JP4162317B2 - 近視野光メモリヘッド - Google Patents
近視野光メモリヘッド Download PDFInfo
- Publication number
- JP4162317B2 JP4162317B2 JP05282599A JP5282599A JP4162317B2 JP 4162317 B2 JP4162317 B2 JP 4162317B2 JP 05282599 A JP05282599 A JP 05282599A JP 5282599 A JP5282599 A JP 5282599A JP 4162317 B2 JP4162317 B2 JP 4162317B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- field optical
- field
- substrate
- optical memory
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 title claims description 134
- 239000000758 substrate Substances 0.000 claims description 113
- 239000004065 semiconductor Substances 0.000 claims description 20
- 230000000694 effects Effects 0.000 claims description 14
- 230000003993 interaction Effects 0.000 claims description 14
- 230000001678 irradiating effect Effects 0.000 claims description 8
- 230000001902 propagating effect Effects 0.000 claims description 7
- 239000010408 film Substances 0.000 description 51
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 42
- 229910052710 silicon Inorganic materials 0.000 description 42
- 239000010703 silicon Substances 0.000 description 42
- 239000000523 sample Substances 0.000 description 41
- 238000004519 manufacturing process Methods 0.000 description 21
- 239000013307 optical fiber Substances 0.000 description 14
- 239000011521 glass Substances 0.000 description 13
- 238000000034 method Methods 0.000 description 11
- 238000001514 detection method Methods 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 238000009826 distribution Methods 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- 238000000206 photolithography Methods 0.000 description 5
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 4
- 238000000605 extraction Methods 0.000 description 4
- 230000004907 flux Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000000314 lubricant Substances 0.000 description 3
- 230000000149 penetrating effect Effects 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 238000010408 sweeping Methods 0.000 description 2
- 230000005641 tunneling Effects 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Images
Landscapes
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Optical Head (AREA)
- Light Receiving Elements (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP05282599A JP4162317B2 (ja) | 1998-04-08 | 1999-03-01 | 近視野光メモリヘッド |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10-96224 | 1998-04-08 | ||
| JP9622498 | 1998-04-08 | ||
| JP05282599A JP4162317B2 (ja) | 1998-04-08 | 1999-03-01 | 近視野光メモリヘッド |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11353690A JPH11353690A (ja) | 1999-12-24 |
| JPH11353690A5 JPH11353690A5 (enExample) | 2006-04-27 |
| JP4162317B2 true JP4162317B2 (ja) | 2008-10-08 |
Family
ID=26393493
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP05282599A Expired - Lifetime JP4162317B2 (ja) | 1998-04-08 | 1999-03-01 | 近視野光メモリヘッド |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4162317B2 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5578527B2 (ja) * | 2009-06-30 | 2014-08-27 | 国立大学法人北海道大学 | プローブおよびその製造方法ならびにプローブ顕微鏡ならびに磁気ヘッドおよびその製造方法ならびに磁気記録再生装置 |
-
1999
- 1999-03-01 JP JP05282599A patent/JP4162317B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH11353690A (ja) | 1999-12-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3862845B2 (ja) | 近接場用光プローブ | |
| JP4094229B2 (ja) | 近視野光ヘッドおよびその製造方法 | |
| JP4060150B2 (ja) | マイクロ集積型近接場光記録ヘッド及びこれを利用した光記録装置 | |
| JP4024570B2 (ja) | 近視野光発生素子、近視野光記録装置、および近視野光顕微鏡 | |
| KR20060065430A (ko) | 광섬유 조명계, 광섬유 조명계의 제작 방법, 광섬유조명계를 구비하는 광 기록 헤드, 및 광 기록 및 재생 장치 | |
| EP0984438B1 (en) | Recording apparatus | |
| JP4083330B2 (ja) | 近視野光メモリヘッド | |
| JP4601867B2 (ja) | 近視野光ヘッド | |
| US6479816B1 (en) | Near-field optical probe | |
| KR100525241B1 (ko) | 전위차를 이용한 광섬유 탐침 및 그를 이용한 광기록 장치 | |
| JP4162317B2 (ja) | 近視野光メモリヘッド | |
| JP4610855B2 (ja) | 近視野光発生素子、近視野光記録装置、および近視野光顕微鏡 | |
| JP4628454B2 (ja) | 記録媒体および光情報記録再生装置 | |
| JP4593666B2 (ja) | 近視野光発生素子、近視野光記録装置、および近視野光顕微鏡 | |
| JPH09326130A (ja) | 光導波素子及びその製造方法並びにそれを用いた光情報記録再生装置 | |
| JP4201232B2 (ja) | 記録媒体および光情報記録再生装置 | |
| JP3892264B2 (ja) | 近視野光発生素子の作製方法 | |
| JP4717958B2 (ja) | 記録媒体および光情報記録再生装置 | |
| JP2000260050A (ja) | 光記録再生装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RD01 | Notification of change of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7421 Effective date: 20040302 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060222 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20060222 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20080415 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20080422 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080623 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20080715 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20080722 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110801 Year of fee payment: 3 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| RD01 | Notification of change of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7421 Effective date: 20091108 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110801 Year of fee payment: 3 |
|
| RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: R3D03 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120801 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120801 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130801 Year of fee payment: 5 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |