JP3923761B2 - Wet treatment apparatus and wet treatment system - Google Patents

Wet treatment apparatus and wet treatment system Download PDF

Info

Publication number
JP3923761B2
JP3923761B2 JP2001274245A JP2001274245A JP3923761B2 JP 3923761 B2 JP3923761 B2 JP 3923761B2 JP 2001274245 A JP2001274245 A JP 2001274245A JP 2001274245 A JP2001274245 A JP 2001274245A JP 3923761 B2 JP3923761 B2 JP 3923761B2
Authority
JP
Japan
Prior art keywords
wet processing
liquid
carry
port
tubular member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2001274245A
Other languages
Japanese (ja)
Other versions
JP2003081423A (en
Inventor
健一 三森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alps Alpine Co Ltd
Original Assignee
Alps Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alps Electric Co Ltd filed Critical Alps Electric Co Ltd
Priority to JP2001274245A priority Critical patent/JP3923761B2/en
Publication of JP2003081423A publication Critical patent/JP2003081423A/en
Application granted granted Critical
Publication of JP3923761B2 publication Critical patent/JP3923761B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Landscapes

  • Surface Treatment Of Optical Elements (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • ing And Chemical Polishing (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は、機械、電子、光学等の分野における微小部品のウエット処理(洗浄、エッチング、メッキ、現像、剥離、研磨等)を行う装置に関するものである。
【0002】
【従来の技術】
機械、電子、光学等の分野において、微小部品の工業的規模における洗浄その他のウェット処理には図6に示す如きウエット処理装置が採用されている。ここで微小部品の例としては、研削加工後のフェライト等の磁気応用部品や光学機器用の小型レンズ等が代表的なものである。
図6の装置では、金網あるいは専用の保持容器35に入れられた被処理物2を、処理液5を溜めた処理槽3の中に浸漬し、処理槽3の底部に設置された超音波振動子4からの超音波を被処理物2に作用させてウェット処理を行う。汚れの除去を目的とする洗浄処理の場合には、処理槽3、リンス槽41、乾燥槽42が少なくとも設けられ、被処理物2を図の矢印の方向に搬送しながらそれぞれの処理を行う。
【0003】
【発明が解決しようとする課題】
上記構成の装置においては、スループット(単位時間あたりの処理量)を上げるという目的から、一度に多数個の被洗浄物2を保持容器35に入れ、その容器を搬送機で吊り上げて移動させながら各槽内の液に浸漬する方法を取っている。このような方法のウェット処理では、保持容器35の中の処理液の流れを均一にすることが難しく、偏った流れによりいわゆるデッドスペースが発生して、処理が不均一となりがちである。
【0004】
この問題を回避する為に、従来例のウェット処理装置では、保持容器35を充分に大きくして内部の空間を広くし処理液を流れ易くする、各槽を大き目に設計して被処理物2の容積に比べて多い処理液を保持し、上下左右の揺動機構、あるいは液循環機構を付与する、等の設計を取り入れている。したがって、装置が大型化して占有面積が大きく且つ構造は複雑となり、扱う処理液やリンス液等の使用量が多く、その結果として消費電力も多くなることが避けられなかった。
【0005】
磁気応用製品の部品、あるいは微小光学部品等のウエット処理は、本来ゴミ、ほこり等の汚染を嫌うものであり、近年では、クリーンルームでの処理が一般的になってきている。そのような背景から、上述の、装置が大型で消費電力が大きい、という問題点の解決が緊急の課題として認識されるようになってきた。
【0006】
本発明は、上記の課題を解決する為に成されたものであって、小型で装置の占有面積が小さく、少ない処理液量でも各被処理物の均一な処理が可能で、且つスループットを低下させないように連続して被処理物を処理できるウェット処理装置を提供することを目的としている。
【0007】
【課題を解決するための手段】
発明者らは、処理装置の構造を種々検討した結果、処理液の表面張力による液面の形成を利用して、被処理物が通過できる幅の間隙に処理液の滞留部を形成することが可能であり、被処理物を、その滞留部の中を通過させながら処理する装置で目的を達成できることを見い出し、提案するものである。
【0008】
すなわち、本発明は、両端を被処理物の搬入口、搬出口とされ、処理液のそれぞれ供給部と排出部となる開口部が少なくとも一つずつ設けられた管状部材と、前記管状部材内部に、前記搬入口、搬出口に大気と接する液面を有するように形成されたウェット処理用の処理液の滞留部と、前記被処理物を前記搬入口から前記搬出口へと管状部材内を搬送する搬送機構と、前記液面を壊さないよう前記滞留部の前記処理液の圧力を調整する圧力調整手段とを有し、前記被処理液が内部に保たれるよう、前記管状部材の両端の内側下面に両端に向かって傾斜がつけられており、前記管状部材内における前記被処理物の搬送方向と前記処理液を流す方向とが反対である、多数の前記被処理物を前記滞留部の内部に搬送して前記多数の被処理物に対して連続的にウェット処理を行うウェット処理装置である。この構成とすることにより、液面を保つための表面張力は小さな値でよく、表面張力が比較的小さい処理液の場合でも安定した液面を形成することができ、小型で且つ少ない処理液量でも各被処理物の均一な処理が可能な、高スループットのウェット処理装置となる。
【0009】
本発明は、前記搬送機構が、前記管状部材を貫通して前記被洗浄物を搬送するベルトを有する事を特徴とするウェット処理装置である。また、前記搬送機構は、被処理物を逐次搬入口より導入し、後から送り込む被処理物で先に導入した被処理物を押す事により前記被処理物を搬入口から前記搬出口へと管状部材内を搬送するものでもよい
【0010】
また本発明は、前記構成部材として、水平に置かれた管状部材を用いても良い。滞留部の周方向は壁で規制され液面は軸方向だけとなるので、滞留部はさらに安定する。また本発明は、前記構成部材が、ほぼ水平に置かれた断面円の管状部材を用いても良い。断面が円であることは、軸方向の液面が最も安定する形状である。
【0011】
また本発明は、前記構成部材の外面の、前記滞留部に対応する位置に超音波振動装置が取り付けられることにより、超音波振動の効果でウット処理の効率が向上する。
【0012】
さらに本発明は、前記管状部材の両端の開口部の一方を前記被処理物の搬入口、他方を搬出口とし、前記被処理物は前記搬入口から前記搬出口へ搬送されるようにすることで、ウェット処理のスループットが向上する。さらに本発明は、ウェット処理装置の前記搬出口の直後に、エアーナイフを有する乾燥部を設けたことを特徴とするウェット処理システムである。ウェット処理から乾燥までを連続して行うことから、より効率的な処理が可能となる。
【0013】
【発明の実施の形態】
【第1の実施の形態】
図1は、本発明のウエット処理装置の主要部分の外形図であり、構成部材として矩形断面の管状部材1を用いた例を示している。管状部材1には処理液の供給口11、排出口12が設けられて、ほぼ水平に保持されており、本発明の特長であるウエット処理液の滞留部33は、管状部材1の内部に形成されている。図においては、被処理物の搬送機構は省略している。
図2は、本発明のウエット処理装置の、被処理物2の搬送機構を含めた全体を、管状部材1の長手方向断面で示した図である。管状部材1の両端の開口部13、14は、それぞれ被処理物2の搬入口、搬出口ともなっている。6は被処理物2を搬送するベルト、4は超音波振動子である。なお、超音波振動子4は管状部材1の図における下部21に取りつけられても良い。
【0014】
