JP4289431B2 - 波長選択素子、光源装置、画像表示装置及びモニタ装置 - Google Patents

波長選択素子、光源装置、画像表示装置及びモニタ装置 Download PDF

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Publication number
JP4289431B2
JP4289431B2 JP2007307605A JP2007307605A JP4289431B2 JP 4289431 B2 JP4289431 B2 JP 4289431B2 JP 2007307605 A JP2007307605 A JP 2007307605A JP 2007307605 A JP2007307605 A JP 2007307605A JP 4289431 B2 JP4289431 B2 JP 4289431B2
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Prior art keywords
light
wavelength
selection
interference
wavelength selection
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JP2007307605A
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English (en)
Japanese (ja)
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JP2008197627A (ja
Inventor
文香 住山
俊司 上島
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Seiko Epson Corp
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Seiko Epson Corp
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Priority to JP2007307605A priority Critical patent/JP4289431B2/ja
Priority to US12/007,569 priority patent/US7775684B2/en
Publication of JP2008197627A publication Critical patent/JP2008197627A/ja
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  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Liquid Crystal (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Projection Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Filters (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
JP2007307605A 2007-01-18 2007-11-28 波長選択素子、光源装置、画像表示装置及びモニタ装置 Active JP4289431B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2007307605A JP4289431B2 (ja) 2007-01-18 2007-11-28 波長選択素子、光源装置、画像表示装置及びモニタ装置
US12/007,569 US7775684B2 (en) 2007-01-18 2008-01-11 Wavelength selective element, manufacturing apparatus for manufacturing wavelength selective element, manufacturing method for manufacturing wavelength selective element, light source device, image display device, and monitor

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007009016 2007-01-18
JP2007307605A JP4289431B2 (ja) 2007-01-18 2007-11-28 波長選択素子、光源装置、画像表示装置及びモニタ装置

Related Child Applications (1)

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JP2009027372A Division JP2009104196A (ja) 2007-01-18 2009-02-09 波長選択素子、波長選択素子の製造装置、波長選択素子の製造方法、光源装置、画像表示装置及びモニタ装置

Publications (2)

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JP2008197627A JP2008197627A (ja) 2008-08-28
JP4289431B2 true JP4289431B2 (ja) 2009-07-01

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JP2007307605A Active JP4289431B2 (ja) 2007-01-18 2007-11-28 波長選択素子、光源装置、画像表示装置及びモニタ装置
JP2009027372A Withdrawn JP2009104196A (ja) 2007-01-18 2009-02-09 波長選択素子、波長選択素子の製造装置、波長選択素子の製造方法、光源装置、画像表示装置及びモニタ装置

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JP2009027372A Withdrawn JP2009104196A (ja) 2007-01-18 2009-02-09 波長選択素子、波長選択素子の製造装置、波長選択素子の製造方法、光源装置、画像表示装置及びモニタ装置

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102200691B1 (ko) * 2014-06-02 2021-01-13 삼성디스플레이 주식회사 검사장치
DE202016103819U1 (de) * 2016-07-14 2017-10-20 Suss Microtec Lithography Gmbh Lichtquellenanordnung für ein Belichtungssystem sowie Fotolithografie-Belichtungssystem
KR102157961B1 (ko) * 2019-04-29 2020-09-18 연세대학교 산학협력단 컬러 필터를 위한 멀티 도메인 나노 패턴 형성 장치 및 방법

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2774398B2 (ja) * 1991-09-17 1998-07-09 富士通株式会社 ホログラム作成装置
JP2000174397A (ja) * 1998-12-02 2000-06-23 Nec Corp 多波長光源装置及びその発振周波数制御方法

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JP2009104196A (ja) 2009-05-14
JP2008197627A (ja) 2008-08-28

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