JP4304254B2 - Recovery method of high purity indium - Google Patents
Recovery method of high purity indium Download PDFInfo
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- JP4304254B2 JP4304254B2 JP34528898A JP34528898A JP4304254B2 JP 4304254 B2 JP4304254 B2 JP 4304254B2 JP 34528898 A JP34528898 A JP 34528898A JP 34528898 A JP34528898 A JP 34528898A JP 4304254 B2 JP4304254 B2 JP 4304254B2
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Description
【0001】
【発明の属する利用分野】
本発明は、インジウム含有物からのインジウム回収方法に関する。より詳しくは、酸化インジウム錫(ITO)ターゲット屑から高純度インジウムメタルを効率よく回収する方法に関する。本回収方法はITOターゲット屑等のリサイクル法として有用である。
【0002】
【従来の技術】
最近の液晶技術の急速な進展により、この液晶の透明導電膜として利用されるITOの需要が著しく伸びている。このITO膜の製造原料としてITOターゲット材が用いられている。従来、ITOターゲット屑等を原料としたインジウムの回収方法がいくつか提案されている。たとえば、溶媒抽出法を利用した方法(特開平8−91838号)があるが、この方法では、抽出と逆抽出を繰り返すため工程が複雑になり、また、高価な溶媒を使用するためコストが高い。また、別の方法として、インジウムを溶解した液に、金属インジウム板を挿入して液中の不純物イオンを置換析出させて除去し、次いで、この溶解液を電解液としてインジウムメタルを電解採取する方法(特開平10−204673)がある。この方法は、工程が簡単ではあるが、置換析出によって除去し得る不純物イオン濃度に限界があり、得られるインジウムメタルの純度はせいぜい99.99%である。
【0003】
【発明が解決しようとする課題】
本発明は、従来のインジウム回収方法における上記の問題を解決したものであって、金属の湿式精製において一般的に用いられる単位操作によって、簡単な工程で、しかも従来の方法を凌ぐ高純度のインジウムを回収できる方法を提案するものである。
【0004】
【課題を解決するための手段】
すなわち本発明は、インジウム含有物を塩酸で溶解する溶解工程と、得られた溶解液にアルカリを加えてpHが0.5〜4の範囲内の所定の値になるように中和し、溶解液中の所定の金属イオンを水酸化物として析出させて除去する中和工程と、得られた中和後液に硫化水素ガスを吹き込み、次の電解工程に有害な金属イオンを硫化物として析出除去する硫化工程と、得られた硫化後液を電解元液としてインジウムメタルを電解採取する電解採取工程とを含む高純度インジウムの回収方法である。原料となるインジウム含有物としては、ITOターゲット屑を好適に使用できる。また、溶解工程で使用される溶解液として電解採取工程の電解採取後液を再利用することができる。さらに、電解採取後液の一部あるいは全量を抜き出すことによって系内における不純物の蓄積を防止することが望ましい。
【0005】
【発明の実施の形態】
本発明に係わる回収方法の概略を図1の工程図に示した。図示するように、本発明のインジウム回収方法は、インジウム含有物を塩酸で溶解し、この溶解液にアルカリを加えてpHが0.5〜4の範囲内の所定の値になるように中和し、溶解液中の所定の金属イオンを水酸化物として析出させて除去し、次いで、これに硫化水素ガスを吹き込み、次工程の電解に有害な金属イオンを硫化物として析出除去した後、この溶解液を電解液としてインジウムメタルを電解採取する高純度インジウムの回収方法である。
【0006】
[解砕工程]:原料となるインジウム含有物としてはITOターゲットが好適に用いられるが、これに限らない。原料は解砕機で溶解に適当なサイズに解砕される。
[溶解工程]:溶解液としては塩酸が用いられる。溶解液量としてはインジウム濃度が20〜200g/lとなるよう液量を調節し、酸量は理論値の1.1から1.5倍当量が適当である。溶解を促進するため溶解液を加熱するのが望ましい。
[中和工程]:インジウム含有物を塩酸に溶解させた溶解液に適当なアルカリを加えて、pHが0.5〜4の範囲内の所定の値になるように中和する。pHを4以下とするのは、インジウムの水酸化物の析出を防止するためであり、pHを0.5以上とするのは、不純物イオンを加水分解させ、水酸化物として析出させるためである。この工程でITOターゲット屑中の主要な不純物である錫のほとんどが効率的に除去される。
[硫化工程]:前記中和工程で析出した錫等の水酸化物をろ過して除去した後、この溶解液に硫化水素ガスを吹き込み.次工程の電解に有害な銅、鉛等に加え微量の錫を硫化物として析出除去する。
[電解採取工程]:清浄となった上記インジウム溶解液を電解採取工程に送り、適当な電解条件で電解採取によりインジウムをメタルとして回収する。
[鋳造工程]:回収したインジウムメタルは不純物として電解液の成分であるナトリウム等のアルカリ金属を含むので、固形苛性ソーダと共に加熱混合溶解し、これらのアルカリ金属を溶融苛性ソーダ中に溶解除去した後、比重分離してメタル分を鋳型に鋳込み、冷却し、高純度インジウムを回収する。
[電解採取後液処理]:電解採取後液は溶解工程に繰り返し、塩酸と混合して再利用される。アルミニウム、鉄等の、インジウムより卑な金属イオンが蓄積するのを防止するため、この電解採取後液の一部あるいは全量を系外に抜き出す。
【0007】
【実施例】
ITOターゲット屑200gを解砕した後に、塩酸5molに溶解して2リットルのインジウム溶解液を得た。この溶解液の液組成を表1に示した。
この溶解液に炭酸ソーダを加えて、pHが1.7になるまで中和した。析出した水酸化物をろ過して除去し、中和後液を得た。この中和後液の組成を表1に示した。
この中和後液に、硫化水素ガスを50cc/分の割合で2分間吹き込んだ。析出した硫化物をろ過して除去し、硫化後液を得た。この硫化後液の液組成を表1に示した。
【0008】
この清浄となった硫化後液を電解採取の元液として、液温30℃、電流密度150A/m2の電解条件でインジウムメタルを電解採取した。得られた電解採取メタルの品位を表1に示した。
この電解採取メタルを固形苛性ソーダと共に加熱混合溶解し、比重分離してメタル分を鋳型に流し込み、冷却し、鋳造インジウムを回収した。得られた鋳造インジウムの品位は表1に示す通りであり、99.999%以上の高純度のものであった。
【0009】
【表1】
【0010】
【発明の効果】
本発明のインジウム回収方法によれば、従来の方法よりも簡単な工程でかつ安価に99.999%以上の高純度のインジウムを回収できる。従って、本発明の方法は、ITOターゲット屑等のリサイクル法として極めて有用な方法である。
【図面の簡単な説明】
【図1】本発明のインジウム回収方法を示す工程図である。[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a method for recovering indium from an indium-containing material. More specifically, the present invention relates to a method for efficiently recovering high-purity indium metal from indium tin oxide (ITO) target scraps. This recovery method is useful as a recycling method for ITO target scraps and the like.
[0002]
[Prior art]