処理液は処理液供給口11より供給され、排出口12より排出される。図示はしていないが、本発明のウェット処理装置には処理液の供給ポンプ及び排出ポンプが設けられおり、それぞれ供給口11、排出口12と繋がっている。これらのポンプの操作により処理液の供給と排出が行われる。一方、被処理物2は搬入口13より導入されて搬出口14に向けて搬送され、処理液の滞留部33を通る間に超音波振動子4からの超音波の作用を受けウェット処理がなされる。
【0015】
処理液の圧力は、滞留部33内に置かれた圧力センサー50によりモニタされ、図示しない圧力調整手段で処理液の供給圧力と排出(吸引)圧力のバランスを取ることにより、適当な範囲内となるように調整される。これにより滞留部33での処理液の圧力は、処理液の表面張力によって開口部13、14に形成される液面を壊さない範囲に制御され、滞留部33が安定して保持される。その結果、装置外に運び出される処理液は、被処理物2及びベルト6に付着するものだけであり、処理液の大部分は排出口12から回収される。処理液供給口11、排出口12、の近傍には整流機構を設けることが好ましく、本実施例では、供給口11、排出口12の両方にそれぞれの整流機構9a、9bが図の位置に取り付けられている。
【0016】
本発明の装置で処理する被処理物2として、径3mm、長さ2mm程度の大きさのセラミック部品を例にとると、このような部品の処理、例えば洗浄では、管状部材1の内寸法は幅4mm、高さ5mm程度となる。管状部材1の長さは、処理する状態により決まるが、比較的汚染量の少ない被処理物の洗浄処理の場合では200mm程度としている。超音波振動子は幅35mm、長さ165mmの200KHz振動子を用いている。この場合の処理(洗浄)液量は、管状部材1内の滞留分で僅か4ccである。被洗浄物2を毎秒2乃至3mmで搬送させると洗浄時間は約1秒となり、洗浄液は、被洗浄物2と反対方向に毎秒約3mmの速度で流すことが必要になる。その場合、洗浄液の供給量は3.6cc/min.程度となり、従来例と比較して極めて少ない液量で充分な洗浄効果が得られる。
【0017】
本実施形態では、両端の開口部の鉛直方向寸法を8mm以下とし、洗浄液としては、純水、水素溶解水(水素ガスを溶存させた水)、オゾン水(オゾンガスを溶存させた水)等を用いる。これらの洗浄液は、常温では水に近い表面張力を示し、ほぼ74dyn/cmであることから、鉛直方向寸法8mm以下の間隙内に、液面が安定して形成される。即ち、洗浄液は管状部材1両端の開口部13、14からほとんどこぼれ落ちることがなく、その状態で被洗浄物2の洗浄が可能である。
【0018】
被処理物2を搬送するベルト6は、ステンレス製で板厚は0.05mm、幅は3mm、長さは500mmとした。ベルトは大きな二つのプーリー7a、7b及び小さな二つのプーリー8a、8bで、一定速度で動かす。本実施例では、3mm/sec.とした。
被処理物2を搬送するベルト6は他の搬送手段で置き換えても良い。例えば、被処理物2を逐次搬入口13より導入し、後から送り込む被処理物2で先に導入した被処理物2を押すことで搬送することでも良い。
【0019】
本実施形態において、リンスは、同じ形態の装置を上述の処理装置に連結して行なうことができる。即ち処理液がリンス液に代わるだけで、全く同様の操作でリンスを行えば良い。また、ウェット処理装置の搬出口の直後に乾燥部を設けてウェット処理システムを構成することにより、ウェット処理から乾燥までを連続して行うことができ、より効率的な処理が可能となる。
【0020】
ここで乾燥部としては、従来用いられているエアーナイフを有するものが、本発明のウェット処理装置と好適に組み合わされて用いられる。あるいは、本発明のウェット処理装置と同じ形態の装置を、管状部材1内に乾燥空気を流して小型の乾燥機として用いる方法でも良い。
【0021】
従来の、処理槽、リンス槽、乾燥槽を並置する一般的な処理装置では、各槽の容積は小さいものでも約0.01m3程度であり、装置全体のの大きさは、長さ4m、幅1m、高さ2m程度であった。本発明のウェット処理装置では、処理、リンス、乾燥の全工程を含めても、長さ、幅、高さとも、縦来装置の1/10以下にできる。つまり装置体積としては、1/1000以下とすることが可能である。
【0022】
【第2の実施の形態】
本発明の第2の実施形態のウェット処理装置を図3に示す。第1の実施の形態と共通の部材には共通の符号を付与している。図4は、本実施形態で用いる管状部材1の両端の開口部13、14の拡大図である。
本実施形態においては、管状部材1の両端で下面に傾斜をつけることにより、開口部13,14での液面が図4に示す様に水平に近くなっていることが特徴である。実質的な間隙の寸法はhとなり、管の内幅寸法dよりも小さくなることから、液面を保つための表面張力は、第1の実施の形態の場合よりも小さな値でよい。従って、表面張力が比較的小さい処理液の場合でも、安定した液面を形成することができる。洗浄液としては例えばIPA(イソプロピルアルコール)、エチルアルコール、アセトン、のようなものを用いる場合に有効である。装置構成は、被処理物を搬送するベルト6を傾斜に合わせた角度にするだけが第1の実施の形態との違いであり、操作は全く同一である。
【0023】
以上の説明においては、管状部材1を断面矩形の管としているが、勿論その形状に限られるものではない。被処理物の2の形状に適合するのものであれば、図5に示すように断面が円の管とする方が、滞留部33の液面はより安定する。この場合、鉛直方向の直径の位置で切断した断面は、第1および第2の実施形態に対応して、図2、図3と全く同一となる。
【0024】
【発明の効果】
以上説明のように、本発明のウェット処理装置は、同程度の処理能力を有する従来例と比較して、装置が占有する空間容積が極めて小さく、極小型の処理装置とすることができる。また、デッドスペースが減少することで、使用する処理液の量も大幅に節減できる。しかも、装置外に持ち出される処理液は僅かでその大部分を回収することができるため、廃液量を低減させるという効果も有している。
【図面の簡単な説明】
【図1】本発明のウエット処理装置の、第1の実施形態を示す外形図である。
【図2】本発明のウエット処理装置の、第1の実施形態を示す断面図である。
【図3】本発明のウエット処理装置の、第2の実施形態を示す断面図である。
【図4】図3におけるA部の拡大図である。
【図5】本発明の他の実施の形態を示す図である。
【図6】従来のウエット処理装置概要説明図のである。
【符号の説明】
1 管状部材
2 被処理物
3 処理層
4 超音波振動子
5 処理液
6 ベルト
7a、7b プーリー(大)
8a、8b プーリー(小)
9a、9b 整流機構
11 処理液供給口
12 処理液排出口
13 開口部(搬入口)
14 開口部(搬出口)
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an apparatus for performing wet processing (cleaning, etching, plating, development, peeling, polishing, etc.) of minute parts in the fields of machinery, electronics, optics, and the like.
[0002]
[Prior art]
In the fields of machinery, electronics, optics, etc., a wet processing apparatus as shown in FIG. 6 is employed for cleaning and other wet processes on the industrial scale of micro parts. Here, typical examples of the minute parts include magnetic applied parts such as ferrite after grinding, small lenses for optical devices, and the like.
In the apparatus of FIG. 6, the workpiece 2 placed in a wire mesh or a dedicated holding container 35 is immersed in the processing tank 3 in which the processing liquid 5 is stored, and ultrasonic vibration installed at the bottom of the processing tank 3. An ultrasonic wave from the child 4 is applied to the workpiece 2 to perform a wet process. In the case of a cleaning process for the purpose of removing dirt, at least a processing tank 3, a rinsing tank 41, and a drying tank 42 are provided, and each processing is performed while conveying the workpiece 2 in the direction of the arrow in the figure.
