JP2006071864A - Electro-optical device and electronic equipment - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an electro-optical device with which a light shielding layer with an excellent light shielding property is formed without increasing the number of steps, and also provide electronic equipment equipped with the electro-optical device and a method for manufacturing the electrooptical device. <P>SOLUTION: In the electro-optical device, the light shielding layer 29 is constructed with a portion 230 of a reflection layer 23 formed inside a groove shaped recessing part 220 of a base layer 22, and an overlapping portion 250 of two out of color filter layers 251R, 251G, 251B for a reflective display corresponding to various colors, on a boundary region of pixels 5 corresponding to the various colors. Also on a boundary region of pixels 5 corresponding to the identical color, a light shielding layer 29 is constructed with a portion 230 of a reflection layer 23 formed inside a groove shaped recessing part 220 of a base layer 22, and an overlapping portion of color filter layers 251R, 251G, 251B for a reflective display of three colors. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to an electro-optical device and an electronic apparatus.

  In an electro-optical device in which a plurality of pixels are arranged in a matrix, a light shielding layer called a so-called black stripe or black matrix is provided in a boundary region between adjacent pixels, thereby clarifying the pixel outline and improving the contrast. I am trying. Here, from the viewpoint of enhancing the light shielding performance of the light shielding layer, it is preferable that the light shielding layer is thick. However, if the light shielding layer is thickened, the flatness of the surface is impaired.

  Here, it has been proposed to form a groove-like recess in the substrate itself and to form a light shielding layer in the recess (see, for example, Patent Document 1).

In addition, a transparent photosensitive resin layer is newly added on the substrate, and a recess is formed by removing the photosensitive resin layer in a groove shape, and a light shielding layer is formed in the recess. (For example, refer to Patent Document 2).
JP-A-10-206623 JP-A-6-34962

  However, in the configuration described in Patent Document 1, it is necessary to newly add a step of forming a groove-like recess in the substrate itself. In the configuration described in Patent Document 2, it is necessary to newly add a step of forming a resin layer for forming a groove-like recess. For this reason, any of the conventional techniques has a problem in that the number of steps increases and the productivity decreases when the light shielding performance of the light shielding layer is increased. Further, when each pixel is driven, it is generally performed by inverting the polarity. For example, in a plurality of pixels arranged in a matrix, columns in the direction along the data line have the same polarity for each column, but in a column that intersects the data line (column in the direction along the scanning line) Have different polarities for each column. In other words, the same polarity is obtained in the own stage, but the polarity is different between the own stage and the preceding stage or between the own stage and the latter stage. Therefore, there is a problem that disclination is likely to occur between the first stage and the first stage or between the first stage and the second stage, and the display is adversely affected. The same problem can occur even if the data line and the scanning line are replaced.

  Therefore, it may be possible to reduce the adverse effect on the display due to the occurrence of disclination by increasing the width of the light shielding film, but if the width of the light shielding film is simply increased, the aperture ratio is reduced. There is a problem.

  In view of the above problems, an object of the present invention is to provide an electro-optical device capable of forming a light-shielding layer having excellent light-shielding properties without increasing the number of steps, and an electronic apparatus including the electro-optical device. It is in. Another object of the present invention is to provide an electro-optical device capable of reducing adverse effects on display due to the occurrence of disclination and preventing a decrease in aperture ratio, and an electronic apparatus including the electro-optical device.

  In order to solve the above problems, the present invention supports an electro-optical device substrate that holds an electro-optical material, a plurality of data lines and a plurality of scanning lines, and an intersection of the plurality of data lines and the plurality of scanning lines. In an electro-optical device including a plurality of pixels provided as a base layer, the base layer is formed on the electro-optical device substrate and has unevenness on the surface, and the reflective layer is stacked on the base layer. A three-color color filter layer corresponding to the plurality of pixels, and a recess formed by removing at least a part of the base layer, which is provided on a boundary region between the plurality of adjacent pixels and stacked on the reflective layer. In the plurality of pixels, a light-shielding layer formed by superimposing the three color filter layers in the recess is formed in the recess in a boundary region between pixels having different polarities when driven. Same polarity when driving A light-shielding layer formed by superimposing two different color filter layers of the three colors in the recess is formed in the recess in the boundary region between the pixels. The light-shielding layer formed by overlapping is wider than the light-shielding layer formed by overlapping the two color filter layers.

  That is, a light shielding layer formed by superposing two color filter layers formed on adjacent pixels across the concave portion is formed in the concave portion in the direction along one direction of the data line or the scanning line. In addition, it is preferable that a light shielding layer formed by superimposing three color filter layers is formed in the recess in the direction intersecting with the one direction.

