JP2000169991A - Recovering method of high purity indium - Google Patents

Recovering method of high purity indium

Info

Publication number
JP2000169991A
JP2000169991A JP34528898A JP34528898A JP2000169991A JP 2000169991 A JP2000169991 A JP 2000169991A JP 34528898 A JP34528898 A JP 34528898A JP 34528898 A JP34528898 A JP 34528898A JP 2000169991 A JP2000169991 A JP 2000169991A
Authority
JP
Japan
Prior art keywords
indium
solution
electrowinning
purity
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP34528898A
Other languages
Japanese (ja)
Other versions
JP4304254B2 (en
Inventor
Hideki Nagata
秀樹 永田
Nagayasu Yanada
長康 梁田
Shigeru Ogasawara
滋 小笠原
Atsushi Komori
淳 小森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dowa Holdings Co Ltd
Original Assignee
Dowa Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dowa Mining Co Ltd filed Critical Dowa Mining Co Ltd
Priority to JP34528898A priority Critical patent/JP4304254B2/en
Publication of JP2000169991A publication Critical patent/JP2000169991A/en
Application granted granted Critical
Publication of JP4304254B2 publication Critical patent/JP4304254B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling

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  • Manufacture And Refinement Of Metals (AREA)
  • Electrolytic Production Of Metals (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method to recover high purity indium with a simple process from an indium-contg. material such as ITO target waste. SOLUTION: An indium-contg. material is dissolved in hydrochloric acid, and an alkali is added to the dissolved liquid to neutralize to obtain a specified pH range from 0.5 to 4 so as to precipitate specified metal ions as hydroxides in the dissolved liquid. Then hydrogen sulfide gas is blown into the liquid to precipitate and remove metal ions as sulfides which are harmful in the succeeding electrolysis process. Then the dissolved liquid is used as an electrolytic source soln. to recover indium metal by electrolysis. By this method, indium of >=99.999% purity can be recovered from an ITO target waste.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する利用分野】本発明は、インジウム含有物
からのインジウム回収方法に関する。より詳しくは、酸
化インジウム錫(ITO)ターゲット屑から高純度イン
ジウムメタルを効率よく回収する方法に関する。本回収
方法はITOターゲット屑等のリサイクル法として有用
である。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for recovering indium from a substance containing indium. More specifically, the present invention relates to a method for efficiently recovering high-purity indium metal from indium tin oxide (ITO) target waste. This recovery method is useful as a recycling method for ITO target waste and the like.

【0002】[0002]

【従来の技術】最近の液晶技術の急速な進展により、こ
の液晶の透明導電膜として利用されるITOの需要が著
しく伸びている。このITO膜の製造原料としてITO
ターゲット材が用いられている。従来、ITOターゲッ
ト屑等を原料としたインジウムの回収方法がいくつか提
案されている。たとえば、溶媒抽出法を利用した方法
(特開平8−91838号)があるが、この方法では、
抽出と逆抽出を繰り返すため工程が複雑になり、また、
高価な溶媒を使用するためコストが高い。また、別の方
法として、インジウムを溶解した液に、金属インジウム
板を挿入して液中の不純物イオンを置換析出させて除去
し、次いで、この溶解液を電解液としてインジウムメタ
ルを電解採取する方法(特開平10−204673)が
ある。この方法は、工程が簡単ではあるが、置換析出に
よって除去し得る不純物イオン濃度に限界があり、得ら
れるインジウムメタルの純度はせいぜい99.99%で
ある。
2. Description of the Related Art Due to the recent rapid development of liquid crystal technology, demand for ITO used as a transparent conductive film for this liquid crystal has been remarkably growing. As a raw material for producing this ITO film, ITO
Target material is used. Conventionally, several methods of recovering indium using ITO target waste as a raw material have been proposed. For example, there is a method using a solvent extraction method (JP-A-8-91838).
The process becomes complicated due to repeated extraction and back extraction,
High cost due to use of expensive solvent. As another method, a method in which a metal indium plate is inserted into a solution in which indium is dissolved to replace and remove impurity ions in the solution and then removed, and then the indium metal is electrolytically collected using the solution as an electrolytic solution. (JP-A-10-204673). This method has a simple process, but has a limit on the impurity ion concentration that can be removed by displacement precipitation, and the purity of the obtained indium metal is at most 99.99%.

