JP4284642B2 - 刺激応答性多孔質高分子ゲル - Google Patents

刺激応答性多孔質高分子ゲル Download PDF

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Publication number
JP4284642B2
JP4284642B2 JP2003073323A JP2003073323A JP4284642B2 JP 4284642 B2 JP4284642 B2 JP 4284642B2 JP 2003073323 A JP2003073323 A JP 2003073323A JP 2003073323 A JP2003073323 A JP 2003073323A JP 4284642 B2 JP4284642 B2 JP 4284642B2
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gel
polymer gel
polymer
solution
concentration
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Expired - Fee Related
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JP2003073323A
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Japanese (ja)
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JP2004027195A (ja
JP2004027195A5 (enExample
Inventor
敬和 竹岡
正義 渡邉
大輔 中山
尚 斉藤
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Yokohama TLO Co Ltd
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Yokohama TLO Co Ltd
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Priority to JP2003073323A priority Critical patent/JP4284642B2/ja
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JP2003073323A 2002-05-09 2003-03-18 刺激応答性多孔質高分子ゲル Expired - Fee Related JP4284642B2 (ja)

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JP2003073323A JP4284642B2 (ja) 2002-05-09 2003-03-18 刺激応答性多孔質高分子ゲル

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JP2002134423 2002-05-09
JP2003073323A JP4284642B2 (ja) 2002-05-09 2003-03-18 刺激応答性多孔質高分子ゲル

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JP2004027195A JP2004027195A (ja) 2004-01-29
JP2004027195A5 JP2004027195A5 (enExample) 2006-05-11
JP4284642B2 true JP4284642B2 (ja) 2009-06-24

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Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4945884B2 (ja) * 2004-03-16 2012-06-06 ソニー株式会社 多孔質炭素材料の製造方法
JP2005283296A (ja) * 2004-03-29 2005-10-13 Takatoshi Kinoshita 被検物の光学的検出方法及び検出システム
EP1892519A4 (en) 2005-04-28 2012-06-06 Japan Science & Tech Agency A REACTIVE GEL WITH AN OPTICAL CHARACTERISTIC MOLECULE, MEASURING DEVICE FOR OUTER IRRITATION USED THEREOF, AND METHOD FOR MEASURING OUTER IRRITATION
US20090220426A1 (en) * 2006-01-30 2009-09-03 Kinki University Biodegradable Inverted-Opal Structure, Method for Manufacturing and Using the Same, and Medical Implant Comprising the Biodegradable Inverted-Opal Structure
JP4743017B2 (ja) 2006-06-22 2011-08-10 豊田合成株式会社 赤外線反射材、赤外線反射積層体および赤外線反射構造体
JP4356779B2 (ja) 2007-07-13 2009-11-04 豊田合成株式会社 赤外線反射材、赤外線反射積層体および赤外線反射構造体ならびにその製造方法
EP2205672B1 (en) * 2007-09-24 2014-04-30 Secretary, Department of Atomic Energy Non-ionic porous, small solid resin with chemically bonded crown ether
EP2052677A1 (en) * 2007-10-23 2009-04-29 Sensile Pat AG Medical device for glucose monitoring or regulation
JP5304065B2 (ja) * 2008-07-11 2013-10-02 コニカミノルタ株式会社 表示部材の製造方法
GB2473814B (en) * 2009-09-16 2014-06-11 Spheritech Ltd Hollow particulate support
JP5489921B2 (ja) * 2010-08-25 2014-05-14 公立大学法人首都大学東京 高分子ゲル、その製造方法、水浄化処理剤及び水浄化処理方法
JP2012101355A (ja) * 2011-12-28 2012-05-31 Sony Corp 多孔質炭素材料の製造方法
WO2016105039A1 (ko) * 2014-12-26 2016-06-30 삼성전자 주식회사 고분자 겔 및 그 제조 방법
JP6577709B2 (ja) 2014-12-26 2019-09-18 三星電子株式会社Samsung Electronics Co.,Ltd. ゲルの製造方法、並びに音響カプラーゲル
US10615417B2 (en) * 2017-05-15 2020-04-07 Millibatt, Inc. Electrolyte material, battery assembly, and production method
WO2019036648A1 (en) * 2017-08-18 2019-02-21 Kaneka Corporation MULTI-PATTERN AND MULTI-REVERSIBLE MULTI-REPEAT PATTERNS
KR102075339B1 (ko) * 2017-11-06 2020-02-10 한국원자력연구원 방사성 핵종 제거용 조성물 및 이를 이용한 방사성 핵종의 제거방법
CN114287947B (zh) * 2022-01-04 2023-08-18 上海未乐科技有限公司 一种可用于虚拟-现实交互的界面材料及其制备方法

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