JP4110295B2 - Method for simultaneously treating copper etching waste liquid and resist waste liquid and chemicals used therefor - Google Patents

Method for simultaneously treating copper etching waste liquid and resist waste liquid and chemicals used therefor Download PDF

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Publication number
JP4110295B2
JP4110295B2 JP2002339876A JP2002339876A JP4110295B2 JP 4110295 B2 JP4110295 B2 JP 4110295B2 JP 2002339876 A JP2002339876 A JP 2002339876A JP 2002339876 A JP2002339876 A JP 2002339876A JP 4110295 B2 JP4110295 B2 JP 4110295B2
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Japan
Prior art keywords
waste liquid
resist
copper
rare earth
copper etching
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JP2002339876A
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JP2004174290A (en
Inventor
憲司 辰巳
愼二 和田
恭啓 湯川
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Mitsubishi Corp
National Institute of Advanced Industrial Science and Technology AIST
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Mitsubishi Corp
National Institute of Advanced Industrial Science and Technology AIST
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  • Separation Of Suspended Particles By Flocculating Agents (AREA)
  • Removal Of Specific Substances (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は、銅エッチング廃液とレジスト廃液を混合して同時に処理する方法及びそれに使用する薬剤に関するものである。
【0002】
【従来の技術】
プリント基板工場からは、銅エッチング廃液(極めて強酸性、銅濃度数千ppm、TOC約1.5%、硫酸約1.5%、過酸化水素十数%を含む)と、レジスト廃液(樹脂を含む)が排出されるが、これらはいずれも処理が困難であり、効率的な処理技術の開発が求められている。
銅エッチング処理工程から排出されるエッチング廃液は強い酸性で銅の濃度は、通常、8〜20%の範囲と高いが、銅の回収再利用の妨げとなる塩素濃度も、通常、5〜30%と高い。このような塩素イオンを大量に含む廃液から銅のみを回収する技術がないため、エッチング廃液は、一般には産業廃棄物処理会社により廃棄物として引き取られ、再利用されることなく処分されてきた。
フォトレジスト廃液はアルカリ性で、一般にアルカリ可溶性の樹脂を主成分として溶解している。フォトレジストの現像廃液または剥離廃液の処理方法は、廃液に硫酸、塩酸などを加え、酸性にしてレジストを不溶化させ、この不溶化したレジストを分離除去する方法で行われてきた。分離されたレジストは焼却処分や産業廃棄物として処分されてきた。しかし、昨今の処分場不足にともなう処分費用の高騰や、ゼロエミッションが求められる現状を鑑み、廃棄物の出ないレジスト廃液の処理方法の開発が強く求められている。また、酸性にして不溶化されたレジストは、粘性が高く分離除去操作が非常に困難で問題であった。
【0003】
【特許文献1】
特開平5−123681号
【特許文献2】
特開平10−104844号
【特許文献3】
特開平11−60239号
【0004】
【発明が解決しようとする課題】
本発明は、プリント基板工場から排出され処理が困難な、強酸性の銅エッチング廃液とアルカリ性のレジスト廃液の両廃液に対する効率的な処理法を確立するため、両廃液を混合して同時に処理し、しかも銅が回収再利用可能な程に銅含有量が高く塩素含有量の低い銅スラッジが得られる処理法を提供することにある。
【0005】
【課題を解決するための手段】
本発明者らは、前記課題を解決すべく鋭意研究を重ねた結果、以下の事柄を見出して本発明を完成するに至った。
すなわち本発明は、
(1)銅エッチング廃液とレジスト廃液を混合し、希土類化合物の共存下で、アルカリを添加してpHを8〜13に調整することによって、該銅を難溶性物質として沈殿分離させること及び、該廃液中の有機物を沈殿させることを特徴とする銅エッチング廃液とレジスト廃液を混合して同時に処理する方法。
(2)該希土類化合物が、ランタンもしくはランタンと他の希土類の化合物との混合物であることを特徴とする(1)項に記載の銅エッチング廃液とレジスト廃液を混合して同時に処理する方法
(3)銅エッチング廃液とレジスト廃液を混合したものに希土類化合物を添加した、銅を含有する被処理水中に凝集剤を添加することを特徴とする(1)又は(2)項に記載の銅エッチング廃液とレジスト廃液を混合して同時に処理する方法。
(4)(1)〜(3)項のいずれか1項に記載の方法に使用される薬剤であって、供給される希土類化合物が薬剤として構成されるものであり、その薬剤が希土類元素の酸化物、水酸化物、炭酸塩、又はハロゲン化物の水溶液、塩酸溶液又は硫酸溶液からなる群から選択される少なくとも一種からなることを特徴とする薬剤を提供するものである。
【0006】
【発明の実施の形態】
以下、本発明について詳細に説明する。
本発明では、銅エッチング廃液とレジスト廃液及び希土類化合物の存在下で、アルカリを添加してpHを8〜13に調整することによって、該銅を難溶性物質として沈殿分離させる及び、該廃液中の有機物を沈殿させること。この希土類化合物が銅除去剤(以下、単に除去剤ともいう)及び有機物除去剤としての役割を果たす。添加する希土類元素は本発明の目的を達成することができればいかなる状態であってもよいが、希土類元素含有溶液として添加するのが好ましく、希土類元素の酸化物、水酸化物、炭酸塩、又はハロゲン化物の水溶液、塩酸溶液又は硫酸溶液として被処理水へ添加するのが好ましい。その濃度は特に限定されるものではないが、操作性を考慮すると、例えば、希土類元素酸化物の塩酸溶液の場合は、塩酸溶液中の希土類元素を酸化物として好ましくは10〜60質量%、より好ましくは30〜50質量%である。
【0007】
希土類元素の中でもランタン、セリウムの使用が好ましく、ランタンの使用がより好ましい。
また、本発明において除去剤として用いる前記希土類元素含有溶液は、希土類元素の混合物の溶液もしくは、希土類元素の単独又は混合液の形態で用いることができる。ランタンとセリウム及びイッテルビウム溶液の使用が好ましく、ランタンとセリウムとの溶液がより好ましい。好ましい具体例としては、ランタンとセリウムとイッテルビウムの塩酸溶液(濃度は酸化物として50質量%、その中の組成は、ランタン95質量%、セリウム4.9質量%、イッテルビウム0.1質量%)である。
【0008】
本発明で使用される除去剤は、例えば、希土類元素を含有している鉱石から不純物を取り除いた後、塩酸に溶解させて調製することができる。このときの塩酸濃度は、0.1〜12規定が好ましく、より好ましくは、5〜12規定、さらに好ましくは8〜12規定であり、希土類元素イオンの濃度は、操作性を考慮すると、酸化物として好ましくは10〜60質量%、より好ましくは20〜50質量%、さらに好ましくは30〜50質量%である。溶解時間は、完全に溶解すればよく、特に限定されないが、0.5時間から2時間程度で十分である。
【0009】
本発明において、希土類元素の添加量は、被処理水中の銅の濃度にもよるが、銅1モル当たり、好ましくは0.1〜50モル、より好ましくは、0.5〜20モル、さらに好ましくは、1〜10モルである。
【0010】
本発明においては、銅エッチング廃液とレジスト廃液と希土類元素水溶液を混合する場合には、これらを混合する順序は、いかなる順序であってもよく、エッチング廃液に除去剤を添加したものに、レジスト廃液を混合してもよいし、レジスト廃液に除去剤を添加したものに、エッチング廃液を混合してもよいし、エッチング廃液とレジスト廃液を混合したものに除去剤を添加しても良い。
【0011】
本発明においては、銅エッチング廃液とレジスト廃液と希土類元素水溶液を混合する場合には、強酸性のエッチング廃液のpHを中性付近に調整したあとに行うこともできる。通常、銅エッチング廃液とレジスト廃液を混合すると、レジスト廃液のpHが下がって樹脂が析出するが、銅エッチング廃液のpHをあらかじめ中性付近に調整することにより、樹脂の析出を防ぐことができる。このときのpHは特に制約されないが、pH4〜9、好ましくは6〜8の範囲である。
【0012】
本発明においては、pHを調整した銅エッチング廃液とレジスト廃液、及び希土類元素水溶液を混合する場合には、これらを混合する順序は、いかなる順序であってもよく、pHを調整したエッチング廃液に除去剤を添加したものに、レジスト廃液を混合してもよいし、レジスト廃液に除去剤を添加したものに、pHを調整したエッチング廃液を混合してもよいし、pHを調整したエッチング廃液とレジスト廃液を混合したものに除去剤を添加しても良い。
【0013】
本発明では、銅エッチング廃液とレジスト廃液及び除去剤を混合した後、銅及び有機物の沈殿が生じるようにpHを調整して、排水中に溶存する銅及び有機物を除去する。そのpHは、一般的には8〜13の範囲、好ましくは9〜13の範囲、より好ましくは10〜13の範囲である。
【0014】
被処理水のpHをアルカリ性領域や酸性領域に調節する場合、pH調節剤が用いられるが、このようなpH調節剤としては、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸カリウム、水酸化カルシウム等のアルカリ性物質、もしくは塩酸、硫酸、硝酸等の酸性物質が用いられる。
【0015】
本発明においては、凝集剤を併用するのが好ましい。この場合の凝集剤は、フロックの凝集に用いられているものであり、このようなものには、塩化カルシウム、ビス(リン酸2水素)カルシウム、塩化第1鉄、塩化第2鉄、硫酸第1鉄、硫酸第2鉄、ポリ硫酸第1鉄、ポリ硫酸第2鉄、硫酸アルミニウム、ポリ塩化アルミニウム等の無機系凝集剤の他、ポリアクリルアミドのカチオン化変性物、ポリアクリル酸ジメチルアミノエチルエステル、ポリメタクリル酸ジメチルアミノエチルエステル、ポリエチレンイミン、キトサン等のカチオン性有機系凝集剤、ポリアクリルアミド等のノニオン性有機系凝集剤、ポリアクリル酸、アクリルアミドとアクリル酸との共重合体及び/その塩等のアニオン性有機系凝集剤が包含される。被処理水への添加量は、例えば高分子凝集剤では、好ましくは0.1〜100ppm、より好ましくは0.2〜80ppm、さらに好ましくは1〜50ppmである。
【0016】
一連の工程終了後、被処理水は固液分離処理される。この場合の固液分離方法としては、慣用の方法、例えば、濾過分離、遠心分離、沈降分離等が挙げられる。
【0017】
【実施例】
次に本発明を実施例によりさらに詳細に説明する。
【0018】
参考例1
希土類元素の酸化物の塩酸溶液(希土類元素の濃度は、酸化物として32.5質量%、組成はランタン95質量%、セリウム4.9質量%、イッテルビウム0.1質量%)を除去剤とした。
【0019】
実施例1
エッチング廃液(pH0.20、銅濃度4750ppm、TOC15000ppm)500L/hに除去剤を10mL/L添加し、5分間撹拌した後、レジスト廃液(pH13.7、銅濃度27ppm、TOC18800ppm)2000L/hを混合し5分間撹拌した。混合液にNaOH水溶液(7%)を添加してpHを12に調整し10分間撹拌した。固液分離した処理水の銅濃度を測定したところ、0.2ppmで、TOCは7300ppmであった。スラッジ中の銅含有量は、63%、塩素含有量は0.5%で、このスラッジは、十分採算ベースで銅資源として利用できることが明らかになった。
【0020】
実施例2
レジスト廃液2000L/hに除去剤を1mL/L、2mL/L及び5mL/L添加し、それぞれを5分間撹拌した後、エッチング廃液500L/hを混合し5分間撹拌した。発熱して発泡し、樹脂状物質が上部に生成した。NaOH水溶液(7%)を添加してpHを12に調整し10分間撹拌した。固液分離した処理水の銅濃度を測定したところ、それぞれ1.16ppm、1.31ppm及び0.88ppmとなった。スラッジ中の銅含有量は、58%、塩素含有量は0.7%で、このスラッジは、十分採算ベースで銅資源として利用できることが明らかになった。
【0021】
比較例2
実施例2において、除去剤を添加せずに他は同様に処理したところ、処理水の銅濃度は43.7ppmであった。
【0022】
実施例3
レジスト廃液2000L/hに除去剤を2mL/L添加し、5分間撹拌した。一方、エッチング廃液500L/hにNaOH水溶液(7%)を添加してpHを7に調整し10分間撹拌した。この両者を混合し、さらにNaOH水溶液(7%)を添加してpHを12に調整し10分間撹拌した。固液分離した処理水の銅濃度を測定したところ、0.12ppmであった。スラッジ中の銅含有量は、56%、塩素含有量は0.6%で、このスラッジは、十分採算ベースで銅資源として利用できることが明らかになった。
【0023】
【発明の効果】
本発明によれば、銅エッチング廃液とレジスト廃液および希土類化合物の存在下で、アルカリを添加してpHを8〜13に調整することによって、該銅を難溶性物質として沈殿分離させること及び該原水中の有機物を沈殿分離できる。
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a method of simultaneously processing by mixing a copper etching waste liquid and a resist waste liquid and a chemical used therefor.
[0002]
[Prior art]
From the printed circuit board factory, copper etching waste liquid (very strong acidity, copper concentration of several thousand ppm, TOC about 1.5%, sulfuric acid about 1.5%, hydrogen peroxide containing 10% and more) and resist waste liquid (resin These are difficult to process, and there is a need for the development of efficient processing techniques.
Etching waste liquid discharged from the copper etching process is strongly acidic and the concentration of copper is usually as high as 8 to 20%, but the chlorine concentration that hinders the recovery and reuse of copper is also usually 5 to 30%. And high. Since there is no technology for recovering only copper from waste liquid containing a large amount of chlorine ions, the etching waste liquid is generally collected as waste by an industrial waste disposal company and disposed of without being reused.
The photoresist waste liquid is alkaline and is generally dissolved with an alkali-soluble resin as a main component. A method for treating a photoresist development waste solution or a stripping waste solution has been performed by adding sulfuric acid, hydrochloric acid, or the like to the waste solution to make the resist insoluble, and separating and removing the insoluble resist. The separated resist has been disposed of by incineration or industrial waste. However, in view of the current increase in disposal costs due to the recent shortage of disposal sites and the need for zero emissions, there is a strong demand for the development of a method for treating resist waste liquid that does not generate waste. In addition, the acidized and insolubilized resist has a problem of high viscosity and very difficult to separate and remove.
[0003]
[Patent Document 1]
JP-A-5-123681 [Patent Document 2]
Japanese Patent Laid-Open No. 10-104844 [Patent Document 3]
Japanese Patent Laid-Open No. 11-60239
[Problems to be solved by the invention]
The present invention establishes an efficient treatment method for both the strongly acidic copper etching waste liquid and the alkaline resist waste liquid that is discharged from the printed circuit board factory and is difficult to treat, so that both waste liquids are mixed and processed simultaneously. In addition, an object of the present invention is to provide a treatment method capable of obtaining copper sludge having a high copper content and a low chlorine content so that copper can be recovered and reused.
[0005]
[Means for Solving the Problems]
As a result of intensive studies to solve the above problems, the present inventors have found the following matters and completed the present invention.
That is, the present invention
(1) a copper etching waste liquid and the resist liquid waste mixed, in the presence of a rare earth compound, by adjusting the pH to 8 to 13 by adding an alkali, it is precipitated separating said copper as a sparingly soluble substance and, the A method of simultaneously processing by mixing a copper etching waste liquid and a resist waste liquid, wherein organic substances in the waste liquid are precipitated.
(2) The method of mixing and simultaneously treating the copper etching waste liquid and the resist waste liquid according to (1), wherein the rare earth compound is lanthanum or a mixture of lanthanum and another rare earth compound.
(3) The copper according to (1) or (2), wherein a flocculant is added to the treated water containing copper, in which a rare earth compound is added to a mixture of a copper etching waste liquid and a resist waste liquid. A method in which etching waste liquid and resist waste liquid are mixed and processed simultaneously.
(4) The chemical | medical agent used for the method of any one of (1)-(3) term | claim, Comprising: The rare earth compound supplied is comprised as a chemical | medical agent, The chemical | medical agent is a rare earth element. An agent comprising at least one selected from the group consisting of an aqueous solution of an oxide, a hydroxide, a carbonate, or a halide, a hydrochloric acid solution, or a sulfuric acid solution is provided.
[0006]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, the present invention will be described in detail.
In the present invention, in the presence of a copper etching waste liquid and the resist waste liquors and rare earth compound, by adjusting the pH to 8 to 13 by adding an alkali, and precipitating separation of copper as a sparingly soluble substance, in waste liquid To precipitate organic matter. This rare earth compound serves as a copper remover (hereinafter also simply referred to as a remover) and an organic matter remover. The rare earth element to be added may be in any state as long as the object of the present invention can be achieved, but it is preferably added as a rare earth element-containing solution, and rare earth element oxide, hydroxide, carbonate, or halogen is added. It is preferable to add to the water to be treated as an aqueous solution of a compound, a hydrochloric acid solution or a sulfuric acid solution. The concentration is not particularly limited, but in consideration of operability, for example, in the case of a rare earth element oxide hydrochloric acid solution, the rare earth element in the hydrochloric acid solution is preferably 10 to 60% by mass, more preferably Preferably it is 30-50 mass%.
[0007]
Of the rare earth elements, use of lanthanum or cerium is preferable, and use of lanthanum is more preferable.
In addition, the rare earth element-containing solution used as a removal agent in the present invention can be used in the form of a rare earth element mixture solution, or a rare earth element alone or a mixed solution. The use of lanthanum and cerium and ytterbium solutions is preferred, and a solution of lanthanum and cerium is more preferred. As a preferable specific example, a hydrochloric acid solution of lanthanum, cerium, and ytterbium (concentration is 50% by mass as an oxide, and the composition thereof is 95% by mass of lanthanum, 4.9% by mass of cerium, and 0.1% by mass of ytterbium). is there.
[0008]
The removing agent used in the present invention can be prepared by, for example, removing impurities from ores containing rare earth elements and then dissolving them in hydrochloric acid. The hydrochloric acid concentration at this time is preferably 0.1 to 12 N, more preferably 5 to 12 N, and still more preferably 8 to 12 N, and the concentration of rare earth element ions is an oxide considering operability. Preferably, it is 10-60 mass%, More preferably, it is 20-50 mass%, More preferably, it is 30-50 mass%. The dissolution time may be completely dissolved, and is not particularly limited, but about 0.5 to 2 hours is sufficient.
[0009]
In the present invention, the amount of rare earth element added depends on the concentration of copper in the water to be treated, but is preferably 0.1 to 50 mol, more preferably 0.5 to 20 mol, and still more preferably per mol of copper. Is 1 to 10 moles.
[0010]
In the present invention, when the copper etching waste liquid, the resist waste liquid, and the rare earth element aqueous solution are mixed, the order of mixing them may be any order, and the resist waste liquid is added to the etching waste liquid to which a remover is added. The etching waste liquid may be mixed with the resist waste liquid added with the removing agent, or the removing agent may be added with the etching waste liquid mixed with the resist waste liquid.
