JP4178003B2 - 半導体回路パターンの検査装置 - Google Patents

半導体回路パターンの検査装置 Download PDF

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Publication number
JP4178003B2
JP4178003B2 JP2002163701A JP2002163701A JP4178003B2 JP 4178003 B2 JP4178003 B2 JP 4178003B2 JP 2002163701 A JP2002163701 A JP 2002163701A JP 2002163701 A JP2002163701 A JP 2002163701A JP 4178003 B2 JP4178003 B2 JP 4178003B2
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Japan
Prior art keywords
electron beam
circuit pattern
semiconductor circuit
pattern inspection
inspection apparatus
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Expired - Fee Related
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JP2002163701A
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Japanese (ja)
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JP2004014207A (ja
JP2004014207A5 (enExample
Inventor
博之 品田
久弥 村越
敦子 高藤
義弘 阿南
憲史 谷本
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Priority to JP2002163701A priority Critical patent/JP4178003B2/ja
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Publication of JP2004014207A5 publication Critical patent/JP2004014207A5/ja
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Publication of JP4178003B2 publication Critical patent/JP4178003B2/ja
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  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2002163701A 2002-06-05 2002-06-05 半導体回路パターンの検査装置 Expired - Fee Related JP4178003B2 (ja)

Priority Applications (1)

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JP2002163701A JP4178003B2 (ja) 2002-06-05 2002-06-05 半導体回路パターンの検査装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002163701A JP4178003B2 (ja) 2002-06-05 2002-06-05 半導体回路パターンの検査装置

Publications (3)

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JP2004014207A JP2004014207A (ja) 2004-01-15
JP2004014207A5 JP2004014207A5 (enExample) 2005-10-06
JP4178003B2 true JP4178003B2 (ja) 2008-11-12

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JP2002163701A Expired - Fee Related JP4178003B2 (ja) 2002-06-05 2002-06-05 半導体回路パターンの検査装置

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JP (1) JP4178003B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3984521B2 (ja) * 2002-09-20 2007-10-03 松下電器産業株式会社 透過型電子顕微鏡による観察方法
US7256606B2 (en) * 2004-08-03 2007-08-14 Applied Materials, Inc. Method for testing pixels for LCD TFT displays
DE112007003536T5 (de) 2007-06-08 2010-04-22 Advantest Corp. Ladungsteilchenstrahl-Untersuchungsgerät und einen Ladungsteilchenstrahl verwendendes Untersuchungsverfahren
GB0713276D0 (en) * 2007-07-09 2007-08-15 Medical Res Council Transmission electron microscope
US7994476B2 (en) * 2007-11-05 2011-08-09 Applied Materials Israel, Ltd. Apparatus and method for enhancing voltage contrast of a wafer
IL303579A (en) * 2020-12-16 2023-08-01 Asml Netherlands Bv Thermal assisted testing by an advanced charge controller module in a charged particle system

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JP2004014207A (ja) 2004-01-15

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