JP4207530B2 - Conveyance mechanism for workpieces - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a carrying mechanism for workpieces whereby such carrying operations as the replacements of the two workpieces can be performed rapidly without any elevating mechanism. <P>SOLUTION: The carrying mechanism for carrying workpieces W while holding them thereby has three rotational shafts 50, 52, 54, a base member 68 attached to one of the three rotational shafts, guide rails 70A, 70B attached to the base member, moving objects 72A, 72B for moving along the rails, holding members 74A, 74B coupled to the moving objects, arms 78A, 78B coupled to the other respective rotational shafts, and motional-direction converting mechanisms 76A, 76B for converting the rotational motions of the arms into the linear motions of the moving objects. Thereby, the rotational motions of the rotational shafts are so converted into the linear motions of the respective holding members as to move the holding members linearly. <P>COPYRIGHT: (C)2004,JPO

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a transport mechanism for an object to be processed such as a semiconductor wafer.
[0002]
[Prior art]
Generally, in order to manufacture a semiconductor integrated circuit, various processes such as film formation, etching, oxidation, and diffusion are performed on a wafer. In order to improve throughput and yield by miniaturization and high integration of semiconductor integrated circuits, a plurality of processing apparatuses performing the same processing or a plurality of processing chambers performing different processing are provided via a common transfer chamber. So-called clustered processing systems are already known that are coupled to each other and allow continuous processing of various processes without exposing the wafer to the atmosphere.
[0003]
In this type of processing system, for example, a semiconductor wafer is taken out from a cassette container installed at an introduction port of an object to be processed provided in the previous stage of the processing system by using a transfer mechanism, and this is taken into an introduction side transfer chamber of the processing system. After the wafer is aligned by an orienter that performs alignment, the wafer is loaded into a load lock chamber that can be evacuated, and the wafer is surrounded by a plurality of vacuum processing chambers. The wafers are carried into a common transfer chamber in a vacuum atmosphere connected to each other by using another transfer mechanism, and the wafers are sequentially introduced into each processing chamber with the common transfer chamber as a center so that processing is performed continuously. ing. Then, the processed wafer is accommodated in the original cassette container through the original path, for example.
[0004]
By the way, as described above, this type of processing system has one or a plurality of transfer mechanisms therein, and wafer transfer and transfer are automatically performed by these transfer mechanisms.
This transfer mechanism is composed of, for example, an articulated arm that can be horizontally moved, bent, extended, swiveled, and raised and lowered. The wafer is directly held by a pick provided at the tip of the arm and horizontally moved to a transfer position, and the wafer is predetermined. It is designed to be transported to the position.
[0005]
The following is known as the conventional transport mechanism described above.
In Japanese Patent Laid-Open No. 3-19252 (Patent Document 1), a pivot arm connected to a rotating shaft is used to convert rotational motion into direct motion, and a pick is placed at the tip of the pivot arm that linearly moves along the slide rail. A transport mechanism is disclosed which is provided and transports the semiconductor wafer while holding it with this pick.
In Japanese Patent Laid-Open No. 4-129985 (Patent Document 2), two articulated arm mechanisms of a so-called frog leg type that move forward and backward in directions opposite to each other by 180 degrees are provided so as to be able to turn, and a wafer is placed at the tip of each arm. There is disclosed a transfer mechanism provided with a pick for holding so that two wafers can be transferred.
In Japanese Patent Laid-Open No. 6-338554 (Patent Document 3), an articulated arm that is independently bent is provided on two rotary shafts that are arranged in parallel and have different shaft structures, and the tip of each arm is picked. A transfer mechanism for transferring a wafer is disclosed. In this case, the two picks are attached to the arms at different heights in order to avoid interference with each other.
[0006]
[Patent Document 1]
Japanese Patent Laid-Open No. 3-19252 (page 4-5, FIGS. 1 to 4).
[Patent Document 2]
Japanese Patent Laid-Open No. 4-129585 (page 2, FIG. 1).
[Patent Document 3]
JP-A-6-338554 (page 2-3, FIG. 1 to FIG. 3).
[0007]
[Problems to be solved by the invention]
Incidentally, the transport mechanism shown in Patent Document 1 has a problem that it takes time to replace the wafer because there is one pick for holding the wafer.
Further, the transport mechanism shown in Patent Document 2 has a structure in which two picks move forward and backward in directions different by 180 degrees, so that a processed wafer is taken out and unloaded, and unprocessed there. In order to carry in the wafer, it is necessary to turn the entire transfer mechanism by 180 degrees. Therefore, the throughput is improved as compared with the transfer mechanism shown in Patent Document 1. There was a problem of taking time.
