JP4323751B2 - Moving positioning apparatus and exposure apparatus having the same - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a moving positioning apparatus that is used in a semiconductor exposure apparatus, an inspection apparatus, and the like, and positions an exposure original plate, an exposure object, or an inspection object at a predetermined position.
[0002]
[Prior art]
Conventionally, an apparatus called a stepper and an apparatus called a scanner are known as exposure apparatuses used for manufacturing semiconductor elements. The stepper moves the semiconductor wafer on the stage device stepwise under the projection lens, and reduces and projects the pattern image formed on the reticle onto the wafer with the projection lens, and sequentially exposes to multiple locations on a single wafer. It is something to do. The scanner moves the semiconductor wafer on the wafer stage and the reticle on the reticle stage relative to the projection lens, irradiates the exposure light on the slit during the scanning movement, and projects the reticle pattern onto the wafer. The scanner is regarded as the mainstream of the exposure apparatus in terms of performance of resolution and overlay accuracy.
[0003]
FIG. 13 is a perspective view showing an outline of a reticle stage conventionally used in a scanner. The main body of the reticle stage 81 is provided with a static pressure guide (not shown) between the upper surface and the side surface of the reticle surface plate 82, and is supported freely in the Y direction. A reticle is mounted on the reticle stage 81 main body by a reticle chuck (not shown). A corner cube 83 is provided on the reticle stage 81, reflects measurement light from a laser interferometer (not shown), and measures the position of the reticle stage 81 in the Y direction. Further, a mover composed of a magnet is provided on both sides of the reticle stage 81, and a coil stator 84 is attached to the same structure as the stage surface plate 82, and the mover and the coil stator 84 A linear motor using Lorentz force is configured. By these linear motors, the reticle stage 81 is given a driving force in the Y direction. The reticle stage 81 is positioned and controlled with high accuracy by a position control system (not shown).
[0004]
[Problems to be solved by the invention]
  The reticle stage is required to have higher positioning accuracy in order to improve apparatus performance. The conventional stage configuration has the following problems. In a linear motor in which a stator having coils arranged therein and a mover using magnets are combined, it is necessary to sequentially switch coils through which a current flows by moving the stage. At the time of this switching, a slight fluctuation occurs in the thrust of the motor. Due to this thrust fluctuation, a deviation (deviation) from the target value occurs when the stage is scanned, resulting in a deterioration in exposure accuracy.Yes.
[0005]
  The present invention provides a drive source such as a linear motor.UsingEven in such a case, an object is to provide a movable positioning device such as a reticle stage with high positioning accuracy.
[0006]
[Means for Solving the Problems]
  In order to overcome the above-described problems, a moving positioning apparatus according to the present invention includes a surface plate placed on a reference surface, a first moving body that is freely guided in one direction on the surface plate surface, and the first moving body. A second moving body supported to move freely on one moving body in six degrees of freedom; a first drive system that generates a driving force for moving the second moving body in the movement free direction of the second moving body; A second driving system for generating a driving force for moving the first moving body in the direction of free movement of the first moving body; and a driving force for moving the second moving body in the direction of free movement of the first moving body. A third drive system to be generated,The second drive system and the third drive system include a linear motor composed of a stator and a mover, and a stator of the linear motor of the second drive system and a stator of the linear motor of the third drive system, Is the same stator provided on the reference plane,Driving means for moving at least the first moving body of the first driving system in the direction of free movement is provided between the first moving body and the second moving body.
[0007]
  The movement positioning device according to the present invention includes a surface plate placed on a reference surface, a first moving body that is guided to move freely in one direction on the surface plate surface, and an in-plane 3 on the surface plate surface. A second movable body that is guided to move freely in a degree of freedom; a first drive system that generates a driving force for moving the second movable body in a direction of freedom of movement of the second movable body; and the first movable body A second driving system for generating a driving force for moving the first moving body in the direction of free movement; and a third driving system for generating a driving force for moving the second moving body in the direction of free movement of the first moving body. AndThe second drive system and the third drive system include a linear motor composed of a stator and a mover, and a stator of the linear motor of the second drive system and a stator of the linear motor of the third drive system, Is the same stator provided on the reference plane,Driving means for moving at least the first moving body of the first driving system in the direction of free movement is provided between the first moving body and the second moving body.
[0017]
DETAILED DESCRIPTION OF THE INVENTION
A moving positioning apparatus according to an embodiment of the present invention and an exposure apparatus including the same will be described in detail with reference to the drawings, taking as an example a case where a positioning target is a reticle as an original.
[0018]
(First embodiment)
FIG. 1 is a plan view of a movement positioning device according to a first embodiment of the present invention. FIG. 2 is a three-side view in which only the stage main body is extracted. The coarse movement stage 2 as the first moving body is provided with static pressure guides 4 and 5 between the upper surface and the side surface of the surface plate 1, and the coarse movement stage 2 can freely move only in the Y direction. Supported on top. The static pressure guides 4 and 5 are composed of a porous air blowing portion and a magnet pressurizing portion, and have very high rigidity. The fine movement stage 3 as the second moving body is elastically supported by three air springs 6 with respect to the coarse movement stage 2. The air spring 6 is designed to have a very small rigidity, and the fine movement stage 3 is in the X direction, the Y direction, and the Z direction with respect to the coarse movement stage 2, and the ωx direction, ωy in the rotation direction therearound, It is supported with a very low natural frequency in the direction and in the ωz direction. The elastic support system may be other than the air spring 6 or may be a support system using repulsion or suction by a coil spring or a magnet. The very low natural frequency means that the rigidity of the support system is reduced and the vibration of the coarse movement stage 2 is not transmitted to the fine movement stage 3, that is, a vibration isolation system is configured.
