JP2002296582A - Liquid crystal display device and manufacturing method therefor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a display device wherein the transmittance and the chromaticity of a color filter layer are changed in a transmission area and a reflection area and the reduction of the reflectance is prevented by utilizing both the transmission light and the reflection light, in the display device having a reflection pixel area and a transmission pixel area. SOLUTION: In the display device 100 having a first substrate having a display area and the reflection area 103 reflecting light by a reflecting means and the transmission area 108 transmitting light in the display area and a color filter area 111 disposed above both the reflection area and the transmission area on the first substrate, the transmittance when light is once transmitted through the color filter area 111 of the transmission area 108 is lower than the transmittance when light is once transmitted through the color filter area of the reflection area 103.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] 1. Field of the Invention [0002] The present invention relates to a liquid crystal display device having a reflection region and a transmission region in which a color filter region is formed, and a method of manufacturing the same.

[0002]

2. Description of the Related Art In recent years, liquid crystal display devices have been characterized by their thinness and low power consumption, so that OA devices such as personal computers, portable information devices such as electronic notebooks, and camera-integrated VTRs equipped with liquid crystal monitors have been developed. Widely used in such as.

Such a liquid crystal display device includes a transmission type liquid crystal display device using a transparent conductive thin film such as ITO (Indium Tin Oxide) as a pixel electrode, and a reflection type using a metal or other reflective electrode as a pixel electrode. Type liquid crystal display devices.

Further, a transflective liquid crystal display device having both functions has been proposed. FIG. 22 shows a cross section of a conventional transflective liquid crystal display device 2200.

The display device 2200 includes a TFT substrate 1, a color filter substrate 2, a reflective electrode 3, a transparent electrode 4,
A liquid crystal layer 5, a polarizing plate 6 on the color filter substrate 2, a quarter-wave plate 7 on the color filter substrate 2, a transparent electrode 8 as a display electrode in the transmission region, and a polarizing plate 9 on the TFT substrate 1. And a quarter-wave plate 10 on the TFT substrate 1, a color filter layer 11, a resin 12, and an insulating film 13.

[0006] The color filter layer 11 is disposed so as to oppose the entire area of the transparent electrode 8 which is a display electrode in the transmission area. On the other hand, only part of the color filter layer 11 is opposed to the reflective electrode 3. That is, a region where the color filter region is not formed is provided in the region facing the reflective electrode 3.

[0007] The display device 2200 displays a color by a method of mixing outgoing light that has passed through a color filter region with high color purity and outgoing light only in a region where a color filter layer (color filter region) is not formed. Let me.

[0008] The transflective liquid crystal display device 2200 comprises:
When the surroundings are completely dark, one display pixel uses a light transmitted through the transmission part from the backlight by creating a reflection part that reflects external light and a transmission part that transmits light from the backlight. It can be used as a transmissive liquid crystal display device that performs display. In addition, when the external light is dark, the transmissive / reflective dual-purpose liquid crystal display device is configured such that light transmitted through the transmitting portion from the backlight and light reflected by the reflecting portion formed of a film having a relatively high light reflectance are used. The present invention can be used as a dual-purpose liquid crystal display device that performs display using both of them.
Further, this transflective liquid crystal display device is a reflection type liquid crystal display device that performs display using light reflected by a reflection portion formed of a film having a relatively high light reflectance when external light is bright. Can be used.

[0009]

However, in the conventional display device 2200, it has been difficult to realize a bright and high color purity color display in both the transmission type and the reflection type. This is because colors are displayed by a method of mixing the emitted light that has passed through the color filter layer with high color purity and the emitted light only in the region where the color filter layer or the color filter region is not formed.

Further, when the reflective electrode 3 is uneven, the thickness of the liquid crystal layer 5 changes between the concave portion and the convex portion.
Further, there is a problem that display quality is deteriorated. Further, when the substrate 1 and the substrate 2 are bonded to each other, the color filter layer or the color filter region 11 is so formed that the area of the region where the color filter layer or the color filter region 11 corresponding to the reflection pixel is not formed does not change. It was also difficult to dispose an unformed region.

The present invention has been made in view of the above problems, and (1) to provide a color filter layer optimal for a transflective liquid crystal device, and to provide a transmissive display excellent in brightness and color reproducibility. Achieving a reflective display, (2) realizing a manufacturing method with a small number of steps, and (3) also solving a display defect caused by the thickness of a liquid crystal layer when the reflective electrode has an uneven structure. With the goal.

[0012]

A display device according to the present invention is a first substrate having a display area, in which a reflection area for reflecting light by a reflection means and a transmission area for transmitting light are provided. A first substrate having a region, and a color filter region disposed on both the reflection region and the transmission region on the first substrate, wherein the color filter of the transmission region is provided. The transmittance when transmitted once through the region is smaller than the transmittance when transmitted once through the color filter region of the reflection region, thereby achieving the above object.

In the display device, the film thickness of the color filter region formed in the transmission region may be larger than the film thickness of at least a part of the color filter region formed in the reflection region.

In the display device, the dye in the color filter region formed in the transmission region may be higher than the dye concentration of at least a part of the color filter region in the reflection region.

[0015] In the display device, a transparent layer may be formed on at least a part of the reflection area, and the color filter area may be formed by laminating the transparent layer.

The display device may include the transparent layer, and the color filter region disposed on the first substrate so as to cover the first substrate and the transparent layer.

In the display device, a plurality of the transparent layers may exist in one reflection area.

[0018] The display device may further include a second substrate disposed opposite to the first substrate, and a reflective electrode disposed on the second substrate and having an uneven surface. .

In the display device, the transparent layer may be formed on the first substrate in at least a part of a position facing the concave portion of the reflective electrode.

The method of manufacturing a display device according to the present invention is a first substrate having a display area, wherein a reflection area for reflecting light by a reflection means and a transmission area for transmitting light are provided in the display area. A method of manufacturing a display device comprising: a first substrate; and a color filter region disposed on both the reflection region and the transmission region on the first substrate. A step of forming a transparent layer on a part of the reflection region, and a step of forming a color filter region so as to cover the reflection region, the transmission region and the transparent layer, thereby achieving the above object. You.

[0021] The method of manufacturing a display device is a first substrate having a display area, wherein the first substrate has a reflection area in which light is reflected by reflection means and a transmission area in which light is transmitted. A method for manufacturing a display device comprising: a first substrate; and a color filter region disposed on both the reflection region and the transmission region on the first substrate, wherein the display device includes the first substrate. A second substrate disposed opposite to the substrate;
Forming a concave and convex surface in a region of the reflective electrode using a photomask on the second substrate; and a step of forming the concave and convex surface on the second substrate by using a photomask. And forming a transparent layer at a part of the position facing the concave portion of the reflective electrode using the photomask.

[0022]

Embodiments of the present invention will be described below with reference to the drawings.

Embodiment 1 FIG. 1A shows a cross section of a transflective liquid crystal display device 100 according to Embodiment 1 of the present invention. The display device 100 includes a lower substrate 101, a glass substrate 102, smooth uneven portions 107, and a reflective electrode 10.
3, the counter electrode 104, the liquid crystal layer 105, and the transmission electrode 1
08, a color filter substrate 110, and a color filter layer 111.

On the lower substrate 101, a reflective electrode 103 and a transparent electrode 108 are formed in a predetermined shape. The lower substrate 101 and the color filter substrate 110 are provided to face each other with the liquid crystal layer 105 interposed therebetween. The color filter substrate 110 includes a glass substrate 102 and a glass substrate 10.
2 color filter layer 11 formed on the liquid crystal layer 105 side
Including 1. Furthermore, the liquid crystal layer 10 of the color filter layer 111
The counter electrode 104 is formed on the fifth side. Lower substrate 1
01 between the liquid crystal layer 105 and the color filter substrate 102.
Is pinched.

