JP4048016B2 - 半導体レーザ光源及びこれを用いた半導体レーザ加工装置 - Google Patents

半導体レーザ光源及びこれを用いた半導体レーザ加工装置 Download PDF

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Publication number
JP4048016B2
JP4048016B2 JP2000066688A JP2000066688A JP4048016B2 JP 4048016 B2 JP4048016 B2 JP 4048016B2 JP 2000066688 A JP2000066688 A JP 2000066688A JP 2000066688 A JP2000066688 A JP 2000066688A JP 4048016 B2 JP4048016 B2 JP 4048016B2
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Prior art keywords
laser light
transparent rod
semiconductor laser
light source
output
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Expired - Fee Related
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JP2000066688A
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Japanese (ja)
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JP2001257434A (ja
JP2001257434A5 (https=
Inventor
ラリット・ビー・シャルマ
裕司 竹中
啓介 古田
哲夫 小島
公治 安井
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Mitsubishi Electric Corp
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Mitsubishi Electric Corp
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Priority to JP2000066688A priority Critical patent/JP4048016B2/ja
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Publication of JP2001257434A5 publication Critical patent/JP2001257434A5/ja
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  • Laser Beam Processing (AREA)
  • Semiconductor Lasers (AREA)
  • Optical Couplings Of Light Guides (AREA)
JP2000066688A 2000-03-10 2000-03-10 半導体レーザ光源及びこれを用いた半導体レーザ加工装置 Expired - Fee Related JP4048016B2 (ja)

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JP2000066688A JP4048016B2 (ja) 2000-03-10 2000-03-10 半導体レーザ光源及びこれを用いた半導体レーザ加工装置

Applications Claiming Priority (1)

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JP2000066688A JP4048016B2 (ja) 2000-03-10 2000-03-10 半導体レーザ光源及びこれを用いた半導体レーザ加工装置

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JP2001257434A JP2001257434A (ja) 2001-09-21
JP2001257434A5 JP2001257434A5 (https=) 2005-07-14
JP4048016B2 true JP4048016B2 (ja) 2008-02-13

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JP2000066688A Expired - Fee Related JP4048016B2 (ja) 2000-03-10 2000-03-10 半導体レーザ光源及びこれを用いた半導体レーザ加工装置

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Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050091915A (ko) * 2004-03-11 2005-09-16 주식회사 솔고 바이오메디칼 반도체 레이저 다이오드 바 스택 방법
CA2568791A1 (en) * 2004-06-01 2005-12-15 Trumpf Photonics Inc. Optimum matching of the output of a two-dimensional laser array stack to an optical fiber
EP1909366A4 (en) * 2005-07-13 2009-07-08 Furukawa Electric Co Ltd LIGHT RADIATION EQUIPMENT AND WELDING METHOD
US7839487B2 (en) * 2006-04-13 2010-11-23 Asml Holding N.V. Optical system for increasing illumination efficiency of a patterning device
JP2008053626A (ja) * 2006-08-28 2008-03-06 Alpha Oikos:Kk レーザ加熱装置
JP5348155B2 (ja) * 2011-02-28 2013-11-20 オムロン株式会社 レーザ加工装置
US8599485B1 (en) * 2012-05-25 2013-12-03 Corning Incorporated Single-emitter etendue aspect ratio scaler
JP6567256B2 (ja) * 2014-06-04 2019-08-28 シャープ株式会社 光学装置
KR101738155B1 (ko) * 2015-06-10 2017-05-22 주식회사 필옵틱스 라인 빔 형성 장치

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