  In the present invention, since the light shielding layer is formed in the recess formed by removing at least a part of the base layer, the surface is flat even when the light shielding layer is thickened or a plurality of light shielding layers are laminated. Sex is not impaired. Therefore, the light shielding performance of the light shielding layer can be enhanced without impairing the surface flatness. Further, since the light shielding layer is disposed in the concave portion from which at least a part of the light scattering base layer is removed, it is not necessary to add a new process to form the concave portion. Therefore, it is possible to form a light shielding layer with excellent light shielding properties without increasing the number of steps. Furthermore, the color filter layers of the three colors are overlapped in the boundary region between adjacent pixels in the direction along the data line between the self-stage and the pre-stage or the self-stage and the post-stage where disclination is likely to occur. By using the light shielding layer, the width of the light shielding film is increased, so that adverse effects on display due to the occurrence of disclination can be reduced. A light shielding layer formed by superposing two different color filter layers is used in a boundary region between adjacent pixels in a direction intersecting the data line (a direction along the scanning line) with little occurrence of disclination. Thus, since the width of the light shielding film does not increase, the aperture ratio does not decrease while reducing the adverse effect on the display due to the occurrence of disclination. In particular, when the voltage difference between pixels having different polarities is 14 V or more, for example, when 7 V is applied to a positive polarity pixel and −7 V is applied to a negative polarity pixel. It is preferable to employ the above configuration.

  In the present invention, the boundary region in which the light shielding layer formed by superimposing the two color filter layers is a boundary region in a direction along one direction of the data line or the scanning line, and the three colors The boundary region in which the light shielding layer formed by overlapping the color filter layers is formed is a boundary region in a direction intersecting the one direction. In particular, a boundary region extending in the direction intersecting with the scanning line is formed by forming a light-shielding layer formed by superimposing the three color filter layers in the boundary region extending along the direction in which the scanning line extends. For example, it is preferable to form a light shielding layer in which two color filter layers are superimposed on a boundary region extending in a direction along the direction in which the data lines extend.

  In the present invention, a configuration in which the data line or the scanning line is formed by a light-shielding conductive layer that overlaps the light-shielding layer may be employed.

  In the present invention, each of the plurality of pixels includes a light transmission portion formed by removing a part of the reflective layer, and the color filter layer includes a color filter layer for reflective display formed in a region overlapping with the reflective layer; A color filter layer for transmissive display formed in a region overlapping with the light transmissive portion, and the light shielding layer in the one direction is formed in the transmissive display color formed in adjacent pixels across the light shielding layer. The filter layers are preferably overlapped in the recess. When comparing the color filter layer for reflective display and the color filter layer for transmissive display, the color filter layer for transmissive display through which display light passes only once has higher colorability. Therefore, when used as a light-shielding layer, better light-shielding properties can be obtained when the color filters for transmissive display are overlapped with each other than when the color filters for reflective display are overlapped.

  In this invention, it is preferable to have a part of said reflective layer in the said recessed part. If comprised in this way, a part of reflection layer can also be utilized as a light shielding layer.

  An electro-optical device to which the present invention is applied is used in an electronic apparatus such as a mobile phone or a mobile computer.

  Embodiments of the present invention will be described below with reference to the drawings. In the drawings shown below, the dimensions and ratios of the components are appropriately different from the actual ones in order to make the components large enough to be recognized on the drawings.

[Embodiment 1]
(Overall configuration of electro-optical device)
1A and 1B are a perspective view and a cross-sectional view of an electro-optical device (liquid crystal device) according to Embodiment 1 of the present invention, and FIG. 2 is an exploded view illustrating a schematic configuration of the electro-optical device. It is a perspective view. Note that FIG. 1B corresponds to a cross section viewed from the line A1-A1 ′ in FIG.

  As shown in FIGS. 1A, 1B, and 2, the electro-optical device 1 according to this embodiment includes a liquid crystal 8 (not shown in FIGS. 1A and 2) as an electro-optical material. A liquid crystal panel 2 held between a transparent substrate 10 (element substrate) and a second transparent substrate 20 (color filter substrate), and a backlight unit disposed on the second transparent substrate 20 side of the liquid crystal panel 2 9, and the image display area 3 is provided in a substantially central area of the liquid crystal panel 2. In this embodiment, for the sake of convenience, as shown in FIG. 1B, the first transparent substrate 10 side with respect to the liquid crystal 8 is the side on which the viewer who views the display image by the electro-optical device 1 is located. The side of the second transparent substrate 20 as viewed from the liquid crystal 8 is referred to as the “back side”. Note that in a liquid crystal device for color display, one pixel is configured by pixels corresponding to each color.

  The backlight unit 9 includes, for example, a light guide plate 91 made of a molded product of a light transmissive resin, and a light source 92 such as an LED or a cold cathode tube. The light source 92 is a light guide plate that is a plate-like member. The side end face 91 is irradiated with light. A diffusion plate (not shown) for uniformly diffusing light from the light guide plate 91 with respect to the liquid crystal panel 2 is disposed on the surface of the light guide plate 91 facing the liquid crystal panel 2. In addition, a reflection plate (not shown) that reflects light to be emitted from the light guide plate 91 to the back side to the liquid crystal panel 2 side is disposed on the opposite surface of the light guide plate 91 and is incident from the side end surface. The emitted light is uniformly emitted toward the second transparent substrate 20 of the liquid crystal panel 2.

