JP4261252B2 - Fault diagnosis apparatus and fault diagnosis method for vacuum pump - Google Patents

Fault diagnosis apparatus and fault diagnosis method for vacuum pump Download PDF

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JP4261252B2
JP4261252B2 JP2003171844A JP2003171844A JP4261252B2 JP 4261252 B2 JP4261252 B2 JP 4261252B2 JP 2003171844 A JP2003171844 A JP 2003171844A JP 2003171844 A JP2003171844 A JP 2003171844A JP 4261252 B2 JP4261252 B2 JP 4261252B2
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vacuum pump
change amount
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pump
rotation speed
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清司 柳澤
知範 大橋
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Ebara Corp
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Description

【０００１】
【発明の属する技術分野】
本発明は、半導体装置や液晶装置の製造プロセス等で使用される各種ガスの排気に用いられる真空ポンプの故障診断装置及び故障診断方法に関するものである。
【０００２】
【従来の技術】
半導体デバイスや液晶デバイスの製造プロセス等で使用される真空ポンプの故障診断予測は、定常運転時のモータ電流、電力、温度、振動、音、ポンプ吸気圧力、ポンプ排気圧力、アコースティックエミッション等の物理量の状態をオペレータによる日常点検結果、又はコンピュータを用いた集中監視によって収集し得られた日常運転データから閾値を設定し、その値を目安に真空ポンプの交換を行っている。しかしながら、このような日常運転データの常時監視では、状態変化量（物理量）が小さいため、真空ポンプに発生する異常を見逃してしまい、真空ポンプが故障して突然停止してしまうことが多い。
【０００３】
半導体装置や液晶装置の製造プロセス等で使用される真空ポンプは、機械の経年変化、反応副生成物のロータとロータの間、ロータとケーシングの間への噛み込み、腐食性ガスによるロータ及びケーシング材の腐食・表面荒れによる擦動抵抗の増大、排気配管閉塞による背圧上昇等の要因により、突然停止することがある。また、このような真空ポンプの突然の停止が発生すると製造中の半導体ウエハ等に損傷を与えることもある。
【０００４】
【特許文献１】
特開２０００−１１０７３５号公報
【０００５】
【発明が解決しようとする課題】
本発明は上述の点に鑑みてなされたもので、上記真空ポンプ停止となる要因を事前に予測し突然の真空ポンプ停止による半導体ウエハ等の損傷を防止することができる真空ポンプの故障診断装置及び故障診断方法を提供することを目的とする。
【０００６】
【課題を解決するための手段】
上記課題を解決するため請求項１に記載の発明は、プロセス装置に接続され、該プロセス装置で使用するプロセスガスを排気する真空ポンプの故障を事前に診断する真空ポンプの故障診断装置であって、プロセス装置のプロセスへの影響がないタイミングに真空ポンプのポンプロータの回転数を変化させるポンプロータ回転数変化手段と、ポンプロータ回転数変化手段によるポンプロータの回転数変化時における真空ポンプの状態変化量を測定する状態変化量測定手段と、真空ポンプの正常時の状態変化量と状態変化量測定手段で測定した状態変化量を比較する状態変化量比較手段と、状態変化量比較手段で正常時の状態変化量と測定した状態変化量とを比較し、その差が所定量大きく又は小さくなった場合、異常と診断する診断手段とを備えたことを特徴とする。ここで正常時とは、真空ポンプを製造し、検査を行い求められた基準を満たした時点である。
【０００７】
請求項２に記載の発明は、請求項１に記載の真空ポンプの故障診断装置において、状態変化量は、ポンプロータ回転数変化手段による真空ポンプ起動時のポンプロータの停止から定速回転に達するまでの状態変化量であることを特徴とする。
【０００８】
請求項３に記載の発明は、請求項１に記載の真空ポンプの故障診断装置において、状態変化量は、ロータ回転数変化手段による真空ポンプ停止時のポンプロータの定速回転から停止までの状態変化量であることを特徴とする。
【０００９】
請求項４に記載の発明は、請求項１に記載の真空ポンプの故障診断装置において、状態変化量は、ロータ回転数変化手段による真空ポンプのポンプロータを定速回転から所定の低速回転に下げた時の状態変化量であることを特徴とする。
【００１０】
請求項５に記載の発明は、請求項１に記載の真空ポンプの故障診断装置において、
状態変化量は、ロータ回転数変化手段による真空ポンプのポンプロータを定速回転から所定の高速回転に上げた時の状態変化量であることを特徴とする。
【００１１】
請求項６に記載の発明は、プロセス装置に接続され、該プロセス装置で使用するプロセスガスを排気する真空ポンプの故障を事前に診断する真空ポンプの故障診断方法であって、プロセス装置のプロセスへの影響がないタイミングに真空ポンプのポンプロータの回転数を変化させるポンプロータ回転数変化工程と、ポンプロータ回転数変化工程によるポンプロータの回転数変化時における真空ポンプの状態変化量を測定する状態変化量測定工程と、真空ポンプの正常時の状態変化量と状態変化量測定工程で測定した状態変化量を比較する状態変化量比較工程と、状態変化量比較工程で正常時の状態変化量と測定した状態変化量とを比較し、その差が所定量大きく又は小さくなった場合、異常と診断する診断工程とを備えたことを特徴とする。