[0008]
Further, in the transfer mechanism shown in Patent Document 3, since the horizontal level positions of the two picks are different, the transfer mechanism itself is moved up and down in order to replace the wafer with respect to the same horizontal level position. There has been a problem that an elevating mechanism has to be provided and the apparatus itself has to be complicated.
The present invention has been devised to pay attention to the above problems and to effectively solve them. An object of the present invention is to provide a transport mechanism and a processing system for a target object that can quickly perform a transport operation such as replacement of two target objects without providing an elevating mechanism.
[0009]
[Means for Solving the Problems]
  According to a first aspect of the present invention, in a transport mechanism for holding and transporting an object to be processed, the first to third rotating shafts that are rotatable are attached to the third rotating shaft. A base member, first and second guide rails attached to the base member, a first moving body that moves along the first guide rail, and the object to hold the object to be processed A first holding member connected to the first moving body, a first arm connected to the first rotating shaft, and a rotational motion of the first arm is a linear motion of the first moving body. A first moving direction converting mechanism that converts the first moving direction, a second moving body that moves along the second guide rail, and a second moving body that is coupled to the second moving body to hold the object to be processed. 2 holding members, a second arm connected to the second rotating shaft, and the second arm. Second motion direction converting mechanism for converting the rotational motion of the arm into linear motion of the second moving bodyThe first guide rail is provided on the upper surface of the base member, and the second guide rail is provided on the lower surface.This is a mechanism for transporting an object to be processed.
[0010]
As described above, the first and second guide rails are provided on the base member that is turnable, and the first and second moving bodies that move along these guide rails hold the object to be processed. Since the first and second holding members are respectively provided and the rotary motions of the first and second rotary shafts are converted into linear motions so that the respective holding members are moved linearly. The conveyance operation can be performed quickly.
[0011]
  According to a second aspect of the present invention, in the transport mechanism for holding and transporting the object to be processed, the first to third rotating shafts that are rotatable are attached to the third rotating shaft. A base member; first and second guide rails attached to the base member; a first moving body that moves along the first guide rail; and the first member for holding the object to be processed. A first holding member coupled to one movable body, a first arm coupled to the first rotating shaft, and a rotational motion of the first arm to a linear motion of the first movable body. A first moving direction converting mechanism for converting, a second moving body moving along the second guide rail, and a second connected to the second moving body to hold the object to be processed. Holding member, a second arm connected to the second rotating shaft, and the second arm A second movement direction conversion mechanism that converts rotational movement into linear movement of the second movable body, and the first and second guide rails are provided on either the upper surface or the lower surface of the base member. The transport mechanism for the object to be processed is provided, wherein the first and second guide rails are arranged at different height positions.
According to a third aspect of the present invention, in a transport mechanism for holding and transporting an object to be processed, the first to third rotating shafts that are rotatable are attached to the third rotating shaft. A base member; first and second guide rails attached to the base member; a first moving body that moves along the first guide rail; and the first member for holding the object to be processed. A first holding member coupled to one movable body, a first arm coupled to the first rotating shaft, and a rotational motion of the first arm to a linear motion of the first movable body. A first moving direction converting mechanism for converting, a second moving body moving along the second guide rail, and a second connected to the second moving body to hold the object to be processed. Holding member, a second arm connected to the second rotating shaft, and the second arm A second movement direction conversion mechanism that converts a rotational movement into a linear movement of the second moving body, and the first movement direction conversion mechanism is a first auxiliary provided in the first moving body. The second motion is composed of a guide rail and a first auxiliary moving body which is provided so as to be movable along the first auxiliary guide rail and which is rotatably attached to a tip end of the first arm. The direction changing mechanism is provided so as to be movable along the second auxiliary guide rail provided on the second movable body and the second auxiliary guide rail, and is rotatable at the tip of the second arm. And a second auxiliary moving body attached to the object..
  In this case, for example, billingItem 4As defined, the first and second holding members have first and second picks for holding the object to be processed directly at the tips of the first and second holding members, respectively. One of the two is formed with a step for positioning the first and second picks at substantially the same horizontal level.ing.
[0012]
  For example, as defined in claim 5, the first and second guide rails are directed in directions different from each other by a predetermined angle.
  For example, as defined in claim 6, the first and second guide rails are:Assuming they are in the same planeThey are arranged to cross each other. Accordingly, the moving distance of the holding member that holds the object to be processed can be increased without increasing the minimum turning radius of the transport mechanism.
  For example, as defined in claim 7,Adjustment means for adjusting the opening angle of the first and second guide rails is provided..
  For example, as defined in claim 8,The first and second auxiliary guide rails are disposed so as to be orthogonal to the first and second guide rails, respectively.Has been.
[0013]
Further, for example, as defined in claim 9, the first to third rotating shafts are provided with a different shaft structure in which the first and second rotating shafts are arranged in parallel with the third rotating shaft. Yes.
