JP2005070427A - Color filter substrate, method for manufacturing the color filter substrate, electro-optical device, method for manufacturing optoelectronic device, and electronic equipment - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide constitution of a substrate or an optoelectronic device that can suppress deterioration in display quality due to the variations in visual characteristics with the wavelength of display light as to a color filter substrate having a color filter and a reflecting layer or the optoelectronic device. <P>SOLUTION: This color filter substrate 10 has a color filter 14 including a plurality of kinds of colored layers 14R, 14G, and 14B having different hues and a reflecting layer 13 having a light-diffusive reflecting surface 13a on a color-filter side surface arranged on a substrate 11 and reflection areas 13R, 13G, and 13B which are provided corresponding to at least two kinds of colored layers and have mutually different light scattering characteristics provided on the reflecting surface. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a color filter substrate, a method for manufacturing a color filter substrate, an electro-optical device, a method for manufacturing an electro-optical device, and an electronic apparatus, and more particularly, to a substrate having a color filter and a reflective layer or a configuration of an electro-optical device.

  In general, an electro-optical device including a color filter and a reflective layer is used in many cases along with the recent colorization of display bodies and the development of portable electronic devices. For example, a liquid crystal display device, which is a kind of electro-optical device, will be described as an example. Reflective color liquid crystal display bodies and transflective color liquid crystal display bodies are used in most mobile phones and portable information terminals. At present, display colorization is indispensable for the above devices due to demands for increasing display information density and improving visibility, and in many cases, R (red), G (green), and B (blue). ) And the like are arranged in a predetermined pattern, and an image having a desired color can be obtained by controlling the ratio of the amount of light passing through each colored layer. The reflective type or transflective type is a very important component in portable electronic devices in order to reduce power consumption or to ensure sufficient visibility even in extremely bright places such as outdoors in the daytime. It has become.

The above-described reflective or transflective liquid crystal display device is configured to reflect external light by a reflective layer so that the display can be visually recognized by the reflected light. The reflective surface of the reflective layer is, for example, a mirror surface. If it is in a state, a dazzle due to lighting or a reflection of the background may occur, causing deterioration of visibility. Therefore, a method of preventing the dazzling due to illumination and the reflection of the background while ensuring the brightness of the display by using a light scattering reflective surface having a fine uneven surface shape (rough surface) is generally used. (For example, refer to Patent Document 1 below).
JP 2003-75987 A

  However, in the conventional color liquid crystal display device, the light intensity of the display light emitted from the display screen has a viewing angle characteristic that varies depending on the emission angle, and the normal direction is higher than when viewed from the normal direction of the display screen. However, there is a problem in that the display quality when viewed from an oblique direction having an inclination is significantly deteriorated. The deterioration in display quality is caused mainly by the fact that the color of the color display image is greatly distorted when viewed from an oblique direction because the viewing angle characteristics vary greatly depending on the wavelength of the display light. In particular, when the color display image changes to an iridescent color by changing the viewing direction, a very uncomfortable feeling is given in situations where a plurality of persons are viewing a common liquid crystal display screen at the same time.

  Therefore, the present invention solves the above-described problems, and the problem is that, in a color filter substrate or an electro-optical device provided with a color filter and a reflective layer, display quality due to a change in visual characteristics depending on the wavelength of display light. It is an object of the present invention to provide a substrate or an electro-optical device that can suppress deterioration of the substrate.

  In view of such a situation, the present invention makes the light scattering characteristics different from each other in the reflection surface of the reflection layer in at least two reflection regions corresponding to the plurality of types of colored layers included in the color filter. It is intended to provide improved display quality.

  That is, the color filter substrate of the present invention includes a color filter including a plurality of types of colored layers having different hues on the substrate, and a reflective layer having a light-scattering reflective surface on the surface of the color filter. In the color filter substrate thus arranged, the reflection surface has a reflection region having different light scattering characteristics provided corresponding to at least two kinds of the colored layers.

  According to the present invention, the reflective surface is provided with reflective regions corresponding to at least two types of colored layers among the plurality of types of colored layers, and these reflective regions have different light scattering characteristics. Since it is possible to set the light scattering characteristics of the reflective surface for each color of the colored layer of the color filter, it is possible to adjust the visual characteristics for each color, so it is possible to improve the viewing angle characteristics of the color display image Become.

  In the present invention, among the reflective regions having different light scattering characteristics, one of the reflective regions has a convex-dispersed concavo-convex reflective surface shape in which a plurality of convex portions are distributed, and the other reflective region. It is preferable that the region has a concave-convex concave / convex reflective surface shape in which a plurality of concave portions are dispersedly arranged.

  According to this, in a reflection region having a convex-dispersed uneven reflection surface shape in which a plurality of convex portions are dispersedly arranged, light incident on the convex portion covers a wide scattering angle range around the convex portion. In contrast, in a reflective region having a concave-convex-type concave-convex reflective surface shape in which a plurality of concave portions are dispersedly arranged, light incident on the concave portion is scattered around the concave portion. The upper limit angle of the range is reduced, and light is scattered in a concentrated range of smaller scattering angles. This is because, in the concave dispersion type reflecting surface shape, the reflected light having a certain large scattering angle (that is, having a large emission angle) out of the light reflected by the inner surface of the concave portion cannot be directly emitted from the concave portion. It is. Such a limitation on the scattering angle is basically not found in the convex-dispersed reflective surface shape. Therefore, since the scattering angle distribution of the convex dispersion type reflection surface shape and the concave dispersion type reflection surface shape are greatly different, the light scattering characteristics can be clearly made different for each color layer of the color filter. Thus, it is possible to adjust the viewing angle characteristics for each color and to configure a display body having improved viewing angle characteristics as a whole.

  Here, the expression “convex part or concave part” refers to a schematic shape of the reflecting surface of each reflective region, and is not intended to limit the surface shape of the convex part and the concave part and the surrounding surface shape. For example, on a reflecting surface that actually has good light scattering properties, the convex portion and the concave portion have a smooth curved surface shape and are also smoothly connected to the surrounding surface. In addition, the convex-dispersed uneven reflective surface shape has a structure in which a plurality of island-shaped convex portions are dispersedly arranged on the reflective surface and the concave portions around the convex portions are connected to each other in a planar manner. Thus, the concave-convex concave / convex reflective surface shape has a structure in which a plurality of island-shaped concave portions are distributed on the reflective surface, and convex portions around the concave portions are connected to each other in a planar manner.

  Here, the color filter includes the colored layer of B (blue) as one of the plurality of types of colored layers, and the reflective region corresponding to the colored layer of B (blue) has another hue. It is preferable to have light scattering characteristics having a gentle scattering angle dependency as compared with the reflection region corresponding to the colored layer having the above. The light reflected by the reflective surface of the color filter substrate is emitted as light having different hues by passing through the colored layers of the color filter. At this time, when passing through another medium, particularly an electro-optical material such as liquid crystal, the viewing angle characteristic varies depending on the color due to the wavelength dispersion of the refractive index. This difference in viewing angle characteristics is particularly large in a large viewing angle range, so that when the display is viewed from an oblique direction, the color balance of the display image is lost, and the display quality is greatly impaired. Here, light in a short wavelength range such as B (blue) in the visible light region, when the viewing angle becomes larger than light in a long wavelength range such as R (red) or Y (yellow), the light intensity rapidly increases. May decrease. In such a situation, as in the present invention, the reflection region corresponding to the colored layer of B (blue) has a gentler scattering angle dependency than the reflection region corresponding to the colored layer having another hue. Since the reflected light that should pass through the colored layer of B (blue) is originally reflected in a wide scattering angle range by the reflective region, the above-mentioned B (blue) is narrow. The viewing angle characteristic can be compensated.

