JP4338191B2 - 蛍光シリカガラス - Google Patents
蛍光シリカガラス Download PDFInfo
- Publication number
- JP4338191B2 JP4338191B2 JP2003430709A JP2003430709A JP4338191B2 JP 4338191 B2 JP4338191 B2 JP 4338191B2 JP 2003430709 A JP2003430709 A JP 2003430709A JP 2003430709 A JP2003430709 A JP 2003430709A JP 4338191 B2 JP4338191 B2 JP 4338191B2
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- JP
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- Prior art keywords
- silica glass
- ultraviolet light
- less
- wavelength
- copper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 74
- 239000010949 copper Substances 0.000 claims description 30
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 23
- 229910052802 copper Inorganic materials 0.000 claims description 23
- 238000002834 transmittance Methods 0.000 claims description 19
- 229910052724 xenon Inorganic materials 0.000 claims description 19
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims description 19
- 238000001514 detection method Methods 0.000 claims description 16
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 14
- 238000006243 chemical reaction Methods 0.000 claims description 6
- 238000005286 illumination Methods 0.000 claims description 4
- 230000005284 excitation Effects 0.000 description 11
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- YDRFJPRPCBJKCM-UHFFFAOYSA-L dichlorocopper ethanol Chemical compound C(C)O.[Cu](Cl)Cl YDRFJPRPCBJKCM-UHFFFAOYSA-L 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 4
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000002189 fluorescence spectrum Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 238000000411 transmission spectrum Methods 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- 238000012935 Averaging Methods 0.000 description 1
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000002354 inductively-coupled plasma atomic emission spectroscopy Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
- C03B19/1438—Reactant delivery systems for delivering and depositing additional reactants as liquids or solutions, e.g. solution doping of the article or deposit
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
- C03B2201/075—Hydroxyl ion (OH)
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
- Luminescent Compositions (AREA)
Description
本発明の紫外光検出器は、紫外−可視変換素子として用いられる紫外光検出用蛍光シリカガラスと、可視光照度計と、を含む紫外光検出器であって、前記紫外光検出用蛍光シリカガラスが本発明の紫外光検出用蛍光シリカガラスであることを特徴とする。前記紫外光が、キセノンエキシマランプが発する波長172nm光であることが好適である。
高純度四塩化ケイ素を加熱気化してArキャリアーガスと共に酸水素火炎中に流し、加水分解反応により生じるシリカ微粒子を石英ガラス製ターゲット上に堆積し、堆積の進行と共にターゲットを引き上げて鉛直方向にシリカ微粒子の堆積を進めるVAD法により、直径150mm長さ200mmのシリカ微粒子堆積体を作成した。これを、石英ガラス炉芯管を持つ縦型加熱炉内に設置し、He気流中1200℃で10時間加熱してシリカ微粒子焼結体を得た。
2)OH基濃度:Nicolet製FT−IR AVATOR360を用いて、2.7μmの吸収強度から算出。