  The first transparent substrate 10 of the liquid crystal panel 2 is a plate-like member made of a light transmissive material such as glass. A phase difference plate 31 (not shown in FIGS. 1A and 2) and a polarizing plate 32 (not shown in FIGS. 1A and 2) are provided on the observation side surface of the first transparent substrate 10. The layers are laminated in this order from the 1 transparent substrate 10 side. Light transmissive pixel electrodes 14 made of an ITO (Indium Tin Oxide) film or the like are arranged in a matrix on the surface of the first transparent substrate 10 on the liquid crystal 8 side (back side). A plurality of data lines 17 extending in one direction (Y direction shown in FIG. 2) are formed in the gaps between the pixel electrodes 14, and the pixel electrodes 14 and the data lines 17 are nonlinear. They are connected via a TFD (Thin Film Diode) element 15 which is a two-terminal switching element having current-voltage characteristics. Further, as shown in FIG. 1B, the surface of the first transparent substrate 10 on which the pixel electrodes 14, the data lines 17, and the TFD elements 15 are formed is covered with an alignment film 18 (not shown in FIG. 2). Yes. The alignment film 18 is an organic thin film such as polyimide, and is subjected to a rubbing process for defining the alignment state of the liquid crystal 8 when no voltage is applied.

  The second transparent substrate 20 is a plate-like member made of a light transmissive material such as glass, and on the back side thereof, similarly to the first transparent substrate 10, the phase difference plate 36 (FIG. 1A and FIG. 2). In FIG. 1, a polarizing plate 37 (not shown in FIG. 1A and FIG. 2) is laminated in this order from the second substrate 20. On the other hand, on the surface of the second transparent substrate 20 on the liquid crystal 8 side (observation side), the underlayer 22, the reflective layer 23, the three color filter layers 25R, 25G, and 25B, the planarizing film 26, the scanning line 27, and An alignment film 28 (not shown in FIG. 2) is laminated in this order from the second transparent substrate 20. Among these layers, the alignment film 28 is an organic thin film such as polyimide, like the alignment film 18, and has been subjected to a rubbing process for defining the alignment state of the liquid crystal 8 when no voltage is applied. .

  The base layer 22 is formed by exposing and developing a positive type photosensitive resin, as will be described later. The base layer 22 has an opening 221 from which the resin is completely removed in a portion deviated from the center of the pixel 5, and has an uneven surface with smooth unevenness on the observation side (surface). Yes.

  The reflective layer 23 is formed by thinly forming a light-reflective material such as aluminum or silver on the upper layer side of the base layer 22 with a substantially constant film thickness. This is a scattering reflection surface reflecting the surface shape of 22 irregularities. Here, the reflective layer 23 includes a light transmitting portion 231 from which a portion corresponding to the opening 221 of the base layer 22 is removed. Therefore, in this embodiment, the reflective layer 23 is configured as a transflective layer.

  In this embodiment, for convenience of explanation, the functional substrate including the second transparent substrate 20, the base layer 22, and the reflective layer 23 is referred to as “electro-optical device substrate 21”.

  The color filter layers 25R, 25G, and 25B are resin layers provided corresponding to the respective pixels 5. Each color filter layer is colored in red (R), green (G), or blue (B) with a pigment or the like, and selectively transmits light having a wavelength corresponding to the color. Note that “R”, “G”, and “B” in FIG. 2 indicate which color filter layers 25 R, 25 G, and 25 B are disposed in each of the plurality of pixels 5.

  Here, a light shielding layer 29 (to be described later) is formed in the boundary regions (boundary regions between the pixels) of the color filter layers 25R, 25G, and 25B, and the light shielding layer 29 forms a black matrix or a black stripe.

  Each of the plurality of scanning lines 27 is a strip-shaped electrode formed of a light-transmitting conductive material such as ITO. The scanning line 27 is formed in the upper layer of the planarizing film 26, extends in a direction intersecting with the data line 17 described above (X direction in FIG. 2), and includes a plurality of columns that form a column on the first transparent substrate 10. It is located so as to face the pixel electrode 14.

  As shown in FIG. 1B, the first transparent substrate 10 and the second transparent substrate 20 having the above-described configuration are bonded together via the sealing material 40 and surrounded by both the substrates and the sealing material 40. For example, a TN (twisted nematic) type liquid crystal 8 is sealed in the region. Here, the wiring pattern formed on the first transparent substrate 10 and the wiring pattern formed on the second transparent substrate 20 are electrically connected to each other by predetermined inter-substrate conductive particles contained in the sealing material 40. Has been. Under such a configuration, the liquid crystal 8 sandwiched between the first transparent substrate 10 and the second transparent substrate 20 is applied with a voltage between the pixel electrode 14 and the scanning line 27 facing the pixel electrode 14. The orientation direction changes. The regions in which the alignment direction of the liquid crystal 8 changes according to the applied voltage are arranged as pixels 5 in a matrix. Accordingly, when external light is incident on the liquid crystal panel 2 from the observation side, the external light is transmitted through the liquid crystal 8, is then scattered and reflected by the electro-optical device substrate 21, is transmitted through the liquid crystal 8 again, and is directed toward the observation side. The image in the reflection mode is displayed. On the other hand, the light from the backlight unit 9 that has entered from the back side of the liquid crystal panel 2 passes through the opening 221 and the light transmitting portion 231 and enters the layer of the liquid crystal 8, and then is emitted to the observation side and is transmitted in the transmission mode. An image is displayed.

[Configuration of Electro-Optical Device Substrate 21]
FIGS. 3A, 3B, 3C, and 3D each schematically illustrate an enlarged portion of the electro-optical device substrate used in the electro-optical device according to Embodiment 1 of the present invention. FIG. 3 is a plan view, a B1-B1 ′ line cross-sectional view, a C1-C1 ′ line cross-sectional view, and a D1-D1 ′ line cross-sectional view. FIG. 4 is an explanatory diagram schematically showing a cross section taken along line E1-E1 ′ of FIG.

  In the electro-optical device 1 of the present embodiment, the polarity of the signal supplied to the scanning line 27 is inverted for each column. When driven, adjacent pixels have different polarities in the direction along the data line 17, and the data line 17 Pixels adjacent to each other in the direction intersecting (the direction along the scanning line 27) have the same polarity. In this embodiment, as will be described below, the light shielding layer 29 is configured to face such a driving method.

  As shown in FIGS. 3A, 3 </ b> B, 3 </ b> C, and 4 </ b> D, and FIG. 4, in the electro-optical device substrate 21 of the present embodiment, the base layer 22 formed on the second transparent substrate 20 is used. The surface of the reflective layer 23 has light scattering irregularities. In addition, the base layer 22 includes an opening 221 from which the resin is completely removed at a portion deviated from the center of the pixel 5, and the reflective layer 23 has a portion corresponding to the opening 221 of the base layer 22 removed. The light transmission part 231 is provided. In each pixel 5, the color filter layers 25 R, 25 G, and 25 B are formed so as to overlap the light transmission portion 231 and the reflective display color filter layers 251 R, 251 G, and 251 B formed so as to overlap the reflective layer 23. The transmissive display color filter layers 252R, 252G, and 252B are included. Here, when displaying in the transmissive mode, the light passes through the transmissive display color filter layers 252R, 252G, and 252B once, whereas when displaying in the reflective mode, the light is reflected in the reflective display color filter. Since it passes through the layers 251R, 251G, and 251B twice, the transmissive display color filter layers 252R, 252G, and 252B have higher coloring than the reflective display color filter layers 251R, 251G, and 251B. Yes.

  Further, a data line 17 formed of a light-shielding conductive layer such as a chromium film or a tantalum film is formed on the first transparent substrate 10 side so as to face the boundary region between the pixels 5 corresponding to different colors. .

  In the electro-optical device substrate 21 configured as described above, in this embodiment, the base layer 22 is completely removed along the boundary region of the adjacent pixels 5 to form a groove-shaped recess 220.

  Here, the reflective layer 23 is formed up to the boundary region of the adjacent pixels 5, and as a result, a part 230 of the reflective layer 23 is formed inside the groove-shaped recess 220. In addition, the reflective display color filter layers 251R, 251G, and 251B are formed not only in the region for each pixel 5 but also in the boundary region between the adjacent pixels 5.

  For this reason, as shown in FIGS. 3B, 3C and 4, the boundary region between adjacent pixels 5 in the direction intersecting the data line 17 (direction along the scanning line 27), in other words, different colors. In the boundary region (recessed portion 220) between the pixels 5 corresponding to, overlapping portions 250 of the color filter layers 25R, 25G, and 25B (reflection display color filter layers 251R, 251G, and 251B) corresponding to different colors are formed. Yes. Therefore, in this embodiment, in the boundary region of the pixels 5 corresponding to different colors, the light shielding layer 29 is adjacent to a part 230 of the reflective layer 23 formed inside the groove-shaped recess 220 of the base layer 22. The color filter layers 25R, 25G, and 25B (reflective display color filter layers 251R, 251G, and 251B) corresponding to the different color pixels are overlapped portions 250 of two color filter layers.

  On the other hand, as shown in FIGS. 3D and 4, the boundary region between the pixels 5 adjacent in the direction along the data line 17, in other words, the boundary region between the pixels 5 corresponding to the same color ( In the concave portion 220), three different color filter layers 25R, 25G, and 25B (reflective display color filter layers 251R, 251G, and 251B) overlap. Accordingly, the light shielding layer 29 includes a part 230 of the reflective layer 23 formed in the groove-shaped recess 220 of the base layer 22 and the color filter layers 25R, 25G, and 25B (reflective display color filter layers 251R, 251G, 251B) and three color filter layer overlapping portions.

