JPH11185636A - Substrate for plasma display and its manufacture - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate having a high-accuracy phosphor layer by setting the maximum grain size of the inorganic phosphor powder forming the phosphor layer to a specific value or below, and stably discharging a phosphor paste from a base. SOLUTION: The maximum grain size of inorganic phosphor powder is set to 40 μm or below, preferably 30 μm or below, and the average grain size is preferably set to 0.5-15 μm, and the specific surface area is preferably set to 0.1-5 m<2> /cc. One or two or more kinds of [(Y, Gd, Eu)BO3 ], [(Y, Eu)2 O3 ], [(Zn, Mn)2 SiO4 ], [(Ba, Eu) MgAl10 O17 ], [(Ba, Sr, Mg)O.aAl2 O3 :Mn] and [BaAl12 O19 :Mn] are preferably used for the phosphor powder. Three kinds of red, green and blue phosphor pastes are discharged from a base and applied into a stripe shape between barrier ribs on a glass substrate to form a fluorescent screen. A phosphor layer is uniformly applied to the side faces and bottom sections of barrier ribs, thus a PDP excellent in luminance can be manufactured.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate for a plasma display panel (hereinafter abbreviated as "PDP").
The present invention relates to a PDP substrate on which a phosphor layer is formed with high precision.

[0002]

2. Description of the Related Art In recent years, PDPs have attracted attention as large displays. PDPs can display at higher speeds than liquid crystal panels, and are easy to increase in size. Therefore, PDPs have penetrated the fields of OA equipment and public relations display devices, and have also made progress in the field of high-definition television. Expected. With the expansion of such uses, color PDPs having a large number of fine display cells and capable of high-definition display have attracted particular attention.

One display cell constituting a PDP is a single pixel formed from three kinds of phosphor layers that emit light in three primary colors, ie, red (R), green (G), and blue (B) by plasma discharge. have.

As a method of forming such a phosphor layer, a screen printing method has been conventionally known. However, in order to form the phosphor layer, it is necessary to repeat printing, whereby the shape of the screen plate is reduced. Because of the change, there were problems that a highly accurate pattern could not be formed, and that it was not possible to cope with mass production in terms of management such as cleaning of a screen plate.

[0005] In addition, a method using photolithography is also known. In this case, in order to form phosphor layers of red, green and blue, paste coating, exposure, development, drying and the like are performed for each color. It is necessary to repeat three times, and after applying and exposing each color, unnecessary portions of the paste are removed by development after the exposure, so that the phosphor powder is wasted and the phosphor powder is recovered and regenerated. There is a cost problem. In addition, since each color is applied to the entire surface, there is a problem that color mixing due to undeveloped portions of the overcoated colors cannot be avoided.

For this reason, a method of injecting a phosphor paste from the tip of an ink jet nozzle to form a phosphor layer has been proposed. However, in the case of an ink jet, a mechanism for ejecting the phosphor paste by a piezoelectric element or the like has been proposed. It is necessary to reduce the viscosity to about 0.02 Pa · s or less, and the amount of the phosphor powder in the paste cannot be increased. Therefore, there is a problem that the thickness of the formed phosphor layer is reduced. Due to the small size, there was also a disadvantage that the phosphor powder was clogged.

[0007]

SUMMARY OF THE INVENTION Accordingly, the present invention has been made to solve the above-mentioned problems of the prior art, and provides a plasma display substrate having a high-accuracy phosphor layer which can be manufactured stably without any trouble. That is its purpose.

[0008]

An object of the present invention is to provide a PDP having, on a glass substrate, at least electrodes, partition walls, and three types of phosphor layers provided in stripes between the partition walls and emitting red, green, and blue light. A PDP substrate, wherein the phosphor layer is made of an inorganic phosphor powder having a maximum particle diameter of 40 μm or less.

[0009]

BEST MODE FOR CARRYING OUT THE INVENTION The PDP substrate of the present invention comprises a glass substrate having at least electrodes, partition walls, and three types of phosphor layers provided in stripes between the partition walls and emitting red, green, and blue light. is there.

In the present invention, the glass substrate is not particularly limited, but general soda lime glass, glass obtained by annealing soda lime glass, high strain point glass, or the like can be used. The size of the glass substrate is not particularly limited, and glass having a thickness of 1 to 5 mm can be used. Further, a dielectric layer may be formed on a glass substrate.

The electrodes are silver, aluminum, copper, gold, nickel,
Tin oxide, ITO, or the like can be formed on a substrate by a screen printing method or a method using a photosensitive conductive paste.

The partition may be formed in a stripe shape, and the pitch of the partition may be 100 to 5
00 μm is preferred. The height of the partition is 50 to 20
0 μm is preferred.

Further, three types of phosphor layers which emit red, green and blue light are formed in stripes between the partition walls. Since one pixel line is formed by three types of stripes of red (R), blue (B), and green (G), the phosphor layer is generally provided by repeating RGB or RBG. As will be described in detail later, the phosphor layer can be formed, for example, by applying a phosphor paste from a die, applying the phosphor paste on a glass substrate, and baking.

In the present invention, the phosphor layer must be formed of an inorganic phosphor powder having a maximum particle diameter of 40 μm or less, and preferably has a maximum particle diameter of 30 μm or less.

When the maximum particle size of the inorganic phosphor powder exceeds 40 μm, when the phosphor layer is formed by discharging the phosphor paste from the die, the discharge holes are clogged with the phosphor powder,
Stable coating cannot be performed.

Further, the cumulative average particle diameter is 0.5 to 15 μm.
m, more preferably 0.5-6 μm, specific surface area 0.1-
It is preferably 5 m ² / cc. More preferably, the cumulative average particle diameter is 1 to 6 μm, and the specific surface area is 0.5 to ⁴ m ² /
cc. When the thickness is in this range, when forming the phosphor layer by a method of discharging the phosphor paste from the die, it is preferable in that clogging of discharge holes hardly occurs, stable discharge is possible, and a highly accurate pattern shape can be obtained. . Further, it is preferable because the luminous efficiency of the phosphor is good and the life is long. If the cumulative average particle diameter is less than 0.5 μm and the specific surface area exceeds 5 m ² / cc, the powder becomes too fine and the powder is likely to aggregate. In particular, when patterning is performed by photolithography, light is scattered during exposure. In some cases, the unexposed portions are light-cured. For this reason, a residual film of the pattern (excess phosphor remaining in the unexposed portion) occurs during development, and it is difficult to obtain a high-definition pattern, and the luminous efficiency and life of the phosphor tend to decrease.

