JP4301337B2 - Manufacturing method of electro-optical device - Google Patents

Manufacturing method of electro-optical device Download PDF

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JP4301337B2
JP4301337B2 JP2007278633A JP2007278633A JP4301337B2 JP 4301337 B2 JP4301337 B2 JP 4301337B2 JP 2007278633 A JP2007278633 A JP 2007278633A JP 2007278633 A JP2007278633 A JP 2007278633A JP 4301337 B2 JP4301337 B2 JP 4301337B2
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substrate
dust
proof
chip
glass substrate
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JP2008058988A (en
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清一 松島
賢司 村上
博基 丸山
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Seiko Epson Corp
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Description

本発明は、表示装置の外表面にガラス基板を配設する電気光学装置の製造方法に関する。   The present invention relates to a method for manufacturing an electro-optical device in which a glass substrate is disposed on the outer surface of a display device.

電気光学装置の代表である投射型液晶表示装置では、液晶パネルの表面付近に塵埃等が付着すると、それが投射レンズ等により拡大されてスクリーン上に投射され、表示品質を著しく低下させてしまうことになる。これを防止するため、例えば特開2003−140125号公報に開示されているように、液晶パネルの外表面に防塵機能を有するガラス基板を貼付する技術が多く採用されている。   In a projection-type liquid crystal display device, which is representative of an electro-optical device, if dust or the like adheres to the vicinity of the surface of the liquid crystal panel, it is enlarged by a projection lens or the like and projected onto a screen, which significantly reduces display quality. become. In order to prevent this, for example, as disclosed in Japanese Patent Application Laid-Open No. 2003-140125, many techniques for attaching a glass substrate having a dustproof function to the outer surface of a liquid crystal panel are employed.

液晶パネルの外表面をガラス基板で保護することで、液晶パネル面に対する塵埃等の付着が防止できる。更に、ガラス基板外表面に塵埃等が付着しても、この塵埃等と液晶との間の距離がガラス基板の厚み分だけ長くなり、塵埃等の像がデフォーカスされ、スクリーン上に大きくぼやけて表示されるので目立たなくなる。   By protecting the outer surface of the liquid crystal panel with a glass substrate, it is possible to prevent dust and the like from adhering to the liquid crystal panel surface. Furthermore, even if dust adheres to the outer surface of the glass substrate, the distance between the dust and the liquid crystal is increased by the thickness of the glass substrate, and the image of the dust is defocused and greatly blurred on the screen. Because it is displayed, it becomes inconspicuous.

ところで、液晶パネルの表面をガラス基板で保護しても、製造工程において液晶パネルの表面、或いはガラス基板の内面に塵埃等が付着する場合が考えられる。   By the way, even if the surface of the liquid crystal panel is protected by the glass substrate, there may be a case where dust or the like adheres to the surface of the liquid crystal panel or the inner surface of the glass substrate in the manufacturing process.

一般に、ガラス基板は、完成された液晶パネルの外表面に対し、熱硬化型接着剤等を用いて貼付される。接着剤が硬化するまでにはおおよそ数十分から1時間程度必要であり、その間、塵埃等が液晶パネルとガラス基板との間に入り込む可能性がある。   Generally, a glass substrate is attached to the outer surface of a completed liquid crystal panel using a thermosetting adhesive or the like. It takes about several tens of minutes to about an hour for the adhesive to cure, and dust or the like may enter between the liquid crystal panel and the glass substrate during that time.

そのため、ガラス基板を液晶パネルに貼付するに際しては、液晶パネルの一方の面にガラス基板を熱硬化型接着剤を介して貼付すると共に、所定に位置決めした状態で治具フレームにより保持固定することで、熱硬化型接着剤が硬化するまでの間、塵埃が液晶パネルとガラス基板との間に入り込まないようにしている。   Therefore, when affixing a glass substrate to a liquid crystal panel, the glass substrate is affixed to one surface of the liquid crystal panel via a thermosetting adhesive, and held and fixed by a jig frame in a predetermined position. Until the thermosetting adhesive is cured, dust is prevented from entering between the liquid crystal panel and the glass substrate.

特開2004−21056号公報Japanese Patent Laid-Open No. 2004-21056

しかし、上述したガラス基板の貼付に際しては、液晶パネルとガラス基板とを治具フレームに対して一々保持固定させなければならず、しかも、これを液晶パネルの両面に対して個別に行うので、治具フレームの取り付け、取り外しが煩雑化するばかりでなく、接着に要する時間は、1つの液晶パネルに対して熱硬化型接着剤の硬化時間の2倍必要となるため、生産性が悪いという問題がある。   However, when affixing the glass substrate described above, the liquid crystal panel and the glass substrate must be held and fixed to the jig frame one by one, and since this is performed separately on both sides of the liquid crystal panel, the glass substrate is cured. In addition to complicating the attachment and detachment of the tool frame, the time required for adhesion is twice as long as the time for curing the thermosetting adhesive for one liquid crystal panel, resulting in a problem of poor productivity. is there.

又、治具フレームによる液晶パネルとガラス基板との位置決め精度は、精々、数十μ程度であり、位置決め精度をより高めるには限界がある。   In addition, the positioning accuracy between the liquid crystal panel and the glass substrate by the jig frame is about several tens of microns, and there is a limit to further increase the positioning accuracy.

上記目的を達成するため本発明によ電気光学装置の製造方法は、チップ状の第1の基板とチップ状の第2の基板が貼り合わされてなる電気光学装置を複数製造する電気光学装置の製造方法において、チップ状の第1の基板に複数切り出すことができる大型基板を用意し、前記大型基板の第1の基板となる領域に対向するように複数のチップ状の第2の基板をそれぞれ貼り合わせる第2の基板の貼付工程と、前記大型基板の、前記複数のチップ状の第2の基板が貼り合わされている面と反対側の面にチップ状の防塵基板に複数切り出すことができる大型防塵基板を貼付する大型防塵基板貼付工程と、前記大型基板と前記大型防塵基板とを共に前記第1の基板単位で切り出す切り出し工程と、を有し、前記大型防塵基板貼付工程において、前記大型防塵基板上に熱硬化型接着剤を滴下し、次いで減圧雰囲気内で該大型防塵基板上に前記大型基板を載置した後、該大型基板を前記大型防塵基板方向へ押圧し、しかる後に高温雰囲気内で前記熱硬化型接着剤を硬化させることを特徴とする。
Method of manufacturing an electro-optical device that by the present invention for achieving the above object, an electro-optical a plurality producing an electro-optical device comprising a first substrate and a second substrate chip-like chip-shaped is formed by Awa bonding In the method of manufacturing an apparatus, a plurality of large substrates that can be cut out are prepared on a chip-shaped first substrate, and a plurality of chip-shaped second substrates are provided so as to face a region of the large substrate that becomes the first substrate. A plurality of chip-shaped dust-proof substrates on the surface of the large substrate opposite to the surface on which the plurality of chip-shaped second substrates are bonded to each other. it and a large dust-proof substrate attaching step of attaching a large-sized dustproof substrate, anda cutout step of cutting with the said large substrate large dustproof substrate and both the first substrate unit, in the large dustproof substrate bonding step, before A thermosetting adhesive is dropped on the large dust-proof substrate, and then the large substrate is placed on the large dust-proof substrate in a reduced-pressure atmosphere, and then the large substrate is pressed toward the large dust-proof substrate, and then the temperature is increased. The thermosetting adhesive is cured in an atmosphere .

このような構成では、チップ状に切り出すことのできる複数の第1の基板を有する大型基板に対して大型防塵基板を貼付した後、大型基板と大型防塵基板とを共に第1の基板単位で切り出すようにしたので、大型防塵基板は高い位置決め精度を要求されることなく大型基板に貼付することができると共に、切り出しに際しては大型基板と大型防塵基板とが一体で分断されるため、高い位置決め精度を得ることができる。また、大型基板全体を大型防塵基板方向へ押圧するようにしたので、より高い密着度で大型防塵基板と大型基板とを貼付させることができる。
In such a configuration, after attaching the large dust-proof substrate to the large substrate having a plurality of first substrates that can be cut out in a chip shape, both the large substrate and the large dust-proof substrate are cut out in units of the first substrate. As a result, the large dustproof substrate can be affixed to the large substrate without requiring high positioning accuracy, and the large substrate and the large dustproof substrate are divided into one piece when cutting out. Obtainable. Further, since the entire large substrate is pressed toward the large dustproof substrate, the large dustproof substrate and the large substrate can be attached with a higher degree of adhesion.

このような構成では、大型防塵基板に熱硬化型接着剤を滴下した後、大型防塵基板上に大型基板を載置し、次いで大型基板全体を大型防塵基板方向へ押圧するようにしたので、より高い密着度で大型防塵基板と大型基板とを貼付させることができる。
In such a configuration, after dropping large dustproof substrate a heat curable adhesive, the large substrate is placed on a large dustproof substrate, then since so as to press the entire large substrate to a large dustproof substrate direction, more A large dustproof substrate and a large substrate can be attached with high adhesion.

このような構成では、減圧雰囲気内で、所定の押圧力で大型防塵基板と大型基板とを
貼り合わせるようにしたので、大型防塵基板と大型基板との間の気泡を完全に抜気した
状態で密着させることができる。
In such a configuration, since the large dust-proof substrate and the large substrate are bonded to each other with a predetermined pressing force in a reduced pressure atmosphere, the air bubbles between the large dust-proof substrate and the large substrate are completely evacuated. It can be adhered.

また、前記大型防塵基板貼付工程では、前記大型防塵基板の外周に仮止め用の光硬化型接着剤を塗布し設定時間経過後、該光硬化型接着剤に光を照射して硬化させて、その後高温雰囲気内で前記熱硬化型接着剤を硬化させてもよい
Further, in the large dustproof substrate bonding step, said applying a photocurable adhesive for temporary fixing to the outer periphery of a large dust-proof substrate, after the set time, it is cured by irradiating light to the photocurable adhesive Then, the thermosetting adhesive may be cured in a high temperature atmosphere.

このような構成では、高温雰囲気内で熱硬化型接着剤を硬化させる前に、大型防塵基板と大型基板との外周を光硬化型接着剤で接着させて仮止めするようにしたので、高温雰囲気内で大型防塵基板と大型基板が位置ずれすることなく、安定した姿勢で接着される。
In such a configuration, before the thermosetting adhesive is cured in a high temperature atmosphere, the outer periphery of the large dust-proof substrate and the large substrate are temporarily fixed by adhering them with a photocurable adhesive. The large dustproof substrate and the large substrate are bonded in a stable posture without being displaced.

また、チップ状の第1の基板とチップ状の第2の基板とが貼り合わされてなる電気光学装置を複数製造する電気光学装置の製造方法において、チップ状の第1の基板に複数切り出すことができる大型基板を用意し、前記大型基板の第1の基板となる領域に対向するように複数のチップ状の第2の基板をそれぞれ貼り合わせる第2の基板の貼付工程と、前記大型基板の、前記複数のチップ状の第2の基板が貼り合わされている面と反対側の面にチップ状の防塵基板に複数切り出すことができる大型防塵基板を貼付する大型防塵基板貼付工程と、前記大型基板と前記大型防塵基板とを共に前記第1の基板単位で切り出す切り出し工程と、を有し、前記大型防塵基板貼付工程において、前記大型防塵基板上に光硬化型接着剤を塗布した後、該大型防塵基板上に前記大型基板を載置し、次いで該大型基板を前記大型防塵基板方向へ押圧し、その後該光硬化型接着剤に光を照射して硬化させ、前記大型基板前記大型防塵基板方向へ押圧する過程において、該両基板の少なくとも一方が加熱されていることを特徴とする。
Further, in a method of manufacturing an electro-optical device that manufactures a plurality of electro-optical devices in which a chip-shaped first substrate and a chip-shaped second substrate are bonded together, a plurality of chips may be cut out on the chip-shaped first substrate. A large substrate that can be prepared, and a second substrate pasting step in which a plurality of chip-shaped second substrates are respectively pasted so as to face a region to be the first substrate of the large substrate; A large dustproof substrate pasting step for pasting a large dustproof substrate that can be cut into a plurality of chip dustproof substrates on the surface opposite to the surface on which the plurality of chip-like second substrates are bonded; and A cutting step for cutting out the large dust-proof substrate in units of the first substrate, and in the large dust-proof substrate attaching step, after applying a photocurable adhesive on the large dust-proof substrate, Placing the large substrate on a substrate, followed by pressing the large-sized substrate to the large dustproof substrate direction, cured by subsequent irradiation with light to the light curing adhesive, the large substrate the large dustproof substrate direction In the process of pressing to, at least one of the two substrates is heated.

このような構成では、光硬化型接着剤は加熱すると粘性が低下するため、大型基板と大型防塵基板とを光硬化型接着剤を挟んで押圧するに際し、この両基板の少なくとも一方
を加熱することで光硬化型接着剤の拡散性が向上する。
In such a configuration, since the viscosity of the photocurable adhesive decreases when heated, at least one of the two substrates is heated when pressing the large substrate and the large dustproof substrate with the photocurable adhesive interposed therebetween. This improves the diffusibility of the photocurable adhesive.

また、前記光硬化型接着剤を硬化させる光は前記大型防塵基板の前記大型基板が貼り合わされている面と反対側の面から照射されてもよい

Moreover , the light for curing the photocurable adhesive may be irradiated from the surface of the large dustproof substrate opposite to the surface on which the large substrate is bonded.

このような構成では、光硬化型接着剤を硬化させる光を大型防塵基板側から照射させるようにしたので、第1の基板の製造過程で遮光膜等が形成される大型基板側から光を照射する場合に比較し、光を遮断するものが殆ど無く光硬化型接着剤全体を良好に硬化させることができる。
In such a configuration, light for curing the photocurable adhesive is irradiated from the large dust-proof substrate side, so that light is irradiated from the large substrate side on which a light-shielding film or the like is formed in the manufacturing process of the first substrate. Compared with the case where it does, there is almost nothing which blocks light, and the whole photocurable adhesive agent can be hardened favorably.

以下、図面に基づいて本発明の一形態を説明する。図1〜図6に本発明の第1形態を示す。図1は液晶表示装置の概略断面図、図2は大型基板にチップ状の対向基板が貼り合わされた状態の斜視図である。   Hereinafter, an embodiment of the present invention will be described with reference to the drawings. 1 to 6 show a first embodiment of the present invention. FIG. 1 is a schematic sectional view of a liquid crystal display device, and FIG. 2 is a perspective view of a state in which a chip-like counter substrate is bonded to a large substrate.

先ず、図1を参照して液晶表示装置の全体構成について簡単に説明する。尚、図1には駆動回路内蔵型のTFTアクティブマトリクス駆動方式の液晶表示装置が示されている。   First, the overall configuration of the liquid crystal display device will be briefly described with reference to FIG. FIG. 1 shows a TFT active matrix drive type liquid crystal display device with a built-in drive circuit.

図1の符号1は、電気光学装置の代表である液晶表示装置であり、石英ガラス基板等からなる第1の基板としての薄膜トランジスタ(TFT:Thin Film Transistor)基板10と、これに対向配置される石英ガラス基板等からなる第2の基板としての対向基板20とがシール材52を介して貼り合わされて液晶パネル120が形成されており、シール材52によって形成された両基板10,20の対向面間に、電気光学物質としての液晶50が封入されている。   Reference numeral 1 in FIG. 1 denotes a liquid crystal display device that is representative of an electro-optical device, and is disposed opposite to a thin film transistor (TFT) substrate 10 as a first substrate made of a quartz glass substrate or the like. A liquid crystal panel 120 is formed by bonding a counter substrate 20 as a second substrate made of a quartz glass substrate or the like via a sealing material 52, and the opposing surfaces of both the substrates 10 and 20 formed by the sealing material 52. In the meantime, a liquid crystal 50 as an electro-optical material is sealed.

TFT基板10上には画素を構成する画素電極(ITO)9a等がマトリクス状に配置され、又、対向基板20上には全面に対向電極(ITO)21が設けられている。更に、TFT基板10の画素電極9a上、及び対向基板20上の全面に渡って、ラビング処理が施された配向膜16,22が各々形成されている。尚、各配向膜16,22は、ポリイミド膜等の透明な有機膜で構成されている。   Pixel electrodes (ITO) 9a constituting pixels are arranged in a matrix on the TFT substrate 10, and a counter electrode (ITO) 21 is provided on the entire surface of the counter substrate 20. Further, the alignment films 16 and 22 subjected to the rubbing process are formed on the entire surface of the pixel electrode 9a of the TFT substrate 10 and the counter substrate 20, respectively. The alignment films 16 and 22 are made of a transparent organic film such as a polyimide film.