[0003]
[Problems to be solved by the invention]
In the apparatus having the above-described configuration, for the purpose of increasing the throughput (processing amount per unit time), a large number of objects to be cleaned 2 are placed in the holding container 35 at a time, and the containers are lifted and moved by the transfer machine. The method of immersing in the liquid in the tank is taken. In the wet processing of such a method, it is difficult to make the flow of the processing liquid in the holding container 35 uniform, and so-called dead space is generated due to the uneven flow, and the processing tends to be non-uniform.
[0004]
In order to avoid this problem, in the wet processing apparatus of the conventional example, each holding tank 35 is designed to be sufficiently large so that the internal space is widened to facilitate the flow of the processing liquid, and each tank is designed to have a large size. A design is adopted in which a large amount of processing liquid is retained compared to the volume of the liquid and a rocking mechanism for up and down, left and right, or a liquid circulation mechanism is provided. Therefore, the size of the apparatus is increased, the occupation area is large, the structure is complicated, the amount of processing liquids and rinsing liquids to be handled is large, and it is inevitable that the power consumption increases as a result.
[0005]
Wet processing of magnetic application product parts or micro-optical parts is inherently disliked of contamination such as dust and dust, and in recent years, processing in a clean room has become common. From such a background, the solution of the above-mentioned problem that the apparatus is large and consumes a large amount of power has been recognized as an urgent problem.
[0006]
The present invention has been made to solve the above-described problems, and is small in size, occupying a small area of the apparatus, and can uniformly treat each workpiece even with a small amount of processing liquid, and lowers the throughput. It is an object of the present invention to provide a wet processing apparatus capable of continuously processing an object to be processed so that it does not occur.
[0007]
[Means for Solving the Problems]
As a result of various investigations on the structure of the processing apparatus, the inventors have formed a retention portion of the processing liquid in a gap having a width that allows the object to be processed to pass through the formation of the liquid surface due to the surface tension of the processing liquid. It is possible to find and propose that the object can be achieved by an apparatus for processing an object to be processed while passing through the staying portion.
[0008]
That is, the present invention provides a tubular member having both ends as an inlet and an outlet for an object to be processed, each provided with at least one opening serving as a supply portion and an outlet portion for processing liquid, and an inside of the tubular member. , conveying the carry-in port, and a retention portion of the processing liquid for the wet treatment is formed so as to have a liquid surface in contact with the atmosphere out port, wherein to said outlet port of the object to be treated from said inlet port to tubular member And a pressure adjusting means for adjusting the pressure of the processing liquid in the staying part so as not to break the liquid surface, and at both ends of the tubular member so that the liquid to be processed is kept inside. The inner lower surface is inclined toward both ends, and a large number of the objects to be processed in the tubular member are opposite to each other in the transport direction of the object to be processed and the direction in which the processing liquid flows. To the inside of the workpiece A wet processing device for connection to the wet process. By adopting this configuration, the surface tension for maintaining the liquid level may be a small value, and a stable liquid surface can be formed even in the case of a processing liquid having a relatively small surface tension. However, it becomes a high-throughput wet processing apparatus capable of uniformly processing each workpiece.
[0009]
The present invention is the wet processing apparatus , wherein the transport mechanism includes a belt that passes through the tubular member and transports the object to be cleaned. Further, the transfer mechanism introduces the workpieces sequentially from the carry-in port, and pushes the workpieces introduced earlier with the workpiece to be fed later, thereby pushing the workpieces from the carry-in port to the carry-out port. It may be one that conveys within the member .
[0010]
Further, in the present invention, a tubular member placed horizontally may be used as the constituent member. Since the circumferential direction of the staying portion is regulated by the tube wall and the liquid level is only in the axial direction, the staying portion is further stabilized. In the present invention, the constituent member may be a tubular member having a cross-sectional circle placed almost horizontally. The circular cross section is the shape in which the liquid level in the axial direction is most stable.
[0011]
The present invention, of the outer surface of the structural member, by ultrasonic vibration device is attached to a position corresponding to the retaining part, the efficiency of c E Tsu preparative process by the effect of ultrasonic vibrations is improved.
[0012]
Further, in the present invention, one of the openings at both ends of the tubular member is used as a carry-in port for the workpiece, and the other as a carry-out port, and the workpiece is conveyed from the carry-in port to the carry-out port. Thus, the throughput of the wet process is improved. Furthermore, the present invention is a wet processing system characterized in that a drying unit having an air knife is provided immediately after the carry-out port of the wet processing apparatus. Since the wet process to the dry process are continuously performed, a more efficient process is possible.
[0013]
DETAILED DESCRIPTION OF THE INVENTION
[First Embodiment]
FIG. 1 is an outline view of the main part of the wet processing apparatus of the present invention, and shows an example in which a tubular member 1 having a rectangular cross section is used as a constituent member. The tubular member 1 is provided with a treatment liquid supply port 11 and a discharge port 12 and is held almost horizontally, and the wet treatment liquid retention portion 33, which is a feature of the present invention, is formed inside the tubular member 1. Has been. In the figure, the conveyance mechanism for the workpiece is omitted.
FIG. 2 is a view showing the whole of the wet processing apparatus of the present invention including the transport mechanism of the workpiece 2 in a longitudinal section of the tubular member 1. Openings 13 and 14 at both ends of the tubular member 1 also serve as a carry-in port and a carry-out port for the workpiece 2, respectively. 6 is a belt that conveys the workpiece 2 and 4 is an ultrasonic transducer. In addition, the ultrasonic transducer | vibrator 4 may be attached to the lower part 21 in the figure of the tubular member 1. FIG.
[0014]
The processing liquid is supplied from the processing liquid supply port 11 and discharged from the discharge port 12. Although not shown, the wet processing apparatus of the present invention is provided with a processing liquid supply pump and a discharge pump, which are connected to a supply port 11 and a discharge port 12, respectively. The treatment liquid is supplied and discharged by operating these pumps. On the other hand, the workpiece 2 is introduced from the carry-in port 13 and is conveyed toward the carry-out port 14, and wet processing is performed by the action of ultrasonic waves from the ultrasonic transducer 4 while passing through the staying portion 33 of the treatment liquid. The
[0015]
The pressure of the processing liquid is monitored by a pressure sensor 50 placed in the staying portion 33, and the supply pressure and discharge (suction) pressure of the processing liquid are balanced by a pressure adjusting means (not shown) to be within an appropriate range. It is adjusted to become. As a result, the pressure of the processing liquid in the staying part 33 is controlled within a range that does not break the liquid surface formed in the openings 13 and 14 by the surface tension of the processing liquid, and the staying part 33 is stably held. As a result, the only processing liquid carried out of the apparatus adheres to the workpiece 2 and the belt 6, and most of the processing liquid is recovered from the discharge port 12. It is preferable to provide a rectification mechanism in the vicinity of the treatment liquid supply port 11 and the discharge port 12. In this embodiment, the rectification mechanisms 9 a and 9 b are attached to both the supply port 11 and the discharge port 12 at the positions shown in the figure. It has been.
[0016]
Taking a ceramic part having a diameter of about 3 mm and a length of about 2 mm as an example of the workpiece 2 to be processed by the apparatus of the present invention, the inner dimension of the tubular member 1 is as follows when processing such a part, for example, cleaning. The width is about 4 mm and the height is about 5 mm. The length of the tubular member 1 is determined by the state to be processed, but is about 200 mm in the case of the cleaning process of the object to be processed with a relatively small amount of contamination. The ultrasonic vibrator uses a 200 KHz vibrator having a width of 35 mm and a length of 165 mm. In this case, the amount of the processing (cleaning) liquid is only 4 cc in terms of the residence in the tubular member 1. When the object to be cleaned 2 is transported at 2 to 3 mm per second, the cleaning time is about 1 second, and the cleaning liquid needs to flow at a speed of about 3 mm per second in the direction opposite to the object to be cleaned 2. In that case, the supply amount of the cleaning liquid is 3.6 cc / min. Thus, a sufficient cleaning effect can be obtained with an extremely small amount of liquid compared to the conventional example.
[0017]
In this embodiment, the vertical dimension of the openings at both ends is 8 mm or less, and as cleaning liquid, pure water, hydrogen-dissolved water (water in which hydrogen gas is dissolved), ozone water (water in which ozone gas is dissolved), or the like. Use. Since these cleaning liquids have a surface tension close to that of water at room temperature and are approximately 74 dyn / cm, the liquid surface is stably formed in a gap having a vertical dimension of 8 mm or less. That is, the cleaning liquid hardly spills from the openings 13 and 14 at both ends of the tubular member 1, and the object to be cleaned 2 can be cleaned in this state.
[0018]
The belt 6 that conveys the workpiece 2 is made of stainless steel, has a thickness of 0.05 mm, a width of 3 mm, and a length of 500 mm. The belt is moved at a constant speed by two large pulleys 7a and 7b and two small pulleys 8a and 8b. In this embodiment, 3 mm / sec. It was.
The belt 6 that conveys the workpiece 2 may be replaced with other conveyance means. For example, the workpiece 2 may be sequentially introduced from the carry-in entrance 13 and conveyed by pushing the workpiece 2 introduced earlier with the workpiece 2 fed later.
[0019]
In the present embodiment, rinsing can be performed by connecting the same type of apparatus to the above-described processing apparatus. In other words, the rinsing may be performed in exactly the same manner only by replacing the treatment liquid with the rinsing liquid. Moreover, by providing a drying unit immediately after the carry-out port of the wet processing apparatus to configure the wet processing system, it is possible to continuously perform from wet processing to drying, thereby enabling more efficient processing.
[0020]
Here, as the drying unit, one having a conventionally used air knife is preferably used in combination with the wet processing apparatus of the present invention. Or the method of using the apparatus of the same form as the wet processing apparatus of this invention as a small dryer by flowing dry air in the tubular member 1 may be used.
[0021]
In a conventional general processing apparatus in which a processing tank, a rinsing tank, and a drying tank are juxtaposed, each tank has a small volume of about 0.01 m3, and the overall size of the apparatus is 4 m in length and width. It was about 1 m and 2 m in height. In the wet processing apparatus of the present invention, the length, width, and height can be reduced to 1/10 or less of the longitudinal apparatus even if all the processes of treatment, rinsing, and drying are included. That is, the device volume can be 1/1000 or less.
[0022]
[Second Embodiment]
A wet processing apparatus according to a second embodiment of the present invention is shown in FIG. The same code | symbol is provided to the member which is common in 1st Embodiment. FIG. 4 is an enlarged view of the openings 13 and 14 at both ends of the tubular member 1 used in the present embodiment.
The present embodiment is characterized in that the liquid level at the openings 13 and 14 is nearly horizontal as shown in FIG. 4 by inclining the lower surface at both ends of the tubular member 1. Since the substantial gap dimension is h, which is smaller than the inner width dimension d of the tube, the surface tension for maintaining the liquid level may be a smaller value than in the first embodiment. Accordingly, a stable liquid surface can be formed even in the case of a treatment liquid having a relatively small surface tension. The cleaning liquid is effective when, for example, IPA (isopropyl alcohol), ethyl alcohol, acetone or the like is used. The configuration of the apparatus is different from that of the first embodiment only in that the belt 6 that conveys the object to be processed has an angle that matches the inclination, and the operation is completely the same.
[0023]
In the above description, the tubular member 1 is a tube having a rectangular cross section, but of course the shape is not limited thereto. If it is suitable for the shape of the object to be processed 2, the liquid level of the staying portion 33 is more stable when the tube has a circular cross section as shown in FIG. 5. In this case, the cross section cut at the position of the diameter in the vertical direction is exactly the same as in FIGS. 2 and 3 corresponding to the first and second embodiments.
[0024]
【The invention's effect】
As described above, the wet processing apparatus of the present invention has an extremely small space volume occupied by the apparatus and can be a very small processing apparatus as compared with the conventional example having the same processing capability. In addition, since the dead space is reduced, the amount of processing solution to be used can be greatly reduced. In addition, since only a small amount of the processing liquid is taken out of the apparatus and most of it can be recovered, the amount of waste liquid is also reduced.
[Brief description of the drawings]
FIG. 1 is an outline view showing a first embodiment of a wet processing apparatus of the present invention.
FIG. 2 is a cross-sectional view showing a first embodiment of the wet processing apparatus of the present invention.
FIG. 3 is a cross-sectional view showing a second embodiment of the wet processing apparatus of the present invention.
4 is an enlarged view of a part A in FIG. 3;
FIG. 5 is a diagram showing another embodiment of the present invention.
FIG. 6 is a schematic explanatory diagram of a conventional wet processing apparatus.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Tubular member 2 To-be-processed object 3 Processing layer 4 Ultrasonic vibrator 5 Processing liquid 6 Belt 7a, 7b Pulley (large)
8a, 8b Pulley (small)
9a, 9b Rectification mechanism 11 Processing liquid supply port 12 Processing liquid discharge port 13 Opening (carriage inlet)
14 Opening (exit)

Claims (7)

両端を被処理物の搬入口、搬出口とされ、処理液のそれぞれ供給部と排出部となる開口部が少なくとも一つずつ設けられた管状部材と、
前記管状部材内部に、前記搬入口、搬出口に大気と接する液面を有するように形成されたウェット処理用の処理液の滞留部と、
前記被処理物を前記搬入口から前記搬出口へと管状部材内を搬送する搬送機構と、
前記液面を壊さないよう前記滞留部の前記処理液の圧力を調整する圧力調整手段とを有し、
前記被処理液が内部に保たれるよう、前記管状部材の両端の内側下面に両端に向かって傾斜がつけられており、
前記管状部材内における前記被処理物の搬送方向と前記処理液を流す方向とが反対である、多数の前記被処理物を前記滞留部の内部に搬送して前記多数の被処理物に対して連続的にウェット処理を行うウェット処理装置。
Tubular members each having both ends serving as workpiece inlets and outlets and provided with at least one opening each serving as a supply portion and a discharge portion for the processing liquid;
In the tubular member, a retention portion of a treatment liquid for wet treatment formed to have a liquid level in contact with the atmosphere at the carry-in port and the carry-out port, and
Wherein a transport mechanism for transporting the tubular member into the outlet port of the object to be treated from said inlet port,
Pressure adjusting means for adjusting the pressure of the treatment liquid in the staying part so as not to break the liquid surface;
The inner surface of the both ends of the tubular member is inclined toward both ends so that the liquid to be treated is kept inside,
The transport direction of the object to be processed in the tubular member is opposite to the direction in which the processing liquid flows, and a large number of the objects to be processed are transported to the inside of the staying portion to the large number of objects to be processed. Wet processing equipment that performs wet processing continuously.
前記搬送機構が、前記管状部材を貫通して前記被洗浄物を搬送するベルトを有する事を特徴とする請求項1記載のウェット処理装置。  The wet processing apparatus according to claim 1, wherein the transport mechanism has a belt that passes through the tubular member and transports the object to be cleaned. 前記搬送機構が、前記被処理物を逐次前記搬入口より導入し、後から送り込む前記被処理物で先に導入した前記被処理物を押すことにより前記被処理物を前記搬入口から前記搬出口へと管状部材内を搬送するものであることを特徴とする請求項1に記載のウェット処理装置。  The conveyance mechanism sequentially introduces the workpieces from the carry-in port, and pushes the workpieces introduced earlier by the workpiece to be fed later, thereby removing the workpieces from the carry-in port to the carry-out port. The wet processing apparatus according to claim 1, wherein the wet processing apparatus conveys the inside of the tubular member to the bottom. 前記構成部材が、ほぼ水平に置かれた断面円の管状部材であることを特徴とする請求項1に記載のウェット処理装置。  The wet processing apparatus according to claim 1, wherein the component member is a tubular member having a cross-sectional circle placed substantially horizontally. 前記構成部材の外側の、前記滞留部に対応する位置に、超音波振動装置が取り付けられていることを特徴とする請求項1に記載のウェット処理装置。  The wet processing apparatus according to claim 1, wherein an ultrasonic vibration device is attached to a position corresponding to the staying portion outside the component member. 請求項1記載のウェット処理装置を用い、前記被処理物を前記搬入口から前記ウェット処理装置内の前記滞留部内に搬送し、ウェット処理の後、前記被処理物を前記搬出口から取り出すことを特徴とする微小部品のウェット処理方法。  The wet processing apparatus according to claim 1, wherein the object to be processed is transported from the carry-in port into the staying part in the wet process apparatus, and after the wet process, the object to be treated is taken out from the carry-out port. A wet processing method for microparts characterized. 請求項1記載のウェット処理装置の前記搬出口の直後に、エアーナイフを有する乾燥部を設けたことを特徴とするウェット処理システム。  A wet processing system comprising a drying unit having an air knife immediately after the carry-out port of the wet processing apparatus according to claim 1.
JP2001274245A 2001-09-10 2001-09-10 Wet treatment apparatus and wet treatment system Expired - Lifetime JP3923761B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001274245A JP3923761B2 (en) 2001-09-10 2001-09-10 Wet treatment apparatus and wet treatment system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001274245A JP3923761B2 (en) 2001-09-10 2001-09-10 Wet treatment apparatus and wet treatment system

Publications (2)

Publication Number Publication Date
JP2003081423A JP2003081423A (en) 2003-03-19
JP3923761B2 true JP3923761B2 (en) 2007-06-06

Family

ID=19099318

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001274245A Expired - Lifetime JP3923761B2 (en) 2001-09-10 2001-09-10 Wet treatment apparatus and wet treatment system

Country Status (1)

Country Link
JP (1) JP3923761B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108636926A (en) * 2018-04-09 2018-10-12 江苏奥赛斯现代农业科技有限公司 A kind of production of quartz tubes cleaning device
CN112427361B (en) * 2020-11-05 2023-01-10 祥越光电(湖北)有限公司 Optical lens cleaning method

Also Published As

Publication number Publication date
JP2003081423A (en) 2003-03-19

Similar Documents

Publication Publication Date Title
KR101700260B1 (en) Method and apparatus for showerhead cleaning
JP2006114884A (en) Substrate cleaning processing apparatus and substrate processing unit
WO2006033186A1 (en) Substrate treatment apparatus
KR100385906B1 (en) nozzle device and wet processing equipment
JPH1070103A (en) Semiconductor wafer wet-etching treatment device
US7380560B2 (en) Wafer cleaning apparatus with probe cleaning and methods of using the same
JP3923761B2 (en) Wet treatment apparatus and wet treatment system
JP3341727B2 (en) Wet equipment
US7373941B2 (en) Wet cleaning cavitation system and method to remove particulate wafer contamination
US6730177B1 (en) Method and apparatus for washing and/or drying using a revolved coanda profile
JP2003077886A (en) Wetting treatment device
KR100330806B1 (en) Device and method for cleaning semiconductor wafers
JP4076755B2 (en) Wet processing apparatus and wet processing method
JPH07283192A (en) Vapor cleaning method
JP2001196345A (en) Substrate guide device and cleaning equipment using it
JP4767769B2 (en) Ultrasonic cleaning equipment
JP4851776B2 (en) Liquid honing machine and liquid honing method
KR20100053091A (en) Equipment for manufacturing semiconductor device
JPH11307493A (en) Substrate processing device
JP2001267279A (en) Method and apparatus for cleaning and etching individual wafer by utilizing wet chemical phenomena
JP2003031460A (en) Apparatus and method for liquid processing
KR102239518B1 (en) home port and substrate processing apparatus having the same
JP3431419B2 (en) Substrate processing equipment
JPS61210637A (en) Washing apparatus
KR20010057041A (en) Wafer cleaning apparatus

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20040603

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20060725

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060912

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20061031

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20061225

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20070206

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20070222

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100302

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110302

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120302

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120302

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130302

Year of fee payment: 6