JP3901716B2 - 短パルスレーザ装置の最小パルス幅を算出する方法、短パルスレーザ装置を用いて複数の孔を開ける方法、及び短パルスレーザ装置 - Google Patents
短パルスレーザ装置の最小パルス幅を算出する方法、短パルスレーザ装置を用いて複数の孔を開ける方法、及び短パルスレーザ装置 Download PDFInfo
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- 238000000034 method Methods 0.000 title claims description 29
- 230000003287 optical effect Effects 0.000 claims description 47
- 238000005553 drilling Methods 0.000 claims description 18
- 239000006185 dispersion Substances 0.000 claims description 15
- 238000002679 ablation Methods 0.000 claims description 10
- 230000005540 biological transmission Effects 0.000 claims description 3
- 230000003595 spectral effect Effects 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 238000004364 calculation method Methods 0.000 description 4
- 210000001747 pupil Anatomy 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000000737 periodic effect Effects 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 230000002940 repellent Effects 0.000 description 3
- 239000005871 repellent Substances 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 238000012886 linear function Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
- B41J2/1634—Manufacturing processes machining laser machining
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
- B23K26/0608—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams in the same heat affected zone [HAZ]
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- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/067—Dividing the beam into multiple beams, e.g. multifocusing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
- B23K26/382—Removing material by boring or cutting by boring
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
- B23K26/382—Removing material by boring or cutting by boring
- B23K26/389—Removing material by boring or cutting by boring of fluid openings, e.g. nozzles, jets
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1607—Production of print heads with piezoelectric elements
- B41J2/161—Production of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/30—Organic material
- B23K2103/42—Plastics
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
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- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
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- Laser Beam Processing (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Lasers (AREA)
Description
ΔT×Δν=0.44 (1)
であり、光の周波数と波長との関係
λ・ν=c (2)
を用いれば、cを光の速度とするとき、
ΔT×Δλ=0.44×λ2/c (3)
が得られる。例えば、λ=1μm、パルス幅ΔT=0.1ピコ秒=1×10-13秒で動作するレーザの場合、最小帯域幅Δλは
Δλmin=0.44×λ2/(c×ΔT) (4)
=0.44×(1×10-6)2/(3×108×1×10-13)
=1.5×10-8m=15nm
である。一方、ΔT=10ピコ秒=1×10-11秒の場合、最小帯域幅Δλは
Δλmin=0.44×λ2/(c×ΔT) (5)
=0.44×(1×10-6)2/(3×108×1×10-11)
=1.5×10-10m=0.15nm
となる。
θ・ sinθ=mλ/D (6)
但し、mは回折次数、λは波長、Dは格子周期である。この回折方程式は、回折光学素子が分散型であり、回折角θが、回折次数mが同じとき、波長λの線形関数であることを示している。
x=f×θ (7)
によって示される。方程式(6)および(7)を組み合わせると、
x=f×θ=f・(m/D)λ (8)
が得られる。方程式(8)から、横方向焦点位置がどの任意の回折次数mについても波長の線形関数であることが分かる。方程式(8)は、スペクトル帯域幅Δλの短パルスレーザビームの場合に、その焦点もλに比例して分散されることも示している。すなわち、
Δx =f(m/D)Δλ (9)
=(f・(m/D)λ)×Δλ/λ
=xΔλ/λ
である。方程式(9)は、焦点の分散が横方向焦点位置xとレーザパルスの比帯域幅との積に等しいことを示している。焦点の分散Δxは、ゼロ次m=0(分散なし)のときの孔開け装置のレーザ焦点スポットサイズと比較して無視できない程大きい場合には、焦点を大幅に悪化させてしまう。このようにして、後の分析の基礎が形成される。
Claims (16)
- 短パルスレーザ装置のパルスレーザビームが回折光学素子を透過することに伴って起こる分散を考慮して上記パルスレーザビームの最小パルス幅を算出する方法であって、
加工物表面に形成されるアブレーション部分のサイズのデータを求める工程と、
パルスレーザビームの動作波長を求める工程と、
上記加工物に入射するビームの元のスポットサイズのデータを求める工程と、
上記入射ビームのスポットサイズの公差のデータを求める工程と、
上記アブレーション部分のサイズのデータと、上記レーザビームの動作波長と、上記入射ビームの元のスポットサイズのデータと、上記スポットサイズの公差のデータとに基づいて上記パルスレーザビームの最小パルス幅を算出する工程とを備えた方法。 - 上記アブレーション部分のサイズのデータは丸孔の直径である請求項1記載の方法。
- 上記最小パルス幅に応じてパルスレーザビームを生成する工程と、
上記パルスレーザビームを上記回折光学素子に透過させることにより、上記パルスレーザビームを2本以上のパルスレーザビームに分割する工程と、
上記2本以上のパルスレーザビームを加工物表面に案内することにより、上記加工物表面に2つ以上のアブレーション部分を形成する工程とをさらに備えた請求項1記載の方法。 - 上記パルスレーザビームを生成する工程は、ピコ秒レーザ源を使用する工程を含む請求項4記載の方法。
- 上記2本以上のパルスレーザビームを案内する工程は、光学素子を用いて上記2本以上のレーザビームを加工物表面に集束させる工程と、上記光学素子を移動可能に調節して上記2本以上のレーザビームを加工物表面に沿って走査することにより、該加工物表面にパターン状のアブレーション部分を形成する工程とを含む請求項4記載の方法。
- 短パルスレーザ装置を用いて複数の孔を開ける方法であって、
パルスレーザビームが回折光学素子を透過することに伴って起こる分散を考慮して上記パルスレーザビームの最小パルス幅を算出する工程と、
上記最小パルス幅に応じてパルスレーザビームを生成する工程と、
上記パルスレーザビームを上記回折光学素子に透過させることにより、上記パルスレーザビームを2本以上のレーザビームに分割する工程と、
上記2本以上のレーザビームを加工物表面に案内することにより、上記加工物表面に複数の孔を開ける工程とを備えた方法。 - 上記最小幅を算出する工程は、加工物表面に形成される孔のサイズのデータを求める工程と、上記パルスレーザビームの動作波長を求める工程と、上記加工物に入射するビームの元のスポットサイズのデータを求める工程と、上記入射ビームのスポットサイズの公差のデータを求める工程と、上記孔のサイズのデータと、上記レーザビームの動作波長と、上記入射ビームの元のスポットサイズのデータと、上記スポットサイズの公差のデータとに基づいて上記パルスレーザビームの最小パルス幅を算出する工程とを含む請求項7記載の方法。
- 上記パルスレーザビームを生成する工程は、ピコ秒レーザ源を使用する工程を含む請求項7記載の方法。
- 上記2本以上のレーザビームを案内する工程は、テレセントリックレンズを用いて上記2本以上のレーザビームを加工物表面に集束させる工程と、上記テレセントリックレンズを移動可能に調節して上記2本以上のレーザビームを加工物表面に沿って走査することにより、該加工物表面に孔のパターンを開ける工程とを含む請求項7記載の方法。
- 加工物の露出面に向かってパルスレーザビームを投射するよう動作可能なレーザサブシステムと、
上記レーザサブシステムと上記加工物との間に配置され、上記レーザサブシステムからパルスレーザビームを受光するよう構成されているとともに、上記パルスレーザビームを複数のレーザ孔開け用ビームに分割するよう動作可能な回折光学素子と、
上記パルスレーザビームが上記回折光学素子を透過することに伴って起こる分散を考慮して上記パルスレーザビームの最小パルス幅を算出する手段とを備えた短パルスレーザ装置。 - 上記加工物はインクジェットヘッドのノズル板として定義される請求項1記載の方法。
- 上記加工物はインクジェットヘッドのノズル板として定義される請求項7記載の方法。
- 上記加工物はインクジェットヘッドのノズル板として定義される請求項12記載の短パルスレーザ装置。
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US39848602P | 2002-07-25 | 2002-07-25 | |
US10/267,034 US6815638B2 (en) | 2002-07-25 | 2002-10-08 | Method of determining a minimum pulse width for a short pulse laser system |
PCT/US2003/005660 WO2004011969A1 (en) | 2002-07-25 | 2003-02-26 | Method for determining a minimum pulse width for a short pulse laser system |
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JP2005536073A JP2005536073A (ja) | 2005-11-24 |
JP3901716B2 true JP3901716B2 (ja) | 2007-04-04 |
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US (1) | US6815638B2 (ja) |
EP (1) | EP1525496A4 (ja) |
JP (1) | JP3901716B2 (ja) |
CN (1) | CN1656397A (ja) |
AU (1) | AU2003213274A1 (ja) |
WO (1) | WO2004011969A1 (ja) |
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DE102018127633A1 (de) * | 2018-11-06 | 2020-05-07 | Bundesdruckerei Gmbh | Durchkontaktierung in einer beidseitig bedruckten Trägerfolie unter Verwendung einer diffraktiven Optik |
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JPS5719185A (en) * | 1980-07-08 | 1982-02-01 | Mitsubishi Electric Corp | Pulse arc welding device |
US5633735A (en) | 1990-11-09 | 1997-05-27 | Litel Instruments | Use of fresnel zone plates for material processing |
US5656186A (en) * | 1994-04-08 | 1997-08-12 | The Regents Of The University Of Michigan | Method for controlling configuration of laser induced breakdown and ablation |
US5780806A (en) * | 1995-07-25 | 1998-07-14 | Lockheed Idaho Technologies Company | Laser ablation system, and method of decontaminating surfaces |
US6072631A (en) * | 1998-07-09 | 2000-06-06 | 3M Innovative Properties Company | Diffractive homogenizer with compensation for spatial coherence |
US6347171B1 (en) * | 1999-03-31 | 2002-02-12 | Matsushita Electric Industrial Co., Ltd. | Method and apparatus for forming a diffraction grating |
US6433303B1 (en) * | 2000-03-31 | 2002-08-13 | Matsushita Electric Industrial Co., Ltd. | Method and apparatus using laser pulses to make an array of microcavity holes |
US6720519B2 (en) * | 2001-11-30 | 2004-04-13 | Matsushita Electric Industrial Co., Ltd. | System and method of laser drilling |
US6710293B2 (en) * | 2002-07-25 | 2004-03-23 | Matsushita Electric Industrial Co., Ltd. | System for and method of custom microfilter design with beamsplitter characterization |
-
2002
- 2002-10-08 US US10/267,034 patent/US6815638B2/en not_active Expired - Fee Related
-
2003
- 2003-02-26 EP EP03709324A patent/EP1525496A4/en not_active Withdrawn
- 2003-02-26 CN CNA038116502A patent/CN1656397A/zh active Pending
- 2003-02-26 JP JP2005505591A patent/JP3901716B2/ja not_active Expired - Fee Related
- 2003-02-26 AU AU2003213274A patent/AU2003213274A1/en not_active Abandoned
- 2003-02-26 WO PCT/US2003/005660 patent/WO2004011969A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
US6815638B2 (en) | 2004-11-09 |
WO2004011969A1 (en) | 2004-02-05 |
US20040017560A1 (en) | 2004-01-29 |
AU2003213274A1 (en) | 2004-02-16 |
CN1656397A (zh) | 2005-08-17 |
EP1525496A1 (en) | 2005-04-27 |
EP1525496A4 (en) | 2006-08-02 |
JP2005536073A (ja) | 2005-11-24 |
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