JP3987222B2 - Substrate heat treatment equipment - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a substrate heat treatment apparatus for performing heat treatment on a substrate (hereinafter referred to as “substrate”) such as a semiconductor wafer, a glass substrate for a liquid crystal display device, a glass substrate for a photomask, and an optical disk substrate.
[0002]
[Prior art]
As a single wafer type substrate heat treatment apparatus, an apparatus (lamp annealing apparatus) that heats a substrate by light irradiation from a plurality of lamps is known. The plurality of lamps are divided into a plurality of zones, and a heating command value for each lamp is given for each zone. Such an apparatus is often used to form a film on a substrate. In that case, it is important to ensure the uniformity of the film thickness. In the conventional apparatus, the thickness of the film obtained by performing the heat treatment on the substrate is measured with a film thickness measuring device, and the heating command value to the lamp is adjusted according to the film thickness measurement result, and the subsequent heat treatment of the substrate is performed. The procedure of improving is adopted.
[0003]
[Problems to be solved by the invention]
However, since the above-described conventional apparatus corrects the heating command value in a subsequent manner, the temperature distribution of the substrate cannot be adjusted in real time. For this reason, not only a lot of work is required until the heating command value is finally determined, but the above procedure must be repeated to reset the heating command value each time the content of the heat treatment changes. This also causes a problem.
[0004]
Further, in such a conventional apparatus, the heating command values for each zone are determined independently of each other, and therefore, mutual interference between zones is not considered, and it is difficult to adjust the temperature distribution of the substrate more precisely. There is a problem that there is.
[0005]
Such a problem is a problem that occurs not only in the film formation process but also in the general heat treatment of the substrate.
[0006]
Accordingly, in view of the above problems, the present invention provides a substrate heat treatment apparatus that can sufficiently ensure the uniformity of heat treatment in a substrate by adjusting the temperature distribution of the substrate more precisely and in real time. Objective.
[0007]
[Means for Solving the Problems]
  In order to achieve the above object, a substrate processing apparatus according to claim 1 is an apparatus for performing heat treatment of a substrate, and heating means for heating the substrate by a plurality of lamps arranged in a plurality of zones. A plurality of temperature measuring means for measuring temperatures at a plurality of representative measurement points on the substrate corresponding to each of the plurality of zones, and a heating command value for at least some of the plurality of lampsRawHeating command value generating meansThe plurality of zones include a main zone and a sub zone, and the plurality of temperature measurement units include a main measurement unit that measures temperatures at representative measurement points on a substrate corresponding to the main zone, and the sub zone. And a secondary measurement unit that measures the temperature at a representative measurement point on the substrate corresponding to the heating command value generation unit, wherein the heating command value generation unit calculates a reference output command value of the main zone based on a measurement result of the main measurement unit Then, a deviation between the measurement result by the main measurement unit and the measurement result by the sub measurement unit is obtained, and the positional relationship between the representative measurement point corresponding to the main zone and each lamp belonging to the sub zone with respect to the deviation. A value obtained by multiplying a coefficient determined accordingly is obtained as a correction value, and the heating command value of each lamp included in the slave zone is determined by combining the reference output command value of the main zone and the correction value. That,It is characterized by that.
[0008]
  The apparatus of claim 2 is the apparatus of claim 1,The coefficient determined according to the positional relationship between the representative measurement point corresponding to the main zone and each lamp belonging to the sub-zone is a representative measurement point corresponding to the main zone and a representative measurement point corresponding to the sub-zone. Is a value determined by interpolating the temperature distribution betweenIt is characterized by that.
[0010]
  Claim3The device according to claim2In the apparatus, the heating command value generating means is provided for each lamp belonging to the main zone and each lamp belonging to the sub zone.CalculationThe main zone according to a ratio of a sum of the heating command values issued and a value corresponding to a product obtained by multiplying a heating command value for each lamp belonging to the main zone by the total number of lamps of the plurality of lamps. Means for correcting the heating command value calculated for each of the lamps belonging to and each of the lamps belonging to the slave zone.
[0011]
  Claim4The device described inAn apparatus for heat-treating a substrate, the heating means for heating the substrate by a plurality of lamps arranged in a plurality of zones, and a plurality of representative measurement points on the substrate corresponding to each of the plurality of zones A plurality of temperature measuring means for measuring the temperature in the heating, and a heating command value generating means for generating a heating command value for at least some of the plurality of lamps,The heating command value generating meansIn each of the plurality of zonesReference output command value for each lampBased on the measurement result of the temperature measuring means corresponding to each of the plurality of zonesA means for calculating, a representative measurement point corresponding to the second zone, and a lamp in the first zone with respect to a deviation between the reference output command values of the first and second zones adjacent to each other;Place ofRelationshipIs decided according toA value obtained by multiplying each coefficient is obtained as a correction value, and a heating command value for each lamp included in the first zone is determined by combining the reference output command value of the first zone and the correction value. And means.
  The apparatus according to claim 5 is the apparatus according to claim 4, wherein each coefficient determined in accordance with a positional relationship between a representative measurement point corresponding to the second zone and each lamp in the first zone is set. The value is determined by interpolating the temperature distribution between the representative measurement point corresponding to the first zone and the representative measurement point corresponding to the second zone.
[0012]
  The device according to claim 6 comprises:An apparatus for performing heat treatment on a substrate, the heating means for heating the substrate by a plurality of lamps arranged in a plurality of zones, and a plurality of representative measurement points on the substrate corresponding to each of the plurality of zones A plurality of temperature measuring means for measuring the temperature in the heating, and a heating command value generating means for generating a heating command value for at least some of the plurality of lamps,The plurality of lamps include specific lamps that are divided so as to belong to M zones (M is an integer equal to or greater than 2), and the heating command value generating means includes the plurality of M lamps. zoneEach ofThe reference output command value for each lamp atBased on the measurement result of the temperature measuring means corresponding to each of the M zones.Means for calculating, representative measurement points corresponding to each of the M zones, and the specific lamp;Place ofMeans for weight-combining the reference output command values in each of the M zones using a weighting coefficient determined according to the positional relationship, thereby determining a heating command value for the specific lamp. It is characterized by.
[0013]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
[0014]
<A. First Embodiment>
<A1. Device>
FIG. 1 is a longitudinal sectional view showing a schematic configuration of a substrate heat treatment apparatus 1 according to the present embodiment. The substrate heat treatment apparatus 1 is a lamp annealing apparatus for a substrate W such as a semiconductor wafer, and can be used for RTP (Rapid Thermal Processing) that raises and lowers the temperature of the substrate at high speed. The substrate heat treatment apparatus 1 includes a chamber 10 that accommodates a substrate W, a substrate support unit 20 that supports the substrate W, a substrate heating unit 30 that heats the substrate W, a temperature measurement unit 40 that measures the temperature of the substrate W, A heating command value generation unit 50 that generates and outputs a heating command value for the substrate heating unit 30 is provided.