According to a tenth aspect of the present invention, in a transport mechanism for holding and transporting an object to be processed, the first and second rotating shafts that are rotatable and a base member that is attached to the second rotating shaft. A guide rail attached to the base member, a moving body that moves along the guide rail, a holding member connected to the moving body to hold the object to be processed, and the first rotation An arm connected to a shaft, and a movement direction conversion mechanism that converts the rotational movement of the arm into a linear movement of the moving body, the movement direction conversion mechanism being provided on the moving body, and the guide rail An auxiliary guide rail provided so as to be substantially orthogonal, and an auxiliary moving body provided so as to be movable along the auxiliary guide rail and rotatably attached to the tip of the arm. It is a transport mechanism of the physical body.
Accordingly, when the holding member that holds the object to be processed starts or stops moving, the speed of the holding member can be reduced, and when the holding member is moving forward and backward, the speed is increased. Can do. As a result, the object to be processed can be safely and reliably transported without reducing the transport throughput.
[0014]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, an embodiment of a conveyance mechanism for an object to be processed according to the present invention will be described in detail with reference to the accompanying drawings.
FIG. 1 is a block diagram showing an example of a processing system provided with a transport mechanism for a target object of the present invention, FIG. 2 is a perspective view showing a transport mechanism for a target object of the present invention, and FIG. 3 is a transport mechanism shown in FIG. FIG. 4 is a bottom view of the transport mechanism shown in FIG. 2, FIG. 5 is a schematic sectional view showing a bearing structure of the transport mechanism, and FIG. 6 is an operation explanatory view showing the operation of the transport mechanism.
[0015]
First, the processing system will be described.
As shown in FIG. 1, the processing system 2 has a plurality of, for example, four processing chambers 4A, 4B, 4C, and 4D, a common transfer chamber 6 that can be evacuated in a substantially hexagonal shape, and a load lock function. It mainly includes first and second load lock chambers 8A and 8B that can be evacuated and an elongated introduction-side transfer chamber 10.
Specifically, the processing chambers 4A to 4D are joined to four sides of the substantially hexagonal common transfer chamber 6, and the first and second load lock chambers 8A and 8B are joined to the other two sides. Each is joined. The introduction-side transfer chamber 10 is connected in common to the first and second load lock chambers 8A and 8B.
[0016]
Between the common transfer chamber 6 and the four processing chambers 4A to 4D and between the common transfer chamber 6 and the first and second load lock chambers 8A and 8B, each can be opened and closed in an airtight manner. The gate valve G is joined and formed into a cluster tool, and can communicate with the common transfer chamber 6 as necessary. Further, between the first and second load lock chambers 8A and 8B and the introduction-side transfer chamber 10, a gate valve G that can be opened and closed in an airtight manner is interposed.
[0017]
In the four processing chambers 4A to 4D, susceptors 12A to 12D for placing semiconductor wafers as objects to be processed are provided, respectively, and the same kind or different kinds of semiconductor wafers W as objects to be processed are provided. The processing of. In the common transfer chamber 6, a second transfer mechanism 14 that can be moved back and forth and turned is provided at a position where the two load lock chambers 8 </ b> A and 8 </ b> B and the four process chambers 4 </ b> A to 4 </ b> D can be accessed. This has two picks 14A and 14B, and the picks 14A and 14B hold a wafer so that two wafers can be handled at a time. The detailed structure of the second transport mechanism 14 will be described later.
[0018]
The introduction-side transfer chamber 10 is formed by a horizontally long box, and one or a plurality of, in the illustrated example, three carry-in portions for introducing a semiconductor wafer as an object to be processed are formed on one side of the horizontally long. A mouth 16 is provided, and each carry-in entrance 16 is provided with an open / close door 21 that can be opened and closed. Corresponding to each carry-in port 16, introduction ports 18A, 18B, and 18C are respectively provided, and one cassette container 20 can be placed on each of them. In each cassette container 20, a plurality of, for example, 25 wafers W can be placed and accommodated in multiple stages at an equal pitch.
[0019]
In the introduction-side transfer chamber 10, a first transfer mechanism 22 that is an introduction-side transfer mechanism for transferring the wafer W along its longitudinal direction is provided. The first transport mechanism 22 is slidably supported on a guide rail 24 provided so as to extend in the introduction-side transport chamber 10 along the length direction. The guide rail 24 incorporates, for example, a linear motor having an encoder as a moving mechanism, and the first transport mechanism 22 moves along the guide rail 24 by driving the linear motor.
[0020]
The first transport mechanism 22 has two articulated arms 32 and 34 arranged in two upper and lower stages. Bifurcated picks 22A and 22B are attached to the tips of the articulated arms 32 and 34, respectively, and the wafer W is directly held on the picks 22A and 22B. Accordingly, the articulated arms 32 and 34 can be bent and extended in the radial direction from the center and can be raised and lowered, and the bending and extending operations of the articulated arms 32 and 34 can be individually controlled. The rotation axes of the articulated arms 32 and 34 are coupled to the base 36 so as to be rotatable coaxially, and can rotate integrally in a turning direction with respect to the base 36, for example. Here, there are cases where only one articulated arm 32, 34 is provided instead of two.
[0021]
Further, an orienter 26 for aligning the wafer is provided at the other end of the introduction side transfer chamber 10, and the two load lock chambers 8 </ b> A and 8 </ b> B are provided in the middle of the introduction side transfer chamber 10 in the longitudinal direction. Each is provided through the gate valve G which can be opened and closed.
The orienter 26 has a turntable 28 and is rotated with the wafer W placed thereon. An optical sensor 30 for detecting the peripheral edge of the wafer W is provided on the outer periphery of the turntable 28, whereby the positioning notch of the wafer W, for example, the position direction of the notch or the orientation flat or the position of the center of the wafer W is provided. The amount of deviation can be detected.
[0022]
In addition, in the first and second load lock chambers 8A and 8B, mounting tables 38A and 38B having a diameter smaller than the wafer diameter are installed for temporarily mounting the wafer W, respectively. Control of the entire operation of the processing system 2, for example, operation control of each of the transport mechanisms 14, 22 and the orienter 26 is performed by a control unit 40 including, for example, a microcomputer.
[0023]
Next, the second transfer mechanism 14 provided in the common transfer chamber 6 will be described with reference to FIGS.
First, as shown in FIG. 5, the second transport mechanism 14 is operated by three rotary shafts 50, 52, and 54 provided in an airtight state in mounting holes formed in the bottom plate 6 </ b> A of the common transport chamber 6. These three rotation shafts 50, 52, 54 are formed in a three-axis coaxial structure so that the respective rotation centers are the same, as disclosed in, for example, Japanese Patent Application Laid-Open No. 11-198070. The innermost rotation shaft (first rotation shaft) 50, the intermediate rotation shaft (third rotation shaft) 52, and the outermost rotation shaft (second rotation shaft) 54 are sequentially arranged coaxially from the center toward the outside. Is done. Bearings 56 are interposed between the coaxially adjacent rotary shafts 50, 52, 54 and between the outermost peripheral rotary shaft 52 and the mounting hole area screen of the bottom plate 6A. 52 and 54 are individually rotatable.
[0024]
The lower portions of the rotary shafts 50, 52 and 54 are airtightly surrounded by a casing 60 attached to the bottom plate 6A via a seal member 58 such as an O-ring. Drive motors 62, 64, 66, such as step motors, each including a rotor and a stator are provided between the lower portions of the rotary shafts 50, 52, 54 and the inner wall of the casing 60. The rotary shafts 50, 52, and 54 can be rotated forward and backward.
[0025]
2 to 4, the second transport mechanism 14 has two picks 14 </ b> A and 14 </ b> B that directly hold the wafer as described above. Specifically, first, the second transport mechanism 14 has a plate-like base member 68 formed in a substantially V shape, and the base member 68 is placed in an intermediate rotation shaft so as to be in a horizontal state. It is attached and fixed to (third rotating shaft) 52 so that it can turn (see FIG. 5). Here, the term “first to third rotating shafts” does not indicate the arrangement position of the rotating shafts, but is merely used to formally distinguish the three rotating shafts. The V-shape of the base member 68 is set, for example, to an opening angle of about 60 degrees. This opening angle is the same as the opening direction of the adjacent processing chambers 4A to 4D with respect to the rotation center of the second transfer mechanism 14 and the opening direction of the first and second load lock chambers 8A and 8B. Is set to
[0026]
As shown in FIG. 3, a first guide rail 70A is linearly provided on one side of the upper surface of the base member 68, and the first guide rail 70A extends along this rail. The first moving body 72A is fitted so as to be movable so as not to come off.
A first holding member 74A, which is formed in an L shape and has a tip end substantially parallel to the first guide rail 70A, is attached and fixed to the upper surface side of the first moving body 72A. Has been. The one pick 14A is attached to the tip of the first holding member 74A.
[0027]
Further, a first motion direction conversion mechanism 76A is provided on the base side of the first holding member 74A. A first arm 78A is attached to the innermost peripheral rotation shaft (first rotation shaft) 50 by connecting the base side thereof, and the distal end portion of the first arm 78A is connected to the first arm 78A. It is connected to the movement direction conversion mechanism 76A, and converts the rotational movement of the first arm 78A into the linear movement of the first moving body 72A. Specifically, the first motion direction conversion mechanism 76A includes a short first auxiliary guide rail 80A attached to the proximal end portion of the first holding member 74A, that is, the first moving body 72A, and the first auxiliary guide rail 80A. The first auxiliary moving body 82A is provided so as not to be disengageable along the first auxiliary guide rail 80A, and the tip end portion of the first arm 78A is the first auxiliary moving body 82A. It is rotatably attached to the upper part of the auxiliary moving body 82A via a rotating shaft 84A. In this case, the first auxiliary guide rail 80A is arranged so as to be substantially orthogonal to the lower first guide rail 70A when viewed in plan.
[0028]
With this configuration, the first auxiliary moving body of the first movement direction conversion mechanism 76A is obtained by rotating the innermost peripheral rotation shaft 50 and turning the first arm 78A in the forward and reverse directions. 82A slides on the first auxiliary guide rail 80A. At this time, the lower first moving body 72A slides along the first guide rail 70A, so that the tip of the first holding member 74A The pick 14 </ b> A provided in the forward and backward movements moves forward and backward along the first guide rail 70 </ b> A.
Here, the other pick 14B is also attached to the lower surface side (back surface side) of the base member 68 with the same configuration.
[0029]
As shown in FIG. 4, a second guide rail 70B is provided in a straight line on the other side of the lower surface (back surface) of the base member 68, and the second guide rail 70B is provided with this rail. The second moving body 72B is fitted so as not to be disengaged.
The second moving body 72B is formed in an L-shape on the upper surface side (the lower surface side in FIG. 2), and the tip end side is substantially parallel to the second guide rail 70B. The holding member 74B is attached and fixed. The other pick 14B is attached to the tip of the second holding member 74B.
[0030]
A second motion direction conversion mechanism 76B is provided on the base side of the second holding member 74B. A second arm 78B is attached to the outermost peripheral rotation shaft (second rotation shaft) 54 by connecting the base side thereof, and the distal end portion of the second arm 78B is in the second motion. Coupled to the direction changing mechanism 76B, the rotational movement of the second arm 78B is converted into the linear movement of the second moving body 72B. Specifically, the second movement direction conversion mechanism 76B includes a short second auxiliary guide rail 80B attached to the base end portion of the second holding portion 74B, that is, the second moving body 72B side, The second auxiliary moving body 82B is provided so as not to be disengageable along the second auxiliary guide rail 80B. The tip of the second arm 78B is connected to the second auxiliary guide rail 80B. The auxiliary moving body 82B is rotatably attached to the upper part (lower part in FIG. 2) via a rotating shaft 84B. In this case, the second auxiliary guide rail 80B is arranged so as to be substantially orthogonal to the lower second guide rail 70B when viewed in plan.
[0031]
With this configuration, the second auxiliary moving body 82B of the second movement direction conversion mechanism 76B is rotated by rotating the outermost peripheral rotation shaft 54 and turning the second arm 78B in the forward and reverse directions. Slides on the second auxiliary guide rail 80B. At this time, the lower second moving body 72B slides along the second guide rail 70B, so that the tip of the second holding member 74B is moved. The provided pick 14B moves forward and backward along the second guide rail 70B.
[0032]
Here, unlike the first holding member 74A, the second holding member 74B is cut in two in the middle of the longitudinal direction of the second holding member 74B so that the heights of the two holding members 74B are increased. Differently connected stepped portions 86 are provided so that both picks 14A, 14B are at substantially the same horizontal level. In addition, you may make it provide this step part 86 not in the 2nd holding member 74B but in the 1st holding member 74A. As can be seen from FIGS. 3 and 4, the first and second guide rails 70 </ b> A and 70 </ b> B are arranged so as to intersect if they are assumed to be in the same plane. Therefore, the moving distance of the holding member that holds the object to be processed can be increased without increasing the minimum turning radius of the transport mechanism.
[0033]
Next, the operation of the present embodiment configured as described above will be described.
First, as shown in FIG. 1, an unprocessed semiconductor wafer W is used from the inside of the cassette container 20 installed in any one of the three introduction ports 18 </ b> A to 18 </ b> C using a first transfer mechanism 22. The wafer W is transferred to the orienter 26 where it is aligned.
The wafer W after the alignment is again held by the first transfer mechanism 22 and is carried into one of the first and second load lock chambers 8A and 8B. The wafer W in the load lock chamber is taken into the common transfer chamber 6 which has been in a vacuum state in advance using the second transfer mechanism 14 according to the present invention provided in the common transfer chamber 6, and this wafer W is carried into a predetermined processing chamber among the four processing chambers 4A to 4D, and predetermined processing is performed on the wafer W. When the wafer W is loaded into the processing chamber, generally, the processed wafer that has been previously loaded into the processing chamber and has been processed is replaced with an unprocessed wafer. In this way, the wafers W are sequentially transferred to other processing chambers as necessary using the second transfer mechanism 14, and a predetermined process is performed each time. The wafer W for which all the processes are completed is returned to the original cassette container 20 through one of the two load lock chambers 8A and 8B.
[0034]
Next, the operation of the second transport mechanism 14 will be described in detail with reference to FIGS.
Further, when the specific pick of the second transport mechanism 14 is oriented in a specific direction, for example, a specific processing chamber or a load lock chamber, the base member 68 is rotated by rotating the intermediate rotation shaft 52. Is turned and a specific pick, for example, the pick 14A is directed in that direction (see FIG. 6A). At this time, in order to maintain both the picks 14A and 14B in a stationary state with respect to directions other than the turning direction, the innermost peripheral rotation shaft 50 and the outermost outer periphery rotation shaft 54 are also synchronized with the intermediate rotation shaft 52 and rotated. Rotate in the direction.
[0035]
In order to move the first pick 14A forward and backward in this state, the innermost rotation shaft 50 is rotated forward and backward to turn the first arm 78A in the forward and backward direction, thereby moving the first motion conversion mechanism 76A. The first auxiliary moving body 82A slides on the first auxiliary guide rail 80A. At this time, the first moving body 72A slides along the first guide rail 70A. The pick 14A provided at the tip of the member 74A advances and retreats along the first guide rail 70A. In this manner, the wafer W can be carried in and out of the processing chambers 4A to 4D and the first and second load lock chambers 8A and 8B (FIGS. 6B and 6C). )reference).
[0036]
Also, with respect to the other pick 14B, the pick 14B can be advanced and retracted in the same manner as described above by rotating the outermost peripheral rotation shaft 54 forward and backward. Therefore, when replacing the wafer W in the processing chamber, the wafer processed by one empty pick, for example, the pick 14A is received, and then the base member 68 is rotated by 60 degrees and held by the other pick 14B. The unprocessed wafer is operated so as to be carried into the processing chamber.
Here, since both the picks 14A and 14B are set at substantially the same horizontal level, the wafer W can be loaded and unloaded without providing an elevating mechanism for elevating and lowering the entire second transfer mechanism 14. . Here, the substantially same horizontal level means that the difference in height that can be absorbed by lifter pins (not shown) for delivering the wafer W provided in the processing chamber or the like is included in the same horizontal level. .
[0037]
Further, when replacing the wafer, the base member 68 only needs to be rotated by about 60 degrees, so that the rotation angle is smaller than that in the case of the conventional mechanism, and the replacement operation can be performed quickly. Furthermore, the opening angles of the two picks 14A and 14B, that is, the advance and retreat directions are respectively directed to the installation directions of the two adjacent processing chambers. Thus, both processing chambers can be accessed simultaneously.
Note that the opening angle of both the picks 14A and 14B is not limited to 60 degrees, and may be set at an arbitrary opening angle of 0 to 180 degrees. In any case, the wafers W of both the picks 14A and 14B are mutually connected. Set to avoid interference.
[0038]
Further, an adjusting means for adjusting the mounting position of the first and second guide rails 70A and 70B with respect to the base member 68 may be provided to adjust the opening angle of both the picks 14A and 14B. The opening angle of both the picks 14A and 14B can be adjusted in accordance with the number of corners of the planar shape of the common transfer chamber 6 to be attached.
Further, particles are unlikely to be generated on the slide surfaces of the first and second guide rails 70A and 70B and the first and second auxiliary guide rails 80A and 80B, and a film such as a fluororesin is formed. preferable.
[0039]
In the above embodiment, the base member 68 of the intermediate rotation shaft 52 is attached, the first arm 78A is attached to the innermost periphery rotation shaft 50, and the second arm 78B is attached to the outermost periphery rotation shaft 54. However, the present invention is not limited to this, and may be configured as shown in FIG. FIG. 7 is a configuration diagram showing a modified example of the attachment state of each rotary shaft, the first and second arms, and the base member. That is, the base member 68 may be attached to the outermost periphery rotation shaft 54, the first arm 78A may be attached to the innermost periphery rotation shaft 50, and the second arm 78B may be attached to the intermediate rotation shaft 52.
[0040]
In this case, the first guide rail 70A is attached via the first leg 90A raised from one side of the base member 68. The second guide rail 70 </ b> B is attached via a second leg 90 </ b> B raised from the other side of the base member 68. Here, the height (length) of the second leg portion is different from the height (length) of the first leg portion, and the first and second guide rails 70A and 70B interfere with each other. It is supposed not to. The structure of other parts is the same as that described with reference to FIGS. Here, the first rotation shaft is the innermost rotation shaft 50, the second rotation shaft is the outermost rotation shaft 54, and the third rotation shaft is the intermediate rotation shaft 52.
