JP4077585B2

JP4077585B2 - Medal cleaning machine

Info

Publication number: JP4077585B2
Application number: JP29519099A
Authority: JP
Inventors: 高敏大宅
Original assignee: 株式会社ジェッター
Priority date: 1999-10-18
Filing date: 1999-10-18
Publication date: 2008-04-16
Anticipated expiration: 2019-10-18
Also published as: JP2001113025A

Description

【０００１】
【発明の属する技術分野】
本発明は、遊技用のメダル・コイン・硬貨（本明細書中メダルと総称する。）の表面を洗浄研磨して油・脂・ゴミ・汚れを除去するメダルの洗浄研磨装置に関する。
【０００２】
【従来の技術】
従来においてメダルに付着した油・脂・ゴミ・汚れを除去するためには、メダルの研磨装置が用いられていた。メダルの研磨装置は、メダルの表面に移動するベルト面を押し当てるものや、移動するブラシを押し当てるものがあった。しかし、乾式であるために、研磨面の摩耗が大きく、定期的に研磨面として用いたベルトやブラシなどを交換する必要があった。また、研磨による摩耗粉がメダルに付着してしまうことがあった。このまま再利用すると、人の手に摩耗粉が付着したり、設備中でのメダル詰まりの原因となるため好ましいものではなかった。
【０００３】
【発明が解決しようとする課題】
本発明が解決しようとする課題は従来のこれらの問題を解消し、メダルに付着したゴミ，汚れ，油，脂を確実に除去し、除去したゴミや汚れなどの再付着を防ぎ、長い間使用できるメダルの洗浄研磨装置を提供することにある。
【０００４】
【課題を解決するための手段】
かかる課題を解決した本発明の構成は、
１）メダルの下面を研磨するための下方ブラシ毛を上面に植毛した下側ブラシ盤とメダルの上面を研磨するための上方ブラシ毛を下面に植毛した上側ブラシ盤を所定の間隔で対向させて設け、前記上側ブラシ盤と前記下側ブラシ盤の間にメダルを投入するメダル投入口を設け、前記上側ブラシ盤と前記下側ブラシ盤の外周側を囲む筒体を設け、同筒体の上下に下側ブラシ盤の下方を外周側から所定の内周側までをカバーする環状の下面部と下側ブラシ盤の上方を外周側から所定の内周側までをカバーする環状の上面部を設けてカバーを形成し、同カバーの下面部には排水用孔を設け、前記上側ブラシ盤と前記下側ブラシ盤の間のメダルを排出するメダル排出口を前記筒体に設け、下側ブラシ盤を回転させる回転装置を設け、上方ブラシ毛と下方ブラシ毛の対向部分に洗浄水を給水し、メダルを洗浄水に濡らした状態で上側ブラシ盤に対し下側ブラシ盤を相対的に回転させて上方ブラシ毛と下方ブラシ毛でメダルの洗浄研磨を行い、しかも下方ブラシ毛及び上方ブラシ毛を環状に植毛し、下方ブラシ毛の上端の高さが下方ブラシ毛を植毛していない下側ブラシ盤の中央部分とほぼ同じ高さになるようにし、メダル投入口を下側ブラシ盤の中央部分の上方に設け、メダル投入口から洗浄水を給水するようにメダル投入口で開口した給水管を設け、投入されたメダルを前記中央部分で受けて上方ブラシ毛と下方ブラシ毛の間に移動させるようにしたメダルの洗浄研磨装置
２）メダル排出口から排出されたメダルを吸水面上で滑らせて下方に送るシュートを設け、前記吸水面の下方に吸水面からの水を受けるシュート排水路を設けた前記１）に記載のメダルの洗浄研磨装置
３）メダル投入口が、上側ブラシ盤の中央に貫通させるように設け、同メダル投入口の周縁から下側ブラシ盤に向って拡径した環状板を設け、同環状板の下端と下側ブラシ盤の間の間隔をメダルの厚さよりやや大きくして上側ブラシ盤の中央からメダルを一枚ずつ遠心力で上方ブラシ毛と下方ブラシ毛の間に送るようにした前記１）に記載のメダルの洗浄研磨装置
４）メダル排出口から排出されたメダルを吸水面上で滑らせて下方に送るシュートを設け、前記吸水面の下方に吸水面からの水を受けるシュート排水路を設けた前記３）に記載のメダルの洗浄研磨装置
５）メダル排出口から排出されたメダルを水切り孔を多数備えた水切り板上で滑らせて下方に送るシュートを設け、前記水切り板の下方に水切り板からの水を受けるシュート排水路を設けた前記１）又は３）いずれかに記載のメダルの洗浄研磨装置
６）メダル排出口から排出されたメダルを吸水面上で滑らせて下方に送るシュートを設け、前記吸水面を水切り孔を多数備えた水切り板で支持し、同水切り板の下方に水切り板からの水を受けるシュート排水路を設けた前記１）又は３）いずれかに記載のメダルの洗浄研磨装置
にある。
【０００５】
【作用】
本発明では、メダルをメダル投入口から下方ブラシ毛と上方ブラシ毛の間に投入する。上方ブラシ毛と下方ブラシ毛の対向部分には洗浄水を給水され、メダルは水に濡された状態となるのでこの状態で上側ブラシ盤と下側ブラシ盤を回転装置で相対的に回転させて上方ブラシ毛と下方ブラシ毛でメダルの洗浄研磨を行う。メダルは上面又は下面あるいは両面に遠心力を受けて筒体の内周に沿って洗浄研磨されながら移動し、筒体に設けられたメダル排出口より排出される。
環状の下方ブラシ毛の上端の高さが下方ブラシ毛を植毛していない下側ブラシ盤の中央部分とほぼ同じ高さになるようにし、メダル投入口を下側ブラシ盤の中央部分の上方に設け、メダル投入口で開口した給水管を設けたので、メダル投入口から洗浄水を供給し、中央部分から下方ブラシ毛を植毛している部分にスムーズにメダルを移動させることができる。
上側ブラシ盤の中央にメダル投入口を設け、メダル投入口の周縁から下側ブラシ盤に向って拡径した環状板を設けたものは、メダル投入口から向きを不整列な状態でメダルを投入できる。投入されたメダルは、環状板の下端と下側ブラシ盤の間から遠心力によって一枚ずつ上方ブラシ毛と下方ブラシ毛の間に送る。もしメダルが縦になった状態で環状板の下端と下側ブラシ盤の間を塞ぐような場合には、環状板は下側ブラシ盤に向って拡径しているので、遠心力によってメダル下端が外周側に引かれる状態になってメダル上端が中央側に向って倒れる。よって縦になったメダルが環状盤の下端と下側ブラシ盤の間を塞いだ状態を長い間保つことがない。
吸水面上でメダルを滑らせて下方に送るシュートを設け、吸水面の下方にシュート排水路を設けたものは、メダルの排出口から排出されたメダルに付着した水を吸水面で吸水して、メダルの洗浄研磨後の乾燥を短時間にできるようにし、吸水面で吸水した水が下方のシュート排水路から排出されるようにして吸水面の吸水性が保たれるようにできる。
水切り孔を多数備えた水切り板上でメダルを滑らせて下方に送るシュートを設け、水切り板の下方にシュート排水路を設けたものは、メダルの排出口から排出されたメダルに付着した水を水切り板の水切り孔から下方に送るようにして水切りを行い、メダルの洗浄研磨後の乾燥を短時間にできるようにし、水切り孔から下方に送った水が排水路から排水されるようにして水切り板の水切り性が保たれるようにできる。
吸水面上でメダルを滑らせて下方に送るシュートを設け、吸水面の下方に水切り板を設け、水切り板の下方にシュート排水路を設けたものは、メダルの排出口から排出されたメダルに付着した水を吸水面で吸水して、メダルの洗浄研磨後の乾燥を短時間にできるようにし、吸水面で吸水した水を水切り板の水切り孔から下方に送って排水路で排水されるようにして吸水面の吸水性が保たれるようにする。