(Method of manufacturing electro-optical device 1)
5 and 6 are process cross-sectional views illustrating a method for manufacturing a substrate for an electro-optical device used in an electro-optical device to which the present invention is applied. Here, in FIG. 5 and FIG. 6, regions corresponding to FIG. 4 are shown. In manufacturing the electro-optical device substrate 21 of the present embodiment, the base layer 22 and the reflective layer 23 are formed on a large transparent substrate from which a large number of substrates can be obtained. Although the optical device substrate 21 is cut out, in the following description, a large transparent substrate is also described as the second transparent substrate 20 and is not distinguished.

  In this embodiment, when the electro-optical device substrate 21 is manufactured, as shown in FIG. 5A, the surface on the observation side of the cleaned and dried second transparent substrate 20 is, for example, a spin coat method. Thus, a positive type photosensitive resin 225 which is a kind of photosensitive material is applied (application process). As the photosensitive resin 225, an acrylic resin or the like can be used. Thereafter, the photosensitive resin 225 applied to the second transparent substrate 20 is dried under a reduced pressure environment, and the dried photosensitive resin 225 is pre-baked at a temperature range of 85 ° C. to 105 ° C. for about 2 minutes.

  Next, as shown in FIG. 5B, the photosensitive resin 225 is exposed by a stepper using a mask 310 (half exposure mask) (half exposure step). Here, the half-exposure mask 310 is formed by forming a chromium layer or the like on a light-transmitting substrate such as glass. In this embodiment, the mask 310 has a region corresponding to the image display region 3. A plurality of minute convex-forming light-shielding portions 311 for forming the uneven surface of the base layer 22 are randomly formed. The mask 310 has a light transmitting portion 312 formed in a region corresponding to the opening 221 and a terminal region (not shown). Further, the mask 310 has a light transmitting portion 313 formed in a region corresponding to the boundary region of each pixel 5. Note that since the photosensitive resin 225 is a positive type, when light is irradiated from the light transmitting portions 312 and 313 of the mask 310, the portion is dissolved and removed in a developing solution in a developing process described later.

  With such a mask 310, for example, when exposure is performed with an exposure time of 1,600 msec, the light transmitted from the light transmitting portions 312 and 313 of the mask 310 half-exposes the photosensitive resin 225. In FIG. 5A, it is schematically represented as a depth indicated by a broken line. In FIG. 5A, the unexposed portion of the photosensitive resin 225 is attached with a slanting dotted line to the right, and the exposure amount is schematically shown.

  After the mask 310 as described above is sequentially shifted by the stepper to perform the entire exposure process of the second transparent substrate 20, as shown in FIG. 5B, a mask 320 (a mask for full exposure) is used. Exposure (complete exposure process). Here, similarly to the mask 310, the full exposure mask 320 is formed by forming a chromium layer or the like on a light-transmitting substrate such as glass. In this embodiment, the mask 320 includes the image display region 3. The solid light-shielding portion 321 is formed in the region corresponding to, but in the image display region 3, a light-transmitting portion 322 is formed in the region corresponding to the opening 221 and the terminal region of each pixel 5. Further, the mask 320 has a light transmitting portion 323 formed in a region corresponding to the boundary region of each pixel 5. Since the photosensitive resin 225 is a positive type, when light is irradiated from the light transmitting portions 322 and 323 of the mask 320, the portions are dissolved and removed in a developing solution in a developing process described later.

  With such a mask 320, the exposure time is different from that of the half exposure process, for example, complete exposure is performed with an exposure time of 4,000 msec. As a result, the light transmitted through the mask 320 completely exposes the photosensitive resin 225, and the exposure amount is schematically shown as a depth indicated by a broken line in FIG. An oblique dotted line with a lower right is attached to the exposed portion.

  When the mask 320 as described above is sequentially shifted by the stepper and the entire second transparent substrate 20 is subjected to the exposure process, the development process is performed on the photosensitive resin 225 (development process). As shown, the photosensitive resin 225 is removed by the depth to which light has acted in the exposure process. As a result, the base layer 22 in which minute convex portions are randomly arranged is formed in the image display region 3, and the opening 221 is formed in each pixel 5. Further, the photosensitive resin 225 is removed from the boundary region of each pixel 5, and a groove-shaped recess 220 is formed in the boundary region of each pixel 5. Next, the photosensitive resin 225 is irradiated with ultraviolet rays (hereinafter referred to as UV) such as i-line as necessary to remove the hue, and then the photosensitive resin 225 is changed to, for example, 220. Bake for 50 minutes at a temperature of ° C.

  Next, as shown in FIG. 6A, a reflective metal layer 235 such as aluminum or an aluminum alloy is formed with a substantially constant thickness so as to cover the base layer 22 by, for example, sputtering, and then the base layer. A resist mask 330 covers a portion corresponding to 22 and a groove-like recess 220 formed in the boundary region of each pixel 5. Then, after etching the portion of the reflective metal layer 235 that is not covered with the resist mask 330, the resist mask 330 is removed, as shown in FIG. 6B, the reflective layer 23 provided with the light transmitting portion 231. A part 230 of the reflective layer 23 is also formed in the groove-shaped recess 220. In this way, the scattering / reflection type electro-optical device substrate 21 is manufactured. Here, since the concave portion of the uneven surface formed on the surface of the underlayer 22 does not reach the second transparent substrate 20, the concave portion of the uneven surface is not flat.

  Next, as shown in FIGS. 6C and 6D, red, green, and blue color filter layers 25R, 25G, and 25B (reflective display color filter layer 251R) are formed using a photosensitive resin colored with a pigment. 251G, 251B and transmissive display color filter layers 252R, 252G, 252B) are sequentially formed. At this time, the color filter layers 251R, 251G, and 251B for reflective display are also formed in the boundary region of each pixel 5. As a result, the base layer 22 is removed in the boundary region between the adjacent pixels 5 in the direction crossing the data line 17 (the direction along the scanning line 27), in other words, in the boundary region of the pixels 5 corresponding to different colors. A part 230 of the reflective layer 23 formed inside the groove-shaped recess 220 and the color filter layers 25R, 25G, and 25B (transparent display color filter layer 251R, corresponding to adjacent pixels of different colors). 251G and 251B), the light shielding layer 29 including the overlapping portion 250 of the two color filter layers is formed. Further, a boundary region between adjacent pixels 5 in the direction along the data line 17, in other words, a boundary region between the pixels 5 corresponding to the same color, is formed inside the groove-shaped recess 220 of the base layer 22. A light-shielding layer 29 including a part 230 of the reflective layer 23 and an overlapping portion of the color filter layers of the three colors of the color filter layers 25R, 25G, and 25B (reflection display color filter layers 251R, 251G, and 251B) is formed. Is done.

  Next, as shown in FIGS. 3 and 4, after the planarization film 26 is formed so as to cover the color filter layers 25R, 25G, 25B and the light shielding layer 29, a thin film made of ITO or the like is formed on the planarization film 26. Are formed and patterned to form the scanning line 27. Thereafter, the alignment film 28 is formed, and the surface of the alignment film 28 is rubbed. The second transparent substrate 20 thus formed and the first transparent substrate 10 on which the pixel electrode 14, the data line 17, the TFD element 15, and the alignment film 18 are formed are opposed to each other with the alignment films 18 and 28 facing each other. Then, the liquid crystal 8 is injected into the space surrounded by the sealing material 40 between the substrates, and then the liquid crystal 8 is injected by a sealing material (not shown). Seal the space. As a result, the liquid crystal panel 2 is completed.

(Main effects of this form)
As described above, in this embodiment, the boundary region between adjacent pixels 5 in the direction intersecting the data line 17 (the direction along the scanning line 27), in other words, the boundary region (recessed portion) of the pixel 5 corresponding to a different color. 220), the light-shielding layer 29 is a color filter corresponding to a part 230 of the reflective layer 23 formed in the groove-shaped recess 220 formed by removing the underlayer 22 and the adjacent pixels of different colors. The layer 25R, 25G, and 25B (transparent display color filter layers 251R, 251G, and 251B) are composed of overlapping portions 250 of two color filter layers. For this reason, the light shielding layer 29 has excellent light shielding performance, but does not impair the flatness of the surface.

  Further, in the boundary region between adjacent pixels 5 in the direction along the data line 17, in other words, in the boundary region (recessed portion 220) between the pixels 5 corresponding to the same color, the light shielding layer 29 has a groove shape of the base layer 22. A portion 230 of the reflective layer 23 formed in the concave portion 220 of the color filter layer, and an overlapping portion of the color filter layers of the three colors of the color filter layers 25R, 25G, and 25B (reflective display color filter layers 251R, 251G, and 251B) It is composed of For this reason, the light shielding layer 29 has excellent light shielding performance, but does not impair the flatness of the surface.

  Furthermore, three color filter layers are superimposed on the boundary region between adjacent pixels in the direction along the data line 17 between the self-stage and the pre-stage or the self-stage and the post-stage where disclination is likely to occur. Since the combined light shielding layer 29 is formed, the width of the light shielding layer 29 is wide, and adverse effects on display due to the occurrence of disclination can be reduced. On the other hand, two different color filter layers are overlapped in the boundary region between adjacent pixels in the direction intersecting the data line 17 (the direction along the scanning line 27) with less disclination. Since the light-shielding layer 29 is used, the width of the light-shielding layer 29 is not increased, and a decrease in the aperture ratio can be suppressed while reducing adverse effects on display due to the occurrence of disclination.

  Moreover, since the groove-shaped recess 220 is formed simultaneously with the opening 221 when forming the base film 22 for light scattering, the light-shielding layer 29 having excellent light-shielding performance can be formed without increasing the number of steps. Can do.

[Embodiment 2]
FIGS. 7A, 7B, 7C, and 7D each schematically illustrate an enlarged portion of the electro-optical device substrate used in the electro-optical device according to Embodiment 2 of the present invention. They are a top view, a B2-B2 'line sectional view, a C2-C2' line sectional view, and a D2-D2 'line sectional view. Since the basic configuration of the electro-optical device of this embodiment is the same as that of Embodiment 1, common portions are denoted by the same reference numerals and description thereof is omitted.

  Also in the electro-optical device 1 of this embodiment, the polarity of the signal supplied to the scanning line 27 is inverted for each column, and when driving, adjacent pixels have different polarities in the direction along the data line 17, and the data line 17 Pixels adjacent to each other in the direction intersecting (the direction along the scanning line 27) have the same polarity. In this embodiment, as will be described below, the light shielding layer 29 is configured to face such a driving method.

  As shown in FIGS. 7A, 7B, 7C, and 7D, in the electro-optical device substrate 21 of the present embodiment, the bottom formed on the second transparent substrate 20 is the same as in the first embodiment. Due to the ground layer 22, irregularities for light scattering are formed on the surface of the reflective layer 23. Here, the base layer 22 and the reflective layer 23 are formed only on one side of the pixel 5. Therefore, the other side of the pixel 5 is an opening 221 from which the base layer 22 is completely removed, and a region corresponding to the opening 221 is located in the light transmission part 231 from which the reflection layer 23 is completely removed. It has become. In each pixel 5, the color filter layers 25 R, 25 G, and 25 B are formed so as to overlap with the light transmission portion 231 and the reflective display color filter layers 251 R, 251 G, and 251 B formed so as to overlap with the reflective layer 23. The transmissive display color filter layers 252R, 252G, and 252B are higher in color than the reflective display color filter layers 251R, 251G, and 251B. It is used.

  Further, a data line 17 made of a light-shielding conductive layer such as chromium or tantalum is formed on the first transparent substrate 10 side so as to face the boundary region between the pixels 5 corresponding to different colors.

  Also in this embodiment, as in the first embodiment, the base layer 22 is completely removed along the boundary region of the adjacent pixels 5 to form a groove-shaped recess 220.

  Here, a part 230 of the reflective layer 23 is formed up to the inside of the recess 220 formed in the boundary region of the adjacent pixels 5. Further, the transmissive display color filter layers 252R, 252G, and 252B are formed up to the boundary region of the adjacent pixels 5 in addition to the region for each pixel 5.

  For this reason, as shown in FIGS. 7B and 7C, it corresponds to a boundary region between adjacent pixels 5 in a direction intersecting with the data line 17 (direction along the scanning line 27), in other words, different colors. In the boundary region (recess 220) between the pixels 5, overlapping portions 250 of color filter layers 25R, 25G, and 25B (transmission display color filter layers 252R, 252G, and 252B) corresponding to different colors are formed. Therefore, in this embodiment, in the boundary region of the pixels 5 corresponding to different colors, the light shielding layer 29 is adjacent to a part 230 of the reflective layer 23 formed inside the groove-shaped recess 220 of the base layer 22. The color filter layers 25R, 25G, and 25B (transmission display color filter layers 252R, 252G, and 252B) corresponding to pixels of different colors are overlapped portions 250 of two color filter layers. For this reason, the light shielding layer 29 has excellent light shielding performance, but does not impair the flatness of the surface.

  Further, as shown in FIG. 7D, light shielding is performed in the boundary region between adjacent pixels 5 in the direction along the data line 17, in other words, in the boundary region (recessed portion 220) between the pixels 5 corresponding to the same color. The layer 29 includes a part 230 of the reflective layer 23 formed inside the groove-shaped recess 220 of the base layer 22 and color filter layers 25R, 25G, and 25B (transmission display color filter layers 252R, 252G, and 252B). It is composed of overlapping portions of three color filter layers. For this reason, the light shielding layer 29 has excellent light shielding performance, but does not impair the flatness of the surface.

  Moreover, since the groove-shaped recess 220 can be formed simultaneously with the opening 221 when forming the light scattering base film 22, the light-blocking layer 29 having excellent light-blocking performance can be formed without increasing the number of steps. Can do.

  Further, in this embodiment, the transmissive display color filter layers 252R, 252G, and 252B, which have higher coloring than the reflective display color filter layers 251R, 251G, and 251B, are used as the light shielding layer 29. There is an advantage that the light shielding performance of the light shielding layer 29 is high.

[Modifications of Embodiments 1 and 2]
In the first and second embodiments, in the boundary region between the pixels 5 corresponding to different colors, the light shielding layer 29 includes a part 230 of the reflective layer 23 and an overlapping part 250 of the color filter layers 25R, 25G, and 25B. Although the configuration is provided, the light shielding layer 29 may be configured only by the overlapping portion 250 of the color filter layers 25R, 25G, and 25B. Even in this case, since the light shielding layer 29 is formed in the recess 220, the color filter layers 25R, 25G, and 25B can be thickly overlapped with each other, so that the light shielding property is high.

  In the first and second embodiments, the color filter layer includes a reflective display color filter layer formed so as to overlap the reflective layer 23 and a transmissive display color filter formed so as to overlap the light transmission portion 231. The reflective display color filter layer and the transmissive display color filter layer may be formed of the same color filter layer.

  Furthermore, in the first and second embodiments, the data line 17 is a light-shielding conductive layer, for example, a conductive layer in which a tantalum film and a chromium film are stacked, and among the light-shielding layers 29, between pixels facing different colors. Therefore, the light shielding property can be further improved.