The shape of the phosphor powder may be a polyhedral (granular) shape, but a powder having no aggregation is preferable. Among them, spherical powder is preferable in the case where a phosphor layer is formed by a method of discharging a phosphor paste from a base, since clogging of discharge holes is unlikely to occur and stable discharge can be performed. The pattern processing is preferable because the influence of light scattering during exposure can be reduced.

Further, it is preferable that the spherical powder has a particle shape having a sphericity of 80% by number or more. More preferably,
The sphericity is 90% by number or more. When the sphericity is less than 80% by number, when performing pattern processing by photolithography, it is difficult to obtain a high-definition pattern due to the influence of light scattering by the phosphor powder during exposure. The sphericity is measured by taking an image of the phosphor powder with an optical microscope at a magnification of 300 times, counting the particles that can be counted, and defining the ratio of spherical particles as the sphericity.

In the present invention, the phosphor powder is an inorganic phosphor powder. For example, in the case of red, (Y, Eu) ₂ O ₃ , Y ₂ O ₃ : Eu, YVO ₄ :
Eu, (Y, Gd, Eu) BO ₃ , Y ₂ O ₃ S: Eu, γ
-Zn ₃ (PO ₄ ) ₂ : Mn, (ZnCd) S: Ag + I
When n ₂ O _{3 and the} like are green, Zn ₂ GeO ₂ : Mn, BaA
l ₁₂ O ₁₉ : Mn, (Ba, Sr, Mg) O · aAl
₂ O ₃ : Mn, (Zn, Mn) ₂ SiO ₄ , Zn ₂ SiO ₄ :
Mn, LaPO ₄ : Tb, ZnS: Cu, Al, Zn
S: Au, Cu, Al, (ZnCd) S: Cu, Al,
Zn ₂ SiO ₄ : Mn, As, Y ₃ Al ₅ O ₁₂ : Ce, Ce
MgAl ₁₁ O ₁₉ : Tb, Gd ₂ O ₂ S: Tb, Y ₃ Al ₅ O
₁₂ : Tb, ZnO: Zn, etc., in blue, Sr ₅ (P
O ₄ ) ₃ Cl: Eu, (Ba, Eu) MgAl ₁₀ O ₁₇ , B
aMgAl ₁₄ O ₂₃ : Eu, BaMgAl ₁₆ O ₂₇ : Eu,
BaMg ₂ Al ₁₄ O ₂₄ : Eu, ZnS: Ag + red pigment, Y ₂ SiO ₃ : Ce, and the like. In particular, [(Y,
Gd, Eu) BO ₃ ], [(Y, Eu) ₂ O ₃ ], [(Z
n, Mn) ₂ SiO ₄ ], [(Ba, Eu) MgAl ₁₀ O
_{17], [(Ba, Sr} , Mg) O · aAl 2 O 3: Mn]
And [BaAl ₁₂ O ₁₉ : Mn].

Further, at least one element selected from the group consisting of thulium (Tm), terbium (Tb), and europium (Eu), yttrium (Y),
A rare earth tantalate phosphor in which at least one rare earth element constituting a base selected from gadolinium (Gd) and lutetium (Lu) is used.

Examples of the tantalate rare earth phosphor, the composition formula _{Y 1-x Eu x TaO 4} ( where, X is approximately 0.005
0.1) is preferably exemplified by a europium-activated yttrium tantalate phosphor represented by the following formula: For the red phosphor, europium-activated yttrium tantalate is preferable, and for the green phosphor, a rare earth tantalate phosphor is represented by a composition formula Y _1-x Tb _x TaO ₄ (where X is approximately 0.001 to 0.001).
Terbium-activated yttrium tantalate represented by the following formula: The blue phosphor, (wherein, X is approximately 0.001 to 0.2) tantalate rare earth phosphor Y _1-x Tm _x TaO ₄ is preferably thulium-activated yttrium tantalate represented by .

As a green phosphor, Mn is at least 0.2% by weight based on the amount of zinc silicate (Zn ₂ SiO ₄ ).
Average particle size activated less than 0.1% by weight 2 μm or more and 8 μm
m or less manganese-activated zinc phosphor (Zn ₂ SiO ₄ : M
n) and the general formula is (Zn _1-x M n _x ) O · αSiO
₂ (where X and α are 0.01 ≦ X ≦ 0.2, 0.
A manganese-activated zinc silicate phosphor represented by the following formula: 5 <α ≦ 1.5) is also preferable.

Next, a method for manufacturing the PDP substrate of the present invention will be described.

The PDP substrate of the present invention can be manufactured, for example, by forming a phosphor layer between partitions of a glass substrate having partitions formed thereon and firing the phosphor layer. Less than,
An example of a preferred manufacturing method will be described in detail with reference to the drawings.

FIG. 1 shows an example of a glass substrate 2 on which electrodes 1 and partition walls 3 are formed. Phosphor pastes of various colors are applied in stripes at predetermined positions between the partition walls of such a glass substrate. Thereby, as shown in FIG. 2, the red phosphor paste layer 4, the blue phosphor paste layer 5, and the green phosphor paste layer 6 can be provided on the glass substrate.

As a method of forming the phosphor layer in a stripe shape at a predetermined position between the partition walls, a screen printing method, a photolithography method, an ink jet method, a die coating method, or the like may be used as appropriate. A coating method is preferably used.

As a method of applying the phosphor paste using the spinneret coating method, for example, three kinds of phosphor pastes each containing an inorganic phosphor powder which emits red, green and blue light having a maximum particle diameter of 40 μm or less are used. Preferably, a method of forming a phosphor screen by ejecting from a nozzle having an ejection hole of a nozzle or a needle, and applying the phosphor in a stripe shape between partition walls formed on a glass substrate is preferably used.
At this time, a base and / or a glass substrate having discharge holes arranged for each of the colors R, G, and B are caused to travel in the direction of forming the partition walls, and the phosphor paste is applied between the partition walls at predetermined positions of the respective colors. Can be.

FIG. 5 shows an example of the cross-sectional shape of the discharge hole of the die 10 used at this time. As shown in FIGS.
Alternatively, the base 12 having a needle is preferable because the base is hardly stained.

The inner diameter of the discharge port is determined by the distance 1 between partition walls to be coated.
It is preferable that the distance between the partition walls is not more than 00 to 400 μm, and it is necessary to be larger than the particle diameter of the phosphor powder.