Hereinafter, the structure of the display device 100 will be described in more detail.

FIG. 1B is a schematic sectional view for explaining the color filter layer 111 of the display device 100.

The display device 100 has a reflective electrode 103 and a transmissive electrode 108 on a lower substrate 101. In the display device 100, a reflection region is formed corresponding to the reflection electrode 103, and a transmission region is formed corresponding to the transmission electrode.

In the reflection area, light from the outside is reflected by the reflection electrode 1.
Reflection by 03 uses that light from outside for display to observer 135. In the transmission region, light from the light source 125 is used for display to the observer 135 by passing the light from the light source 125 through the transmission region.

A transparent layer 145 is provided in a part of the reflection area of the color filter layer 111. By providing the transparent layer 145, chromaticity characteristics of reflected light and transmitted light used for display to the observer 135 can be adjusted.

FIG. 1C is a diagram showing the upper surface of the display device 100. In the display area 155 of the lower substrate 101, a transmission area 165 and a reflection area 175 are provided. For example, the transmission region 165a and the reflection region 175a display a first color (for example, red), the transmission region 165b and the reflection region 175b display a second color (for example, blue), and the transmission region 165c and the reflection region. 175c displays a third color (for example, green).

The following describes how to form the color filter layer 111.
The method (methods 1 to 5) will be described. Method 1. Color filter layer 1 using pigment dispersion method
Method of forming 11 2A to 2F show color filters using a pigment dispersion method.
A method for forming the layer 111 will be described.

As shown in FIGS. 2A (a) and 2A (b), a transparent acrylic photosensitive material (for example, Optmer NN70 manufactured by JSR) is formed on a glass substrate 102 as a transparent layer.
0) is spin-coated to form a coating film having a thickness of about 0.5 μm. Next, the transparent acrylic photosensitive material applied on the glass substrate 102 is subjected to pattern exposure with actinic light, further developed with an alkali developer, washed with water, and then heat-treated to form a transparent resin layer 150.

In addition, the transparent resin layer 150 may be formed by another method such as patterning by etching, printing and transfer.

Although the transparent resin layer 150 is formed in a stripe shape as shown in FIG. 2A (b), the transparent resin layer 150 may be formed in a plurality of island shapes as long as the transparent resin layer 150 is in the reflection region of the opposing substrate.

Next, as shown in FIG. 2B, the acrylic pigment-dispersed photosensitive material 16 of the first color (for example, red) to be a color filter region (for example, the color filter region 170).
0 was spin-coated to form a coating film having a thickness of about 1 μm on the glass substrate 102 and the transparent resin layer 150. Acrylic pigment-dispersed photosensitive material 16 of the first color on transparent resin layer 150
A film thickness of 0 is somewhat flattened. Transparent resin layer 150
The film thickness of the acrylic pigment-dispersed photosensitive material 160 of the first color above is thinner than the film thickness of the acrylic pigment-dispersed photosensitive material 160 of the first color other than the region where the transparent resin layer 150 is formed.

Next, as shown in FIG. 2C, the first color acrylic pigment-dispersed photosensitive material 160 is subjected to pattern exposure with actinic light, developed with an alkali developing solution, washed with water, and then heat-treated. A color filter region 170 was formed.

Similarly, as shown in FIG. 2D, a second color (for example, blue) acrylic pigment-dispersed photosensitive material and a third color (for example, green) acrylic pigment-dispersed photosensitive material are used to form a second color filter area. 180, the third color filter region 190 was formed, and the color filter layer 111a of the color filter substrate 110a was formed.

When the color filter layer 111 is formed using a pigment dispersion method, the surface of the color filter layer 111a is easily flattened, and a thin film region is formed in the color filter region of the reflection region. .

An overcoat layer (not shown) and a transparent conductive layer (not shown) were formed on the color filter substrate 110a as required. Subsequently, the color filter substrate 110a and the lower substrate facing the color filter substrate 110a are attached to each other.

Before bonding the color filter substrate 110a and the lower substrate, the liquid crystal display device 100 is subjected to an alignment treatment as necessary.

When the color filter substrate 110a and the lower substrate facing the color filter substrate 110a are bonded to each other, the transparent resin layer 150 is made of glass so as to face a part or all of the reflection area on the lower substrate. It is formed in an area on the substrate 102 and forms a transparent non-color filter area.

One pixel on the lower substrate is divided into two regions (a transmissive region and a reflective region).

The color filter layer 111a on the color filter substrate 110a is positioned so that the transparent resin layer 150 faces the reflection region of the lower substrate but does not face the transmission region. After bonding the two substrates in this manner, a liquid crystal material is injected to form a liquid crystal display panel.

Here, on the color filter substrate 110a,
A light-shielding layer may be provided as necessary. Further, in order to prevent transmitted light transmitted through the transmission region from directly contributing to display via the transparent resin layer 150, the color filter substrate 110
It is desirable to consider a margin so that the transparent resin layer 150 does not overlap with the transmission region even if a and the lower substrate are misaligned with each other.

In the transmission region, the display device 100 performs display using light from a light source such as a backlight disposed on the back surface of the panel opposite to the observer. The transmitted light passes through the color filter layer only once. The display device 10
0 is sunlight in the reflection area, lighting installed in the room,
Alternatively, display is performed using external light of illumination arranged in front of the display device. The reflected light passes through the color filter layer twice.

In some or all of the reflection region, the thickness of the color filter region is smaller than the thickness of the color filter region in the transmission region. A high-brightness transflective liquid crystal display device with a high utilization efficiency does not decrease. The relationship between the thickness of the color filter region in the transmission region and the thickness of the color filter region in part or all of the reflection region is determined by the chromaticity characteristics of the transmission region and the chromaticity characteristics of the reflection region of the color filter layer. It is desirable to set so as to match (or approach) as much as possible.

With the above configuration, the transmittance of at least a part of the reflection region for a specific wavelength region is smaller than the transmittance of the transmission region for the same wavelength region. Even if the ambient light suddenly changes (for example, when the sunlight suddenly enters or a car running in the day enters a tunnel), the display does not change because the chromaticity does not change. Without this, a liquid crystal display device with high visibility under any environment can be realized.

Regarding the method of forming the color filter layer 111 using the pigment dispersion method, the case where the surface of the color filter region is flattened has been described. However, as shown in FIG. 2E, even if the surface of the color filter region is not flattened, the thickness of the color filter region in the reflection region can be reduced.

Further, as shown in FIG. 2F, a plurality of transparent resin layers may be arranged in one reflection area. Method 2. Color filter layer 111 when using a dyeing method
FIGS. 3A to 3E show a color filter layer 111 using a dyeing method .
A method for forming the following is shown.

As shown in FIGS. 3A and 3B, a non-dyeable photosensitive transparent resin is spin-coated as a transparent layer on a glass substrate 102 to form a coating film having a thickness of about 0.5 μm. Is formed. Next, the non-dyeable photosensitive transparent resin is pattern-exposed with actinic light, further developed with an alkaline developer, washed with water, and then subjected to a heat treatment to form the transparent resin layer 210.
To form

In addition, the transparent resin layer 210 may be formed by another method such as patterning by etching, printing and transfer.

