JP4056734B2 - センスアンプおよびセンスアンプが組み込まれた電子機器 - Google Patents
センスアンプおよびセンスアンプが組み込まれた電子機器 Download PDFInfo
- Publication number
- JP4056734B2 JP4056734B2 JP2001367627A JP2001367627A JP4056734B2 JP 4056734 B2 JP4056734 B2 JP 4056734B2 JP 2001367627 A JP2001367627 A JP 2001367627A JP 2001367627 A JP2001367627 A JP 2001367627A JP 4056734 B2 JP4056734 B2 JP 4056734B2
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- JP
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- Prior art keywords
- terminal
- switch
- transistor
- drain
- gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 239000004065 semiconductor Substances 0.000 claims description 99
- 239000000758 substrate Substances 0.000 claims description 46
- 239000003990 capacitor Substances 0.000 claims description 23
- 239000010409 thin film Substances 0.000 claims description 6
- 239000010408 film Substances 0.000 description 108
- 239000013078 crystal Substances 0.000 description 30
- 238000000034 method Methods 0.000 description 26
- 230000003287 optical effect Effects 0.000 description 21
- 238000010586 diagram Methods 0.000 description 17
- 239000010410 layer Substances 0.000 description 15
- 239000011521 glass Substances 0.000 description 14
- 239000012535 impurity Substances 0.000 description 13
- 238000005224 laser annealing Methods 0.000 description 13
- 238000010438 heat treatment Methods 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 238000001069 Raman spectroscopy Methods 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 229910021417 amorphous silicon Inorganic materials 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 239000012299 nitrogen atmosphere Substances 0.000 description 6
- 230000001133 acceleration Effects 0.000 description 5
- 238000002425 crystallisation Methods 0.000 description 5
- 239000011229 interlayer Substances 0.000 description 5
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000000969 carrier Substances 0.000 description 4
- 230000008025 crystallization Effects 0.000 description 4
- 230000005669 field effect Effects 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- 230000001678 irradiating effect Effects 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 235000018734 Sambucus australis Nutrition 0.000 description 3
- 244000180577 Sambucus australis Species 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 230000007257 malfunction Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- MQRWBMAEBQOWAF-UHFFFAOYSA-N acetic acid;nickel Chemical compound [Ni].CC(O)=O.CC(O)=O MQRWBMAEBQOWAF-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229940078494 nickel acetate Drugs 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 229910018125 Al-Si Inorganic materials 0.000 description 1
- 229910018520 Al—Si Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 208000027418 Wounds and injury Diseases 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 201000009310 astigmatism Diseases 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- ZOCHARZZJNPSEU-UHFFFAOYSA-N diboron Chemical compound B#B ZOCHARZZJNPSEU-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
Images
Landscapes
- Liquid Crystal (AREA)
- Dram (AREA)
- Static Random-Access Memory (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Thin Film Transistor (AREA)
- Recrystallisation Techniques (AREA)
- Amplifiers (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (12)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001367627A JP4056734B2 (ja) | 2001-11-30 | 2001-11-30 | センスアンプおよびセンスアンプが組み込まれた電子機器 |
US10/305,017 US6768348B2 (en) | 2001-11-30 | 2002-11-27 | Sense amplifier and electronic apparatus using the same |
TW091134643A TWI280734B (en) | 2001-11-30 | 2002-11-28 | Sense amplifier and electronic apparatus using the same |
CNB021547157A CN100474435C (zh) | 2001-11-30 | 2002-11-29 | 读出放大器及使用该读出放大器的电子装置 |
KR1020020075687A KR100946943B1 (ko) | 2001-11-30 | 2002-11-30 | 센스 증폭기 및 이를 사용한 전자 장치 |
US10/899,048 US7091750B2 (en) | 2001-11-30 | 2004-07-27 | Sense amplifier and electronic apparatus using the same |
US11/458,710 US7564271B2 (en) | 2001-11-30 | 2006-07-20 | Sense amplifier and electronic apparatus using the same |
US12/469,734 US7847598B2 (en) | 2001-11-30 | 2009-05-21 | Sense amplifier and electronic apparatus using the same |
US12/940,069 US8149018B2 (en) | 2001-11-30 | 2010-11-05 | Sense amplifier and electronic apparatus using the same |
US13/367,397 US8330498B2 (en) | 2001-11-30 | 2012-02-07 | Sense amplifier and electronic apparatus using the same |
US13/677,351 US8581631B2 (en) | 2001-11-30 | 2012-11-15 | Sense amplifier and electronic apparatus using the same |
US14/048,099 US8854084B2 (en) | 2001-11-30 | 2013-10-08 | Sense amplifier and electronic apparatus using the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001367627A JP4056734B2 (ja) | 2001-11-30 | 2001-11-30 | センスアンプおよびセンスアンプが組み込まれた電子機器 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2003173683A JP2003173683A (ja) | 2003-06-20 |
JP2003173683A5 JP2003173683A5 (enrdf_load_stackoverflow) | 2005-07-14 |
JP4056734B2 true JP4056734B2 (ja) | 2008-03-05 |
Family
ID=19177345
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001367627A Expired - Fee Related JP4056734B2 (ja) | 2001-11-30 | 2001-11-30 | センスアンプおよびセンスアンプが組み込まれた電子機器 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4056734B2 (enrdf_load_stackoverflow) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7130234B2 (en) * | 2003-12-12 | 2006-10-31 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
JP5376704B2 (ja) * | 2003-12-12 | 2013-12-25 | 株式会社半導体エネルギー研究所 | 半導体装置 |
-
2001
- 2001-11-30 JP JP2001367627A patent/JP4056734B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2003173683A (ja) | 2003-06-20 |
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