Further, at the time of coating, as shown in FIG. 4, the distance 9 between the tip of the discharge section 7 of the die and the upper end of the partition wall is set to 0.0.
It is preferable that the phosphor paste 8 is discharged at a constant flow rate and applied between the partition walls while running the die and / or the glass substrate at a constant speed while maintaining the state of 1 to 2 mm. More preferably, the distance is between 0.03 and 1 mm. By coating at this interval, the phosphor paste can be poured between the partition walls while avoiding contact with the upper end of the partition walls.

The number of display cells per display, that is, the number of pixel lines, varies depending on the definition and size required for the display.
Most are multiples of 16, such as 800, 1024, 1280, and 1920. For this reason, it is preferable that the number of discharge holes per die unit be in the range of (16n-5) to (16n + 5). Here, n represents an arbitrary natural number, but is preferably a multiple of 5. When the number of discharge holes per base unit satisfies this condition, it is possible to correspond to the number of pixel lines on various substrates, and efficient coating is possible. In order to further improve the thickness of the phosphor paste applied between the stripe-shaped partition walls and increase the coating speed, as shown in FIG. 15 Base 13 having forming direction 16
It is also preferable to employ a method of simultaneously applying the ink from a plurality of ejection holes by using the above method. Further, as shown in FIG. 8, it is preferable that two or more discharge holes arranged in a line in a line at predetermined application position intervals of each color have two or more rows in the partition wall forming direction.

In addition, as shown in FIG.
It is also possible to use a base 23 having discharge holes for phosphor pastes that emit light of two or more different colors at the same time. In this case, phosphor pastes of different colors are discharged in order to avoid mixing with other colors. The hole spacing is preferably at least 600 μm. For example, in a high-definition plasma display panel, the interval between partition walls is 100 to 400 μm,
For example, the holes are shifted in the forming direction 26 of the partition wall 25 so that three holes are continuously formed in three colors so that the hole interval becomes a linear distance of 600 μm or more.
It is preferable to arrange them in rows.

When the bases for discharging phosphor pastes of different colors are independent of each other, the respective bases and / or the glass substrate are moved at the same speed in the direction in which the partition walls are formed, and the phosphor paste is applied. be able to.

As a more efficient method, as shown in FIG. 10, two or more bases 18 for discharging a phosphor paste are arranged for each color, or a phosphor paste for emitting two or more different colors is used. And two or more bases for discharging the glass substrate 17 at the same speed in the same direction while being synchronized or connected.
By using the method of coating the entire surface, the coating time can be reduced to half or less of the case where each color base is one.

When there are two or more bases, the bases are arranged so as to be shifted by an integral multiple of the space between the partitions in the direction perpendicular to the direction of the partitions, but as shown in FIG. It is also efficient and preferable to dispose the paste so that the position of two adjacent groups is “displaced” <“outer dimension of the base body” and the paste is applied to the glass substrate 27. FIG. 1
In FIG. 0 and FIG. 11, trajectories 19 and 29 show an example of the direction of movement of the base at this time.

The viscosity of the phosphor paste used in the method of discharging from the above-mentioned base is 0.1 to 50P.
a · s is preferable in that the coating is easy. More preferably, it is 0.5 to 40 Pa · s.

Next, the composition of the phosphor paste is such that components other than the phosphor powder evaporate or decompose during the drying and firing steps after application in order to form a phosphor layer composed of only the phosphor after firing. Is preferably removed.

The components other than the phosphor powder of the phosphor paste used in the present invention include an organic binder, a solvent, and if necessary, a dispersant, a plasticizer, a leveling agent and the like.

Further, by imparting photosensitivity to such a composition, pattern processing by photolithography is also possible. This method is effective for removing the phosphor formed in unnecessary portions such as the upper portion of the partition and the portion other than the partition forming portion in the coating step. That is, after the phosphor paste is applied, the exposed portion is exposed through a photomask, and the exposed portion of the paste is solubilized or insolubilized in a developing solution, thereby removing unnecessary portions in a developing process to form a phosphor layer. be able to.

Specific examples of the organic binder include:
(Poly) vinyl butyral, (poly) vinyl acetate, (poly) vinyl alcohol, cellulosic polymers (eg, methylcellulose, ethylcellulose, hydroxyethylcellulose, methylhydroxyethylcellulose), polyethylene, silicone polymers (eg,
(Poly) methylsiloxane, (poly) methylphenylsiloxane), polystyrene, butadiene / styrene copolymer, polystyrene, (poly) vinylpyrrolidone, polyamide, high molecular weight polyether, polyacrylamide copolymer of ethylene oxide and propylene oxide and various acrylic polymers ( Examples include sodium polyacrylate, (poly) lower alkyl acrylates, (poly) lower alkyl methacrylates and various copolymers and multipolymers of lower alkyl acrylates and methacrylates.

Specific examples of the plasticizer include dibutyl phthalate, dioctyl phthalate, polyethylene glycol, glycerin and the like.

Specific examples of the solvent include methyl cellosolve, ethyl cellosolve, butyl cellosolve, methyl ethyl ketone, dioxane, acetone, cyclohexanone, cyclopentanone, isobutyl alcohol, isopropyl alcohol, tetrahydrofuran, butyl carbitol acetate, dimethyl sulfoxide, Examples include γ-butyrolactone, bromobenzene, chlorobenzene, dibromobenzene, dichlorobenzene, bromobenzoic acid, chlorobenzoic acid, terpineol, and organic solvents containing at least one of these.

Examples of the dispersant include anionic and nonionic surfactants.

In particular, when patterning a phosphor layer by photolithography, a photosensitive phosphor paste containing an organic component containing a photosensitive compound and a phosphor powder as essential components is used.

The organic component containing the photosensitive compound used in the photosensitive phosphor paste is 10% by weight of the photosensitive compound.
Preferably, the organic component contains at least 25% by weight or more. The organic component containing a photosensitive compound,
It is composed of a photosensitive component selected from at least one of a photosensitive polymer, a photosensitive monomer, and a photosensitive oligomer, and a photopolymerization initiator, a sensitizer, an ultraviolet absorber, and the like that are added as needed.

The amount of the organic component containing the photosensitive compound in the photosensitive phosphor paste is preferably 15 to 60% by weight. If the amount is less than 15% by weight, the patternability tends to be deteriorated due to insufficient photosensitivity.

The photosensitive component includes a photo-insolubilizing type and a photo-solubilizing type. The photo-insolubilizing type includes: (1) a functional monomer having at least one unsaturated group in the molecule. (2) those containing photosensitive compounds such as aromatic diazo compounds, aromatic azide compounds and organic halogen compounds (3) so-called diazo resins such as condensates of diazo-based amines and formaldehyde And others.