又、TFT基板10のシール材52が形成された領域の外側の一辺に、データ線駆動回路101、及び外部接続端子102が形成されている。尚、図示しないが、この一辺に隣接する2辺に沿って走査線駆動回路が設けられ、更に、残る一辺に、走査線駆動回路間をつなぐ配線パターンが形成されている。   A data line driving circuit 101 and an external connection terminal 102 are formed on one side outside the region where the sealing material 52 of the TFT substrate 10 is formed. Although not shown, a scanning line driving circuit is provided along two sides adjacent to the one side, and a wiring pattern for connecting the scanning line driving circuits is formed on the remaining side.

更に、液晶パネル120の両面に、防塵機能を有する透明なガラス基板(以下「防塵ガラス基板」と称する)30,31が貼設されている。防塵ガラス基板30,31は、塵埃等が液晶パネル120の表面に付着することを防止すると共に、塵埃等が液晶表示面から離間させてデフォーカスすることで、塵埃等の像を目立たなくさせる機能を有する。   Further, transparent glass substrates (hereinafter referred to as “dust-proof glass substrates”) 30 and 31 having a dust-proof function are attached to both surfaces of the liquid crystal panel 120. The dust-proof glass substrates 30 and 31 prevent dust and the like from adhering to the surface of the liquid crystal panel 120 and defocus the dust and the like away from the liquid crystal display surface, thereby making the image of the dust and the like inconspicuous. Have

このような機能を実現するために、防塵ガラス基板30,31は、板厚が1〜3mm程度と比較的厚く形成されており、その材質は、TFT基板30や対向基板20と同一のものが使用されている。又、防塵ガラス基板30,31は、液晶パネル120の表面に対し、TFT基板30や対向基板20(及び防塵ガラス基板30,31)と同じ屈折率に調整されたシリコン系接着剤やアクリル系接着剤等からなる熱硬化型透明接着剤を用いて、TFT基板30と対向基板20の外表面に対し気泡を除去した状態で接着されている。   In order to realize such a function, the dust-proof glass substrates 30 and 31 are formed to be relatively thick with a plate thickness of about 1 to 3 mm, and the material is the same as that of the TFT substrate 30 and the counter substrate 20. in use. Further, the dust-proof glass substrates 30 and 31 are a silicon-based adhesive or acrylic-based adhesive adjusted to the same refractive index as the TFT substrate 30 or the counter substrate 20 (and the dust-proof glass substrates 30 and 31) with respect to the surface of the liquid crystal panel 120 A thermosetting transparent adhesive made of an agent or the like is used to adhere the TFT substrate 30 and the outer surface of the counter substrate 20 with air bubbles removed.

TFT基板10と対向基板20とは、異なる工程を経て個別に製造された後、貼り合わされる。図2に示すように、貼り合わせに際しては、多数のTFT基板10が形成されている大型基板110に対して、チップ状に形成された対向基板20を貼り合わせ、その後、TFT基板10と対向基板20との間に液晶を注入し、封入する。   The TFT substrate 10 and the counter substrate 20 are individually bonded through different processes and then bonded together. As shown in FIG. 2, at the time of bonding, a counter substrate 20 formed in a chip shape is bonded to a large substrate 110 on which a large number of TFT substrates 10 are formed, and then the TFT substrate 10 and the counter substrate are bonded. Liquid crystal is injected between 20 and sealed.

尚、本形態による大型基板110は円板状に形成されているが、形状はこれに限定されるものではなく、例えば矩形状に形成されていても良い。又、図においては、1つの大型基板110に、12個のTFT基板10が形成されているが、1つの大型基板110に形成されるTFT基板10の数は、これに限定されるものではない。   In addition, although the large sized board | substrate 110 by this form is formed in disk shape, a shape is not limited to this, For example, you may form in the rectangular shape. In the figure, twelve TFT substrates 10 are formed on one large substrate 110, but the number of TFT substrates 10 formed on one large substrate 110 is not limited to this. .

又、防塵ガラス基板30,31は、図2に示すような大型基板110に、複数の液晶パネル120が形成されている状態で貼付される。図3に、液晶パネル120に防塵ガラス基板30,31を実装する工程を示す。尚、この作業はクリーンルーム内で行われる。   The dustproof glass substrates 30 and 31 are attached to a large substrate 110 as shown in FIG. 2 in a state where a plurality of liquid crystal panels 120 are formed. FIG. 3 shows a process of mounting the dustproof glass substrates 30 and 31 on the liquid crystal panel 120. This work is performed in a clean room.

工程(a):先ず、大型基板110に複数の液晶パネル120を所定に形成した後、洗浄し、動作状態等の検査を行う。   Step (a): First, after a plurality of liquid crystal panels 120 are formed on a large substrate 110 in a predetermined manner, the liquid crystal panel 120 is cleaned and inspected for its operating state.

工程(b):大型基板110の、対向基板20が貼り合わされている面と反対側の面である外表面(図2の下面)に、大型基板110とほぼ同一かやや小さい形状の大型防塵ガラス基板300を貼付する。尚、大型防塵ガラス基板300は、チップ状に分割されることで防塵ガラス基板30となる。   Step (b): Large dust-proof glass having a shape substantially the same as or slightly smaller than that of the large substrate 110 on the outer surface (the lower surface in FIG. 2) of the large substrate 110 that is the surface opposite to the surface to which the counter substrate 20 is bonded. A substrate 300 is attached. The large dust-proof glass substrate 300 becomes the dust-proof glass substrate 30 by being divided into chips.

工程(c):その後、全体を洗浄した後、各対向基板20の、大型基板110に対向する面と反対側の面である外表面(図2の上面)に対向基板20とほぼ同形状の小型防塵ガラス基板31を貼付する。   Step (c): After that, the entire substrate is cleaned, and the outer surface (upper surface in FIG. 2), which is the surface opposite to the surface facing the large substrate 110, of each counter substrate 20 has substantially the same shape as the counter substrate 20. A small dust-proof glass substrate 31 is attached.

工程(d):大型基板110の対向基板20が張り合わされている面にスクライブラインLを形成し、スクライブラインLに沿って大型基板110を分割し、チップ状の液晶表示装置1を切り出す。このとき大型防塵ガラス基板300も、チップ状の防塵ガラス基板30に切り出される。   Step (d): A scribe line L is formed on the surface of the large substrate 110 where the counter substrate 20 is bonded, the large substrate 110 is divided along the scribe line L, and the chip-like liquid crystal display device 1 is cut out. At this time, the large dustproof glass substrate 300 is also cut out into the chip-shaped dustproof glass substrate 30.

尚、防塵ガラス基板30,31の実装工程においては、工程(b)と工程(c)とを入れ換え、大型基板110に大型防塵ガラス基板300を貼付する前に、対向基板20に対して小型防塵ガラス基板31を貼付するようにしても良い。   In the mounting process of the dust-proof glass substrates 30 and 31, the process (b) and the process (c) are interchanged, and before the large dust-proof glass substrate 300 is attached to the large-sized substrate 110, the small dust-proof glass is applied to the counter substrate 20. You may make it affix the glass substrate 31. FIG.

次に、図3(b)に示す大型防塵ガラス基板300の貼付け工程について、図4の工程図を参照しながら更に詳しく説明する。   Next, the process of attaching the large dustproof glass substrate 300 shown in FIG. 3B will be described in more detail with reference to the process diagram of FIG.

工程(a):ステージ40上に大型防塵ガラス基板300を載置し、その中央に大型防塵ガラス基板300と同じ屈折率に調整されたシリコン系接着剤やアクリル系接着剤等からなる熱硬化型透明接着剤41を滴下し、又、周囲に光の代表である紫外線を照射することで硬化する紫外線硬化型接着剤42を塗布する。   Step (a): A thermosetting type comprising a silicon-based adhesive or an acrylic adhesive adjusted to have the same refractive index as that of the large dust-proof glass substrate 300 placed on the stage 40 and placed in the center thereof. A transparent adhesive 41 is dropped, and an ultraviolet curable adhesive 42 that is cured by irradiating ultraviolet rays, which is representative of light, around the periphery is applied.

尚、紫外線硬化型接着剤42は仮固定用であるため、大型防塵ガラス基板300の全周に塗布する必要はなく、所定間隔毎に塗布するようにしても良い。   Since the ultraviolet curable adhesive 42 is for temporary fixing, it is not necessary to apply it to the entire circumference of the large dustproof glass substrate 300, and it may be applied at predetermined intervals.

次いで、大型防塵ガラス基板300上に、複数の液晶パネル120が形成されている大型基板110を対向させ、その状態で減圧室130へ搬送する。   Next, the large substrate 110 on which the plurality of liquid crystal panels 120 are formed is opposed to the large dust-proof glass substrate 300 and is conveyed to the decompression chamber 130 in that state.

