JP4203913B2 - Vacuum device - Google Patents

Vacuum device Download PDF

Info

Publication number
JP4203913B2
JP4203913B2 JP2001375301A JP2001375301A JP4203913B2 JP 4203913 B2 JP4203913 B2 JP 4203913B2 JP 2001375301 A JP2001375301 A JP 2001375301A JP 2001375301 A JP2001375301 A JP 2001375301A JP 4203913 B2 JP4203913 B2 JP 4203913B2
Authority
JP
Japan
Prior art keywords
vacuum
magnetic fluid
fluid seal
shaft
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001375301A
Other languages
Japanese (ja)
Other versions
JP2003170038A (en
Inventor
正 高橋
Original Assignee
株式会社 ユニバーサル システムズ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社 ユニバーサル システムズ filed Critical 株式会社 ユニバーサル システムズ
Priority to JP2001375301A priority Critical patent/JP4203913B2/en
Publication of JP2003170038A publication Critical patent/JP2003170038A/en
Application granted granted Critical
Publication of JP4203913B2 publication Critical patent/JP4203913B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Description

【0001】
【発明が属する技術分野】
本発明は、真空装置に関し、詳しくは、真空室内に延びた回転軸を外気圧側から駆動する真空装置に関する。例えばCDや光ディスクの射出成形用マスタープレート等の作成は、光学的加工手段を超える微細加工を行うことが求められることから、高真空雰囲気中で高速回転させながら電子ビームを照射して所望の情報を書き込むことで行われるが、これに用いられる情報記録装置は、真空装置の典型例である。本発明は、クリーンかつ超高真空を必要とするCVD装置、スパッタ装置、真空蒸着装置、MBE装置等の成膜装置に基板を着脱するための搬送装置を包含する真空装置に関する。
【0002】
上記情報記録装置は、ワーク、即ち加工対象のプレートを真空室内で回転させるために回転軸を有するが、この回転軸は高速且つ正確な回転のために空気軸受等によって支持・支承されるのが通例である。このため、この種の装置は、真空室内に延びた回転軸を外気圧側から駆動するものとなっている。
【0003】
そして、回転軸が外気圧側から真空室に延びていれば、その部分をシールする必要がある。この発明は、真空室内に延びた回転軸を外気圧側から駆動する真空装置について、特にその二軸の同軸型回転軸の場合のシール技術に関する。
【0004】
【従来の技術】
従来、CVD装置等の真空装置においては、差動排気方法又は中間室排気方法が極く一般的に用いられている。磁性流体シールにおいても、同様な考えで可能であり、例えば、特開平09−215917号公報や特開平09−089120号公報に記載されている。しかしながら、上記公知の手段では、二軸の場合に内側のシール部に対しては課題を解決できていない。
【0005】
【発明が解決しようとする課題】
即ち、従来技術においては、一軸の動力導入については有効であったが、二軸の場合には、内側のシール軸からベアリングや磁性流体シールのオイルが真空室内に侵入してクリーン度や超高真空達成に問題があった。したがって、本発明の課題は、上記問題点を解消することに有り、二軸以上の同軸型磁性流体シールを備えた真空装置において、装置内真空環境が、ベアリングや磁性流体からの脱離ガスによって影響を受けることがないようクリーンかつ超高真空に保持できる装置を提供することにある。
【0006】
【課題を解決するための手段】
そこで、本発明は、上記課題を解決するために、外側の軸に貫通孔をあけることにより、軸が回転中でも十分な中間室排気効果を得ることができる真空装置を提供することにある
【0007】
このような解決手段の真空装置にあっては、真空室内に延びた回転軸が外気圧側から駆動されて、真空雰囲気内での回転物の加工等が行なわれる。このような真空室と外気圧側とに亘る回転軸周りの間隙を塞ぐ真空装置を備えたことによって、真空室内に関しては、電子ビームやイオンビームによる加工等に必要な高真空状態を確保することが容易になる。
【0008】
この真空装置は、磁性流体シールを具備して回転軸周りの間隙を塞ぐが、この磁性流体シールが真空室と中間室との間に配設されることから、この磁性流体シールは耐圧が外気圧よりも小さくても済む。これにより、磁性流体シールだけで真空室を外気圧から封じる場合に較べて、磁性流体シールの厚さを薄くすることが可能となるので、回転軸の回転抵抗を少なくすることができる。その結果、回転軸の高速回転駆動が一層容易になる。
【0009】
また、磁性流体シールと外気圧との間に中間室10が形成されるが、この排気は、排気管10aを大きく多数設けて、高真空に排気することで、目的とする真空室Aでクリーン且つ高真空を達成する。
【0010】
【発明の実施の形態】
以下、本発明の実施形態について図面を参照しつつ説明する。図1は、本発明に係る実施例の要部断面図、図2は、同部分の要部説明図である。本実施例は、真空室Aの真空室下壁7の下で且つ回転軸1,2の外周に中間室フランジ6を装着し、更にその下部には軸受フランジ5を装着する。そして、真空室下壁7と外側軸2との間をシール部11とし、また内側軸1と外側軸2との間をシール部12としている。
【0011】
また、内側軸磁性流体シール3でシールされ、下方のモータMにより駆動される内側軸1を第1アーム1aに対応させ、また、外側軸磁性流体シール4でシールされ下方のモータMにより駆動される外側軸2をロボット軸の第2アーム2aに対応させることにより、クリーンかつ超高真空な特性を有した各種成膜装置への基板搬送ロボットが構成される。なお、上記内側軸磁性流体シール3及び外側軸磁性流体シール4は、上下のベアリング8間に配置される。
【0012】
即ち、本装置のロボット軸を構成する2本の回転軸は、モータMにより回転駆動される内側軸1と外側軸2とからなり、また、中間室10を形成するフランジ6を介して真空室Aと外気圧側Bとをシール部11とシール部12で接続した真空装置Cであって、外側の円筒型の外側軸2に複数の貫通孔2bを明けた構造となっている。また、同時に、外側の円筒型の外側軸2は一部内径を大きくして拡開部9を形成した構造となっている。なお、上記中間室10からは、空気吸引用の排気管10aが連結されている。なお、上記の「外気圧」とは、大気圧が典型的なものであるが、与圧や減圧された準大気圧の状態も該当する。
【0013】
別例(図外)として、CVD装置や真空蒸着装置において、複数枚の基板を装着した基板ホルダ(基板サセプタ)を使用する場合、成膜膜厚の均一性を向上させるため、外側軸を基板ホルダの回転に使用し、内側軸を歯車等を介して個々の基板の回転に使用することで、公転−自転型の成膜を可能としてもよい。
【0014】
また、上記実施例においては、二軸回転軸の場合を説明したが、三軸以上の回転軸の場合であっても同様の効果が期待できる。
【0015】
【発明の効果】
本発明は、二軸以上の同軸型磁性流体シールを備えた真空装置において、真空室内がベアリングや磁性流体からの脱離ガスによって影響を受けることを防止して、クリーンかつ超高真空に保持できる効果がある
【0016】
【図面の簡単な説明】
【図1】本発明に係る実施例の要部断面図(図2のC部分の断面図)。
【図2】本発明に係る実施例の要部説明図。
【符号の説明】
A ・・・真空室
B ・・・外気圧側
C ・・・真空装置
M ・・・モータ
1 ・・・内側軸(回転軸)
1a・・・第1アーム
2 ・・・外側軸(回転軸)
2a・・・第2アーム
2b・・・貫通孔
3 ・・・内側軸磁性流体シール
4 ・・・外側軸磁性流体シール
5 ・・・軸受フランジ
6 ・・・中間室フランジ
7 ・・・真空室下壁
8 ・・・ベアリング
9 ・・・拡開部
10 ・・中間室
10a・・排気管
11 ・・シール部
12 ・・シール部
[0001]
[Technical field to which the invention belongs]
The present invention relates to a vacuum apparatus, and more particularly, to a vacuum apparatus that drives a rotating shaft extending into a vacuum chamber from the outside air pressure side. For example, the production of master plates for injection molding of CDs and optical discs requires fine processing that exceeds optical processing means, so that desired information can be obtained by irradiating an electron beam while rotating at high speed in a high vacuum atmosphere. The information recording device used for this is a typical example of a vacuum device. The present invention relates to a vacuum apparatus including a transfer apparatus for attaching and detaching a substrate to and from a film forming apparatus such as a CVD apparatus, a sputtering apparatus, a vacuum deposition apparatus, and an MBE apparatus that require a clean and ultra-high vacuum.
[0002]
The information recording apparatus has a rotating shaft for rotating a workpiece, that is, a plate to be processed in a vacuum chamber. The rotating shaft is supported and supported by an air bearing or the like for high-speed and accurate rotation. It is customary. For this reason, this kind of apparatus drives the rotating shaft extended in the vacuum chamber from the external pressure side.
[0003]
If the rotating shaft extends from the external pressure side to the vacuum chamber, it is necessary to seal that portion. The present invention relates to a vacuum apparatus that drives a rotating shaft extending into a vacuum chamber from the outside air pressure side, and more particularly to a sealing technique in the case of a biaxial coaxial rotating shaft.
[0004]
[Prior art]
Conventionally, in a vacuum apparatus such as a CVD apparatus, a differential exhaust method or an intermediate chamber exhaust method is very commonly used. The same concept can be applied to the magnetic fluid seal, and is described in, for example, Japanese Patent Application Laid-Open Nos. 09-215917 and 09-089120. However, the above known means cannot solve the problem for the inner seal portion in the case of two axes.
[0005]
[Problems to be solved by the invention]
In other words, in the prior art, the introduction of uniaxial power was effective, but in the case of two shafts, the oil in the bearing and magnetic fluid seal entered the vacuum chamber from the inner seal shaft, resulting in a cleanliness and ultrahigh power. There was a problem in achieving the vacuum. Accordingly, an object of the present invention is to eliminate the above-mentioned problems. In a vacuum apparatus having a coaxial magnetic fluid seal having two or more axes, the vacuum environment in the apparatus is caused by desorbed gas from a bearing or magnetic fluid. An object of the present invention is to provide an apparatus that can be kept clean and in an ultra-high vacuum so as not to be affected.
[0006]
[Means for Solving the Problems]
Therefore, in order to solve the above-described problems, the present invention is to provide a vacuum apparatus that can obtain a sufficient intermediate chamber exhaust effect even when the shaft is rotating, by forming a through hole in the outer shaft .
[0007]
In such a vacuum device, the rotating shaft extending into the vacuum chamber is driven from the outside air pressure side to process the rotating object in a vacuum atmosphere. By providing a vacuum device that closes the gap around the rotation axis between the vacuum chamber and the external air pressure side, the vacuum chamber must have a high vacuum state necessary for processing with an electron beam or an ion beam. Becomes easier.
[0008]
This vacuum device is provided with a magnetic fluid seal to close the gap around the rotation axis. However, since this magnetic fluid seal is disposed between the vacuum chamber and the intermediate chamber, the magnetic fluid seal has an external pressure resistance. It can be smaller than atmospheric pressure. This makes it possible to reduce the thickness of the magnetic fluid seal as compared with the case where the vacuum chamber is sealed from the external pressure only with the magnetic fluid seal, and thus the rotational resistance of the rotating shaft can be reduced. As a result, it becomes easier to drive the rotary shaft at a high speed.
[0009]
Further, an intermediate chamber 10 is formed between the magnetic fluid seal and the external pressure. This exhaust is provided with a large number of exhaust pipes 10a and exhausted to a high vacuum, so that the target vacuum chamber A is cleaned. And a high vacuum is achieved.
[0010]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a cross-sectional view of a main part of an embodiment according to the present invention, and FIG. 2 is an explanatory view of the main part of the same part. In this embodiment, an intermediate chamber flange 6 is mounted under the vacuum chamber lower wall 7 of the vacuum chamber A and on the outer circumferences of the rotary shafts 1 and 2, and a bearing flange 5 is mounted at the lower portion thereof. The space between the vacuum chamber lower wall 7 and the outer shaft 2 is a seal portion 11, and the space between the inner shaft 1 and the outer shaft 2 is a seal portion 12.
[0011]
Further, the inner shaft 1 sealed by the inner shaft magnetic fluid seal 3 and driven by the lower motor M is made to correspond to the first arm 1a, and sealed by the outer shaft magnetic fluid seal 4 and driven by the lower motor M. By making the outer shaft 2 corresponding to the second arm 2a of the robot shaft, a substrate transfer robot to various film forming apparatuses having clean and ultrahigh vacuum characteristics is configured. The inner shaft magnetic fluid seal 3 and the outer shaft magnetic fluid seal 4 are disposed between the upper and lower bearings 8.
[0012]
That is, the two rotating shafts constituting the robot shaft of the present apparatus are composed of an inner shaft 1 and an outer shaft 2 that are rotationally driven by a motor M, and a vacuum chamber via a flange 6 that forms an intermediate chamber 10. A vacuum device C in which A and an external air pressure side B are connected by a seal portion 11 and a seal portion 12, and has a structure in which a plurality of through holes 2 b are formed in an outer cylindrical outer shaft 2. At the same time, the outer cylindrical outer shaft 2 has a structure in which an enlarged inner portion is formed by partially increasing the inner diameter. The intermediate chamber 10 is connected to an exhaust pipe 10a for air suction. The “outside air pressure” described above is typically atmospheric pressure, but it also corresponds to a state of quasi-atmospheric pressure that has been pressurized or reduced.
[0013]
As another example (not shown), when using a substrate holder (substrate susceptor) equipped with a plurality of substrates in a CVD apparatus or a vacuum deposition apparatus, the outer shaft is used as a substrate in order to improve the film thickness uniformity. Revolution-spinning type film formation may be possible by using the holder for rotation and using the inner shaft for rotation of individual substrates via gears or the like.
[0014]
In the above embodiment, the case of the biaxial rotating shaft has been described. However, the same effect can be expected even when the rotating shaft has three or more axes.
[0015]
【The invention's effect】
The present invention is a vacuum apparatus equipped with a coaxial magnetic fluid seal of two or more axes, and can be kept clean and ultra-high vacuum by preventing the vacuum chamber from being affected by desorption gas from bearings and magnetic fluid. There is an effect .
[0016]
[Brief description of the drawings]
FIG. 1 is a cross-sectional view of a main part of an embodiment according to the present invention (cross-sectional view of a portion C in FIG. 2).
FIG. 2 is an explanatory diagram of a main part of an embodiment according to the present invention.
[Explanation of symbols]
A ... Vacuum chamber B ... External pressure side C ... Vacuum apparatus M ... Motor 1 ... Inner shaft (rotary shaft)
1a ... 1st arm 2 ... Outer shaft (rotating shaft)
2a ... 2nd arm 2b ... through hole 3 ... inner shaft magnetic fluid seal 4 ... outer shaft magnetic fluid seal 5 ... bearing flange 6 ... intermediate chamber flange 7 ... vacuum chamber Lower wall 8 ・ ・ ・ Bearing 9 ・ ・ ・ Expanded part 10 ・ ・ Intermediate chamber 10 a ・ ・ Exhaust pipe 11 ・ ・ Seal part 12 ・ ・ Seal part