【０００６】
【発明の実施の形態】
本発明のメダルの洗浄研磨装置は、単体で用いてもよいし、乾燥装置や他の装置と連結させて用いてもよい。
洗浄水は、水でも、水に洗浄用の薬剤を混ぜたものでもよい。
下方ブラシ毛及び上方ブラシ毛は、ブラシ状のものであれば、形状，太さ，材質はどのようなものでもよいがメダルの両面の油・脂・ゴミ・汚れが確実に除去できるものが望ましい。
筒体の内周と実施例の下側ブラシ盤のように用いる回転円盤の外周の間は、回転円盤の回転を妨げないように間隔が設けられるが、筒体の内周と回転円盤の間にメダルが落ち込まない寸法にするのが好ましい。
【０００７】
【実施例】
本発明の各実施例について図面を参照して具体的に説明する。
実施例１（図１〜５参照）
図１〜５に示すのは、遊技設備で使用したメダルを再利用するために水洗浄・水研磨を行うメダルの洗浄研磨装置であって、下方ブラシ毛の上端の高さが下側ブラシ盤の中央部分とほぼ同じ高さになるようにし、メダル投入口が上側ブラシ盤の中央に貫通させるように設け、メダル投入口の周縁から下側ブラシ盤に向って拡径した環状板を設け、洗浄水を排出する排水路を設け、メダル排出口から排出されたメダルを吸水面上で滑らせて下方に送るシュートを設け、吸水面の下方に水切り孔を多数備えた水切り板を設け、水切り板の下方に排水路を設けたメダルの洗浄研磨装置の例である。
図１は実施例１のメダルの洗浄研磨装置の説明図である。図２は図１のＡ−Ａ断面図である。図３は実施例１のメダルの洗浄研磨装置の一部拡大断面図である。図４は実施例１のメダルの洗浄研磨装置の説明図である。図５は実施例１のメダルの洗浄研磨装置のシュートの断面図である。
図中、１はメダルの洗浄研磨装置、２は下側ブラシ盤、２ｂは下方ブラシ毛、３は上側ブラシ盤、３ａは送り部、３ｂは上方ブラシ毛、５は給水ホース、６はメダル投入口、７は環状板、８はカバー、８ａは筒体、８ｂはメダル排出口、８ｃは排水用孔、１０はシュート、１０ａは吸水シート、１０ｂは水切り板、１０ｃは水切り孔、１０ｄはシュート排水路、１２は回転軸、１３はベアリング、１４はシール体、１５はベアリングカバー、１６はプーリー、１７はプーリー、１８はベルト、１９はモーター部、２０はカバー、２０ａは折曲部分、２１は水受け、２２は排水口、ｍはメダルである。
【０００８】
実施例１のメダルの洗浄研磨装置１は、上側ブラシ盤を固定し、下側ブラシ盤をモーターで回転させるものである。
まず、円盤状の下側ブラシ盤２を設ける。下側ブラシ盤２は３枚の円盤を重ね合わせて複数箇所をねじ止めで取り付けたもので、図２に示すように中央から所定の長さ外周までの長さ部分を同じ高さの平面にし、外周端から所定の長さ内周側までの環状部分を中央部分より高さを低くしている。次に環状に下方ブラシ毛２ｂを多数植毛する。下方ブラシ毛２ｂの上端は、下側ブラシ盤２の中央部分の高さとほぼ同じになるようにしている。
次に下側ブラシ盤２の中心に下方に伸びた回転軸１２を設ける。回転軸１２の所定位置２箇所にベアリング１３を圧入して取り付ける。次に筒状で下方の開口部にリング状の底部を設けたベアリングカバー１５を設ける。このベアリングカバー１５の上方の開口から回転軸１２の下端を挿入してベアリングカバー１５の下方開口から突出させるようにして、回転軸１２に取り付けたベアリング１３の外周をベアリングカバー１５の内周に挿入して回転軸１２及びベアリング１３をベアリングカバー１５に取り付ける。これにより回転軸１２はベアリング１３によって回転自在となる。ベアリングカバー１５の上方開口からは、回転軸１２の上端が突出している。リング状のシール体１４の中央の穴部分にこの回転軸１２の上端を貫通させるようにして、ベアリングカバー１５の内部と上方外部を水密状にシールする。
次に平面板状のカバー２０を設ける。カバー２０の外周端部分は下方に向かうよう折曲させている。このカバー２０の中央部分には、貫通穴を設ける。さらにカバー２０の下面の貫通穴の穴周縁を上方に折曲する折曲部分２０ａを設ける。
次にベアリングカバー１５の上端近くに鍔部を設けて、回転軸１２の上端がカバー２０に設けた貫通穴から上方に突出するようにして、カバー２０の貫通穴外周の肉厚部分にベアリングカバー１５の鍔部を接するようにしてねじ止めでベアリングカバー１５をカバー２０に取り付ける。次に下側ブラシ盤２の下面に所定深さの取付穴を設け、その取付穴に回転軸１２の上端を圧入し、一部を溶着して回転軸１２と下側ブラシ盤２が一体として回転するように取り付ける。
次に下側ブラシ盤２の外周側に筒状の筒体８ａを有し、下側ブラシ盤２の下方を外周側から所定の内周側までをカバーする環状の下面部と下側ブラシ盤２の上方を外周側から所定の内周側までをカバーする環状の上面部を有するカバー８を設ける。カバー８の下面部には排水用孔８ｃを設ける。
次に下側ブラシ盤２の上方でカバー８の上面部の下方で筒体８ａの内周側に下側ブラシ盤２に所定の間隔で対向するように上側ブラシ盤３を設ける。上側ブラシ盤３は図２に示すように下側ブラシ盤２に対して所定量傾斜させる。次に上側ブラシ盤３の下面に環状に上方ブラシ毛３ｂを多数植毛する。
【０００９】
次に上側ブラシ盤３の中央の穴に沿って下方に伸びる筒状の環状板７を設ける。環状板７は上側ブラシ盤３の中央の穴の下端から下方に行くに従って拡径させた形状とし、環状板７の下端は、下側ブラシ盤２の上面に対してメダルｍの厚さより大きく、メダルｍを２枚重ねた厚さより小さい間隙を設ける形状とする。次に環状板７の上端は外側に広がる平面上にして上側ブラシ盤３の上面に固定する。次に上側ブラシ盤３の外周部分は、カバー８の筒体８ａの内周に接するようにして水密状にシールし、カバー８の上面部は、上側ブラシ盤３の上面との間に空間を形成し、カバー８の上面部の内周端を上側ブラシ盤３に固定した環状板７の上端平面部分に水密状に接合する。このカバー８の上面部から環状板７の円筒部分をメダル投入口６とする。次に図２に示すようにメダル投入口６に上方から洗浄水を給水する給水ホース５を設ける。給水ホース５のもう一端は、洗浄水のタンクから洗浄水を送るポンプの吐出口に取り付けられる。
次に左右に長い樋状の水受け２１を設ける。水受け２１の左右端には側板を設けて、水を一時的に貯えることができるようにする。次に図２に示すようにカバー２０下面の肉厚部及びベアリングカバー１５より大きい貫通穴を設け、貫通穴から水がこぼれないよう筒状にした部分を設ける。次にこの水受け２１に設けた貫通穴から回転軸１２の下端が突出するようにしてカバー２０を水受け２１に取り付ける。これによって下側ブラシ盤２及び上側ブラシ盤３等もカバー２０とともに水受け２１に取り付けられる。次に水受け２１の左端近くに水受け２１で受けた水を下方に流すための排水口２２を設ける。次に水受け２１から下方に向って突出させた回転軸１２の側方にモーター部１９を設ける。モーター部１９は水受け２１の下面に取り付け、出力軸にはプーリー１７を設ける。次に水受け２１から下方に向って突出させた回転軸１２の下端にプーリー１７と同じ高さ位置となるようにプーリー１６を設ける。次にプーリー１６とプーリー１７にベルト１８をかけ渡し、プーリー１６とプーリー１７が連動できるようにする。このように実施例１ではモーター部１９，プーリー１６，１７，ベルト１８で回転装置としている。