【0003】[0003]

【発明が解決しようとする課題】本発明は、従来のイン
ジウム回収方法における上記の問題を解決したものであ
って、金属の湿式精製において一般的に用いられる単位
操作によって、簡単な工程で、しかも従来の方法を凌ぐ
高純度のインジウムを回収できる方法を提案するもので
ある。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems in the conventional indium recovery method, and requires a simple process by a unit operation generally used in wet refining of metals. The present invention proposes a method capable of recovering high-purity indium that exceeds the conventional method.

【0004】[0004]

【課題を解決するための手段】すなわち本発明は、イン
ジウム含有物を塩酸で溶解する溶解工程と、得られた溶
解液にアルカリを加えてpHが0.5〜4の範囲内の所
定の値になるように中和し、溶解液中の所定の金属イオ
ンを水酸化物として析出させて除去する中和工程と、得
られた中和後液に硫化水素ガスを吹き込み、次の電解工
程に有害な金属イオンを硫化物として析出除去する硫化
工程と、得られた硫化後液を電解元液としてインジウム
メタルを電解採取する電解採取工程とを含む高純度イン
ジウムの回収方法である。原料となるインジウム含有物
としては、ITOターゲット屑を好適に使用できる。ま
た、溶解工程で使用される溶解液として電解採取工程の
電解採取後液を再利用することができる。さらに、電解
採取後液の一部あるいは全量を抜き出すことによって系
内における不純物の蓄積を防止することが望ましい。
That is, the present invention provides a dissolving step of dissolving an indium-containing substance with hydrochloric acid, and adding an alkali to the obtained dissolving solution to adjust the pH to a predetermined value within a range of 0.5 to 4. Neutralization so that a predetermined metal ion in the solution is precipitated as hydroxide and removed, and a hydrogen sulfide gas is blown into the obtained neutralized solution to perform the next electrolysis step. This is a method for recovering high-purity indium, which includes a sulfurization step of precipitating and removing harmful metal ions as sulfides and an electrowinning step of electrowinning indium metal using the obtained post-sulfidation solution as an electrolysis source solution. As the indium-containing material serving as a raw material, ITO target waste can be suitably used. In addition, the solution after electrowinning in the electrowinning step can be reused as the lysis solution used in the lysis step. Furthermore, it is desirable to prevent the accumulation of impurities in the system by extracting a part or the whole amount of the solution after the electrolytic sampling.

【0005】[0005]

【発明の実施の形態】本発明に係わる回収方法の概略を
図1の工程図に示した。図示するように、本発明のイン
ジウム回収方法は、インジウム含有物を塩酸で溶解し、
この溶解液にアルカリを加えてpHが0.5〜4の範囲
内の所定の値になるように中和し、溶解液中の所定の金
属イオンを水酸化物として析出させて除去し、次いで、
これに硫化水素ガスを吹き込み、次工程の電解に有害な
金属イオンを硫化物として析出除去した後、この溶解液
を電解液としてインジウムメタルを電解採取する高純度
インジウムの回収方法である。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The outline of the recovery method according to the present invention is shown in the process diagram of FIG. As shown in the figure, the indium recovery method of the present invention dissolves indium-containing substances with hydrochloric acid,
An alkali is added to the solution to neutralize the solution so that the pH becomes a predetermined value in a range of 0.5 to 4, and a predetermined metal ion in the solution is precipitated and removed as a hydroxide, and then removed. ,
This is a method for recovering high-purity indium in which hydrogen sulfide gas is blown thereinto to precipitate and remove metal ions harmful to electrolysis in the next step as sulfides, and then use this solution as an electrolytic solution to electrolytically extract indium metal.

