JP4084721B2 - 表面保護された無機ナノ粒子およびその製造方法 - Google Patents
表面保護された無機ナノ粒子およびその製造方法 Download PDFInfo
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- JP4084721B2 JP4084721B2 JP2003306501A JP2003306501A JP4084721B2 JP 4084721 B2 JP4084721 B2 JP 4084721B2 JP 2003306501 A JP2003306501 A JP 2003306501A JP 2003306501 A JP2003306501 A JP 2003306501A JP 4084721 B2 JP4084721 B2 JP 4084721B2
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- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 35
- 239000010931 gold Substances 0.000 description 21
- 239000002245 particle Substances 0.000 description 17
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 15
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- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 9
- 229920000835 poly(gamma-benzyl-L-glutamate) polymer Polymers 0.000 description 9
- BGGHCRNCRWQABU-SNVBAGLBSA-N (2r)-2-azaniumyl-5-oxo-5-phenylmethoxypentanoate Chemical compound [O-]C(=O)[C@H]([NH3+])CCC(=O)OCC1=CC=CC=C1 BGGHCRNCRWQABU-SNVBAGLBSA-N 0.000 description 8
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- -1 Fe 2 O 3 Chemical class 0.000 description 7
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical class CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
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- AGBQKNBQESQNJD-UHFFFAOYSA-N lipoic acid Chemical compound OC(=O)CCCCC1CCSS1 AGBQKNBQESQNJD-UHFFFAOYSA-N 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- WHUUTDBJXJRKMK-VKHMYHEASA-N L-glutamic acid Chemical compound OC(=O)[C@@H](N)CCC(O)=O WHUUTDBJXJRKMK-VKHMYHEASA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 238000004220 aggregation Methods 0.000 description 4
- 230000002776 aggregation Effects 0.000 description 4
- 229940024606 amino acid Drugs 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 235000019136 lipoic acid Nutrition 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- 229960002663 thioctic acid Drugs 0.000 description 4
- QOSSAOTZNIDXMA-UHFFFAOYSA-N Dicylcohexylcarbodiimide Chemical compound C1CCCCC1N=C=NC1CCCCC1 QOSSAOTZNIDXMA-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000002082 metal nanoparticle Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000012071 phase Substances 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 150000003573 thiols Chemical class 0.000 description 3
- ASOKPJOREAFHNY-UHFFFAOYSA-N 1-Hydroxybenzotriazole Chemical compound C1=CC=C2N(O)N=NC2=C1 ASOKPJOREAFHNY-UHFFFAOYSA-N 0.000 description 2
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 235000002597 Solanum melongena Nutrition 0.000 description 2
- 150000001345 alkine derivatives Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 229960002989 glutamic acid Drugs 0.000 description 2
- NPZTUJOABDZTLV-UHFFFAOYSA-N hydroxybenzotriazole Substances O=C1C=CC=C2NNN=C12 NPZTUJOABDZTLV-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000003444 phase transfer catalyst Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000002094 self assembled monolayer Substances 0.000 description 2
- 239000013545 self-assembled monolayer Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012216 imaging agent Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000002527 isonitriles Chemical class 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000005543 nano-size silicon particle Substances 0.000 description 1
- 239000002120 nanofilm Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
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- QBVXKDJEZKEASM-UHFFFAOYSA-M tetraoctylammonium bromide Chemical compound [Br-].CCCCCCCC[N+](CCCCCCCC)(CCCCCCCC)CCCCCCCC QBVXKDJEZKEASM-UHFFFAOYSA-M 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- UCPYLLCMEDAXFR-UHFFFAOYSA-N triphosgene Chemical compound ClC(Cl)(Cl)OC(=O)OC(Cl)(Cl)Cl UCPYLLCMEDAXFR-UHFFFAOYSA-N 0.000 description 1
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- Powder Metallurgy (AREA)
Description
得られたポリペプチドの末端に、無機ナノ粒子表面に吸着する官能基であるジスルフィドを付加する付加反応工程(B)と、
得られた付加反応物を無機ナノ粒子の分散液に浸漬する浸漬工程(C)と、
を包含することを特徴とする、表面保護された無機ナノ粒子の製造方法である。
本発明における無機ナノ粒子は、ナノメーターサイズの粒子径を有する金属をはじめとする無機化合物粒子であり、Au、Ag、Pd、Pt、Rh、Ru、Cu、Ni、Fe等、又、SnO2、Fe2O3、TiO2、SiO2、CuO、ITOなどの金属酸化物、CdSe、CdSなどの化合物半導体などを挙げることができる。
PBLGの合成
アミノ酸誘導体として、γ−ベンジル−L−グルタメート(BLG)を使用し、以下のようにしてBLGの重合生成物であるBLGポリマー(PBLG)を合成した。
先に合成したPBLGの一方の末端に以下のようにしてジスルフェドを付加させた。
先ず、ジシクロヘキシルカルボジイミド(DCC)100mg、DL−リポ酸100mgおよび1−ヒドロキシベンゾトリアゾール(HOBt)65.4mg(DCC:リポ酸:HOBt=1:1:1のモル比)を取り、これらをジクロロメタン1.5mlに溶かして1〜2時間撹拌し、ジクロロメタン溶液Aとした。
リポ酸を保護剤に用いて、以下のようにしてAuナノ粒子を作製した。
先ず、100mL丸底フラスコに水15mlとDCM15mlを入れ、金の原料であるHAuCl4を5mMの濃度となるように、また、リポ酸を5mMの濃度となるように、夫々加えた。次いで、強く撹拌した状態で、還元剤である0.4MのNaBH4水溶液を5ml加え、金イオンを還元し、そのまま3時間、撹拌し続けた。
PBLGSSを保護剤に用いて、以下のようにしてAuナノ粒子を作製した。 上記のようにして得られたPBLGSSはジクロロメタンに可溶であるため、ジクロロメタンと水の2相系にてAuナノ粒子を調製した。先ず、100mL丸底フラスコに水10mLとジクロロメタン10mLを導入し、次いで、HAuCl4およびPBLGSSをそれぞれ0.2mM(2×10-6モル)の濃度になるように導入した。さらに、そこに相間移動触媒であるテトラ−n−オクチルアンモニウムブロミドをHAuCl4に対して4当量導入した後、攪拌した。
Claims (5)
- 無機ナノ粒子が、一方の末端に該無機ナノ粒子表面に吸着する官能基であるジスルフィドを持つポリペプチドにより、その表面にポリペプチドの単分子膜を有することを特徴とする、表面保護された無機ナノ粒子。
- 前記無機ナノ粒子が金属、金属酸化物、およびこれらの複合体からなる群から選択される請求項1記載の無機ナノ粒子。
- 前記吸着が金属配位結合または共有結合により行われている請求項1または2記載の無機ナノ粒子。
- 前記ポリペプチドが前記無機ナノ粒子の表面でαヘリックス構造を有する請求項1〜3のうちいずれか一項記載の無機ナノ粒子。
- 請求項1〜4のうちいずれか一項記載の無機ナノ粒子の製造方法であって、アミノ酸またはアミノ酸誘導体の重合によりポリペプチドを合成する重合工程(A)と、
得られたポリペプチドの末端に、無機ナノ粒子表面に吸着する官能基であるジスルフィドを付加する付加反応工程(B)と、
得られた付加反応物を無機ナノ粒子の分散液に浸漬する浸漬工程(C)と、
を包含することを特徴とする、表面保護された無機ナノ粒子の製造方法。
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JP2005076064A JP2005076064A (ja) | 2005-03-24 |
JP4084721B2 true JP4084721B2 (ja) | 2008-04-30 |
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JP5579343B1 (ja) | 2012-11-28 | 2014-08-27 | 古河電気工業株式会社 | イムノクロマトグラフィー、これに用いられる検出装置および試薬 |
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