Although the transparent resin layer 210 is formed in a stripe shape as shown in FIG. 3A (b), the transparent resin layer 210 may be formed in a plurality of island shapes as long as the transparent resin layer 210 is in the reflection region of the opposing substrate.

Next, as shown in FIG. 3B, a dyeable photosensitive resin 220 (for example, an aqueous solution obtained by adding ammonium bichromate to low-molecular-weight gelatin to give photosensitivity) is placed on a glass substrate 102. Spin coating was performed to form a coating film having a thickness of about 1 μm on the glass substrate 102 and the transparent resin layer 210. Dyeable photosensitive resin 2 on transparent resin layer 210
The film thickness of 20 is somewhat flattened. Transparent resin layer 21
The film thickness of the dyeable photosensitive resin 220 above “0” is smaller than the film thickness of the dyeable photosensitive resin 220 other than the area where the transparent resin layer 210 is formed.

Subsequently, as shown in FIG. 3C, ultraviolet light is irradiated through an exposure mask having a desired light-shielding pattern to form a first color (for example, red) pattern as a latent image. Next, the relief pattern 230 of the first color was formed by dissolving the non-exposed portion by developing with water.

Next, as shown in FIG. 3D, the relief pattern 230 was dyed by immersing it in a dye solution to dye the first color.

Next, dye fixing and anti-dyeing treatments are carried out.
The color filter area 240 of the color was obtained. At this time, the transparent resin layer 210 formed under the dyeable photosensitive resin is not dyed because of the non-dyeability.

Similarly, as shown in FIG. 3E, a second color (for example, blue) color filter region 250 and a third color (for example, green) color filter region 260 are formed, and the color filter layer 111a of the color filter substrate 110a is formed. It was created.

An acrylic resin-based overcoat layer (not shown) is formed on the color filter substrate 110a, if necessary.
Was coated.

Next, a transparent conductive layer (not shown) was formed on the color filter substrate 110a. Subsequently, the color filter substrate 110a and the lower substrate opposed to the color filter substrate 110a were attached to each other, and a liquid crystal material was injected, whereby a liquid crystal display panel was manufactured.

When the color filter substrate 110a and the lower substrate facing the color filter substrate 110 are bonded to each other to form a liquid crystal display panel, the transparent resin layer 210 is formed on a part or all of the reflection area on the lower substrate. They are formed on the glass substrate 102 so as to face each other.

One pixel on the lower substrate is divided into two regions (transmission region and reflection region).

The film thickness of the color filter region in part or all of the reflection region is smaller than the film thickness of the color filter region in the transmission region. Therefore, even if the external light transmits through the color filter layer twice in the reflection area, the utilization efficiency of the external light does not decrease, and a transmissive and reflective liquid crystal display device with high luminance can be obtained. Method 3. Color filters for polishing color filters
Forming method Figure 4A~E the data layer 111, illustrates a method of forming a color filter layer by polishing the color filter.

As shown in FIGS. 4A and 4B, a transparent acrylic photosensitive material (for example, Optmer NN700 manufactured by JSR) is spin-coated as a transparent layer on the glass substrate 102 to have a film thickness of about 0.1 mm. A 5 μm coating is formed. Next, the transparent acrylic photosensitive material is subjected to pattern exposure with active light, further developed with an alkali developer, washed with water, and then heat-treated to form a transparent resin layer 300.

In addition, the transparent resin layer 300 may be formed by another method such as patterning by etching, printing and transfer.

Although the transparent resin layer 300 is formed in a stripe shape as shown in FIG. 4A (b), the transparent resin layer 300 may be formed in a plurality of island shapes as long as the transparent resin layer 300 is in the reflection region of the opposing substrate.

Next, as shown in FIG. 4B, an acrylic pigment-dispersed photosensitive material 310 of the first color (for example, red) is spin-coated, and a coating having a thickness of about 1 μm is formed on the glass substrate 102.
It was formed on the top and the transparent resin layer 300. Transparent resin layer 3
The film thickness of the first color acrylic pigment-dispersed photosensitive material 310 on 00 is somewhat flattened. Depending on the viscosity of the acrylic pigment-dispersed photosensitive material, the acrylic pigment-dispersed photosensitive material 310
Has a large step in the region where the transparent resin layer 300 is formed and in the region other than the region where the transparent resin layer 300 is formed.

Next, as shown in FIG. 4C, the acrylic pigment-dispersed photosensitive material 310 of the first color is pattern-exposed with actinic light, developed with an alkali developing solution, washed with water, and then heat-treated. A color filter region 320 was formed.

Similarly, as shown in FIG. 4D, the second color (for example, blue) acrylic pigment-dispersed photosensitive material and the third color (for example, green) acrylic pigment-dispersed photosensitive material are used to form a second color filter area. 330, a color filter region 340 for the third color was formed.

As shown in FIG. 4D, the area where the transparent resin layer 300 is formed and the area other than the area where the transparent resin layer 300 is formed include the acrylic pigment-dispersed photosensitive material 3.
In the case where a large step occurs in 20, 330, and 340, the thickness of the acrylic pigment-dispersed photosensitive material 320, 330, and 340 in the area where the transparent resin layer 300 is formed is such that the transparent resin layer 300 is formed. Since the thickness of the acrylic pigment-dispersed photosensitive materials 320, 330, and 340 in the region other than the region where the acrylic pigment-dispersed photosensitive material is not too thin, the effect of the present invention cannot be sufficiently obtained.

As described later in Embodiment 2, when a liquid crystal panel is bonded to an opposing substrate and there is a region where a transparent resin layer is formed in a part of the reflection region. Has a multi-gap structure in which regions having different thicknesses of the liquid crystal layer exist in the reflection region of one pixel, which affects display quality. In particular, in a display mode in which a liquid crystal material having a positive dielectric constant anisotropy is used to perform black display when a voltage is applied, light is not completely shielded during black display, so that a decrease in contrast ratio occurs. In addition, in a display mode in which a white display is performed when a voltage is applied using a liquid crystal material having a negative dielectric anisotropy, for example, in a vertical alignment display mode, black display is performed with no voltage applied or with a voltage lower than the threshold voltage of the liquid crystal. In contrast, light is not completely shielded during black display, so that a decrease in contrast ratio does not occur.

Therefore, as shown in FIG. 4E, the surface of the color filter region of the color filter substrate 110a is polished, so that the color filter substrate 110a shown in FIG.
Can be reduced or made flat in the surface shape of the color filter layer 111a, and the effect of the present invention can be sufficiently obtained. In addition, it is possible to eliminate display quality deterioration due to the multi-gap structure in the reflection region.

The transparent resin layer 300 is formed on the glass substrate 102 so as to oppose a part or all of the reflection area when the liquid crystal panel is bonded to the opposing substrate. Method 4. Reduced the thickness of part of the color filter area
Forming method Figure 5A~H color filter layer 111 in this case, showing a method of forming a color filter layer 111 to reduce the thickness of a portion of the color filter area.

As shown in FIG. 5A, the glass substrate 10
A second color (for example, red) acrylic pigment-dispersed photosensitive material 360 is spin-coated on 2 to form a coating film having a thickness of about 1 μm. Next, as shown in FIG. 5B, the acrylic pigment-dispersed photosensitive material 360 is subjected to pattern exposure with actinic light, further developed with an alkali developing solution, and washed with water and then heat-treated.
The first color filter area 370 is formed.

Similarly, as shown in FIG. 5C, the second color (for example, blue) acrylic pigment-dispersed photosensitive material and the third color (for example, green) acrylic pigment-dispersed photosensitive material are used to form a second color filter area. 380, a color filter region 390 for the third color was formed.