Examples of the photo-soluble type include (4) a complex of a diazo compound with an inorganic salt or an organic acid, and a quinone diazo compound containing the quinone diazo compound. For example, there are naphthoquinone 1,2-diazido-5-sulfonic acid ester of phenol and novolak resin.

In the present invention, all of the above-mentioned photosensitive components can be used. However, the photosensitive component (1) is preferred in that it can be easily mixed with a phosphor powder and used.

As the photosensitive monomer (1), carbon-
Compounds containing a carbon unsaturated bond are preferable, and specific examples thereof include methyl acrylate, ethyl acrylate, n-propyl acrylate, isopropyl acrylate, n-butyl acrylate, sec-butyl acrylate, sec-butyl acrylate, and iso-butyl. Acrylate, tert-butyl acrylate, n-pentyl acrylate, allyl acrylate, benzyl acrylate, butoxyethyl acrylate, butoxytriethylene glycol acrylate, cyclohexyl acrylate, dicyclopentanyl acrylate, dicyclopentenyl acrylate, 2-ethylhexyl acrylate, glycerol acrylate, Glycidyl acrylate, heptadecafluorodecyl acrylate, 2-hydroxyethyl Rate, isobornyl acrylate,
2-hydroxypropyl acrylate, isodecyl acrylate, isooctyl acrylate, lauryl acrylate, 2-methoxyethyl acrylate, methoxyethylene glycol acrylate, methoxydiethylene glycol acrylate, octafluoropentyl acrylate, phenoxyethyl acrylate, stearyl acrylate, trifluoroethyl acrylate, allyl Cyclohexyl diacrylate, 1,4-butanediol diacrylate, 1,3-butylene glycol diacrylate, ethylene glycol diacrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, polyethylene glycol diacrylate, dipentaerythritol hexaacrylate, Pentaerythrito Monohydroxypentaacrylate, ditrimethylolpropane tetraacrylate, glycerol diacrylate, methoxylated cyclohexyl diacrylate, neopentyl glycol diacrylate, propylene glycol diacrylate, polypropylene glycol diacrylate, triglycerol diacrylate, trimethylolpropane triacrylate, acrylamide, Aminoethyl acrylate, phenyl acrylate, phenoxyethyl acrylate, benzyl acrylate, 1-naphthyl acrylate, 2-
Naphthyl acrylate, bisphenol A diacrylate, diacrylate of bisphenol A-ethylene oxide adduct, diacrylate of bisphenol A-propylene oxide adduct, thiophenol acrylate, benzyl mercaptan acrylate, and hydrogen atoms of these aromatic rings A monomer in which 1 to 5 are substituted with chlorine or bromine atoms, or styrene, p-methylstyrene, o-methylstyrene, m-methylstyrene, chlorinated styrene, brominated styrene, α-methylstyrene, chlorinated α- Methylstyrene, brominated α-methylstyrene, chloromethylstyrene, hydroxymethylstyrene, carboxymethylstyrene, vinylnaphthalene,
Examples thereof include vinyl anthracene, vinyl carbazole, and those obtained by partially or entirely changing acrylate in the molecule of the above compound to methacrylate, γ-methacryloxypropyltrimethoxysilane, 1-vinyl-2-pyrrolidone, and the like. In the present invention, one or two of these are used.
More than one species can be used.

It is preferable that the organic component containing a photosensitive compound contains an unsaturated acid such as an unsaturated carboxylic acid in addition to the photosensitive monomer in that the developability after exposure is improved. Specific examples of the unsaturated carboxylic acid include acrylic acid, methacrylic acid, itaconic acid, crotonic acid, maleic acid, fumaric acid, vinyl acetic acid, and acid anhydrides thereof.

The binder may contain polyvinyl alcohol, polyvinyl butyral, methacrylate polymer, acrylate polymer, acrylate-methacrylate copolymer, α-methylstyrene polymer, butyl methacrylate resin, etc. Can be.

Further, it may include an oligomer or a polymer obtained by polymerizing at least one of the compounds having a carbon-carbon unsaturated bond.

In the polymerization, the content of these monomers is 10% by weight or more, more preferably 35% by weight.
As described above, it can be copolymerized with another monomer.

As the monomer to be copolymerized, the use of an unsaturated acid such as the same unsaturated carboxylic acid as described above is preferable because the developability after exposure can be improved.

The polymer or oligomer having an acidic group such as a carboxyl group in the side chain thus obtained has an acid value (AV) of preferably from 50 to 180, more preferably from 70 to 140. When the acid value exceeds 180, the allowable development width becomes narrow. If the acid value is less than 50, the solubility of the unexposed portion in the developing solution tends to decrease. If the developing solution concentration is high, peeling occurs even in the exposed portion, making it difficult to obtain a high-definition pattern.

Photosensitivity can be imparted to the polymer or oligomer shown above by adding a photoreactive group to a side chain or a molecular terminal, and the polymer or oligomer can be used as a photosensitive polymer or oligomer.

Preferred photoreactive groups are those having an ethylenically unsaturated group. As the ethylenically unsaturated group,
Examples include a vinyl group, an allyl group, an acryl group, and a methacryl group.

A method for adding such a side chain to an oligomer or a polymer is based on a method in which an ethylenically unsaturated compound having a glycidyl group or an isocyanate group, an acrylic acid, or There is a method in which chloride, methacrylic chloride or allyl chloride is subjected to an addition reaction.

Examples of the ethylenically unsaturated compound having a glycidyl group include glycidyl acrylate, glycidyl methacrylate, allyl glycidyl ether, glycidyl ethyl acrylate, crotonyl glycidyl ether, glycidyl ether crotonic acid, glycidyl ether isocrotonic acid, and the like. .

Examples of the ethylenically unsaturated compound having an isocyanate group include (meth) acryloyl isocyanate and (meth) acryloylethyl isocyanate.

The ethylenically unsaturated compound having a glycidyl group or isocyanate group, acrylic acid chloride, methacrylic acid chloride or allyl chloride is used in an amount of from 0.05 to 0.05 to the mercapto group, amino group, hydroxyl group and carboxyl group in the polymer. It is preferable to add one molar equivalent.

