JP4164893B2 - Method and apparatus for manufacturing plasma display panel - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a coating liquid coating method and a coating apparatus for a substrate on which a specific pattern having an uneven shape is formed. In particular, the present invention relates to a method and apparatus for manufacturing a plasma display panel in which stripe-shaped partition walls are arranged. The plasma display panel according to the present invention is used as a wall-mounted television or an information display.
[0002]
[Prior art]
Conventionally, a screen printing method is known as a method for manufacturing a plasma display panel. In particular, as a method for forming a phosphor for a plasma display, a screen printing method is often used.
[0003]
Further, a method of using sandblasting after screen printing as shown in JP-A-6-5205 and a method of screen printing after applying a crosslinking agent as shown in JP-A-5-144375 have been proposed. However, both use screen printing.
[0004]
However, since the shape of the screen plate changes as printing is repeated, screen printing has the disadvantage that a highly accurate pattern cannot be formed, and there is a problem in mass production with respect to management aspects such as cleaning of the screen plate.
[0005]
In addition, as a method for obtaining a highly accurate pattern, a method using photolithography is also performed. In this case, in order to form each color phosphor layer of red, green, and blue, application, exposure, It is necessary to repeat development, drying and other processes three times, and unnecessary consumption of phosphor powder by removing unnecessary portions by developing after applying each color to the entire surface, and recovering, recycling, etc. Become high. Then, since each color is applied to the entire surface, there is a problem that color mixing due to the residual development of the overcoated color is unavoidable.
[0006]
A method of forming a phosphor layer by ejecting a phosphor paste from the tip of an inkjet nozzle has also been proposed. However, in the case of inkjet, since the phosphor paste is ejected by a piezoelectric element or the like, the viscosity needs to be about 0.2 poise or less, and the amount of phosphor powder in the paste cannot be increased. There was a problem that the thickness of the body layer was reduced. Moreover, since the diameter of the inkjet nozzle was small, there was a problem that the phosphor powder was clogged.
[0007]
As other methods for simply forming a striped colored pattern on a glass substrate, there are methods described in JP-A-5-11105 and JP-A-5-142407 using a nozzle. Cannot be used as it is for a substrate having a flat surface and a surface having irregularities.
[0008]
[Problems to be solved by the invention]
The present invention provides a coating liquid that can easily and accurately form a coating liquid such as a phosphor paste in a plurality of concave portions of a concavo-convex substrate such as a plasma display panel substrate in which stripe-shaped partition walls are formed in a fixed pattern. An object is to provide a coating apparatus. Moreover, it aims at providing the manufacturing method and manufacturing apparatus of a plasma display panel which can implement | achieve high productivity and high quality by this.
[0009]
[Means for Solving the Problems]
  In order to solve the above-mentioned problems, a method for producing a plasma display panel according to the present invention comprises three types of phosphor pastes each containing phosphor powders that emit red, green, and blue light on a glass substrate from a die having discharge holes. A method of manufacturing a plasma display panel in which a phosphor screen is formed by firing after applying each of the barrier ribs in a stripe shape,From two or more discharge holes per stripeIt consists of what is characterized by apply | coating.
[0010]
Moreover, in the said method, it is preferable to apply | coat in the state whose space | interval of the upper end part of a partition and the discharge hole exit part of a nozzle | cap | die is 0.01-2 mm.
  In the above method, the discharge hole portion shape is preferably a nozzle or a needle.
  Further, in the above method, it is preferable that the base and / or the glass substrate is run in parallel with the partition on the glass substrate.
  In the above method, the base preferably has two or more discharge holes for one color..
In the above method, it is preferable that the shortest interval between the discharge holes for discharging phosphor pastes emitting different colors from one base and discharging the phosphor pastes of different colors is 600 μm or more.
  Moreover, it is preferable to apply | coat simultaneously from 2 or more bases in the said method.
  Further, in the above method, it is preferable to apply two or more bases while running at the same speed.
  In the above method, it is preferable that two or more bases are applied in the same direction while traveling at the same speed.
  In the above method, it is preferable to apply only one color from one die.
  Moreover, it is preferable to apply simultaneously from two or more bases for one color in the above method.
  Further, in the above method, it is preferable that two or more positions are shifted by an integral multiple of the partition interval in the direction perpendicular to the partition direction.
[0011]
Further, in the above method, it is preferable that the two bases adjacent to each other are positioned in a direction parallel to the partition wall.
Moreover, it is preferable to pass through a drying process every time it applies for every color in the said method, and applies 1 color.
In the above method, it is preferable to use a paste having a viscosity of 1 to 100 Pa · s as the phosphor paste.
In the above method, the phosphor powder has a cumulative average particle size of 0.5 to 15 μm and a specific surface area of 0.1 to 5 m.²It is preferable to use phosphor powder that is / cc.
Moreover, it is preferable that after applying the phosphor paste in the above method, a step of drying with the phosphor coating surface facing down is performed.
In the above method, the phosphor paste is preferably a photosensitive phosphor paste.
[0012]
  Furthermore, the coating apparatus for applying a coating liquid to the concavo-convex substrate of the present invention faces the concavo-convex portion of the concavo-convex substrate, a table for fixing the concavo-convex substrate in which the concavo-convex portions are formed in a striped pattern in one direction on the surface.pluralHas discharge holeThe plurality of discharge holes are linearly arranged in a plurality of rows in the stripe direction of the concavo-convex portion of the concavo-convex substrate.A base, a supply means for supplying a coating liquid to the base, a moving means for relatively moving the table and the base in a three-dimensional manner, and an interval between an upper end portion of the convex portion of the concavo-convex substrate and a discharge hole outlet portion of the base And a control means for controlling the coating liquid, wherein the coating liquid is applied to the concave portions of the concavo-convex substrate.
[0013]
  Moreover, in the said apparatus, it is preferable that the said nozzle | cap | die has a manifold part which stores a coating liquid, and the exit part of a discharge hole is a plane.
  Further, in the above apparatus, it is preferable that the base has a manifold part for storing the coating liquid, and the discharge hole is configured by arranging needles having the same shape..
Further, in the above apparatus, the base has a plurality of manifold portions independent from each other and discharge holes for discharging each coating liquid from each manifold portion, and the shortest interval between the discharge holes connected to different manifold portions is 600 μm. Preferably there is.
  Moreover, it is preferable that two or more bases are arranged in the above apparatus.
  Further, in the above apparatus, it is preferable that two or more bases are arranged so as to be shifted by an integral multiple of the convex portion interval in a direction perpendicular to the stripe direction of the concave and convex portions of the concave and convex substrate.
  Moreover, it is preferable that two or more bases adjacent to each other in the above-described apparatus are arranged so as to be shifted in the stripe direction of the uneven portion of the uneven substrate.
  Furthermore, the plasma display panel manufacturing apparatus of the present invention is a paste containing phosphor powder that emits light in any one of red, green, and blue, and uses the coating liquid coating apparatus described above. Consists of features.
[0014]
DETAILED DESCRIPTION OF THE INVENTION
The present invention is a method of first applying a phosphor paste partially on a glass substrate 2 on which electrodes 1 and barrier ribs 3 as shown in FIG. 1 are formed, and in particular, emits three primary colors of red, blue and green. The present invention relates to a phosphor layer forming method in which the phosphors to be applied are respectively applied in stripes to form a red phosphor layer 4, a blue phosphor layer 5, and a green phosphor layer 6 as shown in FIG.
[0015]
Since red (R), blue (B), and green (G) form one pixel line with three stripes, it is necessary to repeat RGB or RBG.
[0016]
As a forming method therefor, first, a base having one discharge hole arranged for each of R, G, and B is run in parallel with the partition wall and / or while running a glass substrate ( 8), a method is used in which a phosphor paste is discharged and applied between barrier ribs at predetermined positions of each color. As a more efficient method, a plurality of nozzles (FIG. 5) having two or more discharge holes per color at predetermined application position intervals for each color (the center interval of the discharge holes is three times the partition wall pitch) are used. A method of applying simultaneously from the discharge holes (FIG. 9) can be used.
[0017]
In order to further improve the thickness of the paste applied between one stripe-shaped partition wall and increase the coating speed, a die having two or more discharge holes per stripe in a direction parallel to the partition wall. The method (FIG. 10) of applying simultaneously from a plurality of discharge holes can be used.
[0018]
In addition, it is possible to use one base having discharge holes for phosphor pastes that emit light of two or more different colors at the same time. In this case, different colors are used in order to avoid color mixing with other colors. The interval between the holes for discharging the phosphor paste is preferably 600 μm or more. In the high-definition plasma display panel, the interval between the partition walls is 100 to 400 μm. As an example, three rows of three colors are arranged by shifting in the partition direction so that the hole interval is a linear distance of 600 μm or more. It can be carried out by the method (FIG. 11).
[0019]
In the case where the bases for discharging the phosphor pastes of different colors are independent from each other, the coating can be carried out by running in parallel with the barrier ribs at the same speed and / or by running the glass substrate.
[0020]
As a more efficient method, two or more bases for discharging phosphor pastes that emit light of different colors are arranged for each color, or bases for simultaneously discharging phosphor pastes that emit light of two or more different colors. By using a method (FIG. 12) in which two or more are arranged and synchronized or moved in the same direction and at the same speed while being connected, one for each color is used. Compared to the case, the coating time can be shortened to half or less.
[0021]
At this time, the two or more units are shifted by an integral multiple of the partition interval in the direction perpendicular to the partition direction. When the positions of two or more adjacent units are “deviation” <“outer dimension of the base body”, the partition It is efficient and preferable to arrange it so as to be shifted in the parallel direction (FIG. 13).