工程(b):減圧室130に大型防塵ガラス基板300が搬入された後、室内を減圧し、設定圧力(例えば2.5[Pa])程度に到達した後、300[sec]程度経過するまで、放置する。或いは、減圧室130が予め設定した圧力(例えば1.0[Pa])程度に達するまで放置する。   Step (b): After the large dust-proof glass substrate 300 is carried into the decompression chamber 130, the interior is decompressed, and after reaching a set pressure (for example, 2.5 [Pa]), it is left until about 300 [sec] elapses. To do. Alternatively, the decompression chamber 130 is left until reaching a preset pressure (for example, 1.0 [Pa]).

工程(c):減圧室130が工程(b)で設定した状態に達した後、大型基板110を大型防塵ガラス基板300上に、昇降装置43を介し、例えば0.5[mm/sec]程度の落とし込み速度で静かに載置し、貼り合わせる。尚、このときの大型基板110と大型防塵ガラス基板300とは、大判同士であり、最終的には液晶表示装置1として個々に切り出されるため、高精度に位置決めする必要はない。   Step (c): After the decompression chamber 130 reaches the state set in step (b), the large substrate 110 is dropped onto the large dust-proof glass substrate 300 through the lifting device 43, for example, about 0.5 [mm / sec]. Place it gently at a speed and paste it together. Note that the large substrate 110 and the large dust-proof glass substrate 300 at this time are large, and are finally cut out individually as the liquid crystal display device 1, and therefore do not need to be positioned with high accuracy.

そして、所定時間(例えば300[sec]程度)、放置する。すると、大型基板110は自重により大型防塵ガラス基板300上に近接され、その結果、大型防塵ガラス基板300の中央に滴下された熱硬化型透明接着剤41が周囲へ拡散される。   Then, it is left for a predetermined time (for example, about 300 [sec]). Then, the large substrate 110 is brought close to the large dust-proof glass substrate 300 by its own weight, and as a result, the thermosetting transparent adhesive 41 dropped on the center of the large dust-proof glass substrate 300 is diffused to the surroundings.

工程(d):大型基板110上全体に加圧ヘッド44を、上方から下降させて当接し、この大型基板110を、所定加圧力(例えば100[g/cm2]程度)で、所定時間(例えば180[sec]程度)だけ押圧する。すると、大型基板110と大型防塵ガラス基板300との間の空気が抜気されながら、熱硬化型透明接着剤41が周囲へ拡散し、両基板110,300が、高い密着度で貼り合わされる。 Step (d): The pressure head 44 is lowered and brought into contact with the entire large substrate 110 from above, and the large substrate 110 is brought into contact with the predetermined pressure (for example, about 100 [g / cm 2 ]) for a predetermined time ( (For example, about 180 [sec]). Then, while the air between the large substrate 110 and the large dust-proof glass substrate 300 is vented, the thermosetting transparent adhesive 41 diffuses to the surroundings, and the two substrates 110 and 300 are bonded together with high adhesion.

工程(e):工程(d)において、所定時間(例えば180[sec]程度)経過した後、減圧室130を徐々に昇圧し、大気圧に達した後、減圧室130から互いに貼り合わされた両基板110,300を取り出し、大型防塵ガラス基板300の周囲に塗布されている紫外線硬化型接着剤42に、紫外線45をスポット照射して硬化させ、両基板110,300を仮固定する。   Step (e): In step (d), after a predetermined time (for example, about 180 [sec]) has elapsed, the decompression chamber 130 is gradually increased in pressure to reach atmospheric pressure, and then the two bonded together from the decompression chamber 130 are combined. The substrates 110 and 300 are taken out, the ultraviolet curable adhesive 42 applied around the large dust-proof glass substrate 300 is cured by spot irradiation with ultraviolet rays 45, and both the substrates 110 and 300 are temporarily fixed.

工程(f):紫外線硬化型接着剤42により仮固定されている両基板110,300を、所定温度(例えば80[℃]程度)に加熱されている高温室131へ搬送し、この中で所定時間(例えば1.5[h]程度)、放置し、熱硬化型透明接着剤41を硬化させて両基板110,300を接着する。大型基板110と大型防塵ガラス基板300とは紫外線硬化型接着剤42にて仮止めされているため、位置ずれすることなく安定した姿勢で接着される。   Step (f): Both substrates 110 and 300 temporarily fixed by the ultraviolet curable adhesive 42 are transported to a high temperature chamber 131 heated to a predetermined temperature (for example, about 80 [° C.]), in which a predetermined The substrate is left to stand for a period of time (for example, about 1.5 [h]), and the thermosetting transparent adhesive 41 is cured to bond the substrates 110 and 300 together. Since the large substrate 110 and the large dustproof glass substrate 300 are temporarily fixed by the ultraviolet curable adhesive 42, they are bonded in a stable posture without being displaced.

そして、所定時間(例えば1.5[h]程度)経過後に、高温室131から互いに接着されている両基板110,300を取り出し、所定に冷却させて、大型防塵ガラス基板300の貼り合わせを完了する。   Then, after elapse of a predetermined time (for example, about 1.5 [h]), the two substrates 110 and 300 bonded to each other are taken out from the high temperature chamber 131 and cooled to a predetermined level to complete the bonding of the large dustproof glass substrate 300.

紫外線硬化型接着剤の硬化時間を比較的長く設定しても、一度に全体が接着されるため、トータル的な硬化時間は、個別に硬化させる場合に比し、大幅に短縮させることができ、その分、生産性を向上させることができる。   Even if the curing time of the UV curable adhesive is set relatively long, the whole is bonded at once, so the total curing time can be greatly reduced compared to the case of individual curing, Accordingly, productivity can be improved.

次に、図3(c)に示す防塵ガラス基板(以下、「小型防塵ガラス基板」と称する)31の貼付け工程について、図5の工程図を参照しながら更に詳しく説明する。尚、小型防塵ガラス基板31は大気圧中で貼付される。   Next, the attaching process of the dustproof glass substrate (hereinafter referred to as “small dustproof glass substrate”) 31 shown in FIG. 3C will be described in more detail with reference to the process diagram of FIG. In addition, the small dustproof glass substrate 31 is stuck in atmospheric pressure.

工程(a):所定温度(例えば70〜80[℃]程度)に加熱されている加熱手段としてのホットプレート46上に、大型防塵ガラス基板300が接着されている大型基板110を載置する。次いで、1つの対向基板20の上面中央に熱硬化型透明接着剤41を滴下する。尚、このホットプレート46は、図示しないステージ上に載置されている。   Step (a): A large substrate 110 to which a large dust-proof glass substrate 300 is bonded is placed on a hot plate 46 as a heating means heated to a predetermined temperature (for example, about 70 to 80 [° C.]). Next, a thermosetting transparent adhesive 41 is dropped on the center of the upper surface of one counter substrate 20. The hot plate 46 is placed on a stage (not shown).

一方、この対向基板20の上方には加熱ヘッド47が対設されている。加熱ヘッド47と大型基板110を載置するホットプレート46とは相対移動自在にされており、所定に位置決めされた状態で対設される。   On the other hand, a heating head 47 is provided above the counter substrate 20. The heating head 47 and the hot plate 46 on which the large substrate 110 is placed are movable relative to each other, and are opposed to each other in a predetermined position.

この加熱ヘッド47の下端面に小型防塵ガラス基板31が吸着されている。加熱ヘッド47の下端面にはヒータが配設されていると共に、吸引口が開孔されており、この吸引口に吸引ポンプ(図示せず)が連通されている。小型防塵ガラス基板31は、加熱ヘッド47の下端面に吸引ポンプの吸引力にて吸着されており、且つヒータにて85〜100[℃]程度に加熱されている。   A small dust-proof glass substrate 31 is adsorbed to the lower end surface of the heating head 47. A heater is disposed on the lower end surface of the heating head 47 and a suction port is opened. A suction pump (not shown) is communicated with the suction port. The small dust-proof glass substrate 31 is adsorbed to the lower end surface of the heating head 47 by the suction force of the suction pump, and is heated to about 85 to 100 [° C.] by the heater.