次に図４に示すように筒体８ａの一部を開口してメダル排出口８ｂを設ける。次に上側ブラシ盤３の下面のメダル排出口８ｂに近い部分に上方ブラシ毛３ｂを植毛しない送り部３ａを設ける。
次にメダル排出口８ｂから排出されるメダルを下方に送るシュート１０を設ける。シュート１０は図５に示すように搬送面として吸水シート１０ａを設けている。さらに吸水シート１０ａの下方に水切り孔１０ｃを多数備えた水切り板１０ｂを設け、水切り板１０ｂの下方にはシュート排水路１０ｄを設ける。
【００１０】
この実施例１のメダルの洗浄研磨装置１を使用するには、まずモーター部１９を駆動させる。するとモーター部１９の出力軸に取り付けたプーリー１７が回転し、ベルト１８によってプーリー１６が連動して回転する。プーリー１６が回転することによって取り付けた回転軸１２が回転し、回転軸１２が回転することによって回転軸１２に取り付けた下側ブラシ盤２が回転する。次に図示しない洗浄水のタンクのポンプによって給水ホース５に洗浄水を送らせる。洗浄水ｗは給水ホース５の先端よりメダル投入口６に噴出される。洗浄水ｗは、下側ブラシ盤２の回転により遠心力によって外周に送られる。外周に送られた洗浄水ｗは下方ブラシ毛２ｂと上方ブラシ毛３ｂの対向部を濡らす。下方ブラシ毛２ｂと上方ブラシ毛３ｂの対向部を濡らしながら洗浄水ｗは下側ブラシ盤２の外周と筒体８ａの内周の間から下方に排出される。下方に排出された洗浄水ｗはカバー８の下面部を伝って、カバー８の下面に設けられた排水用孔８ｃよりさらに下方に流れる。カバー８の下面に設けられた排水用孔８ｃから流れた水はカバー２０の上面上に落下し、カバー２０の上面を伝ってカバー２０の下方に折曲させた外周端から水受け２１内に落下する。カバー２０の上面上のベアリングカバー１５に向かう洗浄水の流れは、カバー２０の中央の開口部周縁を上方に折曲させた折曲部分２０ａで阻止される。また、ベアリングカバー１５の上面上に洗浄水ｗが流れても、ベアリングカバー１５の上方開口部にはシール体１４が設けられているため、ベアリング１３に水が流れ込むことがないので錆などが発生しにくくしてベアリング１３の回転を長い間良好に保つことができる。水受け２１内に流れた洗浄水ｗは水受け２１に設けられた排水口２２から下方に排出される。
【００１１】
この状態でメダル投入口６よりメダルｍを投入する。投入されたメダルｍの最も下方に位置し下側ブラシ盤２に接触しているメダルｍは下側ブラシ盤２の回転による遠心力によって徐々に外周側に移動する。環状板７の下端は下側ブラシ盤２の上面との間にメダルｍが一枚通る間隔を設けているのでメダルｍは一枚ずつ外周に向って移動していく。もし、多くの量のメダルｍをメダル投入口６に入れて、外周側に位置するメダルｍが縦になった状態になって環状板７の下端と下側ブラシ盤２の間の間隔を塞いでしまった場合にも、遠心力によって縦になった状態のメダルｍの下端が外周側に移動する様に力を受ける。環状板７の下部は拡径しているので、メダルｍの下端が外周側に移動するように力を受けることで、拡径した部分にメダルが沿うようにメダルｍが傾いて、メダルの重心がズレて倒れる。又、倒れない場合でもメダルｍが環状板７の下部に沿って外周に向って徐々に移動する。倒れたメダルｍは、環状板７の下端と下側ブラシ盤２の間から一枚ずつ外周に向って移動して行く。上側ブラシ盤３は下側ブラシ盤２に対し傾斜させているので、上側ブラシ盤３と下側ブラシ盤２の間隔を大きくした部分から上方ブラシ毛３ｂと下方ブラシ毛２ｂの間にメダルｍが移動して行く。メダルｍは図４に示すように上方ブラシ毛３ｂと下方ブラシ毛２ｂに挟まれた状態で回転する下方ブラシ毛２ｂによって回転方向に移動する力を受け、固定された上方ブラシ毛３ｂによって移動しないよう摩擦力を受ける。よってメダルｍは、上方ブラシ毛３ｂから受ける摩擦力の分、下方ブラシ毛２ｂより受ける回転する力より少ない力が回転力となって移動する。メダルｍには遠心力も加わるため、外周方向に移動するが、カバー８の筒体８ａの内周に当って、それ以上外周には移動しないので、筒体８ａの内周に沿って移動する。このように、メダルｍと上方ブラシ毛３ｂ，下方ブラシ毛２ｂとの速度差によってメダルｍは表面を研磨される。さらに上方ブラシ毛３ｂと下方ブラシ毛２ｂの間では、メダル投入口６の上方に設けられた給水ホース５の端の開口より供給された洗浄水によってメダルｍ及びメダルｍの上面を研磨する上方ブラシ毛３ｂ及び下方ブラシ毛２ｂに次々と洗浄水付着する。よってメダルｍは、水で洗浄されながら移動する。また、これにより上方ブラシ毛３ｂ，下方ブラシ毛２ｂによる研磨は水研磨となる。洗浄水で洗浄されることにより汚れが落ちたり、落ちなくても水分を汚れやゴミに吸収させて落ちやすくすることができる。さらに上方ブラシ毛３ｂ，下方ブラシ毛２ｂで表面を研磨することにより、汚れを確実に落とすことができる。また、洗浄水ｗに洗浄液などを混入させれば油や脂もより効果的に落とすことができる。このようにしてメダルｍから除去された汚れ，ゴミ，油，脂は、洗浄水とともに排出される。よってメダルｍから除去された汚れ，ゴミ，油，脂がメダルｍに再付着するようなことがない。また、上方ブラシ毛３ｂ，下方ブラシ毛２ｂに水を付着させながら研磨するので、上方ブラシ毛３ｂ，下方ブラシ毛２ｂは研磨による熱を冷却され、研磨による熱によって毛先が摩耗してしまうことを妨いで摩耗を遅らせることができるので上方ブラシ毛３ｂ，下方ブラシ毛２ｂを長い間交換せずに使用することができる。このようにしてメダルｍは水洗浄・水研磨されながら筒体８ａの内周に沿って移動する。さらにメダルｍが送り部３ａ部分に移動すると、送り部３ａには、上方ブラシ毛３ｂが設けられていないので、下方ブラシ毛２ｂより受ける力が相殺されずにメダルｍに加わって、メダルｍは速い速度で回転方向で且つ遠心力によって外周に向って移動する。送り部３ａに近い位置の筒体８ａにはメダル排出口８ｂが設けられているので、メダルｍはここから外部に排出される。
【００１２】
このようなメダルｍの動きが連続して行なわれることによって、本実施例１のメダルの洗浄研磨装置では連続的にメダルを処理できる。
このようにしてメダル排出口８ｂから排出されたメダルｍはシュート１０内の搬送路を斜め下方に向って移動する。シュート１０は図５に示すように吸水シート１０ａを搬送面にしているので、メダルｍは吸水シート１０ａの上を滑るようにして斜め下方に移動して行く。この際にメダルｍに付着している洗浄水は吸水シート１０ａに吸収されて行く。よってメダルｍをこのシュート１０で下方に送ることによりメダルｍに付着した洗浄水を除去することができる。さらに吸水シート１０ａの下面に密着して水切り板１０ｂが設けられている。水切り板１０ｂは金属性であり、所定の強度を有するので吸水シート１０ａがメダルｍの重さで変形したり、しわ等ができたりしてメダルｍの搬送を妨げないようにしている。さらに水切り板１０ｂには多数の水切り孔１０ｃが設けられている。吸水シート１０ａが水を多く吸水して吸水シート１０ａの下部に洗浄水がたまった場合には、このたまった洗浄水は水切り孔１０ｃから水切り板１０ｂの下方に設けられたシュート排水路１０ｄに落ちて、シュート排水路１０ｄを流れて排水される。よって吸水シート１０ａの吸水性は良好な状態で保たれる。
シュート１０によって下方に送られたメダルｍは、収容容器に収容されて別に設けられた乾燥装置で乾燥させて再利用される。またこのシュート１０の下端に乾燥装置を連結してもよい。シュート１０の吸水シート１０ａによってメダルｍに付着した洗浄水を落としているので、その後の乾燥が短時間で済むようになる。