【0006】[解砕工程]:原料となるインジウム含有
物としてはITOターゲットが好適に用いられるが、こ
れに限らない。原料は解砕機で溶解に適当なサイズに解
砕される。 [溶解工程]:溶解液としては塩酸が用いられる。溶解
液量としてはインジウム濃度が20〜200g/lとな
るよう液量を調節し、酸量は理論値の1.1から1.5
倍当量が適当である。溶解を促進するため溶解液を加熱
するのが望ましい。 [中和工程]:インジウム含有物を塩酸に溶解させた溶
解液に適当なアルカリを加えて、pHが0.5〜4の範
囲内の所定の値になるように中和する。pHを4以下と
するのは、インジウムの水酸化物の析出を防止するため
であり、pHを0.5以上とするのは、不純物イオンを
加水分解させ、水酸化物として析出させるためである。
この工程でITOターゲット屑中の主要な不純物である
錫のほとんどが効率的に除去される。 [硫化工程]:前記中和工程で析出した錫等の水酸化物
をろ過して除去した後、この溶解液に硫化水素ガスを吹
き込み.次工程の電解に有害な銅、鉛等に加え微量の錫
を硫化物として析出除去する。 [電解採取工程]:清浄となった上記インジウム溶解液
を電解採取工程に送り、適当な電解条件で電解採取によ
りインジウムをメタルとして回収する。 [鋳造工程]:回収したインジウムメタルは不純物とし
て電解液の成分であるナトリウム等のアルカリ金属を含
むので、固形苛性ソーダと共に加熱混合溶解し、これら
のアルカリ金属を溶融苛性ソーダ中に溶解除去した後、
比重分離してメタル分を鋳型に鋳込み、冷却し、高純度
インジウムを回収する。 [電解採取後液処理]:電解採取後液は溶解工程に繰り
返し、塩酸と混合して再利用される。アルミニウム、鉄
等の、インジウムより卑な金属イオンが蓄積するのを防
止するため、この電解採取後液の一部あるいは全量を系
外に抜き出す。
[Crushing step] An ITO target is preferably used as an indium-containing material as a raw material, but the present invention is not limited to this. The raw material is crushed by a crusher to a size suitable for dissolution. [Dissolution step]: Hydrochloric acid is used as the dissolution solution. The amount of the dissolving solution is adjusted so that the indium concentration becomes 20 to 200 g / l, and the amount of the acid is adjusted from 1.1 to 1.5 of the theoretical value.
Double equivalents are appropriate. It is desirable to heat the lysis solution to promote lysis. [Neutralization step]: An appropriate alkali is added to a solution obtained by dissolving the indium-containing substance in hydrochloric acid to neutralize the solution to a predetermined value within a range of 0.5 to 4. The reason for setting the pH to 4 or less is to prevent precipitation of indium hydroxide, and the reason for setting the pH to 0.5 or more is to hydrolyze impurity ions and precipitate as hydroxide. .
In this step, most of tin, which is a major impurity in the ITO target waste, is efficiently removed. [Sulfurization step]: After removing the hydroxide such as tin precipitated in the neutralization step by filtration, hydrogen sulfide gas was blown into this solution. In addition to copper and lead harmful to electrolysis in the next step, a trace amount of tin is precipitated and removed as sulfide. [Electrolysis sampling step]: The cleaned indium solution is sent to an electrolysis sampling step, and indium is recovered as metal by electrolysis under appropriate electrolysis conditions. [Casting process]: Since the recovered indium metal contains an alkali metal such as sodium which is a component of the electrolytic solution as an impurity, it is heated and mixed together with solid caustic soda to dissolve and remove these alkali metals in molten caustic soda.
The metal is cast into a mold after being separated by specific gravity, cooled, and high-purity indium is recovered. [Liquid treatment after electrolytic collection]: The liquid after electrolytic collection is repeated in the dissolving step, mixed with hydrochloric acid and reused. In order to prevent accumulation of metal ions, such as aluminum and iron, which are more noble than indium, part or all of the liquid after the electrolytic extraction is extracted out of the system.

【0007】[0007]

【実施例】ITOターゲット屑200gを解砕した後
に、塩酸5molに溶解して2リットルのインジウム溶
解液を得た。この溶解液の液組成を表1に示した。この
溶解液に炭酸ソーダを加えて、pHが1.7になるまで
中和した。析出した水酸化物をろ過して除去し、中和後
液を得た。この中和後液の組成を表1に示した。この中
和後液に、硫化水素ガスを50cc/分の割合で2分間
吹き込んだ。析出した硫化物をろ過して除去し、硫化後
液を得た。この硫化後液の液組成を表1に示した。
EXAMPLE After 200 g of ITO target waste was crushed, it was dissolved in 5 mol of hydrochloric acid to obtain a 2 liter indium solution. The solution composition of this solution is shown in Table 1. Sodium carbonate was added to this solution to neutralize it until the pH reached 1.7. The precipitated hydroxide was removed by filtration to obtain a neutralized solution. Table 1 shows the composition of the solution after neutralization. Hydrogen sulfide gas was blown into the liquid after the neutralization at a rate of 50 cc / min for 2 minutes. The precipitated sulfide was removed by filtration to obtain a post-sulfidation liquid. Table 1 shows the liquid composition of the liquid after sulfurization.

【0008】この清浄となった硫化後液を電解採取の元
液として、液温30℃、電流密度150A/mの電解
条件でインジウムメタルを電解採取した。得られた電解
採取メタルの品位を表1に示した。この電解採取メタル
を固形苛性ソーダと共に加熱混合溶解し、比重分離して
メタル分を鋳型に流し込み、冷却し、鋳造インジウムを
回収した。得られた鋳造インジウムの品位は表1に示す
通りであり、99.999%以上の高純度のものであっ
た。
Using the cleaned solution after sulfidation as a base solution for electrowinning, indium metal was electrowinned under electrolysis conditions of a liquid temperature of 30 ° C. and a current density of 150 A / m 2 . Table 1 shows the quality of the obtained electrowinning metal. The electrowinning metal was mixed with solid caustic soda by heating and dissolved, and the specific gravity was separated. The metal component was poured into a mold, cooled, and the cast indium was recovered. The quality of the cast indium obtained was as shown in Table 1, and was high purity of 99.999% or more.

【0009】[0009]

【表1】 [Table 1]

【0010】[0010]

【発明の効果】本発明のインジウム回収方法によれば、
従来の方法よりも簡単な工程でかつ安価に99.999
%以上の高純度のインジウムを回収できる。従って、本
発明の方法は、ITOターゲット屑等のリサイクル法と
して極めて有用な方法である。
According to the method for recovering indium of the present invention,
It is a simpler and cheaper process than the conventional method.
% Or more of highly pure indium can be recovered. Therefore, the method of the present invention is an extremely useful method for recycling ITO target waste.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明のインジウム回収方法を示す工程図であ
る。
FIG. 1 is a process chart showing an indium recovery method of the present invention.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 小笠原 滋 東京都千代田区丸の内1丁目8番2号 同 和鉱業株式会社内 (72)発明者 小森 淳 東京都千代田区丸の内1丁目8番2号 同 和鉱業株式会社内 Fターム(参考) 4K001 AA42 BA22 DB04 DB19 DB21 DB23 4K058 AA21 BA07 BB04 FC07 FC12 FC21 FC27  ──────────────────────────────────────────────────続 き Continued on front page (72) Inventor Shigeru Ogasawara 1-8-2 Marunouchi, Chiyoda-ku, Tokyo Dowa Mining Co., Ltd. (72) Inventor Jun Komori 1-8-2 Marunouchi, Chiyoda-ku, Tokyo Same as above F Mining in WA Mining Co., Ltd. (Reference) 4K001 AA42 BA22 DB04 DB19 DB21 DB23 4K058 AA21 BA07 BB04 FC07 FC12 FC21 FC27