Examples of photopolymerization initiators include benzophenone, methyl o-benzoylbenzoate, 4,4-bis (dimethylamine) benzophenone, 4,4-bis (diethylamino) benzophenone, 4,4-dichlorobenzophenone, Benzoyl-4-methyldiphenyl ketone, dibenzyl ketone, fluorenone, 2,2-diethoxyacetophenone, 2,2-dimethoxy-2-phenyl-2-phenylacetophenone, 2-hydroxy-2
-Methylpropiophenone, pt-butyldichloroacetophenone, thioxanthone, 2-methylthioxanthone, 2-chlorothioxanthone, 2-isopropylthioxanthone, diethylthioxanthone, benzyl, benzyldimethylketanol, benzylmethoxyethylacetal, benzoin, benzoinmethyl Ether, benzoin butyl ether, anthraquinone, 2-t-butyl anthraquinone, 2-amyl anthraquinone, β-
Chloranthraquinone, anthrone, benzanthrone, dibenzosuberone, methyleneanthrone, 4-azidobenzalacetophenone, 2,6-bis (p-azidobenzylidene) cyclohexanone, 2,6-bis (p-
Azidobenzylidene) -4-methylcyclohexanone,
2-phenyl-1,2-butadione-2- (o-methoxycarbonyl) oxime, 1-phenyl-propanedione-2- (o-ethoxycarbonyl) oxime, 1,3
-Diphenyl-propanetrione-2- (o-ethoxycarbonyl) oxime, 1-phenyl-3-ethoxy-
Propanetrione-2- (o-benzoyl) oxime,
Michler's ketone, 2-methyl- [4- (methylthio) phenyl] -2-morpholino-1-propanone, naphthalenesulfonyl chloride, quinoline sulfonyl chloride, N-phenylthioacridone, 4,4-azobisisobutyronitrile, diphenyl Combination of photoreducing dyes such as disulfide, benzthiazole disulfide, triphenylphosphine, camphorquinone, carbon tetrabromide, tribromophenylsulfone, benzoin peroxide and eosin, and methylene blue with reducing agents such as ascorbic acid and triethanolamine And the like. In the present invention, one or more of these can be used.

The photopolymerization initiator is added to the photosensitive component in an amount of 0.1%.
It is preferably added in the range of 1 to 6% by weight, more preferably 0.2 to 5% by weight. If the amount of the photopolymerization initiator is too small, the sensitivity to light becomes low, and if the amount of the photopolymerization initiator is too large, the residual ratio of the exposed portion may become too large.

A sensitizer is added to improve the sensitivity. Specific examples of the sensitizer include 2,4-diethylthioxanthone, isopropylthioxanthone, 2,3-bis (4-diethylaminobenzal) cyclopentanone,
2,6-bis (4-dimethylaminobenzal) cyclohexanone, 2,6-bis (4-dimethylaminobenzal) -4-methylcyclohexanone, Michler's ketone,
4,4-bis (diethylamino) -benzophenone,
4,4-bis (dimethylamino) chalcone, 4,4-bis (diethylamino) chalcone, p-dimethylaminocinnamylideneindanone, p-dimethylaminobenzylideneindanone, 2- (p-dimethylaminophenylvinylene)- Isonaphthothiazole, 1,3-bis (4-
Dimethylaminobenzal) acetone, 1,3-carbonyl-bis (4-diethylaminobenzal) acetone,
3,3-carbonyl-bis (7-diethylaminocoumarin), N-phenyl-N-ethylethanolamine, N
-Phenylethanolamine, N-tolyldiethanolamine, isoamyl dimethylaminobenzoate, isoamyl diethylaminobenzoate, 3-phenyl-5-benzoylthiotetrazole, 1-phenyl-5-ethoxycarbonylthiotetrazole and the like. In the present invention, one or more of these can be used.
Some sensitizers can also be used as photopolymerization initiators. The amount of the sensitizer to be added is 0.1 to the photosensitive component.
It is preferably from 0.05 to 10% by weight, more preferably from 0.1 to 10% by weight.
10% by weight. If the amount of the sensitizer is too small, the effect of improving the photosensitivity is not exhibited, and if the amount of the sensitizer is too large, the residual ratio of the exposed portion may be too small.

It is also effective to add an ultraviolet absorber. High definition and high resolution can be obtained by adding a light absorbing agent having a high ultraviolet absorbing effect. UV absorbers composed of organic dyes, especially 350 to 450 nm
Organic dyes having a high UV absorption coefficient in the above wavelength range are preferably used.

Specifically, azo dyes, aminoketone dyes, xanthene dyes, quinoline dyes, aminoketone dyes, anthraquinone, benzophenone, diphenylcyanoacrylate, triazine, p-aminobenzoic acid dyes, etc. Can be used. Even when the organic dye is added as an ultraviolet light absorber, it is preferable because deterioration of the insulating film characteristics due to the light absorber can be reduced without remaining in the insulating film after firing. Among these, azo dyes and benzophenone dyes are preferred. The addition amount of the organic dye is preferably 0.05 to 5% by weight based on the phosphor paste. 0.
If the content is less than 05% by weight, the effect of adding the ultraviolet light absorber decreases,
If it exceeds 5% by weight, the properties of the insulating film after firing deteriorate, which is not preferable. More preferably, it is 0.15 to 1% by weight.

As an example of the method of adding the ultraviolet light absorber composed of an organic dye, a solution in which the organic dye is dissolved in an organic solvent in advance is prepared, and then the phosphor powder is mixed in the organic solvent and then dried. By doing so, a method of producing a so-called capsule-like powder in which an organic film is coated on the surface of each powder of the phosphor powder and adding this to a paste can be mentioned.

A phosphor paste or a photosensitive phosphor paste using the same is composed of a phosphor powder, an organic binder,
After blending various components such as UV absorber, photosensitive polymer, photosensitive monomer, photopolymerization initiator, dispersant, plasticizer, solvent, etc. to the specified composition, they are mixed homogeneously with three rollers or kneader. Although it can be prepared by dispersing, the dispersant may be dissolved in a solvent in advance, or the phosphor powder may be surface-treated with a dispersant or an ultraviolet absorber, and then mixed with other components.

The substrate for a plasma display of the present invention can be obtained by forming a phosphor layer using the above-mentioned paste on a glass substrate on which electrodes and partition walls are formed.

The phosphor layer preferably has a thickness of 10 to 50 μm at the bottom and side surfaces of the partition (half the height of the partition), and the phosphor paste or photosensitive phosphor paste used is It is preferable to apply in a thickness in consideration of shrinkage after drying or firing depending on the phosphor powder ratio.

In particular, when the phosphor paste is applied by a base having a discharge hole, a nozzle or a needle, it is preferable that the paste is dried while the phosphor applied surface of the glass substrate is kept down. this is,
The phosphor layer can be formed on the side wall of the partition wall by the phosphor paste traveling along the side wall of the partition wall. By forming the phosphor layer not only between the partition walls but also on the side surfaces of the partition walls, the area of the phosphor surface can be increased, which is effective for improving the brightness of the plasma display. In this case, specifically, the glass substrate is preferably at 0 to 30 degrees with respect to the horizontal plane. The drying temperature and drying time vary depending on the paste composition and viscosity, but it is preferable to perform the drying at 50 to 200 ° C. for 5 to 60 minutes.

