JP4116209B2 - Environmental monitoring system - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
In the semiconductor manufacturing process, for example, the manufacturing process of a substrate such as a wafer and a photomask, the environment of the material and product is transported using a transfer robot in an ultra-clean environment. The present invention relates to an environmental monitoring system for monitoring the cleanliness (cleanness), etc.
[0002]
[Prior art]
Conventionally, cleanliness in a clean environment has only been measured when a clean room is installed. In addition, some sensors have a plurality of sensors arranged in a clean room and measure the cleanliness at each point.
[0003]
[Problems to be solved by the invention]
However, the recent drawing patterns are remarkably densified, and with conventional dust generation countermeasures, there is a high possibility that the yield of non-defective products will decrease due to the fatal effect of the glass substrate and the like.
In addition, although the transport robot performs transport with the dust generation suppressed as much as possible, when the surrounding environment deteriorates due to the failure of the air conditioning equipment or transport robot, it cannot be judged until the yield deteriorates in the inspection process, In addition, it is difficult to specify the position.
[0004]
In order to solve this problem, a device for monitoring the cleanliness environment has been proposed, but in order to monitor the entire production line, it is necessary to install a large number of sensors at a plurality of locations. In addition, there is a problem that installation space is required, which leads to an increase in manufacturing cost. In addition, the degree of cleanliness in the vicinity of the conveyed object (workpiece, etc.) being conveyed was not accurately reflected.
The same applies not only to dust generation but also to the fields of light influence on the photosensitive resist and gas contamination on the chemically amplified resist.
[0005]
An object of the present invention is to solve the above-described problems and provide an environment monitoring system that can detect and immediately take measures when dust generation or abnormality occurs near a conveyed product. .
[0006]
[Means for Solving the Problems]
In order to solve the above-mentioned problems, the invention of claim 1 includes the clean room (31) of the previous process, the two clean rooms (32A and 32B) of the main process, the clean room (33) of the next process, and the book. Two transport paths (A, B) provided in the two clean rooms (32A, 32B) of the process, and the two clean rooms (32A, 32B) of the main process are configured to remove dust in a clean environment. Foreign matter / abnormality detection means (12) for detecting the size and / or number of pieces, and moving means (20) for moving the foreign matter / abnormality detection means (12) along a conveyance path of a conveyed product containing materials and / or products. ) And a position detection means (13) for detecting the position of the foreign matter / abnormality detection means (12), respectively, and monitors the position of each position detection means (13) to detect each foreign matter / abnormality detection means. The state of dust is monitored based on the output of 12), and when the output of the foreign matter / abnormality detection means (12) exceeds a predetermined reference value, the clean room (32A, 32B) of the two systems of the present process Among them, a monitoring means (11) for changing a transport path from a clean room exceeding the reference value to another clean room is provided, the transported object is a substrate, and the moving means (20) is attached to be freely rotatable and extendable. The robot hand (23), and a substrate placement section (24) for placing the substrate to be transported provided on the robot hand (23), wherein the abnormality detecting means (12) 23), and is installed in the vicinity of the board installation section (24).
[0015]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, the present invention will be described in more detail with reference to the drawings and the like.
FIG. 1 is a block diagram showing an outline of an embodiment of an environmental monitoring system according to the present invention.
The monitoring system 10 controls the entire system including the transfer robot 20 and other manufacturing apparatuses (not shown), and a centralized control computer 11 that can obtain time information from a clock 11a and particles that detect dust in the work environment. A sensor 12, a position sensor 13 that detects the position of the particle sensor 12, and an operation terminal 14 such as a personal computer operated by the worker P are connected to each other via a network 15.
In this embodiment, since the position sensor 13 obtains position information from the positioning driver of the transfer robot 20 and does not use a special sensor, a simpler monitoring system can be obtained.
[0016]
The particle sensor 12 is a sensor that detects the size and number of dusts, and the detection method may be any method such as a laser method or an ultrasonic method.
The particle sensor 12 is attached to a transport robot 20 that also serves as a moving means in order to detect dust generation in the vicinity of the transport path, which is a position that affects the product. By monitoring, dust distribution can be tabulated.
[0017]
FIG. 2 is a perspective view showing the attachment position of the particle sensor of the environmental monitoring system according to the present embodiment.
The transport robot 20 is a device that transports materials such as materials and products in an ultra-clean environment, and is capable of rotating and extending and contracting to and from the travel rail 21, the base portion 22 that travels on the travel rail 21, and the base portion 22. A robot hand 23 attached to the robot hand 23, and a substrate placement unit 24 for placing a substrate as a transported object on the robot hand 23.
[0018]
In this embodiment, the particle sensor 12 is provided in the vicinity of the product installation unit 24 of the robot hand 23 of the transfer robot 20 and monitors the state of dust on the substrate installation unit 24 or on the substrate surface A.
[0019]
FIG. 3 is a flowchart showing the operation of the embodiment of the environmental monitoring system according to the present invention.
The particle sensor 12 is always in operation and measures foreign matter information X such as the diameter and number of dust. When the foreign object information X is detected (S101), the central control computer 11 which is a host computer receives the position information (position where dust is detected) Y of the conveyed object from the positioning driver of the transfer robot 20, and the position information Y ( S102) and time information Z (S103) are input to the centralized control computer 11 together.