[0022]
It is also preferable to use a method that undergoes a drying process every time one color is applied in order to avoid color mixing of adjacent phosphor pastes of different colors.
[0023]
The inner diameter of the discharge port used in the present invention is preferably equal to or smaller than the partition wall interval with respect to the partition wall interval of 100 to 400 μm, and needs to be larger than the particle diameter of the phosphor powder. In consideration of the particle size distribution of the phosphor powder and some aggregation, it is preferably 80 to 400 μm in order to stably discharge the phosphor paste.
[0024]
In addition, the discharge port shape used in the present invention is preferably a nozzle (FIG. 6) or a needle (FIG. 7), because the base is less likely to become dirty.
[0025]
Furthermore, when applying, the distance 9 between the upper end portion of the partition wall and the discharge hole outlet portion of the base is maintained at 0.01 to 2 mm, and the phosphor is moved while traveling at a constant speed and / or while traveling the glass substrate. It is preferable to apply the paste between the partition walls by discharging the paste at a constant flow rate. More preferably, it is 0.03 to 1 mm. By applying at this interval, the phosphor paste can be poured between the partition walls while avoiding contact with the upper end portions of the partition walls.
[0026]
Moreover, it is preferable to use a paste having a viscosity of 1 to 100 Pa · s as the phosphor paste used in the present invention. More preferably, it is 5 to 50 Pa · s.
[0027]
The composition of the phosphor paste is preferably composed of components that are removed by evaporation or decomposition in the drying and baking steps after coating, except for the phosphor powder. By carrying out like this, the fluorescent substance layer comprised only with fluorescent substance after baking can be formed. As such a phosphor paste, for example, a composition composed of phosphor powder, an organic compound dispersant, a water-soluble organic binder, and water. Alternatively, a composition composed of phosphor powder, an organic binder, an organic solvent, a composition obtained by adding an organic compound dispersant to the composition, and the like can be used.
[0028]
Moreover, patterning by photolithography can be made possible by imparting photosensitivity to such a composition. In this case, it is effective to remove the phosphor formed in unnecessary portions other than the upper part of the partition wall and the partition wall forming part in the coating process. After the coating, it is exposed through a photomask, and the paste in the exposed portion is solubilized or insolubilized in the developer, whereby unnecessary portions can be removed in the developing step and a phosphor layer can be formed.
[0029]
The phosphor powder used in the present invention is not particularly limited. For example, in red, Y₂O_Three: Eu, YVO_Four: Eu, (Y, Gd) BO_Three: Eu, Y₂O_ThreeS: Eu, γ-Zn_Three(PO_Four)₂: Mn, (ZnCd) S: Ag + In₂O_Threeand so on. In green, Zn₂GeO₂: M, BaAl₁₂O₁₉: Mn, Zn₂SiO_Four: Mn, LaPO_Four: Tb, ZnS: Cu, Al, ZnS: Au, Cu, Al, (ZnCd) S: Cu, Al, Zn₂SiO_Four: Mn, As, Y_ThreeAl_FiveO₁₂: Ce, CeMgAl₁₁O₁₉: Tb, Gd₂O₂S: Tb, Y_ThreeAl_FiveO₁₂: Tb, ZnO: Zn and the like. In blue, Sr_Five(PO_Four)_ThreeCl: Eu, BaMgAl₁₄O_{twenty three}: Eu, BaMgAl₁₆O₂₇: Eu, BaMg₂Al₁₄O_{twenty four}: Eu, ZnS: Ag + red pigment, Y₂SiO_Three: Ce and the like.
[0030]
And at least one element selected from the group consisting of thulium (Tm), terbium (Tb) and europium (Eu), and at least one element selected from yttrium (Y), gadolinium (Gd) and lutetium (Lu). A tantalate rare earth phosphor substituted with a matrix rare earth element can be used. Preferably, the rare earth phosphor of tantalate is represented by the formula Y_1-xEu_xTaO_Four(Wherein X is approximately 0.005 to 0.1). The europium activated yttrium tantalate phosphor. Europium activated yttrium tantalate is preferred for the red phosphor, and tantalate rare earth phosphor is the composition formula Y for the green phosphor._1-xTb_xTaO_Four(Wherein X is approximately 0.001 to 0.2), terbium-activated yttrium tantalate is preferred. For blue phosphor, tantalate rare earth phosphor is Y_1-xTb_xTaO_FourThulium activated yttrium tantalate represented by the formula (wherein X is approximately 0.001 to 0.2) is preferred.
[0031]
In the green phosphor, Mn is zinc silicate (Zn₂SiO_Four) Manganese-activated zinc phosphor (Zn) having an average particle size of 2 μm or more and 8 μm or less activated by 0.2% by weight or more and less than 0.1% by weight based on the base amount₂SiO_Four: Mn) and the general formula is (Zn_1-xMn_x) O ・ αSiO₂A manganese-activated zinc silicate phosphor represented by the formula (wherein X and α are in the range of 0.01 ≦ X ≦ 0.2 and 0.5 <α ≦ 1.5) is also preferably used. It is done.
[0032]
The phosphor powder particle size used in the above is selected in consideration of the line width, width interval (space) and thickness of the phosphor layer pattern to be produced, but the powder has a cumulative average particle size of 0.5. -15 μm, preferably 0.5-6 μm, specific surface area 0.1-5 m²/ G is preferable. More preferably, the particle diameter is 1 to 6 μm and the specific surface area is 0.5 to 4 m.²/ G. If it is in this range, the discharge hole is not easily clogged, stable discharge is possible, and a highly accurate pattern shape can be obtained. Moreover, it is preferable because the phosphor has good luminous efficiency and a long lifetime. Powder particle diameter is less than 0.5μm, specific surface area is 5m²When the amount exceeds / g, the powder becomes too fine, and the powder tends to agglomerate. When patterning is performed by photolithography, light is scattered during exposure and the unexposed portion is photocured. For this reason, a residual film of the pattern (excessive phosphor remains in the unexposed portion) occurs during development, and a high-definition pattern cannot be obtained. In addition, the luminous efficiency and lifetime of the phosphor are reduced.
[0033]
As the shape of the phosphor powder, a polyhedral (granular) one can be used, but a powder without aggregation is preferable. Among them, the spherical powder is more preferable because it hardly causes clogging of discharge holes and can be stably discharged, and when performing pattern processing by photolithography, the influence of scattering during exposure can be reduced. The spherical powder preferably has a particle shape with a sphericity of 80% by number or more. More preferably, the sphericity is 90% by number or more. When the sphericity is less than 80% by number, it is difficult to obtain a high-definition pattern due to the influence of scattering by the phosphor powder during ultraviolet exposure. The spherical ratio is measured by photographing the phosphor powder with an optical microscope at a magnification of 300 times, and counting the particles that can be counted, and the ratio of the spherical particles is defined as the spherical ratio.
[0034]
As an organic component used for this invention, additives, such as an organic binder, a solvent, and a dispersing agent, a plasticizer, a leveling agent as needed, can be included.
[0035]
Specific examples of organic binders include (poly) vinyl butyral, (poly) vinyl acetate, (poly) vinyl alcohol, cellulosic polymers (eg, methylcellulose, ethylcellulose, hydroxyethylcellulose, methylhydroxyethylcellulose), polyethylene, and silicon polymers. (Eg (poly) methylsiloxane, (poly) methylphenylsiloxane), polystyrene, butadiene / styrene copolymers, polystyrene, (poly) vinylpyrrolidone, polyamides, high molecular weight polyethers, copolymers of ethylene oxide and propylene oxide polyacrylamide and various Acrylic polymers (eg, sodium polyacrylate, (poly) lower alkyl acrylate, (poly) lower alkyl methacrylate, Fine lower alkyl acrylates and methacrylates and various copolymers and multi-polymers.
[0036]
Specific examples of the plasticizer include dibutyl phthalate, dioctyl phthalate, polyethylene glycol, glycerin and the like.
[0037]
Specific examples of the organic solvent include methyl cellosolve, ethyl cellosolve, butyl cellosolve, methyl ethyl ketone, dioxane, acetone, cyclohexanone, cyclopentanone, isobutyl alcohol, isopropyl alcohol, tetrahydrofuran, butyl carbitol acetate, dimethyl sulfoxide, γ- Butyrolactone, terpineol, benzyl alcohol, bromobenzene, chlorobenzene, dibromobenzene, dichlorobenzene, bromobenzoic acid, chlorobenzoic acid, and the like, and organic solvent mixtures containing one or more of these are used.
[0038]
Anionic and nonionic surfactants are used as the organic compound dispersant.
[0039]
In the present invention, when pattern processing is performed by photolithography, it is also possible to use a photosensitive phosphor paste having an organic component containing a photosensitive compound and a phosphor powder as essential components.
[0040]
The organic component used in the photosensitive phosphor paste is preferably an organic component containing a photosensitive compound in an amount of 10% by weight or more, more preferably 25% by weight or more. The organic component containing a photosensitive compound includes a photosensitive component selected from at least one of a photosensitive polymer, a photosensitive monomer, and a photosensitive oligomer, and further includes a photopolymerization initiator and a sensitizer UV as necessary. An additive such as a light absorber is also added.
[0041]
The amount of the organic component containing the photosensitive compound used in the present invention is preferably 15 to 60% by weight. If it is 15% by weight or less, the pattern property is deteriorated due to insufficient photosensitivity, and if it is 60% by weight or more, the binder removal property at the time of firing is poor and the firing is insufficient.