3)真空紫外域透過率:日本分光製真空紫外域透過率計VUV−200を用いて測定。
4)254nm光励起における蛍光測定:日立製蛍光分光光度計F4500を用いて測定。
[蛍光強度の変化率]=[10時間照射後の蛍光強度]/[1000時間照射後の蛍光強度]
として求めた。これらの結果を表1及び図3に示した。
塩化銅(II)エタノール溶液のCuイオン濃度を50mg/Lとした以外は実施例1と同様の方法で、直径60mm長さ80mmの銅ドープシリカガラスを得た。得られた銅ドープシリカガラスについて実施例1と同様の測定を行った。
塩化銅(II)エタノール溶液のCuイオン濃度を5mg/Lとした以外は実施例1と同様の方法で、直径60mm長さ80mmの銅ドープシリカガラスを得た。得られた銅ドープシリカガラスについて実施例1と同様の測定を行った。
塩化銅(II)エタノール溶液のCuイオン濃度を100mg/Lとした以外は実施例1と同様の方法で、直径60mm長さ80mmの銅ドープシリカガラスを得た。得られた銅ドープシリカガラスについて実施例1と同様の測定を行った。
塩化銅エタノール溶液のCuイオン濃度を0.1mg/Lとした以外は実施例1と同様の方法で、直径60mm長さ80mmの銅ドープシリカガラスを得た。得られた銅ドープシリカガラスについて実施例1と同様の測定を行った。
塩化銅エタノール溶液のCuイオン濃度を500mg/Lとした以外は実施例1と同様の方法で、直径60mm長さ80mmの銅ドープシリカガラスを得た。得られた銅ドープシリカガラスについて実施例1と同様の測定を行った。
Claims (5)
- 紫外光検出器において、紫外−可視変換素子として用いられる紫外光検出用蛍光シリカガラスであって、
銅濃度が1ppm以上400ppm以下、OH基濃度が1ppm以上500ppm以下であり、波長150nm以上300nm以下の紫外光の照射により波長500nm以上570nm以下の領域にピークを持つ蛍光を発し、且つ波長150nm以上300nm以下の紫外光の照射光照度と、波長500nm以上570nm以下の領域にピークを持つ蛍光の強度が正の相関を持ち、波長172nm及び波長185nmにおける厚さ2mmでの透過率が1%以下であることを特徴とする紫外光検出用蛍光シリカガラス。 - キセノンエキシマランプを0.5mW/cm2以上100mW/cm2以下の照度で1kJ/cm2以上2kJ/cm2以下の単位面積当たりのエネルギー量を照射してから用いることを特徴とする請求項1記載の紫外光検出用蛍光シリカガラス。
- キセノンエキシマランプを0.5mW/cm2以上100mW/cm2以下の照度で1kJ/cm2以上2kJ/cm2以下の単位面積当たりのエネルギー量を照射した後の蛍光強度と、前記照射に引き続きキセノンエキシマランプを100mW/cm2以下の照度で100kJ/cm2以上照射した後の蛍光強度の変化率が5%以内であることを特徴とする請求項1又は2記載の紫外光検出用蛍光シリカガラス。
- 紫外−可視変換素子として用いられる紫外光検出用蛍光シリカガラスと、
可視光照度計と、
を含む紫外光検出器であって、
前記紫外光検出用蛍光シリカガラスが請求項1〜3のいずれか1項記載の紫外光検出用蛍光シリカガラスであることを特徴とする紫外光検出器。 - 前記紫外光が、キセノンエキシマランプが発する波長172nm光であることを特徴とする請求項4記載の紫外光検出器。
Priority Applications (1)
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JP2003430709A JP4338191B2 (ja) | 2003-12-25 | 2003-12-25 | 蛍光シリカガラス |
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JP2003430709A JP4338191B2 (ja) | 2003-12-25 | 2003-12-25 | 蛍光シリカガラス |
Publications (2)
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JP2005187262A JP2005187262A (ja) | 2005-07-14 |
JP4338191B2 true JP4338191B2 (ja) | 2009-10-07 |
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JP2003430709A Expired - Lifetime JP4338191B2 (ja) | 2003-12-25 | 2003-12-25 | 蛍光シリカガラス |
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Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP5270862B2 (ja) * | 2007-05-15 | 2013-08-21 | 信越石英株式会社 | 銅含有シリカガラス及びその製造方法、並びにそれを用いたキセノンフラッシュランプ |
CZ201265A3 (cs) * | 2012-01-30 | 2013-04-24 | Vysoká skola chemicko - technologická v Praze | Optické luminiscencní sodnohlinitokremicité sklo, dopované ionty Cu+ a Cu2+, urcené pro fotoniku |
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- 2003-12-25 JP JP2003430709A patent/JP4338191B2/ja not_active Expired - Lifetime
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JP2005187262A (ja) | 2005-07-14 |
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