[0020]
The central control computer 11 has previously set a threshold value (X0) related to dust, and when the foreign object information X exceeds the threshold value X0 (S104), it issues an alarm to the operation terminal 14 (S105), and the operator Inform P.
[0021]
Further, the centralized control computer 11 determines whether or not the transfer route can be changed from an area with a large amount of foreign matter to an area with a small amount of foreign matter (S106). If the change is possible, the central control computer 11 immediately instructs the transfer robot 20 to change the route. (S107).
[0022]
Finally, the foreign object information X (S101), the position information Y (S102), the time information Z (S103), etc. are totaled (S108), and the process is terminated.
[0023]
FIG. 4 is a diagram for explaining the path changing operation of the environment monitoring system according to the present embodiment.
This production line is provided with a clean room 31 in the previous process, two clean rooms 32A and 32B in this process, and a clean room 33 in the next process. The conveyed product is conveyed from the clean room 31 to the clean rooms 32A and 32B by two routes (A) and (B).
[0024]
In the clean rooms 32A and 32B, transfer robots 20A and 20B are arranged, respectively, and equipped with particle sensors 12A and 12B, respectively. Further, processing devices 42A and 42B are arranged in the clean rooms 32A and 32B.
[0025]
If the instruction to change the conveyance path is correct in S107 in FIG. 3, the path is automatically changed from the conveyance path (A) where the foreign matter is detected to the conveyance path (B). Then, the contaminated part in the clean room 32A is confirmed and cleaned. Therefore, it is possible to cope before the yield deteriorates.
[0026]
As described above, according to the present embodiment, as a measure against dust generation, by installing the particle sensor 12 in the robot hand 23 of the transfer robot 20 used for transferring the product, the cleanliness in the vicinity of the product is always improved. The measured size and amount of dust are transmitted to the central control computer 11 and the work terminal 14 of the worker P via the network 15 together with the measurement location and the measurement time.
Accordingly, since dust generation contamination can be managed during the conveyance, even if the periphery of the conveyance path is contaminated, the yield can be prevented from being deteriorated by quick feedback.
[0027]
The present invention is not limited to the embodiment described above, and various modifications and changes can be made, and these are also within the equivalent scope of the present invention.
(1) The sensor installed in the robot hand is not only a particle sensor, but also a product that becomes an obstacle to the product, such as a product that is sensitive to light such as ultraviolet rays (a substrate coated with a resist, etc.). When transporting, an illuminometer (light sensor) is installed, or when gas is generated in an etching process or the like, a gas sensor can be installed to measure the influence on the product during transport.
[0028]
(2) In S105, the example of generating an alarm has been described, but the manufacturing system may be temporarily stopped.
(3) In S107, although the example which changes a conveyance path | route was demonstrated, you may make it raise the output of cleaning apparatuses, such as a fan, or operate an automatic cleaning apparatus (cleaning robot).
[0029]
(4) In particular, it may be possible to improve the work site by collecting data for each place and every time without issuing an alarm or the like.
(5) The apparatus for attaching the particle sensor or the like is not limited to the robot hand, and may be attached to a transport vehicle (AGV), a belt conveyor, or the like as long as the product is likely to generate dust and the product moves.
[0030]
(6) A plurality of particle sensors or the like may be attached at different heights on the same plane.
[0031]
【The invention's effect】
As described above in detail, according to the present invention, when a foreign object or abnormality occurs in the vicinity of a transported object, they can be detected and acquired together with position information and time information, and measures can be taken immediately. There is an effect.
[Brief description of the drawings]
FIG. 1 is a block diagram showing an outline of an embodiment of an environmental monitoring system according to the present invention.
FIG. 2 is a perspective view showing an attachment position of a particle sensor in the environmental monitoring system according to the present embodiment.
FIG. 3 is a flowchart showing the operation of the embodiment of the environment monitoring system according to the present invention.
FIG. 4 is a diagram for explaining a path change operation of the environment monitoring system according to the present embodiment.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 10 Monitoring system 11 Centralized control computer 12 Particle sensor 13 Position sensor 14 Operation terminal 15 Network 20 Transfer robot 21 Running rail 22 Base part 23 Robot hand 24 Substrate installation part 31, 32A, 32B, 33 Clean room 42A, 42B Processing apparatus

Claims (1)

Clean room in the previous process,
Two clean rooms for this process,
Clean room for the next process,
Two transport paths provided in the two clean rooms of this process,
The two clean rooms of this process are
A processing device;
Foreign matter / abnormality detection means for detecting the size and / or number of dust in a clean environment;
Moving means for moving the foreign object / abnormality detecting means along a conveyance path of a conveyed product containing a material and / or product;
A position detection means for detecting the position of the foreign object / abnormality detection means,
The position of each position detecting means is monitored, the state of dust is monitored based on the output of each foreign object / abnormality detecting means, and when the output of the foreign object / abnormality detecting means exceeds a predetermined reference value, Among the two clean rooms of this process, a monitoring means for changing the transport path from a clean room exceeding the reference value to another clean room,
The transported object is a substrate,
The moving means is
A robot hand attached to be rotatable and telescopic, and
A board setting unit that is provided in the robot hand and sets the board to be transferred; and
The abnormality detection means is provided in the robot hand, and is provided near the substrate installation unit;
Environmental monitoring system characterized by

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