[0042]
As the photosensitive component, there are a light-insolubilized type and a light-solubilized type,
(1) Containing a functional monomer, oligomer or polymer having one or more unsaturated groups in the molecule
(2) Containing photosensitive compounds such as aromatic diazo compounds, aromatic azide compounds, and organic halogen compounds
(3) There are so-called diazo resins such as a condensate of diazo amine and formaldehyde.
[0043]
In addition, as a light-soluble type,
(4) Containing inorganic salts of diazo compounds and organic acids, quinonediazos
(5) For example, phenol, novolak resin naphthoquinone 1,2-diazide-5-sulfonic acid ester and the like in which quinonediazos are bonded to an appropriate polymer binder.
[0044]
As the photosensitive component used in the present invention, all of the above-mentioned components can be used. As the photosensitive paste, the photosensitive component (1) that can be used simply by mixing with inorganic fine particles is preferable.
[0045]
The photosensitive monomer is a compound containing a carbon-carbon unsaturated bond, and specific examples thereof include methyl acrylate, ethyl acrylate, n-propyl acrylate, isopropyl acrylate, n-butyl acrylate, sec-butyl acrylate, sec. -Butyl acrylate, iso-butyl acrylate, tert-butyl acrylate, n-pentyl acrylate, allyl acrylate, benzyl acrylate, butoxyethyl acrylate, butoxytriethylene glycol acrylate, cyclohexyl acrylate, dicyclopentanyl acrylate, dicyclopentenyl acrylate, 2 -Ethylhexyl acrylate, glycerol acrylate, glycidyl acrylate, heptadecafluorodecyl acrylate, 2 Hydroxyethyl acrylate, isobornyl acrylate, 2-hydroxypropyl acrylate, isodecyl acrylate, isooctyl acrylate, lauryl acrylate, 2-methoxyethyl acrylate, methoxyethylene glycol acrylate, methoxydiethylene glycol acrylate, octafluoropentyl acrylate, phenoxyethyl acrylate, stearyl Acrylate, trifluoroethyl acrylate, allylated cyclohexyl diacrylate, 1,4-butanediol diacrylate, 1,3-butylene glycol diacrylate, ethylene glycol diacrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, polyethylene glycol diacrylate , Dipen Erythritol hexaacrylate, dipentaerythritol monohydroxypentaacrylate, ditrimethylolpropane tetraacrylate, glycerol diacrylate, methoxylated cyclohexyl diacrylate, neopentyl glycol diacrylate, propylene glycol diacrylate, polypropylene glycol diacrylate, triglycerol diacrylate, tri Methylolpropane triacrylate, acrylamide, aminoethyl acrylate, phenyl acrylate, phenoxyethyl acrylate, benzyl acrylate, 1-naphthyl acrylate, 2-naphthyl acrylate, bisphenol A diacrylate, diacrylate of bisphenol A-ethylene oxide adduct, bisphenol A- Diacrylate of propylene oxide adduct, thiophenol acrylate, benzyl mercaptan acrylate, a monomer in which 1 to 5 of hydrogen atoms of these aromatic rings are substituted with chlorine or bromine atoms, or styrene, p-methylstyrene O-methylstyrene, m-methylstyrene, chlorinated styrene, brominated styrene, α-methylstyrene, chlorinated α-methylstyrene, brominated α-methylstyrene, chloromethylstyrene, hydroxymethylstyrene, carboxymethylstyrene, Vinyl naphthalene, vinyl anthracene, vinyl carbazole, and acrylates in the above compounds, in which some or all of the acrylates are replaced with methacrylate, γ-methacryloxypropyltrimethoxysilane, 1-vinyl-2-pyrrolide And the like. In the present invention, one or more of these can be used.
[0046]
In addition to these, the development property after exposure can be improved by adding an unsaturated acid such as an unsaturated carboxylic acid. Specific examples of the unsaturated carboxylic acid include acrylic acid, methacrylic acid, itaconic acid, crotonic acid, maleic acid, fumaric acid, vinyl acetic acid, and acid anhydrides thereof.
[0047]
Examples of the binder include polyvinyl alcohol, polyvinyl butyral, methacrylic ester polymer, acrylic ester polymer, acrylic ester-methacrylic ester copolymer, α-methylstyrene polymer, and butyl methacrylate resin.
[0048]
Moreover, the oligomer and polymer obtained by superposing | polymerizing at least 1 type among the compounds which have the above-mentioned carbon-carbon double bond can be used. In the polymerization, it can be copolymerized with other photosensitive monomers so that the content of these monomers is 10% by weight or more, more preferably 35% by weight or more.
[0049]
As a monomer to be copolymerized, the developability after exposure can be improved by copolymerizing an unsaturated acid such as an unsaturated carboxylic acid. Specific examples of the unsaturated carboxylic acid include acrylic acid, methacrylic acid, itaconic acid, crotonic acid, maleic acid, fumaric acid, vinyl acetic acid, and acid anhydrides thereof.
[0050]
The acid value (AV) of the polymer or oligomer having an acidic group such as a carboxyl group in the side chain thus obtained is preferably 50 to 180, more preferably 70 to 140. When the acid value exceeds 180, the allowable development width becomes narrow. If the acid value is less than 50, the solubility of the unexposed area in the developing solution is lowered. Therefore, when the developing solution concentration is increased, the exposed area is peeled off and it is difficult to obtain a high-definition pattern.
[0051]
By adding a photoreactive group to the side chain or molecular end of the polymer or oligomer described above, it can be used as a photosensitive polymer or photosensitive oligomer having photosensitivity.
[0052]
Preferred photoreactive groups are those having an ethylenically unsaturated group. Examples of the ethylenically unsaturated group include a vinyl group, an allyl group, an acrylic group, and a methacryl group.
[0053]
Such a side chain can be added to an oligomer or polymer by using an ethylenically unsaturated compound having a glycidyl group or an isocyanate group relative to a mercapto group, amino group, hydroxyl group or carboxyl group in the polymer. There is a method of making an acid chloride or allyl chloride by addition reaction.
[0054]
Examples of the ethylenically unsaturated compound having a glycidyl group include glycidyl acrylate, glycidyl methacrylate, allyl glycidyl ether, glycidyl ethyl acrylate, crotonyl glycidyl ether, glycidyl crotonic acid, and glycidyl ether of isocrotonic acid.
[0055]
Examples of the ethylenically unsaturated compound having an isocyanate group include (meth) acryloyl isocyanate and (meth) acryloylethyl isocyanate.
[0056]
In addition, the ethylenically unsaturated compound having a glycidyl group or an isocyanate group, acrylic acid chloride, methacrylic acid chloride or allyl chloride is 0.05 to 1 molar equivalent with respect to a mercapto group, amino group, hydroxyl group or carboxyl group in the polymer. It is preferable to add.
[0057]
Specific examples of the photopolymerization initiator include benzophenone, methyl o-benzoylbenzoate, 4,4-bis (dimethylamine) benzophenone, 4,4-bis (diethylamino) benzophenone, 4,4-dichlorobenzophenone, 4 -Benzoyl-4-methyldiphenyl ketone, dibenzyl ketone, fluorenone, 2,2-diethoxyacetophenone, 2,2-dimethoxy-2-phenyl-2-phenylacetophenone, 2-hydroxy-2-methylpropiophenone, p -T-butyldichloroacetophenone, thioxanthone, 2-methylthioxanthone, 2-chlorothioxanthone, 2-isopropylthioxanthone, diethylthioxanthone, benzyl, benzyldimethylketanol, benzylmethoxyethyl acetal, benzoy , Benzoin methyl ether, benzoin butyl ether, anthraquinone, 2-t-butylanthraquinone, 2-amylanthraquinone, β-chloroanthraquinone, anthrone, benzanthrone, dibenzosuberone, methyleneanthrone, 4-azidobenzalacetophenone, 2,6- Bis (p-azidobenzylidene) cyclohexanone, 2,6-bis (p-azidobenzylidene) -4-methylcyclohexanone, 2-phenyl-1,2-butadion-2- (o-methoxycarbonyl) oxime, 1-phenyl- Propanedion-2- (o-ethoxycarbonyl) oxime, 1,3-diphenyl-propanetrione-2- (o-ethoxycarbonyl) oxime, 1-phenyl-3-ethoxy-propanetrione-2- (o-benzoyl) ) Oxime, Michler's ketone, 2-methyl- [4- (methylthio) phenyl] -2-morpholino-1-propanone, naphthalenesulfonyl chloride, quinolinesulfonyl chloride, N-phenylthioacridone, 4,4-azobisisobutyro Photoreducing dyes such as nitrile, diphenyl disulfide, benzthiazole disulfide, triphenylphosphine, camphorquinone, carbon tetrabromide, tribromophenylsulfone, benzoin peroxide and eosin, methylene blue and reduction of ascorbic acid, triethanolamine, etc. Combinations of agents are included. In the present invention, one or more of these can be used.
[0058]
A photoinitiator is added in 0.1-6 weight% with respect to the photosensitive component, More preferably, it is 0.2-5 weight%. If the amount of the polymerization initiator is too small, the sensitivity to light becomes dull, and if the amount of the photopolymerization initiator is too large, the residual ratio of the exposed area may be too large.
