JP4164508B2 - 露光装置及びデバイス製造方法 - Google Patents

露光装置及びデバイス製造方法 Download PDF

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Publication number
JP4164508B2
JP4164508B2 JP2005291809A JP2005291809A JP4164508B2 JP 4164508 B2 JP4164508 B2 JP 4164508B2 JP 2005291809 A JP2005291809 A JP 2005291809A JP 2005291809 A JP2005291809 A JP 2005291809A JP 4164508 B2 JP4164508 B2 JP 4164508B2
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liquid
wafer
substrate
exposure
optical system
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Expired - Fee Related
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JP2005291809A
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Japanese (ja)
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JP2006093721A5 (https=
JP2006093721A (ja
Inventor
一志 中野
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Canon Inc
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Canon Inc
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005291809A 2005-10-04 2005-10-04 露光装置及びデバイス製造方法 Expired - Fee Related JP4164508B2 (ja)

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JP2005291809A JP4164508B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

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JP2005291809A JP4164508B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

Related Parent Applications (1)

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JP2003185389A Division JP3862678B2 (ja) 2003-06-27 2003-06-27 露光装置及びデバイス製造方法

Related Child Applications (1)

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JP2007248076A Division JP4533416B2 (ja) 2007-09-25 2007-09-25 露光装置およびデバイス製造方法

Publications (3)

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JP2006093721A JP2006093721A (ja) 2006-04-06
JP2006093721A5 JP2006093721A5 (https=) 2007-08-23
JP4164508B2 true JP4164508B2 (ja) 2008-10-15

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JP2005291809A Expired - Fee Related JP4164508B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4517354B2 (ja) * 2004-11-08 2010-08-04 株式会社ニコン 露光装置及びデバイス製造方法
US7423720B2 (en) 2004-11-12 2008-09-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI416269B (zh) * 2006-08-31 2013-11-21 尼康股份有限公司 Mobile body driving method and moving body driving system, pattern forming method and apparatus, exposure method and apparatus, and component manufacturing method
JP5177736B2 (ja) * 2006-11-01 2013-04-10 レーザーテック株式会社 マスク検査装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1571697A4 (en) * 2002-12-10 2007-07-04 Nikon Corp EXPOSURE SYSTEM AND COMPONENT MANUFACTURING METHOD
SG139733A1 (en) * 2003-04-11 2008-02-29 Nikon Corp Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
JP2005277363A (ja) * 2003-05-23 2005-10-06 Nikon Corp 露光装置及びデバイス製造方法

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