[0015]
The chamber 10 is provided with a water channel 12 and a water channel 14. By flowing the cooling water through the water channels 12 and 14, the temperature rise of the chamber 10 due to the heating of the substrate heating unit 30 is suppressed.
[0016]
The substrate support unit 20 includes a support ring 22 that supports the substrate W and a support column 24 that supports the support ring 22. The support column 24 has a rotation drive mechanism 26 having a motor, a gear mechanism, a magnet, and the like at a lower portion thereof, and can rotate around an axis AX1. The substrate W supported by the substrate support unit 20 rotates around the axis AX1 during the heat treatment described below. Further, by providing the support ring 22 corresponding to the size of the substrate W, it is possible to support a plurality of sizes of substrates.
[0017]
The substrate heating unit 30 includes a plurality of lamps 32 that emit light. In this embodiment, each of the plurality of lamps 32 is a linear lamp. The plurality of lamps 32 are divided into a plurality of zones and arranged at substantially equal intervals at positions facing the substrate, and the substrate W is heated by irradiation of light from them. FIG. 1 shows a case where 21 lamps 32 are arranged and three lamps belong to seven zones Z1 to Z7, respectively. The number of zones and the number of lamps belonging to each zone can be arbitrarily set.
[0018]
The temperature measuring unit 40 includes a plurality of thermometers 42. The plurality of thermometers 42 are fixed below the substrate and measure the temperature at a predetermined position (representative measurement point described later) of the substrate W. . As the plurality of thermometers 42, a radiation thermometer or the like can be used. The plurality of thermometers 42 are expressed as four thermometers 421 to 424 in FIG.
[0019]
FIGS. 2A and 2B are diagrams illustrating two examples of the state of the lower portion of the substrate W supported by the substrate support 20 in the substrate heat treatment apparatus 1. In the example of FIG. 2A, each of the plurality of thermometers 421 to 424 is arranged linearly so that the substrate temperature at positions on concentric circles having different radii can be measured. In the example of FIG. 2B, each of the plurality of thermometers 421 to 424 is two-dimensionally distributed so that the substrate temperature at positions on concentric circles having different radii can be measured. . Both of these two examples can be adopted.
[0020]
FIG. 3 is a diagram schematically showing the zones Z1 to Z7 and the temperature measurement positions of the thermometers 421 to 424 corresponding thereto. In FIG. 3, the three lamps 32 included in each of the zones Z1 to Z7 are represented by circles. The plurality of thermometers 421 to 424 in this embodiment are arranged at positions as shown in FIG. 2 (b), but in the schematic diagram of FIG. 3, the corresponding thermometers are linearly below each zone. It is shown to be arranged, ie corresponding to FIG. 2 (a). This is based on the fact that the temperature distribution of the substrate W is considered to be rotationally symmetric (point symmetric) about the rotation axis AX1 due to the rotation of the substrate W. That is, assuming that the temperature of the substrate W is uniquely determined only by the distance from the rotation center (that is, the radius), the angle in the rotation direction is ignored and the position corresponding to the specific radius is linear. It is expressed to be arranged.
[0021]
Each temperature measurement position by the thermometers 421 to 424 corresponds to a “representative measurement point” in the present invention. That is, strictly speaking, there is a certain temperature distribution in each zone. However, since this is substantially negligible, the temperature at a predetermined position in each zone is measured as the representative temperature of each zone. A predetermined location in each of the zones Z1 to Z7 where the temperature is measured by 421 to 424 is referred to as a “representative measurement point”.
[0022]
A thermometer 421 is disposed below the central zone Z1. The thermometer 421 can measure the substrate temperature at the position where the lamp 32 in the zone Z1 has the greatest influence. Similarly, the thermometer 422 measures the substrate temperature at a position that is particularly greatly affected by the lamp 32 in the zone Z2. The same applies to the thermometers 423 and 424.
[0023]
Further, in determining the heating command values of the lamps 32 of the zones Z5 to Z7 that are symmetrical to the zones Z2 to Z4 with respect to the central zone Z1, the thermometer 422 is based on the rotational symmetry of the temperature distribution. Temperature measurement results of ˜424 can be used.
[0024]
Note that by measuring the temperature of the substrate W in the temperature measuring unit 40 over time, it is possible to calculate a temperature change per unit time, that is, a temperature change rate.
[0025]
FIG. 4 is a diagram illustrating another example of the lamp arrangement. In the example of FIG. 4, a parallel arrangement of linear lamps is vertically arranged so as to be orthogonal to each other. 1 corresponds to the case where only one of the upper and lower arrangements in FIG. 4 exists. As described above, since the substrate W rotates with the rotation of the substrate support portion 20 (FIG. 1), the temperature distribution of the substrate W has a substantially point-symmetric distribution around the rotation axis AX1. Therefore, in determining the heating command value of the lamp 32 included in these zones, the temperature measurement result of another thermometer provided at the corresponding position can be used by utilizing this rotational symmetry. Hereinafter, the heating control in a state where the lamps 32 are arranged in one direction as shown in FIGS. 1 to 3 will be described, but the expansion to the case where the lamps 32 are arranged in two directions as shown in FIG. To do.
[0026]
A heating command value generation unit 50 in FIG. 5 to be described later generates heating command values for the plurality of lamps 32 of the substrate heating unit 30 (FIG. 1) based on the temperature measurement result by the temperature measurement unit 40, and those heating commands. The value is output to each of the plurality of lamps 32. As a result, optimal control is performed so that controlled amounts such as the substrate temperature and the substrate temperature change rate follow the target value. Further, the heating command value generation unit 50 changes and controls the heating command value specific to each lamp in real time in order to make the in-plane distribution of the substrate temperature uniform.
[0027]
Below, the control performed in said board | substrate heat processing apparatus 1 is demonstrated.
[0028]
<A2. Overview of control>
FIG. 5 is a block diagram showing a schematic configuration of the control unit 100 of the apparatus 1. The control unit 100 includes the temperature measurement unit 40, the heating command value generation unit 50, the temperature characteristic storage unit 60, and the target value generation unit 70 described above.
[0029]
The target value generating unit 70 performs the actual control of the curves representing the target values at the respective times of the substrate temperature and the substrate temperature change rate, that is, the target temperature curve (FIG. 6) and the target temperature change rate curve (FIG. 7). To generate. However, in FIG. 6, the horizontal axis represents time t and the vertical axis represents the target temperature T, which is a graph showing the change in the target temperature over time. FIG. 7 shows a change with time of the target temperature change rate V for achieving the target temperature of FIG.
[0030]
Then, the heating command value generation unit 50 generates heating command values for the respective lamps 32 of the substrate heating unit 30 so that these controlled amounts follow the target values, and these heating command values are used for the respective lamps 32. Output to. At this time, the heating command value generation unit 50 measures the actual value of the controlled amount such as the substrate temperature measured in real time by the temperature measurement unit 40 and the characteristic model stored in the temperature characteristic storage unit 60 (that is, the lamp 32). The heating command value is obtained in consideration of a curve modeling the influence of the amount of power supply for heating to each of the substrate on the substrate temperature and the rate of change in substrate temperature.
[0031]
Further, the heating command value generation unit 50 changes and controls the heating command value specific to each lamp 32 in real time in order to make the in-plane distribution of the substrate temperature uniform. Therefore, the heating command value of each lamp 32 belonging to Z1 to Z7 in each zone is determined by first correcting the reference output command value after determining the reference output command value for each zone.
[0032]
In this embodiment, a master-slave method is adopted as a basic concept for adjusting the temperature distribution of the substrate. The master-slave control law has a master (main) control law and a slave (secondary) control law.
[0033]
FIG. 8 shows a schematic functional block diagram of a temperature distribution control system according to this method (master-slave method). FIG. 8 is simplified for illustration. Although only three zones are shown in FIG. 8, it can be considered that a part of the zones in FIG. 1 is shown. For example, zones Za, Zb, and Zc adjacent to or continuous with each other correspond to zones Z1, Z2, and Z5 in FIG. 1, respectively, and thermometers 42a and 42b correspond to thermometers 421 and 422, respectively. Alternatively, the zones Zb and Zc can be considered to correspond to Z3 and Z6, respectively.
[0034]
According to the master-slave control rule, the heating command value for each lamp can be obtained as follows. Here, the relationship between the three zones Za, Zb, and Zc is illustrated, but the same applies to other zones.
[0035]
(a) First, the temperature at the representative measurement point Pa corresponding to the “master zone” is measured by the thermometer 42a, and the reference output command value of each lamp included in the “master zone” is heated based on the temperature measurement result. It is determined by the command value generation unit 50 using a master control law. That is, the reference output command value YC of each of the lamps a1 to a3 belonging to the zone Za is obtained by the compensator C (FIG. 8 described later) of the feedback control system using the temperature measurement result at the representative measurement point Pa by the thermometer 42a. . Like this zone Za, a zone selected in advance so that the reference output command value of each lamp belonging to that zone is determined by the master control law is the “master (main) zone”. The heating command value for each of the lamps a1 to a3 belonging to the master zone Za is a value corresponding to the reference output command value YC.
[0036]
(b) Then, the temperature at the representative measurement point Pb corresponding to the “slave zone” is measured by the thermometer 42b, and using the temperature measurement result and the temperature measurement result at the representative measurement point Pa by the thermometer 42a, “ The heating command value of each of the lamps b1 to b3 included in the “slave zone” is determined by the heating command value generation unit 50 using the slave control law.
[0037]
That is, first, a deviation E between the temperature measurement result at the thermometer 42a at the representative measurement point Pa corresponding to the master zone Za and the temperature measurement result at the representative measurement point Pb corresponding to the slave zone (Zb). Ask for.
[0038]
Next, by adding and synthesizing the deviation E with predetermined coefficients k1 to k3 to the reference output command value YC for the master zone Za, the heating command values for the lamps b1 to b3 included in the slave zone Zb are obtained. decide. As described above, the heating command values of the lamps b1 to b3 included in at least the slave zone Zb among the plurality (nine) lamps shown in FIG. 8 are representative measurements corresponding to the zone Zb to which the lamps b1 to b3 belong. It is generated based on a predetermined heating control rule considering temperature measurement results at two representative measurement points of the point Pb and the representative measurement point Pa corresponding to the adjacent master zone Za. Further, the coefficients k1 to k3 used for the addition synthesis are values specific to the lamps b1 to b3, and the lamps b1 to b3 belonging to the slave zone Zb and the representative measurement points Pa corresponding to the master zone Za. It is determined according to the relative positional relationship. These coefficients k1 to k3 are values that reflect the spatial temperature distribution tendency in the substrate W. Like this zone Zb, a zone for obtaining a heating command value relative to the master control law is a “slave zone”, and in the example of FIG. 8, zones Zb and Zc correspond to this.
[0039]
In the overall arrangement of FIG. 1, for example, the zone Z1 facing the center of the substrate W can be a master zone and the other zones Z2 to Z7 can be slave zones. These zones may be slave zones subordinate to the respective master zones.
[0040]
The above is the outline of the control in the present embodiment. These are described in detail below.
[0041]
<A3. Determination of master zone reference output command value>
First, the reference output command values of the lamps a1 to a3 included in the master zone Za are obtained by the master control law. The reference output command value can be obtained by various methods, but an example is shown below.
[0042]
The outputs of the lamps a1 to a3 belonging to the master zone Za have a particularly great influence on the temperature characteristics of specific positions on the substrate W corresponding to each. These temperature characteristics are measured by the temperature measuring unit 42. Based on this measurement result, the temperature of the substrate W can be controlled in real time by configuring a feedback control system.
[0043]
By outputting the heating command value to each of the lamps a1 to a3 in the master zone Za, control is performed such that the substrate temperature, which is a controlled amount, follows the target value. The heating command value generation unit 50 obtains heating command values for the lamps a1 to a3 in the master zone Za using a master control rule including both the first control rule and the second control rule. FIG. 9 shows a control block diagram of the master zone Za.
[0044]
<First control rule>
First, an outline of the first control rule will be described. The first control rule corresponds to a feedforward (hereinafter abbreviated as “FF”) control rule or an open loop control rule. In FIG. 9, it corresponds to a portion shown as the FF compensator C1. In order to perform feedforward compensation, a model relating to the temperature characteristics of the substrate W with respect to the lamp heating command value is constructed. Specifically, the characteristics of the substrate temperature and the substrate temperature change rate with respect to the heating command value of the lamp 32 are measured in advance with respect to the sample substrate. That is, the values of the substrate temperature and the substrate temperature change rate when various heating command values are output to the plurality of lamps 32 are collected as data. And these data are preserve | saved in the temperature characteristic memory | storage part 60, and are utilized as a database. Note that these data collections are preferably performed in a state as close as possible to the actual processing conditions.
[0045]
FIG. 10 shows a characteristic model related to the substrate temperature, and is a diagram showing the relationship between the heating command values of the lamps a1 to a3 and the temperature of the substrate W. The horizontal axis represents the heating command value of the lamps a1 to a3, and the vertical axis represents the ultimate temperature of the substrate W after a predetermined time has elapsed. FIG. 11 shows a characteristic model related to the substrate temperature increase rate, and shows the relationship between the heating command values of the lamps a1 to a3 and the temperature change rate (temperature increase rate) of the substrate W. The horizontal axis represents the lamp heating command value, and the vertical axis represents the rate of temperature increase from a predetermined temperature. These diagrams can be considered to express characteristics relating to a predetermined physical quantity as “models”. The heating command values for the lamps a1 to a3 on the horizontal axis are normalized values.
[0046]
Using the temperature characteristics shown in these figures, the heating command values for the lamps a1 to a3 are determined so as to be the desired target values. The characteristic model shown in FIG. 10 and FIG. 11 is obtained by using a heating command value as a variable and using a predetermined physical quantity (temperature, etc.) corresponding to the variable as a function value. Is equivalent to finding its inverse function with. That is, the heating command value corresponding to the predetermined physical quantity is determined based on the characteristic model. And this heating command value is made into 1st heating command value YA. When there is no modeling error and disturbance, a desired target temperature and a target temperature change rate can be achieved only by the first heating command value YA.
[0047]
For example, consider a case where the target temperature T1 (see FIG. 10) is 1000 ° C. From FIG. 10, in order to reach the target temperature of the substrate in the temperature maintaining stage to 1000 (° C.), a value of 0.36 is derived. This value is a standardized value. For example, when the standard value 1 corresponds to 50 (kw), the heating command value 18 (kw) corresponds to the standard value 0.36. Therefore, in this case, 18 (kw) is output as the first heating output value YA based on the FF control law.
[0048]
<Second control rule>
Next, an outline of the second control rule will be described. The second control rule corresponds to a feedback (hereinafter abbreviated as “FB”) control law or a closed loop control law. In FIG. 9, it corresponds to a portion shown as the FB compensator C2. By performing feedback compensation, the controlled variable can be made to follow the target value even when the target value and the measured value of the controlled variable such as the substrate temperature do not match. Here, the deviation between the heating command value corresponding to the target value of the predetermined physical quantity and the heating command value corresponding to the actual measurement value is defined as the second heating command value YB. Thus, the heating command value by feedback compensation is determined using the above characteristic model.
[0049]
For example, when the actual measurement value is 900 (° C.), the standard value 0.3 is derived from FIG. 10, and the heating command value is 15 (kw). In this case, 3 (kw), which is a deviation YB0 between the heating command value 18 (kw) corresponding to the target temperature and the heating command value 15 (kw) corresponding to the actually measured temperature, becomes the second heating command value YB.
[0050]
Here, the determination of the heating command value does not determine the output by multiplying the error between the target value and the actual measurement value by each coefficient parameter of the PID operation as in a feedback control system having a normal PID controller. It should be noted. Since it is not necessary to determine PID parameters, complicated adjustments for determining those parameters are not required. In FIG. 9, the FF compensator C1 and the FB compensator C2 are connected to the characteristic model 62 by dotted lines. This indicates that the determination of the heating command value in these compensators C1 and C2 is performed using the characteristic model 62.
[0051]
Further, in determining the second heating command value YB, as will be described later, a value further corrected by correction using fuzzy reasoning or the like can be used as the second heating command value YB.
[0052]
Then, by adding and synthesizing the second heating command value YB and the first heating command value YA as in Equation 1 below, the heating command value YC is used, and control is performed based on the heating command value. To follow the target temperature.
[0053]
[Expression 1]
YC = YA + YB
As described above, the control system is configured using both the first control rule (FF control law) and the second control rule (FB control law), and the reference output command value YC of the master zone Za is set. Ask.
[0054]
<A4. Determination of heating command value for each lamp in slave zone>
Next, with reference to FIGS. 8 and 12, heating command values for the lamps b1 to b3 included in the slave zone Zb are determined. As described above, the slave zone is controlled not only in the zone Zb but also in other slave zones.
[0055]
FIG. 12 is a conceptual diagram showing how to obtain the heating command values for the lamps b1 to b3 included in the slave zone Zb. 12A shows the positional relationship between the zones Za to Zc and the thermometers 42a, 42b, and 42c. FIG. 12B shows the temperature measurement results Ta and Tb at the representative measurement points Pa and Pb and the target temperature. FIG. 12C shows the heating output values for the lamps a1 to a3, b1 to b3, and c1 to c3.
[0056]
Specifically, first, a deviation E (= Ta−Tb) between the measurement result Ta of the substrate temperature by the thermometer 42a and the measurement result Tb of the substrate temperature by the thermometer 42b is obtained.
[0057]
Then, the heating command value of each of the lamps b1 to b3 included in the slave zone Zb is determined based on the deviation E. This determination is performed using the coefficients k1 to k3. As described above, the coefficients k1 to k3 are values specific to the lamps b1 to b3 belonging to the slave zone Zb, and the lamps b1 to b3 and the representative measurement points Pa corresponding to the master zone Za It is determined according to the relative positional relationship.
[0058]
First, as shown in FIG. 8, a value obtained by multiplying the deviation E by coefficients k1 to k3 individually is obtained as a correction value. By adding and combining this correction value with the reference output command value YC of the master zone Za, the heating command values of the lamps b1 to b3 included in the slave zone Zb are obtained. As shown in FIG. 12, (YC + k1 × E) is calculated as the heating command value for the lamp b1. Similarly, (YC + k2 × E) is calculated as the heating command value for the lamp b2, and (YC + k3 × E) is calculated for the lamp b3.
[0059]
Here, the coefficients k1 to k3 are values reflecting the virtual temperature distribution indicated by the broken line in FIG. 12A, and the representative measurement point Pa by the thermometer 42a and the representative measurement point Pb by the thermometer 42b. It can be determined as a value that interpolates the temperature distribution between two points. For example, the temperature change between two points can be interpolated as a curved distribution as shown by a broken line in FIG. 12A, or can be interpolated as a linear distribution.
[0060]
The temperature distribution is estimated by such interpolation, and the master zone Za and the slave zone Zb on the substrate W are determined according to the relative positional relationship of the lamps b1 to b3 from the position of the representative measurement point Pa corresponding to the master zone Za. The heating command value for each of the lamps b1 to b3 in the slave zone Zb that makes the temperature distribution uniform can be obtained. The same applies to other slave zones.
[0061]
For example, at each position of each of the lamps b1 to b3 in the slave zone Zb, the farther from the representative measurement point Pa corresponding to the master zone Za, the more the deviation from the temperature measurement result at the representative measurement point Pa corresponding to the master zone Za is. In this case, a value satisfying the magnitude relationship of k1> k2> k3 can be set as the magnitude of the values of the coefficients k1 to k3. These coefficients k1 to k3 can be made to depend on the actual temperature deviation E, but can also be made to depend only on the general tendency of the spatial temperature distribution. If importance is attached to the simplicity and high speed of control, it is preferable to adopt the latter method, in which case these coefficients k1 to k3 correspond to the lamps b1 to b3 and the master zone Za in each slave zone Zb. As a value that depends only on the relative positional relationship with the representative measurement point Pa, the value can be a fixed value. At this time, the values of these coefficients k1 to k3 are determined prior to the actual control operation and stored in the memory in the heating command value generation unit 50.