[0059]
It is also effective to add an ultraviolet light absorber. High definition and high resolution can be obtained by adding a light-absorbing agent having a high ultraviolet absorption effect. As the ultraviolet light absorber, an organic dye, particularly an organic dye having a high UV absorption coefficient in a wavelength range of 350 to 450 nm is preferably used. Specifically, azo dyes, amino ketone dyes, xanthene dyes, quinoline dyes, amino ketone dyes, anthraquinone dyes, benzophenone dyes, diphenyl cyanoacrylate dyes, triazine dyes, p-aminobenzoic acid dyes, and the like can be used. . Even when an organic dye is added as a light-absorbing agent, it is preferable because it does not remain in the insulating film after baking and the deterioration of the insulating film characteristics due to the light-absorbing agent can be reduced. Of these, azo dyes and benzophenone dyes are preferable. The addition amount of the organic dye is preferably 0.05 to 5% by weight. If it is 0.05% by weight or less, the effect of adding an ultraviolet light absorber is reduced, and if it exceeds 5% by weight, the insulating film properties after firing are deteriorated. More preferably, it is 0.15-1 weight%. An example of a method for adding an ultraviolet light absorber composed of an organic dye is to prepare a solution in which an organic dye is dissolved in an organic solvent in advance, and then mix the phosphor powder in the organic solvent and then dry it. By this method, a so-called capsule-like powder in which the surface of each phosphor powder is coated with an organic film can be produced.
[0060]
A sensitizer is added in order to improve sensitivity. Specific examples of the sensitizer include 2,4-diethylthioxanthone, isopropylthioxanthone, 2,3-bis (4-diethylaminobenzal) cyclopentanone, 2,6-bis (4-dimethylaminobenzal) cyclohexanone, 2,6-bis (4-dimethylaminobenzal) -4-methylcyclohexanone, Michler's ketone, 4,4-bis (diethylamino) -benzophenone, 4,4-bis (dimethylamino) chalcone, 4,4-bis (diethylamino) ) Chalcone, p-dimethylaminocinnamylidene indanone, p-dimethylaminobenzylidene indanone, 2- (p-dimethylaminophenylvinylene) -isonaphthothiazole, 1,3-bis (4-dimethylaminobenzal) acetone 1,3-carbonyl-bis (4-diethylamino) Benzal) acetone, 3,3-carbonyl-bis (7-diethylaminocoumarin), N-phenyl-N-ethylethanolamine, N-phenylethanolamine, N-tolyldiethanolamine, N-phenylethanolamine, isoamyl dimethylaminobenzoate And isoamyl diethylaminobenzoate, 3-phenyl-5-benzoylthiotetrazole, 1-phenyl-5-ethoxycarbonylthiotetrazole and the like. In the present invention, one or more of these can be used. Some sensitizers can also be used as photopolymerization initiators. When adding a sensitizer to the photosensitive paste of this invention, the addition amount is 0.05-10 weight% normally with respect to the photosensitive component, More preferably, it is 0.1-10 weight%. If the amount of the sensitizer is too small, the effect of improving the photosensitivity is not exhibited, and if the amount of the sensitizer is too large, the residual ratio of the exposed portion may be too small.
[0061]
Phosphor pastes or photosensitive phosphor pastes using these are usually phosphor powders, organic binders, ultraviolet light absorbers, photosensitive polymers, photosensitive monomers, photopolymerization initiators, dispersants, plasticizers, solvents, etc. After preparing various components so as to have a predetermined composition, they are uniformly mixed and dispersed with a three-roller or a kneader. Alternatively, the dispersant may be dissolved in a solvent in advance, or the phosphor powder may be mixed with other components after surface treatment with the dispersant or the ultraviolet light absorber.
[0062]
The glass substrate used in the present invention is not particularly limited, but general soda lime glass, glass obtained by annealing soda lime glass, high strain point glass (for example, “PD-200” manufactured by Asahi Glass Co., Ltd.), or the like. Can be used. The size of the glass substrate is not particularly limited, and glass having a thickness of 1 to 5 mm can be used.
[0063]
A plasma display substrate can be obtained by forming a phosphor layer on a glass substrate on which electrodes and barrier ribs are formed. Further, a substrate in which a dielectric layer is formed in addition to the electrodes and the partition walls may be used. The electrode can be formed of silver, aluminum, copper, gold, nickel, tin oxide, ITO or the like using screen printing or a photosensitive conductive paste.
[0064]
As the partition wall, a lattice-shaped or stripe-shaped partition wall can be used, but the present invention is particularly effective in a stripe-shaped partition wall. As a pitch of a partition, 100-500 micrometers is preferred. The height of the partition walls is preferably 50 to 200 μm.
[0065]
In the present invention, the phosphor layer can also be formed on the side surfaces of the partition walls in the heating step of drying the paste applied between the partition walls by a die having nozzles or nozzles or needles. By forming the phosphor layer not only between the partition walls but also on the side surfaces of the partition walls, the area of the phosphor surface can be increased, which is effective in improving the brightness of the plasma display. Drying is performed with the phosphor-coated surface of the glass substrate facing up, but it is also preferable to hold and hold the glass substrate facing down.
[0066]
Next, an example of a method for forming a phosphor layer of a plasma display according to the present invention will be described. However, the present invention is not limited to this.
[0067]
(1) Application process
On the glass substrate (FIG. 1) on which the electrode layer and the barrier rib layer are formed, the phosphor paste is applied between the predetermined barrier ribs of each color. As a coating method, a nozzle or nozzle or needle outlet having a discharge hole is set at a height of 0.01 to 2 mm from the upper end of the partition (FIG. 4) to form a striped partition. The phosphor paste is discharged at a constant flow rate and is allowed to flow between the barrier ribs while running at a constant speed in parallel with the.
[0068]
The nozzles, nozzles, or needles having the discharge holes used at this time are arranged with one discharge hole for each phosphor paste of each color of R, G, B, and applied one by one between the partition walls. However, as a more efficient method, a die having two or more discharge holes arranged on a straight line at a predetermined coating position interval for each color (see FIG. 8). 5), it is preferable to apply simultaneously between two or more partition walls (FIG. 9). Further, in order to further increase the thickness of the paste applied between one stripe-shaped partition wall and increase the coating speed, one line for each color or one line on a predetermined coating position interval for each color. A method of applying two or more nozzles, nozzles or needles each having two or more discharge holes arranged in parallel in the direction parallel to the partition wall (FIG. 10) can be used. In addition, it is possible to use one nozzle or nozzle or needle having holes for discharging two or more different colors of phosphor paste at the same time and having a discharge hole interval of 600 μm or more (FIG. 11).
[0069]
When the nozzles or nozzles or needles for discharging phosphor pastes of different colors run independently, each color is applied while running in parallel with the barrier ribs at the same speed.
As a more efficient method, two or more bases or nozzles or needles for discharging phosphor pastes of different colors are arranged for each color and applied to the entire panel surface in a synchronized or connected state ( FIG. 12) is also possible.
The viscosity of the phosphor paste used is preferably 1 to 100 Pa · s.
[0070]
By using a die or a nozzle or a needle having such discharge holes, the phosphor pastes of R, G, and B are applied sequentially or simultaneously in stripes. In order to avoid color mixing of adjacent different colors, it is also preferable to use a method that undergoes a drying process every time one color is applied.
[0071]
In addition, the phosphor of the plasma display needs to have a thickness of 10 to 50 μm at the bottom and side surfaces (half the height of the partition wall), and shrinkage after drying and firing depending on the phosphor powder ratio in the phosphor paste used. It is necessary to control the coating thickness in consideration of the above.
[0072]
(2) Drying process
After coating, drying is performed. Here, the coating is performed with the coated surface facing up, but drying with the coated surface facing down is also preferred. By doing so, the formability of the phosphor layer on the side wall of the partition can be improved. The angle when the coating surface is down is such that the glass substrate is at an angle of 0 to 30 degrees with respect to the horizontal plane. The drying temperature and drying time vary depending on the paste composition and viscosity, but it is preferably performed at 50 to 200 ° C. for 5 to 60 minutes.
[0073]
(3) Firing process
Next, firing is performed in a firing furnace. The firing atmosphere and temperature vary depending on the type of paste and substrate, but firing is performed in an atmosphere of air, nitrogen, hydrogen, or the like. The firing temperature is 400 to 550 ° C. As the firing furnace, a batch-type firing furnace or a belt-type or roller hearth-type continuous firing furnace can be used.
[0074]
Through the steps (1) to (3), a back plate for a plasma display panel in which a phosphor layer is formed between partition walls on a glass substrate can be produced.
[0075]
Furthermore, in the coating process, when removing the phosphor formed on unnecessary portions other than the upper part of the partition wall or the partition forming part, pattern processing by photolithography is performed by using a phosphor paste imparted with photosensitivity. Can be made possible. In this case, after coating, exposure is performed through a photomask, and the paste in the exposed portion is solubilized or insolubilized in the developer, thereby removing unnecessary portions in the developing step. Then, an exposure step (4) and a development step (5) are performed.
[0076]
(4) Exposure process
A method of performing mask exposure using a photomask is common, as is done in normal photolithography. As the mask to be used, either a negative type or a positive type is selected depending on the type of the photosensitive organic component. Alternatively, a method of directly drawing with a laser beam or the like without using a photomask may be used. As the exposure apparatus, a stepper exposure machine, a proximity exposure machine or the like can be used.
[0077]
In addition, when performing large-area exposure, a photosensitive paste is applied on a substrate such as a glass substrate, and then exposure is performed while being conveyed, thereby exposing a large area with an exposure machine having a small effective exposure area. Can do.
[0078]
Examples of the active light source used in this case include visible light, near ultraviolet light, ultraviolet light, electron beam, X-ray, and laser light. Among these, ultraviolet light is preferable. Mercury lamps, ultra-high pressure mercury lamps, halogen lamps, germicidal lamps, etc. can be used. Among these, an ultrahigh pressure mercury lamp is suitable.