Due to the recent rapid development of liquid crystal technology, the demand for ITO used as a transparent conductive film of this liquid crystal has remarkably increased. An ITO target material is used as a raw material for producing the ITO film. Conventionally, several methods for recovering indium using ITO target scraps and the like as raw materials have been proposed. For example, there is a method using a solvent extraction method (Japanese Patent Laid-Open No. 8-91838). However, this method repeats extraction and back-extraction, which complicates the process, and uses an expensive solvent, resulting in high cost. . As another method, a metal indium plate is inserted into a solution in which indium is dissolved, and impurity ions in the solution are replaced and removed, and then indium metal is electrolytically collected using the solution as an electrolytic solution. (Japanese Patent Laid-Open No. 10-204673). Although this method is simple, the impurity ion concentration that can be removed by displacement deposition is limited, and the purity of the obtained indium metal is at most 99.99%.
[0003]
[Problems to be solved by the invention]
The present invention solves the above-mentioned problems in the conventional indium recovery method, and is a high-purity indium that has a simple process and surpasses the conventional method by a unit operation generally used in wet refining of metals. A method is proposed to recover the wastewater.
[0004]
[Means for Solving the Problems]
That is, the present invention includes a dissolution step of dissolving an indium-containing material with hydrochloric acid, neutralizing the resulting solution by adding an alkali to a predetermined value within a range of 0.5 to 4 and dissolving the solution. Neutralization process that deposits and removes predetermined metal ions in the liquid as hydroxide, and hydrogen sulfide gas is blown into the resulting post-neutralization liquid to deposit metal ions that are harmful to the next electrolysis process as sulfides This is a method for recovering high-purity indium, which includes a sulfiding step for removing, and an electrowinning step for electrolytically collecting indium metal using the obtained post-sulfurized solution as an electrolytic base solution. As the indium-containing material as a raw material, ITO target scraps can be suitably used. Moreover, the solution after electrolytic collection in the electrolytic collection step can be reused as the dissolution solution used in the dissolution step. Furthermore, it is desirable to prevent the accumulation of impurities in the system by extracting a part or all of the solution after electrolytic collection.
[0005]
DETAILED DESCRIPTION OF THE INVENTION
The outline of the recovery method according to the present invention is shown in the process diagram of FIG. As shown in the figure, the indium recovery method of the present invention involves dissolving an indium-containing material with hydrochloric acid, adding an alkali to the solution, and neutralizing the solution so that the pH becomes a predetermined value within a range of 0.5 to 4. Then, the predetermined metal ions in the solution are deposited and removed as hydroxides, and then hydrogen sulfide gas is blown into them to precipitate and remove metal ions harmful to the electrolysis of the next step as sulfides. This is a method for recovering high-purity indium by electrolytically collecting indium metal using a solution as an electrolyte.
[0006]
[Crushing step]: An ITO target is preferably used as the indium-containing material as a raw material, but is not limited thereto. The raw material is crushed to a size suitable for dissolution by a crusher.