[0019]
The coarse movement stage 2 is provided with a coarse movement stage measurement corner cube 10 for a laser interferometer, which reflects laser light from a laser interferometer measurement reference (not shown) and displaces the coarse movement stage 2 from the measurement reference in the Y direction. Is measured. The fine movement stage 3 is similarly provided with two fine movement Y measurement corner cubes 11a and 11b for measuring the position in the Y direction. From these two measured values in the Y direction, the attachment positions of the fine movement Y measurement corner cubes 11a and 11b, and the gravity center coordinates of the fine movement stage 3, the displacement of the fine movement stage center of gravity position in the Y direction and the ωz direction is measured. Further, the fine movement stage 3 is provided with an X measurement reflecting mirror 15 that horizontally reflects the laser light irradiated from the Y direction at an angle of 45 degrees. Laser light from an X laser interferometer (not shown) is reflected in the X direction by the X measurement reflecting mirror 15, and the position is measured by the laser interferometer by a fixed X measurement reference mirror 16 provided outside. From the interferometer measurement value, the position of the X measurement reflecting mirror 15, the fine movement stage barycentric coordinates, and the Y movement of the fine movement stage barycentric position, the displacement of the fine movement stage barycentric position in the X direction is measured.
[0020]
FIG. 3A shows a conceptual diagram of the optical axis of the laser beam. As a measurement value of the X direction interferometer 17, the sum of the positions of the fine movement stage 3 in the X direction and the Y direction is measured. That is, the Y direction displacement measurement value may be subtracted from the X direction displacement measurement value. Actually, the value of the displacement in the ωz direction is also used to calculate the displacement in the X direction at the center of gravity. The fine movement stage 3 is provided with Z measurement reflecting mirrors 20a, 20b, and 20c having the same configuration as the X measurement reflecting mirror 15. The laser light coming from the Y direction is once reflected in the Z direction by these three reflecting mirrors 20a to 20c, and is applied to a fixed Z measuring reference mirror 21 provided above the reticle stage including the coarse moving stage 2 and the fine moving stage 3. Reflected. With these three laser interferometer configurations, measurement at three different points of the fine movement stage 3 is performed. From these measured values, the position of the Z measurement reflecting mirror 20, the fine movement stage barycentric coordinates, and the Y direction displacement of the fine movement stage barycentric position, the Z direction and ωx, ωy direction displacements of the fine movement stage barycentric position are measured.
[0021]
FIG. 3B shows a conceptual diagram of Z-direction displacement measurement. That is, the position of the center of gravity of the fine movement stage 3 is determined by the six interferometers 12a, 12b, 17, 22a, 22b, and 22c shown in FIG. 3A in the X direction, the Y direction, the Z direction, the ωx direction, and the ωy. A displacement of 6 degrees of freedom in the direction and ωz direction is measured. This measurement method is not limited to this. For example, it is possible to have one Z measurement reflector and one Z direction measurement. Instead, in the Y direction measurement, two laser interferometers can be configured in the Z direction, and the displacement in the ωx direction can be measured from the difference. Similarly, in the X direction measurement, two laser interferometers can be configured in the Z direction, and the displacement in the ωy direction can be measured from the difference therebetween. The Z-direction, ωx-direction, and ωy-direction displacements of the fine movement stage barycentric position may be calculated from these Z-direction, ωx-direction, and ωy-direction measured values.
[0022]
FIG. 4 is a conceptual diagram in which the X direction measurement interferometer is configured on the fine movement stage. In this case, the X-direction interferometer 17 can directly measure the X-direction displacement, and there is no need to subtract the Y-direction displacement. The configuration shown in FIG. 4 may be used in consideration of the size and mass of fine movement stage 3. Similarly, interferometers 22 a to 22 c that measure the Z direction can also be configured on fine movement stage 3.
[0023]
For the Z-direction displacement, a proximity position sensor such as a capacitance sensor may be used instead of the laser interferometer. FIG. 5 is a conceptual diagram when a proximity position sensor is used. In this figure, static pressure guidance and the like are omitted. The three proximity position sensors 24 are provided at positions other than on the same straight line. That is, the attachment locations of the three proximity position sensors 24 form a triangle when viewed from the Z information. These proximity position sensors 24 measure the position in the Z direction with respect to the upper surface of the surface plate 1 through the hole of the coarse movement stage 2. In the case of the configuration shown in FIG. 5, it is conceivable that the surface plate 1 is subjected to a change in the position where the load is applied due to the movement of the reticle stage, and the upper plate surface 1a changes slightly. Since the deformation of the upper board surface 1a has a strong correlation with the stage position, it is possible to correct the sensor value measured based on the stage position.
[0024]
FIG. 6 is a diagram for explaining a method of eliminating the deformation of the target surface of the proximity position sensor due to the stage movement. The target of the proximity position sensor 24 is not the surface plate 1 but the Z measurement reference plane 25 of the structure provided above the stage. According to this configuration, since the Z measurement reference surface 25 is not deformed by the stage movement, the accuracy of Z direction measurement is improved.