[0079]
When using a photomask, the design of the pattern width is important. Usually, the same width as the width (space) obtained by subtracting the partition wall width from the partition pitch is used, but a photomask having a pattern 0 to 30 μm narrower than the space may be used in consideration of alignment accuracy and light scattering during exposure. Good.
[0080]
(5) Development process
After the exposure, development is performed using a developer. In this case, the immersion method, the spray method, and the brush method are used.
[0081]
As the developer, an organic solvent capable of dissolving the organic components in the photosensitive paste can be used. Further, water may be added to the organic solvent as long as its dissolving power is not lost. When a compound having an acidic group such as a carboxyl group is present in the photosensitive paste, development can be performed with an aqueous alkaline solution. A metal alkali aqueous solution such as sodium hydroxide or calcium hydroxide aqueous solution can be used as the alkali aqueous solution. However, it is preferable to use an organic alkali aqueous solution because an alkali component can be easily removed during firing.
[0082]
An amine compound can be used as the organic alkali. Specific examples include tetramethylammonium hydroxide, trimethylbenzylammonium hydroxide, monoethanolamine, and diethanolamine. The concentration of the alkaline aqueous solution is usually 0.01 to 10% by weight, more preferably 0.1 to 5% by weight. If the alkali concentration is too low, the unexposed portion is not removed, and if the alkali concentration is too high, the pattern portion may be peeled off and the exposed portion may be corroded. The development temperature during development is preferably 20 to 50 ° C. in terms of process control.
[0083]
Moreover, you may introduce | transduce a 50-300 degreeC heating process in the above process for the purpose of drying and a preliminary reaction.
[0084]
The plasma display panel back plate (FIG. 3) obtained by the above steps is sealed together with the front and back glass substrates and sealed with a rare gas such as helium, neon, xenon, etc., so that the panel portion of the plasma display Can be manufactured. Furthermore, a plasma display can be manufactured by mounting a driver IC for driving.
[0085]
Next, the apparatus for apply | coating the coating liquid of this invention is demonstrated.
14 is an overall perspective view of a coating liquid coating apparatus according to an embodiment of the present invention, and FIG. 15 is a schematic view around the table 42 and the base 50 in FIG. It is a figure for doing. 17 to 22 show the structure of a base according to an embodiment of the present invention.
[0086]
First, the overall configuration of the coating liquid coating apparatus will be described. FIG. 14 shows an example of a coating apparatus applied to the plasma display panel manufacturing apparatus according to the present invention. This coating apparatus includes a base 40. A pair of guide groove rails 44 is provided on the base 40, and the table 42 is disposed on the guide groove rails 44. A plurality of suction holes 43 are provided on the upper surface of the table 42 so that the substrate 41 can be fixed to the table surface by vacuum suction. The substrate 41 is moved up and down on the table 42 by lift pins (not shown). Further, the table 42 can reciprocate on the guide groove rail 44 in the X-axis direction via the slide legs 45.
[0087]
A feed screw 46 constituting a feed screw mechanism shown in FIG. 15 extends through a nut-shaped connector 47 fixed to the lower surface of the table 42 between the pair of guide groove rails 44. Both ends of the feed screw 46 are rotatably supported by a bearing 48, and an AC servo motor 49 is connected to one end of the feed screw 46.
[0088]
As shown in FIG. 14, above the table 42, a base 50 for discharging the phosphor paste is connected to an elevating mechanism 56 and a width direction moving mechanism 59 via a holder 51. The elevating mechanism 56 includes an elevating bracket 54 that can be raised and lowered, and is attached to a pair of guide rods inside the casing of the elevating mechanism 56 so as to be movable up and down. In the casing, a feed screw (not shown) made of a ball screw is also rotatably disposed between the guide rods and is connected to the lifting bracket 54 via a nut-type connector. . Further, an AC servo motor (not shown) is connected to the upper end of the feed screw, and the lifting bracket 54 can be arbitrarily lifted and lowered by the rotation of the AC servo motor.
[0089]
Furthermore, the elevating mechanism 56 is connected to the width direction moving mechanism 59 via a Y-axis moving bracket 57 (actuator). The width direction moving mechanism 59 moves the Y axis moving bracket 57 so as to reciprocate in the width direction of the base 50, that is, the Y axis direction. Guide rods, feed screws, nut type connectors, AC servo motors, and the like necessary for operation are arranged in the casing in the same manner as the lifting mechanism 56. The width direction moving mechanism 59 is fixed on the base 40 by a column 58.
[0090]
With these configurations, the base 50 can be freely moved in the Z-axis and Y-axis directions.
[0091]
The base 50 extends horizontally in the direction perpendicular to the reciprocating direction of the table 42, that is, in the Y-axis direction, but the U-shaped holder 51 that directly holds the base 50 is rotatably supported in the lifting bracket 54. It can be freely rotated in the vertical direction in the direction of the arrow in the figure.
[0092]
A horizontal bar 52 is also fixed to the lifting bracket 54 above the holder 51. Electromagnetically operated linear actuators 53 are attached to both ends of the horizontal bar 52. The linear actuator 53 has a telescopic rod 55 protruding from the lower surface of the horizontal bar 52, and the rotational angle of the holder 51 can be regulated by contacting the both ends of the holder 51 with the telescopic rod 55. A degree of inclination of 50 can be arbitrarily set.
[0093]
Further, referring to FIG. 14, an inverted L-shaped sensor column 60 is fixed to the upper surface of the base 40, and the position (height) of the top of the convex portion of the substrate 41 on the table 42 is measured at the tip thereof. A height sensor 61 is attached. Next to the height sensor 61, a camera 78 for detecting the position between the partition walls of the substrate 41 is attached to the camera column 77. As shown in FIG. 15, the camera 78 is electrically connected to the image processing measure 74, and the change in the position between the partition walls can be obtained quantitatively.
[0094]
Further, a sensor 76 that detects the position of the lower end surface of the base 50 with the discharge hole in the direction perpendicular to the table 42 is attached to one end of the table 42.
[0095]
As shown in FIG. 15, the base 50 is filled with a phosphor paste 63 in its manifold 62, and a discharge hole 64 is formed on the front end surface of the discharge hole. Then, the phosphor paste 63 is discharged from the discharge hole 64. A supply hose 65 is connected to the base 50, and further connected to a discharge electromagnetic switching valve 66, a supply unit 67, a suction hose 68, a suction electromagnetic switching valve 69, and a phosphor paste tank 70. A phosphor paste 63 is stored in the phosphor paste tank 70. The phosphor paste 63 is made of a paste containing phosphor powder that emits light in any one of red, green, and blue.
[0096]
Specific examples of the supply unit 67 include a constant capacity pump such as a piston and a diaphragm type, a tubing pump, a gear pump, a mono pump, and a pressure feed controller for extruding a liquid with a gas pressure. In response to a control signal from the supply device controller 71, the supply unit 67 and each electromagnetic switching valve are operated to suck the phosphor paste 63 from the phosphor paste tank 70, so that the phosphor paste 63 is applied to the base 50. Can be supplied. In order to stabilize the suction operation of the phosphor paste 63 from the phosphor paste tank 70 to the constant capacity pump, the phosphor paste tank 70 is used as a sealed container, and the pressure is increased with a gas such as air or nitrogen as an inert gas. It may be added. In order to always apply a constant pressure with air, nitrogen or the like, the phosphor paste tank 70 may be connected to a supply device such as air or nitrogen to control the pressure. The magnitude of the pressure is preferably 0.01 to 1 MPa, particularly 0.02 to 0.5 MPa.
[0097]
The supply device controller 71 is further electrically connected to the overall controller 72. All control information such as information from the image processing device 79 of the camera 78, such as the electric input of the motor controller 73 and the height sensor 61, is electrically connected to the overall controller 72, and overall sequence control is also performed. I can manage. The general controller 72 may be a computer, a sequencer, or any controller having a control function.
[0098]
The motor controller 73 includes an AC servo motor 49 for driving the table 42, actuators 76 and 78 (for example, AC servo motors) of the elevating mechanism 56 and the width direction moving mechanism 59, and a moving position of the table 42. A signal from the position sensor 75 for detecting the signal, a signal from each of the Y and Z axis linear sensors (not shown) for detecting the operating position of the cap 50, and the like are input. Instead of using the position sensor 75, it is also possible to incorporate an encoder in the AC servo motor 49 and detect the position of the table 42 based on a pulse signal output from the encoder.
[0099]
Next, a phosphor paste application method using the plasma display manufacturing apparatus will be described.
[0100]
First, when the origin of each operating unit is returned, the table 42 and the base 50 move to the X-axis, Y-axis, and Z-axis preparation positions, respectively. At this time, the phosphor paste is already filled from the phosphor paste tank 70 to the base 50, the discharge electromagnetic switching valve 66 is opened, and the suction electromagnetic switching valve 69 is closed. Then, lift pins (not shown) rise on the surface of the table 42, and the substrate 41 is placed on the lift pins from a loader (not shown).
[0101]
Next, the lift pins are lowered to place the substrate 41 on the upper surface of the table, and after positioning on the table 42 by an alignment device (not shown), the substrate 41 is sucked.