このように連続的にメダルの水洗浄・水研磨を行うことができ、排水するシュートでメダルに付着した洗浄水を落とすことができる実施例１のメダルの洗浄・研磨装置は遊技設備などに組み込んで使用すれば、メダルをゴミ，汚れ，油，脂の付着していない状態で循環させて使用できるので非常に有用である。
【００１３】
実施例２（図６参照）
図６に示す実施例２は、シュートの搬送面を水切り板としたメダルの洗浄研磨装置の例である。
図６は実施例２のメダルの洗浄研磨装置のシュートの断面図である。
図中、２５はシュート、２５ａは水切り板、２５ｂは水切り孔、２５ｃはシュート排水路である。
実施例２では、シュート２５の搬送面を水切り板２５ａとしている。このように水切り孔２５ｂを多数備えた水切り板２５ａ上をメダルｍが移動するようにしてメダルｍに付着した洗浄水ｗを落とすようにしてもよい。
その他符号、構成、作用、使い方は実施例１と同じである。
【００１４】
実施例３（図７参照）
図７に示す実施例３は、シュートの搬送面を吸水シートとし、その下方に排水路を設けたメダルの洗浄研磨装置の例である。
図７は実施例３のメダルの洗浄研磨装置のシュートの断面図である。
図中、２８はシュート、２８ａは吸水シート、２８ｂはシュート板、２８ｃは排水溝である。
実施例３では、シュート板２８ｂの上面に吸水面として吸水シート２８ａを設け、吸水シート２８ａの下部に吸収した洗浄水がたまった場合に、斜め下方に洗浄水を流すための排水溝２８ｃをシュート板２８ｂの上面に設けている。このように吸水シートと排水溝を用いてメダルに付着した洗浄水を落とすようにしてもよい。
【００１５】
【発明の効果】
本発明によれば、メダルに付着したゴミ，汚れ，油を確実に除去し、除去したゴミや汚れなどの再付着を防ぎ、長い間使用できるメダルの洗浄研磨装置にできる。
環状の下方ブラシ毛の上端の長さが下方ブラシ毛を植毛していない下側ブラシ盤の中央部分とほぼ同じ高さになるようにし、メダル投入口を下側ブラシ盤の中央部分の上方に設け、メダル投入口で開口した給水管を設けたので、スムーズに連続的に用いることができる。
上側ブラシ盤の中央にメダル投入口を設け、メダル投入口の周縁から下側ブラシ盤に向って拡径した環状板を設けたものは、メダル投入口から投入されたメダルがスムーズに上方ブラシ毛と下方ブラシ毛の間に移動するようにし、メダルが詰まることがないようにできる。
吸水面上でメダルを滑らせて下方に送るシュートを設け、吸水面の下方にシュート排水路を設けたものと、水切り孔を多数備えた水切り板上でメダルを滑らせて下方に送るシュートを設け、水切り板の下方にシュート排水路を設けたものと給水面上でメダルを滑らせて下方に送るシュートを設け、吸水面の下方に水切り板を設け、水切り板の下方にシュート排水路を設けたものは、メダルの乾燥時間を短かくしてメダルを効率よく再利用できるようにする。
【図面の簡単な説明】
【図１】実施例１のメダルの洗浄研磨装置の説明図である。
【図２】図１のＡ−Ａ断面図である。
【図３】実施例１のメダルの洗浄研磨装置の一部拡大断面図である。
【図４】実施例１のメダルの洗浄研磨装置の説明図である。
【図５】実施例１のメダルの洗浄研磨装置のシュートの断面図である。
【図６】実施例２のメダルの洗浄研磨装置のシュートの断面図である。
【図７】実施例３のメダルの洗浄研磨装置のシュートの断面図である。
【符号の説明】
１メダルの洗浄研磨装置
２下側ブラシ盤
２ｂ下方ブラシ毛
３上側ブラシ盤
３ａ送り部
３ｂ上方ブラシ毛
５給水ホース
６メダル投入口
７環状板
８カバー
８ａ筒体
８ｂメダル排出口
８ｃ排水用孔
１０シュート
１０ａ吸水シート
１０ｂ水切り板
１０ｃ水切り孔
１０ｄシュート排水路
１２回転軸
１３ベアリング
１４シール体
１５ベアリングカバー
１６プーリー
１７プーリー
１８ベルト
１９モーター部
２０カバー
２０ａ折曲部分
２１水受け
２２排水口
２５シュート
２５ａ水切り板
２５ｂ水切り孔
２５ｃシュート排水路
２８シュート
２８ａ吸水シート
２８ｂシュート板
２８ｃ排水溝
３０給水口
ｍメダル
ｗ洗浄水[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a medal cleaning and polishing apparatus for cleaning and polishing the surface of medals, coins, and coins for games (collectively referred to as medals in this specification) to remove oil, grease, dust, and dirt.
[0002]
[Prior art]
Conventionally, a medal polishing device has been used to remove oil, grease, dust, and dirt adhering to a medal. Some medal polishing devices press a belt surface that moves against the surface of the medal, or press a moving brush. However, because of the dry type, the abrasion of the polishing surface is large, and it is necessary to periodically replace belts and brushes used as the polishing surface. In addition, abrasion powder from polishing may adhere to the medal. If it is reused as it is, it is not preferable because wear powder adheres to human hands or medals are clogged in the equipment.
[0003]
[Problems to be solved by the invention]
The problem to be solved by the present invention is to solve these conventional problems, to reliably remove dust, dirt, oil and grease adhering to medals, to prevent reattachment of removed dirt and dirt, and to use for a long time An object of the present invention is to provide a medal cleaning and polishing apparatus.
[0004]
[Means for Solving the Problems]
  The configuration of the present invention that solves this problem is as follows.