[0025]
On both sides of the reticle stage, a coarse motion linear motor stator 27b in which coils are arranged is configured. These coarse motion linear motor stators 27b are fixed on the same structure to which the surface plate 1 is attached. The coarse motion stage 2 is provided with a mover 27a made of a magnet, and is paired with a coarse motion linear motor stator 27b to constitute a coarse motion linear motor. By passing a predetermined current through the coil of the coarse motion linear motor, the linear motor generates thrust in the Y direction, and the coarse motion stage 2 is driven in the Y direction. It is desirable that the Z-direction position of the center line (force line) on which the thrust of the coarse motion linear motor acts matches the Z-direction center of gravity position of the coarse motion stage 2 as much as possible. This is because when the force line and the center of gravity do not match, a pitching moment in the ωx direction is generated when the driving force is generated. In the case of the coarse movement stage 2, even if some pitching occurs, the positioning accuracy is not affected. However, since this vibration can cause disturbance in the measurement system, it is desirable to suppress the pitching as much as possible. The coarse movement stage 2 is configured with a coarse movement stage position control system, and feedback control is performed using the displacement of the coarse movement stage in the Y direction so that the coarse movement stage is positioned and controlled with high accuracy.
[0026]
Between the coarse movement stage 2 and the fine movement stage 3, two X-direction fine movement linear motors XLM1, XLM2, two Y-direction fine movement linear motors YLM1, YLM2, and four Z-direction fine movement linear motors ZLM1-ZLM4 are provided. As a result, a single-phase coil fine-motion linear motor is configured. These single-phase coil linear motors are paired with one coil and a magnet unit. The movable range is small, but there is no need to switch coils, so there is almost no fluctuation in thrust. When this single-phase coil linear motor is used, positioning control can be performed with higher accuracy than a coarse motion linear motor in which coils are arranged. In the XY plane, driving forces in the X direction, the Y direction, and the ωz direction can be generated by force distribution of two linear motors in the X direction and two in the Y direction. With respect to the Z direction, driving force can be generated in the Z direction, the ωx direction, and the ωy direction by four Z single-phase linear motors. Here, because of the ease of designing the center of gravity, as a result of arranging these single-phase linear motors symmetrically, redundancy appears in the driving direction. However, the arrangement of this single-phase linear motor is not limited to this, and the fine movement stage 3 is driven with respect to the coarse movement stage 2 in six degrees of freedom in the X direction, Y direction, Z direction, ωx direction, ωy direction, and ωz direction. It only needs to be able to generate power.
[0027]
In addition, it is desirable that the Z-direction position of the force line of the fine movement linear motor in the X direction and the Y direction is matched to the Z-direction gravity center position of the fine movement stage 3 as much as possible. When the line of force and the center of gravity do not match, when a driving force is generated in the X direction and the Y direction, pitching in the ωx direction, ωy direction, and rolling moment are generated. These moments cause deterioration in positioning accuracy of the fine movement stage 3 in the ωx direction and the ωy direction. A command to cancel these moments can be given to the Z fine movement linear motor based on the amount of displacement between the force line and the center of gravity position. However, since such correction causes an error, a design that combines the force line and the center of gravity is performed. Is desirable. These eight single-phase linear motors are connected to the fine movement stage control system, and the fine movement stage 3 is positioned and controlled with high accuracy by the above-described 6-degree-of-freedom position measurement system of the fine movement stage 3. Further, the fine movement stage 3 is provided with an acceleration / deceleration movable element 28a made of a magnet, and an acceleration / deceleration linear motor is configured with the coarse movement linear motor stator 27b described above. It is desirable that the Z-direction position of the force line of the acceleration / deceleration linear motor is matched with the Z-direction gravity center position of fine movement stage 3 as much as possible. This is because, as in the case of the Z fine movement linear motor, the displacement between the force line and the center of gravity generates a pitching moment.
[0028]
FIG. 7 shows a conceptual diagram of the control system of the reticle stage. A fine movement stage target position and a coarse movement stage target position are respectively sent to the fine movement stage control system (b) and the coarse movement stage control system (a). Since the coarse movement stage 2 and the fine movement stage 3 are always driven in the same manner, their target positions are relatively the same. Similarly, the target acceleration is the same. In the coarse movement stage control system (a), the coarse movement of the coarse movement stage system 33 is appropriately multiplied by a gain by the feedback compensator 32 based on the difference (deviation) between the coarse movement stage target position and the aforementioned displacement in the Y direction in the coarse movement stage. A command is sent to the linear motor. With only this feedback control system, the deviation during acceleration / deceleration becomes large. Therefore, a feedforward compensator 31 is provided which feeds a coarse motion stage acceleration / deceleration force, which is a value obtained by multiplying the target acceleration by the coarse motion stage mass, to the coarse motion linear motor. By this feedforward, the deviation at the time of acceleration / deceleration can be reduced. Each fine movement stage target position in the six degrees of freedom direction of the X direction, Y direction, Z direction, ωx direction, ωy direction, and ωz direction is sent to the fine movement stage control system (b). These target positions are values at the position of the center of gravity of fine movement stage 3. The difference between the 6-degree-of-freedom displacement measurement value of fine movement stage 3 and the fine movement stage target position (fine movement stage 6-degree-of-freedom displacement deviation) is calculated by feedback compensator 37. The fine movement stage 6 degree-of-freedom displacement measurement value is also a value at the true true position of the fine movement stage 3. Fine-movement stage 6-degree-of-freedom displacement deviation is appropriately multiplied by a gain to calculate a 6-degree-of-freedom direction control force. This control force means a force to be applied to the center of gravity of fine movement stage 3. The six degrees of freedom direction control force is appropriately distributed to the above-described fine movement linear motor of the fine movement stage system 38 from each mounting position and thrust direction, and a command is sent. The feedforward compensator 36 sends a fine movement stage acceleration / deceleration force command, which is a value obtained by multiplying the fine movement stage target acceleration by the fine movement stage mass, to the acceleration / deceleration linear motor. That is, the acceleration / deceleration force required when driving the stage is generated by the acceleration / deceleration linear motor, and this acceleration / deceleration force is not required for the fine-motion linear motor. Therefore, the force required for the fine movement linear motor is only that required for minute positioning, can be configured in a small shape, and generates very little heat.
