JP4308326B2 - α−アミノアルケン類に基づく光励起性の窒素含有塩基類 - Google Patents

α−アミノアルケン類に基づく光励起性の窒素含有塩基類 Download PDF

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Publication number
JP4308326B2
JP4308326B2 JP54008698A JP54008698A JP4308326B2 JP 4308326 B2 JP4308326 B2 JP 4308326B2 JP 54008698 A JP54008698 A JP 54008698A JP 54008698 A JP54008698 A JP 54008698A JP 4308326 B2 JP4308326 B2 JP 4308326B2
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JP
Japan
Prior art keywords
alkyl
formula
phenyl
diastereomer
compound
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Expired - Fee Related
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JP54008698A
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English (en)
Japanese (ja)
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JP2001515500A5 (OSRAM
JP2001515500A (ja
Inventor
コールム ターナー，ショーン
ボーダン，ジゼル
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BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polyamides (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Paper (AREA)
JP54008698A 1997-03-18 1998-03-07 α−アミノアルケン類に基づく光励起性の窒素含有塩基類 Expired - Fee Related JP4308326B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH65297 1997-03-18
CH652/97 1997-03-18
PCT/EP1998/001346 WO1998041524A1 (en) 1997-03-18 1998-03-07 PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON α-AMINO ALKENES

Publications (3)

Publication Number Publication Date
JP2001515500A JP2001515500A (ja) 2001-09-18
JP2001515500A5 JP2001515500A5 (OSRAM) 2005-11-10
JP4308326B2 true JP4308326B2 (ja) 2009-08-05

Family

ID=4192009

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54008698A Expired - Fee Related JP4308326B2 (ja) 1997-03-18 1998-03-07 α−アミノアルケン類に基づく光励起性の窒素含有塩基類

Country Status (12)

Country Link
US (1) US6087070A (OSRAM)
EP (1) EP0970085B1 (OSRAM)
JP (1) JP4308326B2 (OSRAM)
KR (1) KR100527614B1 (OSRAM)
CN (1) CN1128799C (OSRAM)
AU (1) AU720834B2 (OSRAM)
BR (1) BR9808899B1 (OSRAM)
CA (1) CA2283446C (OSRAM)
DE (1) DE69806739T2 (OSRAM)
TW (1) TW466255B (OSRAM)
WO (1) WO1998041524A1 (OSRAM)
ZA (1) ZA982233B (OSRAM)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU5620499A (en) * 1998-08-21 2000-03-14 Ciba Specialty Chemicals Holding Inc. Photoactivatable bases containing nitrogen
WO2001072910A1 (en) * 2000-03-28 2001-10-04 Akzo Nobel N.V. Photoactivatable coating composition and its use for the preparation of coatings with a rapidly processable surface at ambient temperature
EP1436297B1 (en) * 2001-10-17 2007-04-25 Ciba Specialty Chemicals Holding Inc. Photoactivable nitrogen bases
MXPA04009790A (es) * 2002-04-19 2004-12-13 Ciba Sc Holding Ag Curado de recubrimientos inducido por plasma.
EP1593728B1 (en) * 2004-05-03 2012-05-09 Rohm And Haas Company Michael addition compositions
EP1640388B1 (en) * 2004-09-24 2015-02-25 Rohm and Haas Company Biomass based Michael addition composition
CN101522745B (zh) * 2006-09-29 2013-06-19 西巴控股有限公司 以封闭异氰酸酯为基础的体系的光潜碱
JP5606308B2 (ja) 2007-04-03 2014-10-15 ビーエーエスエフ ソシエタス・ヨーロピア 光活性窒素塩基
DE102008049848A1 (de) 2008-10-01 2010-04-08 Tesa Se Mehrbereichsindikator
JP5978138B2 (ja) * 2013-01-22 2016-08-24 株式会社Adeka 新規化合物及び感光性樹脂組成物
WO2015008709A1 (ja) 2013-07-18 2015-01-22 セメダイン株式会社 光硬化性組成物
CN105829485B (zh) 2013-12-13 2018-10-12 思美定株式会社 具有粘合性的光固化性组合物
CN107148458A (zh) 2014-10-29 2017-09-08 德莎欧洲公司 包含可活化的吸气剂材料的胶粘剂混合物
BR112017023057B1 (pt) 2015-04-29 2023-03-28 Bsn Medical Gmbh Processo para preparação de no e processo cosmético
WO2016176548A1 (en) 2015-04-29 2016-11-03 3M Innovative Properties Company Composition including a polythiol and a polyepoxide and methods relating to the composition
US10813831B2 (en) 2015-04-29 2020-10-27 Bsn Medical Gmbh Medical bathing device
US11198757B2 (en) 2016-11-03 2021-12-14 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and coumarin and related methods
WO2018085190A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Polythiol sealant compositions
JP2019534363A (ja) 2016-11-03 2019-11-28 スリーエム イノベイティブ プロパティズ カンパニー シーラントを航空機用部品に適用する方法
EP3548969A1 (en) 2016-12-05 2019-10-09 Arkema, Inc. Initiator blends and photocurable compositions containing such initiator blends useful for 3d printing
EP3395800B1 (en) 2017-04-26 2021-11-03 Henkel AG & Co. KGaA Heterocyclic quaternary nitrogen compounds comprising a polymeric substituent and their use as a photolatent catalyst in curable compositions
CN112004851A (zh) 2018-04-26 2020-11-27 汉高股份有限及两合公司 用作可固化组合物中的潜在催化剂的季氮化合物
CN112752803A (zh) 2018-09-27 2021-05-04 3M创新有限公司 包含氨基官能硅烷的组合物以及将密封剂施用到基材的方法
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4772530A (en) * 1986-05-06 1988-09-20 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
EP0284561B1 (de) * 1987-03-26 1993-05-12 Ciba-Geigy Ag Neue alpha-Aminoacetophenone als Photoinitiatoren
DE3825586A1 (de) * 1988-07-28 1990-02-01 Basf Ag Substituierte imidazolylmethyloxirane und substituierte imidazolylpropene, ihre herstellung und sie enthaltende fungizide
JP2583364B2 (ja) * 1990-06-19 1997-02-19 三菱電機株式会社 感光性樹脂組成物
JP2654339B2 (ja) * 1992-11-24 1997-09-17 インターナショナル・ビジネス・マシーンズ・コーポレイション 感光性レジスト組成物及び基板上にレジスト像を形成する方法

Also Published As

Publication number Publication date
BR9808899B1 (pt) 2009-12-01
TW466255B (en) 2001-12-01
CN1128799C (zh) 2003-11-26
EP0970085B1 (en) 2002-07-24
CA2283446A1 (en) 1998-09-24
DE69806739D1 (de) 2002-08-29
US6087070A (en) 2000-07-11
KR100527614B1 (ko) 2005-11-15
AU7032798A (en) 1998-10-12
CN1251103A (zh) 2000-04-19
BR9808899A (pt) 2000-08-01
AU720834B2 (en) 2000-06-15
DE69806739T2 (de) 2003-03-13
EP0970085A1 (en) 2000-01-12
CA2283446C (en) 2008-05-06
KR20000076332A (ko) 2000-12-26
WO1998041524A1 (en) 1998-09-24
ZA982233B (en) 1998-09-18
JP2001515500A (ja) 2001-09-18

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