  In particular, the reflective region corresponding to the colored layer of B (blue) has the convex-dispersed uneven convex surface shape, and the reflective region corresponding to the colored layer having another hue is the concave-dispersed type It preferably has an uneven reflective surface shape. As described above, the convex-dispersed uneven reflective surface shape has a light scattering characteristic dispersed in a larger scattering angle range than the concave-dispersed uneven reflective surface shape, and therefore corresponds to a B (blue) colored layer. By forming the reflecting area to be a convex-dispersed reflecting surface shape, the narrow viewing angle characteristic of B (blue) light can be compensated and the viewing angle characteristic of other colored layers can be aligned.

  In the present invention, it is preferable that the reflective layer is formed on a base layer disposed on a side opposite to the reflective surface, and the reflective surface is configured to reflect the surface shape of the base layer. According to this, the surface shape of the base layer is formed in a shape corresponding to the light scattering reflective surface, and the reflective surface reflecting the surface shape is formed by forming the reflective layer on the base layer. By doing so, a reflecting surface having desired light scattering characteristics can be easily formed. Here, as long as the underlying layer has a surface shape corresponding to the required reflective surface shape, other conditions such as optical characteristics are not necessary, and thus a material that easily forms the required surface shape can be easily obtained. Can be selected. The material constituting the underlayer is preferably a resin material in terms of good workability. For example, it is possible to use a photosensitive resin having a concavo-convex surface shape formed by exposing and developing a photosensitive resin with a predetermined mask pattern.

  Next, the method for manufacturing a color filter substrate of the present invention includes a step of forming a color filter including a plurality of types of colored layers having different hues on the substrate, and light scattering on the surface of the color filter on the substrate. A step of forming a reflective layer having a reflective surface, wherein the step of forming the reflective layer comprises forming a base layer having a light-scattering uneven surface. And a reflective layer forming step of forming a reflective layer having the reflective surface reflecting the surface shape on the uneven surface of the base layer, and in the base layer forming step, at least 2 of the photosensitive resin. The regions corresponding to the types of the colored layers are exposed using different mask patterns and developed to provide surface shapes having different light scattering characteristics in the regions, respectively. To.

  In this case, the mask pattern used for one of the regions has a plurality of island-shaped light transmission portions dispersed in the light shielding portion, and the mask pattern used for the other region has a plurality of island-shaped lights. It is preferable that the shielding part is dispersedly arranged in the light transmission part. Thereby, a region having a convex-dispersed uneven surface shape in which a plurality of convex portions are dispersedly arranged on the surface of the photosensitive resin, and a region having a concave-dispersed uneven surface shape in which a plurality of concave portions are dispersedly arranged. Can be formed. Here, in particular, by using proximity exposure in which exposure is performed by appropriately setting an exposure gap between the mask and the photosensitive resin, the convex and concave surface shapes of the convex portions and concave portions are smoothly curved due to the light diffraction effect. Since it can be made into a shape, it is possible to give preferable light dispersion characteristics to the reflecting surface constituted by the reflecting layer formed thereon. In this exposure step, stepper exposure using a stepper exposure machine can also be performed.

  Next, an electro-optical device according to the present invention includes an electro-optical layer, a color filter including a plurality of types of colored layers having different hues, the electro-optical layer, and the color filter disposed behind the electro-optical layer. And an electro-optical device having a reflective layer having a light-scattering reflective surface on the surface on the color filter side, the reflective surfaces differing from each other provided corresponding to at least two types of the colored layers. It has a reflective region with light scattering characteristics.

  According to this, the reflective surface is provided with reflective regions corresponding to at least two types of colored layers among the plurality of types of colored layers, and these reflective regions have different light scattering characteristics, thereby providing color Since the light scattering characteristic of the reflecting surface can be set for each color of the colored layer of the filter, the viewing angle characteristic of the color display image can be improved, and an electro-optical device having high display quality can be configured.

  In the present invention, among the reflective regions having different light scattering characteristics, one of the reflective regions has a convex-dispersed concavo-convex reflective surface shape in which a plurality of convex portions are distributed, and the other reflective region. It is preferable that the region has a concave-convex concave / convex reflective surface shape in which a plurality of concave portions are dispersedly arranged.

  According to this, in a reflection region having a convex-dispersed uneven reflection surface shape in which a plurality of convex portions are dispersedly arranged, light incident on the convex portion covers a wide scattering angle range around the convex portion. In contrast, in a reflective region having a concave-convex-type concave-convex reflective surface shape in which a plurality of concave portions are dispersedly arranged, light incident on the concave portion is scattered around the concave portion. The upper limit angle of the range is reduced, and light is scattered in a concentrated range of smaller scattering angles. Therefore, since the scattering angle distribution of the convex dispersion type reflection surface shape and the concave dispersion type reflection surface shape are greatly different, the light scattering characteristics can be clearly made different for each color layer of the color filter. Thus, it is possible to adjust the viewing angle characteristics for each color and to configure a display body having improved viewing angle characteristics as a whole.

  Further, it is preferable that the reflective layer is formed on a base layer disposed on the side opposite to the reflective surface, and the reflective surface is configured to reflect the surface shape of the base layer. According to this, the surface shape of the base layer is formed in a shape corresponding to the light scattering reflective surface, and the reflective surface reflecting the surface shape is formed by forming the reflective layer on the base layer. By doing so, a reflecting surface having desired light scattering characteristics can be easily formed.

  Here, the color filter includes the colored layer of B (blue) as one of the plurality of types of colored layers, and the reflective region corresponding to the colored layer of B (blue) has another hue. It is preferable to have light scattering characteristics having a gentle scattering angle dependency as compared with the reflection region corresponding to the colored layer having the above.

  Next, an electro-optical device manufacturing method according to the present invention is disposed behind an electro-optical layer, a color filter including a plurality of types of colored layers having different hues, and the electro-optical layer and the color filter. In the method of manufacturing an electro-optical device having the electro-optical layer and a reflective layer having a light-scattering reflective surface on the surface on the color filter side, the step of forming the reflective layer includes a light-scattering uneven surface. A base layer forming step for forming the base layer, and a reflective layer forming step for forming a reflective layer having the reflective surface reflecting the surface shape on the irregular surface of the base layer, In the formation stage, the areas corresponding to at least two kinds of the colored layers of the photosensitive resin are exposed using different mask patterns and developed, whereby the areas having different light scattering characteristics are displayed on the areas. And providing a shape.

  In this case, the mask pattern used for one of the regions has a plurality of island-shaped light transmission portions dispersed in the light shielding portion, and the mask pattern used for the other region has a plurality of island-shaped lights. It is preferable that the shielding part is dispersedly arranged in the light transmission part.

  Furthermore, an electronic apparatus according to the invention includes any one of the electro-optical devices described above and a control unit that controls the electro-optical device. Since the electronic device of the present invention includes an electro-optical device including a color filter and a reflective layer, the electronic device is preferably a portable electronic device such as a mobile phone, a portable information terminal, a portable computer, and an electronic wristwatch. In particular, a portable electronic device has advantages such as low power consumption and excellent visibility in a bright place because it is a reflective or transflective electro-optical device. In addition, since there are relatively many opportunities for the portable device to be viewed obliquely with respect to the display screen, it is extremely advantageous that the viewing angle characteristics can be improved by the present invention.