On the other hand, when performing pattern processing by photolithography using a photosensitive phosphor paste, exposure and development are performed after application. That is, exposure is performed through a photomask, and the exposed portion of the paste is solubilized or insolubilized in a developer, and unnecessary portions are removed in the developing process.

The exposure method at this time is not particularly limited, and a method of performing mask exposure using a photomask as in usual photolithography is used. As the mask to be used, either a negative type or a positive type is selected depending on the type of the photosensitive organic component. Alternatively, a method of directly drawing with a laser beam or the like without using a photomask may be used. As the exposure device, a stepper exposure device, a proximity exposure device, or the like can be used.

In the case of exposing a large area, a photosensitive fluorescent paste is applied onto a substrate such as a glass substrate and then exposed while being conveyed. The area can be exposed.

The active light source used at this time is, for example,
Visible light, near-ultraviolet light, ultraviolet light, electron beam, X-ray, laser light, etc. are preferable. Among them, ultraviolet light is preferable. Etc. can be used. Among these, an ultra-high pressure mercury lamp is preferred.

When a photomask is used, the design of the pattern width is important. Normally, the same width (space) as the width obtained by subtracting the partition width from the partition pitch is used. However, in consideration of alignment accuracy and light scattering at the time of exposure, a photomask having a pattern narrower than the space by 0 to 30 μm may be used. Good.

Further, after exposure, development is carried out using a developing solution. In this case, an immersion method, a spray method, a brush method or the like can be used.

As the developer, an organic solvent in which an organic component in the photosensitive fluorescent paste can be dissolved can be used. Water may be added to the organic solvent as long as the solvent does not lose its solubility. In particular, when a compound having an acidic group such as a carboxyl group is present in the photosensitive fluorescent paste, development can be performed with an aqueous alkali solution. As the alkali aqueous solution, a metal alkali aqueous solution such as a sodium hydroxide or calcium hydroxide aqueous solution can be used, but it is preferable to use an organic alkali aqueous solution since the alkali component can be easily removed at the time of firing.

As the organic alkali, an amine compound can be used. Specific examples include tetramethylammonium hydroxide, trimethylbenzylammonium hydroxide, monoethanolamine, diethanolamine and the like. The concentration of the alkaline aqueous solution is usually 0.01 to 10% by weight, more preferably 0.1 to 5% by weight. If the alkali concentration is too low, the unexposed portions will not be removed, and if the alkali concentration is too high, the pattern portions may be peeled off and the exposed portions may be corroded. The development temperature is preferably from 20 to 50 ° C. in terms of process control.

In the above steps, a heating step at 50 to 300 ° C. may be introduced for the purpose of drying and preliminary reaction.

Further, firing is performed in a firing furnace to remove organic components other than the phosphor. The firing atmosphere and the temperature vary depending on the type of the paste or the substrate, but specifically, a firing temperature of 400 to 550 ° C. in an atmosphere of air, nitrogen, hydrogen, or the like is preferable. As the firing furnace, a batch type firing furnace, a belt type or a roller hearth type continuous firing furnace, or the like can be used.

Through the above-described firing step,
A PDP substrate having a red phosphor layer 4 ', a blue phosphor layer 5', and a green phosphor layer 6 'formed between partitions on a glass substrate as shown in FIG. 3 can be produced. It can be preferably used as a substrate.

The PDP substrate obtained as described above is used for the back surface, sealed together with the front and back glass substrates, and sealed with a rare gas such as helium, neon, or xenon to form a panel portion of the PDP. Can be manufactured. Furthermore, by mounting a driver IC for driving, the PDP
Can be manufactured.

Hereinafter, the present invention will be specifically described with reference to examples. However, the present invention is not limited to this. The concentration (%) in the examples is% by weight unless otherwise specified.

[0086]

Example 1 To prepare a phosphor paste, 47 g of a phosphor powder, 20 g of a binder polymer (methyl methacrylate, methacrylic acid, styrene copolymer) and 33 g of a solvent (γ-butyrolactone) were prepared.

As the phosphor powder, red: (Y, Gd, E
u) BO ₃ (maximum particle diameter 27 μm, cumulative average particle diameter 2.
7 μm, specific surface area 3.1 m ² / cc), green: (Zn, M
n) ₂ SiO ₄ (maximum particle diameter 25 μm, cumulative average particle diameter 3.6 μm, specific surface area 2.5 m ² / cc), blue: (B
(a, Eu) MgAl ₁₀ O ₁₇ (maximum particle diameter 27 μm, cumulative average particle diameter 3.7 μm, specific surface area 2.3 m ² / cc) was used.

First, the binder polymer and the solvent
It melt | dissolved, heating at 0 degreeC, and after that, phosphor powder was added and it knead | mixed with the kneading machine, and the phosphor paste of three colors was produced. The viscosity was 12 Pa · s.

A paste having a pitch of 220 μm and a height of 15 μm was prepared.
Red, green, and blue pastes were applied in a stripe shape on a glass substrate on which 961 partition walls of 0 μm and 60 μm width were formed.

The coating was performed by a nozzle having 16 discharge ports with a hole diameter of 150 μm. One nozzle was used for each of the red, blue, and green phosphor pastes. The distance between the tip of the nozzle and the upper end of the partition was set to 50 μm. Then, the discharge pressure is adjusted to 3 kg / c by a dispenser.
m ² , and a predetermined amount of the phosphor paste was discharged and applied between the partition walls while running the nozzle at a constant speed in parallel with the partition walls.

First, a red phosphor paste was applied between predetermined partition walls. At this time, at the position where one coating (16 coatings) is completed, the nozzle is set at 10 in the direction perpendicular to the partition wall forming direction.
The coating was moved by 560 μm and then applied between the partition walls for the second time while the nozzle was running in the direction opposite to the first time. This was repeated 20 times, and 320 red phosphors at predetermined positions were applied. After completion of the coating, the coating was dried at 80 ° C. for 40 minutes with the coated surface facing upward.

Next, 320 blue phosphor pastes were similarly applied between the adjacent partitions coated with the red phosphor paste and dried. Next, 320 green phosphor pastes were similarly applied between the adjacent partitions coated with the blue phosphor paste and dried. During the above application, there was no clogging of the discharge holes of the die, and stable application could be performed. Then, the obtained glass substrate was baked at 500 ° C. for 30 minutes.