1) A lower brush board in which a lower brush hair for polishing the lower surface of the medal is planted on the upper surface and an upper brush board in which the upper brush hair for polishing the upper surface of the medal is planted on the lower surface are opposed to each other at a predetermined interval. Providing a medal slot for inserting a medal between the upper brush board and the lower brush board, and providing a cylindrical body surrounding an outer peripheral side of the upper brush board and the lower brush board,An annular lower surface part that covers the lower side of the lower brush disk from the outer peripheral side to the predetermined inner peripheral side above and below the cylindrical body, and an annular part that covers the upper part of the lower brush disk from the outer peripheral side to the predetermined inner peripheral side The upper surface of the cover is formed to form a cover, the lower surface of the cover is provided with a drain hole,A medal discharge port for discharging a medal between the upper brush board and the lower brush board is provided in the cylindrical body.,underSide brush boardTimesAn upper brush board is provided in a state in which a rotating device is provided to rotate, and cleaning water is supplied to the upper brush bristles and lower brush bristles facing each other, and the medal is wet with the washing water.AgainstBy rotating the lower brush plate relatively, the upper brush bristles and the lower brush bristles wash and polish the medals, and the lower brush bristles and the upper brush bristles are planted in an annular shape, and the upper end of the lower brush bristles has a lower height. Make sure that the brush head is almost the same height as the central part of the lower brush board, and that the medal slot is located above the central part of the lower brush board, and that the wash water is supplied from the medal slot. The medal cleaning and polishing apparatus is provided with a water supply pipe that is opened at the medal slot and receives the inserted medal at the central portion and moves it between the upper brush hair and the lower brush hair.
2) A chute that slides the medal discharged from the medal discharge port on the water absorption surface and sends it downward, and a chute drainage channel that receives water from the water absorption surface is provided below the water absorption surface. Medal cleaning machine
3) The medal slot is provided so as to penetrate through the center of the upper brush board, an annular plate having a diameter increased from the periphery of the medal slot toward the lower brush board, the lower end of the annular board and the lower brush The distance between the boards is slightly larger than the thickness of the medals, and medals are sent one by one from the center of the upper brush board between the upper and lower brush hairs by centrifugal force. Cleaning and polishing equipment
4) A chute that slides the medal discharged from the medal discharge port on the water absorption surface and sends it downward, and a chute drainage channel that receives water from the water absorption surface is provided below the water absorption surface.3)Cleaning and polishing equipment for medals as described in
5) A chute that slides the medal discharged from the medal discharge port on a draining plate having many draining holes and sends it downward is provided with a chute drainage channel that receives water from the draining plate below the draining plate. Above1) or 3)The medal cleaning and polishing apparatus according to any one of the above
6) A chute that slides the medal discharged from the medal discharge port on the water absorption surface and sends it downward is supported by a water draining plate having a number of drain holes, and the water draining plate is provided below the water draining plate. Provided with a chute drainage channel for receiving water1) or 3)The medal cleaning and polishing apparatus according to any one of the above
It is in.
[0005]
[Action]
  In the present invention, a medal is inserted between the lower brush hair and the upper brush hair from the medal insertion port. Washing water is supplied to the upper brush bristles and the lower brush bristles, and the medals are wetted with water. In this state, the upper brush board and the lower brush board are rotated relatively by the rotating device. The medals are cleaned and polished with the upper and lower brush hairs. The medal receives centrifugal force on the upper surface, the lower surface, or both surfaces, moves along the inner circumference of the cylinder while being cleaned and polished, and is discharged from a medal discharge port provided in the cylinder.
  The height of the upper edge of the annular lower bristle is approximately the same as the central part of the lower brush board where the lower bristle is not planted, and the medal slot is above the central part of the lower brush board. And a water supply pipe opened at the medal slotBecauseThe washing water can be supplied from the medal insertion port, and the medal can be smoothly moved from the central part to the part where the lower brush hair is planted.
  A medal slot is provided in the center of the upper brush board, and a medal slot is provided with an annular plate that expands from the periphery of the medal slot toward the lower brush board. it can. The inserted medals are sent one by one between the upper brush hair and the lower brush hair by centrifugal force between the lower end of the annular plate and the lower brush board. If the medal is placed vertically and closes between the lower end of the annular plate and the lower brush plate, the annular plate expands toward the lower brush plate. Is pulled to the outer peripheral side and the upper end of the medal falls toward the center side. Therefore, it is not possible to maintain a state where the vertical medal blocks the lower end of the annular board and the lower brush board for a long time.
  A chute that slides the medal on the water absorption surface and sends it down, and a chute drainage channel below the water absorption surface absorbs water adhering to the medal discharged from the medal outlet from the water absorption surface. In addition, it is possible to dry the medal after cleaning and polishing in a short time, and the water absorbed by the water absorption surface is discharged from the lower chute drainage channel so that the water absorption of the water absorption surface can be maintained.
  A chute that slides a medal on a draining plate having many draining holes and sends it downward, and a chute drainage channel below the draining plate, removes water adhering to the medal discharged from the outlet of the medal. Water is drained by sending it downward from the draining hole of the draining plate so that the drying after cleaning and polishing of the medal can be done in a short time, and the water sent downward from the draining hole is drained from the drainage channel. The drainage of the board can be maintained.
  A chute that slides a medal on the water-absorbing surface and sends it downward, a drainer plate below the water-absorbing surface, and a chute drainage channel below the drainer plate is a medal discharged from the medal outlet. The adsorbed water is absorbed by the water absorption surface so that the medals can be dried after cleaning and polishing, and the water absorbed by the water absorption surface is sent downward from the drain hole of the drain plate to be drained by the drainage channel. Thus, the water absorption of the water absorption surface is maintained.
[0006]
DETAILED DESCRIPTION OF THE INVENTION
  The medal cleaning and polishing apparatus of the present invention may be used alone or in combination with a drying apparatus or another apparatus.
  The washing water may be water or a mixture of washing chemicals in water.
  The lower brush bristles and upper brush bristles may be of any shape, thickness, and material as long as they are brush-like, but those that can reliably remove oil, grease, dust, and dirt on both sides of the medal are desirable. .
  A space is provided between the inner periphery of the cylinder and the outer periphery of the rotating disk used like the lower brush disk of the embodiment so as not to prevent the rotation of the rotating disk, but between the inner periphery of the cylinder and the rotating disk. It is preferable to make the dimensions so that the medal does not fall into.
[0007]
【Example】
Embodiments of the present invention will be specifically described with reference to the drawings.
Example 1 (see FIGS. 1 to 5)
1 to 5 show a medal cleaning / polishing apparatus for performing water cleaning / polishing to reuse a medal used in a game facility, and the lower brush board has a lower upper bristle with a height at the upper end of the lower brush bristles. The center portion of the medal slot is provided so that the medal slot is inserted through the center of the upper brush board, and an annular plate is provided that expands from the peripheral edge of the medal slot toward the lower brush board. A drainage channel for discharging the washing water is provided, a chute that slides the medal discharged from the medal outlet on the water absorption surface and sends it downward is provided, a drainer plate with many drain holes is provided below the water absorption surface, It is an example of the washing | cleaning grinding | polishing apparatus of the medal which provided the drainage channel under the board.
FIG. 1 is an explanatory view of a medal cleaning and polishing apparatus according to the first embodiment. 2 is a cross-sectional view taken along the line AA in FIG. FIG. 3 is a partially enlarged cross-sectional view of the medal cleaning and polishing apparatus of the first embodiment. FIG. 4 is an explanatory diagram of a medal cleaning and polishing apparatus according to the first embodiment. FIG. 5 is a sectional view of the chute of the medal cleaning and polishing apparatus of the first embodiment.
