JP3953873B2 - Method for forming electrode for plasma display panel - Google Patents

Method for forming electrode for plasma display panel Download PDF

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JP3953873B2
JP3953873B2 JP2002114170A JP2002114170A JP3953873B2 JP 3953873 B2 JP3953873 B2 JP 3953873B2 JP 2002114170 A JP2002114170 A JP 2002114170A JP 2002114170 A JP2002114170 A JP 2002114170A JP 3953873 B2 JP3953873 B2 JP 3953873B2
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electrode
pdp
forming
photomask
display panel
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JP2003308791A (en
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博久 原
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Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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Description

【0001】
【発明の属する技術分野】
本発明は、プラズマディスプレイパネル(以下、PDPと記す)の技術分野に関し、さらに詳しくは、PDP用の電極の形成方法に関するものである。
【0002】
【従来の技術】
近年、プラズマディスプレイパネル(以下、PDPと記す)は、その奥行きの薄いこと、軽量であること、鮮明な表示と視野角が広いことにより、種々の表示装置に利用されつつある。一般に、PDPは、2枚の対向するガラス基板にそれぞれ規則的に配列した一対の電極を設け、その間にネオン、キセノン等を主体とするガスを封入した構造になっている。そして、これらの電極間に電圧を印加し、電極周辺の微小なセル内で放電を発生させることにより、各セルを発光させて表示を行うようにしている。特に情報表示をするためには、規則的に並んだセルを選択的に放電発光させている。
【0003】
ここで、PDPの構成を、図1に示すAC型PDPの一例をあげて説明しておく。図1はPDP構成斜視図であるが、分かり易くするため前面板(ガラス基板1)と背面板(ガラス基板2)を実際より離した状態で示してある。図示のように2枚のガラス基板1、2が互いに平行に且つ対向して配設されており、両者は背面板となるガラス基板2上に互いに平行に設けられたリブ(障壁ともいう)3により、一定の間隔に保持されるようになっている。前面板となるガラス基板1の背面側には、透明電極よりなる放電維持電極4と金属電極よりなるバス電極5とで構成される複合電極が互いに平行に形成され、これを覆って誘電体層6が形成されており、さらにその上に保護層7(MgO層)が形成されている。また、背面板となるガラス基板2の前面側には、前記複合電極と直交するようにリブ3の間に位置してアドレス電極8が互いに平行に形成されており、これを覆って誘電体層9が形成され、さらにリブ3の壁面とセル底面を覆うようにして蛍光体10が設けられている。リブ3は放電空間を区画するためのもので、区画された各放電空間をセルないし単位発光領域と言う。このAC型PDPは面放電型であって、前面板上の複合電極間に交流電圧を印加し、放電させる構造である。この場合、交流をかけているために電界の向きは周波数に対応して変化する。そして、この放電により生じる紫外線により蛍光体10を発光させ、前面板を透過する光を観察者が視認するようになっている。なお、DC型PDPにあっては、電極は誘電体層で被覆されていない構造を有する点でAC型と相違するが、その放電効果は同じである。
【0004】