  Next, embodiments according to the present invention will be described with reference to the accompanying drawings.

[First Embodiment: Color Filter Substrate and Manufacturing Method Thereof]
(Substrate Structure) FIG. 1 shows the structure of a color filter substrate 10 according to the present invention, FIG. 1 (a) is a plan view of a reflective layer, and FIG. 1 (b) is a longitudinal sectional view of the color filter substrate 10. It is. Here, FIG. 1 shows only a plurality of pixel regions constituting one pixel. The actual color filter substrate 10 has a plurality of pixels arranged in a predetermined pattern vertically and horizontally.

  In the illustrated example, three color pixels of R (red), G (green), and B (blue) constitute one pixel, and these pixels are arranged in a stripe arrangement. This stripe arrangement refers to a pattern form arranged in a matrix so that pixels of the same color are arranged in the vertical direction in the figure. Actually, a known delta arrangement (a pattern aspect in which three pixels are adjacently arranged in a Δ shape to form one pixel) or a diagonal mosaic arrangement (a pattern aspect in which pixels of the same color are arranged diagonally in a matrix) are used. It can also be adopted.

  In the color filter substrate 10, a base layer 12 is formed of a resin or the like on a substrate 11 made of glass or plastic, and a reflective layer 13 is formed on the base layer 12 using a metal film or the like. On the reflective layer 13, a color filter 14 in which colored layers (filter elements) 14R, 14G, and 14B exhibiting a plurality of types of hues are arranged is formed. Here, the color filter 14 may be formed with a transparent protective film (for example, made of an acrylic resin) for protecting each colored layer, as will be described later. In the illustrated example, the colored layer 14R is made of a red transmission filter material, the colored layer 14G is made of a green transmission filter material, and the colored layer 14B is made of a blue transmission filter material. Each of these transmission filter materials is obtained by dispersing a colorant composed of a pigment or a dye in a transparent resin.

  The surface of the reflective layer 13 on the color filter 14 side is a reflective surface 13a. On the reflective surface 13a, a reflective region 13R is formed as a region corresponding to the colored layers 14R, 14G, and 14B (a region overlapping in plan view). , 13G, 13B are set. These reflection regions 13R, 13G, and 13B are virtually set, and a clear boundary line does not actually exist. Here, the reflective region 13B has a convex-dispersed uneven reflective surface shape in which a plurality of convex portions 13ap are dispersedly arranged. The reflection regions 13R and 13G have a concave-convex uneven projection surface shape in which a plurality of concave portions 13aq are dispersedly arranged. The surfaces of the convex portions 13ap and the concave portions 13aq are actually configured as smooth convex curved surfaces or concave curved surfaces. The convex portion 13ap and the concave portion 13aq are preferably about 6 to 15 μm in diameter. If it falls below this range, the controllability at the time of manufacturing the concavo-convex shape deteriorates.

  In the present embodiment, the reflective region 13B is provided with a convex-dispersed uneven reflective surface shape, and the reflective regions 13R and 13G are provided with a concave-dispersed reflective surface shape. As a result, light scattering characteristics of B (blue) reflected light obtained by reflecting light incident from the observation side (that is, the color filter 14 side; upper side in the drawing) by the reflection region 13B, for example, the scattering angle dependency of the light scattering intensity. Is different from the light scattering characteristics of the reflected light of R (red) color or G (green) color reflected by the reflective regions 13R, 13G. For this reason, for example, when a medium having a wavelength dispersion (transparent plate, liquid crystal layer or other electro-optical material layer, polarizing plate, etc.) is arranged on the observation side, the variation in viewing angle characteristics due to the wavelength caused by the wavelength dispersion is reduced. It becomes possible to compensate.

  The color filter substrate 10 has a structure in which the reflective layer 13 and the color filter 14 are sequentially laminated on the substrate 11. However, the color filter 14 is formed on the substrate 11, and then the reflective layer 13 is formed. It may be formed. Alternatively, the reflective layer 13 may be formed on one surface of the substrate 11 and the color filter 14 may be formed on the other surface. In either case, the color filter side surface of the reflective layer 13 is used as the reflective surface.

  (Manufacturing method) Next, with reference to FIG. 2 thru | or FIG. 4, the manufacturing method of said color filter substrate 10 is demonstrated.

  First, as shown in FIG. 3A, a photosensitive resin 12A is applied to the surface of a substrate 11 made of glass, plastic, or the like by a spin coating method, a roll coater method, or the like. In the present embodiment, the photosensitive resin 12A is a positive photosensitive resin such as a light-dissolving type, and is preferably an acrylic resin, for example. However, a negative type photosensitive resin such as a photo-curing type may be used.

  Next, as shown in FIG. 3B, the photosensitive resin 12 </ b> A is exposed using a mask 102. Here, the mask 102 is obtained by forming a light shielding layer 102K composed of a thin film such as Cr on the surface of a transparent substrate 102A such as glass. In the mask 102, a portion not covered with the light shielding layer 102K serves as a light transmission portion 102x, and a portion covered with the light shielding layer 102K serves as a light shielding portion 102y. The light transmitted through the light transmitting portion 102x is irradiated to the photosensitive resin 12A.

  As shown in FIG. 2A, the mask 102 has pixel corresponding regions 102P corresponding to one pixel of the color filter substrate 10 arranged vertically and horizontally. In the pixel corresponding region 102P, the colored layers 14R, 14G, 14B of the color filter 14 of the color filter substrate 10 or the pixel corresponding regions 102R, 102G, 102B corresponding to the reflective regions 13R, 13G, 13B are set. The In each of the pixel corresponding regions 102R, 102G, and 102B, a large number of island-shaped light transmitting portions 102xa or light shielding portions 102ya are randomly distributed. That is, in the pixel corresponding region 102B, a large number of island-shaped light shielding portions 102ya are dispersedly arranged, and the periphery of each light shielding portion 102ya is a light transmitting portion 102x. The light shielding part 102ya is constituted by an island-shaped light shielding layer 102K. In addition, in the pixel corresponding regions 102R and 102G, a large number of island-shaped light transmission portions 102xa are dispersedly arranged, and the periphery of each light transmission portion 102xa is a light shielding portion 102y. The light transmitting portion 102xa is configured by the opening of the light shielding layer 102K.

  The shape of the island-shaped light transmitting portion 102xa or the light shielding portion 102ya is not particularly limited, such as a circle, an ellipse, an oval, a polygon, and the like. ) Is preferable. This is because such a shape does not have a bias in a specific direction, so that uniform optical characteristics can be easily obtained, and mask processing becomes easy. However, when the orientation dependency of the scattering characteristics is required, the shape of the light transmitting portion 102xa or the light shielding portion 102ya may be a shape extended in a predetermined direction.

  In the pixel corresponding region 102B, the circle-converted diameter (diameter of the circle with the same area) of the light shielding portion 102ya of the mask 102 is preferably in the range of 6 to 12 μm, and the aperture ratio is about 60 to 70%. . In the pixel corresponding regions 102R and 102G, the light-transmitting portion 102xa preferably has a circle-equivalent diameter of about 9 to 12 μm and an aperture ratio of about 30 to 40%. The exposure gap G at this time is desirably about 60 to 150 μm. Furthermore, the exposure intensity is preferably about 30 to 100 mJ. In this exposure intensity, the thickness of the photosensitive resin 12A is preferably 1.5 μm or more, and particularly preferably 2.0 μm or more.