【００１２】
この種の真空ポンプに異常が生じているときの状態量（物理量、モータ電流値等）変化は、ポンプ定常運転時のそれよりも、真空ポンプのポンプロータの回転数が変化する（又は変化させる）ときの方が変化量は顕在化する。即ち、真空ポンプに異常が生じているときの状態変化量は真空ポンプ定常運転時のそれよりもポンプロータの回転数が変化する（或いは変化させる）時の方が変化幅が大きくなる。そこで請求項１に記載のように、ポンプロータの回転数変化時における状態変化量を正常時の状態変化量と比較して、その正常・異常の判定を行うことにより、容易で正確な判断が可能となる。
【００１３】
例えば、真空ポンプを起動させたときのポンプロータの起動から定格回転数に達する間の状態量（物理量）を測定し、その変化量に関して出荷時の、フィールド（現場）からフィードバックした（使用条件（圧力、ガス量）等の条件を含んだ）値と比較し異常・正常の判定を行う。
【００１４】
また、請求項２又は３に記載の発明のように、真空ポンプ起動時のポンプロータの停止から定格回転に達するまで又は真空ポンプの停止時のポンプロータの定格回転から停止状態に達するまでの状態変化量を測定し、その変化量に関しての出荷時の値、フィールドからフィードバックした（使用条件（圧力、ガス量）等の条件を含んだ）値と比較し異常・正常の判定を行うことにより、容易で且つ正確に正常・異常を判定できる。
【００１５】
また、請求項４又は５に記載の発明のように、真空ポンプのポンプロータの回転数を定格回転数よりも意図的に速くし、若しくは遅くしたときの状態変化を測定する。その変化量を使用条件等に合わせて予め設定した値、若しくは使用状態からフィードバックした値と比較し異常・正常の判定を行うことにより、容易で且つ正確に正常・異常を判定できる。
【００１６】
【発明の実施の形態】
以下、本発明の実施の形態例を図面に基づいて説明する。図１は本発明に係る真空ポンプの故障診断装置のシステム構成例を示す図である。ＣＶＤ装置又はエッチング装置等のプロセス装置１０には該プロセスで用いるガスを排気するために真空ポンプ１１が接続され、該真空ポンプ１１で排気されたガスは除害装置１２及び工場スクラバ１３を通って有害成分が除去された後、排気される。
【００１７】
真空ポンプ１１には図示しない状態変化量（物理量）、例えばガス温度、ケーシング温度、モータコイル温度、モータ電流、モータ電力、背圧、吸気圧力、規定値に達するまでの時間、アコースティックエミッションＡＥ、振動、回転数等を計測するための各種センサ群１４が設けられ、該センサ群１４の測定出力が正常・異常判定装置１５ａに送られる。
【００１８】
正常・異常判定装置１５ａはポンプ制御盤１５内に組み込まれているパソコンで構成され、該正常・異常判定装置１５ａではセンサ群１４で測定した測定出力から、各状態変化量を検出し、該検出した各状態変化量と正常時の状態変化量とを比較し、真空ポンプ１１の正常・異常を判断し、その結果を警報装置、ポケベル、Ｅ−ｍａｉｌ１６に出力すると共に、プロセス装置１０にフィードバックする。
【００１９】
真空ポンプ１１は半導体デバイス製造プロセスや液晶デバイス製造プロセスにおいて多く使用されているが、下記に示すような原因による突然停止により、製造中のウエハ等に損傷を与えることがある。
【００２０】
真空ポンプ１１はプロセス装置１０のチャンバ内を真空状態にし、同時にプロセスガスを排気するために使用される。このプロセスガスの中には腐食性の強いものや排気途中に配管内や真空ポンプ１１内で固体化してしまうガスが含まれる。
【００２１】
真空ポンプ１１のロータとロータの間、ロータとケーシングの間の隙間は微小であり、このようなプロセスガスによりロータやケーシングが腐食すると、面荒れによりロータとロータの間、ロータとケーシングの間のかじりが発生し、モータに負荷がかかり真空ポンプ１１が停止する。
【００２２】
また、反応副生成物がロータとロータの間、ロータとケーシングの間に発生し、付着し、成長し、接触したり、配管中で発生した反応副生成物が落ち込んできて噛み込みが発生し、モータに負荷がかかることにより真空ポンプ１１が停止するという問題が起る。特に、真空ポンプ１１の後段側では気体の圧力が高くなるため、反応副生成物の発生が起こりやすく、その部分へ生成物が付着し、擦動抵抗の増大によりポンプが停止に至る事例が多い。
【００２３】
また、潤滑用油の漏れ、ガスによる劣化、経年劣化により軸受が加熱、摩擦等のダメージを受け、その結果モータに負荷がかかり真空ポンプ１１が停止することもある。
【００２４】
また、軸受の劣化によりスムーズな回転が行われずモータに負荷がかかりポンプ停止に至ることもある。
【００２５】
上記のように、真空ポンプ１１の突然の停止はこのような機械的、物理的な要因によって引き起こされることが多く、その際には、必ず物理的な信号がポンプから発せられる。但し、真空ポンプ１１の通常の運転時に発生されるこのような物理的信号は、変化量が小さく又緩やかに変化するため、真空ポンプ１１の異常に起因するものなのか、或いはポンプ使用状況の変化によるものなのか判別がつきにくい。或いは大きな変化が検知されるときには真空ポンプ１１の停止直前で、交換するまでに時間的余裕がない。
【００２６】
そこで、図１に示すように、故障診断装置を構成し、真空ポンプ１１の起動時若しくは停止時の状態変化量、低速回転から高速回転若しくは高速回転から低速回転に移行する間の状態変化量を正常・異常判定装置１５ａでセンサ群１４の各センサの測定出力から検知する。このように回転数を変化させると、状態変化量の絶対値が大きくなり、正常・異常判定装置１５ａでこの検知した状態変化量と正常時の状態変化量とを比較することにより、異常が検知しやすくなる。
【００２７】
また、この正常・異常を判断するための操作は任意のタイミングでおこなうことができるので、プロセスへの影響がないタイミングを選んで実施することが可能である。
【００２８】
図２は故障診断装置で真空ポンプの回転数を上下させて故障診断する場合の処理例を示す図である。先ず、ポンプ制御盤１５から真空ポンプ１１へ回転数上昇・減少の指令を出す（ステップＳＴ１）。センサ群１４の各センサの出力をポンプ制御盤１５の正常・異常判定装置１５ａへ入力し（ステップＳＴ２）、該正常・異常判定装置１５ａで各センサの測定出力から各状態変化量を検知し、該検知した状態変化量と正常時の状態変化量とを比較し正常・異常の判定を行う（ステップＳＴ３）。判定結果が正常であったら、真空ポンプ１１の運転状態を回転数を変化させる前の状態に復帰させ（ステップＳＴ４）、判定結果が異常であったら、警報装置、ポケベル、Ｅ−ｍａｉｌ１６に警報を出力する（ステップＳＴ５）。
【００２９】
図３は上記回転数を上下させて故障診断する場合の正常・異常の判定ルーチン例を示す図である。先ず、上記検知した状態変化量が規定値、即ち正常時の状態変化量を所定量超えたか否かを判断する（ステップＳＴ１１）。規定値を超えなかった場合は正常（ＯＫ）であるから、真空ポンプ１１の運転を回転数変更前の状態に復帰し（ステップＳＴ１２）、規定値を超えた場合は回転数を一旦元に戻し（ステップＳＴ１３）、続いて再度真空ポンプ１１へ回転数上昇・減少の指令を出し、回転数を再度変化させる（ステップＳＴ１４）。
【００３０】
続いて、状態変化量が規定値を超えたか否かを判断し（ステップＳＴ１５）、規定値を超えなかった場合は正常（ＯＫ）として真空ポンプ１１の運転を回転数変更前の状態に復帰させ（ステップＳＴ１６）、規定値を超えた場合は前記ステップＳＴ１３に戻して処理を繰り返す。この処理を所定のＮ回繰り返す（Ｎは任意の数）。設定したＮ回処理を繰り返しても状態変化が規定値、即ち正常時の状態変化量を所定量超えた場合、真空ポンプ１１が異常であるとして、上記のように、警報装置、ポケベル、Ｅ−ｍａｉｌ１６に警報を出力する。
【００３１】
図４は故障診断装置で真空ポンプを起動若しくは停止させて故障診断する場合の処理例を示す図である。先ず、ポンプ制御盤１５から真空ポンプ１１へポンプ起動若しくは停止の指令を出力する（ステップＳＴ２１）。センサ群１４の各センサの出力をポンプ制御盤１５の正常・異常判定装置１５ａへ入力し（ステップＳＴ２２）、該正常・異常判定装置１５ａで各センサの出力から各状態変化量を検知し、該検知した状態変化量と正常時の状態変化量とを比較し正常・異常の判定を行う（ステップＳＴ２３）。判定結果が正常であったら、前の状態に復帰させ（ステップＳＴ２４）、判定結果が異常であったら、警報装置、ポケベル、Ｅ−ｍａｉｌ１６に警報を出力する（ステップＳＴ２５）。
【００３２】
図５は上記真空ポンプを起動若しくは停止させて故障診断する場合の正常・異常の判定ルーチン例を示す図である。先ず、上記検知した状態変化量が規定値、即ち正常時の状態変化量を所定量超えたか否かを判断する（ステップＳＴ３１）。規定値を超えなかった場合は正常（ＯＫ）とし（ステップＳＴ３２）、規定値を超えた場合は状態を元（起動又は停止）の状態に戻し（ステップＳＴ３３）、続いて再度真空ポンプ１１へポンプ起動若しくは停止の指令を出力する（ステップＳＴ３４）。
【００３３】
続いて、状態変化量が規定値を超えたか否かを判断し（ステップＳＴ３５）、規定値を超えなかった場合は正常（ＯＫ）とし（ステップＳＴ３６）、規定値を超えた場合は前記ステップＳＴ３３に戻して処理を繰り返す。この処理を所定の設定したＮ回繰り返す（Ｎは任意の数）。設定したＮ回処理を繰り返しても状態変化が規定値、即ち正常時の状態変化量を所定量超えた場合、真空ポンプ１１が異常であるとして、警報装置、ポケベル、Ｅ−ｍａｉｌ１６に警報を出力する。
【００３４】
上記真空ポンプの故障診断装置では、ポンプ制御盤１５内の正常・異常判定装置（パソコン）１５ａで正常・異常を判断する場合を示したが、図６に示すように、センサ群１４の測定出力をポンプ制御盤１５からポンプモニタシステム１７に伝送し、ポンプモニタシステム１７で真空ポンプ１１の正常・異常を判断するようにしてもよい。
【００３５】
図７はポンプモニタシステムの構成例を示す図であり、ポンプモニタシステム１７はシステム管理パソコン２０を具備し、該システム管理パソコン２０には各データ収集パソコン２１、２１（このデータ収集パソコン２１はポンプ制御盤１５に備えられている）、モニタパソコン２２、故障予測判定パソコン２３が接続されている。各データ収集パソコン２１には各真空ポンプ１１に取りつけたセンサ群１４の各センサからの測定出力が入力され、各状態変化量が検知される。この検知された状態変化量は各データ収集パソコン２１、２１からシステム管理パソコン２０に送られる。モニタパソコン２２は、各真空ポンプ１１の状態をモニタし、故障予測判定パソコン２３で各真空ポンプ１１の状態変化量を基に正常・異常を判断し、異常と判断する場合、警報を出力する。
【００３６】
【発明の効果】
以上説明したように各請求項に記載の発明によれば下記のような優れた効果が得られる。
【００３７】
請求項１に記載の発明によれば、プロセス装置のプロセスへの影響がないタイミングで真空ポンプのポンプロータの回転数を変化させ、該回転数変化時における状態変化量を正常時の状態変化量と比較して、その正常・異常の判定を行うので、真空ポンプに異常が生じているときの状態変化量はポンプ定常運転時のそれよりも回転数が変化する（或いは変化させる）時の方が変化幅が大きくなるから、容易で正確に正常・異常を判定でき、しかもプロセス装置のプロセスに影響を与えることがない。
【００３８】
請求項２又は３に記載の発明によれば、真空ポンプ起動時のポンプロータの停止から定格回転に達するまで又は真空ポンプの停止時のポンプロータの定格回転から停止状態に達するまでの状態変化量を測定し、その変化量に関して出荷時の値、フィールドからフィードバックした（使用条件（圧力、ガス量）等の条件を含んだ）値と比較し異常・正常の判定を行うことにより、容易で且つ正確に正常・異常を判定できる。
【００３９】
また、請求項４又は５に記載の発明によれば、真空ポンプのポンプロータの回転数を定格回転数よりも意図的に速くし、若しくは遅くしたときの状態変化を測定する。その変化量を使用条件等に合わせて予め設定した値、若しくは使用状態からフィードバックした値と比較し異常・正常の判定を行うことにより、容易で且つ正確に正常・異常を判定できる。
【００４０】