[0011]
In the present invention, when the copper etching waste liquid, the resist waste liquid, and the rare earth element aqueous solution are mixed, it can be carried out after adjusting the pH of the strongly acidic etching waste liquid to near neutral. Usually, when the copper etching waste liquid and the resist waste liquid are mixed, the pH of the resist waste liquid is lowered and the resin is precipitated. However, the resin can be prevented from being precipitated by adjusting the pH of the copper etching waste liquid to near neutral in advance. The pH at this time is not particularly limited, but is in the range of pH 4 to 9, preferably 6 to 8.
[0012]
In the present invention, when the copper etching waste solution adjusted in pH, the resist waste solution, and the rare earth element aqueous solution are mixed, the order of mixing them may be any order, and is removed to the etching waste solution adjusted in pH. The resist waste liquid may be mixed with the additive added, the etching waste liquid adjusted with pH may be mixed with the resist waste liquid added with the removal agent, or the etching waste liquid adjusted with the pH and the resist. You may add a removal agent to what mixed the waste liquid.
[0013]
In the present invention, after mixing the copper etching waste liquid, the resist waste liquid, and the removal agent, the pH is adjusted so as to cause precipitation of copper and organic matter, and the copper and organic matter dissolved in the waste water are removed. The pH is generally in the range of 8-13, preferably in the range of 9-13, more preferably in the range of 10-13.
[0014]
When adjusting the pH of the water to be treated to an alkaline region or an acidic region, a pH regulator is used. Examples of such a pH regulator include sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, and calcium hydroxide. Or an alkaline substance such as hydrochloric acid, sulfuric acid or nitric acid is used.
[0015]
In the present invention, it is preferable to use a flocculant in combination. The flocculant in this case is used for floc aggregation, such as calcium chloride, bis (dihydrogen phosphate) calcium, ferrous chloride, ferric chloride, sulfuric acid In addition to inorganic flocculants such as ferrous sulfate, ferric sulfate, ferrous polysulfate, polyferric sulfate, aluminum sulfate, polyaluminum chloride, etc., polyacrylamide cation-modified products, polyacrylic acid dimethylaminoethyl ester , Cationic organic flocculants such as polymethacrylic acid dimethylaminoethyl ester, polyethyleneimine and chitosan, nonionic organic flocculants such as polyacrylamide, polyacrylic acid, copolymers of acrylamide and acrylic acid and / or salts thereof Anionic organic flocculants such as are included. For example, in the case of a polymer flocculant, the amount added to the water to be treated is preferably 0.1 to 100 ppm, more preferably 0.2 to 80 ppm, and still more preferably 1 to 50 ppm.
[0016]
After the series of steps, the water to be treated is subjected to solid-liquid separation treatment. Examples of the solid-liquid separation method in this case include conventional methods such as filtration separation, centrifugation, and sedimentation separation.
[0017]
【Example】
Next, the present invention will be described in more detail with reference to examples.
[0018]
Reference example 1
A hydrochloric acid solution of a rare earth oxide (the concentration of the rare earth element is 32.5% by mass as an oxide, the composition is 95% by mass of lanthanum, 4.9% by mass of cerium, and 0.1% by mass of ytterbium) is used as a remover. .
[0019]
Example 1
Etching waste liquid (pH 0.20, copper concentration 4750ppm, TOC 15000ppm) 500L / h, remover 10mL / L, stirred for 5 minutes, then mixed resist waste liquid (pH 13.7, copper concentration 27ppm, TOC 18800ppm) 2000L / h And stirred for 5 minutes. Aqueous NaOH (7%) was added to the mixture to adjust the pH to 12, and the mixture was stirred for 10 minutes. When the copper concentration of the treated water separated into solid and liquid was measured, it was 0.2 ppm and the TOC was 7300 ppm. The copper content in the sludge was 63% and the chlorine content was 0.5%, and it became clear that this sludge can be used as a copper resource on a fully profitable basis.
