布方法 | |
JP2005096067A (ja) | 曲面加工方法及びその装置 | |
US7893386B2 (en) | Laser micromachining and methods of same | |
JP6028910B2 (ja) | ノズルチップ | |
JPH08216415A (ja) | 液体噴射用ノズルの微細機械的加工方法 | |
JP2008149223A (ja) | 塗布装置 | |
KR101019028B1 (ko) | 웨이퍼의 표면 평활 방법 및 그 장치 | |
CN102310029B (zh) | 气压旋转式圆形工作件表面薄膜涂布设备 | |
JP2009178697A (ja) | コーティング装置 | |
JP2005246590A (ja) | 噴射ノズル、研磨装置、研磨方法、光学素子及び露光装置 | |
JP4353681B2 (ja) | 塗工用ダイヘッド | |
US6613237B2 (en) | Apparatus and method for removing matter on a fluid surface of a tank | |
JP5127127B2 (ja) | 塗膜形成方法 | |
JP2018143966A (ja) | 成膜装置 | |
JP2007001003A (ja) | 基板の製造方法 | |
JP4352084B2 (ja) | 現像装置 | |
JP2008029917A (ja) | 機能性材料塗布装置、及び機能性材料塗布方法 | |
JPH06122204A (ja) | インクジェット記録ヘッドおよびその撥水処理方法 | |
JP2005246589A (ja) | 研磨装置、研磨方法、光学素子、及び露光装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20070201 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20080814 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20080819 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20081016 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20090616 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20090629 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120717 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4341432 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20150717 Year of fee payment: 6 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20150717 Year of fee payment: 6 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20150717 Year of fee payment: 6 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
EXPY | Cancellation because of completion of term |