また、請求項６に記載の発明によれば、請求項１の発明と同様、プロセス装置のプロセスへの影響がないタイミングで真空ポンプのポンプロータの回転数を変化させ、該回転数変化時における状態変化量を正常時の状態変化量と比較して、その正常・異常の判定を行うので、真空ポンプに異常が生じているときの状態変化量はポンプ定常運転時のそれよりも回転数が変化する（或いは変化させる）時の方が変化幅が大きくなるから、容易で正確に正常・異常を判定でき、しかもプロセス装置のプロセスに影響を与えることがない。
【図面の簡単な説明】
【図１】 本発明に係る真空ポンプの故障診断装置のシステム構成例を示す図である。
【図２】 本発明に係る真空ポンプの故障診断装置で真空ポンプの回転数を上下させて故障診断する場合の処理例を示す図である。
【図３】 真空ポンプの回転数を上下させて故障診断する場合の正常・異常の判定ルーチン例を示す図である。
【図４】 本発明に係る真空ポンプの故障診断装置で真空ポンプを起動若しくは停止させて故障診断する場合の処理例を示す図である。
【図５】 真空ポンプを起動若しくは停止させて故障診断する場合の正常・異常の判定ルーチン例を示す図である。
【図６】 本発明に係る真空ポンプの故障診断装置のシステム構成例を示す図である。
【図７】 図６のポンプモニタシステムの構成例を示す図である。
【符号の説明】
１０ プロセス装置
１１ 真空ポンプ
１２ 除害装置
１３ 工場スクラバ
１４ センサ群
１５ ポンプ制御盤
１６ 警報装置、ポケベル、Ｅ−ｍａｉｌ
１７ ポンプモニタシステム
２０ システム管理パソコン
２１ データ収集パソコン
２２ モニタパソコン
２３ 故障予測判定パソコン[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a failure diagnosis device and failure diagnosis method for a vacuum pump used for exhausting various gases used in a manufacturing process of a semiconductor device or a liquid crystal device.
[0002]
[Prior art]
Failure diagnosis prediction of vacuum pumps used in the manufacturing process of semiconductor devices and liquid crystal devices is based on physical quantities such as motor current, power, temperature, vibration, sound, pump intake pressure, pump exhaust pressure, and acoustic emission during steady operation. A threshold is set based on the daily check result obtained by the operator or the daily operation data collected by centralized monitoring using a computer, and the vacuum pump is replaced based on the threshold value. However, in such constant monitoring of daily operation data, since the amount of state change (physical quantity) is small, an abnormality occurring in the vacuum pump is often overlooked, and the vacuum pump often fails and suddenly stops.
[0003]
Vacuum pumps used in manufacturing processes of semiconductor devices and liquid crystal devices include mechanical aging, reaction by-products between rotors and between rotors, and between rotors and casings, and rotors and casings caused by corrosive gas. It may stop suddenly due to factors such as increased frictional resistance due to corrosion or surface roughness of the material and increased back pressure due to exhaust pipe blockage. In addition, when such a sudden stop of the vacuum pump occurs, the semiconductor wafer being manufactured may be damaged.
[0004]
[Patent Document 1]
Japanese Patent Laid-Open No. 2000-110735
[Problems to be solved by the invention]
SUMMARY OF THE INVENTION The present invention has been made in view of the above points. A failure diagnosis apparatus for a vacuum pump capable of predicting in advance the factor causing the vacuum pump stop and preventing damage to the semiconductor wafer or the like due to the sudden vacuum pump stop, and An object is to provide a fault diagnosis method .