[0102]
Next, the table 42 moves until the partition wall of the substrate 41 comes under the camera 78 and the height sensor 61 and stops. The camera 78 is adjusted in advance so as to project the end of the partition wall on the substrate 41 positioned on the table 42, detects the position between the partition walls at the end by image processing, and is positioned from the camera reference point. Find the amount of change. On the other hand, the distance between the reference point of the camera 78 and the discharge hole 64 located at the end of the base 50 at the predetermined Y-axis coordinate position is measured at the time of prior adjustment and is input to the overall controller 72 as information. Therefore, when the positional change amount between the partition walls from the camera reference point is transmitted from the image processing device 79, the discharge hole 64 positioned at the end of the base 50 is directly above the partition between the partition walls. The Y-axis coordinate value is calculated, and the base 50 is moved to that position. The camera 78 can have the same function even when attached to the base 50 or the holder 51.
[0103]
As a result, the centers of all the discharge ports of the base 50 have been moved between the partition walls to which the phosphor paste is applied, and the relative positioning of the base 50 and the substrate 41 is completed.
[0104]
The height sensor 61 detects the vertical position of the top of the partition wall of the substrate 41 and calculates the height of the top of the partition wall of the substrate 41 from the difference in position with the top surface of the table 42. To this height, a gap value between the endmost part of the base 50 and the top of the partition wall of the substrate 41 given in advance is added, and a value to be lowered on the Z-axis linear sensor of the base 50 is calculated. The base 50 is moved to that position. As a result, even if the top position of the partition wall on the table 42 changes for each substrate, the gap between the end of the base 50 important for coating and the top of the partition wall on the substrate 41 can always be kept constant. .
[0105]
The height sensor 61 applicable to the present invention has a measurable principle such as a non-contact measurement type using a laser or ultrasonic wave, a contact measurement type using a dial gauge, a differential transformer, or the like. Anything can be used.
[0106]
Next, the operation is started with the table 42 directed toward the base 50, and the speed is increased to a predetermined coating speed before the application start position of the substrate 41 reaches just below the discharge hole of the base 50. The distance between the operation start position of the table 42 and the application start position must be sufficiently secured so that the table 42 can be increased to the application speed.
[0107]
Further, a position sensor 65 for detecting the position of the table 42 is arranged until the application start position of the substrate 41 reaches just below the discharge hole of the base 50. When the table 42 reaches this position, the supply unit The operation 67 is started and the supply of the phosphor paste 63 to the base 50 is started. In order for the phosphor paste discharged from the discharge hole of the base 50 to reach the substrate 41, a time delay is caused by the gap between the substrate and the base discharge hole. Therefore, by supplying the phosphor paste 63 to the base 50 in advance, a predetermined amount of the phosphor paste 63 discharged from the base 50 is formed when the application start position of the substrate 41 is just below the base 50 discharge hole. Since it reaches 41, coating can be started with almost no thickness unevenness. The position where the supply of the phosphor paste 63 is started is the same even if the value of the encoder or linear sensor is detected when an encoder is connected to the motor or feed screw or a linear sensor is attached to the table instead of the position sensor 65. It becomes possible.
[0108]
The application is performed until the application end position of the substrate 41 comes to a position immediately below the discharge hole of the base 50. That is, since the substrate 41 is always placed at a predetermined position on the table 42, the application end position of the substrate 41 is (a), for example, 5 mm before the discharge hole of the base 50 is directly below, or (b) just below. A position sensor and its encoder value are set in advance in the position of the table 42 corresponding to the position to be, and when the table 42 comes to the position corresponding to (a), a stop command is issued from the overall controller 72 to the supply device controller 71. The supply of the phosphor paste 63 to the base 50 is stopped.
[0109]
Even if the application end position is passed, the table 42 continues to operate and stops when it reaches the end position. If the part to be applied still remains at this time, the base 50 is moved in the Y-axis direction by the application width (ejection hole pitch × number of holes) to the start position for the next application, and the table 42 is reversed. The coating is performed in the same procedure except that it is moved in the direction. If application is performed in the same movement direction of the table 42 as the first time, the base 50 is moved in the Y-axis direction to the start position to be applied next, and the table 42 is returned to the X-axis preparation position.
[0110]
When the coating process is completed, the table 42 is moved to a place where the substrate 41 is transferred by the unloader and stopped. After the suction of the substrate 41 is released and the atmosphere is released, the lift pins are raised and the substrate 41 is moved to the table 42. Pull it away from the surface and lift it up.
[0111]
At this time, the lower surface of the substrate 41 is held by an unloader (not shown), and the substrate 41 is transferred to the next step. When the substrate 41 is delivered to the unloader, the table 42 lowers the lift pins and returns to the origin position.
[0112]
Then, the discharge electromagnetic switching valve 66 is closed, the suction electromagnetic switching valve 69 is opened, the supply unit 67 is operated, and the phosphor paste in an amount necessary for coating one substrate from the phosphor paste tank 70 is operated. 63 is supplied.
[0113]
In the above coating process, in order to improve the coating thickness accuracy in a given effective region, the timing of starting the phosphor paste supply to the base 50 with respect to the coating start position and the phosphor paste to the base 50 with respect to the coating end position Since the timing of supply stoppage is important, each operation must be performed at an optimum point. Further, in this embodiment of the present invention, the supply of the phosphor paste 63 is started after the interval value between the discharge port portion of the base 50 and the upper end portion of the partition wall of the substrate 41 is set. This is because, when the supply of the phosphor paste 63 is started in a state before the interval between the two is set, the phosphor paste 63 spreads to the front end surface of the discharge port when it is discharged from the discharge port, and other than the discharge port This is because, when the portion is contaminated and severe, the phosphor paste 63 discharged from the discharge ports adjacent to each other merges, and high-precision coating cannot be performed. When the supply of the phosphor paste 63 is started after the front end surface of the discharge port portion of the base 50 is brought close to the substrate 41, the phosphor paste 63 is guided between the partition walls before the phosphor paste 63 spreads on the front end surface. Therefore, such inconvenience does not occur.
[0114]
In this embodiment, the application example in which the substrate 41 moves in the X-axis direction and the base 50 moves in the Y-axis and Z-axis directions has been described. However, the base 50 and the substrate 41 are relatively three-dimensional. As long as the structure and type can be moved to the table, the table and the base can be moved in any form.
[0115]
Although the case where one kind of phosphor paste is applied is described in detail here, the present invention can also be applied to the case where phosphors of three colors such as red, blue, and green are simultaneously applied.
[0116]
FIG. 16 is a schematic longitudinal sectional view showing an example of a base used in the present invention, and FIG. 17 is a bottom view thereof. The base 90 has a manifold portion 91 for storing the phosphor paste, a supply port 94 for supplying the phosphor paste of the manifold portion 91, and a plurality of discharge holes 92 for discharging the phosphor paste. The discharge holes 92 are formed by penetrating from the inside to the outside of the manifold portion 91, and are arranged linearly at a predetermined pitch. Further, the outlet portion of the discharge hole 92 is a flat surface, which makes it easier to clean the discharge hole outlet portion.
[0117]
FIG. 18 is a schematic longitudinal sectional view showing an example of another base used in the present invention, and FIG. 19 is a bottom view thereof. In this aspect, the needles 93 having the same shape are arranged, so that the outlet portion of the discharge hole is not easily contaminated.
[0118]
FIG. 20 is a bottom view showing an example of still another base used in the present invention. A plurality of discharge holes 92 are arranged in two lines in a straight line. As a result, the phosphor paste can be applied from two ejection holes between one stripe-shaped partition wall, so that the paste thickness accuracy can be improved or the coating speed can be increased.
[0119]
FIG. 21 is a schematic longitudinal sectional view showing an example of another base used in the present invention, and FIG. 22 is a bottom view thereof. The base 95 includes a plurality of manifold portions 96, 97, 98, supply ports 99, 100, 101 for supplying the phosphor paste to the manifold portions 96, 97, 98, a plurality of discharge holes 102 for discharging the phosphor paste, 103 and 104. Furthermore, as shown in the bottom view, the discharge ports 102, 103, 104 are more numerous than the manifold portions 96, 97, 98 and are arranged on a straight line. Thereby, different types of phosphor pastes can be discharged from one base. In addition, when the shortest distance between the discharge holes for discharging phosphor pastes of different colors is 600 μm or more, color mixing with other colors can be prevented.
[0120]
FIG. 23 is a schematic perspective view for explaining a main part of a plasma display manufacturing apparatus according to another embodiment of the present invention. Not only one base, but two or more bases may be arranged in the Y direction. The bases 110 and 111 are driven by a control device (not shown) so as to be driven synchronously or asynchronously in the X direction and the Y direction. As described above, since the application of the phosphor paste to the substrate 41 on the table 42 is shared by the two or more bases, the application time can be shortened.
[0121]
At this time, as the two or more bases, the base for discharging the phosphor paste emitting the same color, the base for discharging the phosphor paste emitting different colors, or the phosphor emitting the two or more different colors Any of the caps for discharging the paste may be used.
[0122]
In addition, when these two or more bases are positioned so as to be shifted by an integral multiple of the partition spacing in the direction perpendicular to the partition direction, and the positions of two or more adjacent groups are “deviation” <“outside dimension of the base body” It is efficient and preferable to dispose it so as to be displaced in the parallel direction with respect to the partition wall.
[0123]
【Example】
Hereinafter, the present invention will be specifically described with reference to examples. However, the present invention is not limited to this.
[0124]
Reference example 1
  A phosphor paste comprising 45 g phosphor powder, 25 g binder polymer (methyl methacrylate, methacrylic acid, styrene copolymer), 28 g solvent (γ-butyrolactone) and 2 g dispersant was prepared. The phosphor powder is red: (Y, Gd, Eu) BO₃(Cumulative average particle size 2.7 μm Specific surface area 3.1 m²/ Cc), green: (Zn, Mn)₂SiO₄(Cumulative average particle size 3.6 μm Specific surface area 2.5 m²/ Cc), Blue: (Ba, Eu) MgAl₁₀O₁₇(Cumulative average particle size 3.7 μm Specific surface area 2.3 m²/ Cc) was used. First, each component of the organic component was dissolved while being heated to 60 ° C., and then phosphor powder was added and kneaded with a kneader to prepare a paste. The viscosity was 9 Pa · s.