Observation of the thickness of the side surface and the thickness of the bottom portion by an electron microscope revealed that the phosphors of each color could be formed in a stripe shape with a thickness of 20 ± 5 μm on the side surface and 20 ± 5 μm on the bottom portion.

Example 2 To prepare a phosphor paste, 39 g of a phosphor powder, 8 g of a binder polymer (ethyl cellulose) and 53 g of a solvent (terpineol) were prepared. The phosphor powder was the same as in Example 1 (red: (Y, Gd, Eu) B
O ₃ , green: (Zn, Mn) ₂ SiO ₄ , blue: (Ba, E
u) MgAl ₁₀ O ₁₇ ) was used.

First, each of the organic components was dissolved in water while heating at 60 ° C., and then phosphor powder was added and kneaded with a kneader to prepare a phosphor paste. The viscosity was 35 Pa · s.

The paste was prepared with a pitch of 220 μm and a height of 15 μm.
Red, green, and blue pastes were applied in a stripe shape on a glass substrate on which 961 partition walls of 0 μm and 60 μm width were formed.

The coating was performed by a die having 20 discharge holes having a hole diameter of 100 μm and formed in a line at a pitch of 660 μm.
Two caps were used for each of the red, blue, and green phosphor pastes. The distance between the discharge hole of the base and the upper end of the partition was set to 50 μm. The discharge pressure is adjusted to 4 kg / cm ² by a dispenser, and a predetermined amount of the phosphor paste is discharged from the 20 discharge holes while the base is running at a constant speed in parallel with the partition walls, and is simultaneously applied between the 20 partition walls. did.

First, the red phosphor paste was applied between predetermined partition walls. At this time, two bases for discharging the red phosphor paste were respectively attached to the ends where the partition walls were formed, in a direction perpendicular to the partition wall direction. The discharge holes were arranged so that the distance between the discharge holes at the center of the two bases was 105.6 mm. The two bases were synchronized and simultaneously run in the same direction at the same speed. At the position where the application of 20 pieces was completed for each of the two bases, the two bases were simultaneously moved in the same direction by 13,200 μm in the direction perpendicular to the partition wall forming direction.
Next, the coating was applied between the 20 partition walls while the two caps were running in the opposite direction in the same manner. Repeat this eight times,
A single base is used to fix the red phosphor paste at a predetermined position.
A total of 320 pieces were applied, including zero and two sets. After application,
It was dried at 80 ° C. for 40 minutes with the coated side down.

Next, 320 pieces of blue phosphor paste were similarly applied between two adjacent partitions to which the red phosphor paste was applied by using two bases and dried. Next, 320 green phosphor pastes were similarly applied between the adjacent partitions coated with the blue phosphor paste by two bases and dried. During the above application, there was no clogging of the discharge holes of the die, and stable application could be performed. Then, the obtained glass substrate is
Baking was performed at 0 ° C. for 30 minutes.

When the thickness of the side surface and the thickness of the bottom portion were observed by an electron microscope, the phosphors of each color could be formed in a stripe shape with a thickness of 20 ± 5 μm on the side surface and 20 ± 5 μm on the bottom portion.

Example 3 The same phosphor paste as in Example 1 was applied to the same partition walls as in Example 1 in the form of red, blue and green stripes.

The coating was performed by a die (240 needles, length 6 mm) having 80 needles having a discharge diameter of 150 μm in a row at a pitch of 660 μm, and press-fitting the tips into three rows at a pitch of 650 μm. Was. Four caps were used for each of the red, blue, and green phosphor pastes. The distance between the tip of the needle part of the base and the upper end of the partition was set to 80 μm. The discharge pressure is adjusted to 4 kg / cm ² by a dispenser, and a predetermined amount of the phosphor paste is discharged from 240 discharge holes while the base is running at a constant speed in parallel with the partition walls, and the phosphor paste is simultaneously applied between the 80 partition walls. did. First, a red phosphor paste was applied between predetermined partition walls. At this time, the four bases for discharging the red phosphor paste are arranged alternately at intervals of the main body (1 mm) in which three rows of 80 needles are arranged in a direction perpendicular to the partition wall forming direction and adjacent bases do not contact. Was set as follows. The four bases were synchronized and simultaneously run in the same direction at the same speed. The discharge start and end of the phosphor paste
This was performed only when the tip of the needle was located above the partition wall. Thereby, 320 lines between the partition walls were applied at one time.

After completion of the coating, the coated surface was
Dried for 0 minutes. Next, 320 blue phosphor pastes were similarly applied between the adjacent partitions to which the red phosphor paste was applied using four bases and dried. Next, 320 green phosphor pastes were similarly applied between the adjacent partitions to which the blue phosphor paste was applied by using four bases and dried. During the above application, there was no clogging of the discharge holes of the die, and stable application could be performed. Then, the obtained glass substrate is
Baking was performed at 00 ° C. for 30 minutes.

Observation of the side thickness and the bottom thickness by an electron microscope revealed that the phosphors of each color could be formed in a stripe shape with a thickness of 20 ± 5 μm on the side and 20 ± 5 μm on the bottom.

Example 4 To prepare a phosphor paste, 45 g of a phosphor powder was prepared.
Binder polymer (methyl methacrylate, methacrylic acid, styrene copolymer) 15 g, trimethylolpropane triacrylate 9 g, solvent (γ-butyrolactone) 30 g, benzophenone dye 0.05 g, photopolymerization initiator (“Irgacure” 907, Ciba Geigy) Made)
1 g was prepared.

The phosphor powder was the same as in Example 1 (red:
(Y, Gd, Eu) BO ₃ , green: (Zn, Mn) ₂ Si
O ₄ , blue: (Ba, Eu) MgAl ₁₀ O ₁₇ ) was used.

First, each component other than the phosphor powder was dissolved while heating to 60 ° C., and then the phosphor powder was added and kneaded with a kneader to prepare a phosphor paste.
The viscosity was 3.5 Pa · s.

