JP4177035B2 - Color filter, method for manufacturing the same, and liquid crystal display device - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a liquid crystal display device that realizes both transmissive display and reflective display, a color filter used therefor, and a method of manufacturing the same.
[0002]
[Prior art]
The liquid crystal display device utilizes the feature of being thin and having low power consumption, office automation (office automation; OA) devices such as word processors and personal computers, portable information terminal devices such as electronic notebooks and mobile phones, and liquid crystal monitors. It is widely used in a video tape recorder (abbreviation: VTR) with a camera and a personal television.
[0003]
Liquid crystal display devices include display devices such as a cathode-ray tube (abbreviation: CRT) display device, an electroluminescence (abbreviation: EL) display device, and a plasma display panel (abbreviation: PDP). Unlike light, it does not emit light by itself, so it requires a light source. As a light source of the liquid crystal display device, a device having a fluorescent tube called a backlight is used, and this backlight is installed behind one of a pair of substrates forming the liquid crystal display device, and the backlight 2. Description of the Related Art A transmissive liquid crystal display device that performs display by switching between transmission and blocking of light from backlight, that is, backlight light, by a liquid crystal panel is widely used. However, when the transmissive liquid crystal display device is used for a portable information terminal device or the like, there are the following problems. Since the power consumption of the backlight provided in the transmissive liquid crystal display device is so large that it accounts for more than half of the total power consumption of the device, the power consumption of the transmissive liquid crystal display device inevitably increases. Such a transmissive liquid crystal display device with high power consumption is often used by being carried outdoors all the time, and if it is used for portable information terminal devices, etc., most of which are driven by a battery, the power consumption of the battery is severe. Can not be used for a long time. In addition, since backlight light is always used in a transmissive liquid crystal display device, if the surroundings are very bright, the display light is relatively darker than the surrounding light and visibility is reduced. Further, if the backlight light is increased to brighten the display light, the power consumption of the liquid crystal display device increases.
[0004]
Therefore, in order to reduce power consumption, a portable information terminal device or the like is provided with a reflective film instead of a backlight, and the reflected light obtained by reflecting ambient light by the reflective film is used as a light source. A reflection type liquid crystal display device that performs display by switching between transmission and blocking with a liquid crystal panel is used. As a display mode of the reflective liquid crystal display device, polarized light such as a twisted nematic (abbreviation: TN) mode and a super twisted nematic (abbreviation: STN) mode widely used in a transmissive liquid crystal display device. A display mode using a plate and a display mode not using a polarizing plate capable of bright display, for example, a phase transition type guest-host mode disclosed in JP-A-4-75022 and JP-A-9-133930 have been developed. ing. However, since the reflective liquid crystal display device uses reflected light of ambient light, there is a problem that when the surrounding is dark, the amount of light is insufficient and the visibility is extremely lowered.
[0005]
As described above, there are problems when the transmissive liquid crystal display device and the reflective liquid crystal display device are used in the portable information terminal device. As a means for solving this problem, development and commercialization of a liquid crystal display device that realizes both transmissive display and reflective display, such as the liquid crystal display device disclosed in Japanese Patent Application Laid-Open No. 11-101992. Is actively promoted. Hereinafter, a liquid crystal display device that realizes both transmissive display and reflective display is also referred to as a “semi-transmissive liquid crystal display device”.
[0006]
In order to realize color display of a liquid crystal display device, a transmissive liquid crystal display device and a reflective liquid crystal display device use a method of forming a color filter on one of a pair of substrates forming the liquid crystal display device. . Also in the transflective liquid crystal display device, a color filter is used to realize color display as in the transmissive liquid crystal display device and the reflective liquid crystal display device.
[0007]
Since the transmissive liquid crystal display device and the reflective liquid crystal display device are different in the type of light source used for display and the light passage path, the transmissive liquid crystal display device and the reflective liquid crystal display device have different characteristics. Is used. Therefore, when a color filter for a transmissive liquid crystal display device or a color filter for a reflective liquid crystal display device is used for a transflective liquid crystal display device, the following problems occur.
[0008]
In the transmissive liquid crystal display device, color display is enabled by the backlight passing through the color filter through the liquid crystal layer. That is, the number of times that the light passes through the color filter is one. Therefore, the influence of a decrease in the amount of light transmission due to the light absorption by the color filter is small, and the color filter can be formed with a high density. Therefore, the color filter for the transmissive liquid crystal display device widens the color reproduction range. Therefore, it is formed with a high concentration. When this color filter for a transmissive liquid crystal display device is used in a transflective liquid crystal display device, the transmittance in the transmissive display region is about 32% after the visibility correction, whereas in the reflective display region. The transmittance is about 11%, and the color reproduction range is extremely widened, but the display characteristics are very dark.
[0009]
On the other hand, in the reflection type liquid crystal display device, ambient light once passes through the color filter, reaches the reflection film provided on the counter substrate through the liquid crystal layer, and the light reflected by the reflection film passes through the liquid crystal layer again. By passing through, color display becomes possible. That is, the number of times that the light passes through the color filter is two. Accordingly, the influence of a decrease in the amount of light transmission due to the light absorption by the color filter is large, and thus the color filter for the reflective liquid crystal display device is formed with a thin concentration in order to ensure brightness. If this color filter for a reflective liquid crystal display device is used in a transflective liquid crystal display device, the amount of light transmitted through the transmissive display region will be extremely large, making it difficult to identify the color and extremely reducing the color reproduction range. Narrow.
[0010]
As a technique for solving such a problem, a technique disclosed in JP-A-8-286178 can be cited. The technology disclosed in this publication succeeds in improving the transmittance in a liquid crystal display device having a color filter by forming a colored portion and a non-colored portion in the color filter provided in each pixel portion. is doing.
[0011]
In addition, color filters for transflective liquid crystal display devices have been developed. For example, a color filter 55 has been developed in which a colored resist pattern having suitable color characteristics is arranged in an area used for transmissive display and an area used for reflective display. 18 is a bottom view showing a simplified configuration of the transflective liquid crystal display device 5 including the color filter 55, and FIG. 19 is a cross-sectional line BB of the transflective liquid crystal display device 5 shown in FIG. It is sectional drawing which shows the cross-sectional structure in FIG. In FIG. 18, the transparent insulating substrate 51, the black matrix pattern 52, the transparent electrode film 56, and the liquid crystal layer 70 are not shown because they are difficult to understand because the drawings are complicated.
[0012]
The transflective liquid crystal display device 5 includes a color filter substrate 50, a counter substrate 60, and a liquid crystal layer 70 sandwiched between the color filter substrate 50 and the counter substrate 60. The color filter substrate 50 includes a black matrix pattern 52, a transmissive display colored resist pattern 53 corresponding to the transmissive display region 90, and a reflective display colored corresponding to the reflective display region 91 on the transparent insulating substrate 51. A color filter 55 including a resist pattern 54 and a transparent electrode film 56 are formed. The counter substrate 60 includes a transparent electrode 61, a source electrode wiring 62, a gate electrode wiring 63, a transmissive display transparent electrode 64 corresponding to the transmissive display area 90, and a reflective type corresponding to the reflective display area 91. A reflective electrode 65 for display and a TFT element portion (not shown) are formed.
[0013]
The transmissive display colored resist pattern 53 includes a red resist pattern 53R colored red (abbreviation: R), a green resist pattern 53G colored green (abbreviation: G), and a blue (Blue; abbreviation: B) and a blue resist pattern 53B which is colored, and is formed at a high density so that the color reproduction range is wide with respect to light from the backlight. The reflective display colored resist pattern 54 includes a red resist pattern 54R colored in red, a green resist pattern 54G colored in green, and a blue resist pattern 54B colored in blue, and has high light transmittance. Thus, it is formed at a thin concentration. As a result, a bright color display with a wide color reproduction range is realized.
[0014]
In the technique disclosed in Japanese Patent Laid-Open No. 2000-29012, a bright color display is realized by forming a colored portion and a non-colored portion in a color filter corresponding to the reflective display area. .
[0015]
As another technique, after forming a transparent resist pattern at a position corresponding to a predetermined area to be used for reflective display, a colored resist is applied on the transparent resist pattern by applying a colored resist using a spin coater or the like. The thickness of the colored resist layer in the area used for reflective display using the step between the part where the transparent resist pattern is formed and the part where it is not formed is used for the transmissive display. A color filter 83 formed thinner than the thickness of the colored resist layer in a certain region has also been developed. 20 is a bottom view showing a simplified configuration of the transflective liquid crystal display device 8 including the color filter 83, and FIG. 21 is a cross-sectional line CC of the transflective liquid crystal display device 8 shown in FIG. It is sectional drawing which shows the cross-sectional structure in FIG. In FIG. 20, the transparent insulating substrate 51, the black matrix pattern 52, the transparent electrode film 56, and the liquid crystal layer 70 are not illustrated because they are difficult to understand due to the complexity of the drawings. Further, since the transflective liquid crystal display device 8 is similar to the transflective liquid crystal display device 5 shown in FIGS. 18 and 19, the corresponding portions are denoted by the same reference numerals and description thereof is omitted.
[0016]
The transflective liquid crystal display device 8 includes a color filter substrate 80, a counter substrate 60, and a liquid crystal layer 70 sandwiched between the color filter substrate 80 and the counter substrate 60. On the color filter substrate 80, a color filter 83 including a black matrix pattern 52, a transparent resist pattern 81, and a colored resist pattern 82 and a transparent electrode film 56 are formed on the transparent insulating substrate 51. The colored resist pattern 82 includes a red resist pattern 82R colored in red, a green resist pattern 82G colored in green, and a blue resist pattern 82B colored in blue.
[0017]
Since the transparent resist pattern 81 is formed between the colored resist pattern 82 in the reflective display area 91 and the transparent insulating substrate 51 in the color filter 83, the thickness t1 of the colored resist pattern 82 in the reflective display area 91 is formed. Can be made thinner than the thickness t2 of the colored resist pattern 82 in the transmissive display region 90. As a result, the transmittance in the reflective display area 91 has been successfully improved.
[0018]
[Problems to be solved by the invention]
However, in the technique disclosed in Japanese Patent Laid-Open No. 8-286178, only the configuration of the color filter in the transmission type liquid crystal display device or the reflection type liquid crystal display device is shown. Even when applied to a liquid crystal display device, good color display cannot be realized.
[0019]
Further, in the configuration of the color filter 55 shown in FIGS. 18 and 19, if the alignment accuracy between the transmissive display colored resist pattern 53 and the reflective display colored resist pattern 54 and the finishing accuracy of each pattern are poor, the transmission There may occur an overlap between the color resist pattern 53 for type display and the color resist pattern 54 for reflection type display, or a gap between the color resist pattern 53 for transmission type display and the color resist pattern 54 for reflection type display. If the transmissive display colored resist pattern 53 and the reflective display colored resist pattern 54 overlap, the cell gap of the liquid crystal panel may not be uniform and display defects may occur. When a gap is formed between the transmissive display colored resist pattern 53 and the reflective display colored resist pattern 54, part of the reflected light reflected by the backlight or the reflective film passes through the gap. Since it does not pass through the color filter, the color reproduction range may be significantly narrowed.
[0020]
Light passes through the overlapping of the transmissive display colored resist pattern 53 and the reflective display colored resist pattern 54 and the gap between the transmissive display colored resist pattern 53 and the reflective display colored resist pattern 54. In order to prevent this, it is conceivable to form a black matrix pattern at the boundary between the transmissive display colored resist pattern 53 and the reflective display colored resist pattern 54. Although the formation of the black matrix pattern makes the cell gap uniform and widens the color reproduction range, there is a problem that the pixel aperture ratio is greatly reduced.
[0021]
Further, in the color filter for the transmissive liquid crystal display device and the color filter for the reflective liquid crystal display device, each color pattern of R, G, and B is formed by one photolithography process, but the color shown in FIGS. In the filter 55, the patterns of each color of R, G, and B are formed by two photolithography processes, so there is a concern about an increase in cost and a decrease in yield.
[0022]
In the technique disclosed in Japanese Patent Laid-Open No. 2000-29012, a colored portion and a non-colored portion are formed in the color filter corresponding to the reflective display area, and thus the reflected light reflected by the reflective film A part of passes through the uncolored part of the color filter and does not pass through the colored part. Therefore, since the light that has passed through the uncolored portion is included in the display light, the color reproduction range is narrowed.
[0023]
In the color filter 83 shown in FIGS. 20 and 21, the colored resist pattern 82 in the reflective display area 91 is coated with a colored resist after the transparent resist pattern 81 is formed, so that the colored resist pattern 82 in the reflective display area 91 is coated. The resist pattern 82 is formed simultaneously. At this time, the colored resist pattern 82 is formed on the basis of the thickness of the colored resist pattern 82 in the transmissive display region 90 so that the colored resist pattern 82 in the transmissive display region 90 has a desired thickness. That is, the thickness t1 of the colored resist pattern 82 formed on the transparent resist pattern 81 in the reflective display area 91 is equal to the thickness of the lower transparent resist pattern 81 and the thickness of the colored resist pattern 82 formed in the transmissive display area 90. Since it is determined secondary by t2, the accuracy of the thickness t1 of the colored resist pattern 82 in the reflective display area 91 is worse than the accuracy of the thickness t2 of the colored resist pattern 82 in the transmissive display area 90. Accordingly, the variation in the thickness t1 of the colored resist pattern 82 in the reflective display region 91 is larger than the variation in the thickness t2 of the colored resist pattern 82 in the transmissive display region 90. Therefore, in the reflective display region 91, the color reproduction range and The light transmission amount greatly varies, and the variation in color characteristics increases.
[0024]
Further, in order to further improve the transmittance in the reflective display area 91 and obtain a brighter display, the thickness t1 of the colored resist pattern 82 in the reflective display area 91 is set to the thickness t2 of the colored resist pattern 82 in the transmissive display area 90. It is conceivable to make it even thinner. In this case, the thickness t2 of the colored resist pattern 82 in the transmissive display area 90 is not changed, and only the thickness t1 of the colored resist pattern 82 in the reflective display area 91 is reduced. It is necessary to thicken. However, when the transparent resist pattern 81 is formed thick and a colored resist is applied thereon by a spin coater or the like, radial unevenness occurs, and thus the colored resist pattern 82 cannot be uniformly formed on the substrate. Therefore, in the configuration of the color filter 83, the thickness t1 of the colored resist pattern 82 in the reflective display area 91 is made thinner than the thickness t2 of the colored resist pattern 82 in the transmissive display area 90, particularly t1 is t2. It is difficult to make it smaller than 0.5 times (t1 <0.5t2).
[0025]
An object of the present invention is to form a resist pattern for each color of R, G, and B of a color filter used in a liquid crystal display device that realizes both transmissive display and reflective display at a time. A color filter having a small variation in color characteristics in a transmissive display region and a reflective display region, a method for manufacturing the color filter, and a liquid crystal display device including the color filter are provided.
[0026]
[Means for Solving the Problems]
  The present invention is a color filter formed on a substrate and having a region used for transmissive display and a region used for reflective display,
  A black matrix pattern and a colored layer surrounded by the black matrix pattern,
  Of the colored layersOf the area used for the reflective displayportionThe thickness d1 ofOf the colored layersThe colored layer of the area used for the transmissive displayportionthinner than d2 (d1 <d2),
  Of the colored layersOf the area used for the reflective displayportionIsOf the colored layersOf the area used for the transmissive displayportionSurrounded byAnd formed in contact with the substrateThis is a color filter.
[0027]
  According to the present invention, the color filter is formed on the substrate, has a region used for transmissive display and a region used for reflective display, and is surrounded by a black matrix pattern and the black matrix pattern. The thickness d1 of the colored layer in the region used for the reflective display is smaller than the thickness d2 of the colored layer in the region used for the transmissive display (d1 <d2),Out of colored layerUsed for the reflective displayportionIsOut of colored layerOf the area used for the transmissive displayportionSurrounded by As a result, the transmittance in the region used for the reflective display can be improved and higher than the transmittance in the region used for the transmissive display. When used in a liquid crystal display device that realizes both displays, the color characteristics in the reflective display area can be brought close to the color characteristics in the transmissive display area, and the color can be realized with a wide color reproduction range and bright display. A filter can be obtained.
[0029]
  AlsoThe colored layer in the region used for the reflective display is formed in contact with the substrate. That is, the color layer of the region used for the reflective display is formed on the substrate simultaneously with the color layer of the region used for the transmissive display without any other layer, and then the thickness is adjusted. Therefore, the thickness d1 of the colored layer in the region used for the reflective display is not affected by the thicknesses of other layers and the thickness d2 of the colored layer in the region used for the transmissive display. Therefore, since the variation in the thickness d1 can be reduced, color characteristics in the transmissive display area and the reflective display area when used in a liquid crystal display device that realizes both transmissive display and reflective display. The variation of can be reduced.
[0030]
Further, the present invention is characterized in that the thickness d1 is not more than 0.5 times the thickness d2 (d1 ≦ 0.5d2).
[0031]
According to the present invention, the thickness d1 is not more than 0.5 times the thickness d2 (d1 ≦ 0.5d2). As a result, the transmittance in the region used for the reflective display can be further improved, so that a brighter display can be realized.
[0032]
The present invention is also a liquid crystal display device comprising the color filter.
[0033]
According to the invention, the liquid crystal display device includes the color filter. As a result, a liquid crystal display device capable of displaying a wide color reproduction range and bright in both transmissive display and reflective display can be realized.
[0034]
  The present invention also includes a region used for transmissive display and a region used for reflective display, and includes a black matrix pattern and a colored layer surrounded by the black matrix pattern, and is used for the reflective display. The color layer of the area to be manufactured is a method for producing a color filter surrounded by the color layer of the area used for the transmissive display,
  Forming a black matrix pattern on the substrate;
  Forming a photosensitive colored layer on the substrate;
  With respect to the colored layer having photosensitivity, a hardened portion is formed at a predetermined position to be an area used for the transmissive display, and hardened at a predetermined position to be an area used for the reflective display. A step of exposing so that a part and an uncured part are formed;
  Removing the photosensitive colored layer other than the cured portion.See
  The colored layer having photosensitivity has photosensitivity in which a portion irradiated with light is cured,
  With respect to the colored layer having photosensitivity, a hardened portion is formed at a predetermined position to be an area used for the transmissive display, and hardened at a predetermined position to be an area used for the reflective display. The step of exposing so that the part and the uncured part are formed
    Irradiating light from the surface side not in contact with the substrate to the colored layer having photosensitivity at a predetermined position as a region used for the transmissive display;
    From the surface side in contact with the substrate with respect to the colored layer having photosensitivity at a predetermined position as a region used for the reflective display and a predetermined position as a region used for the transmissive display. Including the step of irradiating light.A method of manufacturing a color filter.
[0035]
  According to the present invention, there are an area used for transmissive display and an area used for reflective display.A colored layer surrounded by the black matrix pattern, and a colored layer of the region used for the reflective display is surrounded by a colored layer of the region used for the transmissive display.The color filterForming a black matrix pattern on the substrate;A step of forming a colored layer having photosensitivity on the substrate, and a cured portion is formed in a predetermined position as much as possible in the region used for the transmissive display with respect to the colored layer. It is manufactured through an exposure step and a step of removing the colored layer other than the cured portion so that the cured portion and the uncured portion are formed in a predetermined position as much as possible. Since the thickness d1 of the colored layer in the region used for the reflective display can be changed by changing the exposure amount in the above-described exposure step, the region in the region used for the reflective display can be easily changed. Optical characteristics can be changed in a wide range. That is, the colored layer having the thickness d1 (d1 <d2) smaller than the thickness d2 of the colored layer in the region used for the transmissive display is added to the region used for the reflective display by one photolithography process. A layer can be formed to improve the transmittance in the region used for the reflective display, and higher than the transmittance in the region used for the transmissive display. As a result, when used in a liquid crystal display device that realizes both transmissive display and reflective display, the color characteristics in the reflective display area can be brought close to the color characteristics in the transmissive display area. A color filter that can realize bright display with a wide reproduction range can be obtained. In addition, the colored layer in the region used for the reflective display is formed on the substrate simultaneously with the colored layer in the region used for the transmissive display without passing through another layer, and then the thickness is increased. Therefore, the thickness d1 of the colored layer in the region used for the reflective display is not affected by the thicknesses of other layers and the thickness d2 of the colored layer in the region used for the transmissive display. . Therefore, since the variation in the thickness d1 can be reduced, color characteristics in the transmissive display area and the reflective display area when used in a liquid crystal display device that realizes both transmissive display and reflective display. The variation of can be reduced.
[0037]
  AlsoThe colored layer having photosensitivity has a photosensitivity that cures a portion irradiated with light, and a cured portion is formed at a predetermined position as much as possible to be an area used for the transmissive display with respect to the colored layer. And the step of performing the exposure so that the hardened portion and the uncured portion are formed at a predetermined position as much as possible as the region used for the reflection type display. The step of irradiating the colored layer at a predetermined position with light from the surface side not in contact with the substrate, and a position determined in advance as a region used for the reflective display and used for the transmissive display Irradiating light from the surface side in contact with the substrate with respect to the colored layer at a predetermined position as a region. Thus, irradiation is performed from the surface side in contact with the substrate to the colored layer at a predetermined position as a region used for the reflective display and a predetermined position as a region used for the transmissive display. Since the thickness d1 of the colored layer in the region used for the reflective display can be determined by the amount of light irradiated, the variation in the thickness d1 can be extremely reduced, and uniform color characteristics can be obtained. be able to.
[0038]
According to the present invention, the step of forming the photosensitive colored layer on the substrate includes the step of forming the photosensitive colored layer on the support, and the photosensitivity formed on the support. And a step of adhering a colored layer having a surface to the substrate.
[0039]
According to the present invention, a colored layer having photosensitivity is formed on a support, and the colored layer formed on the support is adhered onto the substrate, whereby the colored layer is formed on the substrate. Is formed. In this way, the colored layer can be uniformly formed on the substrate with a high yield, and variations in color characteristics can be reduced. The colored layer formed on the substrate has a support on the surface, and the support functions as a protective layer for the colored layer. Therefore, the substrate is turned over without damaging the colored layer. Can be irradiated with light. Therefore, in a color filter for a transmissive liquid crystal display device or a color filter for a reflective liquid crystal display device, the colored layer can be obtained simply by providing an exposure device so that light can be irradiated from one surface side of the substrate. In contrast, light can be irradiated from both surface sides of the substrate.
[0040]
In the present invention, the step of forming a photosensitive colored layer on the substrate is a step of applying a colored photosensitive material on the substrate.
[0041]
According to the present invention, the step of forming a photosensitive colored layer on the substrate is a step of applying a colored photosensitive material on the substrate. Accordingly, a colored layer having photosensitivity can be uniformly formed on the substrate without increasing the number of manufacturing steps, and variations in color characteristics can be reduced, so that productivity is good.
[0042]
DETAILED DESCRIPTION OF THE INVENTION
FIG. 1 is a bottom view showing a simplified configuration of a transflective liquid crystal display device 1 including a color filter 14 according to a first embodiment of the present invention, and FIG. 2 is a transflective type shown in FIG. 2 is a cross-sectional view illustrating a cross-sectional configuration along a cutting plane line AA of the liquid crystal display device 1. In FIG. 1, the transparent insulating substrate 11, the black matrix pattern 12, the transparent electrode film 15, and the liquid crystal layer 30 are omitted because they are difficult to understand due to the complexity of the figure.
[0043]
The transflective liquid crystal display device 1 includes a color filter substrate 10, a counter substrate 20, and a liquid crystal layer 30 sandwiched between the color filter substrate 10 and the counter substrate 20. On the color filter substrate 10, a black matrix pattern 12 is formed in a predetermined pattern on a transparent insulating substrate 11 made of glass or the like, and surrounded by the black matrix pattern 12, a red resist colored in red (R). A pattern 13R, a green resist pattern 13G colored green (G), and a blue resist pattern 13B colored blue (B) are formed in a predetermined pattern, and the black matrix pattern 12, the red resist pattern 13R, and the green resist pattern 13G are formed. A transparent electrode film 15 is formed on the color filter 14 including the blue resist pattern 13B. The red resist pattern 13R, the green resist pattern 13G, and the blue resist pattern 13B are formed by the colored resist layer 13 that is a colored layer. The counter substrate 20 is formed on the transparent insulating substrate 21 made of glass or the like, on the source electrode wiring 22, the gate electrode wiring 23, the transmissive display transparent electrode 24 corresponding to the transmissive display area 40, and the reflective display area 41. Corresponding reflective display reflective electrodes 25 and TFT element portions (not shown) are formed.
[0044]
The transflective liquid crystal display device 1 is a liquid crystal display device that realizes both transmissive display and reflective display. In the transflective liquid crystal display device 1, a color filter in which three color resist patterns of red, green, and blue, that is, a red resist pattern 13 R, a green resist pattern 13 G, and a blue resist pattern 13 B are arranged on the transparent insulating substrate 11. 14 is used to adjust the amount of light transmitted through the colored resist pattern of each color by controlling the voltage applied to the liquid crystal layer 30 and to use additive color mixing to display various colors by mixing the transmitted light. Realize color display.
[0045]
As shown in FIG. 2, the colored resist layer 13 of the color filter 14 corresponds to each of the transmissive display transparent electrode 24 and the reflective display reflective electrode 25 of the counter substrate 20, that is, an area used for reflective display, The thickness d1 of the colored resist layer 13 at the position corresponding to the reflective display area 41 is thinner than the thickness d2 of the colored resist layer 13 at the position corresponding to the transmission display area 40, that is, the area used for the transmissive display area (d1). <D2). As a result, the transmittance at the position corresponding to the reflective display area 41 of the color filter 14 can be improved and higher than the transmittance at the position corresponding to the transmissive display area 40. Therefore, the transflective liquid crystal display The color characteristics in the reflective display area 41 of the device 1 can be brought close to the color characteristics in the transmissive display area 40. Therefore, the transflective liquid crystal display device 1 can display brightly with a wide color reproduction range in both transmissive display and reflective display.
[0046]
The thickness d1 is preferably not more than 0.5 times the thickness d2 (d1 ≦ 0.5d2). As a result, the transmittance at the position corresponding to the reflective display area 41 of the color filter 14 can be further improved, so that a brighter display can be realized.
[0047]
A method for manufacturing the color filter 14 provided in the transflective liquid crystal display device 1 shown in FIGS. 1 and 2 will be described. 3-7 is sectional drawing which shows typically the state of each process in manufacture of the color filter 14. As shown in FIG. In this embodiment, the red resist pattern 13R, the green resist pattern 13G, and the blue resist pattern 13B are formed in this order.
[0048]
FIG. 3 is a view showing a state in which the black matrix pattern 12 and the colored resist layer 13 are formed on the transparent insulating substrate 11.
[0049]
First, a metal film to be the black matrix pattern 12 is formed on the transparent insulating substrate 11 made of glass or the like by sputtering or the like, and the black matrix pattern 12 having a predetermined pattern is formed by a photolithography process and an etching process.
[0050]
On the transparent insulating substrate 11 on which the black matrix pattern 12 is formed, a red colored resist, which is a colored photosensitive material, is applied so as to have a uniform thickness using a spin coater or the like to form a photosensitive colored layer. A colored resist layer 13 is formed. The colored resist layer 13 is formed of a photosensitive material that cures a portion irradiated with light.
[0051]
The formed colored resist layer 13 is exposed as follows.
FIG. 4 is a diagram showing a state where the colored resist layer 13 at a position corresponding to the transmissive display region 40 is irradiated with light from the surface side not in contact with the transparent insulating substrate 11. Using a photomask 17 formed in a predetermined pattern, transparent insulation is provided for the colored resist layer 13 at a position that is predetermined as a region used for transmissive display, that is, a position corresponding to the transmissive display region 40. Light is irradiated from the surface side that is not in contact with the substrate 11, that is, from the direction of the reference symbol 42, and the cured portion 16 a is formed at a position corresponding to the transmissive display region 40.
[0052]
FIG. 5 is a diagram showing a state in which light is irradiated from the surface side in contact with the transparent insulating substrate 11 to the colored resist layer 13 at a position corresponding to the reflective display area 41 and a position corresponding to the transmissive display area 40. It is. After the exposure process from the surface side not in contact with the transparent insulating substrate 11, using the photomask 18 formed in a predetermined pattern, a position that is predetermined as a region used for the reflective display, that is, the reflective display region 41 is used. And the colored resist layer 13 at the position corresponding to the transmissive display area 40 are irradiated with light from the surface side in contact with the transparent insulating substrate 11, that is, from the direction of the reference numeral 43, and the reflective display area 41. The cured portion 16c and the uncured portion 16b are formed at positions corresponding to the above. In the step shown in FIG. 5, when exposure is performed using the same exposure apparatus as that used in the step shown in FIG. 4, the transparent insulating substrate 11 is turned over and held on an exposure stage which is a holding table in the exposure apparatus. Therefore, the colored resist layer 13 directly contacts the exposure stage, and the colored resist layer 13 is scratched. Therefore, in the step shown in FIG. 5, unlike the exposure apparatus used in the step shown in FIG. 4, the colored resist layer 13 is held in a state where the transparent insulating substrate 11 is held in contact without turning over. On the other hand, an exposure apparatus capable of irradiating light from the surface side in contact with the transparent insulating substrate 11 is required.
[0053]
By performing the exposure as described above, the cured portion 16a is formed at a position corresponding to the transmissive display region 40, and the cured portion 16c and the uncured portion 16b are formed at a position corresponding to the reflective display region 41. .
[0054]
FIG. 6 is a view showing a state in which the red resist pattern 13R is formed. By performing development processing on the transparent insulating substrate 11 that has been exposed from the surface side in contact with the transparent insulating substrate 11, unnecessary colors other than the cured portion 16a and the cured portion 16c shown in FIG. The resist layer 13 is removed. Thereby, the thickness d1 of the colored resist layer 13 at the position corresponding to the reflective display area 41 is thinner than the thickness d2 of the colored resist layer 13 at the position corresponding to the transmissive display area 40 (d1 <d2). 13R is formed.
[0055]
FIG. 7 is a diagram illustrating a state in which the color filter 14 is formed. In the same manner as the red resist pattern 13R, a green resist pattern 13G and a blue resist pattern 13B are formed in order, and the color filter 14 is obtained.
[0056]
As described above, in the method of manufacturing the color filter 14 according to the present embodiment, the colored resist layer at the position corresponding to the reflective display area 41 is obtained by changing the exposure amount in the exposure process shown in FIGS. Since the thickness d1 of 13 can be changed, the optical characteristics at the position corresponding to the reflective display area 41 can be easily changed in a wide range. That is, the colored resist layer 13 is formed as shown in FIG. 3 and the transmission type is formed at a position corresponding to the reflective display area 41 by a single photolithography process of performing exposure as shown in FIGS. The colored resist layer 13 having a thickness d1 (d1 <d2) thinner than the thickness d2 of the colored resist layer 13 at the position corresponding to the display area 40 is formed, and the transmittance at the position corresponding to the reflective display area 41 of the color filter 14 is formed. And the transmittance at a position corresponding to the transmissive display region 40 can be made higher. Thus, when used in the transflective liquid crystal display device 1 that realizes both transmissive display and reflective display, the color characteristic in the reflective display area 41 is changed to the color characteristic in the transmissive display area 40. It is possible to obtain the color filter 14 that can be close to each other and can realize a bright display with a wide color reproduction range.
[0057]
Further, the colored resist layer 13 at a position corresponding to the reflective display area 41 is formed in contact with the transparent insulating substrate 11. That is, the colored resist layer 13 at a position corresponding to the reflective display area 41 is formed on the transparent insulating substrate 11 simultaneously with the colored resist layer 13 at a position corresponding to the transmissive display area 40 without passing through other layers. After that, since the thickness is adjusted, the thickness d1 is not affected by the thicknesses of other layers and the thickness d2. Therefore, since the variation in the thickness d1 can be reduced, the variation in color characteristics in the transmissive display area 40 and the reflective display area 41 when used in the transflective liquid crystal display device 1 can be reduced.
[0058]
In the step shown in FIG. 5 described above, the colored resist layer 13 at the position corresponding to the reflective display area 41 and the position corresponding to the transmissive display area 40 is irradiated from the surface side in contact with the transparent insulating substrate 11. Since the thickness d1 can be determined by the amount of light irradiation, the variation in the thickness d1 can be extremely reduced, and uniform color characteristics can be obtained. Further, the thickness d1 can be easily reduced to 0.5 times or less (d1 ≦ 0.5d2) of the thickness d2.
[0059]
As shown in FIG. 3 described above, the colored resist layer 13 is formed by applying a colored resist, which is a colored photosensitive material, on the transparent insulating substrate 11. Therefore, the colored resist layer 13 can be uniformly formed on the transparent insulating substrate 11 without increasing the number of manufacturing steps, and variations in color characteristics can be reduced, so that productivity is good.
[0060]
FIG. 8 is a schematic cross-sectional view showing a simplified configuration of the transflective liquid crystal display device 2 including the color filter 140 according to the second embodiment of the present invention. The transflective liquid crystal display device 2 of the present embodiment is similar to the transflective liquid crystal display device 1 of the first embodiment, and corresponding portions are denoted by the same reference numerals and description thereof is omitted.
[0061]
It should be noted that the red resist pattern 130 </ b> R, the green resist pattern 130 </ b> G, and the blue resist pattern 130 </ b> B of the color filter 140 are formed of a colored resist layer 130 that is bonded onto the transparent insulating substrate 11.
[0062]
A method for manufacturing the color filter 140 provided in the transflective liquid crystal display device 2 shown in FIG. 8 will be described. 9 to 11, 13, 14, and 16 are cross-sectional views schematically showing the state of each step in manufacturing the color filter 140. Since the manufacturing method of the color filter 140 of the present embodiment is similar to the manufacturing method of the color filter 14 of the first embodiment, the description of the same steps will be omitted, and the different steps will be described below.
[0063]
In this embodiment, instead of the step of applying the colored resist, which is the colored photosensitive material in the first embodiment, onto the transparent insulating substrate 11 and the step of exposing from the direction of reference numeral 43 shown in FIG. FIG. 11 shows a step of forming a colored resist layer 130 on the support film 131, a step of sticking the colored resist layer 130 formed on the support film 131 on the transparent insulating substrate 11, and FIG. And performing the exposure from the direction of reference numeral 44.
[0064]
FIG. 9 is a view showing a state where a colored organic film 132 is adhered after the black matrix pattern 12 is formed on the transparent insulating substrate 11.
[0065]
First, a colored resist layer 130 which is a colored layer having photosensitivity is formed on a support film 131 which is a support by applying and drying a colored photosensitive material, for example, a colored organic resist. As a result, a colored organic film 132 in which the colored resist layer 130 is formed on the support film 131 is obtained. The colored resist layer 130 is formed of a photosensitive material that cures a portion irradiated with light. As the support film 131, a film having a property of transmitting light used for exposure in an exposure process for the colored resist layer 130 described later is used. For example, in the case where ultraviolet light having a wavelength of about 365 nm is used in an exposure process for the colored resist layer 130 described later, a colored organic film 132 having a property of allowing the support film 131 to transmit ultraviolet light having a wavelength of about 365 nm is used. Uses a transformer film (trade name) manufactured by Fuji Photo Film Co., Ltd. Further, the thickness of the support film 131 is thinner than the thickness of the transparent insulating substrate 11.
[0066]
The obtained colored organic film 132 is stuck on the transparent insulating substrate 11 on which the black matrix pattern 12 having a predetermined pattern is formed in the same manner as in the first embodiment. That is, the colored resist layer 130 is formed on the transparent insulating substrate 11 by sticking the colored resist layer 130 formed on the support film 131 on the transparent insulating substrate 11. In this way, the colored resist layer 130 can be uniformly formed on the transparent insulating substrate 11 with high yield, and variation in color characteristics when used in the transflective liquid crystal display device 1 can be reduced. Can do.
[0067]
The formed colored resist layer 130 is exposed as follows.
FIG. 10 is a diagram showing a state in which light is applied to the colored resist layer 130 at a position corresponding to the transmissive display region 40 from the surface side not in contact with the transparent insulating substrate 11. As in the first embodiment, the transparent resist substrate 11 is not in contact with the colored resist layer 130 at a position corresponding to the transmissive display region 40 using the photomask 17 formed in a predetermined pattern. Light is irradiated from the surface side, that is, from the direction of the reference symbol 42, and the cured portion 160 a is formed at a position corresponding to the transmissive display region 40. Since the support film 131 has the property of transmitting light used for exposure as described above, the colored resist layer 130 can be exposed through the support film 131.
[0068]
FIG. 11 is a diagram showing a state in which light is irradiated from the surface side in contact with the transparent insulating substrate 11 to the colored resist layer 130 at a position corresponding to the reflective display area 41 and a position corresponding to the transmissive display area 40. It is. The transparent insulating substrate 11 that has been exposed from the surface side that is not in contact with the transparent insulating substrate 11 is turned upside down, and the position corresponding to the reflective display area 41 and the photomask 19 formed in a predetermined pattern are used. The colored resist layer 130 at the position corresponding to the transmissive display area 40 is irradiated with light from the surface side in contact with the transparent insulating substrate 11, that is, from the direction of the reference sign 44, and is positioned at the position corresponding to the reflective display area 41. A cured portion 160c and an uncured portion 160b are formed. At this time, the colored resist layer 130 formed on the transparent insulating substrate 11 has a support film 131 on the surface, and the support film 131 functions as a protective layer for the colored resist layer 130. The transparent insulating substrate 11 can be turned over and irradiated with light without damaging 130. That is, even if the transparent insulating substrate 11 is turned upside down and held on the exposure stage in the exposure apparatus, the colored resist layer 130 is not damaged, so in the process shown in FIG. 11, the exposure apparatus used in the process shown in FIG. The exposure can be performed using the same exposure apparatus. Therefore, in the present embodiment, in an apparatus for manufacturing a color filter for a transmissive liquid crystal display device or a color filter for a reflective liquid crystal display device, an exposure apparatus so that light can be irradiated from one surface side of the transparent insulating substrate 11. It is possible to irradiate the colored resist layer 130 with light from both surface sides of the transparent insulating substrate 11 simply by providing
[0069]
By performing the exposure as described above, the cured portion 160a is formed at a position corresponding to the transmissive display region 40, and the cured portion 160c is formed at a position corresponding to the reflective display region 41, as in the first embodiment. An uncured portion 160b is formed.
[0070]
In the exposure process shown in FIG. 10 and FIG. 11, if the focus position of the exposure apparatus used for exposure shifts, the pattern accuracy decreases. In the exposure process shown in FIG. 10, the deviation of the focal position is caused by a mechanism for correcting the focal position when a sequential exposure apparatus having a projection lens (also known as a step-and-repeat exposure apparatus) is used, and a proximity gap. When a system exposure apparatus is used, it can be minimized by a mechanism for adjusting the height of the exposure stage.
[0071]
On the other hand, in the exposure step shown in FIG. 11, the colored resist layer 130 is exposed through the transparent insulating substrate 11 having a thickness larger than the thickness of the support film 131, so that the exposure step shown in FIG. The focal position is easily displaced, and it is difficult to suppress the deviation of the focal position even if the mechanism for correcting the focal position or the mechanism for adjusting the height of the exposure stage is used. Therefore, in this case, the influence on the pattern accuracy due to the shift of the focal position is suppressed by correcting the design value of the photomask 19 used for exposure.
[0072]
FIG. 12 is a diagram showing the relationship between the exposure amount and the line width shift amount with respect to the design value of the photomask. In FIG. 12, the horizontal axis represents the exposure amount (mJ / cm²The vertical axis represents the line width shift amount (μm) with respect to the photomask design value. Here, the line width shift amount with respect to the design value of the photomask is a deviation of the line width of the pattern obtained by exposure from the design value of the photomask. FIG. 12A is a diagram illustrating a case where the colored resist layer 130 is formed of a red (R) resist, and FIG. 12B is a diagram illustrating a case where the colored resist layer 130 is formed of a green (G) resist. FIG. 12C shows a case where the resist is formed of a blue (B) resist. In FIG. 12, when the colored resist layer 130 is exposed from the surface side that does not contact the transparent insulating substrate 11, 100R, 100G, and 100B, and when the exposure is performed from the surface side that contacts the transparent insulating substrate 11 101R, 101G and 101B are shown. In FIG. 12, exposure performed on the colored resist layer 130 from the front surface side not in contact with the transparent insulating substrate 11 is referred to as front surface exposure, and exposure performed from the front surface side in contact with the transparent insulating substrate 11 is referred to as back surface exposure. To do. At the time of exposure, a proximity gap type exposure apparatus was used as the exposure apparatus, and a mechanism for correcting the height of the exposure stage was not used.
[0073]
As shown in FIG. 12, in the case of any of the colored resist layers 130 of red, green and blue, when the exposure is performed from the surface side not in contact with the transparent insulating substrate 11, the line width shift amounts of 100R, 100G and 100B However, when the exposure is performed from the surface side in contact with the transparent insulating substrate 11, the line width shift amount of 101R, 101G, and 101B is larger, but the exposure is performed from the surface side in contact with the transparent insulating substrate 11 In the case 101R, 101G, and 101B, the line width shift amount increases as the exposure amount increases. When exposure is performed from the surface side in contact with the transparent insulating substrate 11, the exposure amount and line width shift of 101R, 101G, and 101B The relationship with quantity is stable. Therefore, by correcting the design value of the photomask in consideration of the relationship between the exposure amount and the line width shift amount, a desired line width is ensured even in exposure from the surface side in contact with the transparent insulating substrate 11 and high. Pattern accuracy can be obtained.
[0074]
In the exposure process shown in FIG. 5 in the first embodiment described above, the pattern accuracy due to the shift of the focal position can be obtained by correcting the design value of the photomask 18 used for exposure as in the present embodiment. The influence of can be suppressed.
[0075]
FIG. 13 is a diagram showing a state where the support film 131 is peeled from the colored resist layer 130. After the exposure process from the surface side in contact with the transparent insulating substrate 11, the support film 131 is peeled from the colored resist layer 130. As the peeling method of the support film 131, a method of peeling using an adhesive tape or the like is frequently used.
[0076]
FIG. 14 is a diagram showing a state in which a red resist pattern 130R is formed. By performing development processing on the transparent insulating substrate 11 from which the support film 131 has been peeled off in the same manner as in the first embodiment, unnecessary portions other than the curing portion 160a and the curing portion 160c shown in FIG. 13 described above are unnecessary. The colored resist layer 130 is removed. Thus, as in the first embodiment, the thickness d1 of the colored resist layer 130 at the position corresponding to the reflective display area 41 is larger than the thickness d2 of the colored resist layer 130 at the position corresponding to the transmissive display area 40. A thin (d1 <d2) red resist pattern 130R is formed.
[0077]
FIG. 15 is a diagram showing the relationship between the exposure dose and the pattern thickness obtained by exposure. In FIG. 15, the horizontal axis represents the exposure dose (mJ / cm²The vertical axis indicates the thickness (μm). FIG. 15A is a diagram illustrating a case where the colored resist layer 130 is formed of a red (R) resist, and FIG. 15B is a diagram illustrating a case where the colored resist layer 130 is formed of a green (G) resist. FIG. 15C is a diagram showing a case where the resist is formed with a blue (B) resist. In FIG. 15, when the colored resist layer 130 is exposed from the surface side that is not in contact with the transparent insulating substrate 11, the exposure is performed from the surface side that is in contact with the transparent insulating substrate 11. 103R, 103G and 103B are shown. In FIG. 15, similarly to FIG. 12, exposure to the colored resist layer 130 from the surface side not in contact with the transparent insulating substrate 11 is referred to as surface exposure, and is performed from the surface side in contact with the transparent insulating substrate 11. Exposure is referred to as back exposure.
[0078]
As shown in FIG. 15, in the case of colored resist layers 130 of red, green, and blue, the thicknesses of the patterns obtained in 103R, 103G, and 103B when exposed from the surface side in contact with the transparent insulating substrate 11 are As the exposure amount increases, the relationship between the exposure amount and the thickness of the pattern obtained in 103R, 103G, and 103B when the exposure is performed from the surface side in contact with the transparent insulating substrate 11 is stable. When the exposure is performed from the surface side in contact with the transparent insulating substrate 11, the thickness of the pattern obtained on 103R, 103G, and 103B is 102R, 102G, and 102B when the exposure is performed from the surface side that is not in contact with the transparent insulating substrate 11. When the thickness of the pattern obtained is 1 is 0.5 or less. Therefore, in the step shown in FIG. 11 described above, the colored resist layer 130 at the position corresponding to the reflective display area 41 and the position corresponding to the transmissive display area 40 is irradiated from the surface side in contact with the transparent insulating substrate 11. The thickness d1 of the colored resist layer 130 at a position corresponding to the reflective display area 41 can be determined by the amount of light irradiation. Further, the thickness d1 can be easily reduced to 0.5 times or less (d1 ≦ 0.5d2) of the thickness d2 of the colored resist layer 130 at a position corresponding to the transmissive display area 40.
[0079]
FIG. 16 is a diagram illustrating a state in which the color filter 140 is formed. Similarly to the red resist pattern 130R, a green resist pattern 130G and a blue resist pattern 130B are sequentially formed.
[0080]
Except for the above steps, the color filter 140 is obtained in the same manner as in the first embodiment.
[0081]
As described above, in the method of manufacturing the color filter 140 according to the present embodiment, the reflective display area is obtained by changing the exposure amount in the exposure process shown in FIGS. 10 and 11 described above, as in the first embodiment. Since the thickness d1 of the colored resist layer 130 at the position corresponding to 41 can be changed, the optical characteristics at the position corresponding to the reflective display area 41 can be easily changed in a wide range. Therefore, when used in the transflective liquid crystal display device 2 that realizes both transmissive display and reflective display, the color characteristics in the reflective display area 41 are brought close to the color characteristics in the transmissive display area 40. Therefore, it is possible to obtain the color filter 140 that can realize a bright display with a wide color reproduction range.
[0082]
Similarly to the first embodiment, the colored resist layer 130 at the position corresponding to the reflective display area 41 is simultaneously with the colored resist layer 130 at the position corresponding to the transmissive display area 40 without passing through other layers. Since the thickness is adjusted after being formed on the transparent insulating substrate 11, the variation in the thickness d1 can be reduced, and the transmissive display region 40 and the reflection when used in the transflective liquid crystal display device 2 can be reduced. Variations in color characteristics in the mold display area 41 can be reduced.
[0083]
Further, as in the first embodiment, since the thickness d1 can be determined by the amount of light irradiated in the process shown in FIG. 11, the variation in the thickness d1 can be extremely reduced. , Uniform color characteristics can be obtained. Further, the thickness d1 can be easily reduced to 0.5 times or less (d1 ≦ 0.5d2) of the thickness d2.
[0084]
17 shows an optical characteristic 104 in the reflective display area 41 and an optical characteristic 105 in the transmissive display area 40 of the transflective liquid crystal display device 2 including the color filter 140, and an optical characteristic 106 in a general reflective liquid crystal display apparatus. FIG. In FIG. 17, the horizontal axis indicates the color reproduction range (%), and the vertical axis indicates the transmittance (%) during white display. In FIG. 17, the optical characteristics 104 in the reflective display area 41 are reflected when the thickness d1 of the colored resist layer 130 at the position corresponding to the reflective display area 41 is changed to change the transmittance during white display. The change of the color reproduction range in the display area 41 is shown.
[0085]
As shown in FIG. 17, in the transflective liquid crystal display device 2 including the color filter 140, the optical characteristic 104 in the reflective display area 41 is close to the optical characteristic 105 in the transmissive display area 40, and the color reproduction range is wide and bright. Display can be realized. Further, the optical characteristic 104 in the reflective display area 41 can be brought close to the optical characteristic 106 of a general reflective liquid crystal display device, so that a brighter display can be realized.
[0086]
As described above, in the first and second embodiments of the present invention, the colored resist patterns of red, green, and blue are formed in the order of the red resist pattern, the green resist pattern, and the blue resist pattern. However, the present invention is not limited to this and may be formed in any order. In addition, the color of the colored resist pattern is three colors of red, green, and blue. However, the color resist pattern is not limited to this, and a colored resist pattern of another color is formed and light transmitted through those colored resist patterns is mixed. By doing so, color display may be realized.
[0087]
Further, the black matrix pattern 12 is formed of a metal film, but is not limited thereto, and may be formed using a light-blocking and photosensitive resin such as a black matrix colored resist. In this case, coloring is performed by applying a black matrix colored resist or the like on the transparent insulating substrate 11 with a spin coater or the like, or attaching a colored organic film coated with a black matrix colored resist or the like on the surface. A resist layer is formed, and a black matrix pattern 12 having a predetermined pattern is formed by a photolithography process.
[0088]
Further, although the colored resist layers 13 and 130 are formed of a photosensitive material that cures the portion irradiated with light, the portion irradiated with light is not limited to this, and the portion irradiated with light against the developer. You may form with the material which has the photosensitivity which changes to a soluble state. In this case, the photomask pattern used in the above exposure process is changed.
[0089]
【The invention's effect】
As described above, according to the present invention, the transmittance in the region used for the reflective display can be improved and higher than the transmittance in the region used for the transmissive display. When used in a liquid crystal display device that realizes both display with a liquid crystal display, the color characteristics in the reflective display area can be brought close to the color characteristics in the transmissive display area, realizing a bright display with a wide color reproduction range. The color filter which can be obtained can be obtained.
[0090]
Further, according to the present invention, it is possible to reduce the variation in the thickness of the colored layer in the region used for the reflective display, so that the liquid crystal display device that realizes both the transmissive display and the reflective display can be used. In this case, variation in color characteristics in the transmissive display area and the reflective display area can be reduced.
[0091]
Further, according to the present invention, the transmittance in the region used for the reflective display can be further improved, so that a brighter display can be realized.
[0092]
Further, according to the present invention, it is possible to realize a liquid crystal display device that can display brightly with a wide color reproduction range in both transmissive display and reflective display.
[0093]
According to the present invention, the colored layer having a thickness smaller than the thickness of the colored layer of the region used for the transmissive display is formed in the region used for the reflective display, and the region used for the reflective display is used. Since the transmittance can be improved and higher than the transmittance in the region used for transmissive display, when used in a liquid crystal display device that realizes both transmissive display and reflective display, The color characteristic in the type display area can be made close to the color characteristic in the transmission type display area, and a color filter that can realize a bright display with a wide color reproduction range can be obtained.
[0094]
According to the present invention, the colored layer is irradiated from the surface side in contact with the substrate at a predetermined position as a region used for the reflective display and a predetermined layer as a region used for the transmissive display. Since the thickness of the colored layer in the region used for the reflective display can be determined by the amount of light irradiation, the variation in the thickness of the colored layer in the region used for the reflective display can be extremely reduced. Uniform color characteristics can be obtained.
[0095]
In addition, according to the present invention, a colored layer having photosensitivity can be uniformly formed on a substrate with high yield, variation in color characteristics can be reduced, and color for a transmissive liquid crystal display device can be reduced. In a manufacturing facility for color filters for filters or reflective liquid crystal display devices, the colored layer is irradiated with light from both sides of the substrate simply by providing an exposure device so that light can be emitted from one side of the substrate. can do.
[0096]
In addition, according to the present invention, a colored layer having photosensitivity can be uniformly formed on a substrate without increasing the number of manufacturing steps, and variations in color characteristics can be reduced, resulting in high productivity. .
[Brief description of the drawings]
FIG. 1 is a bottom view showing a simplified configuration of a transflective liquid crystal display device 1 including a color filter 14 according to a first embodiment of the present invention.
2 is a cross-sectional view showing a cross-sectional configuration taken along a cutting plane line AA of the transflective liquid crystal display device 1 shown in FIG.
FIG. 3 is a view showing a state in which a black matrix pattern 12 and a colored resist layer 13 are formed on a transparent insulating substrate 11;
4 is a view showing a state in which light is irradiated from the surface side not in contact with the transparent insulating substrate 11 to the colored resist layer 13 at a position corresponding to the transmissive display region 40. FIG.
FIG. 5 is a diagram showing a state in which light is irradiated from the surface side in contact with the transparent insulating substrate 11 to the colored resist layer 13 at a position corresponding to the reflective display area 41 and a position corresponding to the transmissive display area 40; It is.
FIG. 6 is a diagram showing a state in which a red resist pattern 13R is formed.
FIG. 7 is a diagram showing a state in which a color filter is formed.
FIG. 8 is a schematic cross-sectional view showing a simplified configuration of a transflective liquid crystal display device 2 including a color filter 140 according to a second embodiment of the present invention.
FIG. 9 is a view showing a state in which a colored organic film 132 is adhered after the black matrix pattern 12 is formed on the transparent insulating substrate 11;
10 is a view showing a state in which light is applied to the colored resist layer 130 at a position corresponding to the transmissive display region 40 from the surface side not in contact with the transparent insulating substrate 11. FIG.
11 is a view showing a state in which light is irradiated from the surface side in contact with the transparent insulating substrate 11 to the colored resist layer 130 at a position corresponding to the reflective display area 41 and a position corresponding to the transmissive display area 40. FIG. It is.
FIG. 12 is a diagram showing a relationship between an exposure amount and a line width shift amount with respect to a photomask design value.
FIG. 13 is a view showing a state where a support film 131 is peeled from a colored resist layer 130. FIG.
FIG. 14 is a diagram showing a state in which a red resist pattern 130R is formed.
FIG. 15 is a diagram showing a relationship between an exposure amount and a pattern thickness obtained by exposure.
16 is a diagram showing a state in which a color filter 140 is formed. FIG.
17 shows an optical characteristic 104 in a reflective display region 41 and an optical characteristic 105 in a transmissive display region 40 of a transflective liquid crystal display device 2 including a color filter 140, and an optical characteristic 106 in a general reflective liquid crystal display device. FIG.
18 is a bottom view showing a simplified configuration of a transflective liquid crystal display device 5 including a color filter 55. FIG.
FIG. 19 is a cross-sectional view showing a cross-sectional configuration taken along the section line BB of the transflective liquid crystal display device 5 shown in FIG.
20 is a bottom view showing a simplified configuration of a transflective liquid crystal display device 8 including a color filter 83. FIG.
21 is a cross-sectional view showing a cross-sectional configuration taken along a section line CC of the transflective liquid crystal display device 8 shown in FIG.
[Explanation of symbols]
1 Transflective liquid crystal display device
2 Transflective liquid crystal display device
10 Color filter substrate
11, 21 Transparent insulating substrate
12 Black matrix pattern
13,130 Colored resist layer
13R, 130R red resist pattern
13G, 130G green resist pattern
13B, 130B Blue resist pattern
14,140 Color filter
15 Transparent electrode film
16a, 16c, 160a, 160c Curing part
16b, 160b Uncured part
17, 18, 19 Photomask
20 Counter substrate
22 Source electrode wiring
23 Gate electrode wiring
24 Transparent electrode for transmissive display
25 Reflective electrode for reflective display
30 Liquid crystal layer
40 Transparent display area
41 Reflective display area
131 Support film
132 Colored organic film

Claims (6)

A color filter formed on a substrate and having a region used for transmissive display and a region used for reflective display,
A black matrix pattern and a colored layer surrounded by the black matrix pattern,
When the thickness d1 of the portion of the area used for the reflective-type display of the colored layer is thinner than the portion d2 of the colored layer in the region to be used for the transmission type display of the colored layer (d1 <d2),
Portion of space used for the reflective display of the colored layer is surrounded by the portion of the area used for the transmission type display of the colored layer, and is formed in contact with the substrate, wherein Rukoto Color filter. 2. The color filter according to claim 1 , wherein the thickness d1 is 0.5 times or less of the thickness d2 (d1 ≦ 0.5d2) . A liquid crystal display device comprising: a color filter according to 請 Motomeko 1 or 2. A region having a region used for transmissive display and a region used for reflective display, including a black matrix pattern and a colored layer surrounded by the black matrix pattern, and a color of the region used for the reflective display A layer is a method of manufacturing a color filter surrounded by a colored layer in a region used for the transmissive display,
Forming a black matrix pattern on the substrate;
Forming a photosensitive colored layer on the substrate;
With respect to the colored layer having photosensitivity, a hardened portion is formed at a predetermined position to be an area used for the transmissive display, and hardened at a predetermined position to be an area used for the reflective display. A step of exposing so that a part and an uncured part are formed;
Removing the colored layer having photosensitivity other than the cured portion,
The colored layer having photosensitivity has photosensitivity in which a portion irradiated with light is cured,
With respect to the colored layer having photosensitivity, a hardened portion is formed at a predetermined position to be an area used for the transmissive display, and hardened at a predetermined position to be an area used for the reflective display. The step of exposing so that the part and the uncured part are formed
Irradiating light from the surface side not in contact with the substrate to the colored layer having photosensitivity at a predetermined position as a region used for the transmissive display;
From the surface side in contact with the substrate with respect to the colored layer having photosensitivity at a predetermined position as a region used for the reflective display and a predetermined position as a region used for the transmissive display. And a step of irradiating with light. The step of forming a colored layer having photosensitivity on the substrate,
Forming a photosensitive colored layer on a support;
The method for producing a color filter according to claim 4 , further comprising a step of adhering the photosensitive colored layer formed on the support onto the substrate . The step of forming a colored layer having photosensitivity on the substrate,
5. The method for producing a color filter according to claim 4 , wherein the color photosensitive material is applied onto the substrate .

Images