Claims (1)

真空室Aの真空室下壁7の下に中間室フランジ6を装着し、更にその下部には軸受フランジ5を装着するとともに、該真空室A内に延び、二軸同軸に配置した回転軸1,2を外気圧側Bからそれぞれ駆動する真空装置を形成し、且つ、前記中間室フランジ6と前記回転軸2の間に中間室10を形成し、更に、前記真空室Aと前記外気圧側Bとに亘る前記回転軸1,2周りのそれぞれの間隙を塞ぐ内側軸磁性流体シール3及び外側軸磁性流体シール4を設けた真空装置Cを備え、内側軸磁性流体シール3の外側の円筒型の外側軸2に複数の貫通孔2bを穿設し、該貫通孔2bから前記中間室10を介して空気を吸引可能とすることを特徴とする真空装置。An intermediate chamber flange 6 is mounted below the vacuum chamber lower wall 7 of the vacuum chamber A, and a bearing flange 5 is mounted below the intermediate chamber flange 6. The rotary shaft 1 extends into the vacuum chamber A and is arranged biaxially. , 2 are driven from the external air pressure side B, an intermediate chamber 10 is formed between the intermediate chamber flange 6 and the rotary shaft 2, and the vacuum chamber A and the external air pressure side are further formed. A vacuum device C provided with an inner shaft magnetic fluid seal 3 and an outer shaft magnetic fluid seal 4 that block the respective gaps around the rotation shafts 1 and 2 across B, and a cylindrical type outside the inner shaft magnetic fluid seal 3 A vacuum apparatus characterized in that a plurality of through-holes 2b are formed in the outer shaft 2, and air can be sucked from the through-holes 2b through the intermediate chamber 10.
JP2001375301A 2001-12-10 2001-12-10 Vacuum device Expired - Fee Related JP4203913B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001375301A JP4203913B2 (en) 2001-12-10 2001-12-10 Vacuum device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001375301A JP4203913B2 (en) 2001-12-10 2001-12-10 Vacuum device