[0006]
[Means for Solving the Problems]
In order to solve the above-mentioned problem, the invention described in claim 1 is a failure diagnosis device for a vacuum pump, which is connected to a process device and diagnoses in advance a failure of a vacuum pump for exhausting a process gas used in the process device. a pump rotor speed change means for changing a rotational speed of the pump rotor of a vacuum pump timing is not affected to the process of the process equipment, state of the vacuum pump during the speed change of the pump rotor by the pump rotor speed change means a state variation measuring means for measuring the amount of change, and the state variation comparing means for comparing the state change amount measured in a normal state when the change amount and the state change amount measuring means of the vacuum pump, the state change amount comparison means in comparing the state change amount measured with the state variation of the normal, if the difference becomes a predetermined amount larger or smaller, Bei and diagnosis means for diagnosing an abnormal Characterized in that was. Here, the normal time is a time when a vacuum pump is manufactured, inspected, and a required standard is satisfied.
[0007]
According to a second aspect of the present invention, in the failure diagnosis device for a vacuum pump according to the first aspect, the state change amount reaches a constant speed rotation from a stop of the pump rotor when the pump pump is started by the pump rotor rotation speed changing means. It is the amount of state change until.
[0008]
According to a third aspect of the present invention, in the failure diagnosis device for a vacuum pump according to the first aspect, the state change amount is a state from a constant speed rotation to a stop of the pump rotor when the vacuum pump is stopped by the rotor rotation speed changing means. It is a change amount.
[0009]
According to a fourth aspect of the present invention, in the vacuum pump failure diagnosis apparatus according to the first aspect, the state change amount is reduced from a constant speed rotation to a predetermined low speed rotation of the pump rotor of the vacuum pump by the rotor rotation speed changing means. It is a state change amount when
[0010]
The invention according to claim 5 is the fault diagnosis device for a vacuum pump according to claim 1,
The state change amount is a state change amount when the pump rotor of the vacuum pump by the rotor rotation speed changing means is raised from a constant speed rotation to a predetermined high speed rotation.
[0011]
The invention according to claim 6 is a vacuum pump failure diagnosis method for diagnosing in advance a failure of a vacuum pump connected to a process apparatus and exhausting a process gas used in the process apparatus. The pump rotor speed changing process for changing the pump rotor speed at a timing that does not affect the pump pump, and the state of measuring the amount of change in the vacuum pump state when the pump rotor speed is changed by the pump rotor speed changing process State change amount comparison step, state change amount of normal state of vacuum pump and state change amount comparison step for comparing state change amount measured in state change amount measurement step, state change amount in normal state in state change amount comparison step A diagnostic step of comparing the measured state change amount and diagnosing an abnormality when the difference becomes larger or smaller by a predetermined amount is provided .
[0012]
The change in the state quantity (physical quantity, motor current value, etc.) when an abnormality occurs in this type of vacuum pump changes (or changes) the rotation speed of the pump rotor of the vacuum pump rather than that during steady pump operation. ) The amount of change becomes more apparent. In other words, the amount of change in the state when the abnormality occurs in the vacuum pump is larger when the rotation speed of the pump rotor is changed (or changed) than that during the steady operation of the vacuum pump. Therefore, as described in claim 1, by comparing the amount of state change when the rotation speed of the pump rotor is changed with the amount of state change at the normal time, and determining the normality / abnormality, an easy and accurate determination can be made. It becomes possible.
[0013]
For example, the state quantity (physical quantity) from when the pump rotor is started up to the rated speed when the vacuum pump is started is measured , and the amount of change is fed back from the field (site) at the time of shipment (use conditions ( Compare with the values including conditions such as pressure and gas volume) and judge whether it is abnormal or normal.
[0014]
Further, as in the invention described in claim 2 or 3, the state from the stop of the pump rotor at the time of starting the vacuum pump until reaching the rated rotation or the state from the rated rotation of the pump rotor at the time of stopping the vacuum pump until reaching the stopped state By measuring the amount of change, comparing it with the value at the time of shipment regarding the amount of change, and the value fed back from the field (including conditions such as usage conditions (pressure, gas amount), etc.) Easy and accurate determination of normality / abnormality.
[0015]
Further, as in the invention described in claim 4 or 5, the state change is measured when the rotational speed of the pump rotor of the vacuum pump is intentionally made faster or slower than the rated rotational speed. By comparing the change amount with a value set in advance according to the use condition or the like, or a value fed back from the use state, and determining abnormality / normality, it is possible to determine normality / abnormality easily and accurately.
[0016]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a diagram showing a system configuration example of a vacuum pump failure diagnosis apparatus according to the present invention. A vacuum pump 11 is connected to a process apparatus 10 such as a CVD apparatus or an etching apparatus in order to exhaust gas used in the process, and the gas exhausted by the vacuum pump 11 passes through an abatement apparatus 12 and a factory scrubber 13. After harmful components are removed, it is exhausted.
[0017]
The vacuum pump 11 has a state change amount (physical quantity) not shown, such as gas temperature, casing temperature, motor coil temperature, motor current, motor power, back pressure, intake pressure, time to reach a specified value, acoustic emission AE, vibration. Various sensor groups 14 for measuring the number of revolutions are provided, and the measurement output of the sensor group 14 is sent to the normality / abnormality determination device 15a.