[0029]
  As shown in FIG. 8, the pipe 41 of the vacuum reticle chuck provided on the fine movement stage 3 is once received by the coarse movement stage 2 and then sent to the outside. Since the fine movement stage 3 and the coarse movement stage 2 hardly move relatively, disturbance due to the spring property of the pipe 41 does not occur during this period. Although a disturbance of resistance force due to the spring property of the pipe 41 occurs in the coarse movement stage 2, there is no problem because the coarse movement stage 2 itself does not require super-precision positioning. Similarly to the pipe 41, when it is necessary to connect an electric wire or the like from the outside to the fine movement stage 3, the electric wire 42 is temporarily received by the coarse movement stage 2.
  As described above, the coarse motion stage and the fine motion stage are separated and driven in the main direction (Y direction), and at least the main direction drive actuator for each direction fine drive of the fine motion stage is the coarse motion stage. Since it is positioned between the fine movement stage, the final positioning can be performed by a fine drive actuator such as a single-phase fine movement linear motor. Therefore, the positioning is more accurate than when using a conventional multiphase linear motor. Can be done. In addition, the structure is configured so as to have coarse and fine movements, and once the pipe and wiring to the fine movement stage system are received by the coarse movement stage, disturbances from the pipe and wiring are not transmitted to the fine movement stage system.
  With the configuration shown in FIG. 8, when a vacuum suction chuck using negative pressure is used as a chuck for fixing the reticle to the stage, the stage is moved by dragging the piping for this purpose. It was. At this time, the piping has a spring property and becomes a transmission path for disturbance to the positioning control system. In positioning in the nanometer dimension, it becomes possible to solve the problem that the resistance of this pipe also affects the increase in deviation, and even if pipes are made on the stage, these disturbance factors It is possible to reduce the influence of disturbance transmission.
[0030]
(Second Embodiment)
FIG. 9 is a plan view showing a movable positioning apparatus according to the second embodiment of the present invention, and FIG. 10 is a three-side view of the stage portion extracted. When the accuracy of the positioning accuracy of the reticle stage in the Z direction is moderate, the present invention can be used in such a configuration only in the XY plane. As in the first embodiment, the coarse movement stage 2 is supported freely in the Y direction by using a static pressure guide between the upper surface and the side surface of the surface plate 1. Further, the coarse movement stage 2 is similarly measured by a laser interferometer in the Y-direction displacement. On both sides of the reticle stage, a coarse motion linear motor stator 27b in which coils are arranged is configured. These coarse motion linear motor stators 27b are fixed on the same structure to which the surface plate 1 is attached. The coarse motion stage 2 is provided with a mover 27a made of a magnet, and is paired with a coarse motion linear motor stator 27b to constitute a coarse motion linear motor. This coarse motion linear motor generates a thrust in the Y direction by passing a predetermined current through the coil, and the coarse motion stage 2 is driven in the Y direction. The fine movement stage 3 is provided with a static pressure guide 8 only on the bottom surface, and is supported on the surface plate 1 freely in an XY plane. Between the coarse movement stage 2 and the fine movement stage 3, two Y fine movement linear motors YLM1 and YLM2 constituted by single phase linear motors are provided. These fine movement linear motors YLM can drive the fine movement stage 3 in the Y direction. The fine movement stage 3 is provided with an acceleration / deceleration movable element 28a made of a magnet, and an acceleration / deceleration linear motor is constituted with the coarse movement linear motor stator 27b described above. Further, an X fine movement linear motor mover magnet XLMa is formed at the tip of the acceleration / deceleration mover 28a. In the portion of the coarse motion linear motor stator 27b corresponding to this magnet, there is an X fine motion linear motor stator coil XLMb constituted by an elongated coil. These movers and stators constitute an X fine movement linear motor XLM. The fine movement stage 3 can receive a driving force in the X direction by the X fine movement linear motor XLM. Therefore, the fine movement stage 3 can receive a driving force in the X direction, the Y direction, and the ωz direction by the two Y fine movement linear motors YLM1, YLM2 and the X fine movement linear motor XLM. The fine movement stage 3 is provided with two corner cubes 11a and 11b for Y direction measurement and an X measurement reflecting mirror 15, and, as in the first embodiment, the X direction, Y direction, and The displacement in the ωz direction can be measured. The laser interferometer for X measurement may be mounted on the fine movement stage as shown in FIG. The stage control system is basically the same as in the first embodiment. The fine movement stage control system has six degrees of freedom in the first embodiment, but this embodiment is different only in that it is reduced to three degrees of freedom in the X direction, the Y direction, and the ωz direction. The target position with three degrees of freedom is input to the control system as a value around the center of gravity of fine movement stage 3, and a control command with three degrees of freedom is generated inside the control system based on deviation information around the center of gravity. Based on the control command with three degrees of freedom, commands are appropriately given to the two Y fine motion linear motors YLM1, YLM2 and the X fine motion linear motor XLM. Similar to the first embodiment, once the pipe to the fine movement stage 3 is received by the coarse movement stage 2, a configuration in which disturbance due to the spring property of the pipe is not transmitted to the fine movement stage 3 can be achieved.