Publications (2)

Publication Number Publication Date
JP2003170038A JP2003170038A (en) 2003-06-17
JP4203913B2 true JP4203913B2 (en) 2009-01-07

Family

ID=19183704

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001375301A Expired - Fee Related JP4203913B2 (en) 2001-12-10 2001-12-10 Vacuum device

Country Status (1)

Country Link
JP (1) JP4203913B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109280898A (en) * 2017-07-23 2019-01-29 杰莱特(苏州)精密仪器有限公司 A kind of vacuum workpiece high speed rotating unit

Also Published As

Publication number Publication date
JP2003170038A (en) 2003-06-17

Similar Documents

Publication Publication Date Title
JP3107275B2 (en) Semiconductor manufacturing apparatus and semiconductor manufacturing apparatus cleaning method
JP2000130595A (en) Sealing mechanism of rotary shaft used for vacuum chamber
JP2627861B2 (en) Method and apparatus for forming Ti-TiN laminated film
JPS63277762A (en) Dial vapor deposition treatment apparatus
WO2009084408A1 (en) Film formation device and film formation method
KR102170483B1 (en) Cathode unit for sputtering device
JP2013174020A (en) Sputtering apparatus
JP4321785B2 (en) Film forming apparatus and film forming method
JPH02294475A (en) Cathode sputtering apparatus
JP4203913B2 (en) Vacuum device
JP2002329763A (en) Connecting structure between hermetic chambers
JP5034578B2 (en) Thin film processing equipment
JP2001269890A (en) Conveying robot
JP2006254604A (en) Motor system
JP2001156158A (en) Thin-film forming apparatus
JP2004502869A (en) Apparatus for performing at least one process on a substrate
JPH11158604A (en) Rotating mechanism of physical vapor deposition apparatus
JP4702867B2 (en) Vacuum processing equipment
JPH0443668Y2 (en)
JP3592480B2 (en) Manipulator device
JP5059269B2 (en) Sputter chamber, vacuum transport chamber, and vacuum processing apparatus including these chambers
JPH0330320A (en) Load lock mechanism of gas phase chemical reaction forming device
JP3564038B2 (en) Shaft sealing device
JP3281005B2 (en) Sputtering apparatus and method for manufacturing semiconductor device using the same
JPH03111575A (en) Vacuum treating device

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20041015

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080513

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080714

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080901

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080910

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20081003

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20081006

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20111024

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees