JP4042592B2 - Heating device - Google Patents
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Description
【０００１】
【発明の属する技術分野】
本発明は、近赤外線放射源と遠赤外線放射源とを組み合わせて被処理物（ワーク）を加熱する加熱装置に関する。
【０００２】
【従来の技術】
従来、部分的に塗料を塗布したガラス等の、分光吸収波長特性の異なる被処理物を加熱する際には、一般的には、分光吸収波長特性の影響が少ない伝導方式や対流方式を主とした加熱源、例えば、熱風循環炉や雰囲気炉等が使用されている。
また、輻射方式を主とした加熱源としては、被処理物の分光吸収波長特性に対して比較的影響差が少なく安定して加熱できる遠赤外線ヒータ（セラミックヒータやシーズヒータなど）がよく使われる。
【０００３】
ここで、赤外線とは、波長域０．７５μｍ〜１０００μｍの電磁波の一種であり、通常０．７５μｍ〜３μｍを近赤外線、３μｍ〜１０００μｍを遠赤外線とされるものであり、本願ではこれらの定義に従う。
【０００４】
次に、近赤外線ヒータまたは遠赤外線ヒータを用いて、例えば、素ガラスに黒色セラミック塗料を塗布した被処理物の塗布部（塗膜部）だけの温度を上げて乾燥させる場合について説明する。
【０００５】
まず、近赤外線ヒータのみを用いて加熱処理しようとすると、塗布部が集中的に昇温されてしまうため、塗布部と素ガラス部で温度差を生ずる。そのため、素ガラス部と塗布部の境界付近を起点として素ガラス部にクラックを生じてしまう。
【０００６】
また、遠赤外線ヒータのみを用いて加熱処理しようとすると、素ガラス部の温度は上昇するが、塗布部の温度上昇が不十分となり、十分に乾燥させることができないという問題を生じる。
【０００７】
また、近赤外線ヒータと遠赤外線ヒータとを組み合わせた加熱装置としては、特開平１０−１８９２２０号公報に記載されているように、近赤外線ヒータと遠赤外線ヒータとを被処理物の搬送方向に順に並べて配置したものが知られている。
【０００８】
この加熱装置は、図９に示すように、複数本の近赤外線ヒータ１１と複数本の遠赤外線ヒータ１２のそれぞれを被処理物１３の進行方向と平行に配列している。ここで、近赤外線ヒータ１１は透光性ガラス管内にフィラメント線が設けられ、フィラメント線から放射する近赤外線を利用して被処理物１３を加熱する。また、遠赤外線ヒータ１２はフィラメント線を内封したガラス管の周囲にセラミックが被覆されたものやシーズ線が用いられ、遠赤外線ヒータ１２の外囲管表面から輻射する遠赤外線を利用して被処理物１３を加熱する。被処理物１３はチェーンコンベア１４上を搬送され、最初近赤外線ヒータ１１によって加熱され、次に遠赤外線ヒータ２によって加熱される。
【０００９】
【特許文献１】
特開平１０−１８９２２０号公報
【００１０】
【発明が解決しようとする課題】
しかし、図９に示すような加熱装置においては、遠赤外線を放射する熱源自体が大気中にさらされているため、遠赤外線ヒータ１２周囲の雰囲気による対流の影響を受けやすく、対流による熱損失を生じてしまう。そのため、遠赤外線ヒータ２の下方に被処理物１３があると、熱の上方への逃げによる熱損失、即ち、エネルギー損が大きくなる。また、被処理物１３を透過した近赤外線は迷光となり炉体内の温度上昇を招くと共に、エネルギー損を生じてしまう。
【００１１】
本発明の目的は、上記の問題点に鑑み、単一の所定の厚さを有する透明な被処理物等を加熱する際には、近赤外線放射源によって被処理物を効果的に加熱するとともに、遠赤外線放射源の加熱効率を向上させ、また、分光吸収波長特性の異なる被処理物等を加熱する際には、エネルギー損を少なくし、被処理物の昇温が必要な部分とそれ以外の部分との温度差を大きくしないようにして、変形や破損を生じることのない加熱装置を提供することにある。
【００１２】
【課題を解決するための手段】
本発明は、上記の課題を解決するために、次のような手段を採用した。
第１の手段は、近赤外線放射源から放射される近赤外線および遠赤外線放射源から放射される遠赤外線とによって被処理物を加熱する加熱装置において、前記被処理物は分光吸収波長特性の異なる領域を有する被処理物であって、前記近赤外線放射源は前記被処理物の上に配置され、前記遠赤外線放射源は遠赤外線放射プレートから構成されると共に前記被処理物の下に配置され、前記近赤外線放射源から照射され、前記被処理物に吸収された近赤外線は前記被処理物を加熱し、前記被処理物を透過した近赤外線は前記遠赤外線放射プレートに照射されて遠赤外線を放射して前記被処理物を加熱することを特徴とする。
第２の手段は、近赤外線放射源から放射される近赤外線および遠赤外線放射源から放射される遠赤外線とによって被処理物を加熱する加熱装置において、前記被処理物は分光吸収波長特性の異なる領域を有する被処理物であって、前記近赤外線放射源は前記被処理物の上に配置され、前記遠赤外線放射源は遠赤外線ヒータから構成されると共に前記被処理物の下に配置され、前記近赤外線放射源から照射され、前記被処理物に吸収された近赤外線は前記被処理物を加熱し、前記被処理物を透過した近赤外線は前記遠赤外線ヒータに照射されて遠赤外線を放射すると共に前記遠赤外線ヒータは自ら発熱して遠赤外線を放射して前記被処理物を加熱することを特徴とする。
第３の手段は、近赤外線放射源から放射される近赤外線および遠赤外線放射源から放射される遠赤外線とによって被処理物を加熱する加熱装置において、前記被処理物は厚さに応じて分光透過率の異なる被処理物であって、前記近赤外線放射源は前記被処理物の上に配置され、前記遠赤外線放射源は遠赤外線放射プレートから構成されると共に前記被処理物の下に配置され、前記近赤外線放射源から照射され、前記被処理物に吸収された近赤外線は前記被処理物を加熱し、前記被処理物を透過した近赤外線は前記遠赤外線放射プレートに照射されて遠赤外線を放射して前記被処理物を加熱することを特徴とする。
第４の手段は、近赤外線放射源から放射される近赤外線および遠赤外線放射源から放射される遠赤外線とによって被処理物を加熱する加熱装置において、前記被処理物は厚さに応じて分光透過率の異なる被処理物であって、前記近赤外線放射源は前記被処理物の上に配置され、前記遠赤外線放射源は遠赤外線ヒータから構成されると共に前記被処理物の下に配置され、前記近赤外線放射源から照射され、前記被処理物に吸収された近赤外線は前記被処理物を加熱し、前記被処理物を透過した近赤外線は前記遠赤外線ヒータに照射されて遠赤外線を放射すると共に前記遠赤外線ヒータは自ら発熱して遠赤外線を放射して前記被処理物を加熱することを特徴とする。
【００１５】
【発明の実施の形態】
本発明の第１の実施形態を図１乃至図５を用いて説明する。
図１は、本実施形態の発明に係る加熱装置の正面断面図、図２は図１に示した被処理物３の平面図である。
【００１６】
これらの図において、１は被処理物３の上方に設けられるとともに、被処理物３の進行方向と平行に配列された複数本の近赤外線放射源としての近赤外線ヒータであり、この近赤外線ヒータ１は透光性ガラス管内に設けられたフィラメント線から近赤外線を放射する。２は被処理物３の下方に設けられ、被処理物３の進行方向と平行に配列された単一の部材からなる遠赤外線放射源としての遠赤外線放射プレートであり、この遠赤外線放射プレート２は、近赤外線ヒータ１から放射された近赤外線を吸収して遠赤外線を上方に輻射する波長変換部材である。３は、例えば、自動車の後部窓ガラス等に用いられる、素ガラス部３１と素ガラス部３１の周縁部に黒色塗料が塗布された塗布部３２とからなる分光吸収波長特性の異なる被処理物（ワーク）であり、この被処理物３はチェーンコンベア４上を図示左から右方向に移動する間に加熱処理される。４は被処理物３を搬送するチェーンコンベア、５は近赤外線ヒータ１から放射される近赤外線を反射するために設けられたミラーである。
【００１７】
ここで、黒色塗料が塗布された塗布部３２は、例えば、近赤外線の吸収率が９０％、それ以外の素ガラス部３１の吸収率は１０％（透過率９０％）であり、黒色塗料の材質としては、例えば、Ａｌ２Ｏ３＋ＳｉＯ２＋ＭｇＯの混合物が用いられる。
【００１８】
また、遠赤外線放射プレート２は、例えば、石英ガラス（板厚２ｍｍ）の表面に黒色のセラミック塗料を塗布したものが用いられる。
【００１９】
上述のごとく、本実施形態の加熱装置によれば、被処理物３の上方に近赤外線ヒータ１を配置し、下方に遠赤外線の放射率の優れた遠赤外線放射プレート２を配置した。そのため、被処理物３の塗布部３２は上方から照射される近赤外線により昇温し、素ガラス部３１は近赤外線の大半を吸収せず、透過した光が被処理物３の下方にある遠赤外線放射プレート２を加熱する。遠赤外線放射プレート２は加熱されると温度上昇し、遠赤外線の放射や熱対流を生じ、被処理物３全体を加熱する。
【００２０】
ここで、近赤外線は近赤外線ヒータ１の管球内のフィラメントから放射されるため、対流による熱損失は少なく、また、遠赤外線放射プレート２から発生する対流熱は上昇するため、被処理物３の昇温に寄与し、加熱効率を向上させる。
また、塗布部３２以外の素ガラス部３１は、下方からの遠赤外線放射により、ある程度温度上昇されるため、温度差による変形や破損の発生を抑制することができる。
【００２１】
さらに、本実施形態の加熱装置によれば、被処理物３の昇温させたい部分と昇温させたくない部分との温度差を最大限に抑えることができるので、加熱後の冷却時間を短縮でき、生産タクトを向上させることができる。
【００２２】
図３は、従来例に係る加熱装置と本発明の実施例に係る加熱装置とを用いて被処理物を加熱処理した結果を示す表である。
ここで、各加熱装置における加熱処理は、消費電力８０ｋＷ、加熱時間３０秒の条件下で行った。
【００２３】
従来例１は、図２に示すような被処理物３の上方から近赤外線ヒータのみを照射した場合の加熱結果を示すものであり、近赤外線が照射されると黒色の塗布部３２は昇温が大きく、３０秒の加熱で１８０℃にまで到達した。しかしこのとき素ガラス部３１は約８０℃までしか昇温せず、界面にてガラスの割れが発生した。
【００２４】
従来例２は、図２に示すような被処理物３の上方から遠赤外線ヒータのみを照射した場合の加熱結果を示すものであり、この場合は、消費電力８０ｋＷ、加熱時間３０秒では、塗布部３２の温度は１２０℃にまでしか上昇せず、塗布部３２の乾燥が不十分であった。
【００２５】
従来例３は、図９に示すような従来技術に係る加熱装置を用いて、被処理物１３の上方から近赤外線ヒータ１１による照射に続き、被処理物１３の上方から遠赤外線ヒータ１２による照射を行った場合の加熱結果を示すものであり、この場合は、消費電力８０ｋＷ、加熱時間３０秒では、塗布部１３２の温度は１６０℃にまでしか昇温せず、塗布部１３２の乾燥が不十分であった。
【００２６】
本発明の実施例は、図１に示す加熱装置を用いて、被処理物３の上方から近赤外線ヒータ１による照射を行い、被処理物３の下方からは、被処理物３の下方に配置された遠赤外線放射プレート２による照射を行った場合の加熱結果を示すものであり、この場合は、被処理物３の上面からの近赤外線により、遠赤外線放射プレート２の表面が約５０℃にまで加熱され、遠赤外線および熱対流を発生させた。消費電力８０ｋＷ、加熱時間３０秒では、被処理物２の塗布部３２の温度は１８０℃になり、塗布部３２は十分乾燥し、このとき素ガラス部３１の温度は約１２０℃まで昇温され、塗布部３２との温度差が少なかった。
【００２７】
このように、図３の対比結果に示すように、本発明の実施例の加熱装置によれば、従来例１〜従来例３の加熱装置と比べて、被処理物面内での温度差を抑えることができ、変形や割れを防止でき、また昇温させたくない部分の温度を極力抑えることができるので、後工程での冷却時間の短縮が図られ、生産タクトを向上させることができる。
【００２８】
なお、本発明の加熱装置においては、被処理物３として、透明ガラスの周辺部のみに黒色塗料が塗布されたものを用いたが、この他にも、看板等に使用されるアクリル透明樹脂と黒色塗料との組み合わせや、ＬＣＤやＰＤＰといった各種フラットパネルのガラス基板用のガラスと有機膜や金属膜の組み合わせからなるものを用いても、本発明の加熱装置の適用は可能である。
【００２９】
また、本発明の加熱装置において、遠赤外線放射源として遠赤外線放射プレート２を用いたが、遠赤外線放射プレート２に代えて、図４に示すように遠赤外線ヒータ（ランプヒータ）６や、図５に示すようにセラミックヒータ７を用いてもよい。
遠赤外線ヒータ（ランプヒータ）６やセラミックヒータ７を用いた場合は、これら自らが発熱して遠赤外線を放射するとともに、図示されていない近赤外線ヒータ１から放射された近赤外線を吸収して遠赤外線を輻射する機能も有するので、自らの発熱によってのみ遠赤外線を放射させる場合に比べて、電力消費を軽減することができる。
【００３０】
次に、本発明の第２の実施形態を図６乃至図８を用いて説明する。
図６は本実施形態の発明に係る加熱装置の正面断面図、図７は近赤外線波長に対するアクリル板の分光透過率の特性を示す図、図８は図６に示した被処理物８における近赤外線吸収を説明するための模式図である。
これら図において、８は単一の所定の厚さを有する透明なアクリル板等からなる被処理物（ワーク）である。なお、その他の構成は図１に示す同符号の構成に対応するので説明を省略する。
【００３１】
通常、近赤外線を透過し遠赤外線を吸収するような被処理物を加熱する場合、一般的には遠赤外線ヒータが使用されることが多い。しかし、遠赤外線を照射した場合は、遠赤外線は被処理物の表面で多くが吸収され、その後伝導によって厚み方向に熱が伝達される。従って、一定以上の厚みを有する被処理物を加熱した場合、表面（ヒータ側）と裏面（非ヒータ側）との温度差が大きくなり、加熱ムラや被処理物の反り返り等の不具合が発生し易い。
【００３２】
それに対して、このような被処理物を近赤外線で照射する場合、近赤外線は図７の特性に示すように、被処理物（アクリル板）の厚さに応じて分光透過率が異なる。即ち、被処理物（アクリル板）の厚みが厚くなる程近赤外線は透過しにくくなるので、図８にも示すように、近赤外線は被処理物８の厚み方向に進行するにつれて徐々に吸収されていく。そのため、被処理物８を内部から加熱することができ、表面と裏面の温度差を小さくすることができる。
また被処理物８を透過した近赤外線は遠赤外線放射プレート２にて吸収され、遠赤外線放射プレート２の温度を上昇させることによって被処理物８に遠赤外線を照射させることができる。
【００３３】
この時、遠赤外線放射プレート２から放射された遠赤外線は、主に被処理物８の裏面で吸収されることになるが、実際には、近赤外線によって被処理物８の内部から加熱できるとはいうものの、近赤外線ヒータ１からもある程度の遠赤外線が放射されているため、表面（近赤外線ヒータ側）の方が温度が高くなる傾向にある。従って、被処理物８の裏面側で遠赤外線放射プレート２からの遠赤外線を吸収したとしても表面と裏面の温度差に影響を及ぼすこともなく、被処理物の加熱効率を向上させることができる。
【００３４】
なお、遠赤外線放射プレート２の代わりに、近赤外線を反射する反射板を用いることも考えられるが、反射板で反射した近赤外線は再度被処理物８を照射し、最終的にミラー５と反射板とを反復しながら被処理物８を加熱することになる。しかし、反射を繰り返す近赤外線は、ミラー５や近赤外線ヒータ１のバルブの温度を上昇させてしまい、ミラー５の酸化、変形や、近赤外線ヒータ１の短寿命化の原因となってしまうおそれがある。また、これらを回避しようとして強制冷却機構を設けると、装置の大型化やコストアップを招き、得策とはいえない。
【００３５】
【発明の効果】
請求項１に記載の発明によれば、近赤外線放射源から放射される近赤外線は一般に対流による熱損失は少なく、また遠赤外線放射源から発生する対流熱は上昇するため、被処理物の昇温に寄与し、加熱効率をアップすることができる。また分光吸収波長特性の異なる被処理物を加熱する場合には、エネルギー損を少なくし、被処理物の昇温が必要な部分とそれ以外の部分との温度差を大きくしないようにして、変形や破損を生じないようにすることができる。また遠赤外線放射源は、近赤外線放射源から放射された近赤外線によって遠赤外線を放射する遠赤外線放射プレートから構成されているので、簡便な構成で遠赤外線放射源を実現することができる。
請求項２に記載の発明によれば、近赤外線放射源から放射される近赤外線は一般に対流による熱損失は少なく、また遠赤外線放射源から発生する対流熱は上昇するため、被処理物の昇温に寄与し、加熱効率をアップすることができる。また分光吸収波長特性の異なる被処理物を加熱する場合には、エネルギー損を少なくし、被処理物の昇温が必要な部分とそれ以外の部分との温度差を大きくしないようにして、変形や破損を生じないようにすることができる。また遠赤外線放射源は、自ら発熱することによって遠赤外線を放射すると共に、近赤外線放射源から放射された近赤外線によって遠赤外線を放射する遠赤外線ヒータから構成されているので、簡便な構成で所望の強さを有する遠赤外線を放射する遠赤外線放射源を容易に実現することができる。
請求項３に記載の発明によれば、近赤外線放射源から放射される近赤外線は一般に対流による熱損失は少なく、また遠赤外線放射源から発生する対流熱は上昇するため、被処理物の昇温に寄与し、加熱効率をアップすることができる。また所定の厚さを有する単一の透明なアクリル板等からなる被処理物を加熱する場合には、近赤外線は被処理物の厚み方向に進行するにつれて徐々に吸収されていくため、被処理物を内部から加熱することができ、表面と裏面の温度差を小さくすることができる。また遠赤外線放射源は、近赤外線放射源から放射された近赤外線によって遠赤外線を放射する遠赤外線放射プレートから構成されているので、簡便な構成で遠赤外線放射源を実現することができる。
請求項４に記載の発明によれば、近赤外線放射源から放射される近赤外線は一般に対流による熱損失は少なく、また遠赤外線放射源から発生する対流熱は上昇するため、被処理物の昇温に寄与し、加熱効率をアップすることができる。また所定の厚さを有する単一の透明なアクリル板等からなる被処理物を加熱する場合には、近赤外線は被処理物の厚み方向に進行するにつれて徐々に吸収されていくため、被処理物を内部から加熱することができ、表面と裏面の温度差を小さくすることができる。また遠赤外線放射源は、自ら発熱することによって遠赤外線を放射すると共に、近赤外線放射源から放射された近赤外線によって遠赤外線を放射する遠赤外線ヒータから構成されているので、簡便な構成で所望の強さを有する遠赤外線を放射する遠赤外線放射源を容易に実現することができる。
【図面の簡単な説明】
【図１】第１の実施形態の発明に係る加熱装置の正面断面図である。
【図２】図１に示した被処理物３の平面図である。
【図３】 従来例に係る加熱装置と本発明の実施例に係る加熱装置とを用いて被処理物を加熱処理した結果を示す表である。
【図４】図１に示した加熱装置の遠赤外線放射プレート２に代えて遠赤外線ヒータ（ランプヒータ）６を用いた加熱装置を示す図である。
【図５】図１に示した加熱装置の遠赤外線放射プレート２に代えてセラミックヒータ７を用いた加熱装置を示す図である。
【図６】第２の実施形態の発明に係る加熱装置の正面断面図である。
【図７】近赤外線波長に対するアクリル板の分光透過率の特性を示す図である。
【図８】図６に示した被処理物８における近赤外線吸収を説明するための模式図である。
【図９】従来技術に係る加熱装置の正面断面図である。
【符号の説明】
１ 近赤外線ヒータ
２ 遠赤外線放射プレート
３ 被処理物（ワーク）
３１ 素ガラス部
３２ 塗布部
４ チェーンコンベア
５ ミラー
６ 遠赤外線ヒータ（ランプヒータ）
７ セラミックヒータ
８ 単一の透明なアクリル板等からなる被処理物（ワーク）[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a heating apparatus that heats an object (workpiece) by combining a near-infrared radiation source and a far-infrared radiation source.
[0002]
[Prior art]
Conventionally, when heating an object to be processed with different spectral absorption wavelength characteristics, such as partially coated glass, generally the conduction method or convection method is less affected by the spectral absorption wavelength characteristics. A heated source such as a hot air circulating furnace or an atmospheric furnace is used.
As a heating source mainly using a radiation method, a far-infrared heater (such as a ceramic heater or a sheathed heater) that can be stably heated with a relatively small difference in influence on the spectral absorption wavelength characteristics of the workpiece is often used. .
[0003]
Here, infrared rays are a kind of electromagnetic waves having a wavelength range of 0.75 μm to 1000 μm, and normally 0.75 μm to 3 μm are near infrared rays, and 3 μm to 1000 μm are far infrared rays. .
[0004]
Next, a case will be described in which a near-infrared heater or a far-infrared heater is used to elevate the temperature of only the application part (coating part) of the object to be processed in which a black ceramic paint is applied to raw glass, for example.
[0005]
First, when an attempt is made to perform heat treatment using only a near-infrared heater, the temperature of the coating part is intensively increased, and thus a temperature difference occurs between the coating part and the raw glass part. For this reason, a crack is generated in the raw glass portion starting from the vicinity of the boundary between the raw glass portion and the coating portion.
[0006]
Moreover, when it is going to heat-process only using a far-infrared heater, the temperature of a raw glass part will rise, but the temperature rise of an application part will become inadequate and the problem that it cannot fully dry will arise.
[0007]
Moreover, as a heating device combining a near-infrared heater and a far-infrared heater, as described in Japanese Patent Laid-Open No. 10-189220, a near-infrared heater and a far-infrared heater are sequentially arranged in the conveying direction of the workpiece. Those arranged side by side are known.
[0008]
As shown in FIG. 9, the heating device has a plurality of near-infrared heaters 11 and a plurality of far-infrared heaters 12 arranged in parallel with the traveling direction of the workpiece 13. Here, the near-infrared heater 11 is provided with a filament wire in the translucent glass tube, and heats the workpiece 13 using near-infrared radiation radiated from the filament wire. Further, the far-infrared heater 12 is made of a glass tube enclosing a filament wire and coated with ceramics or a sheathed wire. The far-infrared heater 12 is covered with far-infrared rays radiated from the outer tube surface of the far-infrared heater 12. The processed product 13 is heated. The workpiece 13 is transported on the chain conveyor 14, and is first heated by the near infrared heater 11 and then heated by the far infrared heater 2.
[0009]
[Patent Document 1]
Japanese Patent Laid-Open No. 10-189220
[Problems to be solved by the invention]
However, in the heating apparatus as shown in FIG. 9, since the heat source that radiates far infrared rays is exposed to the atmosphere, it is easily affected by convection due to the atmosphere around the far infrared heater 12, and heat loss due to convection is reduced. It will occur. Therefore, if the workpiece 13 is present below the far-infrared heater 2, the heat loss due to the upward escape of heat, that is, the energy loss increases. Moreover, near infrared rays that have passed through the workpiece 13 become stray light, leading to an increase in temperature in the furnace and energy loss.
[0011]
In view of the above problems, the object of the present invention is to effectively heat a workpiece by a near infrared radiation source when heating a transparent workpiece having a single predetermined thickness. , Improve the heating efficiency of the far-infrared radiation source, and when heating the object to be processed with different spectral absorption wavelength characteristics, reduce the energy loss and other parts that need to be heated It is an object of the present invention to provide a heating device that does not cause deformation or breakage without increasing the temperature difference from this part.
[0012]
[Means for Solving the Problems]
The present invention employs the following means in order to solve the above problems.
The first means is a heating apparatus that heats the object to be processed by the near infrared ray emitted from the near infrared radiation source and the far infrared ray emitted from the far infrared radiation source, wherein the object to be treated has different spectral absorption wavelength characteristics. A near-infrared radiation source disposed on the workpiece, the far-infrared radiation source comprising a far-infrared radiation plate and disposed under the workpiece. The near infrared ray irradiated from the near infrared radiation source and absorbed by the object to be processed heats the object to be processed, and the near infrared ray transmitted through the object to be processed is irradiated to the far infrared radiation plate to obtain a far infrared ray. And the object to be processed is heated .
The second means is a heating apparatus that heats the object to be processed by the near infrared ray emitted from the near infrared radiation source and the far infrared ray emitted from the far infrared radiation source, wherein the object to be treated has different spectral absorption wavelength characteristics. A near-infrared radiation source disposed on the workpiece, the far-infrared radiation source comprising a far-infrared heater and disposed under the workpiece; The near infrared ray irradiated from the near infrared radiation source and absorbed by the object to be processed heats the object to be processed, and the near infrared ray transmitted through the object to be processed is irradiated to the far infrared heater and radiates far infrared rays. In addition, the far-infrared heater generates heat by itself and emits far-infrared rays to heat the object to be processed.
The third means is a heating apparatus that heats the object to be processed by the near infrared ray emitted from the near infrared radiation source and the far infrared ray emitted from the far infrared radiation source. An object to be processed having different transmittances, wherein the near-infrared radiation source is disposed on the object to be treated, and the far-infrared radiation source is constituted by a far-infrared radiation plate and disposed below the object to be treated. The near-infrared radiation irradiated from the near-infrared radiation source and absorbed by the object to be processed heats the object to be processed, and the near-infrared light transmitted through the object to be processed is irradiated to the far-infrared radiation plate and travels far away. The object to be processed is heated by emitting infrared rays.
The fourth means is a heating device that heats the object to be processed by the near infrared ray emitted from the near infrared radiation source and the far infrared ray emitted from the far infrared radiation source. An object to be processed having different transmittances, wherein the near-infrared radiation source is disposed on the object to be treated, and the far-infrared radiation source includes a far-infrared heater and is disposed below the object to be treated. The near infrared ray irradiated from the near infrared radiation source and absorbed by the object to be processed heats the object to be processed, and the near infrared ray that has passed through the object to be processed is irradiated to the far infrared heater to generate the far infrared ray. The far-infrared heater generates heat and emits far-infrared radiation to heat the object to be processed.
[0015]
DETAILED DESCRIPTION OF THE INVENTION
A first embodiment of the present invention will be described with reference to FIGS.
FIG. 1 is a front sectional view of a heating device according to the invention of this embodiment, and FIG. 2 is a plan view of the workpiece 3 shown in FIG.
[0016]
In these figures, reference numeral 1 denotes a near-infrared heater as a plurality of near-infrared radiation sources provided above the workpiece 3 and arranged in parallel with the traveling direction of the workpiece 3. 1 emits near infrared rays from a filament wire provided in a translucent glass tube. Reference numeral 2 denotes a far-infrared radiation plate as a far-infrared radiation source provided as a far-infrared radiation source, which is provided below the workpiece 3 and is arranged in parallel with the traveling direction of the workpiece 3. Is a wavelength conversion member that absorbs near infrared rays emitted from the near infrared heater 1 and radiates far infrared rays upward. 3 is an object to be processed having different spectral absorption wavelength characteristics (e.g., composed of a
[0017]
Here, the
[0018]
The far-infrared radiation plate 2 is, for example, a quartz glass (plate thickness 2 mm) surface coated with a black ceramic paint.
[0019]
As described above, according to the heating apparatus of the present embodiment, the near infrared heater 1 is disposed above the workpiece 3 and the far infrared radiation plate 2 having excellent far infrared emissivity is disposed below. Therefore, the
[0020]
Here, since near infrared rays are radiated from the filament in the tube of the near infrared heater 1, heat loss due to convection is small, and convection heat generated from the far infrared radiation plate 2 rises, so that the workpiece 3 is processed. It contributes to the temperature rise of and improves the heating efficiency.
Moreover, since the
[0021]
Furthermore, according to the heating apparatus of the present embodiment, the temperature difference between the portion of the workpiece 3 that is to be heated and the portion that is not desired to be heated can be suppressed to the maximum, so that the cooling time after heating is shortened. And production tact can be improved.
[0022]
FIG. 3 is a table showing the results of heat treatment of an object to be processed using the heating device according to the conventional example and the heating device according to the example of the present invention.
Here, the heat treatment in each heating apparatus was performed under the conditions of power consumption of 80 kW and heating time of 30 seconds.
[0023]
Conventional example 1 shows the heating result when only the near infrared heater is irradiated from above the workpiece 3 as shown in FIG. 2, and when the near infrared ray is irradiated, the
[0024]
Conventional example 2 shows the heating result when only the far-infrared heater is irradiated from above the workpiece 3 as shown in FIG. 2, and in this case, when the power consumption is 80 kW and the heating time is 30 seconds, the coating is performed. The temperature of the
[0025]
Conventional Example 3 uses a heating device according to the prior art as shown in FIG. 9 to irradiate from the upper side of the workpiece 13 with the near-infrared heater 11 and then irradiate the workpiece 13 with the far-infrared heater 12 from above. In this case, when the power consumption is 80 kW and the heating time is 30 seconds, the temperature of the application unit 132 is raised only to 160 ° C., and the application unit 132 is not dried. It was enough.
[0026]
In the embodiment of the present invention, irradiation with the near-infrared heater 1 is performed from above the workpiece 3 using the heating apparatus shown in FIG. 1, and the workpiece 3 is disposed below the workpiece 3 from below. The result of heating when irradiation is performed with the far-infrared radiation plate 2 is shown. In this case, the surface of the far-infrared radiation plate 2 is brought to about 50 ° C. by the near-infrared radiation from the upper surface of the workpiece 3. To generate far infrared and thermal convection. When the power consumption is 80 kW and the heating time is 30 seconds, the temperature of the
[0027]
Thus, as shown in the comparison result of FIG. 3, according to the heating device of the embodiment of the present invention, the temperature difference in the surface of the object to be processed is compared with the heating devices of Conventional Example 1 to Conventional Example 3. Since it can be suppressed, deformation and cracking can be prevented, and the temperature of the portion where the temperature is not desired to be raised can be suppressed as much as possible, the cooling time in the subsequent process can be shortened and the production tact can be improved.
[0028]
In addition, in the heating apparatus of the present invention, the object to be processed 3 is one in which a black paint is applied only to the peripheral portion of the transparent glass, but in addition, an acrylic transparent resin used for a signboard or the like The heating apparatus of the present invention can be applied even when a combination of black paint or a combination of glass for various flat panel glass substrates such as LCD and PDP and an organic film or a metal film is used.
[0029]
Further, in the heating device of the present invention, the far infrared radiation plate 2 is used as the far infrared radiation source. However, instead of the far infrared radiation plate 2, as shown in FIG. As shown in FIG. 5, a ceramic heater 7 may be used.
When the far-infrared heater (lamp heater) 6 or the ceramic heater 7 is used, these themselves generate heat to emit far-infrared rays, and absorb the near-infrared rays emitted from the near-infrared heater 1 (not shown). Since it also has a function of radiating infrared rays, power consumption can be reduced compared to the case of emitting far infrared rays only by its own heat generation.
[0030]
Next, a second embodiment of the present invention will be described with reference to FIGS.
FIG. 6 is a front sectional view of the heating apparatus according to the invention of this embodiment, FIG. 7 is a diagram showing the spectral transmittance characteristics of the acrylic plate with respect to the near-infrared wavelength, and FIG. 8 is a near view of the workpiece 8 shown in FIG. It is a schematic diagram for demonstrating infrared absorption.
In these drawings, reference numeral 8 denotes an object to be processed (work) made of a transparent acrylic plate or the like having a single predetermined thickness. Other configurations correspond to the same reference numerals shown in FIG.
[0031]
Usually, when heating an object that transmits near infrared rays and absorbs far infrared rays, a far infrared heater is generally used in many cases. However, when far-infrared rays are irradiated, much of the far-infrared rays are absorbed on the surface of the object to be processed, and then heat is transferred in the thickness direction by conduction. Therefore, when a workpiece having a certain thickness or more is heated, the temperature difference between the front surface (heater side) and the back surface (non-heater side) increases, causing problems such as uneven heating and warping of the workpiece. easy.
[0032]
On the other hand, when such an object to be processed is irradiated with near infrared rays, as shown in the characteristics of FIG. 7, near infrared rays have different spectral transmittances depending on the thickness of the object to be processed (acrylic plate). That is, as the thickness of the object to be processed (acrylic plate) increases, near-infrared light is less likely to be transmitted. Therefore, as shown in FIG. 8, the near-infrared light is gradually absorbed as it proceeds in the thickness direction of the object to be processed 8. To go. Therefore, the workpiece 8 can be heated from the inside, and the temperature difference between the front surface and the back surface can be reduced.
Further, the near-infrared ray that has passed through the workpiece 8 is absorbed by the far-infrared radiation plate 2, and the far-infrared radiation can be irradiated to the workpiece 8 by raising the temperature of the far-infrared radiation plate 2.
[0033]
At this time, the far infrared rays emitted from the far-infrared radiation plate 2 are mainly absorbed by the back surface of the object 8 to be processed, but actually, if the near infrared rays can be heated from the inside of the object 8 to be processed. Nevertheless, since a certain amount of far-infrared rays are emitted from the near-infrared heater 1, the surface (near-infrared heater side) tends to have a higher temperature. Therefore, even if far-infrared rays from the far-infrared radiation plate 2 are absorbed on the back surface side of the workpiece 8, the heating efficiency of the workpiece can be improved without affecting the temperature difference between the front surface and the back surface. .
[0034]
Although it is conceivable to use a reflecting plate that reflects near infrared rays instead of the far infrared radiation plate 2, the near infrared rays reflected by the reflecting plate again irradiate the object 8 to be processed, and finally reflect with the
[0035]
【The invention's effect】
According to the invention described in claim 1, near infrared rays emitted from the near-infrared radiation source generally heat loss by convection is small, and because the convective heat generated from the far infrared radiation source is increased, the treatment object temperature Contributes to temperature and can improve heating efficiency. In addition, when heating an object to be processed with different spectral absorption wavelength characteristics, the energy loss is reduced, and the temperature difference between the part requiring the temperature increase of the object to be processed and the other part is not increased. Or damage can be prevented. Moreover, since the far-infrared radiation source is composed of a far-infrared radiation plate that emits far-infrared radiation by the near-infrared radiation emitted from the near-infrared radiation source, the far-infrared radiation source can be realized with a simple configuration.
According to the second aspect of the present invention, the near-infrared radiation emitted from the near-infrared radiation source generally has little heat loss due to convection, and the convection heat generated from the far-infrared radiation source rises. Contributes to temperature and can improve heating efficiency. In addition, when heating an object to be processed with different spectral absorption wavelength characteristics, the energy loss is reduced, and the temperature difference between the part requiring the temperature increase of the object to be processed and the other part is not increased. Or damage can be prevented. The far-infrared radiation source is composed of a far-infrared heater that radiates far-infrared by emitting heat by itself and radiates far-infrared by the near-infrared emitted from the near-infrared radiation source. It is possible to easily realize a far-infrared radiation source that emits far-infrared radiation having the intensity of.
According to the third aspect of the present invention, the near-infrared radiation emitted from the near-infrared radiation source generally has little heat loss due to convection, and the convection heat generated from the far-infrared radiation source rises. Contributes to temperature and can improve heating efficiency. In addition, when heating an object to be processed consisting of a single transparent acrylic plate or the like having a predetermined thickness, near infrared light is gradually absorbed as it proceeds in the thickness direction of the object to be processed. The object can be heated from the inside, and the temperature difference between the front surface and the back surface can be reduced. Moreover, since the far-infrared radiation source is composed of a far-infrared radiation plate that emits far-infrared radiation by the near-infrared radiation emitted from the near-infrared radiation source, the far-infrared radiation source can be realized with a simple configuration.
According to the fourth aspect of the present invention, the near-infrared radiation emitted from the near-infrared radiation source generally has little heat loss due to convection, and the convective heat generated from the far-infrared radiation source rises. Contributes to temperature and can improve heating efficiency. In addition, when heating an object to be processed consisting of a single transparent acrylic plate or the like having a predetermined thickness, near infrared light is gradually absorbed as it proceeds in the thickness direction of the object to be processed. The object can be heated from the inside, and the temperature difference between the front surface and the back surface can be reduced. The far-infrared radiation source is composed of a far-infrared heater that radiates far-infrared by emitting heat by itself and radiates far-infrared by the near-infrared emitted from the near-infrared radiation source. It is possible to easily realize a far-infrared radiation source that emits far-infrared radiation having the intensity of.
[Brief description of the drawings]
FIG. 1 is a front sectional view of a heating device according to the invention of a first embodiment.
FIG. 2 is a plan view of the workpiece 3 shown in FIG.
FIG. 3 is a table showing a result of heat-treating an object to be processed using a heating device according to a conventional example and a heating device according to an example of the present invention.
4 is a view showing a heating device using a far infrared heater (lamp heater) 6 in place of the far infrared radiation plate 2 of the heating device shown in FIG. 1;
5 is a view showing a heating device using a ceramic heater 7 instead of the far-infrared radiation plate 2 of the heating device shown in FIG. 1. FIG.
FIG. 6 is a front sectional view of a heating device according to the invention of the second embodiment.
FIG. 7 is a diagram showing the spectral transmittance characteristics of an acrylic plate with respect to near infrared wavelengths.
8 is a schematic diagram for explaining near-infrared absorption in the workpiece 8 shown in FIG. 6. FIG.
FIG. 9 is a front sectional view of a heating device according to the prior art.
[Explanation of symbols]
1 Near-infrared heater 2 Far-infrared radiation plate 3 Object to be processed (workpiece)
31
7 Ceramic heater 8 Object to be processed (work) made of a single transparent acrylic plate
Claims (4)
前記被処理物は分光吸収波長特性の異なる領域を有する被処理物であって、前記近赤外線放射源は前記被処理物の上に配置され、前記遠赤外線放射源は遠赤外線放射プレートから構成されると共に前記被処理物の下に配置され、前記近赤外線放射源から照射され、前記被処理物に吸収された近赤外線は前記被処理物を加熱し、前記被処理物を透過した近赤外線は前記遠赤外線放射プレートに照射されて遠赤外線を放射して前記被処理物を加熱することを特徴とする加熱装置。In a heating apparatus for heating an object to be processed by a near infrared ray emitted from a near infrared ray source and a far infrared ray emitted from a far infrared ray source,
The object to be processed has a region having different spectral absorption wavelength characteristics, the near-infrared radiation source is disposed on the object to be processed, and the far-infrared radiation source is composed of a far-infrared radiation plate. And the near infrared ray disposed under the object to be processed, irradiated from the near infrared radiation source and absorbed by the object to be processed heats the object to be processed, and the near infrared light transmitted through the object to be processed is A heating apparatus that heats the object to be processed by irradiating the far-infrared radiation plate to emit far-infrared radiation .
前記被処理物は分光吸収波長特性の異なる領域を有する被処理物であって、前記近赤外線放射源は前記被処理物の上に配置され、前記遠赤外線放射源は遠赤外線ヒータから構成されると共に前記被処理物の下に配置され、前記近赤外線放射源から照射され、前記被処理物に吸収された近赤外線は前記被処理物を加熱し、前記被処理物を透過した近赤外線は前記遠赤外線ヒータに照射されて遠赤外線を放射すると共に前記遠赤外線ヒータは自ら発熱して遠赤外線を放射して前記被処理物を加熱することを特徴とする加熱装置。 The object to be processed has a region having different spectral absorption wavelength characteristics, the near infrared radiation source is disposed on the object to be processed, and the far infrared radiation source is constituted by a far infrared heater. The near-infrared rays disposed under the object to be processed, irradiated from the near-infrared radiation source and absorbed by the object to be processed heat the object to be processed, and the near-infrared light transmitted through the object to be processed is the A heating apparatus, wherein the far-infrared heater emits far-infrared radiation, and the far-infrared heater generates heat and emits far-infrared radiation to heat the object to be processed.
前記被処理物は厚さに応じて分光透過率の異なる被処理物であって、前記近赤外線放射源は前記被処理物の上に配置され、前記遠赤外線放射源は遠赤外線放射プレートから構成されると共に前記被処理物の下に配置され、前記近赤外線放射源から照射され、前記被処理物に吸収された近赤外線は前記被処理物を加熱し、前記被処理物を透過した近赤外線は前記遠赤外線放射プレートに照射されて遠赤外線を放射して前記被処理物を加熱することを特徴とする加熱装置。 The object to be processed is an object to be processed having different spectral transmittances according to thickness, the near-infrared radiation source is disposed on the object to be processed, and the far-infrared radiation source is composed of a far-infrared radiation plate. The near-infrared light that is disposed under the object to be processed, irradiated from the near-infrared radiation source, and absorbed by the object to be processed heats the object to be processed, and passes through the object to be processed. Irradiates the far-infrared radiation plate and emits far-infrared radiation to heat the object to be processed.
前記被処理物は厚さに応じて分光透過率の異なる被処理物であって、前記近赤外線放射源は前記被処理物の上に配置され、前記遠赤外線放射源は遠赤外線ヒータから構成されると共に前記被処理物の下に配置され、前記近赤外線放射源から照射され、前記被処理物に吸収された近赤外線は前記被処理物を加熱し、前記被処理物を透過した近赤外線は前記遠赤外線ヒータに照射されて遠赤外線を放射すると共に前記遠赤外線ヒータは自ら発熱して遠赤外線を放射して前記被処理物を加熱することを特徴とする加熱装置。 The object to be processed is an object to be processed whose spectral transmittance varies depending on the thickness, the near infrared radiation source is disposed on the object to be processed, and the far infrared radiation source is constituted by a far infrared heater. And the near infrared ray disposed under the object to be processed, irradiated from the near infrared radiation source and absorbed by the object to be processed heats the object to be processed, and the near infrared light transmitted through the object to be processed is A heating apparatus, wherein the far-infrared heater emits far-infrared radiation, and the far-infrared heater generates heat and emits far-infrared radiation to heat the object to be processed.
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| JP2007261869A (en) * | 2006-03-28 | 2007-10-11 | Brother Ind Ltd | Method for forming ceramic film and annealing apparatus |
| JP2009192141A (en) * | 2008-02-14 | 2009-08-27 | Hitachi Plant Technologies Ltd | Continuous heating device |
| US20090308860A1 (en) * | 2008-06-11 | 2009-12-17 | Applied Materials, Inc. | Short thermal profile oven useful for screen printing |
| JP5600885B2 (en) * | 2009-03-19 | 2014-10-08 | 凸版印刷株式会社 | Organic EL drying equipment |
| JP5797413B2 (en) * | 2011-01-25 | 2015-10-21 | 光洋サーモシステム株式会社 | Heater unit and heat treatment apparatus |
| JP6076631B2 (en) * | 2012-07-12 | 2017-02-08 | 光洋サーモシステム株式会社 | Heater unit and heat treatment apparatus |
| JP5760060B2 (en) * | 2013-09-27 | 2015-08-05 | 株式会社茨城技研 | Metal film forming method, metal film forming product manufacturing method and manufacturing apparatus |
| CN113446846A (en) * | 2021-07-22 | 2021-09-28 | 深圳市鸿富诚屏蔽材料有限公司 | High-efficient tunnel furnace |
| CN113645719A (en) * | 2021-08-16 | 2021-11-12 | 攀钢集团攀枝花钢钒有限公司 | Cold-rolled strip steel passivation near-infrared heater lamp tube arrangement structure |
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