[0031]
(Third embodiment)
FIG. 11 is a plan view showing a movement positioning apparatus according to the third embodiment. In the reticle stage having the configuration shown in FIG. 1, the reaction force during acceleration / deceleration of the stage is transmitted from the stator to the reference structure. The vibration at this time greatly affects the positioning accuracy of the stage. In the configuration of FIG. 11, a static pressure guide is provided on the bottom surface of the coarse motion linear motor stator 27b, and the coarse motion linear motor stator 27b is supported so that it can freely move in the XY directions on the reference surface. Yes. For this reason, the coarse motion linear motor stator 27b receives a reaction force for the coarse motion stage acceleration / deceleration and the fine motion stage acceleration / deceleration when accelerating / decelerating the reticle stage, and moves on the reference surface in the opposite direction to the stage. To do. At this time, the motion of the coarse motion linear motor stator 27b and the reticle stage system occurs at an inverse ratio of the respective masses. That is, F is the acceleration / deceleration force at a certain time, M is the mass of the coarse motion linear motor stator system (for simplicity, the left and right are considered as one), and the mass of the reticle stage system (coarse motion stage 2 and fine motion stage 3). ) Is m, and each acceleration is α and β, the following relationship holds.
F = Mα = −mβ
[0032]
However, in reality, the above equation does not hold exactly due to the disturbance applied to both. Therefore, if the stage movement is repeated a plurality of times, the relative positional relationship between the two is lost, resulting in a narrow range of movement of the stage. In order to prevent this phenomenon, the coarse motion linear motor stator 27b is provided with corner cubes 13a and 13b for interferometers for Y-direction position measurement. The displacement of the coarse motion linear motor stator 27b in the Y direction is determined by a laser interferometer. measure. Further, the displacement in the X direction of the coarse motion linear motor stator 27b is measured by linear gauges 51, 52, 53, and 54 that are arranged at two positions apart from each other in the X direction. The coarse motion linear motor stator 27b is provided with one Y-direction stator linear motors Yb1 and Yb2 constituting a single-phase linear motor, and two X-direction stator linear motors Xb1, Xb2 and Xb3 and X4b, respectively. A driving force is applied to the reference surface in each direction. A coarse motion linear motor stator control system (not shown) is configured to control the positioning of the coarse motion linear motor stator 27b in the X, Y, and ωz directions by the respective displacement measurement values and the stator linear motor. Has been. The coarse motion linear motor stator control system is always given a constant target value in the X and ωz directions, and a target value synchronized with the stage movement in the Y direction. As a result, the coarse motion linear motor stator 27b and the reticle stage always move in a relative relationship, and the movable range of the stage is not reduced as described above. The reaction forces of the stator linear motors Yb1, Yb2, Xb1, Xb2, Xb3, and Xb4 are transmitted to the reference plane, but these forces only correct slight disturbances, so that the positioning accuracy of the reticle stage is deteriorated. It does not become a vibration of. Here, the position measurement of the coarse motion linear motor stator 27b is shown by a combination of an interferometer and a linear gauge, but other combinations may be used. Any sensor can be used as long as it can measure the position of the coarse motion linear motor stator.
[0033]
(Fourth embodiment)
FIG. 12 is a plan view of the movement positioning device according to the fourth embodiment, and the configuration of the third embodiment shown in FIG. 11 is applied to the second embodiment shown in FIGS. 9 and 10. Is shown. In this moving positioning apparatus shown in FIG. 12, a coarse motion linear motor stator 27b in which coils are arranged on both sides of a reticle stage is configured. A static pressure guide is provided on the bottom surface of the coarse motion linear motor stator 27b, and the coarse motion linear motor stator 27b is supported so that it can freely move in the XY directions on the reference surface. For this reason, the coarse motion linear motor stator 27b receives a reaction force for the coarse motion stage acceleration / deceleration and the fine motion stage acceleration / deceleration when accelerating / decelerating the reticle stage, and moves on the reference surface in the opposite direction to the stage. To do. The coarse movement stage 2 is provided with a mover made of a magnet and is paired with a coarse movement linear motor stator 27b to constitute a coarse movement linear motor. This coarse motion linear motor generates a thrust in the Y direction by passing a predetermined current through the coil, and the coarse motion stage 2 is driven in the Y direction.
[0034]
The coarse motion linear motor stator 27b is provided with corner cubes 13a and 13b for interferometers for Y-direction position measurement, and the displacement in the Y direction of the coarse motion linear motor stator 27b is measured by a laser interferometer. Further, the displacement in the X direction of the coarse motion linear motor stator 27b is measured by linear gauges 51, 52, 53, and 54 that are arranged at two positions apart from each other in the X direction. The coarse motion linear motor stator 27b is provided with one Y-direction stator linear motors Yb1 and Yb2 each being a single-phase linear motor, and two X-direction stator linear motors Xb1, Xb2 and Xb3 and X4b, respectively. Thus, a driving force is applied to the reference surface in each direction. The coarse motion linear motor stator 27b is positioned and controlled in the X direction, the Y direction, and the ωz direction by the respective displacement measurement values and the stator linear motor by a coarse motion linear motor stator control system (not shown). It is configured. The coarse motion linear motor stator control system is always given a constant target value in the X and ωz directions, and a target value synchronized with the stage movement in the Y direction. As a result, the coarse motion linear motor stator 27b and the reticle stage always move in a relative relationship, and the movable range of the stage does not decrease.