In the figure, 1 is a cleaning and polishing apparatus for medals, 2 is a lower brush board, 2b is a lower brush bristles, 3 is an upper brush board, 3a is a feed section, 3b is upper brush bristles, 5 is a water supply hose, and 6 is a medal insertion Mouth, 7 is an annular plate, 8 is a cover, 8a is a cylinder, 8b is a medal outlet, 8c is a drain hole, 10 is a chute, 10a is a water absorbing sheet, 10b is a drain plate, 10c is a drain hole, and 10d is a chute Drainage channel, 12 is a rotating shaft, 13 is a bearing, 14 is a seal body, 15 is a bearing cover, 16 is a pulley, 17 is a pulley, 18 is a belt, 19 is a motor unit, 20 is a cover, 20a is a bent portion, 21 Is a water receiver, 22 is a drain, and m is a medal.
[0008]
The medal cleaning and polishing apparatus 1 of Example 1 fixes an upper brush disk and rotates a lower brush disk with a motor.
First, a disc-shaped lower brush disc 2 is provided. The lower brush disk 2 is composed of three disks stacked and screwed at a plurality of locations. As shown in FIG. 2, the length from the center to the outer periphery of a predetermined length is a flat surface of the same height. The height of the annular portion from the outer peripheral end to the inner peripheral side of a predetermined length is made lower than the central portion. Next, a large number of downward brush bristles 2b are planted in a ring shape. The upper end of the lower brush bristles 2b is set to be substantially the same as the height of the central portion of the lower brush disc 2.
Next, a rotating shaft 12 extending downward is provided at the center of the lower brush board 2. A bearing 13 is press-fitted and attached to two predetermined positions of the rotary shaft 12. Next, a bearing cover 15 having a cylindrical shape and a ring-shaped bottom at the lower opening is provided. The lower end of the rotary shaft 12 is inserted from the upper opening of the bearing cover 15 so as to protrude from the lower opening of the bearing cover 15, and the outer periphery of the bearing 13 attached to the rotary shaft 12 is inserted into the inner periphery of the bearing cover 15. Then, the rotating shaft 12 and the bearing 13 are attached to the bearing cover 15. As a result, the rotary shaft 12 is freely rotatable by the bearing 13. The upper end of the rotating shaft 12 protrudes from the upper opening of the bearing cover 15. The inner and upper exteriors of the bearing cover 15 are sealed in a watertight manner so that the upper end of the rotating shaft 12 passes through the central hole portion of the ring-shaped seal body 14.
Next, a flat plate-like cover 20 is provided. The outer peripheral end portion of the cover 20 is bent so as to face downward. A through hole is provided in the central portion of the cover 20. Further, a bent portion 20 a that bends the peripheral edge of the through hole on the lower surface of the cover 20 upward is provided.
Next, a flange is provided near the upper end of the bearing cover 15 so that the upper end of the rotary shaft 12 protrudes upward from the through hole provided in the cover 20, and the bearing cover is formed on the thick portion of the outer periphery of the through hole of the cover 20. The bearing cover 15 is attached to the cover 20 with screws so that the flanges 15 are in contact with each other. Next, a mounting hole having a predetermined depth is provided in the lower surface of the lower brush board 2, the upper end of the rotary shaft 12 is press-fitted into the mounting hole, and a part of the rotary shaft 12 is welded so that the rotary shaft 12 and the lower brush board 2 are integrated. Install to rotate.
Next, an annular lower surface and a lower brush disc having a cylindrical tube 8a on the outer peripheral side of the lower brush disc 2 and covering the lower brush disc 2 from the outer peripheral side to a predetermined inner peripheral side. A cover 8 having an annular upper surface portion that covers the upper side of 2 from the outer peripheral side to a predetermined inner peripheral side is provided. A drain hole 8 c is provided on the lower surface of the cover 8.
Next, the upper brush disc 3 is provided above the lower brush disc 2 and below the upper surface of the cover 8 on the inner peripheral side of the cylinder 8a so as to face the lower brush disc 2 at a predetermined interval. The upper brush disc 3 is inclined by a predetermined amount with respect to the lower brush disc 2 as shown in FIG. Next, a large number of upper brush hairs 3 b are planted in a ring shape on the lower surface of the upper brush board 3.
[0009]
Next, a cylindrical annular plate 7 extending downward along the central hole of the upper brush board 3 is provided. The annular plate 7 has a shape in which the diameter increases from the lower end of the central hole of the upper brush disc 3 toward the lower side, and the lower end of the annular plate 7 is larger than the thickness of the medal m with respect to the upper surface of the lower brush disc 2, The shape is such that a gap smaller than the thickness of two medals m stacked is provided. Next, the upper end of the annular plate 7 is fixed on the upper surface of the upper brush board 3 with the plane extending outward. Next, the outer peripheral portion of the upper brush plate 3 is sealed in a watertight manner so as to be in contact with the inner periphery of the cylinder 8 a of the cover 8, and the upper surface portion of the cover 8 has a space between the upper surface of the upper brush plate 3. Then, the inner peripheral end of the upper surface portion of the cover 8 is joined in a watertight manner to the upper flat portion of the annular plate 7 fixed to the upper brush disc 3. A cylindrical portion of the annular plate 7 from the upper surface of the cover 8 is used as a medal slot 6. Next, as shown in FIG. 2, a water supply hose 5 for supplying cleaning water from above is provided at the medal slot 6. The other end of the water supply hose 5 is attached to a discharge port of a pump that sends cleaning water from a cleaning water tank.
Next, a long bowl-shaped water receiver 21 is provided on the left and right. Side plates are provided at the left and right ends of the water receiver 21 so that water can be temporarily stored. Next, as shown in FIG. 2, a thicker portion on the lower surface of the cover 20 and a through hole larger than the bearing cover 15 are provided, and a cylindrical portion is provided so that water does not spill from the through hole. Next, the cover 20 is attached to the water receiver 21 so that the lower end of the rotary shaft 12 protrudes from the through hole provided in the water receiver 21. Accordingly, the lower brush board 2 and the upper brush board 3 are also attached to the water receiver 21 together with the cover 20. Next, a drain port 22 is provided near the left end of the water receiver 21 to allow the water received by the water receiver 21 to flow downward. Next, the motor unit 19 is provided on the side of the rotating shaft 12 protruding downward from the water receiver 21. The motor unit 19 is attached to the lower surface of the water receiver 21 and a pulley 17 is provided on the output shaft. Next, the pulley 16 is provided at the lower end of the rotating shaft 12 projecting downward from the water receiver 21 so as to be at the same height as the pulley 17. Next, the belt 18 is passed over the pulley 16 and the pulley 17 so that the pulley 16 and the pulley 17 can be interlocked. As described above, in the first embodiment, the motor unit 19, the pulleys 16 and 17, and the belt 18 serve as a rotating device.
Next, as shown in FIG. 4, a part of the cylinder 8a is opened to provide a medal discharge port 8b. Next, a feeding portion 3a that does not plant the upper brush bristles 3b is provided on the lower surface of the upper brush board 3 near the medal discharge port 8b.
Next, a chute 10 is provided for sending medals discharged from the medal discharge port 8b downward. As shown in FIG. 5, the chute 10 is provided with a water absorbing sheet 10a as a conveying surface. Further, a draining plate 10b having a number of draining holes 10c is provided below the water absorbing sheet 10a, and a chute drainage channel 10d is provided below the draining plate 10b.