Next, as shown in FIG. 5D, the glass substrate 1
The resist layer 400 was formed on the color filter regions 370, 380, and 390 on No. 02.

Next, as shown in FIG. 5E, the color filter regions 370, 380, and 390 in the region where the resist layer 400 was not formed were etched by dry etching. Means such as ashing may be used other than the dry etching method.

Thereafter, as shown in FIG.
00 was removed. Color filter layer 1 shown in FIG. 5F
The display device 100 can be manufactured by using the color filter substrate 110b on which the substrate 11b is formed and attaching the color filter substrate 110b to an opposing lower substrate.

At the time of manufacturing the display device 100, in order to optimize the thickness or optical path length of the liquid crystal layer or to stabilize the alignment of the liquid crystal layer, as shown in FIG.
The color filter substrate 110c after the entire surface 1c is covered with the transparent resin 410 and flattened may be used. Further, the display device 100 is manufactured, and as shown in FIG. 5H, a part of the thinned color filter layer 111d is
Color filter substrate 1 after covering with 10 and flattening
10d may be used. The transparent resin 410 functions as a transmissive non-color filter region.

The part of the color filter region to be thinned is
Any shape such as a stripe shape or a plurality of island shapes may be used as long as it is within the reflection region of the opposing substrate.

The color filter substrates 110b, 110c,
An overcoat layer (not shown) and a transparent conductive layer (not shown) were formed on 110d. Subsequently, the color filter substrates 110b, 110c, and 110d are bonded to an opposing substrate, and a liquid crystal material is injected to form a liquid crystal display panel. Pixels on the opposing substrate are divided into two regions (a transmissive region and a reflective region). Here, a light-shielding layer may be provided on the color filter substrate as needed.

As described with reference to FIGS. 6A to 6I, a color filter substrate can be formed by applying a dyeing method to the color filter layer 111.

As shown in FIG. 6A, a dyeable photosensitive resin 440 (for example, an aqueous solution obtained by adding ammonium dichromate to low molecular weight gelatin to give photosensitivity) is spin-coated on the glass substrate 102, A coating film having a thickness of about 1 μm is formed.

Next, as shown in FIG. 6B, ultraviolet light is irradiated through an exposure mask having a desired light shielding pattern.
A latent image of a first color (for example, red) pattern is formed. The first color relief pattern 450 was formed by dissolving the non-exposed portions by developing with water.

Next, as shown in FIG. 6C, the relief pattern 450 was dyed by immersing it in a dye solution to dye the first color. Next, dye fixing and anti-dyeing processing are performed to perform the first color filter area 46.
0 was obtained.

Similarly, as shown in FIG. 6D, a second color (for example, blue) color filter region 470 and a third color (for example, green) color filter region 480 were formed.

As in the steps of FIGS. 5D to 5H, the color filter layers 111b, 111c, 1
11d, a desired color filter substrate 110b,
10c and 110d were obtained.

A transparent layer is first formed on a glass substrate,
Next, when a color filter region is formed (FIGS.
F, 3A-E) are color filters on a glass substrate.
When a transparent region is formed and then a transparent layer is formed (FIGS.
H, see FIGS. 6A-I).
Steps for reducing the thickness of the filter layer (dry etching,
Ashing, etc.)
Can be formed. Method 5. The reflection area and transmission area of the same color
Color filter region is formed of different materials
Method of forming filter layer 111 Method 1. ~ Method 4. Color filters performed in
In the description of the method of forming the layer, a reflection region and a reflection region exhibiting the same color type are described.
And the color filter area of the transmission area are made of the same material
Said if you are. However, they have the same color
The color filter area of the reflection area and the transmission area
It may be formed of different materials.

Hereinafter, a method of forming the color filter layer 111 in which the color filter regions of the reflection region and the transmission region exhibiting the same color type are formed of different materials will be described.

FIGS. 7A to 7C are diagrams showing a method of forming the color filter layer 111 in which the color filter regions of the reflection region and the transmission region exhibiting the same color type are formed of different materials.

As shown in FIG. 7A, an acrylic pigment-dispersed photosensitive material 500 of the first color (for example, red for the transmission region) was spin-coated on a glass substrate 102 to form a coating film having a thickness of about 1 μm.

Next, as shown in FIG. 7B, the glass substrate 102 on which the coating film is formed is exposed to a pattern with active light, developed with an alkali developing solution, washed with water, and then heat-treated to form a first color. A color filter region 510 was formed.

Similarly, as shown in FIG. 7C, an acrylic pigment-dispersed photosensitive material of the second color (for example, blue for the transmission region),
An acrylic pigment-dispersed photosensitive material of a color (for example, green for a transmission region), an acrylic pigment-dispersed photosensitive material of a fourth color (for example, red for a reflection region), an acrylic pigment-dispersed photosensitive material of a fifth color (for example, blue for a reflection region), Using an acrylic pigment-dispersed photosensitive material of the sixth color (for example, green for the reflection area),
The color filter area 520 for the third color, the color filter area 530 for the third color, the color filter area 540 for the fourth color,
A fifth color filter region 550 and a sixth color filter region 560 are formed. Here, the first color filter region 510 and the fourth color filter region 540 have the same color type. Similarly, the second color filter region 520 and the fifth color filter region 550 have the same color type. The third color filter region 530 and the sixth color filter region 560 have the same color type. However, the dye densities of the color filter regions 510, 520, and 530 corresponding to the transmission regions correspond to the color filter regions 540,
It is formed so as to be darker than the dye concentrations of 50 and 560.

When the color filter substrate 110e having the color filter layer 111e formed as described above is used for the display device 100, the number of times that light contributing to display passes through the color filter region is one in the transmission region and one in the transmission region. In the reflection area, transmission is performed twice. Here, for the same color type, by changing the material (dye density and type) of the color filter region between the transmission region and the reflection region, the utilization efficiency of the external light is reduced even if the external light passes through the color filter region twice. Thus, a transflective liquid crystal display device having excellent brightness and chromaticity characteristics can be obtained.

In order to change the type of the color filter region and the film thickness of the color filter region arranged in the region on the glass substrate facing the entire reflection region or a part of the reflection region, the following formation method is considered. Can be

FIGS. 8A to 8E are diagrams showing a method of forming the color filter layer 111 for changing the type of the color filter region and the film thickness of the color filter region.

As shown in FIG. 8A, an acrylic pigment-dispersed photosensitive material 600 of the first color (for example, red for the transmission region) was spin-coated on a glass substrate 102 to form a coating film having a thickness of about 1 μm. Subsequently, as shown in FIG. 8B, the applied glass substrate 102 is pattern-exposed with actinic light, further developed with an alkali developer, washed with water, and then heat-treated.
A first color filter 610 was formed.

Similarly, as shown in FIG. 8C, the acrylic pigment-dispersed photosensitive material of the second color (for example, blue for the transmission region),
An acrylic pigment-dispersed photosensitive material of a color (for example, green for a transmission area), an acrylic pigment-dispersed photosensitive material of a fourth color (for example, red for a reflective area), an acrylic pigment-dispersed photosensitive material of a fifth color (for example, blue for a reflective area), Using an acrylic pigment-dispersed photosensitive material of the sixth color (for example, green for the reflection area),
The color filter area 620 for the third color, the color filter area 630 for the third color, the color filter area 640 for the fourth color,
A fifth color filter region 650 and a sixth color filter region 660 were formed.

In this case, the fourth color (red for the reflection area) of the acrylic pigment-dispersed photosensitive material is the first color (red for the transmission area).
And the same material as the acrylic pigment-dispersed photosensitive material. By changing the spin-coating conditions or the viscosity of these acrylic pigment-dispersed photosensitive materials, on the glass substrate 102,
The film was formed thin. Similarly, the acrylic pigment-dispersed photosensitive material of the fifth color (blue for the reflective area) and the acrylic pigment-dispersed photosensitive material of the sixth color (green for the reflective area),
The acrylic pigment-dispersed photosensitive material of the second color (blue for the transmission region) was formed to be thinner than the acrylic pigment-dispersed photosensitive material of the third color (green for the transmission region).

The color filter layer 1 thus formed
When the color filter substrate 110f having 11f is applied to a high-luminance transflective liquid crystal display device, the external light utilization efficiency does not decrease even if external light passes through the color filter region twice in the reflection region.

If necessary, as shown in FIGS. 8D and 8E, by flattening with a transparent resin 670 or the like, color filter substrates 110g and 110h having color filter layers 111g and 111h can be obtained. it can.

In the above description, the color filter layer is provided on the glass substrate, but the present invention is not limited to this.

For example, as a display device 200, as shown in FIG.
May be formed. In the display device 200, the color filter substrate 110 includes the lower substrate 101 and the color filter layer 111. The liquid crystal layer 105 is formed between the color filter substrate 110 and the counter substrate 130. Lower substrate 1
A color filter layer 111 is formed on the reflection electrode 103 and the transmission electrode 108 on the first electrode 101. Color filter layer 1
11 is a transparent layer 1 provided on a part of the reflection area 103.
45. It is obvious to those skilled in the art that the effects of the present invention can be obtained by providing the chromaticity characteristics of the light transmitted through the reflective area and the transmissive area and contributing to the display in such a manner.

Further, by applying the above-described embodiment, by making the area ratio between the color filter region and the transparent layer constant in each of the plurality of reflection regions, uniform display without display unevenness can be performed. .

The transmissive area and the reflective area in the display area are not limited to the configuration described with reference to FIG. 1C. In FIG. 1C, the transmission region is formed so as to be surrounded by the reflection region. Alternatively, the reflection region may be formed so as to be surrounded by the transmission region. Alternatively, the transmission region and the reflection region may have the same shape. Yes, they may be arranged in a matrix. The area ratio between the transmission region and the reflection region changes, for example, from 1: 9 to 9: 1 according to the specification of the product used. If the ratio of the smaller area is about 10% of the whole, the advantage of the transflective liquid crystal display device can be obtained.

When the area ratio between the transmission region and the reflection region is used in a portable transmission / reflection type liquid crystal display device, it is preferable to increase the ratio of the reflection region in order to suppress power consumption. Conversely, when used in an in-vehicle transflective liquid crystal display device, the battery of the car has a relatively large capacity, and therefore it is preferable to increase the proportion of the transmissive region in order to obtain a brighter display. Depending on the relationship between the power consumption of the light source and the required brightness, the preferred area ratio between the transmission region and the reflection region changes. Of course, the area ratio between the transmission region and the reflection region may be 1: 1.

Display device 100 described in the first embodiment
And the performance of the conventional display device 2200 are compared.

FIG. 10 shows the color filter layer 111 of the display device 100 and the color filter layer 1 of the display device 2200.
2 shows the results of a simulation showing the color reproducibility of No. 1. The horizontal axis indicates the Y value indicating the brightness of the color filter layer. The vertical axis indicates the color reproduction range (NTSC ratio).

The NTSC ratio is expressed by red, green, and xy chromaticity coordinates.
It is a ratio (SA / S) of the area of a triangle surrounded by three blue points. The reference area S is red (X: 0.670, y:
0.330) The area of a triangle surrounded by green (X: 0.210, y: 0.710) and blue (X: 0.140, y: 0.080). The area SA is an area of a triangle surrounded by three points of chromaticity coordinates corresponding to red, green, and blue of a color filter layer serving as a sample.

In performing the simulation, the color filter layer 111 and the color filter layer 11 have a reflection area and a transmission area, both of which have red (X: 0.6) when reflected.
70, y: 0.326), green (X: 0.286, y:
0.648), blue (X: 0.131, y: 0.12)
0), an NTSC ratio of 79.9%, and a color plate (a material forming a color filter region) having an optical characteristic of a color filter layer having a Y value of 22.9 (P0 in FIG. 10). ).

[0110] In Fig. 10, the symbol "■" indicates the characteristics of the color filter layer 11 of the prior art. From P0 at the upper left corner, P1 → P2
Simulation results are shown in the case where the color filter layer or the region where the color filter region is not formed is increased by 5% of the area of the reflective electrode in order of → P3 → P4 → P5 → P6 → P7. Thus, the color filter layer 1
When 1 is used, the Y value is improved, and the reflectance is improved.
However, since the color reproduction range (NTSC ratio) is significantly reduced, the color tone becomes whitish and the color tone is deteriorated.

[0111] In Fig. 10, the symbol "◆" indicates the characteristics of the color filter layer 111 of this embodiment. From P0 at the upper left corner, PN1
The simulation results when the color plate at the position facing the reflective electrode is thinned by 25% in the order of → PN2 → PN3 are shown. In order to make effective use of the reflected light on the reflective electrode,
When the color plate at the position facing the reflective electrode is made thinner, the Y value of the color filter is improved, and the reflectance is improved. However, the color reproduction range is reduced.

However, when compared with the characteristics of the color filter layer 11 of the prior art, when compared with the same Y value,
The color filter layer 111 of the present embodiment shows a higher color reproduction range. For example, the comparison is performed at a Y value of 35%. The color reproduction range (NTSC ratio) of the conventional color filter layer 11 is 0.23 (P3). On the other hand, the color reproduction range (NTSC ratio) of the color filter layer 111 of this embodiment is 0.48.
(PN2).

When compared in the same color reproduction range (NTSC ratio), the Y value of the color filter layer 111 of this embodiment is higher. For example, the color reproduction range (NTS
(C ratio) 0.5. The Y value of the conventional color filter layer 11 is 27 (P1). On the other hand, the Y value of the color filter layer 111 of this embodiment is 34 (PN2).

From the above results, the color filter layer 111 of the present embodiment is better than the color filter layer 11 of the prior art.
It can be seen that is more excellent in the balance between the color reproduction range and the reflectance.

In particular, it is more difficult to obtain a sufficient contrast ratio in a reflective display using external light than in a transmissive display. In an actual liquid crystal display device (in a state where the conditions of the liquid crystal layer are added), it is more difficult to balance the color reproduction range and the reflectance than when only the color filter layer is used. Superiority increases. That is, when the color filter layer 111 of the present embodiment is used, a reflective display in which the color reproduction range and the reflectance are well balanced can be performed as compared with the color filter layer 11 of the related art.

Accordingly, the liquid crystal display device 100 having the color filter layer 111 can realize a transmissive display and a reflective display excellent in brightness and color tone.

Further, according to the method of manufacturing the display device 100 of the present embodiment, the transparent layer is formed in a part of the reflection area. This makes it possible to easily form a thin color filter region in a part of the reflection region. Therefore, it is possible to realize a display device that realizes transmissive display and reflective display excellent in brightness and color tone.

(Embodiment 2) FIG. 11 shows a cross section of a transflective liquid crystal display device 700 according to Embodiment 2 of the present invention. The display device 700 includes a first substrate 720 on the color filter side, a second substrate 730 on the TFT side, and a liquid crystal layer 740.
And The first substrate 720 includes a substrate 702, a transparent layer 707 made of a transparent photosensitive resin, and a color filter layer 7.
09 and a counter electrode 710. The second substrate 730 includes
The substrate 702, the transmission electrode 703, and the smooth uneven portion 7
04 and a reflective electrode 706.