[0125]
Each paste of red, green, and blue was applied in stripes on a glass substrate on which 961 partitions having a pitch of 220 μm, a height of 150 μm, and a width of 60 μm were formed.
[0126]
The application was performed using a nozzle having one discharge port having a hole diameter of 150 μm. One nozzle was used for each of the red, blue, and green phosphor pastes. The distance between the tip of the nozzle and the upper end of the partition was set to 50 μm. And the discharge pressure is 3kg / cm by the dispenser.²The phosphor paste was ejected in a certain amount while the nozzle was running at a constant speed in parallel with the partition walls, and was applied one by one between the partition walls. First, red phosphor paste was applied one by one between predetermined partitions. At this time, the nozzle was moved by 660 μm in the direction perpendicular to the partition direction at the position where one coating was completed, and then the coating was applied between the second partition while running the nozzle in the opposite direction to the first. This was repeated to apply 320 pieces of red phosphors at predetermined positions. After the completion of coating, the coated surface was turned up and dried at 80 ° C. for 40 minutes. Next, 320 blue phosphor pastes were similarly applied between adjacent barrier ribs coated with red phosphors and dried. Next, 320 pieces of green phosphor paste were similarly applied between adjacent barrier ribs coated with blue phosphor and dried. And the obtained glass substrate was baked at 500 degreeC for 30 minutes.
[0127]
When the thickness of the side surface and the bottom portion was observed with an electron microscope, each color phosphor could be formed in a stripe shape with a thickness of 20 ± 5 μm on the side surface and 20 ± 5 μm on the bottom portion.
[0128]
Reference example 2
  A phosphor paste consisting of 45 g of phosphor powder, 25 g of binder polymer (polyvinyl alcohol), 20 g of solvent (water) and 2 g of dispersant was prepared. The phosphor powderReference example 1Same as (Red: (Y, Gd, Eu) BO₃, Green: (Zn, Mn)₂SiO₄, Blue: (Ba, Eu) MgAl₁₀O₁₇) Was used. First, each component of the organic component was dissolved in water while heating at 60 ° C., and then phosphor powder was added and kneaded with a kneader to prepare a paste. The viscosity was 30 Pa · s.
[0129]
Each paste of red, green, and blue was applied in stripes on a glass substrate on which 961 partitions having a pitch of 220 μm, a height of 150 μm, and a width of 60 μm were formed.
[0130]
Application was performed by a die in which five ejection holes having a hole diameter of 100 μm were formed in a row at a pitch of 660 μm. Two bases were used for each of the red, blue and green phosphor pastes. The distance between the discharge hole of the die and the upper end of the partition was set to 50 μm. And the discharge pressure is 4kg / cm by the dispenser.²The phosphor paste was ejected from the five ejection holes at a constant speed parallel to the partition walls, and a predetermined amount of the phosphor paste was ejected and applied simultaneously between the five partition walls. First, a red phosphor paste was applied between predetermined partitions. At this time, two nozzles for discharging the red phosphor paste are arranged such that five discharge holes are arranged in the direction perpendicular to the partition wall at the ends where the partition walls are formed, and the discharge hole interval between the centers of the two nozzles is 105. It was set to be 6 mm. The two bases were synchronized and simultaneously run in the same direction at the same speed. The two bases were simultaneously moved in the same direction by 3300 μm in the direction perpendicular to the partition wall direction at the positions at which five coatings were completed for each of the two bases. Next, two bases were applied in the opposite direction and applied between five partition walls in the same manner. This was repeated, and 160 pieces of 2 pieces were applied to a predetermined position of the red phosphor with one base. After the completion of coating, the coated surface was down and dried at 80 ° C. for 40 minutes. Next, 320 blue phosphor pastes were similarly applied with two bases between adjacent barrier ribs coated with red phosphors and dried. Next, 320 green phosphor pastes were similarly applied with two bases between the adjacent barrier ribs coated with the blue phosphor and dried. And the obtained glass substrate was baked at 500 degreeC for 30 minutes.
[0131]
When the thickness of the side surface and the bottom portion was observed with an electron microscope, each color phosphor could be formed in a stripe shape with a thickness of 20 ± 5 μm on the side surface and 20 ± 5 μm on the bottom portion.
[0132]
Example1
  Reference example 1Using the same phosphor paste asReference example 1Red, blue and green stripes were applied to the same partition walls.
[0133]
Application was performed by a die (120 needles, length 3 mm) in which 40 needles having a hole diameter of 150 μm were pressed into one row at a pitch of 660 μm and pressed into three rows at a pitch of 650 μm at the tip. Eight bases were used for each of red, blue and green phosphor pastes. The distance between the tip of the needle portion of the die and the upper end of the partition wall was set to 80 μm. And the discharge pressure is 4kg / cm by the dispenser.²The phosphor paste was ejected from the 120 ejection holes at a constant speed parallel to the partition walls, and a predetermined amount of the phosphor paste was ejected and applied simultaneously between the 40 partition walls. First, a red phosphor paste was applied between predetermined partitions. At this time, the eight bases for discharging the red phosphor paste are arranged in three rows and 40 needles in a direction perpendicular to the partition wall direction, and are alternately positioned at intervals of the main body (1 mm) where the adjacent bases do not contact each other. Set. The eight bases were synchronized and simultaneously moved in the same direction at the same speed. The start and end of the discharge of the phosphor paste were performed only when the tip of the needle was positioned above the partition wall. Thereby, 320 spaces between the partition walls were applied at once. After the completion of coating, the coated surface was down and dried at 80 ° C. for 40 minutes. Next, 320 blue phosphor pastes were similarly applied with eight bases between the adjacent barrier ribs coated with the red phosphor and dried. Next, 320 green phosphor pastes were similarly applied by using eight bases between adjacent barrier ribs coated with blue phosphor, and dried. And the obtained glass substrate was baked at 500 degreeC for 30 minutes.
[0134]
When the thickness of the side surface and the bottom portion was observed with an electron microscope, each color phosphor could be formed in a stripe shape with a thickness of 20 ± 5 μm on the side surface and 20 ± 5 μm on the bottom portion.
[0135]
Reference example 3
  45 g phosphor powder, 18 g binder polymer (methyl methacrylate, methacrylic acid, styrene copolymer), 11 g trimethylolpropane triacrylate, 18 g solvent (γ-butyrolactone), 2 g dispersant, 0.05 g benzophenone dye, photopolymerization started A phosphor paste made of an agent (“Irgacure” 907, manufactured by Ciba Geigy) was prepared. The phosphor powderReference example 1Same as (Red: (Y, Gd, Eu) BO₃, Green: (Zn, Mn)₂SiO₄, Blue: (Ba, Eu) MgAl₁₀O₁₇) Was used. First, each component of the organic component was dissolved while being heated to 60 ° C., and then phosphor powder was added and kneaded with a kneader to prepare a paste. The viscosity was 20 Pa · s.
[0136]
  The pasteReference example 1Red, green and blue stripes were applied to the same partition walls.
For the application, 40 needles having a hole diameter of 150 μm are arranged in a row at a pitch of 660 μm, and the nozzles are press-fitted into the tip in three rows (row pitch 15 mm) by shifting by 220 μm pitch (120 needles, length). 3 mm). Eight bases were used. The distance between the tip of the needle portion of the die and the upper end of the partition wall was set to 50 μm. And the discharge pressure is 3.5 kg / cm by the dispenser.²The phosphor paste was ejected from the 120 ejection holes at a constant speed parallel to the partition walls, and a predetermined amount of the phosphor paste was ejected and applied simultaneously between the 120 partition walls. Red phosphor paste is ejected from the first row of needles, green phosphor paste is ejected from the second row of needles, and blue phosphor paste is ejected from the third row of needles. did. At this time, the eight bases were set so that 40 needles in three rows were arranged in the direction perpendicular to the partition wall direction, and the positions were alternated at an interval (1 mm) where adjacent bases did not contact. The eight bases were synchronized and simultaneously moved in the same direction at the same speed. The start and end of the discharge of the phosphor paste were performed only when the tip of the needle was positioned above the partition wall. Thereby, 960 spaces between the partition walls were applied at once. After the completion of coating, the coated surface was down and dried at 80 ° C. for 40 minutes.
[0137]
Next, a negative photomask having a pitch of 220 μm and a line width of 70 μm was subjected to alignment exposure, developed with a 0.5% aqueous sodium carbonate solution, and then baked at 500 ° C. for 30 minutes.
[0138]
When the thickness of the side surface and the bottom portion was observed with an electron microscope, each color phosphor could be formed in stripes with a thickness of 23 ± 2 μm on the side surface and 30 ± 6 μm on the bottom portion.
[0139]
【The invention's effect】
As described above in detail, according to the plasma display panel manufacturing method and manufacturing apparatus of the present invention, the phosphor layer can be easily formed between the partition walls of the substrate with high accuracy and with high quality. A display panel can be manufactured at high cost with high productivity.
[Brief description of the drawings]
FIG. 1 is a schematic view of a glass substrate on which partition walls used for carrying out the present invention are formed.
FIG. 2 is a schematic view showing a plasma display panel after a phosphor layer is applied by the method of the present invention.
FIG. 3 is a schematic view showing a plasma display panel after firing according to the present invention.