[0020]
Example 2
1 mL / L, 2 mL / L, and 5 mL / L of a removing agent were added to the resist waste liquid 2000 L / h, and after stirring each for 5 minutes, the etching waste liquid 500 L / h was mixed and stirred for 5 minutes. It exothermed and foamed, and a resinous material was formed at the top. Aqueous NaOH (7%) was added to adjust the pH to 12 and stirred for 10 minutes. When the copper concentration of the treated water separated into solid and liquid was measured, it was 1.16 ppm, 1.31 ppm and 0.88 ppm, respectively. The copper content in the sludge was 58% and the chlorine content was 0.7%, and it became clear that this sludge can be used as a copper resource on a fully profitable basis.
[0021]
Comparative Example 2
In Example 2, when it processed similarly except not adding a removal agent, the copper concentration of treated water was 43.7 ppm.
[0022]
Example 3
2 mL / L of the removing agent was added to 2000 L / h of the resist waste liquid and stirred for 5 minutes. On the other hand, an aqueous NaOH solution (7%) was added to 500 L / h of the etching waste liquid to adjust the pH to 7, followed by stirring for 10 minutes. Both were mixed, and further an aqueous NaOH solution (7%) was added to adjust the pH to 12, followed by stirring for 10 minutes. It was 0.12 ppm when the copper concentration of the treated water separated into solid and liquid was measured. The copper content in the sludge was 56% and the chlorine content was 0.6%, and it became clear that this sludge can be used as a copper resource on a fully profitable basis.
[0023]
【The invention's effect】
According to the present invention, in the presence of a copper etching waste liquid, a resist waste liquid, and a rare earth compound, the alkali is added to adjust the pH to 8 to 13, thereby precipitating and separating the copper as a hardly soluble substance and the raw material. Precipitate and separate organic substances in water.

Claims (4)

銅エッチング廃液とレジスト廃液を混合し、希土類化合物の共存下で、アルカリを添加してpHを8〜13に調整することによって、該銅を難溶性物質として沈殿分離させること及び、該廃液中の有機物を沈殿させることを特徴とする銅エッチング廃液とレジスト廃液を混合して同時に処理する方法。The copper etching waste liquid and the resist waste liquid are mixed, and in the presence of the rare earth compound, the alkali is added to adjust the pH to 8 to 13, thereby precipitating and separating the copper as a hardly soluble substance, and in the waste liquid A method of simultaneously processing by mixing a copper etching waste liquid and a resist waste liquid, wherein organic substances are precipitated. 該希土類化合物がランタンもしくはランタンと他の希土類化合物との混合物である請求項1記載の銅エッチング廃液とレジスト廃液を混合して同時に処理する方法。The method of mixing and simultaneously treating a copper etching waste solution and a resist waste solution according to claim 1, wherein the rare earth compound is lanthanum or a mixture of lanthanum and another rare earth compound. 銅エッチング廃液とレジスト廃液を混合したものに希土類化合物を添加した、銅を含有する被処理水中に凝集剤を添加することを特徴とする請求項1又は2記載の銅エッチング廃液とレジスト廃液を混合して同時に処理する方法。 The copper etching waste liquid and the resist waste liquid according to claim 1 or 2, wherein a coagulant is added to the treated water containing copper, wherein a rare earth compound is added to a mixture of the copper etching waste liquid and the resist waste liquid. To process simultaneously. 請求項1〜3のいずれか1項に記載の方法に使用される薬剤であって、供給される希土類化合物が薬剤として構成されるものであり、その薬剤が、希土類元素の酸化物、水酸化物、炭酸塩、又はハロゲン化物の水溶液、塩酸溶液又は硫酸溶液からなる群から選択される少なくとも一種からなることを特徴とする薬剤。The chemical | medical agent used for the method of any one of Claims 1-3, Comprising: The rare earth compound supplied is comprised as a chemical | medical agent, The chemical | medical agent is a rare earth element oxide, hydroxylation. An agent comprising at least one selected from the group consisting of an aqueous solution of an acid, a carbonate or a halide, a hydrochloric acid solution or a sulfuric acid solution.
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