[0018]
The normality / abnormality determination device 15a is composed of a personal computer incorporated in the pump control panel 15, and the normality / abnormality determination device 15a detects each state change amount from the measurement output measured by the sensor group 14, and the detection is performed. Each state change amount is compared with a normal state change amount to determine whether the vacuum pump 11 is normal or abnormal, and the result is output to an alarm device, a pager, an E-mail 16, and fed back to the process device 10. .
[0019]
The vacuum pump 11 is often used in a semiconductor device manufacturing process and a liquid crystal device manufacturing process. However, a sudden stop due to the following causes may damage a wafer or the like being manufactured.
[0020]
The vacuum pump 11 is used for evacuating the chamber of the process apparatus 10 and simultaneously exhausting the process gas. The process gas includes a highly corrosive gas or a gas that solidifies in the pipe or the vacuum pump 11 during exhaustion.
[0021]
The gaps between the rotor and the rotor of the vacuum pump 11 and between the rotor and the casing are very small. When such a process gas corrodes the rotor and the casing, the surface roughness causes a rough surface between the rotor and the rotor. A galling occurs, a load is applied to the motor, and the vacuum pump 11 stops.
[0022]
In addition, reaction by-products are generated between the rotor and the rotor, between the rotor and the casing, and adhere to, grow, contact, and the reaction by-product generated in the piping falls and biting occurs. The problem is that the vacuum pump 11 stops when a load is applied to the motor. In particular, since the pressure of the gas increases on the rear stage side of the vacuum pump 11, reaction by-products are likely to be generated, the product adheres to the portion, and the pump is often stopped due to an increase in frictional resistance. .
[0023]
Further, the bearing may be damaged by heating, friction and the like due to leakage of lubricating oil, deterioration due to gas, and aging, resulting in a load on the motor and the vacuum pump 11 being stopped.
[0024]
In addition, smooth rotation may not be performed due to deterioration of the bearing, and a load may be applied to the motor and the pump may be stopped.
[0025]
As described above, the sudden stop of the vacuum pump 11 is often caused by such mechanical and physical factors, and a physical signal is always generated from the pump. However, since such a physical signal generated during normal operation of the vacuum pump 11 has a small amount of change and changes slowly, it may be caused by an abnormality in the vacuum pump 11 or a change in pump usage status. It is difficult to determine whether it is due to. Alternatively, when a large change is detected, there is no time before the replacement just before the vacuum pump 11 is stopped.
[0026]
Therefore, as shown in FIG. 1, the failure diagnosis apparatus is configured, and the state change amount when the vacuum pump 11 is started or stopped, the state change amount during the transition from the low speed rotation to the high speed rotation or from the high speed rotation to the low speed rotation. The normal / abnormal determination device 15a detects from the measurement output of each sensor of the sensor group 14. When the rotational speed is changed in this way, the absolute value of the state change amount increases, and an abnormality is detected by comparing the detected state change amount with the normal state change amount by the normal / abnormality determination device 15a. It becomes easy to do.
[0027]
In addition, since the operation for determining the normality / abnormality can be performed at an arbitrary timing, it is possible to select and execute a timing that does not affect the process.
[0028]
FIG. 2 is a diagram showing an example of processing when a failure diagnosis is performed by increasing and decreasing the rotation speed of the vacuum pump with the failure diagnosis apparatus. First, a command for increasing / decreasing the rotational speed is issued from the pump control panel 15 to the vacuum pump 11 (step ST1). The output of each sensor of the sensor group 14 is input to the normality / abnormality determination device 15a of the pump control panel 15 (step ST2), and the normality / abnormality determination device 15a detects each state change amount from the measurement output of each sensor. The detected state change amount is compared with the normal state change amount to determine normality / abnormality (step ST3). If the determination result is normal, the operation state of the vacuum pump 11 is returned to the state before changing the rotation speed (step ST4). If the determination result is abnormal, an alarm is given to the alarm device, pager, and E-mail 16. Output (step ST5).
[0029]
FIG. 3 is a diagram showing an example of a normal / abnormal determination routine in the case where a failure diagnosis is performed by increasing or decreasing the rotational speed. First, it is determined whether or not the detected state change amount exceeds a predetermined value, that is, a normal state change amount by a predetermined amount (step ST11). If it does not exceed the specified value, it is normal (OK), so the operation of the vacuum pump 11 is returned to the state before the rotation speed change (step ST12). If the specified value is exceeded, the rotation speed is temporarily restored. (Step ST13) Subsequently, the vacuum pump 11 is again commanded to increase / decrease the rotational speed, and the rotational speed is changed again (step ST14).
[0030]
Subsequently, it is determined whether or not the state change amount exceeds a specified value (step ST15). If the specified value does not exceed the specified value, the operation of the vacuum pump 11 is returned to the state before the rotation speed change as normal (OK). (Step ST16) If the specified value is exceeded, the process returns to Step ST13 and the process is repeated. This process is repeated a predetermined N times (N is an arbitrary number). If the state change exceeds a specified value, that is, a normal state change amount after a predetermined amount even after the set N times of processing, it is determined that the vacuum pump 11 is abnormal, and the alarm device, pager, E- An alarm is output to mail16.
[0031]
FIG. 4 is a diagram illustrating an example of processing when a failure diagnosis is performed by starting or stopping the vacuum pump with the failure diagnosis apparatus. First, a pump start or stop command is output from the pump control panel 15 to the vacuum pump 11 (step ST21). The output of each sensor of the sensor group 14 is input to the normality / abnormality determination device 15a of the pump control panel 15 (step ST22), and the normality / abnormality determination device 15a detects each state change amount from the output of each sensor. The detected state change amount is compared with the normal state change amount to determine normality / abnormality (step ST23). If the determination result is normal, the state is returned to the previous state (step ST24). If the determination result is abnormal, an alarm is output to the alarm device, the pager, and the E-mail 16 (step ST25).
