JP3989132B2 - 遠紫外線露光用ポジ型フォトレジスト組成物 - Google Patents
遠紫外線露光用ポジ型フォトレジスト組成物 Download PDFInfo
- Publication number
- JP3989132B2 JP3989132B2 JP15869399A JP15869399A JP3989132B2 JP 3989132 B2 JP3989132 B2 JP 3989132B2 JP 15869399 A JP15869399 A JP 15869399A JP 15869399 A JP15869399 A JP 15869399A JP 3989132 B2 JP3989132 B2 JP 3989132B2
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- Prior art keywords
- group
- alkyl group
- hydrogen atom
- carbon atoms
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 0 CC(CC1)C(C2)(CC3)C1C(C)(C)C2C3(C)OC(C(*)=C)=O Chemical compound CC(CC1)C(C2)(CC3)C1C(C)(C)C2C3(C)OC(C(*)=C)=O 0.000 description 3
- NYRVOCHASGYGEQ-UHFFFAOYSA-N CC(C)(C)O[NH+](C)[O-] Chemical compound CC(C)(C)O[NH+](C)[O-] NYRVOCHASGYGEQ-UHFFFAOYSA-N 0.000 description 1
- NECCIWSOMGMZPL-AATRIKPKSA-N CC(C)([NH+](C)[O-])O/C=C/C Chemical compound CC(C)([NH+](C)[O-])O/C=C/C NECCIWSOMGMZPL-AATRIKPKSA-N 0.000 description 1
- AUQACKSTMTWLBU-UHFFFAOYSA-N CC(CC1)C(C2)(CC3)C1C(C)(C)C2C3(C)OC(C=C)=O Chemical compound CC(CC1)C(C2)(CC3)C1C(C)(C)C2C3(C)OC(C=C)=O AUQACKSTMTWLBU-UHFFFAOYSA-N 0.000 description 1
- IQWTXUFGOKMOCF-UHFFFAOYSA-N CC(OC1C2CC(C3)CC1CC3C2)OC(C=C)=O Chemical compound CC(OC1C2CC(C3)CC1CC3C2)OC(C=C)=O IQWTXUFGOKMOCF-UHFFFAOYSA-N 0.000 description 1
- UXZAIOMWHMGKAQ-UHFFFAOYSA-N CCC(OC(C)OC1(CC(C2)C3)CC3CC2C1)=O Chemical compound CCC(OC(C)OC1(CC(C2)C3)CC3CC2C1)=O UXZAIOMWHMGKAQ-UHFFFAOYSA-N 0.000 description 1
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- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15869399A JP3989132B2 (ja) | 1999-06-04 | 1999-06-04 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| US09/577,884 US6479211B1 (en) | 1999-05-26 | 2000-05-25 | Positive photoresist composition for far ultraviolet exposure |
| KR1020000028523A KR100684155B1 (ko) | 1999-05-26 | 2000-05-26 | 원자외선 노광용 포지티브 포토레지스트 조성물 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15869399A JP3989132B2 (ja) | 1999-06-04 | 1999-06-04 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000347408A JP2000347408A (ja) | 2000-12-15 |
| JP2000347408A5 JP2000347408A5 (enrdf_load_stackoverflow) | 2005-07-07 |
| JP3989132B2 true JP3989132B2 (ja) | 2007-10-10 |
Family
ID=15677302
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15869399A Expired - Fee Related JP3989132B2 (ja) | 1999-05-26 | 1999-06-04 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3989132B2 (enrdf_load_stackoverflow) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4277420B2 (ja) * | 1999-10-18 | 2009-06-10 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物 |
| JP2001215704A (ja) * | 2000-01-31 | 2001-08-10 | Sumitomo Chem Co Ltd | 化学増幅型ポジ型レジスト組成物 |
| JP3945741B2 (ja) * | 2000-12-04 | 2007-07-18 | 東京応化工業株式会社 | ポジ型レジスト組成物 |
| JP2002193895A (ja) * | 2000-12-27 | 2002-07-10 | Daicel Chem Ind Ltd | 環式骨格を有する３−アクリロイルオキシプロピオン酸エステル誘導体、及びアクリル酸エステル混合物 |
| JP4149153B2 (ja) * | 2001-09-28 | 2008-09-10 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| EP2017674A1 (en) * | 2007-07-20 | 2009-01-21 | Fujifilm Corporation | Positive resist composition and pattern forming method |
-
1999
- 1999-06-04 JP JP15869399A patent/JP3989132B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2000347408A (ja) | 2000-12-15 |
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