[Other embodiments]
In any of the above forms, the positive type photosensitive resin is used to form the underlayer 22. However, the underlayer 22 can be formed using a negative type photosensitive resin. In the above embodiment, the recess layer 220 is formed by completely removing the underlayer 22. However, a configuration in which a part of the underlayer 22 remains at the bottom of the recess 220 may be used.

  In the above embodiment, the electro-optical device substrate 21 used in the transflective electro-optical device 1 has been described. However, the present invention is applied to the electro-optical device substrate 21 used in the total reflection electro-optical device 1. May be. In addition, in the above embodiments, the electro-optical device including a liquid crystal panel using a TFD element as an active element has been described as an example. However, the electro-optical apparatus including a liquid crystal panel using a TFT as an active element, etc. The present invention may be applied to. In each of the above embodiments, the same effect can be obtained even if the data line and the scanning line are replaced.

[Example of mounting on electronic devices]
An electro-optical device to which the present invention is applied is mounted on an electronic device such as a mobile phone, a mobile computer, a digital camera, a movie camera, an in-vehicle device, an audio device, and a projector.

(A), (b) is the perspective view and sectional drawing of the electro-optical apparatus (liquid crystal device) to which this invention is applied. FIG. 2 is an exploded perspective view illustrating a schematic configuration of the electro-optical device illustrated in FIG. 1. (A), (b), (c), (d) is a plane schematically showing an enlarged part of a substrate for an electro-optical device used in the electro-optical device according to Embodiment 1 of the present invention. FIG. 3 is a sectional view taken along line B1-B1 ′, a sectional view taken along line C1-C1 ′, and a sectional view taken along line D1-D1 ′. It is explanatory drawing which shows typically the E1-E1 'line cross section of Fig.3 (a). FIG. 6 is a process diagram illustrating a method for manufacturing a substrate for an electro-optical device of the electro-optical device according to the first embodiment of the invention. FIG. 6 is a process diagram illustrating a method for manufacturing a substrate for an electro-optical device of the electro-optical device according to the first embodiment of the invention. (A), (b), (c), (d) is a plane schematically showing an enlarged part of a substrate for an electro-optical device used in the electro-optical device according to Embodiment 2 of the present invention. FIG. 2 is a sectional view taken along line B2-B2 ′, a sectional view taken along line C2-C2 ′, and a sectional view taken along line D2-D2 ′.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Electro-optical device, 2 Liquid crystal panel, 3 Image display area, 8 Liquid crystal (electro-optical material), 10 1st transparent substrate, 17 Data line (light-shielding wiring layer), 20 2nd transparent substrate, 21 Electro-optical device substrate , 22 Underlayer, 23 Reflective layer, 25R, 25G, 25B Color filter layer, 29 Light-shielding layer, 220 Recessed underlayer, 251R, 251G, 251B Reflective display color filter layer, 252R, 252G, 252B Transparent display color filter layer

Claims (6)

A substrate for an electro-optical device holding an electro-optical material, a plurality of data lines and a plurality of scanning lines, and a plurality of pixels provided corresponding to intersections of the plurality of data lines and the plurality of scanning lines. In an electro-optical device,
An underlayer formed on the electro-optical device substrate and provided with irregularities on the surface;
A reflective layer laminated on the underlayer;
Three color filter layers stacked on the reflective layer and corresponding to the plurality of pixels;
Provided in a boundary region between the plurality of adjacent pixels, and a recess formed by removing at least a part of the foundation layer,
In the plurality of pixels, a light-shielding layer formed by superimposing the three color filter layers in the recess is formed in the recess in a boundary region between pixels having different polarities when driven,
In the recess in the boundary region between pixels having the same polarity during driving, a light shielding layer is formed by superimposing two different color filter layers of the three colors in the recess,
The electro-optical device, wherein the light shielding layer formed by superimposing the three color filter layers is wider than the light shielding layer formed by superimposing the two color filter layers. In Claim 1, the boundary region in which the light shielding layer formed by superimposing the two color filter layers is formed is a boundary region in a direction along one direction of the data line or the scanning line,
The electro-optical device, wherein a boundary region in which a light shielding layer formed by superimposing the three color filter layers is formed is a boundary region intersecting with the one direction.   3. The electro-optical device according to claim 1, wherein the data line or the scanning line is a light-shielding conductive layer that overlaps the light-shielding layer. 4. The light emitting unit according to claim 1, wherein each of the plurality of pixels includes a light transmission portion formed by removing a part of the reflection layer.
The color filter layer has a reflective display color filter layer formed in a region overlapping with the reflective layer, and a transmissive display color filter layer formed in a region overlapping with the light transmission portion,
The electro-optical device, wherein the light-shielding layer in the one direction is formed by superimposing the transmissive display color filter layers formed in adjacent pixels across the light-shielding layer in the concave portion.   5. The electro-optical device according to claim 1, wherein a part of the reflective layer is included in the recess.   An electronic apparatus comprising the electro-optical device defined in any one of claims 1 to 5.

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