[0062]
Thus, the heating command values of the lamps b1 to b3 in the slave zone Zb can be obtained using the coefficients k1 to k3 reflecting the temperature change tendency.
[0063]
<A5. Compensation of applied power>
By the way, in the above method, the reference output command value YC of the lamps a1 to a3 included in the master zone Za serving as a reference is set as a reference value, and the lamps b1 to b3 included in the slave zone Zb with respect to the reference value YC. The heating command value is changed. In this case, the temperature of the representative measurement point Pa on the substrate W corresponding to the master zone Za may be affected by the heating of the lamps b1 to b3 included in the slave zone Zb. For example, when the heating command value calculated by the above method is larger in the heating command value of the lamps b1 to b3 in the slave zone Zb than the heating command value of the lamps a1 to a3 in the master zone Za, the master zone At the representative measurement point Pa on the substrate W corresponding to Za, the temperature may be higher than the target value. This is based on the fact that each point on the substrate below the master zone Za is also heated by the lamps b1 to b3 in the slave zone Zb, and the temperature rise due to the heating appears as a temperature measurement result at the temperature fixed point Pa.
[0064]
Therefore, it is preferable to compensate the heating command value of each lamp by the following method. Here, the sum of the heating command values of all the lamps obtained by the above method (that is, the sum of the heating command values calculated for each lamp belonging to the master zone Za and each lamp belonging to the slave zone), and the master zone Za Is compared with the sum of output command values in a hypothetical case in which the reference output command value YC is commonly given to all the lamps (a value corresponding to the product of the heating command value for each lamp multiplied by the total number of lamps), A method for compensating each heating command value by correcting the heating command value calculated for each lamp belonging to the master zone Za and each lamp belonging to the slave zone according to the ratio between the two will be described. For example, when the heating command value of the slave zone is larger than the heating command value of the master zone, the total output of a plurality of lamps is suppressed as a whole, thereby preventing the temperature rise of the substrate at the representative measurement point Pa It is.
[0065]
Therefore, first, the sum Y of the heating command values Yi (i = 1, 2,..., N) of all the lamps Li obtained by the above method is obtained by the following formula 2. Here, N is the total number of lamps, and this sum Y is the sum of all lamps regardless of whether they belong to the master zone or the slave zone, and the lamp LPi represents the i-th lamp. Yes. In the case of FIG. 1, N = 3 × 7 = 21, and 21 lamps 32 correspond to the lamps LPi (i = 1, 2,..., 21). Hereinafter, all the lamps Li (i = 1, 2,..., N) are denoted as lamps {Li}.
[0066]
[Expression 2]
Y = ΣYi
In Equation 2, Σ means the sum of i (i = 1, 2,..., N).
[0067]
Further, as shown in Expression 3, a value obtained by multiplying the master zone reference output command value YC by N, which is the total number of lamps, is obtained as a virtual reference output total amount Y ′.
[0068]
[Equation 3]
Y ′ = YC × N
Then, a coefficient ks that satisfies the following equation 4 is obtained.
[0069]
[Expression 4]
Y ′ = ks × Y
The coefficient ks is a factor representing the relationship between the values Y and Y ′. In other words, the ratio between the sum Y of the heating command values for all the lamps and the reference output sum Y ′ is evaluated by the coefficient ks.
[0070]
Then, a value obtained by multiplying the heating command value for each lamp {Li} obtained by the master-slave system by the coefficient ks is obtained as a new heating command value for each lamp {Li}, and the new lamp {Li} The heating command value is output to each lamp {Li} as the final heating command value. Thereby, the influence which the output of the lamp | ramp of a slave zone has on the temperature of the representative measurement point Pa corresponding to a master zone can be relieved.
[0071]
<B. Second Embodiment>
The substrate heat treatment apparatus according to the second embodiment is different from the substrate heat treatment apparatus according to the first embodiment in the processing content performed by the heating command value generation unit 50 in FIG. It is the same.
[0072]
As described above, the first embodiment employs the master-slave method to perform control so as to adjust the temperature distribution of the substrate. On the other hand, in the second embodiment, a temperature distribution adjustment method different from the first embodiment, that is, a method of generating a unique reference output command value for each zone is adopted.
[0073]
FIG. 13 is a schematic conceptual diagram of a control method according to the second embodiment. In this figure, Za and Zb are used as symbols representatively representing a plurality of adjacent or continuous zones. However, in the second embodiment, there is no distinction between a master zone and a slave zone. Therefore, the zones Za and Zb are equal to each other.
[0074]
First, the reference output command value YCa for the zone Za and the reference output command value YCb for the zone Zb are generated by the compensators Ca and Cb, respectively. Each reference output command value YCa, YCb can be obtained in the same manner as the reference output command value of each lamp in the master zone in the first embodiment.
[0075]
Next, heating command values for the lamps a1 to a3 and b1 to b3 are obtained in the zones Za and Zb. FIG. 14 is a conceptual diagram showing how to obtain the heating command value of each lamp included in each zone Za, Zb, and corresponds to FIG. 12 of the first embodiment. Note that the illustration of the lamp is omitted. Hereinafter, with reference to FIG. 14, the case where the heating command values of the lamps b <b> 1 to b <b> 3 included in the zone Zb will be described, but the same applies to other zones.
[0076]
After the standard output command values YCa and YCb are obtained, the standard output command value YCb of the zone Zb (hereinafter “first zone”) and the reference zone Za (“second zone”) adjacent to the first zone Zb are obtained. A deviation Eab = (YCa−YCb) from the reference output command value YCa is calculated, and a value obtained by multiplying the deviation Eab by predetermined coefficients k1b to k3b (see FIG. 13) of the lamps b1 to b3. Is calculated as a correction value. A value obtained by adding and combining these correction values to the reference output command value YCb of the first zone Zb is obtained as the final heating command value Y. For example, the heating command value Y of the first lamp b1 is obtained by the following formula 5.
[0077]
[Equation 5]
Y = YCb + k1b × (YCa−YCb)
The coefficients k1b to k3b can be determined according to the relative positional relationship between the lamps b1 to b3 belonging to the zone Zb and the representative measurement points Pa and Pb. These coefficients k1b to k3b are values determined in consideration of the influence of the lamps b1 to b3 on the temperature measurement result at the representative measurement point Pb. The value after the correction according to the temperature distribution on the substrate W is set as a heating command value to the lamps b1 to b3. Thus, the heating command value for each of the lamps b1 to b3 included in at least the zone Zb among the plurality of lamps corresponds to the representative measurement point Pb corresponding to the zone Zb to which the lamps b1 to b3 belong and the adjacent zone Za. It is generated based on a predetermined heating control rule considering the temperature measurement results at the two representative measurement points Pa.
[0078]
Similarly, heating command values for the lamps a1 to a3 and the like can be obtained. Thus, the temperature distribution on the substrate W can be made uniform by obtaining the respective heating command values for all N lamps.
[0079]
<C. Third Embodiment>
The third embodiment is an example in which the present invention is applied when the same lamp belongs to M different zones (M is an integer of 2 or more).
[0080]
FIG. 15 is a schematic conceptual diagram of a control method according to the third embodiment. The plurality of lamps L <b> 1 to L <b> 11 are divided into a plurality of zones Za, Zb, and Zc and are disposed at substantially equal intervals at positions facing the substrate W. In FIG. 15, five lamps belong to each of the zones Za, Zb, and Zc, and two specific lamps L4 and L5 on one end side of the central zone Za belong to the adjacent zone Zb, Moreover, the case where the two specific lamps L7 and L8 on the other end side of the central zone Za belong to the adjacent zone Zc is shown. In this example, since each of the specific lamps L4, L5, L7, and L8 is included in two zones, M = 2. FIG. 16 is a conceptual diagram showing how to obtain the heating command value of each lamp included in each zone, and corresponds to FIG. 14 of the second embodiment. Hereinafter, these FIG. 15 and FIG. 16 are referred.
[0081]
Also in the third embodiment, as in the second embodiment, first, reference output command values for the respective zones Za, Zb, and Zc are obtained. This reference output command value is obtained by a control law unique to each zone. For example, the method of the second embodiment can be used to obtain the reference output command value. That is, for the lamps L1 to L5, the reference output command value YCb is obtained by the compensator Cb based on the measurement result of the thermometer 42b. For the lamps L4 to L8, a reference output command value YCa is obtained by the compensator Ca based on the temperature measurement result of the thermometer 42a.
[0082]
Among the reference output command values obtained in this way, the reference output command values of the lamps L1, L2, L3, L6, L9, L10, and L11 each belonging to only one zone are the same as in the second embodiment. Each final heating command value is obtained by this method.
[0083]
On the other hand, for the specific lamps L4, L5, L7, and L8 each belonging to two zones overlappingly, the reference output command values obtained in each of the M zones to which the zone belongs are given weights. Additive synthesis. For example, the heating command value Y4 for the specific lamp L4 belonging to both the zones Za and Zb is expressed by the following equation 6 using the reference output command values YCa and YCb of both zones Za and Zb using the weighting factors ka4 and kb4. Thus, it can be calculated by weighted synthesis (specifically, weighted addition synthesis).
[0084]
[Formula 6]
Y4 = ka4 × YCa + kb4 × YCb
Preferably, these coefficients ka4 and kb4 are
[0085]
[Expression 7]
ka4 + kb4 = 1
Standardize as follows.
[0086]
Specific values of the weighting coefficients ka4 and kb4 in the specific lamp L4 are the relative positions of the representative measurement points Pa and Pb corresponding to the two zones Za and Zb to which the specific lamp L4 belongs and the lamp L4. Predetermined based on the relationship. For example, when the lamps L1 to L11 are arranged at equal intervals ΔD in the example of FIG. 15, the specific lamp L4 is separated from the representative measurement point Pb by (1 × ΔD) in one zone Zb. The other zone Za is separated from the representative measurement point Pa by (2 × ΔD). Therefore, the specific lamp L4 weights the reference output command value YCb in one zone Zb and the reference output command value YCa in the other zone Za at a ratio of 2: 1 corresponding to the inverse ratio of the distance ratio 1: 2. If the heating command value of the lamp L4 is obtained by the addition synthesis, the temperature measurement results in the zones Za and Zb can be appropriately synthesized. Accordingly, the coefficients ka4 and kb4 in this case are defined as normalized values such as ka4 = 2/3 and kb4 = 1/3.
[0087]
Similarly, the heating command value for the specific lamp L5 belonging to both the zones Za and Zb is also added using the reference output command values YCa and YCb of both zones using the coefficients ka5 = 1/3 and kb5 = 1/3. It can be calculated by synthesis.
[0088]
In general, for specific lamps Ld belonging to M zones Zj (j = 1 to M), when the distance to each representative measurement point Pj corresponding to these M zones Zj is Ddj,
[0089]
[Equation 8]
kjd = Ddj / ΣDdm
(However, in this equation 8, Σ is the sum of m over M zones belonging to each other)
The coefficient kjd may be determined as follows, and the heating command value Yd for the specific lamp Ld is calculated using the coefficient kjd determined as described above.
[0090]
[Equation 9]
Yd = Σkjd × YCj
(However, in this equation 9, Σ is the sum of j over M zones belonging to each other)
You can get like that. Here, YCj is a reference output command value for the zone Zj, and is a value reflecting the temperature measurement result at the representative measurement point Pj corresponding to the zone Zj. As described above, the heating command value for at least the specific lamp Ld among the plurality of lamps is the temperature at M representative measurement points Pj (j = 1 to M) corresponding to the M zones to which the specific lamp Ld belongs. It is generated based on a predetermined heating control rule considering the measurement result.
[0091]
<D. Other variations>
<D1. Reference output command value-1>
The method of obtaining each reference output command value in the above embodiment is not limited to the above method. For example, as described above, fuzzy inference can be used when obtaining the second heating command value YB by the feedback compensator C2.
[0092]
Here, a detailed description will be given of a case where a value obtained by further correcting the second heating command value YB obtained above using a correction coefficient α based on fuzzy inference is obtained as a new second heating command value YB. This makes it possible to perform control with higher accuracy. In the following, for explanation, the second heating command value YB obtained in the above embodiment is replaced with a value YB0.
[0093]
A value obtained by adding a value obtained by multiplying the value YB0 by a correction coefficient α based on fuzzy inference is defined as YB1. At this time, the value YB1 is expressed by the following Expression 10 or Expression 11.
[0094]
[Expression 10]
YB1 = YB0 + α × YB0
[0095]
## EQU11 ##
YB1 = β × YB0, where β = 1 + α
Here, how to obtain the correction coefficient α based on fuzzy inference will be described.
[0096]
As an example, a case will be described in which the control in the temperature rising stage is performed using a fuzzy rule in which the deviation e1 and the deviation e2 are taken into the antecedent part. Here, the deviation e1 is a deviation between the output command value corresponding to the target temperature and the output command value corresponding to the actually measured temperature, and the deviation e2 is the output command value corresponding to the target temperature rising rate and the actually measured temperature rising speed. Deviation from the corresponding output command value. These output command values can be obtained based on the “characteristic model” shown in FIGS. The temperature raising step refers to a step of raising the temperature of the substrate to a predetermined temperature by heating the lamp, and corresponds to the time t0 to the time t10 in FIGS.
[0097]
The following three rules are used as fuzzy rules.
[0098]
(Rule 1): When e1 is positive and e2 is positive and large, the output is increased.
[0099]
(Rule 2): When e1 is about 0 and e2 is also about 0, the output is maintained.
[0100]
(Rule 3): When e1 is positive and e2 is negative and large, the output is reduced.
[0101]
Here, the values of e1 and e2 are normalized, but in practice, they can be scaled to represent appropriate values.
[0102]
FIG. 17A shows membership functions of the antecedent part and the consequent part of Rule 1. In FIG. 17 (a), the two graphs on the left represent the membership function of the antecedent part, and the graph on the right represents the membership function of the consequent part. Similarly, FIG. 17 (b) and FIG. 17 (c) show the membership functions of the antecedent part and the consequent part of rule 2 and rule 3, respectively.
[0103]
The case where fuzzy calculation is performed by the “max-min centroid method” will be described with reference to these drawings. Here, it is assumed that the deviation e1 and the deviation e2 at a certain time are e1 = 0.4 and e2 = −0.2, respectively.
[0104]
First, the degree of the antecedent part based on rule 1 is determined. When e1 = 0.4, the degree is +0.8 from the membership function a11. Further, when e2 = −0.2, the degree is 0 based on the membership function a12. Therefore, taking the smaller value, the combined result of “degree” is zero.
[0105]
Next, the degree of the antecedent part based on rule 2 is determined. When e1 = 0.4, the degree is +0.2 from the membership function a21. When e2 = −0.2, the degree is 0.6 based on the membership function a22. Therefore, taking the smaller value, the synthesis result of “degree” is 0.2.
[0106]
Then, the degree of the antecedent part based on the rule 3 is determined. When e1 = 0.4, the degree is +0.8 from the membership function a31. When e2 = −0.2, the degree is 0.4 based on the membership function a32. Therefore, taking the smaller value, the combined result of “degree” is 0.4.
[0107]
Next, the area of the trapezoidal part formed by cutting the membership function of the consequent part of each rule with a straight line representing the value of the synthesis result of “degree” in each rule is superimposed. The center of gravity of the superimposed figure is obtained in consideration of the weighting for each rule. For example, the weight w in this weighting can be set as follows for each rule.
[0108]
(1) For Rule 1: w = 0.5
(2) For rule 2: w = 1.0
(3) Regarding rule 3: w = 0.5
FIG. 18 is a diagram illustrating that the result of the consequent part is obtained by superimposing the trapezoidal figures based on each rule to obtain the center of gravity of the composite figure. The center of gravity of the figure of the trapezoid D2 corresponding to the rule 2 and the trapezoid D3 corresponding to the rule 3 is obtained in consideration of weighting. In this case, -0.25 is obtained as a result. This value is the correction coefficient α. Therefore, if this correction coefficient α is used, the value YB1 is calculated based on the above-described formula 10.
[0109]
The value YB1 obtained by adding correction based on fuzzy reasoning as described above can be used as a new second heating command value YB. With respect to the new second heating command value YB, a heating command value YC expressed by the equation 1 can be obtained, and this value YC can be obtained as a reference output command value. By controlling based on this reference output command value, effects such as suppression of overshoot can be obtained.
[0110]
<D2. Reference output command value-2>
Alternatively, the reference output command value can be obtained by setting the value YB1 obtained by further correction based on fuzzy inference as a new second heating command value YB. For example, the accumulated value YB2 obtained by adding the value YB1 at each time with respect to time can be calculated, and the value added to the value YB1 can be used as the second heating command value YB. The value YB2 is expressed by the following formula.
[0111]
[Expression 12]
YB2 = ΣYB1 (t)
Here, Σ means the sum of time, and YB2 is obtained by adding YB1 (t) at each time t from time t0 to the current time. Here, YB1 (t) is specified to emphasize that the value YB1 is a function of time t, but other values that do not specify that the value YB1 is a function of time, for example, YA, YB , YC, YB0 and YB2 are also functions of time.
[0112]
This value YB2 corresponds to the I (integration) operation in the PID operation of feedback control. By adding the value YB2 to the value YB1, it is possible to prevent the occurrence of offset and improve the tracking performance. In this case, the new second heating command value YB is expressed by the following equation.
[0113]
[Formula 13]
YB = YB1 + YB2
Based on the above formula 1, the heating command value YC is obtained as a reference output command value for the new second heating command value YB, and the heating control is performed based on the value YC, so that the target temperature and the target temperature rise Control that follows the speed with higher accuracy can be realized.
[0114]
<D3. Other>
In the above embodiment, the fact that the in-plane temperature distribution of the substrate W becomes almost rotationally symmetric by the rotation of the substrate W is used, but the present invention is not limited to this, and even when the substrate does not rotate. Applicable. In that case, more thermometers may be arranged at appropriate positions corresponding to each zone.
[0115]
When the lamps 32 are arranged in two directions as shown in FIG. 4, for example, as shown in FIG. 19, the matrix zone Zx-y (x, y = 1, 2,..., N: n is 2 Can be defined. At this time, each of the lamps 32 extends over a plurality of zones in the column direction or the row direction. Further, black circles in FIG. 19 indicate representative measurement points corresponding to the respective zones Zxy. In such an apparatus configuration in which the substrate does not rotate in this case, for example, for the lamp 32a, the reference output command value calculated based on the temperature measurement results in the zones Z1-1, Z2-1, and Z3-1 has a relatively large weight. Including the reference output command value calculated from the temperature measurement results in zones Z1-2, Z2-2, and Z3-2 with a medium weight, and in zones Z1-3, Z2-3, and Z3-3 The reference output command values calculated based on the temperature measurement results may be added, synthesized, or weighted averaged so as to include a relatively small weight.
[0116]
When the substrate is rotated, zone division is performed only in one specific direction (for example, the row direction arrangement of the lamps), and the present invention is applied to such a band-like zone arrangement in the other direction. A predetermined heating command value may be given to the lamp arrangement.
[0117]
In the present invention, regarding the heating command value of at least some of the plurality of lamps, if the temperature measurement results at two or more representative measurement points including the representative measurement points corresponding to the zone to which the lamp belongs are considered. However, if the number of lamps is small or the number of representative measurement points is small, the temperature measurement results at all the representative measurement points may be taken into account. A relative positional relationship can also be considered.
[0118]
【The invention's effect】
  As described above, according to the substrate heat treatment apparatus according to any one of claims 1 to 6, the heating command values for at least some of the plurality of lamps are set to the representative measurement points corresponding to the zones to which the lamps belong. Of temperature measurement at two or more representative measurement points includingIn response to theGenerate. Therefore, the lamp heating command value is finely adjusted to reflect the measurement results of two or more representative measurement points on the substrate, and the temperature distribution on the substrate can be finely controlled.
[0119]
  Especially claims1 to 3According to the invention, an appropriate representative zone is set as the main zone in accordance with the shape of the substrate and the arrangement characteristics of the heating means, and the main zoneAnd positionIn relationOn the basis ofSince temperature control is performed in other zones, if the heating control rule in the main zone is adjusted, the temperature control in other zones is adjusted accordingly and the uniformity of heating is ensured. is there.