  In this embodiment, as shown in FIG. 2, the pixel corresponding regions 102R and 102G and the pixel corresponding region 102B are exposed together by one mask 102, but the pixel corresponding regions 102R and 102G and the pixel corresponding regions are exposed. The region 102B may be exposed with separate masks. The exposure gap G at this time is desirably about 60 to 100 μm in the pixel corresponding region 102B and about 100 to 250 μm in the pixel corresponding regions 102R and 102G. The exposure intensity in the pixel corresponding region 102B is about 30 to 40 mJ, and the pixel corresponding regions 102R and 102G are about 60 to 100 mJ.

  If the diameter of the island-shaped light transmitting portion 102xa or the light shielding portion 102ya is too small, it becomes difficult to form a concave portion or a convex portion due to the light diffraction effect, and the surface of the base layer 12 after development becomes gentle as a whole. The regular reflection light increases, and it becomes difficult to obtain sufficient light scattering property by the reflection surface when the reflection layer is formed. In addition, if the diameter of the island-shaped light transmitting portion 102xa or the light shielding portion 102ya is too large, it is difficult to obtain a smooth curved surface of the underlying layer due to the light diffraction effect, and the flat portion of the reflecting surface increases. Regular reflection light increases and it becomes difficult to obtain sufficient light scattering properties.

  The exposure gap G determines the degree of the diffraction effect of light by proximity exposure. If the exposure gap G is too small, the diffraction effect is not easily reflected, and the flat portion of the underlying layer is relatively increased and reflected. The regular reflection light by the surface increases. If the exposure gap G is too large, the influence of the diffraction effect becomes strong, so that the surface of the underlayer becomes smooth as a whole, and regular reflection light by the reflection surface also increases.

  In this exposure process, an ultra-high pressure mercury lamp is used as a light source. The light of this lamp is mainly composed of three types of wavelengths (365 nm i-line, 405 nm h-line, 436 nm g-line). In the present embodiment, the sensitivity distribution of the photosensitive resin 12A has the highest sensitivity to i-line with a wavelength of 365 nm. Therefore, in this exposure step, the photosensitive resin 12A is substantially exposed with i-line (wavelength 365 nm).

  In the case of the present embodiment, the pixel-corresponding regions 102R and 102G are adjusted by adjusting the circle-converted diameter and the exposure gap G of the island-shaped light transmitting portion 102xa, and the pixel-corresponding region 102B is the island-shaped region. By adjusting the circle-equivalent diameter and exposure gap G of the light shielding portion 102ya, the exposure intensity distribution along the surface of the photosensitive resin 12A, particularly the surface region corresponding to the light transmitting portion 102xa or the light shielding portion 102ya and the vicinity thereof. The exposure intensity distribution is set so as to smoothly increase and decrease, and exposure is performed in this state.

  Next, by developing the photosensitive resin 12A with a predetermined developer, as shown in FIG. 3C, the region corresponding to the light transmitting portion 102x of the mask 102 and the light shielding portion 102y are supported. An uneven step is formed between the region. In the development process, an amount of resin corresponding to the exposure intensity distribution is removed from the surface of the photosensitive resin 12A. As a result, as shown in the drawing, the underlayer 12 having a relatively gentle surface irregularity shape 12a is obtained.

  The surface irregularity shape 12a has a mode in which island-shaped concave portions corresponding to the island-shaped light transmission portions 102xa are dispersedly arranged in the pixel corresponding regions 102R and 102G. Further, the pixel corresponding region 102B has an aspect in which island-shaped convex portions corresponding to the island-shaped light shielding portions 120ya are dispersedly arranged.

  Next, a thin film of metal such as aluminum, silver, a silver alloy (APC alloy, etc.), chromium or the like is formed on the surface of the base layer 12 configured as described above to form the reflective layer 13. The reflective layer 13 is provided with a reflective surface having a concavo-convex shape reflecting the surface concavo-convex shape 12a by forming the surface concavo-convex shape 12a on the surface of the base layer 12 serving as the base surface. Therefore, the reflective surface 13a of the reflective layer 13 has a mode in which island-shaped concave portions corresponding to the surface uneven shape 12a are dispersedly arranged, that is, a concave-convex-type uneven reflective surface shape (in the case of the pixel corresponding regions 102R and 102G), Alternatively, it has an aspect in which island-shaped convex portions are dispersedly arranged, that is, a convex portion-dispersed uneven reflective surface shape (in the case of the pixel corresponding region 102B).

  In this way, a reflective substrate including the reflective layer 13 is formed. On this, the color filter substrate 10 is formed by forming the colored layers 14R, 14G, and 14B as shown in FIG. The colored layers 14R, 14G, and 14B are repeatedly formed one color at a time by, for example, applying a photosensitive resin in which a coloring material such as a pigment is dispersed in a transparent resin base material, and performing exposure and development.

  By the way, the color filter substrate 10 has the reflective layer 13 formed entirely in each pixel on the substrate 11. For example, when a transflective liquid crystal display is formed, each pixel is formed. It is necessary to configure a transflective substrate having a light transmission region therein. In this case, as shown in FIG. 4A, a mask 13A made of a resist or the like is formed on the surface of the reflective layer 13 by a normal photolithography method. The mask 13A is provided with an opening 13Ax in a region where the reflective layer 13 is unnecessary. Then, by performing etching using this mask 13A, as shown in FIG. 4B, a reflective layer 13 having an opening 13b is formed. In this way, a transflective reflective substrate 10 'is formed. By forming a color filter 14 similar to that shown in FIG. 1 on the transflective reflective substrate 10 ', a transflective color filter substrate is obtained.

  Further, in the etching step, the reflective layer 13 and the base layer 12 are removed together, so that the opening 13b of the reflective layer 13 and the opening 12b of the base layer 12 are mutually connected as shown in FIG. A reflective substrate 10 ″ provided at a position overlapping the surface of the substrate may be formed. In addition, an opening 12b is provided at the stage of forming the base layer 12, and reflection is performed so as to overlap the opening 12b. You may make it provide the opening part 13b of the layer 13. In the case of this reflective substrate 10 '', since the opening part 12b is formed in the base layer 12, the transmission which passes the opening part 13b of the reflective layer 13 is carried out. Since light does not pass through the underlayer 12, it is possible to avoid slight coloring of the underlayer 12 and the influence on the transmitted light due to the scattering or refraction action caused by the surface irregularity shape 12a of the underlayer 12.It is to be noted that a transflective color filter substrate can be formed by forming the color filter 14 shown in FIG. 1 also on the reflective substrate 10 ″.

  As shown in FIG. 1, the color filter substrate 10 has a concave-convex concave / convex reflective surface shape in which a large number of concave portions are dispersedly arranged in the reflective regions 13R and 13G, and a large number of convex portions in the reflective region 13B. Has a convex-dispersed reflective surface shape in which are distributed. In general, in the concave-dispersed reflective surface shape, when the emission angle of the light reflected by the inner surface of the concave portion increases, it becomes impossible to directly go outside from the concave portion, and the smaller inner surface portion reflected by the other inner surface portion of the concave portion Since the light is scattered in the form of an angle, the light scattering characteristics are as shown in FIG. 12A. As shown by A in FIG. 12, the scattered light intensity is large in the range where the scattering angle is small, but the scattered light intensity decreases as the scattering angle increases. . On the other hand, in the convex-dispersed concave-convex reflective surface shape, the light reflected on the surface of the convex part is basically emitted as it is, and therefore tends to be emitted more uniformly over a wider range of scattering angles. As a result, as shown by B in FIG. 12, the scattering angle dependence of the scattered light intensity is further relaxed as compared with A of the concave-convex-type uneven reflection surface shape.