The cell gap d1 indicates the distance between the concave portion of the first substrate 720 on the color filter side and the convex portion of the reflective electrode of the second substrate 730 on the TFT side.

The cell gap d2 indicates the distance between the convex portion of the first substrate 720 on the color filter side and the concave portion of the reflective electrode of the second substrate 730 on the TFT side.

In the display device 700, the convex portion of the first substrate 720 on the color filter side and the second substrate 7 on the TFT side are used.
The concave portions of the 30 reflective electrodes are aligned. The concave portion of the first substrate 720 on the color filter side and the convex portion of the second substrate 730 on the TFT side are aligned. Therefore, the layer thickness of the liquid crystal layer 740 in the reflection region is substantially constant.

FIG. 12 is a diagram showing a cross section of a display device in which a transparent layer is not formed on the substrate on the color filter side.
The cell gap d3 indicates the distance between the projection of the reflective electrode on the TFT side substrate and the flat substrate on the color filter side. The cell gap d4 indicates the distance between the concave portion of the reflective electrode on the substrate on the TFT side and the flat substrate on the color filter side.

Hereinafter, a further advantage of the display device 700 shown in FIG. 11 will be described. The cell gap d3 shown in FIG.
Is smaller than the cell gap d4 by the unevenness of the reflective electrode (d3 <d4). For example, the cell gap difference ΔD1 = d4−d3 ≒ 1 μm. Therefore, cell gaps d3 to d4 are continuously mixed in the reflective electrode portion. FIG. 13A shows the voltage-reflectance characteristics of the cell gap d3 and the cell gap d4. Since the retardation of the liquid crystal layer when a voltage is applied largely depends on the cell gap, the cell gap greatly affects the voltage-reflectance characteristics. Therefore, the voltage-reflectance characteristics of the entire reflective electrode portion (FIG. 13B) are characteristics in which different voltage-reflectance characteristics corresponding to a plurality of cell gaps are combined. In a display mode in which a voltage is applied and black display is performed with a specific liquid crystal layer retardation (hereinafter referred to as “normally white mode”), when a black display voltage is applied, different liquid crystal layers corresponding to a plurality of cell gaps are applied. Retardation is mixed. Therefore, it is almost impossible to design a polarizing plate and a retardation plate so as to obtain a sufficient black display with respect to the retardations of all the liquid crystal layers. Therefore,
As shown in FIG. 13B, the reflectivity of black display may be improved (floating of black display), and the contrast ratio may be reduced.

On the other hand, the display device 700 shown in FIG.
Then, the difference ΔD2 (= d2-d1) between the cell gap d1 of the convex part of the concave and convex of the reflective electrode and the cell gap d2 of the concave part is:
It is smaller than ΔD1 in the prior art. This is because the transparent layer 707 is formed on the first substrate 720.
Therefore, the difference between the cell gaps mixed in the reflective electrode portion is reduced, and the variation in the voltage-reflectance characteristics is also reduced. Accordingly, in the voltage-reflectance characteristics of the entire reflective electrode portion, the floating of black display is reduced, and the contrast ratio is improved.

FIG. 11 according to the second embodiment of the present invention will be described below.
Used in the transmission-reflection type liquid crystal display device 700 shown in FIG.
A method for forming the first substrate 720 and the second substrate 730 will be described.
You. Formation of first substrate 720 on color filter side 14A to 14D show the first substrate 720 on the color filter side.
It is a figure explaining a formation process.

As shown in FIG. 14A, a negative type photosensitive resin (acrylic resin) is applied as a transparent layer 707 on a substrate 702 as a transparent layer 707 (except for the portions other than the exposed portions and disappears after development), and light shielding portions 708a and 708b are provided. Exposure was performed uniformly using a third photomask. Since the type of the photosensitive resin used is opposite between the first substrate and the second substrate, the third photomask is, for example, as shown in FIG. The same can be used. In this case, the number of photomasks can be reduced. At this time, the light-shielding portion 708a of the third photomask corresponds to a light-shielding portion 705a of the first photomask described later. Light-shielding portion 70 of third photomask
8b corresponds to the light shielding portion 705b of the first photomask. When the substrate 720 and the substrate 730 are bonded together, FIG.
As shown in FIG. 9B and FIG. 11, the first substrate 72 is provided at a position corresponding to the concave portion of the reflective electrode formed on the second substrate 730 side.
It is designed so that a convex portion of the transparent layer 707 is formed. Here, the sectional view taken along the sectional line of FIG.
It is one.

Next, as shown in FIG. 14B, by performing development with a developing solution, the photosensitive resin other than the above-described exposed portion is completely removed, and the transparent layer 707 is placed at a desired position on the substrate 702. Form into shape.

Next, as shown in FIG. 14C, the transparent layer 70
7 on the color filter layer 70 by the methods 1, 2, and 3 (FIGS. 2, 3, and 4) described in the first embodiment.
9 was formed. Further, as shown in FIG. 14D, an ITO thin film is formed by a sputtering method, and a counter electrode 710 is formed.
Was formed. Formation of TFT-side Second Substrate 730 FIGS. 15A to 15D are diagrams illustrating a process of forming the TFT-side second substrate 730.

As shown in FIG. 15A, a positive type photosensitive resin (an acrylic resin made of Nippon Synthetic Rubber Co., Ltd.) having a thickness of 3.7 μm is applied on a substrate 702 so that the exposed portion disappears after development. Using a first photomask having portions 705a and 705b (FIG. 18A), exposure was uniformly performed at low illuminance.

The light-shielding portion 705a is for producing an uneven shape. A circle having a diameter of 12 μm was arranged so that the center distance between the circles was 14 μm. However, if the light-shielding portions 705a are uniformly arranged at a center interval of 14 μm, interference of reflected light is likely to occur.
They were randomly arranged so as to be about μm.

The light shielding portion 705b is for shielding the photosensitive resin on the transparent electrode 703 from light. The reflection characteristics were evaluated in advance while changing the exposure conditions, and the exposure amount at which good reflection characteristics were obtained was examined. Based on this result, 50
Exposure was performed at mJ (low illuminance).

Next, as shown in FIG. 15B, a region corresponding to the contact region (a conducting region for supplying a voltage to the liquid crystal driving electrode) and the transmissive region C on the transmissive electrode portion 703 is defined as a transmissive region 705d. Light-shielding part 70 corresponding to the reflection area
Using a second photomask having 5C (FIG. 18B), exposure was performed at an exposure amount of 260 mJ (high illuminance).

Next, as shown in FIG. 15C, the photosensitive resin in the high illuminance exposed portion (contact hole portion and transmission region) is completely removed by developing with a developing solution, and the low illuminance exposed portion is removed. This resin was in a state where the film thickness was reduced with respect to the initial film thickness. Further, heat treatment was performed at 100 ° C. for 11 minutes, and then heat treatment was performed at 220 ° C. for 60 minutes. Due to the heat dripping phenomenon, the resin in the region exposed to low illuminance was deformed, and a smooth uneven portion 704 was obtained.

Next, as shown in FIG.
06 and the Mo thin film was 100
An Al thin film was formed thereon by sputtering to a thickness of 1000 °. Then, a photoresist was applied, and the transmissive electrode 703 and the boundary region of the pixel were exposed, and the reflective electrode (Al / Mo electrode) was patterned by performing development, etching, and peeling steps. By doing so, at least one reflection electrode 706 and at least one transmission electrode 703 exist in one pixel. In FIG. 15D, the transmission region C also has the function of the contact hole, but both may be provided separately.

Another example of the third photomask used in FIG. 14A will be described below.

As shown in FIG. 20A, a third photomask in which a circular transmitting portion 750 is provided in a region other than the light shielding portions 705a and 705b of the first photomask can be used. FIG. 20B is a plan view in which the substrate 720 and the substrate 730 are attached to each other. Here, FIG. 11 is a cross-sectional view taken along the cross-sectional line of FIG. At this time, the third photomask is designed so that the transparent layer 707 is formed at the position where the circular transmission portion 750 is formed. This position does not necessarily correspond to the entire concave portion formed on the second substrate 730 side. However, by forming the convex portion by the transparent layer 707 on the first substrate 720 side in a region corresponding to a part of the concave portion formed on the second substrate 730 side, the effect of reducing the change in the thickness of the liquid crystal layer is reduced. There is.

Further, another example of the first photomask used in FIG. 15A and the third photomask used in FIG. 14A will be described below. As a first photomask, a photomask in which a circular transmission part 760 is formed instead of the circular light shielding part 705a shown in FIG.
Using (a)), a smooth uneven portion 704 is formed on the second substrate 730 by the same method. Further, when the same photomask is used as a third photomask (FIG. 21B), a transparent layer 707 is formed at a position where the circular transmission part 770 is formed. This position corresponds to the position of the second substrate 7 caused by the light shielding portion 761 of the first photomask.
It is in a complementary relationship with the protrusion formed on the 30 side.

FIG. 21C is a plan view in which the substrate 720 and the substrate 730 are attached to each other. Here, FIG. 11 is a cross-sectional view taken along the cross-sectional line in FIG. Therefore, the thickness of the liquid crystal layer in the reflective electrode portion approaches a constant value, and the floating of black display is reduced in the voltage-reflectance characteristics of the entire reflective electrode portion, so that the contrast ratio is improved.

Also in the structure of the display device shown in FIGS. 12 and 16, if the normally black mode is applied, floating of black display hardly occurs, and the contrast ratio is improved.
The normally black mode is a mode in which a black display is performed by causing no phase difference in the liquid crystal layer when no voltage is applied to the liquid crystal layer. Typically, a transmissive display has a structure in which a liquid crystal layer in a vertical alignment state is sandwiched between polarizing plates in a crossed Nicols state. Typically, a reflective display has a structure in which circularly polarized light is incident on a liquid crystal layer in a vertically aligned state.

FIG. 16 shows the smooth uneven portion 704 of FIG.
Instead, a flat insulating film 704a is formed, so that the surface of the reflective electrode 706 is flat. Here, there is a cell gap d5 in a region where the transparent layer 707 exists, and a cell gap d6 in a region where the transparent layer 707 does not exist. The difference ΔD3 (= d6-d5) is larger than the difference ΔD2 (= d2-d1) shown in FIG. However, in the case of the normally black mode, no phase difference occurs (the reflectance is close to 0), as shown by the area B in FIG.
Therefore, the voltage value is the same even if there is a difference in the cell gap. Moreover, the margin is wide. Therefore, FIG.
As shown in (b), in the voltage-reflectance characteristics of the entire reflective electrode portion, the black display is less likely to float.

As described above, according to the display device 700 of the present invention, in the case of a reflective electrode having an uneven shape, the colorless and transparent insulating layer is used for adjusting the film thickness. Display defects can be solved. At this time, since the colorless and transparent insulating layer is patterned using the photomask used to form the unevenness of the reflective electrode, the trouble of creating a new photomask can be omitted and the alignment of the unevenness can be improved.

[0142]

According to the display device of the present invention, a reduction in color purity of emitted light can be suppressed by forming a thin color filter in a region where the conventional color filter layer of the present invention is not formed. Therefore, according to the display device of the present invention,
A transmissive display excellent in brightness and color reproducibility and a reflective display can be realized.

According to the display device manufacturing method of the present invention, a colorless and transparent insulating layer is formed in a region where no color filter layer is formed. Therefore, a thin color filter layer can be easily formed in a region where the color filter layer is not formed. Therefore, it is possible to manufacture a transflective liquid crystal display device excellent in color reproducibility and brightness.

Further, according to the display device of the present invention, in the case of a reflective electrode having an uneven shape, a colorless and transparent insulating layer is used for adjusting the film thickness, so that a display defect caused by unevenness can be solved. At this time, since the colorless and transparent insulating layer is patterned using the photomask used for forming the unevenness, the trouble of creating a new photomask can be omitted, and the alignment of the unevenness can be improved.

[Brief description of the drawings]

FIG. 1A is a diagram illustrating a cross section of a transflective liquid crystal display device 100 according to a first embodiment of the present invention.

FIG. 1B is a schematic cross-sectional view illustrating a color filter layer 111 of the display device 100.

FIG. 1C is a diagram showing an upper surface of the display device 100.

FIG. 2A shows a color filter layer 111 formed by a pigment dispersion method.
FIG. 4 is a diagram showing a method of forming a hologram.

FIG. 2B shows a color filter layer 111 formed by a pigment dispersion method.
FIG. 4 is a diagram showing a method of forming a hologram.

FIG. 2C is a diagram illustrating a color filter layer 111 using a pigment dispersion method.
FIG. 4 is a diagram showing a method of forming a hologram.

FIG. 2D is a diagram illustrating a color filter layer 111 using a pigment dispersion method.
FIG. 4 is a diagram illustrating a method of forming a hologram.

FIG. 2E shows a color filter layer 111 formed by a pigment dispersion method.
FIG. 4 is a diagram showing a method of forming a hologram.

FIG. 2F shows a color filter layer 111 formed by a pigment dispersion method.
FIG. 4 is a diagram showing a method of forming a hologram.

FIG. 3A is a diagram showing a method of forming a color filter layer 111 using a dyeing method.

FIG. 3B is a diagram showing a method of forming a color filter layer 111 by using a dyeing method.

FIG. 3C is a diagram showing a method of forming a color filter layer 111 by using a dyeing method.

FIG. 3D is a diagram showing a method of forming a color filter layer 111 by using a dyeing method.

FIG. 3E is a diagram showing a method of forming a color filter layer 111 using a dyeing method.

FIG. 4A is a diagram showing a method of forming a color filter layer by polishing a color filter.

FIG. 4B is a diagram illustrating a method of forming a color filter layer by polishing the color filter.

FIG. 4C is a diagram showing a method of forming a color filter layer by polishing the color filter.

FIG. 4D is a diagram showing a method of forming a color filter layer by polishing the color filter.

FIG. 4E is a diagram showing a method of forming a color filter layer by polishing the color filter.

FIG. 5A is a diagram illustrating a method of forming a color filter layer 111 by reducing the thickness of a part of a color filter region.

FIG. 5B is a diagram showing a method of forming a color filter layer 111 by reducing the thickness of a part of a color filter region.

FIG. 5C is a diagram showing a method of forming the color filter layer 111 by reducing the thickness of a part of the color filter region.

FIG. 5D is a diagram illustrating a method of forming the color filter layer 111 by reducing the thickness of a part of the color filter region.

FIG. 5E is a diagram illustrating a method of forming the color filter layer 111 by reducing the thickness of a part of the color filter region.

FIG. 5F is a diagram showing a method of forming the color filter layer 111 by reducing the thickness of a part of the color filter region.

FIG. 5G is a diagram showing a method of forming the color filter layer 111 by reducing the thickness of a part of the color filter region.