[0041]
In this case, the rotation shaft to which the base member 68 to which the largest rotation torque is applied is attached is the outermost rotation shaft 54 having the largest diameter among the three rotation shafts 50, 52, 54. The stability of the rotational operation can be improved as compared with the transport mechanism having the structure shown in FIG. In this case, instead of attaching the second guide rail 70B to the second leg 90B, it may be attached to the base member 68.
In each of the above embodiments, the case where the three rotating shafts 50, 52, and 54 have a three-axis coaxial structure has been described as an example. However, the present invention is not limited to this. For example, as shown in FIG. The present invention may be applied to a shaft structure.
FIG. 8 is a schematic sectional view showing an example of a different shaft structure. That is, as shown in FIG. 8, a support member 90 is provided on the bottom plate 6A of the common transfer chamber 6, and the bottom plate 6A and the support member 90 provide a large-diameter rotating shaft 92 having a hollow interior with the largest diameter. It is provided to be rotatable through a bearing 94.
[0042]
Then, the two rotary shafts 96 and 98 are rotatably provided through the bearings 100 and 102, respectively, so as to be inserted through the rotary shaft 92 having the large diameter. Thereby, the two rotating shafts 96 and 98 are arranged in parallel with different shaft structures.
And the lower part of each rotating shaft 92,96,98 is airtightly covered with the casing 60 provided via the sealing member 58. FIG. In the illustrated example, the description of the drive motor is omitted.
In this case, the large-diameter rotating shaft 92 becomes the third rotating shaft, and the base member 68 (see FIG. 7) is attached thereto. The two rotation shafts 96 and 98 are, for example, first and second rotation shafts, and the first arm 78A and the second arm 78B are attached to them.
[0043]
In each of the above embodiments, the entire second transport mechanism 14 cannot move in the horizontal direction. However, the second transport mechanism 14 is provided with a horizontal movement mechanism so that the entire second transport mechanism 14 can be moved horizontally ( It may be possible to move in the X-axis direction).
Moreover, although the above-mentioned 2nd conveyance mechanism 14 was provided in the common conveyance chamber 6 made evacuable here, it is not limited to this, You may provide in the conveyance chamber of atmospheric pressure atmosphere, or You may make it provide in the introduction side conveyance chamber 10 with the horizontal movement mechanism mentioned above.
Although a semiconductor wafer has been described as an example of an object to be processed here, the present invention is not limited to this, and the present invention can of course be applied to a glass substrate, an LCD substrate, or the like.
[0044]
【The invention's effect】
As described above, according to the conveyance mechanism of the object to be processed of the present invention, the following excellent operational effects can be exhibited.
First and second guide rails are respectively provided on the base member that can be turned, and the first and second moving bodies that move along these guide rails hold the object to be processed. The holding members are provided, and the rotary motions of the first and second rotating shafts are converted into linear motions to move the holding members linearly. Can be done.
[Brief description of the drawings]
FIG. 1 is a configuration diagram showing an example of a processing system provided with a transport mechanism for an object to be processed according to the present invention.
FIG. 2 is a perspective view illustrating a conveyance mechanism for an object to be processed according to the present invention.
FIG. 3 is a top view of the transport mechanism shown in FIG.
4 is a bottom view of the transport mechanism shown in FIG. 2. FIG.
FIG. 5 is a schematic cross-sectional view showing a bearing structure of a transport mechanism.
FIG. 6 is an operation explanatory view showing the operation of the transport mechanism.
FIG. 7 is a configuration diagram showing a modified example of an attachment state of each rotation shaft, first and second arms, and a base member.
FIG. 8 is a schematic cross-sectional view showing an example of a different shaft structure.