  Therefore, the convex dispersion type uneven reflection surface shape can substantially reflect light in a wider scattering angle range than the concave dispersion type uneven reflection surface shape, so that light is generated for each color generated by the color filter 14. It is possible to greatly change the viewing angle characteristics. In this embodiment, by flattening the viewing angle characteristic of B (blue) light with respect to the viewing angle, it is possible to make it difficult to reduce the intensity of the B (blue) light component even when the viewing angle increases. . Thereby, for example, by applying to a display body such as a liquid crystal display body having such a characteristic that the light intensity of B (blue) rapidly decreases as the viewing angle increases, B (blue) in a range where the viewing angle is large. The effect of suppressing the decrease in the light intensity is obtained.

  In the above-described embodiment, the light scattering characteristics for the light of R (red) and G (green), and the B (blue) Although light scattering characteristics for light are different from each other, for example, by changing the height of the concave part or convex part, the angle of the concave surface of the concave part or convex part, etc. The characteristics can be changed. In this case, a slight difference in light scattering characteristics can be set for each color.

  In the above embodiment, the light scattering characteristics of the reflective regions 13R and 13G and the reflective region 13B are different from each other, but may be configured to be different from each other in other combinations. For example, the reflection region 13R and the reflection regions 13G and 13B may be different from each other, or all the three reflection regions 13R, 13G, and 13B may have different light scattering characteristics. . These modes are appropriately set according to the desired display mode of each color.

  FIG. 13 is an explanatory view schematically showing a state in which a plurality of color filter substrates 10 are formed on one mother substrate 110 in the above manufacturing process. The mother substrate 110 includes a plurality of regions to be the substrates 11, and the mask 102 is provided with a plurality of mask unit regions 102S corresponding to the plurality of regions. Each mask unit region 102S is formed corresponding to a region to be the substrate 11, and the plurality of pixel corresponding regions 102P are arranged in a predetermined pattern therein. By exposing the photosensitive resin 12A using the mask 102, the photosensitive resin 12A on the region to be the substrate 11 corresponding to each mask unit region 102S is exposed. After that, by exposing again using the mask 103 having the light shielding region 103x that covers the region exposed in each mask unit region 102S, a portion other than the region to be the substrate 11 is exposed. Finally, by developing the exposed photosensitive resin 12 </ b> A, a base layer 12 having a concavo-convex surface shape corresponding to the exposure state using the mask 102 is formed in the region to be the substrate 11, thereby forming the substrate 11. The photosensitive resin 12 </ b> A is completely removed by the mask 103 outside the power region.

  In addition, the formation method of the reflection layer 13 is not restricted to the said method, It can also carry out by another method. Another method is shown in FIG. 10 and FIG. In this method, a photosensitive resin 12A having a thickness of 1.6 μm is applied on the substrate 11 as shown in FIG. 10A, and then the photosensitive resin 12A is coated with a mask 104 as shown in FIG. Perform exposure. Here, the mask 104 is obtained by forming a light-shielding layer 104B on a transparent substrate 104A, and a light transmitting portion 104x is appropriately arranged in the same manner as the mask 102. After the exposure using the mask 104, development is performed to form the first underlayer 12B having an uneven surface shape.

  Next, as shown in FIG. 10D, a photosensitive resin 12C is further applied to the thickness of 1.3 μm on the first base layer 12B, and then transparent as shown in FIG. Using the mask 105 having the substrate 105A and the light shielding layer 105B, only the region other than the region to be the substrate 11 shown in FIG. 13 is exposed, and the region to be the substrate 11 is developed without being exposed. Then, by firing the base layer, as shown in FIG. 11 (b), a smooth surface uneven shape substantially the same as that of the above embodiment is obtained by the two-layer structure of the first base layer 12B and the second base layer 12D. Is obtained.

  Thereafter, as shown in FIG. 11C, the reflective layer 13 was formed of aluminum or the like on the surface of the second base layer 12D. Further, a resist 13C having an opening 13Ca is formed thereon and etching is performed. As shown in FIG. 11D, an opening 13b is provided in the reflective layer 13, thereby providing a transflective reflective substrate. Can be obtained.

  Also in the color filter substrate using the reflective substrate formed as described above, the light scattering property of the reflection region set for each color of the color filter is made different from each other as in the above embodiment. The same effect can be obtained.

  In the above embodiment, the diameter of the light transmitting portion of the mask 102 and the range of the exposure gap are obtained on the assumption of the exposure wavelength λ (= 365 nm) in the exposure process. However, even if light having a wavelength λ in the range of 300 to 450 nm, generally called the ultraviolet region, is used, the same result as above can be obtained. That is, since the range (9 to 12 μm) of the circle-converted diameter of the light transmission part in the above embodiment is about 25 to 33 times the exposure wavelength λ (= 365 nm), the exposure is performed in the wavelength range of 300 to 450 nm. Even if the wavelength is changed, the diffraction effect is hardly changed, and the range of the exposure gap G (150 to 250 μm) in the above embodiment is about 400 to 700 times the exposure wavelength λ, and therefore the wavelength range of 300 to 450 nm. This is because the extent of the spread of the diffracted light hardly changes even when the exposure wavelength is changed.

  The aperture ratio of the mask 102 is usually preferably about 20 to 40% when island-like light transmission portions are dispersed. If the aperture ratio is less than the lower limit of the above range, the distance between the island-like light transmitting portions is increased, and the area of the flat portion on the surface of the base layer is increased, and a reflective surface with much regular reflection is formed. Further, when the aperture ratio exceeds the above range, the interval between adjacent island-shaped light transmission portions becomes small, so that the concave portions formed on the surface of the underlayer are easily connected to each other. It increases, and a reflective surface with many regular reflections will be formed.

  On the other hand, when the island-shaped light shielding portions are dispersed, the aperture ratio is preferably 60 to 80%. When the aperture ratio exceeds the above range, the distance between the island-shaped light shielding portions is increased, so that the area of the flat portion on the surface of the base layer is increased, and a reflection surface with much regular reflection is formed. Further, when the aperture ratio is below the above range, the interval between adjacent island-shaped light shielding portions becomes small, so that the concave portions formed on the surface of the underlayer are easily connected, and as a result, the area of the flat portion is also reduced. It increases, and a reflective surface with many regular reflections will be formed.

  Furthermore, the exposure amount is preferably about 30 to 90 mJ when the thickness of the photosensitive resin 12A is about 1.5 to 3.0 μm. This exposure amount is the maximum exposure amount (exposure amount at the center position of the light transmitting portion) determined by the size of the light transmitting portion and the exposure gap (so that the remaining film amount is 5 to 20%). It is desirable to adjust to the extent. When all the photosensitive resin is removed by the maximum exposure amount, the substrate surface is exposed at the bottom of the recess formed in the underlayer, and the reflection surface portion formed on the exposed substrate surface is This is because it becomes flat and causes regular reflection.