上記の如きPDPにおける電極の形成方法としては、大別すると次の2通りの方法がある。すなわち、一つは導電性の厚膜ペ−ストを用いたスクリ−ン印刷法によりパタ−ン形成する方法であり、もう一つは真空蒸着法、スパッタリング法、めっき法等によってガラス基板上に導電性金属の薄膜を形成し、これをフォトリソグラフィ法によってパタ−ン形成する方法とが知られている。このうち、前者のスクリ−ン印刷法は、比較的容易に電極を形成できる利点はあるものの、製造上の精度によって電極の寸法や厚さにバラツキを生ずる欠点があり、特に大型のパネルになると、スクリ−ン版の歪み等のために電極を設計通りに形成することが困難である。また、スクリ−ン版のメッシュの大きさや乳剤の加工精度のために、線幅100μm以下の精細な電極を欠陥なく形成するのに困難さがある。これに対して、後者のフォトリソグラフィ法は、電極を精度良く形成できる方法ではあるが、成膜装置本体とその維持等でコストが高くなるという欠点がある。近年は、表示画像の高精細化が進み、画像表示領域の表示用の電極線幅、ピッチも小さくなる傾向にあり、感光性の導電性ペ−ストを用いて、スクリ−ン印刷法で印刷をした後に、フォトリソグラフィ法で精密な所定の寸法を形成する方法も行われるようになっている。
【0005】
【発明が解決しようとする課題】
PDP用の電極の一例を平面模式図として図2に示す。PDP用電極は、画像表示領域にある表示部電極A、表示部に繋がって画像表示領域の外にありコネクタ−に接続するための端子部電極Bと、表示部電極と端子部電極を繋ぐリ−ド部電極Cから構成されている。一般に、PDP用電極をスクリ−ン印刷で形成する場合には、比較的価格が安く導電性の良い銀ペ−ストが使われる。各電極A、B、Cをすべて銀ペ−ストで印刷できれば効率的である。しかし、端子部電極Cに銀ペ−ストを使用した場合には、電極としての銀の耐薬品性に問題があり、また銀のマイグレ−ションにより表示不良を起こし易いという問題がある。この問題点を解決するため、本出願人は、特開2001−357788号公報において、端子部の電極材料を導電性、耐薬品性に優れ、マイグレ−ションの問題が無い金とするPDPを開示している。したがって、図2に示すように、最初に表示部電極Aとリ−ド部電極Cを銀電極11で形成し、端子部内にまで延長した銀電極11に接続して、後続して金電極12で端子部電極Bを形成したPDPが用いられるようになってきている。
【0006】
上記のように、表示部分、リ−ド部分と端子部分を異なる電極材料で形成する場合においては、銀電極部分と金電極部分が十分に接触した状態であることが必要であり、したがって両電極には重なり部分がある。しかしながら、電極が重なることにより新たな技術課題が生じてきた。図6は従来技術による接続部分の電極形状の説明図であり、図6(a)は接続部分の断面模式図、図6(b)は接続部分の平面模式図である。図6に示すように、ガラス基板27上に最初に形成した電極28の上に重ねて、後続して形成する電極29は、最初に形成した電極28の膜厚の影響を受け、後続して形成する電極29が最初に形成した電極と重なった部分30の段差部分の膜厚が薄くなったり、後続して形成する電極のエッジ31の形状が悪くなったりして、電極の信頼性を低下させるという問題があった。
【0007】
そこで、本発明はこのような問題点を解消するためになされたものである。その目的は、最初に形成した電極と後続して形成する電極とが重なる段差部分の膜厚が薄くなったりせず、後続して形成する電極のエッジ形状が良好なPDP用電極の形成方法を提供することである。
【0008】
【課題を解決するための手段】
上記の課題を解決するために、請求項1の発明に係るプラズマディスプレイパネル用電極の形成方法は、基板上に形成され、画像表示領域にある表示部電極と、表示部電極に繋がって画像表示領域の外にありコネクタ−に接続するための端子部電極と、表示部電極と端子部電極とを繋ぐリ−ド部電極からなり、最初に形成する電極の膜厚が後続して形成する電極との接続部分において薄くなっているプラズマディスプレイパネル用電極の形成方法において、最初に形成する電極に感光性導電性ペ−ストを用い、階調を有するフォトマスクでパタ−ン露光し、現像し、焼成して前記接続部分の所定箇所の膜厚を薄くして電極を形成したことを特徴とするものである。
【0009】
請求項に係るプラズマディスプレイパネル用電極の形成方法は、階調を有するフォトマスクにおいて、電極接続部分の電極パタ−ン幅の少なくとも両端部がハ−フト−ンとなっているフォトマスクであることを特徴とするものである。
【0010】
【発明の実施の形態】
以下、図面を参照して本発明の実施形態について説明する。
【0011】