[0035]
(Fifth embodiment)
Next, an embodiment of a scanning exposure apparatus in which the moving positioning apparatus of the above-described embodiment is mounted as a reticle stage will be described with reference to FIG.
The lens barrel surface plate 96 is supported from the floor or base 91 via a damper 98. The lens barrel surface plate 96 supports the reticle stage surface plate 94 and also supports the projection optical system 97 positioned between the reticle stage 95 and the wafer stage 93.
[0036]
The wafer stage 93 is supported on a stage surface plate 92 supported from a floor or base 91, and performs positioning by placing the wafer. The reticle stage 95 is supported on a reticle stage surface plate 94 supported by a lens barrel surface plate 96, and is movable by mounting a reticle on which a circuit pattern is formed. Exposure light for exposing the reticle mounted on the reticle stage 95 onto the wafer on the wafer stage 93 is generated from the illumination optical system 99.
[0037]
Wafer stage 93 is scanned in synchronization with reticle stage 95. During scanning of the reticle stage 95 and the wafer stage 93, the positions of the both are continuously detected by the interferometers and fed back to the driving units of the reticle stage 95 and the wafer stage 93, respectively. As a result, both scanning start positions can be accurately synchronized, and the scanning speed of the constant speed scanning region can be controlled with high accuracy. While both are scanning the projection optical system 97, the reticle pattern is exposed on the wafer, and the circuit pattern is transferred.
[0038]
In this embodiment, since the movement positioning apparatus according to the above-described embodiment is used as a reticle stage, high-precision positioning is possible, and high-speed and high-precision exposure is possible.
[0039]
(Embodiment of semiconductor production system)
Next, an example of a production system of a semiconductor device (a semiconductor chip such as an IC or LSI, a liquid crystal panel, a CCD, a thin film magnetic head, a micromachine, etc.) using the apparatus according to the present invention will be described. In this method, maintenance services such as troubleshooting, periodic maintenance, and software provision for manufacturing apparatuses installed in a semiconductor manufacturing factory are performed using a computer network outside the manufacturing factory.
[0040]
FIG. 15 illustrates the entire system cut out from a certain angle. In the figure, reference numeral 101 denotes a business office of a vendor (apparatus supply manufacturer) that provides a semiconductor device manufacturing apparatus. Examples of manufacturing apparatuses include semiconductor manufacturing apparatuses for various processes used in semiconductor manufacturing plants, such as pre-process equipment (lithographic apparatuses such as exposure apparatuses, resist processing apparatuses, etching apparatuses, heat treatment apparatuses, film forming apparatuses, and flattening apparatuses. As well as post-processing equipment (assembly equipment, inspection equipment, etc.). The office 101 includes a host management system 108 that provides a maintenance database for manufacturing apparatuses, a plurality of operation terminal computers 110, and a local area network (LAN) 109 that connects these to construct an intranet or the like. The host management system 108 includes a gateway for connecting the LAN 109 to the Internet 105, which is an external network of the office, and a security function for restricting access from the outside.
[0041]
On the other hand, 102 to 104 are manufacturing factories of semiconductor manufacturers as users of manufacturing apparatuses. The manufacturing factories 102 to 104 may be factories belonging to different manufacturers, or factories belonging to the same manufacturer (for example, a factory for a pre-process, a factory for a post-process, etc.). In each of the factories 102 to 104, a plurality of manufacturing apparatuses 106, a local area network (LAN) 111 that connects them together to construct an intranet, etc., and a host as a monitoring apparatus that monitors the operating status of each manufacturing apparatus 106 A management system 107 is provided. The host management system 107 provided in each factory 102 to 104 includes a gateway for connecting the LAN 111 in each factory to the Internet 105 which is an external network of the factory. As a result, the host management system 108 on the vendor's office 101 side can be accessed from the LAN 111 of each factory via the Internet 105, and access is permitted only to limited users due to the security function of the host management system 108. . Specifically, status information (for example, a symptom of a manufacturing apparatus in which a trouble has occurred) indicating the operating status of each manufacturing apparatus 106 is notified from the factory side to the vendor side via the Internet 105, and the notification is also handled. It is possible to receive response information (for example, information for instructing a coping method for trouble, coping software or data), maintenance information such as the latest software and help information from the vendor side. A communication protocol (TCP / IP) generally used on the Internet is used for data communication between each factory 102 to 104 and the vendor office 101 and data communication on the LAN 111 in each factory. . Instead of using the Internet as an external network outside the factory, it is also possible to use a high-security dedicated line network (such as ISDN) without being accessible from a third party. Further, the host management system is not limited to the one provided by the vendor, and the user may construct a database and place it on the external network, and allow access to the database from a plurality of factories of the user.