Second Embodiment: Electro-Optical Device
Next, a configuration of an electro-optical device using the color filter substrate formed by the above-described method for manufacturing a color filter substrate and a method for manufacturing the same will be described using the liquid crystal display device 200 shown in FIG. 5 as an example. FIG. 5 is a schematic perspective view showing the appearance of the liquid crystal display device 200 formed by the embodiment of the electro-optical device and the manufacturing method thereof according to the present invention, and FIG. 6A is a schematic view of the liquid crystal display device 200. FIG. 6B is a schematic sectional view, and FIG. 6B is an enlarged partial plan view of the color filter substrate 210 constituting the liquid crystal display device 200. Although only the liquid crystal panel portion having a so-called reflective transflective passive matrix structure is shown in the figure, in the actually configured liquid crystal display device, a backlight (not shown) is provided for the portion shown in the drawing as needed. A lighting device such as a front light or a case body is appropriately attached.

  As shown in FIG. 5, the liquid crystal display device 200 includes a color filter substrate 210 having a transparent first substrate 211 made of a glass plate, a synthetic resin plate, or the like as a base, and a similar second substrate 221 facing the base. The counter substrate 220 is bonded to each other through the sealant 230, and after the liquid crystal 232 is injected into the sealant 230 from the injection port 230a, the cell structure is formed by sealing with the sealant 231. The

  A plurality of parallel striped transparent electrodes 216 are formed on the inner surface of the first substrate 211 (the surface facing the second substrate 221) by sputtering or the like, and a plurality of parallel striped electrodes are formed on the inner surface of the second substrate 221. The transparent electrode 222 is formed by the same method. The transparent electrode 216 is conductively connected to the wiring 218 </ b> A, and the transparent electrode 222 is conductively connected to the wiring 228. The transparent electrode 216 and the transparent electrode 222 are orthogonal to each other, and the intersection region thereof constitutes a large number of pixels arranged in a matrix, and these pixel arrangements constitute a liquid crystal display region A.

  The first substrate 211 has a substrate overhanging portion 210T that projects outward from the outer shape of the second substrate 221, and the sealing material 230 is provided on the substrate overhanging portion 210T with respect to the wiring 218A and the wiring 228. A wiring 218 </ b> B that is conductively connected through a vertical conduction portion constituted by a part of the wiring pattern and an input terminal portion 219 including a plurality of wiring patterns formed independently are formed. A semiconductor IC 261 with a built-in liquid crystal driving circuit and the like is mounted on the substrate extension portion 210T so as to be conductively connected to the wirings 218A and 218B and the input terminal portion 219. A flexible wiring board 263 is mounted on the end portion of the board overhanging portion 210T so as to be conductively connected to the input terminal portion 219.

  In this liquid crystal display device 200, as shown in FIG. 6, a retardation plate (¼ wavelength plate) 240 and a polarizing plate 241 are disposed on the outer surface of the first substrate 211, and a position is disposed on the outer surface of the second substrate 221. A phase difference plate (¼ wavelength plate) 250 and a polarizing plate 251 are arranged.

<Detailed structure of color filter substrate 210 and counter substrate 220>
Next, the detailed structure of the color filter substrate 210 and the counter substrate 220 will be described with reference to FIGS.

  In the reflective substrate 210, a transparent base layer 219 is formed on the surface of the first substrate 211. A reflective layer 212 is formed on the base layer 219, and an opening 212a is provided for each pixel. Of the reflective layer 212, a portion other than the opening 212a is a reflective portion 212b that substantially reflects light. In the present embodiment, a reflective layer 212 having an opening 212a and a reflective portion 212b is formed for each pixel. However, the reflective layer 212 may be integrally formed in the entire liquid crystal display region A, and only the opening 212a may be formed for each pixel.

  The base layer 219 and the reflective layer 212 correspond to the base layer 12 and the reflective layer 13 configured by the reflective substrate manufacturing method, and are formed by the same manufacturing method as described above. Therefore, description of the manufacturing method of this part is omitted. The structure of the reflective substrate 210 shown in FIG. 6 corresponds to the reflective substrate 10 ′. That is, not only the opening 212a is formed in the reflective layer 212, but also an opening is provided in the underlying layer 219 below the reflective layer 212 at a position overlapping the opening 212a.

  A colored layer 214 is formed on the reflective layer 212, and a surface protective layer (overcoat layer) 215 made of a transparent resin or the like is further formed thereon. The colored layer 214 and the surface protective layer 215 constitute a color filter.

  The colored layer 214 usually has a predetermined color tone by dispersing a coloring material such as a pigment or a dye in a transparent resin. An example of the color tone of the colored layer is a primary color filter composed of a combination of three colors of R (red), G (green), and B (blue), but is not limited to this. Can be formed in various colors. Usually, a colored resist having a predetermined color pattern is formed by applying a colored resist made of a photosensitive resin containing a coloring material such as a pigment or a dye on the surface of the substrate and removing unnecessary portions by a photolithography method. Here, the above process is repeated when forming a colored layer of a plurality of tones.

  As the arrangement pattern of the colored layers, a stripe arrangement is adopted in the illustrated example shown in FIG. 6B, but various pattern shapes such as a delta arrangement and a diagonal mosaic arrangement are adopted in addition to the stripe arrangement. be able to. In addition, a light-shielding film (black matrix or black mask) for shielding light in the inter-pixel region can be formed around each of the RGB colored layers as part of the colored layer.

  On the surface protective layer 215, a transparent electrode 216 made of a transparent conductor such as ITO (indium tin oxide) is formed by a sputtering method or the like. The transparent electrode 216 is formed in a strip shape extending in the illustrated vertical direction in FIG. 6B, and a plurality of transparent electrodes 216 are arranged in parallel with each other in a stripe shape. An alignment film 217 made of polyimide resin or the like is formed on the transparent electrode 216.

  In this embodiment, as shown in FIG. 6B, the colored layer 214 constituting the color filter overlaps in a plane so as to completely cover the opening 212a of the reflective layer 212 in each pixel. , And is integrally formed so as to project from the region overlapping the opening 212a to the periphery on the reflection portion 212b around the opening 212a.

  In addition, the colored layer 214 is not formed on each pixel, but is formed so as to overlap only a part of the reflective layer 212. That is, the reflective layer 212 includes a region that overlaps with the colored layer 214 in a plane (in the illustrated example, an inner peripheral region that faces the opening 212a) and a region that does not overlap with the colored layer 214 in a planar manner (an outer peripheral region in the illustrated example). Exists.

  In the present embodiment, the formation mode of the colored layer 214 is not limited to the above-described mode, and may be formed over the entire pixel. Moreover, you may comprise the part on the surface of the reflective layer 212, and the part on the opening part 212a with another filter material amount.

On the other hand, in the liquid crystal display device 200, on the counter substrate 220 facing the reflective substrate 210, a transparent electrode 222 similar to the above is formed on a second substrate 221 made of glass or the like, and on that, an SiO ₂ film is formed. A hard protective film 223 made of TiO ₂ or the like is formed. Further thereon, an alignment film 224 similar to the above is laminated.

  In this embodiment, the electro-optical device (liquid crystal display device) is configured using the color filter substrate 210, but one substrate is a reflective substrate having a reflective layer, and the color filter is formed on the counter substrate. It doesn't matter.