工程(b):加熱ヘッド47を下降させ、その下端面に吸着されている小型防塵ガラス基板31を、対向基板20の上面に当接させ、所定時間(例えば10〜20[sec]程度)、所定圧着力(例えば0.15[Kg/cm2]程度)で押圧し、小型防塵ガラス基板31を対向基板20に圧着する。 Step (b): The heating head 47 is lowered, the small dust-proof glass substrate 31 adsorbed on the lower end surface thereof is brought into contact with the upper surface of the counter substrate 20, and a predetermined time (for example, about 10 to 20 [sec]), The small dustproof glass substrate 31 is pressed against the counter substrate 20 by pressing with a predetermined pressure (for example, about 0.15 [Kg / cm 2 ]).

すると、熱硬化型透明接着剤41が周囲へ拡散すると共に、ホットプレート46により、70〜80[℃]程度に加熱されている大型基板110と、ヒータにより、85〜100[℃]程度に加熱されている小型防塵ガラス基板31とにより加熱されて硬化される。   Then, the thermosetting transparent adhesive 41 diffuses to the surroundings, and is heated to about 85 to 100 [° C.] by the large substrate 110 heated to about 70 to 80 [° C.] by the hot plate 46 and the heater. The small dustproof glass substrate 31 is heated and cured.

尚、熱硬化型透明接着剤41の硬化時間は、加熱ヘッド47による小型防塵ガラス基板31の加熱温度と、ホットプレート46による大型基板110の加熱温度とによって決定され、加熱ヘッド47の圧着時間は、この熱硬化型透明接着剤41の硬化時間に応じて設定される。   The curing time of the thermosetting transparent adhesive 41 is determined by the heating temperature of the small dustproof glass substrate 31 by the heating head 47 and the heating temperature of the large substrate 110 by the hot plate 46. The thermosetting transparent adhesive 41 is set according to the curing time.

図6に示すように、加熱ヘッド47の圧着力を一定とした状態で、加熱ヘッド47による加熱温度、ホットプレート46による加熱温度、及び加熱ヘッド47の圧着時間の条件を種々変更して、熱硬化型透明接着剤41の硬化の可否を調べた。その結果、条件6が最も短い時間で効率よく熱硬化型透明接着剤41を硬化させることができる。   As shown in FIG. 6, with the pressure of the heating head 47 fixed, the heating temperature by the heating head 47, the heating temperature by the hot plate 46, and the conditions for the pressure bonding time of the heating head 47 are variously changed. Whether the curable transparent adhesive 41 could be cured was examined. As a result, the thermosetting transparent adhesive 41 can be efficiently cured in the time in which condition 6 is the shortest.

工程(c):加熱ヘッド47による小型防塵ガラス基板31の圧着時間が所定圧着時間に達した後、すなわち、熱硬化型透明接着剤41が硬化した後、加熱ヘッド47を上昇させる。すると、小型防塵ガラス基板31は熱硬化型透明接着剤41により対向基板20に接着されているため、加熱ヘッド47の下端面から離間し、小型防塵ガラス基板31の接着が完了する。   Step (c): After the pressure bonding time of the small dustproof glass substrate 31 by the heating head 47 reaches a predetermined pressure bonding time, that is, after the thermosetting transparent adhesive 41 is cured, the heating head 47 is raised. Then, since the small dustproof glass substrate 31 is bonded to the counter substrate 20 by the thermosetting transparent adhesive 41, the small dustproof glass substrate 31 is separated from the lower end surface of the heating head 47 and the bonding of the small dustproof glass substrate 31 is completed.

次いで、ホットプレート46を載置するステージ(図示せず)と加熱ヘッド47とを相対移動させて、隣の対向基板20上に加熱ヘッド47を対設すると共に、上述した各工程(a)〜(c)と同一の工程を繰り返して、当該対向基板20に小型防塵ガラス基板31を接着する。これを残りの対向基板20に対して繰り返すことで、大型基板110に貼り合わされている全ての対向基板20の外表面に対して小型防塵ガラス基板31を接着する。   Next, a stage (not shown) on which the hot plate 46 is placed and the heating head 47 are moved relative to each other so that the heating head 47 is disposed on the adjacent counter substrate 20 and each of the above-described steps (a) to (a) to (b). The same process as (c) is repeated to bond the small dustproof glass substrate 31 to the counter substrate 20. By repeating this for the remaining counter substrates 20, the small dust-proof glass substrate 31 is bonded to the outer surface of all the counter substrates 20 bonded to the large substrate 110.

このように、本形態によれば、液晶パネル120の外表面に防塵ガラス基板300,31を貼付する作業を、液晶パネル120を大型基板110からチップ状に切り出す前の工程で行うようにしたので、大型基板110の外表面に対し、1枚の大型防塵ガラス基板300を貼付するだけで良くなり、貼付け工数の大幅な削減を図ることができる。又、大型防塵ガラス基板300は大型基板110と同時に切り出されることで、TFT基板10の外表面を保護する防塵ガラス基板30となるため、大型防塵ガラス基板300を大型基板110に貼付するに際しては、高い位置決め精度が要求されなくなり、作業効率が向上する。   As described above, according to the present embodiment, the operation of attaching the dust-proof glass substrates 300 and 31 to the outer surface of the liquid crystal panel 120 is performed in a step before the liquid crystal panel 120 is cut out from the large substrate 110 into a chip shape. It is only necessary to attach one large dust-proof glass substrate 300 to the outer surface of the large substrate 110, and the number of pasting steps can be greatly reduced. Further, since the large dustproof glass substrate 300 is cut out simultaneously with the large substrate 110, the dustproof glass substrate 30 protects the outer surface of the TFT substrate 10. Therefore, when attaching the large dustproof glass substrate 300 to the large substrate 110, High positioning accuracy is not required, and work efficiency is improved.

一方、対向基板20の外表面に対して小型防塵ガラス基板31を貼付する工程では、大型基板110をホットプレート46で加熱し、且つ、小型防塵ガラス基板31を加熱ヘッド47で加熱すると共に、圧着力を印加した状態で小型防塵ガラス基板31を貼付させるようにしたので、熱硬化型透明接着剤41の硬化時間を短縮させることができる。その結果、1つ1つの貼付工程に要する時間が短縮され、作業時間が大幅に削減され、高い生産性を得ることができる。更に、小型防塵ガラス基板31は、対向基板20に対して上方から所定に位置決めされた状態で、1つずつ接着されるため、高い精度の位置決めを行うことができる。   On the other hand, in the step of attaching the small dustproof glass substrate 31 to the outer surface of the counter substrate 20, the large substrate 110 is heated by the hot plate 46, and the small dustproof glass substrate 31 is heated by the heating head 47 and is subjected to pressure bonding. Since the small dust-proof glass substrate 31 is stuck with the force applied, the curing time of the thermosetting transparent adhesive 41 can be shortened. As a result, the time required for each sticking process is shortened, the working time is greatly reduced, and high productivity can be obtained. Furthermore, since the small dust-proof glass substrate 31 is bonded one by one in a state where the small dust-proof glass substrate 31 is positioned with respect to the counter substrate 20 from above, high-precision positioning can be performed.

更に、治具フレームを用いることなく、防塵ガラス基板30,31を液晶パネル120の外表面に貼付することができるので、治具フレームの組付け、解体等に要する工程が不要となり、作業工数の大幅な削減を図ることができる。   Furthermore, since the dust-proof glass substrates 30 and 31 can be attached to the outer surface of the liquid crystal panel 120 without using a jig frame, the steps required for assembly and disassembly of the jig frame are not required, and the number of work steps is reduced. Significant reduction can be achieved.

又、図7、図8に本発明の第2形態を示す。上述した第1形態では大型防塵ガラス基板300、及び小型防塵ガラス基板31を、大型基板110、対向基板20に対し、熱硬化型透明接着剤41を用いて接着しているが、本形態では、光硬化(可視光或いは紫外線)型透明接着剤を用いて接着するようにしたものである。   7 and 8 show a second embodiment of the present invention. In the first embodiment described above, the large dustproof glass substrate 300 and the small dustproof glass substrate 31 are bonded to the large substrate 110 and the counter substrate 20 using the thermosetting transparent adhesive 41. Bonding is performed using a photo-curing (visible light or ultraviolet ray) type transparent adhesive.

すなわち、本形態では、大型防塵ガラス基板300の貼付け工程においては、第1形態の図4に示す工程に代えて、図7に示す工程を採用する。   That is, in this embodiment, the step shown in FIG. 7 is adopted in place of the step shown in FIG. 4 of the first embodiment in the step of attaching the large dustproof glass substrate 300.