The paste was applied to the same partition walls as in Example 1 in red,
It was applied in green and blue stripes. Coating is 150 hole diameter
80 needles having a discharge hole of μm are arranged in a line at a pitch of 660 μm, and the needles are shifted by a pitch of 220 μm.
As a row (row pitch: 15 mm), a die (240 needles, length: 3 mm) pressed into the tip was used. Four caps were used. The distance between the tip of the needle part of the base and the upper end of the partition was set at 50 μm. The discharge pressure is adjusted to 3 kg / cm ² by a dispenser, and a predetermined amount of the phosphor paste is discharged from 240 discharge holes while the base is running at a constant speed in parallel with the partition walls, and the phosphor paste is simultaneously applied between the 240 partition walls. did. A red phosphor paste is discharged from the first row of needles of the base, a green phosphor paste is discharged from the second row of needles, and a blue phosphor paste is discharged from the third row of needles. did. At this time, the four bases were set so that 80 needles in three rows were arranged in the direction of the partition wall and the direction perpendicular to the partition wall, respectively, and alternately positioned at an interval (1 mm) at which adjacent bases did not come into contact with each other. 4
The base caps were synchronized and simultaneously run in the same direction at the same speed. The discharge start and end of the phosphor paste were performed only when the tip of the needle was positioned above the partition. Thereby, 960 lines between the partition walls were applied at once. During the above application, there was no clogging of the discharge holes of the die, and stable application could be performed. After completion of the coating, the coating was dried at 80 ° C. for 40 minutes with the coated surface facing down.

Next, after aligning and exposing a negative photomask having a pitch of 220 μm and a line width of 70 μm,
And then developed at 500 ° C for 30%.
A minute firing was performed.

Observation of the thickness of the side surface and the thickness of the bottom portion by an electron microscope revealed that the phosphors of each color could be formed in a stripe shape with a thickness of 23 ± 2 μm on the side surface and a thickness of 30 ± 6 μm on the bottom portion.

[0111]

The substrate for a PDP of the present invention is a substrate for a PDP having at least electrodes, partition walls, and three types of phosphor layers for emitting red, green, and blue light which are provided in stripes between the partition walls on a glass substrate. In addition, since the phosphor layer is made of an inorganic phosphor powder having a maximum particle diameter of 40 μm or less, the clogging of the ejection holes is not restricted even when a method of ejecting the phosphor paste from the base when forming the phosphor layer is adopted. This is a PDP substrate having a high-precision phosphor layer, which can be stably applied without generation of the like. Further, since the phosphor layer is uniformly applied to the side and bottom portions of the partition walls, an excellent brightness can be obtained by manufacturing a PDP using the PDP substrate of the present invention as a back plate.

[Brief description of the drawings]

FIG. 1 is a schematic view of a glass substrate having a partition wall preferably used for manufacturing a plasma display substrate of the present invention.

FIG. 2 is a schematic view showing a glass substrate after a phosphor layer is applied.

FIG. 3 is a schematic view showing a substrate for a plasma display of the present invention.

FIG. 4 is a diagram schematically showing a method of applying a phosphor paste.

FIG. 5 is a schematic cross-sectional view schematically showing one example of a die used for applying a phosphor paste.

FIG. 6 is a schematic cross-sectional view schematically showing one example of a nozzle with a nozzle used for applying a phosphor paste.

FIG. 7 is a schematic cross-sectional view schematically showing one example of a base with a needle used for applying a phosphor paste.

FIG. 8 is a schematic plan view showing an example of an arrangement of discharge holes of a base, showing a positional relationship with respect to a partition on a glass substrate.

FIG. 9 is a schematic plan view showing another example of the arrangement of the discharge holes of the base, showing a positional relationship with respect to a partition on a glass substrate.

FIG. 10 schematically shows an example of a preferred method of applying a phosphor paste in the present invention.

FIG. 11 schematically shows another example of a preferred method of applying a phosphor paste in the present invention.

[Explanation of symbols]

1: electrode 2: glass substrate 3: partition wall 4: red phosphor paste layer 5: blue phosphor paste layer 6: green phosphor paste layer 4 ': red phosphor layer 5': blue phosphor layer 6 ': green phosphor Body layer 7: Ejector 8: Phosphor paste 9: Distance between tip of ejector and upper part of partition 10: Perforated base 11: Perforated nozzle 12: Perforated needle 13: One-color application base or nozzle or needle 23 in one row arrangement hole : One-color coating base or nozzle or needle having three rows of holes 15, 25: Partition 16, 26: Partition forming direction 17, 27: Glass substrate 18, 28: Base 19, 29: Locus

Claims (12)

[Claims] 1. A plasma display substrate comprising at least an electrode, a partition, and three types of phosphor layers which emit red, green and blue light between the partition on a glass substrate. Consisting of an inorganic phosphor powder having a maximum particle diameter of 40 μm or less. 2. The plasma display substrate according to claim 1, wherein the maximum particle size of the inorganic phosphor powder is 30 μm or less. 3. An inorganic phosphor powder having a cumulative average particle size of 0.5
3. The plasma display substrate according to claim 1, wherein the substrate has a specific surface area of 0.1 to ⁵ m ² / cc. 4. The method according to claim 1, wherein the inorganic phosphor powder is [(Y, Gd, Eu) B].
O ₃ ], [(Y, Eu) ₂ O ₃ ], [(Zn, Mn) ₂ Si
O ₄ ], [(Ba, Eu) MgAl ₁₀ O ₁₇ ], [(B
a, Sr, Mg) O · aAl 2 O 3: Mn] and [Ba
Al ₁₂ O ₁₉ : Mn], and the plasma display substrate according to any one of claims 1 to 3. 5. A red, green or green color having a maximum particle size of 40 μm or less.
By discharging three types of phosphor pastes each containing an inorganic phosphor powder that emits blue light from a die having nozzles or needle discharge holes, and applying the paste in the form of stripes between partition walls formed on a glass substrate. A method for manufacturing a plasma display substrate, comprising forming a phosphor screen. 6. The number of discharge holes per base is (16n)
6. The method according to claim 5, wherein the value is in the range of (-5) to (16n + 5) (where n represents an arbitrary natural number). 7. The method according to claim 6, wherein n is a multiple of 5. 8. The method for manufacturing a plasma display substrate according to claim 5, wherein the base and / or the glass substrate is moved in a direction in which the partition walls are formed. 9. The plasma display substrate according to claim 5, wherein the distance between the tip of the discharge hole and the upper end of the partition wall during the application of the phosphor paste is 0.01 to 2 mm. Production method. 10. The phosphor paste has a viscosity of 0.1 to 50P.
a.s, characterized by the above-mentioned.
13. The method for producing a plasma display substrate according to the above item. 11. The method according to claim 5, wherein after the phosphor paste is applied, the phosphor paste is dried with the phosphor applied surface facing downward.
11. The method for manufacturing a plasma display substrate according to any one of claims 10 to 10. 12. The phosphor paste according to claim 5, wherein the phosphor paste is a photosensitive phosphor paste.
13. The method for producing a plasma display substrate according to the above item.