JP4308326B2 - α−アミノアルケン類に基づく光励起性の窒素含有塩基類 - Google Patents

α−アミノアルケン類に基づく光励起性の窒素含有塩基類 Download PDF

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Publication number
JP4308326B2
JP4308326B2 JP54008698A JP54008698A JP4308326B2 JP 4308326 B2 JP4308326 B2 JP 4308326B2 JP 54008698 A JP54008698 A JP 54008698A JP 54008698 A JP54008698 A JP 54008698A JP 4308326 B2 JP4308326 B2 JP 4308326B2
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JP
Japan
Prior art keywords
alkyl
formula
phenyl
diastereomer
compound
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Expired - Fee Related
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JP54008698A
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English (en)
Japanese (ja)
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JP2001515500A5 (https=
JP2001515500A (ja
Inventor
コールム ターナー，ショーン
ボーダン，ジゼル
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BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paper (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Polyamides (AREA)
JP54008698A 1997-03-18 1998-03-07 α−アミノアルケン類に基づく光励起性の窒素含有塩基類 Expired - Fee Related JP4308326B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH652/97 1997-03-18
CH65297 1997-03-18
PCT/EP1998/001346 WO1998041524A1 (en) 1997-03-18 1998-03-07 PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON α-AMINO ALKENES

Publications (3)

Publication Number Publication Date
JP2001515500A JP2001515500A (ja) 2001-09-18
JP2001515500A5 JP2001515500A5 (https=) 2005-11-10
JP4308326B2 true JP4308326B2 (ja) 2009-08-05

Family

ID=4192009

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54008698A Expired - Fee Related JP4308326B2 (ja) 1997-03-18 1998-03-07 α−アミノアルケン類に基づく光励起性の窒素含有塩基類

Country Status (12)

Country Link
US (1) US6087070A (https=)
EP (1) EP0970085B1 (https=)
JP (1) JP4308326B2 (https=)
KR (1) KR100527614B1 (https=)
CN (1) CN1128799C (https=)
AU (1) AU720834B2 (https=)
BR (1) BR9808899B1 (https=)
CA (1) CA2283446C (https=)
DE (1) DE69806739T2 (https=)
TW (1) TW466255B (https=)
WO (1) WO1998041524A1 (https=)
ZA (1) ZA982233B (https=)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE59903270D1 (de) * 1998-08-21 2002-12-05 Ciba Sc Holding Ag Photoaktivierbare stickstoffhaltige basen
EP1278804A1 (en) * 2000-03-28 2003-01-29 Akzo Nobel N.V. Photoactivatable coating composition and its use for the preparation of coatings with a rapidly processable surface at ambient temperature
ATE360629T1 (de) 2001-10-17 2007-05-15 Ciba Sc Holding Ag Photoaktivierbare stickstoffbasen
US8003169B2 (en) * 2002-04-19 2011-08-23 Basf Se Curing of coating induced by plasma
EP1593728B1 (en) * 2004-05-03 2012-05-09 Rohm And Haas Company Michael addition compositions
EP1640388B1 (en) * 2004-09-24 2015-02-25 Rohm and Haas Company Biomass based Michael addition composition
WO2008037635A1 (en) * 2006-09-29 2008-04-03 Ciba Holding Inc. Photolatent bases for systems based on blocked isocyanates
JP5606308B2 (ja) * 2007-04-03 2014-10-15 ビーエーエスエフ ソシエタス・ヨーロピア 光活性窒素塩基
DE102008049848A1 (de) 2008-10-01 2010-04-08 Tesa Se Mehrbereichsindikator
JP5978138B2 (ja) * 2013-01-22 2016-08-24 株式会社Adeka 新規化合物及び感光性樹脂組成物
WO2015008709A1 (ja) 2013-07-18 2015-01-22 セメダイン株式会社 光硬化性組成物
CN105829485B (zh) 2013-12-13 2018-10-12 思美定株式会社 具有粘合性的光固化性组合物
JP6474489B2 (ja) 2014-10-29 2019-02-27 テーザ・ソシエタス・ヨーロピア 活性化可能なゲッター材料を含む接着剤
AU2016256186B2 (en) 2015-04-29 2020-01-16 Bsn Medical Gmbh Multi-step process for no production
US10526440B2 (en) 2015-04-29 2020-01-07 3M Innovative Properties Company Method of making a polymer network from a polythiol and a polyepoxide
EP3288517B1 (de) 2015-04-29 2019-07-17 BSN Medical GmbH Medizinische badevorrichtung
US11198757B2 (en) 2016-11-03 2021-12-14 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and coumarin and related methods
WO2018085546A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition
CA3042860A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Polythiol sealant compositions
JP7109438B2 (ja) 2016-12-05 2022-07-29 アーケマ・インコーポレイテッド 重合開始剤ブレンド物、およびそのような重合開始剤ブレンド物を含む３ｄプリンティングに有用な光硬化性組成物
EP3395800B1 (en) 2017-04-26 2021-11-03 Henkel AG & Co. KGaA Heterocyclic quaternary nitrogen compounds comprising a polymeric substituent and their use as a photolatent catalyst in curable compositions
CN112004851A (zh) 2018-04-26 2020-11-27 汉高股份有限及两合公司 用作可固化组合物中的潜在催化剂的季氮化合物
WO2020065588A1 (en) 2018-09-27 2020-04-02 3M Innovative Properties Company Composition including amino-functional silanes and method of applying a sealant to a substrate
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4772530A (en) * 1986-05-06 1988-09-20 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
EP0284561B1 (de) * 1987-03-26 1993-05-12 Ciba-Geigy Ag Neue alpha-Aminoacetophenone als Photoinitiatoren
DE3825586A1 (de) * 1988-07-28 1990-02-01 Basf Ag Substituierte imidazolylmethyloxirane und substituierte imidazolylpropene, ihre herstellung und sie enthaltende fungizide
JP2583364B2 (ja) * 1990-06-19 1997-02-19 三菱電機株式会社 感光性樹脂組成物
JP2654339B2 (ja) * 1992-11-24 1997-09-17 インターナショナル・ビジネス・マシーンズ・コーポレイション 感光性レジスト組成物及び基板上にレジスト像を形成する方法

Also Published As

Publication number Publication date
CA2283446C (en) 2008-05-06
CN1251103A (zh) 2000-04-19
BR9808899A (pt) 2000-08-01
US6087070A (en) 2000-07-11
BR9808899B1 (pt) 2009-12-01
EP0970085B1 (en) 2002-07-24
EP0970085A1 (en) 2000-01-12
WO1998041524A1 (en) 1998-09-24
AU720834B2 (en) 2000-06-15
DE69806739T2 (de) 2003-03-13
ZA982233B (en) 1998-09-18
KR20000076332A (ko) 2000-12-26
KR100527614B1 (ko) 2005-11-15
CN1128799C (zh) 2003-11-26
TW466255B (en) 2001-12-01
AU7032798A (en) 1998-10-12
CA2283446A1 (en) 1998-09-24
DE69806739D1 (de) 2002-08-29
JP2001515500A (ja) 2001-09-18

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