工程(a):所定温度(例えば40〜50[℃]程度)に加熱されている加熱手段としてのホットプレート400上に大型防塵ガラス基板300を載置し、その中央に大型防塵ガラス基板300と同じ屈折率に調整されたシリコン系接着剤やアクリル系接着剤等からなる光硬化(可視光或いは紫外線)型透明接着剤410を滴下する。光硬化型透明接着剤410は、加熱することで粘性が低下する性質を有している。従って、ホットプレート400によって所定温度に加熱されている大型防塵ガラス基板300上に滴下された光硬化型透明接着剤410は粘性が低下し、拡散性が向上する。   Step (a): A large dust-proof glass substrate 300 is placed on a hot plate 400 serving as a heating means heated to a predetermined temperature (for example, about 40 to 50 [° C.]), and the large dust-proof glass substrate 300 and A photo-curing (visible light or ultraviolet ray) type transparent adhesive 410 made of a silicon adhesive, an acrylic adhesive or the like adjusted to the same refractive index is dropped. The photocurable transparent adhesive 410 has a property that the viscosity is lowered by heating. Accordingly, the viscosity of the photocurable transparent adhesive 410 dropped on the large dustproof glass substrate 300 heated to a predetermined temperature by the hot plate 400 is reduced, and the diffusibility is improved.

次いで、大型防塵ガラス基板300上に、複数の液晶パネル120が形成されている大型基板110を対向させ、その状態で減圧室130へ搬送する。   Next, the large substrate 110 on which the plurality of liquid crystal panels 120 are formed is opposed to the large dust-proof glass substrate 300 and is conveyed to the decompression chamber 130 in that state.

工程(b):減圧室130に大型防塵ガラス基板300が搬入された後、室内を減圧し、設定圧力(例えば2.5[Pa])程度に到達した後、300[sec]程度経過するまで、放置する。或いは、減圧室130が予め設定した圧力(例えば1.0[Pa])程度に達するまで放置する。   Step (b): After the large dust-proof glass substrate 300 is carried into the decompression chamber 130, the interior is decompressed, and after reaching a set pressure (for example, 2.5 [Pa]), it is left until about 300 [sec] elapses. To do. Alternatively, the decompression chamber 130 is left until reaching a preset pressure (for example, 1.0 [Pa]).

工程(c):減圧室130が工程(b)で設定した状態に達した後、大型基板110を大型防塵ガラス基板300上に、昇降装置43を介し、例えば0.5[mm/sec]程度の落とし込み速度で静かに載置し、貼り合わせる。尚、このときの大型基板110と大型防塵ガラス基板300とは、大判同士であり、最終的には液晶表示装置1として個々に切り出されるため、高精度に位置決めする必要はない。   Step (c): After the decompression chamber 130 reaches the state set in step (b), the large substrate 110 is dropped onto the large dust-proof glass substrate 300 through the lifting device 43, for example, about 0.5 [mm / sec]. Place it gently at a speed and paste it together. Note that the large substrate 110 and the large dust-proof glass substrate 300 at this time are large, and are finally cut out individually as the liquid crystal display device 1, and therefore do not need to be positioned with high accuracy.

そして、所定時間(例えば300[sec]程度)、放置する。すると、大型基板110は自重により大型防塵ガラス基板300上に近接され、その結果、大型防塵ガラス基板300の中央に滴下された光硬化型透明接着剤410が周囲へ拡散される。この光硬化型透明接着剤410は、ホットプレート400により加熱されている大型防塵ガラス基板300の熱を受けて粘性が低下しているため、良好な拡散性を得ることができる。   Then, it is left for a predetermined time (for example, about 300 [sec]). Then, the large substrate 110 is brought close to the large dust-proof glass substrate 300 by its own weight, and as a result, the photocurable transparent adhesive 410 dropped on the center of the large dust-proof glass substrate 300 is diffused to the surroundings. This photo-curing transparent adhesive 410 receives good heat from the large dust-proof glass substrate 300 heated by the hot plate 400 and has reduced viscosity, so that it can obtain good diffusibility.

工程(d):大型基板110上全体に加圧ヘッド44を、上方から下降させて当接し、この大型基板110を、所定加圧力(例えば100[g/cm2]程度)で、所定時間(例えば180[sec]程度)だけ均等に押圧する。すると、大型基板110と大型防塵ガラス基板300との間の空気が抜気されながら、光硬化型透明接着剤410が周囲へ拡散し、両基板110,300が、高い密着度で貼り合わされる。 Step (d): The pressure head 44 is lowered and brought into contact with the entire large substrate 110 from above, and the large substrate 110 is brought into contact with the predetermined pressure (for example, about 100 [g / cm 2 ]) for a predetermined time ( For example, press evenly by about 180 [sec]. Then, while the air between the large substrate 110 and the large dust-proof glass substrate 300 is vented, the photocurable transparent adhesive 410 diffuses to the surroundings, and the two substrates 110 and 300 are bonded together with high adhesion.

工程(e):工程(d)において、所定時間(例えば180[sec]程度)経過した後、減圧室130を徐々に昇圧し、大気圧に達した後、減圧室130から互いに貼り合わされた両基板110,300を取り出し、光が透過する透明なステージ420上に載置し、下方から光照射器500を用いて大型防塵ガラス基板300と大型基板110との間に介装されている光硬化型透明接着剤410に、光を照射して、この光硬化型透明接着剤410を硬化させ、大型基板110に対する大型防塵ガラス基板300の貼り合わせを完了する。   Step (e): After a predetermined time (for example, about 180 [sec]) has elapsed in step (d), the pressure in the decompression chamber 130 is gradually increased to reach atmospheric pressure, and then the two bonded together from the decompression chamber 130. The substrates 110 and 300 are taken out, placed on a transparent stage 420 through which light is transmitted, and light curing is performed between the large dustproof glass substrate 300 and the large substrate 110 using the light irradiator 500 from below. The mold transparent adhesive 410 is irradiated with light to cure the photocurable transparent adhesive 410, and the bonding of the large dustproof glass substrate 300 to the large substrate 110 is completed.

尚、光硬化型透明接着剤410として紫外線硬化型透明接着剤を用いている場合は、光照射器500から照射される光は紫外線であり、又、可視光硬化型透明接着剤を用いている場合は、光照射器500から照射される光は、例えば410[nm]以上の波長領域を有する可視光線である。   In the case where an ultraviolet curable transparent adhesive is used as the light curable transparent adhesive 410, the light emitted from the light irradiator 500 is ultraviolet light, and a visible light curable transparent adhesive is used. In this case, the light emitted from the light irradiator 500 is visible light having a wavelength region of, for example, 410 [nm] or more.

光(紫外線)硬化型透明接着剤410は、3000[mJ/cm2]程度の光照射量で硬化するものを採用した場合、例えば出力が500[w]では、照射時間が6[sec]程度でよいことになる。この照射時間は、出力に応じて自由に設定することができる。従って、熱硬化型透明接着剤41を採用する第1形態に比し、硬化時間を大幅に短縮することができ、その分、生産性が向上する。又、光硬化型透明接着剤410は瞬時に硬化させることができるため、第1形態のように、大型防塵ガラス基板300の周囲を紫外線硬化型接着剤を用いて仮固定する必要がなく、その分、製造工程の簡素化を実現することもできる。 When the light (ultraviolet) curable transparent adhesive 410 is cured with a light irradiation amount of about 3000 [mJ / cm 2 ], for example, when the output is 500 [w], the irradiation time is about 6 [sec]. It will be good. This irradiation time can be freely set according to the output. Therefore, compared with the 1st form which employ | adopts the thermosetting type transparent adhesive 41, hardening time can be shortened significantly and productivity is improved by that much. Further, since the photo-curing transparent adhesive 410 can be cured instantaneously, there is no need to temporarily fix the periphery of the large dust-proof glass substrate 300 using an ultraviolet-curing adhesive as in the first embodiment. Therefore, the manufacturing process can be simplified.

ところで、光硬化型透明接着剤410を硬化させるに際しては、光を対向基板20側、すなわち、図7(e)の上方から照射することも可能である。しかし、対向基板20の内面側には、表示領域を区画する遮光膜が形成されているので、上方から照射される光は、遮光膜により遮断され易く、従って、光照射は光を遮断するものが殆ど無い大型防塵ガラス基板300側から行うことが好ましい。   By the way, when the photocurable transparent adhesive 410 is cured, it is possible to irradiate light from the counter substrate 20 side, that is, from above in FIG. However, since the light shielding film that divides the display area is formed on the inner surface side of the counter substrate 20, the light irradiated from above is easily blocked by the light shielding film, and thus the light irradiation blocks the light. It is preferable to carry out from the side of the large dust-proof glass substrate 300 where there is almost no.

