JP4285663B2 - 酸素分圧制御装置及びガス供給方法 - Google Patents
酸素分圧制御装置及びガス供給方法 Download PDFInfo
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- JP4285663B2 JP4285663B2 JP2007507588A JP2007507588A JP4285663B2 JP 4285663 B2 JP4285663 B2 JP 4285663B2 JP 2007507588 A JP2007507588 A JP 2007507588A JP 2007507588 A JP2007507588 A JP 2007507588A JP 4285663 B2 JP4285663 B2 JP 4285663B2
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- 239000007789 gas Substances 0.000 title claims description 416
- 239000001301 oxygen Substances 0.000 title claims description 193
- 229910052760 oxygen Inorganic materials 0.000 title claims description 193
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 title claims description 191
- 238000000034 method Methods 0.000 title claims description 21
- 238000000746 purification Methods 0.000 claims description 106
- 238000011144 upstream manufacturing Methods 0.000 claims description 14
- 239000002994 raw material Substances 0.000 claims description 13
- 238000012544 monitoring process Methods 0.000 claims description 3
- 238000002360 preparation method Methods 0.000 description 34
- 239000007784 solid electrolyte Substances 0.000 description 32
- 239000011261 inert gas Substances 0.000 description 15
- 238000010586 diagram Methods 0.000 description 9
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 230000001276 controlling effect Effects 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 4
- 238000005429 filling process Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- AHKZTVQIVOEVFO-UHFFFAOYSA-N oxide(2-) Chemical compound [O-2] AHKZTVQIVOEVFO-UHFFFAOYSA-N 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- QRSFFHRCBYCWBS-UHFFFAOYSA-N [O].[O] Chemical compound [O].[O] QRSFFHRCBYCWBS-UHFFFAOYSA-N 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000011344 liquid material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000002926 oxygen Chemical class 0.000 description 1
- -1 oxygen ion Chemical class 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/02—Preparation of oxygen
- C01B13/0229—Purification or separation processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/30—Controlling by gas-analysis apparatus
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
- B01D53/326—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 in electrochemical cells
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2256/00—Main component in the product gas stream after treatment
- B01D2256/12—Oxygen
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/0004—Gaseous mixtures, e.g. polluted air
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Electrochemistry (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Description
15A 酸素センサ
15B 酸素センサ
19、19A、19B 循環回路
20、20A、20B タンク
21、21A、21B ガス精製部
51 第1切換手段
52 第2切換手段
76 第3切換手段
Claims (7)
- 0.2〜10−30気圧の範囲で酸素分圧を制御したガスを精製するガス精製部と、このガス精製部にて精製された精製ガスを貯めるタンクとを備え、タンク内の精製ガスを他の装置に供給する酸素分圧制御装置であって、
タンクとガス精製部とを有する循環回路を備え、タンクに充填した原料ガスをこの循環回路を循環させて、タンクに前記ガス精製部にて精製される精製ガスを貯めることを特徴とする酸素分圧制御装置。 - 前記循環回路は、複数のタンクと、ガス精製部にて精製された精製ガスの各タンクへの供給許容と供給停止とを切換える第1切換手段と、各タンクの精製ガスの他の装置への供給許容と供給停止とを切換える第2切換手段とを備え、第2切換手段を切換えて少なくとも一のタンクから他の装置へ精製ガスの供給を許容し、第1切換手段の切換えにて、この一のタンクからのガス供給許容状態において、他の装置への精製ガスの供給が終了したタンクに精製ガスを精製することを特徴とする請求項1の酸素分圧制御装置。
- 前記循環回路は、複数のガス精製部と、各ガス精製部からのタンクへの精製ガスの供給許容と供給停止とを切換える第3切換手段とを備え、第3切換手段の切換えにて、複数のガス精製部のうちの任意のガス精製部にガスを循環させることを特徴とする請求項1の酸素分圧制御装置。
- 前記循環回路は、複数のタンクと、複数のガス精製部と、ガス精製部にて精製された精製ガスの各タンクへの供給許容と供給停止とを切換える第1切換手段と、各タンクの精製ガスの他の装置への供給許容と供給停止とを切換える第2切換手段と、各ガス精製部からのタンクへの精製ガスの供給許容と供給停止とを切換える第3切換手段とを備え、第2切換手段を切換えて少なくとも一のタンクから他の装置へ精製ガスの供給を許容し、第1切換手段の切換えにて、この一のタンクからのガス供給許容状態において、他の装置への精製ガスの供給が終了したタンクに精製ガスを精製するとともに、第3切換手段の切換えにて、複数のガス精製部のうちの任意のガス精製部にガスを循環させることを特徴とする請求項1の酸素分圧制御装置。
- ガス精製部は、ガスを目的の酸素分圧に制御可能な電気化学的な酸素ポンプと、ガスの酸素分圧をモニタする酸素センサとを備えることを特徴とする請求項1〜請求項4のいずれかの酸素分圧制御装置。
- 酸素センサを酸素ポンプの上流側と下流側とに配置したことを特徴とする請求項5の酸素分圧制御装置。
- 0.2〜10−30気圧の範囲で酸素分圧を制御してなる精製ガスを、他の装置へ供給するガス供給方法であって、
前記精製ガスを複数のタンクに貯めた後、少なくとも一のタンクから他の装置に精製ガスを供給して、このタンク内のガス供給終了後に、他のタンクからの他の装置への精製ガスの供給を行い、精製ガスの供給中にガス供給が終了したタンクに精製ガスを貯めることを特徴とするガス供給方法。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2006/324238 WO2008068844A1 (ja) | 2006-12-05 | 2006-12-05 | 酸素分圧制御装置及びガス供給方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP4285663B2 true JP4285663B2 (ja) | 2009-06-24 |
JPWO2008068844A1 JPWO2008068844A1 (ja) | 2010-03-11 |
Family
ID=39491764
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007507588A Active JP4285663B2 (ja) | 2006-12-05 | 2006-12-05 | 酸素分圧制御装置及びガス供給方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8070852B2 (ja) |
EP (1) | EP2090545A4 (ja) |
JP (1) | JP4285663B2 (ja) |
WO (1) | WO2008068844A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008137875A (ja) * | 2006-12-05 | 2008-06-19 | Canon Machinery Inc | 酸素分圧制御装置 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5550530B2 (ja) * | 2010-11-15 | 2014-07-16 | キヤノンマシナリー株式会社 | 酸素分圧制御方法 |
US11071840B2 (en) | 2016-05-13 | 2021-07-27 | Lynntech, Inc. | Hypoxia training device |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3749918B2 (ja) | 2001-04-27 | 2006-03-01 | キヤノンマシナリー株式会社 | 酸素分圧制御による試料作製装置 |
JP3921520B2 (ja) * | 2003-02-20 | 2007-05-30 | 独立行政法人産業技術総合研究所 | 酸素分圧制御による試料作成方法および試料作成装置 |
US6955198B2 (en) * | 2003-09-09 | 2005-10-18 | Advanced Technology Materials, Inc. | Auto-switching system for switch-over of gas storage and dispensing vessels in a multi-vessel array |
JP4621888B2 (ja) * | 2005-02-02 | 2011-01-26 | 独立行政法人産業技術総合研究所 | 半導体装置の製造方法 |
DE102007001417B4 (de) * | 2007-01-09 | 2009-11-12 | Ford Global Technologies, LLC, Dearborn | Vorrichtung zur Abschätzung des Beladungszustandes eines NOx-Speicherkatalysators |
-
2006
- 2006-12-05 EP EP06833993A patent/EP2090545A4/en not_active Withdrawn
- 2006-12-05 WO PCT/JP2006/324238 patent/WO2008068844A1/ja active Application Filing
- 2006-12-05 US US12/517,615 patent/US8070852B2/en not_active Expired - Fee Related
- 2006-12-05 JP JP2007507588A patent/JP4285663B2/ja active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008137875A (ja) * | 2006-12-05 | 2008-06-19 | Canon Machinery Inc | 酸素分圧制御装置 |
Also Published As
Publication number | Publication date |
---|---|
US8070852B2 (en) | 2011-12-06 |
US20100065440A1 (en) | 2010-03-18 |
WO2008068844A1 (ja) | 2008-06-12 |
EP2090545A4 (en) | 2012-03-21 |
JPWO2008068844A1 (ja) | 2010-03-11 |
EP2090545A1 (en) | 2009-08-19 |
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