[0032]
FIG. 5 is a diagram showing an example of normal / abnormal determination routines when a failure diagnosis is performed by starting or stopping the vacuum pump. First, it is determined whether or not the detected state change amount exceeds a predetermined value, that is, a normal state change amount by a predetermined amount (step ST31). If the specified value is not exceeded, normal (OK) is set (step ST32). If the specified value is exceeded, the state is returned to the original (started or stopped) state (step ST33), and then pumped again to the vacuum pump 11. A start or stop command is output (step ST34).
[0033]
Subsequently, it is determined whether or not the state change amount exceeds a specified value (step ST35). If the specified value does not exceed the specified value, the state is determined to be normal (OK) (step ST36). Return to and repeat the process. This process is repeated N times with a predetermined setting (N is an arbitrary number). If the state change exceeds the specified value, that is, the normal state change amount after a predetermined amount even after repeating the set N times, the vacuum pump 11 is regarded as abnormal and an alarm is output to the alarm device, pager, and E-mail 16 To do.
[0034]
In the above-described vacuum pump failure diagnosis apparatus, the normality / abnormality determination device (personal computer) 15a in the pump control panel 15 determines normality / abnormality. As shown in FIG. May be transmitted from the pump control panel 15 to the pump monitor system 17, and the pump monitor system 17 may determine whether the vacuum pump 11 is normal or abnormal.
[0035]
FIG. 7 is a diagram showing a configuration example of the pump monitor system. The pump monitor system 17 includes a system management personal computer 20, and the system management personal computer 20 includes data collection personal computers 21 and 21 (the data collection personal computer 21 is a pump). A monitor personal computer 22 and a failure prediction determination personal computer 23 are connected to the control panel 15. Each data collection personal computer 21 receives the measurement output from each sensor of the sensor group 14 attached to each vacuum pump 11 and detects each state change amount. The detected state change amount is sent from each data collection personal computer 21, 21 to the system management personal computer 20. The monitor personal computer 22 monitors the state of each vacuum pump 11, and the failure prediction determination personal computer 23 determines normality / abnormality based on the state change amount of each vacuum pump 11, and outputs an alarm if it is determined abnormal.
[0036]
【The invention's effect】
As described above, according to the invention described in each claim, the following excellent effects can be obtained.
[0037]
According to the first aspect of the present invention, the rotational speed of the pump rotor of the vacuum pump is changed at a timing that does not affect the process of the process apparatus, and the state change amount at the time of the change in the rotational speed is changed to the state change amount at the normal time. Compared with, the normal / abnormal judgment is made, so the amount of state change when the vacuum pump is abnormal is the one when the rotation speed changes (or changes) than that during steady pump operation. However, since the change width becomes large, it is possible to easily and accurately determine normality / abnormality , and it does not affect the process of the process apparatus .
[0038]
According to the invention described in claim 2 or 3, the amount of state change from the stop of the pump rotor when the vacuum pump is started until the rated rotation is reached or the rated rotation of the pump rotor when the vacuum pump is stopped until the stop state is reached. It is easy to measure the change and compare it with the value at the time of shipment and the value fed back from the field (including conditions such as usage conditions (pressure, gas amount) etc.) Normal / abnormal can be determined accurately.
[0039]
According to the invention described in claim 4 or 5, the change in state when the rotational speed of the pump rotor of the vacuum pump is intentionally made faster or slower than the rated rotational speed is measured . By comparing the change amount with a value set in advance according to the use condition or the like, or a value fed back from the use state, and determining abnormality / normality, it is possible to determine normality / abnormality easily and accurately.
[0040]
According to the sixth aspect of the invention, as in the first aspect of the invention, the rotational speed of the pump rotor of the vacuum pump is changed at a timing that does not affect the process of the process device, and the rotational speed is changed. the state variation compared to the state variation of the normal, since the determination of the normal or abnormal, the rotation speed than that of the state variation during pump steady operation when the abnormality in the vacuum pump has occurred When changing (or changing), the range of change becomes larger, so that normality / abnormality can be determined easily and accurately , and the process of the process apparatus is not affected .
[Brief description of the drawings]
FIG. 1 is a diagram showing a system configuration example of a vacuum pump failure diagnosis apparatus according to the present invention.
FIG. 2 is a diagram showing a processing example when a failure diagnosis is performed by increasing or decreasing the number of rotations of the vacuum pump with the vacuum pump failure diagnosis device according to the present invention.
FIG. 3 is a diagram illustrating an example of a normal / abnormal determination routine when a failure diagnosis is performed by increasing or decreasing the number of rotations of the vacuum pump.
FIG. 4 is a diagram showing a processing example when a failure diagnosis is performed by starting or stopping the vacuum pump with the failure diagnosis device for a vacuum pump according to the present invention.
FIG. 5 is a diagram illustrating an example of normal / abnormal determination routines when a failure diagnosis is performed by starting or stopping a vacuum pump.
FIG. 6 is a diagram showing a system configuration example of a vacuum pump failure diagnosis apparatus according to the present invention.