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 インジウム含有物を塩酸で溶解する溶解
工程と、得られた溶解液にアルカリを加えてpHが0.
5〜4の範囲内の所定の値になるように中和し、溶解液
中の所定の金属イオンを水酸化物として析出させて除去
する中和工程と、得られた中和後液に硫化水素ガスを吹
き込み、次の電解工程に有害な金属イオンを硫化物とし
て析出除去する硫化工程と、得られた硫化後液を電解元
液としてインジウムメタルを電解採取する電解採取工程
とを含む高純度インジウムの回収方法。
1. A dissolving step of dissolving an indium-containing substance with hydrochloric acid, and adding an alkali to the obtained dissolving solution to adjust the pH to 0.1.
A neutralization step of neutralizing to a predetermined value in the range of 5 to 4 and precipitating and removing a predetermined metal ion in the solution as a hydroxide; High purity including a sulfurization step of blowing hydrogen gas to precipitate and remove harmful metal ions as sulfides in the next electrolysis step, and an electrowinning step of electrowinning indium metal using the obtained post-sulfidation liquid as an electrolysis source liquid How to recover indium.
【請求項2】 原料のインジウム含有物がITOターゲ
ット屑である請求項1記載の高純度インジウムの回収方
法。
2. The method for recovering high-purity indium according to claim 1, wherein the indium-containing material as a raw material is ITO target waste.
【請求項3】 溶解工程で使用される溶解液として電解
採取工程の電解採取後液を再利用する請求項1、2のい
ずれかに記載の高純度インジウムの回収方法。
3. The method for recovering high-purity indium according to claim 1, wherein the solution after the electrowinning in the electrowinning step is reused as the lysis solution used in the lysing step.
【請求項4】 電解採取工程における電解採取後液の少
なくとも一部を抜き出すことによって系内における不純
物の蓄積を防止する請求項1〜3のいずれかに記載の回
収方法。
4. The method according to claim 1, wherein at least a part of the solution after the electrowinning in the electrowinning step is extracted to prevent accumulation of impurities in the system.
JP34528898A 1998-12-04 1998-12-04 Recovery method of high purity indium Expired - Fee Related JP4304254B2 (en)

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JP2006349480A Division JP4310388B2 (en) 2006-12-26 2006-12-26 Indium recovery method

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JP2002069544A (en) * 2000-08-28 2002-03-08 Nikko Materials Co Ltd Method for recovering indium
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KR20040042696A (en) * 2002-11-15 2004-05-20 주식회사 씨에스 이엔지 Method for withdrawing indium from waste-ITO target
KR20040048662A (en) * 2002-12-04 2004-06-10 주식회사 씨에스 이엔지 Method for withdrawing indium from waste-ITO target by using nitric acid
KR100492929B1 (en) * 2002-10-22 2005-05-31 희성금속 주식회사 Purification and Recycling method by the synthesis of In(Ⅲ)β-diketonate from ITO scraps
WO2006080565A1 (en) * 2005-01-31 2006-08-03 Dowa Metals & Mining Co., Ltd. Method for recovering indium
JP2007084432A (en) * 2006-09-26 2007-04-05 Nikko Kinzoku Kk Method for recovering indium hydroxide or indium
WO2008053620A1 (en) 2006-10-24 2008-05-08 Nippon Mining & Metals Co., Ltd. Method for collection of valuable metal from ito scrap
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WO2008099773A1 (en) 2007-02-16 2008-08-21 Nippon Mining & Metals Co., Ltd. Methods of recovering valuable metal from scrap containing electrically conductive oxide
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WO2008117649A1 (en) 2007-03-27 2008-10-02 Nippon Mining & Metals Co., Ltd. Method of recovering valuable metal from scrap containing conductive oxide
JP2008240090A (en) * 2007-03-28 2008-10-09 Dowa Metals & Mining Co Ltd Indium recovery method
JP2009155717A (en) * 2007-12-28 2009-07-16 Dowa Eco-System Co Ltd Method for recovering indium
JP2009185389A (en) * 2009-05-11 2009-08-20 Hitachi Zosen Corp Recycling method for valuable metal
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