  In the color filter substrate 210 of the present embodiment, one uniform colored layer 214 (for example, any one of R, G, and B) is formed for each pixel, and each colored layer has an opening 212a. It is formed across the light transmission region and the light reflection region where the reflection layer 212 is formed. However, separate colored layers may be formed in the light transmission region and the light reflection region. FIG. 7 shows a modification of the second embodiment formed as described above. Here, the same parts as those of the second embodiment are denoted by the same reference numerals, and the description thereof is omitted.

  In the color filter substrate 210, the colored layer 214 provided for each pixel includes a dark color portion 214c having a high light density and a light color portion 214d having a light density lower than that of the dark color portion 214c. 214c is arranged so as to overlap at least the light transmission region in a plane. Here, the light density refers to the ability per unit thickness of the colored layer to bias the wavelength distribution of light. If the light density is high (if it is large), the saturation of the transmitted light (coloriness) becomes strong, and the light density If it is low (small), the saturation of the transmitted light will be weak. When the colored layer contains a colorant such as a pigment or a dye, the light density usually has a positive correlation with the amount of the colorant. Specific parameters having a correlation with the concept of color density include, for example, the Y value of the XYZ color system and the L * value of the Lab color system corresponding to the luminous transmittance or brightness, that is, the visible light region (for example, Integral value of spectral transmittance in a light wavelength range of 380 nm to 780 nm can be used. The Y value and L * value have a negative correlation (for example, an inversely proportional relationship) with the color density. Therefore, the Y value and L * value of the dark color portion are smaller than the Y value and L * value of the light color portion.

  More specifically, in the case of this configuration example, a dark color portion 214c is formed in the light transmission region constituted by the opening 212a, and a light color portion 214d is formed in the light reflection region constituted by the reflection layer 212. ing. Here, in the illustrated example, the dark color portion 214c and the light color portion 214d are configured not to overlap each other. However, the dark color portion 214c and the light color portion 214d may be configured to partially overlap each other in the boundary region. In any case, in the light transmissive region, light that passes through the colored layer only once becomes display light, and in the light reflective region, light that passes through the colored layer twice back and forth becomes display light. The difference in color of the type display can be reduced by providing the dark color portion 214c and the light color portion 214d for each pixel.

  Further, unlike the above, a thick portion may be formed in the colored layer in the light transmission region, and a thin portion may be formed in the light reflection region. Even in this case, the difference in color between the transmissive display and the reflective display can be reduced in the same manner as described above.

  The above configuration example can be basically manufactured by a method similar to the method for manufacturing the color filter substrate. However, a step of separately forming the dark color portion 214c and the light color portion 214d is necessary. For example, when forming colored layers of three colors of R, G, and B, a total of six steps (for example, steps including coating, exposure, and development stages when using a photolithography method) are performed. It is necessary to implement. This also applies to the case where a thick part and a thin part are formed. However, in this case, it is also possible to form the thick part and the thin part at the same time by one exposure / development process by changing the exposure amount between the light transmission region and the light reflection region.

[Third Embodiment: Electro-Optical Device]
Next, another electro-optical device having a structure different from the above will be described with reference to FIGS. The electro-optical device of this embodiment is an active matrix liquid crystal display device 300 including a reflective substrate 310. In the liquid crystal display device 300, a reflective substrate 310 and a counter substrate 320 opposite to the reflective substrate 310 are bonded together by a sealing material 330, and a liquid crystal 332 is sealed between the substrates. This embodiment is different from the second embodiment in that the color filter is formed not on the reflective substrate 310 but on the counter substrate 320.

  In the reflective substrate 310, on the inner surface of the substrate 311, as shown in FIG. 8, a pixel electrode 315 that also serves as a reflective layer is formed on a base layer 312 having a surface irregularity shape similar to the above base layer, An alignment film 316 is formed thereon. Further, on the inner surface of the reflective substrate 310, a plurality of scanning lines 313 indicated by dotted lines in FIG. 9 and data lines 314 having cross sections shown in FIGS. Is formed.

  Under the pixel electrode 315, a TFT (thin film transistor) 310T is formed as shown in FIG. In this TFT 310T, a semiconductor layer including a channel region 310c, a source region 310s, and a drain region 310d is formed, and the channel region 310c is disposed to face a gate electrode 310g that is conductively connected to the scanning line 313 through an insulating film. The source region 310s is conductively connected to the data line 314, and the drain region 310d is conductively connected to the pixel electrode 315. The TFT 310T is not limited to the illustrated configuration having an inverted stagger structure, and may have a structure in which a gate electrode is disposed on a channel layer, and has a known LDD (Lightly Doped Drain) structure. It may be adopted.

  As shown in FIG. 8, in the counter substrate 320, a counter electrode 322 made of a transparent conductor such as ITO is formed on the inner surface of the substrate 321, and an appropriate colored layer 323 is arranged in a predetermined arrangement on the counter electrode 322. A color filter similar to that of the first embodiment formed to be an aspect is configured, and an alignment film 324 is further formed thereon.

In the liquid crystal display device 300 configured as described above, the potential supplied by the data line 314 in the pixel selected by the scanning line 313 is supplied to the pixel electrode 315, and the pixel electrode 315 and the counter electrode 322 are between. The alignment state of the liquid crystal 332 changes in accordance with the electric field formed on the, and a desired image is formed.
However, the active matrix liquid crystal display device is not limited to the one using the TFT as a switching element as described above, and the present invention can be similarly applied to one using a TFD (thin film diode) as a switching element. .

  Similar to the reflective regions 13R, 13G, and 13B of the first embodiment, the pixel electrode 315 includes a reflective surface having different light scattering properties for each color of the colored layer constituting the color filter. That is, between two pixel electrodes 315 corresponding to two different colored layers 323, the light scattering properties of the reflecting surfaces thereof are different from each other.

  The electro-optical device of the present invention is not limited to a liquid crystal display device as shown in the illustrated example, but also an electroluminescence device, an organic electroluminescence device, a plasma display device, an electrophoretic display device, and a device using an electron-emitting device (Field The present invention can be similarly applied to various electro-optical devices such as Emission Display and Surface-Conduction Electron-Emitter Display.

[Fourth Embodiment: Electronic Device]
Finally, an embodiment of an electronic apparatus according to the present invention will be described with reference to FIGS. In this embodiment, an electronic apparatus including the electro-optical device (liquid crystal display device 200) as a display unit will be described. FIG. 14 is a schematic configuration diagram showing an overall configuration of a control system (display control system) for the liquid crystal display device 200 in the electronic apparatus of the present embodiment. The electronic device shown here includes a display control circuit 290 including a display information output source 291, a display information processing circuit 292, a power supply circuit 293, a timing generator 294, and a light source control circuit 295. The liquid crystal display device 200 similar to the above is provided with a drive circuit 200D for driving the liquid crystal panel 200P having the above-described configuration. The drive circuit 200D is configured by an electronic component (semiconductor IC 261) that is directly mounted on the liquid crystal panel 200P as described above. However, the drive circuit 200D may be a circuit pattern formed on the panel surface, or a semiconductor IC chip or a circuit pattern mounted on a circuit board conductively connected to the liquid crystal panel, in addition to the above-described aspect. Can be configured.

  The display information output source 291 includes a memory such as a ROM (Read Only Memory) or a RAM (Random Access Memory), a storage unit such as a magnetic recording disk or an optical recording disk, and a tuning circuit that tunes and outputs a digital image signal. The display information is supplied to the display information processing circuit 292 in the form of an image signal or the like of a predetermined format based on various clock signals generated by the timing generator 294.