[0010]
In order to use the medal cleaning and polishing apparatus 1 of the first embodiment, first, the motor unit 19 is driven. Then, the pulley 17 attached to the output shaft of the motor unit 19 rotates, and the pulley 16 rotates in conjunction with the belt 18. When the pulley 16 rotates, the attached rotating shaft 12 rotates, and when the rotating shaft 12 rotates, the lower brush board 2 attached to the rotating shaft 12 rotates. Next, wash water is sent to the water supply hose 5 by a pump of a wash water tank (not shown). The washing water w is ejected from the tip of the water supply hose 5 to the medal slot 6. The washing water w is sent to the outer periphery by centrifugal force due to the rotation of the lower brush board 2. The washing water w sent to the outer periphery wets the facing portions of the lower brush bristles 2b and the upper brush bristles 3b. The washing water w is discharged downward from between the outer periphery of the lower brush disc 2 and the inner periphery of the cylindrical body 8a while wetting the facing portion of the lower brush bristle 2b and the upper brush bristle 3b. The washing water w discharged downward flows along the lower surface portion of the cover 8 and flows further downward from the drainage hole 8 c provided on the lower surface of the cover 8. The water that flows from the drain hole 8c provided on the lower surface of the cover 8 falls on the upper surface of the cover 20 and enters the water receiver 21 from the outer peripheral end that is bent below the cover 20 along the upper surface of the cover 20. Fall. The flow of cleaning water toward the bearing cover 15 on the upper surface of the cover 20 is blocked by a bent portion 20a in which the peripheral edge of the opening at the center of the cover 20 is bent upward. Even if cleaning water w flows on the upper surface of the bearing cover 15, since the seal body 14 is provided in the upper opening of the bearing cover 15, water does not flow into the bearing 13, so rust is generated. The rotation of the bearing 13 can be kept good for a long time. The washing water w that has flowed into the water receiver 21 is discharged downward from a drain port 22 provided in the water receiver 21.
[0011]
In this state, the medal m is inserted from the medal insertion slot 6. The medal m positioned at the lowest position of the inserted medal m and in contact with the lower brush board 2 is gradually moved to the outer peripheral side by the centrifugal force due to the rotation of the lower brush board 2. Since an interval through which one medal m passes is provided between the lower end of the annular plate 7 and the upper surface of the lower brush disc 2, the medal m moves toward the outer circumference one by one. If a large amount of medals m are inserted into the medal slot 6, the medals m positioned on the outer peripheral side are in a vertical state to close the gap between the lower end of the annular plate 7 and the lower brush board 2. Even when the medals m are bent by the centrifugal force, the medal m in a vertical state receives force so that the lower end moves to the outer peripheral side. Since the diameter of the lower portion of the annular plate 7 is increased, the medal m is tilted so that the medal follows the expanded portion by receiving a force so that the lower end of the medal m moves to the outer peripheral side, and the center of gravity of the medal Falls and falls. Further, even when the medals cannot fall down, the medals m gradually move toward the outer circumference along the lower part of the annular plate 7. The fallen medals m move from the lower end of the annular plate 7 and the lower brush board 2 one by one toward the outer periphery. Since the upper brush disc 3 is inclined with respect to the lower brush disc 2, a medal m is formed between the upper brush bristle 3b and the lower brush bristle 2b from a portion where the interval between the upper brush disc 3 and the lower brush disc 2 is increased. Go and go. As shown in FIG. 4, the medal m receives a force that moves in the rotating direction by the lower brush bristles 2b that are rotated between the upper brush bristles 3b and the lower brush bristles 2b, and does not move by the fixed upper brush bristles 3b. Receiving frictional force. Therefore, the medal m moves as a rotational force that is less than the rotational force received from the lower brush bristles 2b by the amount of friction received from the upper brush bristles 3b. Since the medal m is also subjected to centrifugal force, the medal m moves in the outer circumferential direction, but hits the inner circumference of the cylinder 8a of the cover 8 and does not move further to the outer circumference, and therefore moves along the inner circumference of the cylinder 8a. In this way, the surface of the medal m is polished by the speed difference between the medal m and the upper brush bristles 3b and the lower brush bristles 2b. Further, between the upper brush bristles 3b and the lower brush bristles 2b, the upper brush that polishes the medals m and the upper surface of the medals m with the cleaning water supplied from the opening of the end of the water supply hose 5 provided above the medal insertion port 6. Washing water adheres to the bristles 3b and the lower brush bristles 2b one after another. Therefore, the medal m moves while being washed with water. Moreover, by this, the polishing by the upper brush bristles 3b and the lower brush bristles 2b is water polishing. By washing with washing water, dirt can be removed, or even if it does not fall, moisture can be absorbed by dirt and dust to make it easier to remove. Further, by polishing the surface with the upper brush bristles 3b and the lower brush bristles 2b, dirt can be reliably removed. Moreover, if cleaning liquid etc. are mixed in the cleaning water w, oil and fat can be removed more effectively. The dirt, dust, oil, and fat removed from the medal m in this way are discharged together with the cleaning water. Therefore, the dirt, dust, oil, and fat removed from the medal m do not reattach to the medal m. Further, since polishing is performed while water is attached to the upper brush bristles 3b and the lower brush bristles 2b, the upper brush bristles 3b and the lower brush bristles 2b are cooled by the heat from the polishing, and the hair tips are worn by the heat from the polishing. Therefore, the wear can be delayed and the upper brush bristles 3b and the lower brush bristles 2b can be used without being exchanged for a long time. In this way, the medal m moves along the inner periphery of the cylindrical body 8a while being washed with water and polished. When the medal m further moves to the feeding portion 3a portion, the upper brush hair 3b is not provided in the feeding portion 3a, so that the force received from the lower brush hair 2b is added to the medal m without being canceled, and the medal m It moves in the direction of rotation at high speed and towards the outer periphery by centrifugal force. Since the medal discharge port 8b is provided in the cylindrical body 8a at a position close to the feeding portion 3a, the medal m is discharged from here.
[0012]
By continuously performing such movement of the medal m, the medal cleaning and polishing apparatus according to the first embodiment can continuously process the medal.
In this way, the medal m discharged from the medal discharge port 8b moves obliquely downward along the conveyance path in the chute 10. Since the chute 10 has the water absorbent sheet 10a as the conveying surface as shown in FIG. 5, the medal m moves obliquely downward while sliding on the water absorbent sheet 10a. At this time, the washing water adhering to the medal m is absorbed by the water absorbing sheet 10a. Therefore, the cleaning water adhering to the medal m can be removed by sending the medal m downward with the chute 10. Further, a draining plate 10b is provided in close contact with the lower surface of the water absorbent sheet 10a. Since the draining plate 10b is metallic and has a predetermined strength, the water absorbing sheet 10a is deformed by the weight of the medal m, wrinkles, etc., so that the conveyance of the medal m is not hindered. Further, the draining plate 10b is provided with a number of draining holes 10c. When the water absorbing sheet 10a absorbs a large amount of water and the washing water accumulates in the lower part of the water absorbing sheet 10a, the accumulated washing water falls from the draining hole 10c to the chute drainage channel 10d provided below the draining plate 10b. Then, it flows through the chute drainage channel 10d and is drained. Therefore, the water absorption of the water absorbing sheet 10a is maintained in a good state.
The medals m sent downward by the chute 10 are stored in a storage container and dried by a separate drying device and reused. A drying device may be connected to the lower end of the chute 10. Since the washing water adhering to the medal m is dropped by the water absorbing sheet 10a of the chute 10, subsequent drying can be completed in a short time.
As described above, the medal cleaning / polishing apparatus according to the first embodiment, which can continuously wash and polish the medal with water, and can remove the washing water adhering to the medal with the draining chute, is incorporated in a game facility or the like. It is very useful because it can be used by circulating the medals without dust, dirt, oil, or grease attached.
[0013]
Example 2 (see FIG. 6)
Example 2 shown in FIG. 6 is an example of a medal cleaning and polishing apparatus in which a chute conveying surface is a draining plate.
FIG. 6 is a cross-sectional view of the chute of the medal cleaning and polishing apparatus of the second embodiment.
In the figure, 25 is a chute, 25a is a draining plate, 25b is a draining hole, and 25c is a chute drainage channel.
In Example 2, the conveyance surface of the chute 25 is a draining plate 25a. As described above, the washing water w attached to the medal m may be dropped so that the medal m moves on the draining plate 25a provided with many draining holes 25b.
Other symbols, configurations, operations, and usage are the same as those in the first embodiment.
[0014]
Example 3 (see FIG. 7)
Example 3 shown in FIG. 7 is an example of a medal cleaning and polishing apparatus in which a conveyance surface of a chute is a water absorbent sheet and a drainage channel is provided below the absorbent sheet.
FIG. 7 is a cross-sectional view of the chute of the medal cleaning and polishing apparatus of the third embodiment.
In the figure, 28 is a chute, 28a is a water absorbing sheet, 28b is a chute plate, and 28c is a drainage groove.
In the third embodiment, a water absorbing sheet 28a is provided on the upper surface of the chute plate 28b as a water absorbing surface, and when the cleaning water absorbed in the lower part of the water absorbing sheet 28a is accumulated, the drain groove 28c for flowing the cleaning water obliquely downward is chuteed. It is provided on the upper surface of the plate 28b. In this way, the washing water adhering to the medal may be dropped using the water absorbing sheet and the drainage groove.
[0015]
【The invention's effect】
  According to the present invention, it is possible to reliably remove dust, dirt and oil adhering to a medal, prevent reattachment of the removed dust and dirt, etc., and provide a medal cleaning and polishing apparatus which can be used for a long time.
  The length of the upper end of the annular lower bristle is approximately the same height as the central part of the lower brush board where the lower bristle is not implanted, and the medal slot is above the central part of the lower brush board. And a water supply pipe opened at the medal slotBecauseCan be used smoothly and continuously.
  In the case where a medal slot is provided in the center of the upper brush board and an annular plate whose diameter is increased from the periphery of the medal slot toward the lower brush board, the medal inserted from the medal slot is smoothly brushed upward. And move between the lower brush hairs so that the medal is not clogged.
  A chute that slides the medal on the water absorption surface and sends it downward, a chute drainage channel provided below the water absorption surface, and a chute that slides the medal on the drainage plate with many drain holes and sends it downward Provide a chute drainage channel below the drainage plate and a chute that slides the medal on the water supply surface and sends it down, a drainage plate below the water absorption surface, and a chute drainage channel below the drainage plate The provided one shortens the drying time of the medals so that the medals can be reused efficiently.
[Brief description of the drawings]
FIG. 1 is an explanatory diagram of a medal cleaning and polishing apparatus according to a first embodiment.
FIG. 2 is a cross-sectional view taken along the line AA of FIG.
3 is a partially enlarged cross-sectional view of the medal cleaning and polishing apparatus of Example 1. FIG.
4 is an explanatory diagram of a medal cleaning and polishing apparatus according to Embodiment 1; FIG.
5 is a cross-sectional view of a chute of the medal cleaning and polishing apparatus of Example 1. FIG.
6 is a cross-sectional view of a chute of the medal cleaning and polishing apparatus of Example 2. FIG.
7 is a cross-sectional view of a chute of the medal cleaning and polishing apparatus of Example 3. FIG..
[Explanation of symbols]
      1 Medal cleaning and polishing equipment
      2 Lower brushBoard
      2b downward brush hair
      3 Upper brush board
      3a Feeder
      3b Upper brushhair
      5 Water supply hose
      6 medal slot
      7 Annular plate
      8 Cover
      8a cylinder
      8b Medal outlet
      8c For drainageHole
    10 Shoot
    10a Water absorption sheet
    10b Draining board
    10c Draining hole
    10d chute drainageRoad
    12 Rotating shaft
    13 Bearing
    14 Seal body
    15 Bearing cover
    16 pulley
    17 pulley
    18 belt
    19 Motor part
    20 Cover
    20a Bent part
    21 Water receiver
    22 Drainagemouth
    25 Shoot
    25a Draining board
    25b Draining hole
    25c Chute drainageRoad
    28 Shoot
    28a Water absorption sheet
    28b Chute board
    28c Drainagegroove
    30 Water inlet
        m medal
        w Wash water

Claims

A lower brush plate in which a lower brush hair for polishing the lower surface of the medal is planted on the upper surface and an upper brush plate in which an upper brush hair for polishing the upper surface of the medal is planted on the lower surface are provided facing each other at a predetermined interval. the upper brush plate and medal insertion slot for inserting a medal between the lower brush plate is provided, provided with a cylindrical body surrounding the outer periphery of the lower brush plate and the upper brush plate, beneath the top and bottom of the cylindrical body An annular lower surface portion covering the lower side of the side brush disc from the outer peripheral side to the predetermined inner peripheral side and an annular upper surface portion covering the lower brush disc from the outer peripheral side to the predetermined inner peripheral side are provided. A drainage hole is provided in the lower surface of the cover, a medal discharge port for discharging a medal between the upper brush board and the lower brush board is provided in the cylindrical body, and the lower brush board is rotated. A rotating device is provided to rotate the upper brush hair and the lower brush. Washed water watered opposing portions of the hair, the clean polishing medal above bristles and a lower brush bristles by relatively rotating the lower brush plate to the upper brush plate in a state wetted medals to the wash water And the lower brush bristle and the upper brush bristle are planted in an annular shape so that the height of the upper end of the lower brush bristle is substantially the same as the central part of the lower brush board not planting the lower brush bristle, A medal slot is provided above the central part of the lower brush board, and a water supply pipe that opens at the medal slot is provided so that cleaning water is supplied from the medal slot. A medal cleaning and polishing apparatus that moves between the bristle and the lower bristle.

2. The medal according to claim 1, further comprising a chute that slides the medal discharged from the medal discharge port on the water absorption surface and sends the medal downward, and a chute drainage channel that receives water from the water absorption surface below the water absorption surface. Cleaning and polishing equipment.

The medal slot is provided so as to penetrate the center of the upper brush board, an annular plate having a diameter expanded from the periphery of the medal slot toward the lower brush board, the lower end of the annular board and the lower brush board 2. The medal cleaning and polishing according to claim 1, wherein the distance between the medals is slightly larger than the thickness of the medals and the medals are sent one by one from the center of the upper brush board between the upper and lower brush hairs by centrifugal force. apparatus.

4. The medal according to claim 3 , wherein a chute that slides the medal discharged from the medal discharge port on the water absorption surface and sends it downward is provided, and a chute drainage channel that receives water from the water absorption surface is provided below the water absorption surface. Cleaning and polishing equipment.

A chute is provided for sliding a medal discharged from the medal discharge port on a draining plate having a number of draining holes and feeding it downward, and a chute drainage channel for receiving water from the draining plate is provided below the draining plate. The medal cleaning and polishing apparatus according to any one of 1 and 3 .

A chute that slides the medal discharged from the medal outlet on the water absorption surface and sends it downward is supported by a water draining plate having many drain holes, and water from the water draining plate is below the water draining plate. 4. The medal cleaning and polishing apparatus according to claim 1, further comprising a chute drainage channel for receiving the medal.