図3は本発明のPDP用電極の形成方法による電極の一実施形態に関する説明図で、基板(図示していない)上にPDP用電極として最初に形成した電極13と、後続して形成した電極14の接続部分を拡大した平面模式図である。基板としては一般にガラス基板が用いられるが、本発明の電極および電極形成方法は、必ずしもガラスに限定されている訳ではなく、基板の透過性を必要としない部位に適用する場合には、セラミック基板等に使用することも可能である。図3では、後続して形成する電極の幅は、最初に形成する電極の幅よりも若干広い場合を示してあるが、それぞれの電極幅は同じでもどちらかが太くてもよい。電極13の接続部分の膜厚は、接続部分15において薄くなった形状をしている。接続部分15の膜厚は、電極13と電極14のペ−スト材料、ペ−スト印刷条件等により若干異なるが、非接続部分の膜厚の略半分程度が好ましいが、それに限定される訳ではなく、電極パタ−ンエッジの段差部分の膜厚が薄くなったりせず、エッジ形状が乱れない膜厚ならば適用可能である。
【0012】
図4は本発明のPDP用電極の形成方法による電極の他の実施形態に関する説明図であり、PDP用電極において、最初に形成した電極16と後続して形成した電極17の接続部分を拡大した平面模式図である。図4(a)においては、電極16の接続部分の膜厚は、中心部18においては非接続部分と同じ膜厚であるが、電極の幅の両端部19においては膜厚が薄くなっている形状をしている。図4(b)においては、電極20の接続部分の膜厚は、中心部22のおよそ中程までは非接続部分と同じ膜厚であるが、電極の幅の両端部と先端部23においては膜厚が薄くなった形状をしている。図4(a)、(b)における接続部分の少なくとも両端部における膜厚は、各々の電極のペ−スト材料、ペ−スト印刷条件等により若干異なるが、非接続部分の膜厚の略半分程度が好ましいが、それに限定される訳ではなく、電極パタ−ンエッジの段差部分の膜厚が薄くなったりせず、エッジ形状が乱れない膜厚ならば適用可能である。また、接続部分の両端部の幅は、重なった電極パタ−ンのエッジの段差部分の膜厚が薄くなったりしない膜厚ならばよく、片側において、最初に形成する電極幅の1/3〜1/5程度が用いられる。図4において、非接続部分と同じ膜厚である接続部分の電極中心部18および22は、後続して形成する電極を重ね合わせた時、電極の長さ方向の位置合わせ誤差を吸収するために設けるものであり、中心部の長さは、接続部分の電極長さの範囲内において任意に設定し得る。
【0013】
本発明において最初に形成する電極は銀電極が好ましく、銀電極を銀ペ−ストで形成する場合には、感光性導電性銀ペ−ストを用いるのが好ましく、通常使用されている感光性導電性銀ペ−ストが適用できる。感光性導電性銀ペ−ストはガラス基板上に、スクリ−ン印刷、ブレ−ドコ−ト、ロ−ルコ−ト、ダイコ−ト、フィルム転写等の方法により行うことができ、乾燥後の感光性導電性ペ−ストの膜厚は1〜10μm程度が好ましい。
【0014】
PDPを構成する基板を製造する場合には、最初に形成する電極は表示部電極およびリ−ド部電極とするのが工程上好ましい。ガラス基板の一面上に、必要に応じて下引き層を設け、上記の塗布方法により感光性導電性ペ−ストをガラス基板上に塗布し、乾燥してから、階調部分を有する最初に形成する電極パタ−ンのフォトマスクにより露光し、現像して、ガラス基板上に表示部電極とリ−ド部電極より構成される焼成前の最初の電極を形成する。
【0015】
感光性導電性ペ−ストは、通常、紫外線により光硬化するネガ型であるので、最初に形成する電極パタ−ンのフォトマスクは、図5にフォトマスクの電極パタ−ン部分を拡大した平面模式図を示すように、電極接続部分の膜厚を薄くする部分のみ紫外線が一定の透過率で透過する階調部分26とし、通常の電極形成部分には遮光層が無くて光透過部24であり、現像により導電性ペ−ストを除去する非電極部分には露光光を透過しない遮光層25を設けた構成をしている。フォトマスクの光透過部24における露光光の透過率を100%とした場合、階調部分26の透過率は20〜80%程度が用いられるが、フォトリソグラフィ工程のプロセス条件の幅を広くするためには、階調部分は透過率50%程度のハ−フト−ンが好ましい。
【0016】
上記の階調を有するフォトマスクとしては、階調表示できる銀塩のエマルジョンマスクやクロムマスク等が例示できる。階調を有するクロムマスクは、成膜時に遮光層の厚さを部分的に時間で制御するマスキング蒸着法やマスキングスパッタリング法、あるいは遮光層成膜後の部分ハ−フエッチング法によりフォトマスクを形成する。光学的に黒の遮光層部分と階調部分の2段階なので、フォトマスクの製造は比較的容易である。
【0017】
次に、ガラス面上に設けられた焼成前の最初の電極の接続部分に位置合わせを行い、後続の電極である端子部電極を形成する。端子部電極としては前述のように、耐薬品性に優れ、マイグレ−ションによる表示不良がない点から金電極が好ましい。金電極を金ペ−ストで形成する場合には、通常用いられている感光性金ペ−ストもしくは非感光性の金ペ−ストのいずれも使用することができる。材料コスト、形成工程の容易さから、非感光性の金ペ−ストを用いてスクリ−ン印刷でパタ−ン形成するのが好ましい。金ペ−ストの乾燥後の膜厚は1〜10μm程度が好ましい。金ペ−ストパタ−ン形成後は、ペ−スト焼成温度で焼成し、ガラス基板上に表示部電極およびリ−ド部電極が銀で、端子部が金の電極を形成する。
