JP3948506B2 - ポジ型フォトレジスト組成物 - Google Patents

ポジ型フォトレジスト組成物 Download PDF

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Publication number
JP3948506B2
JP3948506B2 JP32134799A JP32134799A JP3948506B2 JP 3948506 B2 JP3948506 B2 JP 3948506B2 JP 32134799 A JP32134799 A JP 32134799A JP 32134799 A JP32134799 A JP 32134799A JP 3948506 B2 JP3948506 B2 JP 3948506B2
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JP
Japan
Prior art keywords
group
positive photoresist
alicyclic hydrocarbon
alkyl group
photoresist composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP32134799A
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English (en)
Japanese (ja)
Other versions
JP2001142212A5 (https=
JP2001142212A (ja
Inventor
利明 青合
健一郎 佐藤
邦彦 児玉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP32134799A priority Critical patent/JP3948506B2/ja
Publication of JP2001142212A publication Critical patent/JP2001142212A/ja
Publication of JP2001142212A5 publication Critical patent/JP2001142212A5/ja
Application granted granted Critical
Publication of JP3948506B2 publication Critical patent/JP3948506B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP32134799A 1999-11-11 1999-11-11 ポジ型フォトレジスト組成物 Expired - Lifetime JP3948506B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32134799A JP3948506B2 (ja) 1999-11-11 1999-11-11 ポジ型フォトレジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32134799A JP3948506B2 (ja) 1999-11-11 1999-11-11 ポジ型フォトレジスト組成物

Publications (3)

Publication Number Publication Date
JP2001142212A JP2001142212A (ja) 2001-05-25
JP2001142212A5 JP2001142212A5 (https=) 2005-07-14
JP3948506B2 true JP3948506B2 (ja) 2007-07-25

Family

ID=18131578

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32134799A Expired - Lifetime JP3948506B2 (ja) 1999-11-11 1999-11-11 ポジ型フォトレジスト組成物

Country Status (1)

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JP (1) JP3948506B2 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4358940B2 (ja) * 1999-08-26 2009-11-04 丸善石油化学株式会社 シクロヘキサンラクトン構造を有する重合性化合物及び重合体
TW581941B (en) * 2001-06-21 2004-04-01 Fuji Photo Film Co Ltd Positive resist composition
JP4727092B2 (ja) * 2001-09-10 2011-07-20 東京応化工業株式会社 化学増幅型レジスト組成物
JP4149154B2 (ja) * 2001-09-28 2008-09-10 富士フイルム株式会社 ポジ型レジスト組成物
JP3827290B2 (ja) * 2001-10-03 2006-09-27 富士写真フイルム株式会社 ポジ型感光性組成物
JP3836359B2 (ja) 2001-12-03 2006-10-25 東京応化工業株式会社 ポジ型レジスト組成物及びレジストパターン形成方法
US7015291B2 (en) 2002-04-01 2006-03-21 Daicel Chemical Industries, Ltd. Process for the production of high-molecular compounds for photoresist
US7338740B2 (en) 2003-03-27 2008-03-04 Fujifilm Corporation Positive resist composition
US7279265B2 (en) 2003-03-27 2007-10-09 Fujifilm Corporation Positive resist composition and pattern formation method using the same
JP4347110B2 (ja) 2003-10-22 2009-10-21 東京応化工業株式会社 電子線又はｅｕｖ用ポジ型レジスト組成物
JP2006030532A (ja) * 2004-07-15 2006-02-02 Tokyo Ohka Kogyo Co Ltd レジスト組成物およびレジストパターン形成方法
JP5148882B2 (ja) * 2007-01-18 2013-02-20 株式会社ダイセル レジスト組成物

Also Published As

Publication number Publication date
JP2001142212A (ja) 2001-05-25

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