[0042]
FIG. 16 is a conceptual diagram showing the overall system of this embodiment cut out from an angle different from that in FIG. In the previous example, a plurality of user factories each equipped with a manufacturing apparatus and a management system of a vendor of the manufacturing apparatus are connected via an external network, and production management of each factory or at least one unit is performed via the external network. Data communication of manufacturing equipment was performed. On the other hand, in this example, a factory equipped with a plurality of vendors' manufacturing devices and a management system of each vendor of the plurality of manufacturing devices are connected by an external network outside the factory, and maintenance information of each manufacturing device is obtained. Data communication. In the figure, reference numeral 201 denotes a manufacturing factory of a manufacturing apparatus user (semiconductor device manufacturer), and a manufacturing apparatus that performs various processes on the manufacturing line of the factory, in this case, an exposure apparatus 202, a resist processing apparatus 203, and a film forming processing apparatus. 204 has been introduced. In FIG. 16, only one manufacturing factory 201 is depicted, but actually, a plurality of factories are similarly networked. Each device in the factory is connected by a LAN 206 to form an intranet, and the host management system 205 manages the operation of the production line.
[0043]
On the other hand, each business office of a vendor (apparatus supply manufacturer) such as the exposure apparatus manufacturer 210, the resist processing apparatus manufacturer 220, and the film formation apparatus manufacturer 230 has host management systems 211, 221 for performing remote maintenance of the supplied devices. 231 and these comprise a maintenance database and an external network gateway as described above. The host management system 205 that manages each device in the user's manufacturing factory and the vendor management systems 211, 221, and 231 of each device are connected by the external network 200, which is the Internet or a dedicated line network. In this system, if a trouble occurs in any one of a series of production equipment on the production line, the operation of the production line is suspended, but remote maintenance via the Internet 200 is received from the vendor of the troubled equipment. Therefore, it is possible to respond quickly and to minimize downtime of the production line.
[0044]
Each manufacturing apparatus installed in the semiconductor manufacturing factory includes a display, a network interface, and a computer that executes network access software stored in a storage device and software for operating the apparatus. The storage device is a built-in memory, a hard disk, or a network file server. The network access software includes a dedicated or general-purpose web browser, and provides, for example, a user interface having a screen as shown in FIG. 17 on the display. The operator who manages the manufacturing apparatus in each factory refers to the screen, and the manufacturing apparatus model 401, serial number 402, trouble subject 403, date of occurrence 404, urgency 405, symptom 406, countermeasure 407, progress 408, etc. Enter the information in the input field on the screen. The input information is transmitted to the maintenance database via the Internet, and appropriate maintenance information as a result is returned from the maintenance database and presented on the display. Further, the user interface provided by the web browser further realizes hyperlink functions 410 to 412 as shown in the figure, and the operator can access more detailed information on each item, or the latest software used for the manufacturing apparatus from the software library provided by the vendor. Version software can be pulled out, and operation guides (help information) for use by factory operators can be pulled out. Here, the maintenance information provided by the maintenance database includes the information related to the present invention described above, and the software library also provides the latest software for realizing the present invention.
[0045]
Next, a semiconductor device manufacturing process using the production system described above will be described. FIG. 18 shows the flow of the entire manufacturing process of the semiconductor device. In step 1 (circuit design), a semiconductor device circuit is designed. In step 2 (mask production), a mask on which the designed circuit pattern is formed is produced. On the other hand, in step 3 (wafer manufacture), a wafer is manufactured using a material such as silicon. Step 4 (wafer process) is called a pre-process, and an actual circuit is formed on the wafer by lithography using the prepared mask and wafer. The next step 5 (assembly) is called a post-process, and is a process for forming a semiconductor chip using the wafer produced in step 4, and is an assembly process (dicing, bonding), packaging process (chip encapsulation), etc. Process. In step 6 (inspection), the semiconductor device manufactured in step 5 undergoes inspections such as an operation confirmation test and a durability test. Through these steps, the semiconductor device is completed and shipped (step 7). The pre-process and post-process are performed in separate dedicated factories, and maintenance is performed for each of these factories by the remote maintenance system described above. In addition, information for production management and apparatus maintenance is communicated between the pre-process factory and the post-process factory via the Internet or a dedicated network.
[0046]
FIG. 19 shows a detailed flow of the wafer process. In step 11 (oxidation), the wafer surface is oxidized. In step 12 (CVD), an insulating film is formed on the wafer surface. In step 13 (electrode formation), an electrode is formed on the wafer by vapor deposition. In step 14 (ion implantation), ions are implanted into the wafer. In step 15 (resist process), a photosensitive agent is applied to the wafer. In step 16 (exposure), the circuit pattern of the mask is printed onto the wafer by exposure using the exposure apparatus described above. In step 17 (development), the exposed wafer is developed. In step 18 (etching), portions other than the developed resist image are removed. In step 19 (resist stripping), unnecessary resist after etching is removed. By repeating these steps, multiple circuit patterns are formed on the wafer. Since the manufacturing equipment used in each process is maintained by the remote maintenance system described above, it is possible to prevent troubles in advance and to recover quickly even if troubles occur. Productivity can be improved.
[0047]
【The invention's effect】
According to the present invention, at least the first moving body of the first driving system has a fine movement positioning driving means in the direction of free movement of the first moving body and the second moving body separately from the second driving system and the third driving system. By being provided in between, there is an effect that a reticle stage with good positioning accuracy can be provided.
[Brief description of the drawings]
FIG. 1 is a plan view showing a moving positioning device according to a first embodiment of the present invention.
FIGS. 2A and 2B are three views showing the main part of the movable positioning device according to the first embodiment of the present invention, wherein FIG. 2A is a plan view, FIG. 2B is a front view, and FIG. .