7 is a diagram showing a configuration example of the pump monitor system of FIG. 6. FIG.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 10 Process apparatus 11 Vacuum pump 12 Detoxification apparatus 13 Factory scrubber 14 Sensor group 15 Pump control panel 16 Alarm device, pager, E-mail
17 Pump monitor system 20 System management personal computer 21 Data collection personal computer 22 Monitor personal computer 23 Failure prediction judgment personal computer

Claims (6)

プロセス装置に接続され、該プロセス装置で使用するプロセスガスを排気する真空ポンプの故障を事前に診断する真空ポンプの故障診断装置であって、
前記プロセス装置のプロセスへの影響がないタイミングに前記真空ポンプのポンプロータの回転数を変化させるポンプロータ回転数変化手段と、
前記ポンプロータ回転数変化手段によるポンプロータの回転数変化時における前記真空ポンプの状態変化量を測定する状態変化量測定手段と、
前記真空ポンプの正常時の状態変化量と前記状態変化量測定手段で測定した状態変化量を比較する状態変化量比較手段と、
前記状態変化量比較手段で正常時の状態変化量と前記測定した状態変化量とを比較し、その差が所定量大きく又は小さくなった場合、異常と診断する診断手段とを備えたことを特徴とする真空ポンプの故障診断装置。 A fault diagnosis device for a vacuum pump that is connected to a process device and diagnoses in advance a failure of a vacuum pump that exhausts a process gas used in the process device,
A pump rotor rotation speed changing means for changing the rotation speed of the pump rotor of the vacuum pump at a timing that does not affect the process of the process apparatus;
State change amount measuring means for measuring a state change amount of the vacuum pump at the time of pump rotor rotation speed change by the pump rotor rotation speed change means;
A state change amount comparison means for comparing the state change amount measured in a normal state when the change amount and the state change amount measuring means of the vacuum pump,
Comparing the pre-Symbol state change state variation of the normal in quantity comparing means and the measured state variation, if the difference becomes a predetermined amount larger or smaller, further comprising a diagnostic means for diagnosing an abnormal A fault diagnosis device for vacuum pumps. 請求項１に記載の真空ポンプの故障診断装置において、
前記状態変化量は、前記ポンプロータ回転数変化手段による前記真空ポンプ起動時のポンプロータの停止から定速回転に達するまでの状態変化量であることを特徴とする真空ポンプの故障診断装置。In the vacuum pump failure diagnosis device according to claim 1,
The fault diagnosis device for a vacuum pump according to claim 1, wherein the state change amount is a state change amount from the stop of the pump rotor when the vacuum pump is started by the pump rotor rotation speed changing means until reaching a constant speed rotation. 請求項１に記載の真空ポンプの故障診断装置において、
前記状態変化量は、前記ロータ回転数変化手段による前記真空ポンプ停止時のポンプロータの定速回転から停止までの状態変化量であることを特徴とする真空ポンプの故障診断装置。In the vacuum pump failure diagnosis device according to claim 1,
The vacuum pump failure diagnosis device according to claim 1, wherein the state change amount is a state change amount from a constant speed rotation to a stop of the pump rotor when the vacuum pump is stopped by the rotor rotation speed changing means . 請求項１に記載の真空ポンプの故障診断装置において、
前記状態変化量は、前記ロータ回転数変化手段による前記真空ポンプのポンプロータを定速回転から所定の低速回転に下げた時の状態変化量であることを特徴とする真空ポンプの故障診断装置。In the vacuum pump failure diagnosis device according to claim 1,
The state change amount is a state change amount when the pump rotor of the vacuum pump is lowered from a constant speed rotation to a predetermined low speed rotation by the rotor rotation speed changing means . 請求項１に記載の真空ポンプの故障診断装置において、
前記状態変化量は、前記ロータ回転数変化手段による前記真空ポンプのポンプロータを定速回転から所定の高速回転に上げた時の状態変化量であることを特徴とする真空ポンプの故障診断装置。In the vacuum pump failure diagnosis device according to claim 1,
The state change amount is a state change amount when the pump rotor of the vacuum pump is raised from a constant speed rotation to a predetermined high speed rotation by the rotor rotation speed changing means . プロセス装置に接続され、該プロセス装置で使用するプロセスガスを排気する真空ポンプの故障を事前に診断する真空ポンプの故障診断方法であって、
前記プロセス装置のプロセスへの影響がないタイミングに前記真空ポンプのポンプロータの回転数を変化させるポンプロータ回転数変化工程と、
前記ポンプロータ回転数変化工程によるポンプロータの回転数変化時における前記真空ポンプの状態変化量を測定する状態変化量測定工程と、
前記真空ポンプの正常時の状態変化量と前記状態変化量測定工程で測定した状態変化量を比較する状態変化量比較工程と、
前記状態変化量比較工程で正常時の状態変化量と前記測定した状態変化量とを比較し、その差が所定量大きく又は小さくなった場合、異常と診断する診断工程とを備えたことを特徴とする真空ポンプの故障診断方法。 A vacuum pump failure diagnosis method for diagnosing in advance a failure of a vacuum pump connected to a process device and exhausting a process gas used in the process device,
A pump rotor rotation speed changing step for changing the rotation speed of the pump rotor of the vacuum pump at a timing that does not affect the process of the process apparatus;
A state change amount measuring step for measuring a state change amount of the vacuum pump when the rotation speed of the pump rotor is changed by the pump rotor rotation speed changing step;
A state change amount comparison step for comparing the state change amount of the vacuum pump in a normal state with the state change amount measured in the state change amount measurement step;
Comparing a normal state change amount and the measured state change amount in the state change amount comparison step, and comprising a diagnosis step of diagnosing an abnormality when the difference becomes larger or smaller by a predetermined amount A fault diagnosis method for vacuum pumps.
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