FIG. 5H is a diagram showing a method of forming a color filter layer 111 by reducing the thickness of a part of the color filter region.

FIG. 6A is a diagram illustrating a method of forming a color filter layer 111 to which a dyeing method is applied by reducing the thickness of a part of a color filter region.

FIG. 6B is a diagram showing a method of forming a color filter layer 111 adapted to a dyeing method by reducing the thickness of a part of the color filter region.

FIG. 6C is a diagram showing a method of forming a color filter layer 111 adapted to a dyeing method by reducing the film thickness of a part of the color filter region.

FIG. 6D is a diagram showing a method of forming a color filter layer 111 adapted to a dyeing method by reducing the thickness of a part of the color filter region.

FIG. 6E is a diagram showing a method of forming a color filter layer 111 adapted to a dyeing method by reducing the film thickness of a part of the color filter region.

FIG. 6F is a diagram showing a method of forming a color filter layer 111 adapted to a dyeing method by reducing the film thickness of a part of the color filter region.

FIG. 6G is a diagram showing a method of forming a color filter layer 111 adapted to a dyeing method by reducing the film thickness of a part of the color filter region.

FIG. 6H is a diagram showing a method of forming a color filter layer 111 adapted to a dyeing method by reducing the film thickness of a part of the color filter region.

FIG. 6I is a diagram showing a method of forming a color filter layer 111 adapted to a dyeing method by reducing the thickness of a part of a color filter region.

FIG. 7A is a diagram showing a method of forming a color filter layer 111 in which a color filter region of a reflection region and a color filter region of a transmission region having the same color type are formed of different materials.

FIG. 7B is a diagram showing a method of forming a color filter layer 111 in which color filter regions of a reflection region and a transmission region exhibiting the same color type are formed of different materials.

FIG. 7C is a diagram showing a method of forming a color filter layer 111 in which color filter regions of a reflection region and a transmission region exhibiting the same color type are formed of different materials.

FIG. 8A is a diagram illustrating a method of forming a color filter layer 111 that changes the type of a color filter region and the thickness of the color filter region.

FIG. 8B is a diagram showing a method of forming a color filter layer 111 for changing the type of the color filter region and the film thickness of the color filter region.

FIG. 8C is a diagram showing a method of forming a color filter layer 111 for changing the type of the color filter region and the thickness of the color filter region.

FIG. 8D is a diagram showing a method of forming a color filter layer 111 for changing the type of the color filter region and the film thickness of the color filter region.

FIG. 8E is a diagram showing a method of forming a color filter layer 111 for changing the type of the color filter region and the thickness of the color filter region.

FIG. 9 is a diagram showing a cross section of the display device 200.

FIG. 10 is a diagram illustrating a simulation result of a relationship between color reproduction ranges of color filter layers used in the display device 100 and the display device 2200.

FIG. 11 is a diagram illustrating a cross section of a transflective liquid crystal display device 700 according to a second embodiment of the present invention.

FIG. 12 is a diagram illustrating a cross section of a display device in which unevenness is not formed on a substrate on a color filter side.

13A shows the voltage-reflectance characteristics of the cell gap d3 and the cell gap d4, and FIG. 13B shows the voltage-reflectance characteristics of the entire reflecting electrode unit.

FIG. 14A is a diagram illustrating a step of forming a first substrate 720 on the color filter side.

FIG. 14B is a diagram illustrating a step of forming the first substrate 720 on the color filter side.

FIG. 14C is a diagram illustrating a step of forming the first substrate 720 on the color filter side.

FIG. 14D is a diagram illustrating a step of forming the first substrate 720 on the color filter side.

FIG. 15A is a diagram illustrating a step of forming a second substrate 730 on the TFT side.

FIG. 15B is a diagram illustrating a step of forming a second substrate 730 on the TFT side.

FIG. 15C is a diagram illustrating a step of forming a second substrate 730 on the TFT side.

FIG. 15D is a diagram illustrating a step of forming the second substrate 730 on the TFT side.

FIG. 16 is a diagram showing a display device in which the surface of a reflective electrode 706 is flat.

17A is a diagram illustrating voltage-reflectance characteristics of the cell gap d3 and the cell gap d4 in the normally black mode, and FIG. 17B is a diagram illustrating the voltage of the entire reflective electrode unit in the normally black mode. 4 shows a reflectance characteristic.

FIG. 18A shows a first photomask, and FIG.
FIG. 3 is a diagram showing a second photomask.

FIG. 19 illustrates an embodiment utilizing a third photomask.

FIG. 20 illustrates an embodiment utilizing a third photomask.

FIG. 21 is a diagram illustrating an embodiment utilizing a first photomask and a third photomask.

FIG. 22 shows a conventional transflective liquid crystal display device 2200.
FIG.

[Explanation of symbols]

 REFERENCE SIGNS LIST 100 transflective liquid crystal display device 101 lower substrate 102 glass substrate 103 reflective electrode 104 counter electrode 105 liquid crystal layer 108 transmissive electrode 110 color filter substrate 111 color filter layer

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H048 BA12 BA43 BA45 BA48 BB02 BB08 BB28 BB42 2H091 FA02Y FA14Z FA41Z GA01 LA30

Claims (9)

[Claims] 1. A first substrate having a display area,
A first substrate having a reflection area for reflecting light by a reflection unit and a transmission area for transmitting light in the display area; and a first substrate on both the reflection area and the transmission area on the first substrate. And a transmittance when transmitted once through the color filter region of the reflection region, and a transmittance when transmitted once through the color filter region of the reflection region. Display device smaller than. 2. A film thickness of a color filter region formed in the transmission region is larger than a film thickness of at least a part of a color filter region formed in the reflection region.
The display device according to claim 1. 3. The color density of a color filter area formed in the transmission area is higher than that of at least a part of a color filter area of the reflection area.
The display device according to claim 1. 4. The display device according to claim 2, wherein a transparent layer is formed on at least a part of the reflection region, and the color filter region is formed by laminating with the transparent layer. 5. The display device according to claim 4, further comprising: the transparent layer, and the color filter region disposed on the first substrate so as to cover the first substrate and the transparent layer. 6. The display device according to claim 5, wherein a plurality of the transparent layers exist in one reflection region. 7. A display device, further comprising: a second substrate disposed opposite to the first substrate; and a reflective electrode disposed on the second substrate and having a concave-convex surface. The display device according to claim 6, wherein the transparent layer is formed on the first substrate at at least a part of a position facing the concave portion of the reflective electrode. 8. A first substrate having a display area, wherein:
A first substrate having a reflection area for reflecting light by a reflection unit and a transmission area for transmitting light in the display area; and a first substrate on both the reflection area and the transmission area on the first substrate. Forming a transparent layer on a part of a reflection region of the first substrate; and forming the reflection region, the transmission region and the transparent region on the first substrate. Forming a color filter region so as to cover the layer. 9. A first substrate having a display area, wherein:
A first substrate having a reflection area for reflecting light by a reflection unit and a transmission area for transmitting light in the display area; and a first substrate on both the reflection area and the transmission area on the first substrate. A display device having a color filter region disposed on the first substrate, wherein the display device includes a second substrate disposed opposite to the first substrate.
Forming a concave and convex surface in a region of the reflective electrode using a photomask on the second substrate, the reflective electrode being disposed on the second substrate and having a concave and convex surface. The display device according to claim 8, further comprising: a step of forming a transparent layer on the first substrate at a position facing the concave portion of the reflective electrode using the photomask. Manufacturing method.