  The display information processing circuit 292 includes various known circuits such as a serial-parallel conversion circuit, an amplification / inversion circuit, a rotation circuit, a gamma correction circuit, and a clamp circuit, and executes processing of input display information to obtain image information. Are supplied to the drive circuit 200D together with the clock signal CLK. The drive circuit 200D includes a scanning line drive circuit, a signal line drive circuit, and an inspection circuit. The power supply circuit 293 supplies a predetermined voltage to each of the above-described components.

  The light source control circuit 295 supplies power supplied from the power supply circuit 293 to the light source unit 110 of the lighting device 100 based on a control signal introduced from the outside. The light emitted from the light source unit 110 enters the light guide plate 120 and is irradiated from the light guide plate 120 to the liquid crystal panel 200P. The light source control circuit 295 controls lighting / non-lighting of each light source of the light source unit 110 according to the control signal. It is also possible to control the luminance of each light source.

  FIG. 15 shows an appearance of a mobile phone which is an embodiment of the electronic apparatus according to the invention. The electronic device 2000 includes an operation unit 2001 and a display unit 2002, and a circuit board 2100 is disposed inside the display unit 2002. The liquid crystal display device 200 is mounted on the circuit board 2100. The liquid crystal panel 200P is visible on the surface of the display unit 2002.

The enlarged partial top view (a) and enlarged partial longitudinal cross-sectional view (b) of the reflection layer in the color filter substrate of 1st Embodiment. The enlarged partial top view (a) and enlarged partial longitudinal cross-sectional view (b) which show the mask pattern used for the exposure process in the manufacturing method of the color filter substrate of 1st Embodiment. Process sectional drawing (a)-(d) which shows the manufacturing process of the color filter substrate of 1st Embodiment. Process sectional drawing (a)-(c) which shows the additional official residence in the case of manufacturing the modification of the color filter board | substrate of 1st Embodiment. FIG. 6 is an overall perspective view of an electro-optical device according to a second embodiment. The schematic sectional drawing (a) of 2nd Embodiment, and the enlarged partial top view (b) of a color filter substrate. The schematic sectional drawing (a) of the modification of 2nd Embodiment, and the expanded partial top view (b) of a color filter substrate. The schematic sectional drawing of 3rd Embodiment. The schematic partial expanded sectional view of 3rd Embodiment. Process sectional drawing (a)-(d) which shows the manufacturing method of a different reflective substrate. Process sectional drawing (a)-(d) which shows the manufacturing method of a different reflective substrate. The graph which compares and shows the light-scattering characteristic A of a recessed part dispersion | distribution type uneven | corrugated reflective surface shape, and the light-scattering characteristic B of a convex part dispersion | distribution uneven | corrugated reflective surface shape. Explanatory drawing for demonstrating the exposure process using a mother board | substrate. FIG. 10 is a schematic configuration diagram illustrating a display control system of an electronic apparatus including an electro-optical device according to a fourth embodiment. The schematic perspective view which shows the external appearance of the electronic device of 4th Embodiment.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 ... Color filter board | substrate, 11 ... Board | substrate, 12 ... Underlayer, 13 ... Reflection layer, 13a ... Reflection surface, 13R, 13G, 13B ... Reflection area | region, 14 ... Color filter, 14R, 14G, 14B ... Colored layer, 102 ... Mask, 102P: Pixel corresponding area, 102R, 102G, 102B: Pixel corresponding area, 200, 300: Liquid crystal display device

Claims (11)

In a color filter substrate in which a color filter including a plurality of types of colored layers having different hues on a substrate, and a reflective layer having a light-scattering reflective surface on the surface of the color filter are disposed.
The color filter substrate according to claim 1, wherein the reflective surface has reflective regions having different light scattering characteristics provided corresponding to at least two types of the colored layers.   Among the reflective regions having different light scattering characteristics, one of the reflective regions has a convex-dispersed uneven reflective surface shape in which a plurality of convex portions are dispersedly arranged, and the other reflective region has a plurality of reflective regions. The color filter substrate according to claim 1, wherein the color filter substrate has a concave-convex-dispersed concave-convex reflective surface shape in which concave portions are dispersedly arranged.   The reflective layer is formed on a base layer disposed on a side opposite to the reflective surface, and the reflective surface is configured to reflect a surface shape of the base layer. 2. The color filter substrate according to 2. Forming a color filter including a plurality of types of colored layers having different hues on the substrate; forming a reflective layer having a light-scattering reflective surface on the surface of the color filter on the substrate; and In the manufacturing method of the color filter substrate having
The step of forming the reflective layer includes a base layer forming step of forming a base layer having a light-scattering uneven surface, and a reflection having the reflective surface reflecting the surface shape on the uneven surface of the base layer. A reflective layer forming step to form a layer,
In the base layer forming step, the regions corresponding to at least two types of the colored layers of the photosensitive resin are exposed using different mask patterns and developed, whereby the regions have different light scattering characteristics. A method of manufacturing a color filter substrate, wherein a surface shape is provided.   In the mask pattern used for one of the regions, a plurality of island-shaped light transmitting portions are dispersedly arranged in the light shielding portion, and in the mask pattern used for the other region, the plurality of island-shaped light shielding portions are light-transmitted. The method for manufacturing a color filter substrate according to claim 4, wherein the color filter substrate is dispersedly arranged in the transmission part. An electro-optic layer, a color filter including a plurality of types of colored layers having different hues, and a light scattering property disposed on the electro-optic layer and the color filter side surface disposed behind the electro-optic layer and the color filter. In an electro-optical device having a reflective layer having a reflective surface of
2. The electro-optical device according to claim 1, wherein the reflection surface has a reflection region having different light scattering characteristics provided corresponding to at least two types of the colored layers.   Among the reflective regions having different light scattering characteristics, one of the reflective regions has a convex-dispersed uneven reflective surface shape in which a plurality of convex portions are dispersedly arranged, and the other reflective region has a plurality of reflective regions. 7. The electro-optical device according to claim 6, wherein the electro-optical device has a concave-convex-type uneven reflection surface shape in which concave portions are dispersedly arranged.   The said reflective layer is formed on the base layer arrange | positioned on the opposite side to the said reflective surface, The said reflective surface is comprised in the shape reflecting the surface shape of the said base layer, or characterized by the above-mentioned. 8. The electro-optical device according to 7. An electro-optic layer, a color filter including a plurality of types of colored layers having different hues, and a light scattering property disposed on the electro-optic layer and the color filter side surface disposed behind the electro-optic layer and the color filter. In a method for manufacturing an electro-optical device having a reflective layer having a reflective surface of
The step of forming the reflective layer includes a base layer forming step of forming a base layer having a light-scattering uneven surface, and a reflection having the reflective surface reflecting the surface shape on the uneven surface of the base layer. A reflective layer forming step to form a layer,
In the base layer forming step, the regions corresponding to at least two types of the colored layers of the photosensitive resin are exposed using different mask patterns and developed, whereby the regions have different light scattering characteristics. A method of manufacturing an electro-optical device, wherein a surface shape is provided.   In the mask pattern used for one of the regions, a plurality of island-shaped light transmitting portions are dispersedly arranged in the light shielding portion, and in the mask pattern used for the other region, the plurality of island-shaped light shielding portions are light-transmitted. The method of manufacturing an electro-optical device according to claim 4, wherein the electro-optical device is dispersedly arranged in the transmission portion. 9. An electronic apparatus comprising: the electro-optical device according to claim 6; and a control unit that controls the electro-optical device.

Images