次に、小型防塵ガラス基板31の貼付け工程について説明する。本形態による小型防塵ガラス基板31の貼付け工程は、第1形態の図5に示す工程に代えて、図8に示す工程を採用する。尚、この小型防塵ガラス基板31は大気圧中で貼付される。   Next, the sticking process of the small dustproof glass substrate 31 will be described. The process shown in FIG. 8 is adopted for the attaching process of the small dustproof glass substrate 31 according to this embodiment instead of the process shown in FIG. 5 of the first embodiment. In addition, this small dustproof glass substrate 31 is stuck in atmospheric pressure.

工程(a):光が透過する透明なプレート(以下「光透過プレート」と称する)460上に、大型防塵ガラス基板300が接着されている大型基板110を載置する。次いで、1つの対向基板20の上面中央に、光硬化型透明接着剤410を滴下する。   Step (a): A large substrate 110 to which a large dust-proof glass substrate 300 is bonded is placed on a transparent plate (hereinafter referred to as “light transmitting plate”) 460 through which light is transmitted. Next, a photocurable transparent adhesive 410 is dropped on the center of the upper surface of one counter substrate 20.

一方、この対向基板20の上方には加熱ヘッド470が対設されている。加熱ヘッド470と大型基板110を載置する光透過プレート460とは相対移動自在にされており、所定に位置決めされた状態で対設される。   On the other hand, a heating head 470 is provided above the counter substrate 20. The heating head 470 and the light transmission plate 460 on which the large substrate 110 is placed are relatively movable, and are opposed to each other in a predetermined position.

この加熱ヘッド470の下端面に小型防塵ガラス基板31が吸着されている。この加熱ヘッド470の構成は第1形態の加熱ヘッド47と同様である。小型防塵ガラス基板31は、加熱ヘッド470の下端面に吸引ポンプの吸引力にて吸着されており、且つヒータにて40〜50[℃]程度に加熱されている。   A small dust-proof glass substrate 31 is adsorbed to the lower end surface of the heating head 470. The configuration of the heating head 470 is the same as that of the heating head 47 of the first embodiment. The small dust-proof glass substrate 31 is adsorbed to the lower end surface of the heating head 470 by the suction force of the suction pump, and is heated to about 40 to 50 [° C.] by the heater.

工程(b):加熱ヘッド470を下降させ、その下端面に吸着されている小型防塵ガラス基板31を、対向基板20の上面に均等に当接させ、所定時間(例えば10〜20[sec]程度)、所定圧着力(例えば0.15[Kg/cm2]程度)で押圧し、小型防塵ガラス基板31を対向基板20に圧着する。対向基板20は加熱ヘッド470により40〜50[℃]程度に加熱されているため、対向基板20が光硬化型透明接着剤410に接触すると、この光硬化型透明接着剤410が加熱されて粘性が低下し、周囲へ良好に拡散される。 Step (b): The heating head 470 is lowered, and the small dust-proof glass substrate 31 adsorbed on the lower end surface of the heating head 470 is brought into uniform contact with the upper surface of the counter substrate 20 for a predetermined time (eg, about 10 to 20 [sec]) ) And pressing with a predetermined pressure (for example, about 0.15 [Kg / cm 2 ]), and the small dust-proof glass substrate 31 is pressure-bonded to the counter substrate 20. Since the counter substrate 20 is heated to about 40 to 50 [° C.] by the heating head 470, when the counter substrate 20 comes into contact with the photocurable transparent adhesive 410, the photocurable transparent adhesive 410 is heated and becomes viscous. Decreases and diffuses well to the surroundings.

そして、光硬化型透明接着剤410が対向基板20と小型防塵ガラス基板31との間に均一に拡散された後、光透過プレート460の下方に配設されている光ファイバ510から、対向基板20と小型防塵ガラス基板31との間に介装されている光硬化型透明接着剤410に対して光を照射する。この場合においても、上述と同様、光硬化型透明接着剤410として紫外線硬化型透明接着剤を採用し、3000[mJ/cm2]程度の光照射量で硬化するとした場合、例えば出力が500[w]では、照射時間が6[sec]程度でよいことになる。 Then, after the light curable transparent adhesive 410 is uniformly diffused between the counter substrate 20 and the small dust-proof glass substrate 31, the optical fiber 510 disposed below the light transmission plate 460 is used to transmit the counter substrate 20. The light-curing transparent adhesive 410 interposed between the small dust-proof glass substrate 31 and the small dust-proof glass substrate 31 is irradiated with light. Also in this case, as described above, when an ultraviolet curable transparent adhesive is used as the light curable transparent adhesive 410 and cured with a light irradiation amount of about 3000 [mJ / cm 2 ], for example, an output of 500 [ For w], the irradiation time may be about 6 [sec].

従って、この場合においても、熱硬化型透明接着剤41を採用する第1形態に比し、硬化時間を大幅に短縮することができ、その分、生産性が向上する。   Accordingly, even in this case, the curing time can be significantly reduced as compared with the first embodiment employing the thermosetting transparent adhesive 41, and the productivity is improved accordingly.

工程(c):光硬化型透明接着剤410が所定に硬化した後、加熱ヘッド470を上昇させる。すると、小型防塵ガラス基板31は光硬化型透明接着剤410により対向基板20に接着されているため、加熱ヘッド470の下端面から離間し、小型防塵ガラス基板31の接着が完了する。   Step (c): After the photocurable transparent adhesive 410 is cured to a predetermined level, the heating head 470 is raised. Then, since the small dustproof glass substrate 31 is bonded to the counter substrate 20 by the photocurable transparent adhesive 410, the small dustproof glass substrate 31 is separated from the lower end surface of the heating head 470 and the bonding of the small dustproof glass substrate 31 is completed.

次いで、光透過プレート460と加熱ヘッド470とを相対移動させて、隣の対向基板20上に加熱ヘッド470を対設すると共に、上述した各工程(a)〜(c)と同一の工程を繰り返して、当該対向基板20に小型防塵ガラス基板31を接着する。これを残りの対向基板20に対して繰り返すことで、大型基板110に貼り合わされている全ての対向基板20の外表面に対して小型防塵ガラス基板31を接着する。   Next, the light transmission plate 460 and the heating head 470 are moved relative to each other so that the heating head 470 is disposed on the adjacent counter substrate 20 and the same steps as the above-described steps (a) to (c) are repeated. Then, the small dust-proof glass substrate 31 is bonded to the counter substrate 20. By repeating this for the remaining counter substrates 20, the small dust-proof glass substrate 31 is bonded to the outer surface of all the counter substrates 20 bonded to the large substrate 110.

この場合、光ファイバ510を用いて、各対向基板20毎に光を照射せず、大型基板110全体に、図示しない光照射器を用いて光を照射するようにしても良い。   In this case, the optical fiber 510 may be used to irradiate the entire large substrate 110 with light using a light irradiator (not shown) without irradiating each counter substrate 20 with light.

このように、本形態によれば、液晶パネル120の外表面に防塵ガラス基板300,31を貼付するに際し、接着剤として光硬化型透明接着剤410を採用したので、硬化時間を大幅に短縮することができ、その分、生産効率の向上を図ることができる。   As described above, according to the present embodiment, when the dust-proof glass substrates 300 and 31 are attached to the outer surface of the liquid crystal panel 120, the photo-curing transparent adhesive 410 is used as the adhesive, so that the curing time is significantly shortened. The production efficiency can be improved accordingly.

又、光硬化型透明接着剤410は加熱されて粘性が低下された状態で防塵ガラス基板300,31と基板110,20との間に拡散されるので、光硬化型透明接着剤410を均質に拡散させることができる。   Further, since the light curable transparent adhesive 410 is diffused between the dust-proof glass substrates 300 and 31 and the substrates 110 and 20 in a state where the viscosity is lowered by heating, the light curable transparent adhesive 410 is made homogeneous. Can be diffused.

本発明において、電気光学装置は、TFTアクティブマトリクス駆動方式の液晶装置以外に、パッシブマトリックス型の液晶装置、TFD(薄型ダイオード)をスイッチング素子として備えた液晶装置であっても良く、更に、液晶装置に限らず、エレクトロルミネッセンス装置、有機エレクトロルミネッセンス装置、プラズマディスプレイ装置、電気泳動ディスプレイ装置、電子放出素子を用いた装置(Field Emission Dispiay、及びSurface-Conductin Electron-Emitter Display)、更には、DLP(登録商標)(Digital Light Processing)やDMD(Digital Micromirror Device)等の各種の電気光学装置に、本発明を適用することも可能である。     In the present invention, the electro-optical device may be a liquid crystal device having a passive matrix type liquid crystal device or a TFD (thin diode) as a switching element in addition to the TFT active matrix driving type liquid crystal device. In addition to electroluminescence devices, organic electroluminescence devices, plasma display devices, electrophoretic display devices, devices using electron-emitting devices (Field Emission Dispiay and Surface-Conductin Electron-Emitter Display), and DLP (Registration) The present invention can also be applied to various electro-optical devices such as trademark (Digital Light Processing) and DMD (Digital Micromirror Device).