FIG. 4 is a view schematically showing an example of a method for carrying out the present invention performed on a glass substrate on which a partition wall is formed.
FIG. 5 is a schematic cross-sectional view schematically showing an example of the base of the present invention.
FIG. 6 is a schematic cross-sectional view schematically showing an example of a nozzle-type base having a discharge hole shape according to the present invention.
FIG. 7 is a schematic cross-sectional view schematically showing an example of a needle-type base having a discharge hole shape according to the present invention.
FIG. 8 is a schematic plan view showing an example of the arrangement of the discharge holes of the die of the present invention and showing the positional relationship with respect to the substrate on which stripe-shaped partition walls are formed.
FIG. 9 is a schematic plan view showing a positional relationship with respect to a substrate on which stripe-shaped partition walls are formed, schematically showing an example of arrangement of discharge holes of the die of the present invention.
FIG. 10 is a schematic plan view showing a positional relationship with respect to a substrate on which stripe-shaped partition walls are formed, schematically showing an example of the arrangement of the discharge holes of the die of the present invention.
FIG. 11 is a schematic plan view showing a positional relationship with respect to a substrate on which stripe-shaped partition walls are formed, schematically showing an example of the arrangement of discharge holes of the die of the present invention.
FIG. 12 is a schematic plan view showing an example of a method for carrying out the present invention and showing an operation direction in which two bases, nozzles or needles are applied to the entire surface of a substrate on which a partition wall is formed in synchronization. It is.
FIG. 13 schematically shows an example of an implementation method of the present invention, in which four bases or nozzles or needles are set so that they are alternately positioned at intervals where adjacent ones do not contact each other. FIG. 5 is a schematic plan view showing an operation of applying the coating to the entire surface of the substrate on which the partition walls are formed by synchronizing and simultaneously traveling in the same direction at the same speed.
FIG. 14 is an overall perspective view of a coating liquid coating apparatus according to an embodiment of the present invention.
15 is a schematic diagram for explaining a main part of the apparatus of FIG. 14;
FIG. 16 is a schematic longitudinal sectional view showing an example of a base used in the present invention.
FIG. 17 is a bottom view of the base of FIG. 16;
FIG. 18 is a schematic longitudinal sectional view showing an example of another base used in the present invention.
FIG. 19 is a bottom view of the base of FIG. 18;
FIG. 20 is a bottom view showing an example of still another base used in the present invention.
FIG. 21 is a schematic longitudinal sectional view showing an example of another base used in the present invention.
22 is a bottom view of the base of FIG. 21. FIG.
FIG. 23 is a schematic perspective view for explaining a main part of a coating liquid coating apparatus according to another embodiment of the present invention.
[Explanation of symbols]
1: Electrode
2: Substrate
3: Bulkhead
4: Red phosphor layer
5: Blue phosphor layer
6: Green phosphor layer
7: Needle
8: Phosphor paste
9: Distance between discharge hole outlet and partition top
10: Porous die
11: Porous nozzle
12: Perforated needle
13: 1 hole mouthpiece or nozzle or needle
14: One-color coating base or nozzle or needle with a one-row arrangement hole
15: One-color coating base or nozzle or needle with three rows of holes
16: 1 three-color coating cap or nozzle or needle with holes arranged in one row
17: Striped partition on substrate
18: Direction of travel of the base, nozzle or needle
19: Substrate on which partition walls are formed
20: base, nozzle or needle
21: Traveling operation direction in which the base, nozzle or needle is synchronized
40: Base
41: Substrate
42: Table
43: Suction hole
44: Guide groove rail
45: Slide leg
46: Feed screw
47: Connector
48: Bearing
49: AC servo motor
50: Base
51: Holder
52: Horizontal bar
53: Linear actuator
54: Lift bracket
55: Telescopic rod
56: Lifting mechanism
57: Y-axis moving bracket
58: Prop
59: Axial movement mechanism
60: Sensor support
61: Height sensor
62: Manifold
63: Phosphor paste
64: Discharge hole
65: Supply hose
66: Discharge electromagnetic switching valve
67: Supply unit
68: Suction hose
69: Electromagnetic switching valve for suction
70: Phosphor paste tank
71: Supply device controller
72: Overall controller
73: Motor controller
74: Sensor bracket
75: Position sensor
76: Position sensor
77: Camera support
78: Camera
79: Image processing apparatus
80: Actuator for lifting mechanism
81: Actuator for width direction moving mechanism
90: base
91: Manifold part
92: Discharge hole
93: Needle
94: Supply port
95: Base
96: Manifold part
97: Manifold
98: Manifold part
99: Supply port
100: Supply port
101: Supply port
102: Discharge hole
103: Discharge hole
104: Discharge hole
110: Nozzle
111: Nozzle

Claims (26)

Three types of phosphor paste each containing phosphor powders that emit red, green, and blue light are respectively applied in stripes from the die having discharge holes to the partition walls on the glass substrate, and then fired to obtain a phosphor screen. A method of manufacturing a plasma display panel to be formed, the method comprising applying from two or more ejection holes per stripe . 2. The method of manufacturing a plasma display panel according to claim 1, wherein the coating is performed in a state where the distance between the upper end of the partition wall and the outlet of the outlet of the die is 0.01 to 2 mm. The method for manufacturing a plasma display panel according to claim 1 or 2, wherein the discharge hole portion shape is a nozzle or a needle. The method for manufacturing a plasma display panel according to any one of claims 1 to 3, wherein the base and / or the glass substrate is run in parallel with the partition on the glass substrate. The method for manufacturing a plasma display panel according to any one of claims 1 to 4, wherein the base has two or more ejection holes for one color . The plasma display according to any one of claims 1 to 5, wherein a phosphor paste that emits light of different colors is discharged from a single die, and a shortest interval between discharge holes for discharging phosphor pastes of different colors is 600 µm or more. Panel manufacturing method. The manufacturing method of the plasma display panel in any one of Claims 1-6 which apply | coat simultaneously from 2 or more bases. The method for producing a plasma display panel according to claim 7, wherein two or more bases are applied while running at the same speed. 9. The method of manufacturing a plasma display panel according to claim 8, wherein two or more bases are applied while traveling in the same direction at the same speed. The method for manufacturing a plasma display panel according to any one of claims 7 to 9, wherein only one color is applied from one die. The manufacturing method of the plasma display panel in any one of Claims 7-10 which apply | coat simultaneously from 2 or more bases about 1 color. The method for manufacturing a plasma display panel according to any one of claims 7 to 11, wherein two or more positions are shifted by an integral multiple of a partition interval in a direction perpendicular to the partition direction. The method for manufacturing a plasma display panel according to any one of claims 7 to 12, wherein two adjacent bases are positioned in a direction parallel to the partition wall. The manufacturing method of the plasma display panel in any one of Claims 1-13 which apply | coat for every color and pass through a drying process, whenever it applies one color. The method for manufacturing a plasma display panel according to claim 1, wherein a paste having a viscosity of 1 to 100 Pa · s is used as the phosphor paste. The method for producing a plasma display panel according to claim 15, wherein the phosphor powder is a phosphor powder having a cumulative average particle size of 0.5 to 15 µm and a specific surface area of 0.1 to ⁵ m ² / cc. The manufacturing method of the plasma display panel in any one of Claims 1-16 which passes through the process dried after making a fluorescent substance coating surface face down, after apply | coating a fluorescent substance paste. The method for manufacturing a plasma display panel according to claim 1, wherein the phosphor paste is a photosensitive phosphor paste. A table for fixing the uneven substrate an uneven portion is formed at a predetermined pitch in a stripe shape in one direction on the surface, have a plurality of discharge holes facing the uneven part of the uneven substrate, the plurality of discharge holes linear And a base arranged in a plurality of rows in the stripe direction of the concavo-convex portion of the concavo-convex substrate, a supply means for supplying a coating liquid to the base, and a moving means for relatively moving the table and the base three-dimensionally And a control means for controlling the distance between the upper end of the convex portion of the concave-convex substrate and the discharge hole outlet portion of the base, and the coating liquid is applied to the concave portion of the concave-convex substrate, Liquid application device. The coating device for applying a coating liquid to a concavo-convex substrate according to claim 19, wherein the base has a manifold part for storing the coating liquid, and the outlet part of the discharge hole is a flat surface. The coating device for applying a coating liquid to a concavo-convex substrate according to claim 19, wherein the base has a manifold part for storing the coating liquid, and the discharge holes are configured by arranging needles having the same shape . The base has a plurality of manifold parts independent from each other and discharge holes for discharging each coating liquid from each manifold part, and the shortest interval between the discharge holes connected to different manifold parts is 600 μm. The coating apparatus of the coating liquid to the uneven | corrugated board | substrate in any one of 21 . 19 claims decor mouthpiece of more than 2 groups to the coating solution of a coating apparatus to uneven substrate according to any one of 22. 24. The coating liquid for a concavo-convex substrate according to any one of claims 19 to 23 , wherein two or more bases are arranged in a direction perpendicular to the stripe direction of the concavo-convex portion of the concavo-convex substrate and shifted by an integral multiple of the convex interval. Coating device. 25. The coating device for applying a coating liquid to a concavo-convex substrate according to any one of claims 19 to 24 , wherein two or more adjacent bases are shifted in the stripe direction of the concavo-convex portion of the concavo-convex substrate. 26. An apparatus for manufacturing a plasma display panel, wherein the coating liquid is a paste containing phosphor powder that emits light in any one of red, green, and blue, and uses the coating liquid coating apparatus according to any one of claims 19 to 25. .

Images