FIG. 3 is a configuration diagram of a fine movement stage interferometer according to the first embodiment of the present invention.
FIG. 4 is a diagram showing an example of an interferometer for X-direction measurement according to the first embodiment of the present invention.
FIG. 5 is a diagram showing a configuration of a proximity position sensor for Z-direction measurement according to the first embodiment of the present invention.
FIG. 6 is a diagram showing another example of the configuration of the proximity position sensor for Z direction measurement according to the first embodiment of the present invention.
FIG. 7 is a block diagram of a reticle stage control system according to the first embodiment of the present invention.
FIG. 8 is a conceptual diagram of pipe connection according to the first embodiment of the present invention.
FIG. 9 is a plan view showing a movement positioning device according to a second embodiment of the present invention.
FIGS. 10A and 10B are three views of a movable positioning device according to a second embodiment of the present invention, where FIG. 10A is a plan view, FIG. 10B is a front view, and FIG. 10C is a side view.
FIG. 11 is a plan view of a movement positioning device according to a third embodiment of the present invention.
FIG. 12 is a plan view of a movement positioning device according to a fourth embodiment of the present invention.
FIG. 13 is a perspective view showing a configuration of a conventional reticle stage.
FIG. 14 is an elevational view of an exposure apparatus according to a fifth embodiment of the present invention.
FIG. 15 is a conceptual view of a semiconductor device production system using an apparatus according to the present invention as seen from a certain angle.
FIG. 16 is a conceptual view of a semiconductor device production system using the apparatus according to the present invention as seen from another angle.
FIG. 17 is a specific example of a user interface.
FIG. 18 is a diagram illustrating a flow of a device manufacturing process.
FIG. 19 is a diagram illustrating a wafer process.
[Explanation of symbols]
1: surface plate, 2: coarse movement stage (first moving body), 3: fine movement stage (second moving body), 4: static pressure guide (between the upper surface of the surface plate), 5: static pressure guide (constant) 6: air spring, 8: static pressure guide (bottom surface), 10: corner cube (for coarse movement), 11a, 11b: corner cube (for fine movement), 12 (12a, 12b): Y Directional interferometer, 13a, 13b: Corner cube, 15: X measurement reflector, 16: X measurement reference mirror, 17: X direction interferometer, 20 (20a, 20b, 20c): Z measurement reflector, 21: Z measurement Reference mirror, 22 (22a, 22b, 22c): Z direction interferometer, 24: proximity sensor, 25: Z measurement reference plane, 27a: coarse motion linear motor mover, 27b: coarse motion linear motor stator, 28a: Acceleration / deceleration linear motor mover, 31: Feed forward compensation , 32: feedback compensator, 33: coarse motion stage system, 36: feed forward compensator, 37: feedback compensator, 38: fine motion stage system, 41: piping, 42: wires, 51-54: X linear gauge ,
XLM1, XLM2 (movable element a and stator b): X-direction fine movement linear motor, YLM1, YLM2 (movable element a and stator b): Y-direction fine movement linear motor, ZLM1 to ZLM4 (movable element a and stator b) : Z-direction fine movement linear motor, Xb1 to Xb4: Stator X linear motor, Yb1, Yb2: Stator Y linear motor.

Claims (5)

A surface plate placed on a reference surface;
A first moving body guided to move freely in one direction on the surface plate surface;
A second moving body supported on the first moving body so as to move freely in six degrees of freedom;
A first driving system that generates a driving force for moving the second moving body in a direction of free movement of the second moving body;
A second driving system for generating a driving force for moving the first moving body in the direction of free movement of the first moving body;
A third driving system that generates a driving force for moving the second moving body in the direction of free movement of the first moving body;
The second drive system and the third drive system include a linear motor composed of a stator and a mover,
The stator of the linear motor of the second drive system and the stator of the linear motor of the third drive system are the same stator provided on the reference plane,
A moving positioning apparatus, wherein driving means for moving at least the first moving body of the first driving system in the direction of free movement is provided between the first moving body and the second moving body. A surface plate placed on a reference surface;
A first moving body guided to move freely in one direction on the surface plate surface;
A second moving body that is guided to move freely in three degrees of freedom in a plane on the surface plate surface;
A first driving system that generates a driving force for moving the second moving body in a direction of free movement of the second moving body;
A second driving system for generating a driving force for moving the first moving body in the direction of free movement of the first moving body;
A third driving system that generates a driving force for moving the second moving body in the direction of free movement of the first moving body;
The second drive system and the third drive system include a linear motor composed of a stator and a mover,
The stator of the linear motor of the second drive system and the stator of the linear motor of the third drive system are the same stator provided on the reference plane,
A moving positioning apparatus, wherein driving means for moving at least the first moving body of the first driving system in the direction of free movement is provided between the first moving body and the second moving body.   The movement positioning apparatus according to claim 1, wherein the first drive system uses a single-phase linear motor.   3. The moving positioning device according to claim 1, wherein the second drive system and the third drive system use a multiphase linear motor. A first measuring system for measuring a displacement in the moving direction of the first moving body;
A second measurement system for measuring a displacement in the moving direction of the second moving body;
A first control system for positioning control of the first moving body by the first measurement system and the second drive system;
A second control system for positioning control of the second moving body by the second measurement system and the first drive system;
A third control system for commanding a desired acceleration / deceleration force to the second moving body by the third drive system;
The movement positioning apparatus according to claim 1, wherein the movement positioning apparatus is provided.

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