第1形態による液晶表示装置の概略断面図Schematic sectional view of the liquid crystal display device according to the first embodiment 同、大型基板にチップ状の対向基板が貼り合わされた状態の斜視図The perspective view of the state where the chip-like counter substrate is bonded to the large substrate 同、液晶パネルの外表面に防塵ガラス基板を実装する工程を示す工程図Process diagram showing the process of mounting a dust-proof glass substrate on the outer surface of the liquid crystal panel 同、大型防塵ガラス基板の貼付け工程を示す工程図Process drawing showing the process of attaching a large dustproof glass substrate 同、小型防塵ガラス基板の貼付け工程を示す工程図Process drawing showing the process of attaching a small dustproof glass substrate 同、熱硬化型透明接着剤の硬化の可否を条件毎に示す図表Same as above, chart showing whether or not thermosetting transparent adhesive can be cured 第2形態による大型防塵ガラス基板の貼付け工程を示す工程図Process drawing showing the process of attaching a large dustproof glass substrate according to the second embodiment 同、小型防塵ガラス基板の貼付け工程を示す工程図Process drawing showing the process of attaching a small dustproof glass substrate

符号の説明Explanation of symbols

1…液晶表示装置、10…TFT基板、20…対向基板、30,31…防塵ガラス基板、40,420…ステージ、41…熱硬化型透明接着剤、42…紫外線硬化型接着剤、43…昇降装置、44…加圧ヘッド、45…紫外線、46,400…ホットプレート、47,470…加熱ヘッド、110…大型基板、120…液晶パネル、130…減圧室、131…高温室、300…大型防塵ガラス基板、410…光硬化型透明接着剤、460…光透過プレート、500…光照射器、510…光ファイバ。   DESCRIPTION OF SYMBOLS 1 ... Liquid crystal display device, 10 ... TFT substrate, 20 ... Opposite substrate, 30, 31 ... Dust-proof glass substrate, 40, 420 ... Stage, 41 ... Thermosetting transparent adhesive, 42 ... Ultraviolet curable adhesive, 43 ... Lifting Equipment 44 ... Pressure head 45 ... UV light 46,400 ... Hot plate 47,470 ... Heating head 110 ... Large substrate 120 ... Liquid crystal panel 130 ... Decompression chamber 131 ... High temperature chamber 300 ... Large dustproof Glass substrate, 410 ... light curable transparent adhesive, 460 ... light transmission plate, 500 ... light irradiator, 510 ... optical fiber.

Claims (4)

チップ状の第1の基板とチップ状の第2の基板とが貼り合わされてなる電気光学装置を複数製造する電気光学装置の製造方法において、
チップ状の第1の基板に複数切り出すことができる大型基板を用意し、前記大型基板の第1の基板となる領域に対向するように複数のチップ状の第2の基板をそれぞれ貼り合わせる第2の基板の貼付工程と、
前記大型基板の、前記複数のチップ状の第2の基板が貼り合わされている面と反対側の面にチップ状の防塵基板に複数切り出すことができる大型防塵基板を貼付する大型防塵基板貼付工程と、
前記大型基板と前記大型防塵基板とを共に前記第1の基板単位で切り出す切り出し工程と、を有し、
前記大型防塵基板貼付工程において、前記大型防塵基板上に熱硬化型接着剤を滴下し、次いで減圧雰囲気内で該大型防塵基板上に前記大型基板を載置した後、該大型基板を前記大型防塵基板方向へ押圧し、しかる後に高温雰囲気内で前記熱硬化型接着剤を硬化させることを特徴とする電気光学装置の製造方法。
In a manufacturing method of an electro-optical device for manufacturing a plurality of electro-optical devices in which a chip-shaped first substrate and a chip-shaped second substrate are bonded together,
A second large substrate that can be cut out is prepared on the first chip-shaped substrate, and a plurality of second chip-shaped substrates are bonded to each other so as to face the first substrate area of the large substrate. Pasting process of the substrate,
A large dust-proof substrate attaching step of attaching a plurality of large dust-proof substrates that can be cut out to a chip-like dust-proof substrate on the surface of the large substrate opposite to the surface on which the plurality of chip-shaped second substrates are bonded; ,
Cutting out both the large substrate and the large dust-proof substrate in units of the first substrate,
In the large dust-proof substrate attaching step, a thermosetting adhesive is dropped on the large dust-proof substrate, and then the large substrate is placed on the large dust-proof substrate in a reduced-pressure atmosphere, and then the large-sized substrate is attached to the large dust-proof substrate. A method for manufacturing an electro-optical device, characterized in that the thermosetting adhesive is cured in a high temperature atmosphere after pressing toward the substrate.
前記大型防塵基板貼付工程では、前記大型防塵基板の外周に仮止め用の光硬化型接着剤を塗布し、設定時間経過後、該光硬化型接着剤に光を照射して硬化させて、その後高温雰囲気内で前記熱硬化型接着剤を硬化させることを特徴とする請求項1に記載の電気光学装置の製造方法。   In the large dust-proof substrate pasting step, a photocurable adhesive for temporary fixing is applied to the outer periphery of the large dust-proof substrate, and after the set time has elapsed, the photocurable adhesive is irradiated with light and cured, and thereafter The method of manufacturing an electro-optical device according to claim 1, wherein the thermosetting adhesive is cured in a high temperature atmosphere. チップ状の第1の基板とチップ状の第2の基板とが貼り合わされてなる電気光学装置を複数製造する電気光学装置の製造方法において、
チップ状の第1の基板に複数切り出すことができる大型基板を用意し、前記大型基板の第1の基板となる領域に対向するように複数のチップ状の第2の基板をそれぞれ貼り合わせる第2の基板の貼付工程と、
前記大型基板の、前記複数のチップ状の第2の基板が貼り合わされている面と反対側の面にチップ状の防塵基板に複数切り出すことができる大型防塵基板を貼付する大型防塵基板貼付工程と、
前記大型基板と前記大型防塵基板とを共に前記第1の基板単位で切り出す切り出し工程と、を有し、
前記大型防塵基板貼付工程において、前記大型防塵基板上に光硬化型接着剤を塗布した後、該大型防塵基板上に前記大型基板を載置し、次いで該大型基板を前記大型防塵基板方向へ押圧し、その後該光硬化型接着剤に光を照射して硬化させ、
前記大型基板を前記大型防塵基板方向へ押圧する過程において、該両基板の少なくとも一方が加熱されていることを特徴とする電気光学装置の製造方法。
In a manufacturing method of an electro-optical device for manufacturing a plurality of electro-optical devices in which a chip-shaped first substrate and a chip-shaped second substrate are bonded together,
A second large substrate that can be cut out is prepared on the first chip-shaped substrate, and a plurality of second chip-shaped substrates are bonded to each other so as to face the first substrate area of the large substrate. Pasting process of the substrate,
A large dust-proof substrate attaching step of attaching a plurality of large dust-proof substrates that can be cut out to a chip-like dust-proof substrate on the surface of the large substrate opposite to the surface on which the plurality of chip-shaped second substrates are bonded; ,
Cutting out both the large substrate and the large dust-proof substrate in units of the first substrate,
In the large dust-proof substrate attaching step, after applying a photocurable adhesive on the large dust-proof substrate, the large substrate is placed on the large dust-proof substrate, and then the large substrate is pressed toward the large dust-proof substrate. Then, the photocurable adhesive is cured by irradiating with light.
In the process of pressing the large substrate in the direction of the large dust-proof substrate, at least one of the two substrates is heated.
前記光硬化型接着剤を硬化させる光は、前記大型防塵基板の前記大型基板が貼り合わされている面と反対側の面から照射されることを特徴とする請求項に記載の電気光学装置の製造方法。 4. The electro-optical device according to claim 3 , wherein the light that cures the photocurable adhesive is irradiated from a surface of the large dust-proof substrate opposite to a surface on which the large substrate is bonded. Production method.
JP2007278633A 2004-05-25 2007-10-26 Manufacturing method of electro-optical device Expired - Fee Related JP4301337B2 (en)

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