[Dissolution step]: Hydrochloric acid is used as the solution. The amount of solution is adjusted so that the indium concentration is 20 to 200 g / l, and the acid amount is suitably 1.1 to 1.5 equivalents of the theoretical value. It is desirable to heat the solution to facilitate dissolution.
[Neutralization step]: An appropriate alkali is added to a solution obtained by dissolving an indium-containing material in hydrochloric acid to neutralize the solution to a predetermined value within a range of 0.5 to 4. The pH is set to 4 or less in order to prevent precipitation of indium hydroxide, and the pH is set to 0.5 or more in order to hydrolyze impurity ions and precipitate them as hydroxides. . In this process, most of tin, which is a main impurity in the ITO target scrap, is efficiently removed.
[Sulfurization step]: After removing hydroxides such as tin deposited in the neutralization step by filtration, hydrogen sulfide gas was blown into the solution. In addition to copper and lead, which are harmful to electrolysis in the next step, a small amount of tin is precipitated and removed as sulfides.
[Electrolytic collection step]: The cleaned indium solution is sent to the electrolytic collection step, and indium is recovered as a metal by electrolytic collection under appropriate electrolysis conditions.
[Casting process]: Since the recovered indium metal contains alkali metal such as sodium which is a component of the electrolytic solution as impurities, it is heated and mixed with solid caustic soda, and these alkali metals are dissolved and removed in molten caustic soda. Separate and cast metal into mold, cool and collect high purity indium.
[Solution treatment after electrolytic collection]: The solution after electrolytic collection is repeatedly used in the dissolution process, mixed with hydrochloric acid and reused. In order to prevent accumulation of metal ions that are lower than indium, such as aluminum and iron, a part or all of the solution after electrolytic collection is withdrawn out of the system.
[0007]
【Example】
After crushing 200 g of ITO target scrap, it was dissolved in 5 mol of hydrochloric acid to obtain 2 liters of indium solution. The solution composition of this solution is shown in Table 1.
Sodium carbonate was added to the solution to neutralize it until the pH reached 1.7. The precipitated hydroxide was removed by filtration to obtain a neutralized solution. The composition of this neutralized solution is shown in Table 1.
Hydrogen sulfide gas was blown into the solution after neutralization at a rate of 50 cc / min for 2 minutes. The precipitated sulfide was removed by filtration to obtain a solution after sulfidation. The liquid composition of this post-sulfurized liquid is shown in Table 1.
[0008]
Using the cleaned post-sulfurized solution as a base solution for electrowinning, indium metal was electrowinned under electrolysis conditions of a liquid temperature of 30 ° C. and a current density of 150 A / m 2 . Table 1 shows the quality of the obtained electrowinning metal.
This electrolytically collected metal was heated and mixed and dissolved together with solid caustic soda, separated by specific gravity, poured into a mold, cooled, and cast indium was recovered. The quality of the obtained cast indium was as shown in Table 1, and was high purity of 99.999% or more.
[0009]
[Table 1]
[0010]
【The invention's effect】
According to the indium recovery method of the present invention, 99.999% or more of high-purity indium can be recovered in a simpler process and at a lower cost than conventional methods. Therefore, the method of the present invention is an extremely useful method as a recycling method for ITO target scraps and the like.
[Brief description of the drawings]
FIG. 1 is a process diagram showing an indium recovery method of the present invention.
Claims (3)
Priority Applications (1)
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JP34528898A JP4304254B2 (en) | 1998-12-04 | 1998-12-04 | Recovery method of high purity indium |
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JP34528898A JP4304254B2 (en) | 1998-12-04 | 1998-12-04 | Recovery method of high purity indium |
Related Child Applications (3)
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JP2004381412A Division JP2005146420A (en) | 2004-12-28 | 2004-12-28 | High purity indium |
JP2005232153A Division JP2006022407A (en) | 2005-08-10 | 2005-08-10 | Method for recovering indium |
JP2006349480A Division JP4310388B2 (en) | 2006-12-26 | 2006-12-26 | Indium recovery method |
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JP4304254B2 true JP4304254B2 (en) | 2009-07-29 |
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Families Citing this family (26)
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US8734633B2 (en) | 2007-02-16 | 2014-05-27 | Jx Nippon Mining & Metals Corporation | Method of recovering valuable metal from scrap containing conductive oxide |
EP2130947B1 (en) | 2007-03-27 | 2012-08-08 | JX Nippon Mining & Metals Corporation | Method of recovering valuable metal from scrap containing conductive oxide |
JP5102523B2 (en) * | 2007-03-28 | 2012-12-19 | Dowaメタルマイン株式会社 | Indium recovery method |
JP2009155717A (en) * | 2007-12-28 | 2009-07-16 | Dowa Eco-System Co Ltd | Method for recovering indium |
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JP2011062594A (en) | 2009-09-15 | 2011-03-31 | Nagoya Institute Of Technology | Indium adsorbent, method for manufacturing the same, and indium adsorbing method |
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1998
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