[Explanation of symbols]
2 Processing system
4A-4D processing chamber
6 Common transfer room (transfer room)
8A, 8B Load lock room
10 Introduction-side transfer chamber (transfer chamber)
14 Second transport mechanism
14A, 14B pick
22 First transport mechanism
50, 52, 54 rotation axis
68 Base member
70A First guide rail
70B Second guide rail
72A First moving body
72B Second moving body
74A First holding member
74B Second holding member
76A First motion direction conversion mechanism
76B Second motion direction conversion mechanism
78A first arm
78B Second arm
80A first auxiliary rail
80B second auxiliary rail
82A First auxiliary moving body
82B Second auxiliary moving body
86 steps
90A first leg
90B second leg
W Semiconductor wafer (object to be processed)

Claims (10)

In a transport mechanism for holding and transporting a workpiece,
First to third rotating shafts made rotatable, and
A base member attached to the third rotating shaft;
First and second guide rails attached to the base member;
A first moving body that moves along the first guide rail;
A first holding member coupled to the first moving body to hold the object to be processed;
A first arm connected to the first rotating shaft;
A first motion direction conversion mechanism that converts the rotational motion of the first arm into the linear motion of the first moving body;
A second moving body that moves along the second guide rail;
A second holding member coupled to the second moving body to hold the object to be processed;
A second arm connected to the second rotating shaft;
A second movement direction conversion mechanism that converts the rotational movement of the second arm into the linear movement of the second moving body ;
A transport mechanism for an object to be processed, wherein the first guide rail is provided on an upper surface of the base member, and the second guide rail is provided on a lower surface . In a transport mechanism for holding and transporting a workpiece,
First to third rotating shafts made rotatable, and
A base member attached to the third rotating shaft;
First and second guide rails attached to the base member;
A first moving body that moves along the first guide rail;
A first holding member coupled to the first moving body to hold the object to be processed;
A first arm connected to the first rotating shaft;
A first motion direction conversion mechanism that converts the rotational motion of the first arm into the linear motion of the first moving body;
A second moving body that moves along the second guide rail;
A second holding member coupled to the second moving body to hold the object to be processed;
A second arm connected to the second rotating shaft;
A second movement direction conversion mechanism that converts the rotational movement of the second arm into the linear movement of the second moving body ;
The first and second guide rails are provided on either the upper surface or the lower surface of the base member, and the first and second guide rails are arranged at different height positions. A mechanism for conveying the object to be processed. In a transport mechanism for holding and transporting a workpiece,
First to third rotating shafts made rotatable, and
A base member attached to the third rotating shaft;
First and second guide rails attached to the base member;
A first moving body that moves along the first guide rail;
A first holding member coupled to the first moving body to hold the object to be processed;
A first arm connected to the first rotating shaft;
A first motion direction conversion mechanism that converts the rotational motion of the first arm into the linear motion of the first moving body;
A second moving body that moves along the second guide rail;
A second holding member coupled to the second moving body to hold the object to be processed;
A second arm connected to the second rotating shaft;
A second movement direction conversion mechanism that converts the rotational movement of the second arm into the linear movement of the second moving body ;
The first movement direction conversion mechanism is:
A first auxiliary guide rail provided on the first moving body;
A first auxiliary moving body that is movably provided along the first auxiliary guide rail and that is rotatably attached to the tip of the first arm;
The second movement direction conversion mechanism is:
A second auxiliary guide rail provided on the second moving body;
Conveying the object to be processed, comprising: a second auxiliary moving body which is provided so as to be movable along the second auxiliary guide rail and which is rotatably attached to the tip of the second arm. mechanism. At the front ends of the first and second holding members, there are first and second picks for directly holding the object to be processed, respectively, and one of the first and second holding members has workpiece mounting serial to any one of claims 1 to 3, characterized in that stepped portions for positioning the first and second pick substantially same horizontal level with each other is formed Transport mechanism.   5. The transport mechanism for an object to be processed according to claim 1, wherein the first and second guide rails are directed in directions different from each other by a predetermined angle. 6. It said first and second guide rails, the transport mechanism of the target object according to claim 5, characterized in that it is arranged so as to cross each other physician when it is assumed to be in the same plane. 7. The conveyance mechanism for an object to be processed according to claim 5, further comprising an adjusting means for adjusting an opening angle of the first and second guide rails. The said 1st and 2nd auxiliary guide rail is arrange | positioned so that it may respectively orthogonally cross with respect to the said 1st and 2nd guide rail, The conveyance mechanism of the to-be-processed object of Claim 3 characterized by the above-mentioned.   8. The first to third rotating shafts according to claim 1, wherein the first and second rotating shafts are provided with a different shaft structure in which the first and second rotating shafts are arranged in parallel to the third rotating shaft. The conveyance mechanism of the to-be-processed object as described in any one of Claims. In a transport mechanism for holding and transporting a workpiece,
First and second rotating shafts made rotatable;
A base member attached to the second rotating shaft;
A guide rail attached to the base member;
A moving body that moves along the guide rail;
A holding member coupled to the moving body to hold the object to be processed;
An arm connected to the first rotating shaft;
A movement direction conversion mechanism for converting the rotational movement of the arm into the linear movement of the movable body,
The movement direction conversion mechanism is
An auxiliary guide rail provided on the movable body and provided substantially orthogonal to the guide rail;
A conveyance mechanism for an object to be processed, comprising: an auxiliary moving body which is provided so as to be movable along the auxiliary guide rail and which is rotatably attached to the tip of the arm.

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