[0120]
  Claims3In particular, when the heating command value for the lamps in the slave zone is determined relative to the main zone, the heat interference from the heat of the lamps in the slave zone reaches the substrate area of the main zone. The influence can be prevented.
[0121]
Further, in the invention of claim 6, even when zoning is performed so that a specific lamp belongs to a plurality of zones (M zones), the control is performed in consideration of such an arrangement relationship. Sufficient uniformity of heating can be secured.
[Brief description of the drawings]
FIG. 1 is a longitudinal sectional view showing a schematic configuration of a heat treatment apparatus 1 according to an embodiment of the present invention.
FIG. 2 is a view showing a lower part of a substrate support part 20 in the heat treatment apparatus 1;
FIG. 3 is a diagram schematically showing zones Z1 to Z4 and measurement positions of thermometers 421 to 424 corresponding to the zones Z1 to Z4.
FIG. 4 is a diagram illustrating a two-directional arrangement of lamps.
5 is a diagram showing a schematic diagram of a control unit 100. FIG.
FIG. 6 is a diagram illustrating a target temperature curve.
FIG. 7 is a diagram illustrating a target temperature change rate curve.
FIG. 8 is a schematic functional block diagram of a temperature distribution control system based on a master-slave method.
FIG. 9 is a diagram illustrating a control block diagram of a master zone.
FIG. 10 is a diagram illustrating a characteristic model related to a substrate temperature.
FIG. 11 is a diagram illustrating a characteristic model related to a substrate temperature change rate (temperature increase rate).
FIG. 12 is a conceptual diagram showing how to obtain a heating command value for each lamp.
FIG. 13 is a schematic conceptual diagram showing a control method of the second embodiment.
FIG. 14 is a conceptual diagram showing how to obtain a heating command value for each lamp.
FIG. 15 is a schematic conceptual diagram illustrating a control method according to a third embodiment.
FIG. 16 is a conceptual diagram showing how to obtain a heating command value for each lamp.
FIG. 17 is a diagram illustrating membership functions of an antecedent part and a consequent part of each fuzzy rule.
FIG. 18 is a diagram for explaining a synthesis result of a consequent part by a combination of fuzzy rules.
FIG. 19 is a diagram showing an example of zoning in the case of the lamp arrangement of FIG.
[Explanation of symbols]
1 Substrate heat treatment equipment
10 chambers
20 Substrate support
30 Substrate heating unit
40 Temperature measurement unit
421-424, 42a, 42b thermometer
50 Heating command value generator
60 Temperature characteristics storage
70 Target value generator
100 control unit
W substrate
t hours
T temperature
V Heating rate
E Temperature deviation
Za, Zb, Zc zones
b1, b2, b3 lamp

Claims (6)

An apparatus for performing a heat treatment on a substrate,
Heating means for heating the substrate by a plurality of lamps arranged in a plurality of zones;
A plurality of temperature measuring means for measuring temperatures at a plurality of representative measurement points on the substrate corresponding to each of the plurality of zones;
A heating command value generation means that generates a heating command value for at least a portion of the lamp of the plurality of lamps,
Equipped with a,
The plurality of zones have a main zone and a sub zone,
The plurality of temperature measuring means includes a main measuring means for measuring a temperature at a representative measuring point on the substrate corresponding to the main zone, and a slave measuring means for measuring a temperature at a representative measuring point on the substrate corresponding to the slave zone. And
The heating command value generation means calculates a reference output command value of the main zone based on the measurement result of the main measurement means, and obtains a deviation between the measurement result by the main measurement means and the measurement result by the slave measurement means. A value obtained by multiplying the deviation by a coefficient determined according to the positional relationship between the representative measurement point corresponding to the main zone and each lamp belonging to the sub-zone is obtained as a correction value, and the reference output of the main zone By combining the command value and the correction value, the heating command value of each lamp included in the slave zone is determined.
A substrate heat treatment apparatus. The apparatus of claim 1.
The coefficient determined according to the positional relationship between the representative measurement point corresponding to the main zone and each lamp belonging to the sub-zone is a representative measurement point corresponding to the main zone and a representative measurement point corresponding to the sub-zone. A substrate heat treatment apparatus characterized in that the value is determined by interpolating a temperature distribution between the two . The apparatus of claim 1 or claim 2,
The heating command value generating means
The total number of heating command values calculated for each lamp belonging to the main zone and each lamp belonging to the sub-zone, and the total number of lamps of the plurality of lamps to the heating command value for each lamp belonging to the main zone Means for correcting heating command values calculated for each lamp belonging to the main zone and each lamp belonging to the sub-zone according to a ratio to a value corresponding to the product multiplied;
Substrate heat treatment apparatus characterized by having a. An apparatus for performing a heat treatment on a substrate,
Heating means for heating the substrate by a plurality of lamps arranged in a plurality of zones;
A plurality of temperature measuring means for measuring temperatures at a plurality of representative measurement points on the substrate corresponding to each of the plurality of zones;
Heating command value generating means for generating a heating command value for at least some of the plurality of lamps;
With
The heating command value generating means
Means for calculating a reference output command value of each lamp in each of the plurality of zones based on a measurement result of the temperature measuring means corresponding to each of the plurality of zones;
The deviation between the reference output command values of the first and second zones adjacent to each other corresponds to the positional relationship between the representative measurement point corresponding to the second zone and each lamp in the first zone. A value obtained by multiplying each coefficient determined in the same time is obtained as a correction value, and the reference output command value of the first zone and the correction value are combined to heat each lamp included in the first zone. Means for determining the command value;
A substrate heat treatment apparatus comprising: The apparatus of claim 4 .
Each coefficient determined in accordance with the positional relationship between the representative measurement point corresponding to the second zone and each lamp in the first zone has a representative measurement point corresponding to the first zone and the second A substrate heat treatment apparatus characterized in that it is a value determined by interpolating a temperature distribution between representative measurement points corresponding to the zones of the above . An apparatus for performing a heat treatment on a substrate,
Heating means for heating the substrate by a plurality of lamps arranged in a plurality of zones;
A plurality of temperature measuring means for measuring temperatures at a plurality of representative measurement points on the substrate corresponding to each of the plurality of zones;
Heating command value generating means for generating a heating command value for at least some of the plurality of lamps;
With
The plurality of lamps include specific lamps that are divided and belong to M zones (M is an integer of 2 or more),
The heating command value generating means
Means for calculating on the basis of the reference output command value of each lamp in each of the previous SL M number of zones on a measurement result of the temperature measuring means corresponding to each of the M zone,
Using a weighting coefficient determined in accordance with the position relationship between the specific lamp a representative measurement point corresponding to each of the M zones, weighted synthesizing the reference output command value at each of the M zones Means for determining the heating command value of the specific lamp, thereby
A substrate heat treatment apparatus comprising:

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