【0018】
その後は、従来の方法により、例えば、PDP背面板の場合には、電極を覆うようにして誘電体層を形成し、誘電体層上にリブを設け、リブ間に蛍光体層を形成し、PDP背面板を形成する。
【0019】
【実施例】
PDP用背面板の電極を形成するために、ガラス基板として、大きさ1000mm×600mm、厚さ2.8mmの高歪点ガラス(旭硝子(株)製「PD200」)を用い、感光性銀ペ−スト(デュポン(株)製DC206)を用いて、乳剤厚10μmのスクリ−ン印刷版(東京プロセスサ−ビス(株)製「ST400メッシュ」)にてベタ印刷し、80℃で30分乾燥した。次に、表示部およびリ−ド部の電極線幅60μmのパタ−ンで、端子部との接続部分の両端部が、片側で各々20μm幅で光透過率50%のハ−フト−ン階調を有するフォトマスクにより露光し、0.4%炭酸ナトリウム水溶液にて現像圧1.5kgf/cm2 でスプレ−現像し、銀電極パタ−ンを形成した。接続部分の膜厚は、中心部は非接続部分の膜厚と同じで8μm、両端部は約4μmであった。次に、金ペ−スト(田中貴金属(株)製「TR1451」)を用いて、端子部電極のパタ−ンを有する乳剤厚10μmのスクリ−ン印刷版(ソノコム(株)製「ST400メッシュ」)を最初に形成した銀電極パタ−ンに位置合わせし、スクリ−ン印刷し、120℃、30分乾燥して、電極線幅120μm、膜厚8μmの金電極パタ−ンを形成した。端子部で接続している銀電極と金電極は、接続部分の段差部分の膜厚が薄くなったりしておらず、エッジ形状にも乱れがなかった。次に、600℃にて焼成し、ガラス基板上に表示部電極、リ−ド部電極、端子部電極を形成した。
【0020】
次に、電極を覆うようにして誘電体層を7μmの厚さに形成した。続いて、ダイコ−タ−によりリブ形成材料を塗布し、乾燥させ、リブ形成材料上に設けたレジスト膜からなるマスクを介して、サンドブラスト法によりリブ形成材料を切削し、リブ形成材料をパタ−ン化した。続いて、レジスト膜を剥膜し、リブ焼成工程を経て、ガラス基板上に電極層、誘電体層、リブを設けた基板を形成した。
【0021】
次に、後工程として、PDP用として使用される通常の蛍光体をスクリ−ン印刷し、焼成して、それぞれのリブ間に赤色、緑色、青色の蛍光体層を形成し、PDP用背面板を得た。
【0022】
このPDP用背面板と、別途作製した前面板を貼り合せて封着してパネルとし、画像表示を行なったところ、高品質、高精細な画像を表示できた。
【0023】
【発明の効果】
本発明のPDP用電極の形成方法によるPDP用電極は、耐薬品性に優れ、銀のマイグレ−ションによるトラブルが無く、電極接続部分の段差部分の膜厚が薄くなったりせず、エッジ形状が良好な電極形状であり、高品質、高精細な画像表示に適している。また、本発明によるPDP用電極の形成方法は、感光性導電性ペ−ストと階調を有するフォトマスクを用いることにより、膜厚の異なる高精細の電極を1回の露光、現像で形成することができるという工程面、品質面での利点がある。
【図面の簡単な説明】
【図1】 AC型PDPの一構成例を示す分解斜視図
【図2】 PDP用電極パタ−ンの一構成例の説明図
【図3】 本発明のPDP電極の形成方法による電極形状を示す説明図
【図4】 本発明のPDP電極の形成方法による電極形状の他の例を示す説明図
【図5】 本発明の階調を有するフォトマスクの部分拡大図
【図6】 従来技術による電極形状の説明図
【符号の説明】
1、2 ガラス基板
3 リブ
4 放電維持電極
5 バス電極
6、9 誘電体層
7 保護層(MgO層)
8 アドレス電極
10 蛍光体層
11 銀電極
12 金電極
13、16、20、28 最初に形成した電極
14、17、21、29 次に形成した電極
15、30 電極が重なった部分
18、22 接続部分の電極中心部
19 接続部分の電極の幅の両端部
23 接続部分の電極の幅の両端部と先端部
24 光透過部
25 遮光層
26 階調部分
27 ガラス基板
31 次に形成した電極のエッジの乱れ
[0001]
BACKGROUND OF THE INVENTION
The present invention includes a plasma display panel (hereinafter, referred to as PDP) relates to the technical field of, more particularly, to a method of forming electrodes for PDP.
[0002]
[Prior art]
In recent years, plasma display panels (hereinafter referred to as PDPs) are being used in various display devices due to their thin depth, light weight, clear display, and wide viewing angle. In general, a PDP has a structure in which a pair of electrodes regularly arranged on two opposing glass substrates are provided, and a gas mainly composed of neon, xenon, or the like is enclosed therebetween. Then, a voltage is applied between these electrodes, and discharge is generated in minute cells around the electrodes, thereby causing each cell to emit light for display. In particular, in order to display information, the regularly arranged cells are selectively discharged to emit light.
[0003]
Here, the configuration of the PDP will be described with reference to an example of the AC type PDP shown in FIG. FIG. 1 is a perspective view of a PDP configuration, but for the sake of clarity, the front plate (glass substrate 1) and the back plate (glass substrate 2) are shown separated from each other. As shown in the drawing, two glass substrates 1 and 2 are arranged in parallel and facing each other, and both are ribs (also referred to as barriers) 3 provided in parallel to each other on a glass substrate 2 serving as a back plate. By this, it is held at a constant interval. On the back side of the glass substrate 1 serving as a front plate, composite electrodes composed of a discharge sustaining electrode 4 made of a transparent electrode and a bus electrode 5 made of a metal electrode are formed in parallel to each other, covering the dielectric layer 6 is formed, and a protective layer 7 (MgO layer) is further formed thereon. Further, on the front side of the glass substrate 2 serving as the back plate, address electrodes 8 are formed in parallel with each other so as to be positioned between the ribs 3 so as to be orthogonal to the composite electrode. 9 is formed, and a phosphor 10 is provided so as to cover the wall surface of the rib 3 and the cell bottom surface. The rib 3 is for partitioning the discharge space, and each partitioned discharge space is called a cell or a unit light emitting region. The AC type PDP is a surface discharge type, and has a structure in which an AC voltage is applied between the composite electrodes on the front plate to discharge. In this case, since alternating current is applied, the direction of the electric field changes corresponding to the frequency. And the fluorescent substance 10 is light-emitted by the ultraviolet-ray which arises by this discharge, and an observer visually recognizes the light which permeate | transmits a front plate. The DC type PDP is different from the AC type in that the electrode has a structure not covered with a dielectric layer, but the discharge effect is the same.
[0004]
As a method for forming an electrode in the PDP as described above, there are the following two broad methods. That is, one is a method of forming a pattern by a screen printing method using a conductive thick film paste, and the other is a method for forming a pattern on a glass substrate by a vacuum deposition method, a sputtering method, a plating method or the like. A method of forming a conductive metal thin film and patterning it by photolithography is known. Among these, although the former screen printing method has an advantage that the electrodes can be formed relatively easily, there is a defect that the size and thickness of the electrodes vary depending on the manufacturing accuracy. It is difficult to form the electrodes as designed due to the distortion of the screen plate. Further, due to the size of the screen plate mesh and the processing accuracy of the emulsion, it is difficult to form fine electrodes having a line width of 100 μm or less without defects. On the other hand, the latter photolithography method is a method capable of forming electrodes with high accuracy, but has a drawback that the cost increases due to the main body of the film forming apparatus and its maintenance. In recent years, the resolution of display images has increased, and the electrode line width and pitch for display in the image display area tend to be reduced. Printing using a photosensitive conductive paste is performed by the screen printing method. After the process, a method for forming a precise predetermined dimension by a photolithography method is also performed.
[0005]
[Problems to be solved by the invention]
An example of the electrode for PDP is shown in FIG. 2 as a schematic plan view. The electrode for PDP is connected to the display unit electrode A in the image display region, the terminal unit electrode B connected to the connector outside the image display region and connected to the connector, and the connection unit connecting the display unit electrode and the terminal unit electrode. -It is comprised from the part electrode C. Generally, when a PDP electrode is formed by screen printing, a silver paste having a relatively low cost and good conductivity is used. It is efficient if all the electrodes A, B, and C can be printed with silver paste. However, when a silver paste is used for the terminal part electrode C, there is a problem in the chemical resistance of silver as an electrode, and there is a problem that a display defect is liable to occur due to silver migration. In order to solve this problem, the present applicant discloses in Japanese Patent Application Laid-Open No. 2001-357788 a PDP in which the electrode material of the terminal portion is gold that is excellent in conductivity and chemical resistance and has no problem of migration. is doing. Therefore, as shown in FIG. 2, first, the display portion electrode A and the lead portion electrode C are formed by the silver electrode 11 and connected to the silver electrode 11 extending into the terminal portion, and then the gold electrode 12 Thus, a PDP in which the terminal electrode B is formed has been used.
[0006]
As described above, when the display portion, the lead portion, and the terminal portion are formed of different electrode materials, it is necessary that the silver electrode portion and the gold electrode portion be in sufficient contact with each other. Has an overlap. However, new technical problems have arisen due to the overlapping of electrodes. FIG. 6 is an explanatory diagram of the electrode shape of the connection portion according to the prior art, FIG. 6A is a schematic cross-sectional view of the connection portion, and FIG. 6B is a schematic plan view of the connection portion. As shown in FIG. 6, the electrode 29 that is subsequently formed on the electrode 28 that is first formed on the glass substrate 27 is affected by the film thickness of the electrode 28 that is initially formed, and subsequently The thickness of the stepped portion of the portion 30 where the electrode 29 to be formed overlaps the electrode formed first becomes thin, or the shape of the edge 31 of the electrode to be formed subsequently deteriorates, reducing the reliability of the electrode There was a problem of letting.
[0007]
Accordingly, the present invention has been made to solve such problems. Its purpose is not or initially followed the formed electrode thin film thickness of the step portion and the electrode are overlapped to form, method of forming subsequently the electrode edge shape formed by favorable for PDP electrodes Is to provide.
[0008]
[Means for Solving the Problems]
In order to solve the above-described problem, a method for forming an electrode for a plasma display panel according to the invention of claim 1 is formed on a substrate and is connected to the display unit electrode and the display unit electrode in the image display region, and displays an image. An electrode formed of a terminal part electrode for connecting to a connector outside the region, and a lead part electrode for connecting the display part electrode and the terminal part electrode, and the film thickness of the electrode formed first is subsequently formed In the method of forming an electrode for a plasma display panel that is thinned at the connection portion with a photosensitive conductive paste on the first electrode to be formed, pattern exposure is performed with a photomask having gradation, and development is performed. The electrode is formed by firing and reducing the film thickness at a predetermined portion of the connection portion.
[0009]
The method for forming an electrode for a plasma display panel according to claim 2 is a photomask having a gradation, wherein at least both ends of the electrode pattern width of the electrode connection portion are halftone. It is characterized by this.
[0010]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
[0011]
FIG. 3 is an explanatory view of an embodiment of an electrode according to the method for forming an electrode for PDP of the present invention. An electrode 13 formed first as an electrode for PDP on a substrate (not shown) and an electrode formed subsequently. It is the plane schematic diagram which expanded 14 connection parts. As a substrate, a glass substrate is generally used. However, the electrode and the electrode forming method of the present invention are not necessarily limited to glass, and when applied to a portion that does not require the transparency of the substrate, a ceramic substrate. It is also possible to use it. FIG. 3 shows a case where the width of the electrode to be formed subsequently is slightly wider than the width of the electrode to be formed first, but each electrode width may be the same or either may be thicker. The thickness of the connection portion of the electrode 13 is reduced at the connection portion 15. The thickness of the connecting portion 15 is slightly different depending on the paste material of the electrode 13 and the electrode 14, paste printing conditions, etc., but is preferably about half of the thickness of the non-connecting portion, but is not limited thereto. The film thickness of the step portion of the electrode pattern edge is not reduced and the edge shape is not disturbed.
[0012]
FIG. 4 is an explanatory view of another embodiment of the electrode according to the method for forming a PDP electrode of the present invention. In the PDP electrode, the connection portion between the electrode 16 formed first and the electrode 17 formed subsequently is enlarged. It is a plane schematic diagram. In FIG. 4A, the thickness of the connection portion of the electrode 16 is the same as that of the non-connection portion in the central portion 18, but the thickness is reduced at both end portions 19 of the width of the electrode. It has a shape. In FIG. 4B, the thickness of the connecting portion of the electrode 20 is the same as that of the non-connecting portion up to about the middle of the center portion 22, but at both ends of the electrode width and the tip portion 23. The shape is reduced in film thickness. 4 (a) and 4 (b), the film thicknesses at least at both ends of the connection portion are slightly different depending on the paste material, paste printing conditions, etc. of each electrode, but are approximately half of the film thickness of the non-connection portion. However, the present invention is not limited to this, and the present invention can be applied to any film thickness where the thickness of the step portion of the electrode pattern edge does not become thin and the edge shape is not disturbed. Further, the width of both ends of the connecting portion may be a thickness that does not reduce the thickness of the stepped portion of the edge of the overlapped electrode pattern, and on one side, 1/3 to 1/3 of the width of the electrode formed first. About 1/5 is used. In FIG. 4, the electrode center portions 18 and 22 of the connection portion having the same film thickness as the non-connection portion absorb the alignment error in the length direction of the electrode when the electrodes to be formed subsequently are overlapped. The length of the center portion can be arbitrarily set within the range of the electrode length of the connection portion.
[0013]
In the present invention, the first electrode formed is preferably a silver electrode. When the silver electrode is formed of silver paste, it is preferable to use a photosensitive conductive silver paste. A silver paste can be applied. The photosensitive conductive silver paste can be formed on a glass substrate by methods such as screen printing, blade coating, roll coating, die coating, film transfer, and the like. The film thickness of the conductive conductive paste is preferably about 1 to 10 μm.
[0014]
When manufacturing the substrate constituting the PDP, it is preferable in the process that the electrode to be formed first is a display part electrode and a lead part electrode. An undercoat layer is provided on one surface of the glass substrate as required, and a photosensitive conductive paste is applied on the glass substrate by the above-described application method, dried, and then formed first with a gradation portion. Then, exposure is performed using a photomask having an electrode pattern to be developed, and development is performed to form a first electrode before firing composed of a display portion electrode and a lead portion electrode on a glass substrate.
[0015]
Since the photosensitive conductive paste is usually a negative type photocured by ultraviolet rays, the photomask of the electrode pattern to be formed first is a plane obtained by enlarging the electrode pattern portion of the photomask in FIG. As shown in the schematic diagram, only the portion where the film thickness of the electrode connecting portion is thinned is a gradation portion 26 through which ultraviolet rays are transmitted with a constant transmittance, and the normal electrode forming portion does not have a light shielding layer and the light transmitting portion 24 In other words, the non-electrode portion from which the conductive paste is removed by development is provided with a light shielding layer 25 that does not transmit exposure light. When the transmittance of exposure light in the light transmitting portion 24 of the photomask is 100%, the transmittance of the gradation portion 26 is about 20 to 80%. However, in order to widen the range of process conditions in the photolithography process. For the gradation portion, halftone having a transmittance of about 50% is preferable.
[0016]
Examples of the photomask having the above gradation include a silver salt emulsion mask and a chrome mask that can display gradation. For chrome masks with gradations, a photomask is formed by masking vapor deposition or masking sputtering, which partially controls the thickness of the light-shielding layer in time during film formation, or by partial half-etching after the light-shielding layer is formed To do. Since the optically black light shielding layer portion and the gradation portion are two stages, the photomask can be manufactured relatively easily.
[0017]
Next, alignment is performed on a connection portion of the first electrode before firing provided on the glass surface, and a terminal electrode as a subsequent electrode is formed. As described above, the terminal electrode is preferably a gold electrode because it is excellent in chemical resistance and does not have a display defect due to migration. When the gold electrode is formed from a gold paste, either a commonly used photosensitive gold paste or non-photosensitive gold paste can be used. In view of material cost and ease of forming process, it is preferable to form a pattern by screen printing using a non-photosensitive gold paste. The thickness of the gold paste after drying is preferably about 1 to 10 μm. After the gold paste pattern is formed, firing is performed at a paste firing temperature, and a display portion electrode and a lead portion electrode are made of silver and a terminal portion is made of gold on a glass substrate.
[0018]
Thereafter, according to a conventional method, for example, in the case of a PDP back plate, a dielectric layer is formed so as to cover the electrode, a rib is provided on the dielectric layer, a phosphor layer is formed between the ribs, A PDP back plate is formed.
[0019]
【Example】
In order to form the electrode of the back plate for PDP, a high-strain point glass (“PD200” manufactured by Asahi Glass Co., Ltd.) having a size of 1000 mm × 600 mm and a thickness of 2.8 mm was used as a glass substrate. Using a strike (DC206 manufactured by DuPont), solid printing was performed on a screen printing plate having an emulsion thickness of 10 μm (“ST400 mesh” manufactured by Tokyo Process Services Co., Ltd.) and dried at 80 ° C. for 30 minutes. . Next, in the pattern where the electrode line width of the display part and the lead part is 60 μm, both ends of the connection part with the terminal part are each 20 μm wide on one side, and the half level where the light transmittance is 50%. The film was exposed with a photomask having a tone and spray developed with a 0.4% sodium carbonate aqueous solution at a development pressure of 1.5 kgf / cm 2 to form a silver electrode pattern. The thickness of the connecting portion was 8 μm at the center and the thickness of the non-connecting portion, and about 4 μm at both ends. Next, using a gold paste ("TR1451" manufactured by Tanaka Kikinzoku Co., Ltd.), a screen printing plate having an emulsion thickness of 10 [mu] m having a terminal electrode pattern ("ST400 mesh" manufactured by Sonocom Co., Ltd.). ) Was aligned with the silver electrode pattern formed first, screen printed, and dried at 120 ° C. for 30 minutes to form a gold electrode pattern having an electrode line width of 120 μm and a film thickness of 8 μm. In the silver electrode and the gold electrode connected at the terminal portion, the thickness of the stepped portion of the connecting portion was not thinned, and the edge shape was not disturbed. Next, it baked at 600 degreeC and the display part electrode, the lead part electrode, and the terminal part electrode were formed on the glass substrate.
[0020]
Next, a dielectric layer was formed to a thickness of 7 μm so as to cover the electrodes. Subsequently, the rib forming material is applied by a die coater, dried, and the rib forming material is cut by sand blasting through a mask made of a resist film provided on the rib forming material. Turned into Subsequently, the resist film was peeled off, and a substrate provided with an electrode layer, a dielectric layer, and ribs on a glass substrate was formed through a rib firing step.
[0021]
Next, as a post-process, a normal phosphor used for PDP is screen-printed and baked to form red, green, and blue phosphor layers between the ribs. Got.
[0022]
When this PDP back plate and a separately manufactured front plate were bonded and sealed to form a panel and image display was performed, a high-quality, high-definition image could be displayed.
[0023]
【The invention's effect】
The electrode for PDP by the method for forming the electrode for PDP of the present invention has excellent chemical resistance, no trouble due to silver migration, the film thickness of the stepped portion of the electrode connecting portion does not become thin, and the edge shape is Good electrode shape, suitable for high-quality, high-definition image display. In the method for forming a PDP electrode according to the present invention, high-definition electrodes having different film thicknesses are formed by a single exposure and development by using a photosensitive conductive paste and a photomask having gradation. There are advantages in terms of process and quality.
[Brief description of the drawings]
FIG. 1 is an exploded perspective view showing a configuration example of an AC type PDP. FIG. 2 is an explanatory view of a configuration example of an electrode pattern for a PDP. FIG. 3 shows an electrode shape according to the method for forming a PDP electrode of the present invention. Explanatory drawing [FIG. 4] Explanatory drawing which shows the other example of the electrode shape by the formation method of the PDP electrode of this invention [FIG. 5] The partial enlarged view of the photomask which has the gradation of this invention [FIG. 6] The electrode by a prior art Illustration of shape [Explanation of symbols]
1, 2 Glass substrate 3 Rib 4 Discharge sustaining electrode 5 Bus electrode 6, 9 Dielectric layer 7 Protective layer (MgO layer)
8 Address electrode 10 Phosphor layer 11 Silver electrode 12 Gold electrode 13, 16, 20, 28 First formed electrode 14, 17, 21, 29 Next formed electrode 15, 30 Port overlapped portion 18, 22 Connection portion Electrode center portion 19 both ends of electrode width of connection portion 23 both ends and tip portion of electrode width of connection portion 24 light transmission portion 25 light shielding layer 26 gradation portion 27 glass substrate 31 edge of electrode formed next Disorder

Claims (2)

基板上に形成され、画像表示領域にある表示部電極と、表示部電極に繋がって画像表示領域の外にありコネクタ−に接続するための端子部電極と、表示部電極と端子部電極とを繋ぐリ−ド部電極からなり、最初に形成する電極の膜厚が後続して形成する電極との接続部分において薄くなっているプラズマディスプレイパネル用電極の形成方法において、最初に形成する電極に感光性導電性ペ−ストを用い、階調を有するフォトマスクでパタ−ン露光し、現像し、焼成して前記接続部分の所定箇所の膜厚を薄くして電極を形成したことを特徴とするプラズマディスプレイパネル用電極の形成方法。A display unit electrode formed on the substrate and in the image display region; a terminal unit electrode connected to the display unit electrode and connected to the connector outside the image display region; and the display unit electrode and the terminal unit electrode In the method of forming an electrode for a plasma display panel, which is composed of lead electrodes connected to each other, and the film thickness of the first electrode formed is thin at the connection part with the electrode to be subsequently formed, the first electrode formed is exposed to light. The electrode is formed by pattern exposure using a conductive paste, pattern exposure with a photomask having gradation, development, and baking to reduce the film thickness at a predetermined portion of the connection portion. method of forming a pulp plasma display panel electrode. 前記階調を有するフォトマスクにおいて、電極接続部分の電極パタ−ン幅の少なくとも両端部がハ−フト−ンとなっているフォトマスクであることを特徴とする請求項に記載のプラズマディスプレイパネル用電極の形成方法。2. The plasma display panel according to claim 1 , wherein the photomask having the gradation is a photomask in which at least both ends of the electrode pattern width of the electrode connection portion are half-tone. For forming an electrode.
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