JP3877608B2 - シリル化された多孔質シリカの製造方法 - Google Patents

シリル化された多孔質シリカの製造方法 Download PDF

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Publication number
JP3877608B2
JP3877608B2 JP2002034380A JP2002034380A JP3877608B2 JP 3877608 B2 JP3877608 B2 JP 3877608B2 JP 2002034380 A JP2002034380 A JP 2002034380A JP 2002034380 A JP2002034380 A JP 2002034380A JP 3877608 B2 JP3877608 B2 JP 3877608B2
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Prior art keywords
porous silica
surfactant
integer
producing
organosilicon compound
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Japanese (ja)
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JP2003238140A5 (enrdf_load_stackoverflow
JP2003238140A (ja
Inventor
村 一 夫 高
池 俊 輔 大
田 武 司 窪
野 義 人 蔵
上 雅 美 村
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Mitsui Chemicals Inc
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Mitsui Chemicals Inc
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Publication of JP2003238140A5 publication Critical patent/JP2003238140A5/ja
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  • Silicon Compounds (AREA)
  • Silicates, Zeolites, And Molecular Sieves (AREA)
JP2002034380A 2002-02-12 2002-02-12 シリル化された多孔質シリカの製造方法 Expired - Fee Related JP3877608B2 (ja)

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JP2002034380A JP3877608B2 (ja) 2002-02-12 2002-02-12 シリル化された多孔質シリカの製造方法

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JP2002034380A JP3877608B2 (ja) 2002-02-12 2002-02-12 シリル化された多孔質シリカの製造方法

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JP2003238140A JP2003238140A (ja) 2003-08-27
JP2003238140A5 JP2003238140A5 (enrdf_load_stackoverflow) 2005-06-02
JP3877608B2 true JP3877608B2 (ja) 2007-02-07

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JP (1) JP3877608B2 (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5076377B2 (ja) * 2006-07-03 2012-11-21 トヨタ自動車株式会社 排ガス浄化触媒
DE102007055879A1 (de) * 2007-12-19 2009-06-25 Wacker Chemie Ag Hydrophobierung von Kieselsäuren und oxidierenden Bedingungen
JP5622564B2 (ja) 2010-06-30 2014-11-12 富士フイルム株式会社 感光性組成物、パターン形成材料、並びに、これを用いた感光性膜、パターン形成方法、パターン膜、低屈折率膜、光学デバイス、及び、固体撮像素子
JP2010265174A (ja) * 2010-07-27 2010-11-25 Asahi Kasei Chemicals Corp 変性メソポーラス酸化物
JP5976523B2 (ja) 2011-12-28 2016-08-23 富士フイルム株式会社 光学部材セット及びこれを用いた固体撮像素子
JP6343446B2 (ja) 2012-12-28 2018-06-13 富士フイルム株式会社 硬化性樹脂組成物、赤外線カットフィルタ及びこれを用いた固体撮像素子
SG11201505047WA (en) 2012-12-28 2015-08-28 Fujifilm Corp Curable resin composition for forming infrared reflective film, infrared reflective film and manufacturing method thereof, infrared ray cutoff filter and solid-state imaging device using the same
JP2018205598A (ja) 2017-06-07 2018-12-27 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ 感光性シロキサン組成物、およびそれを用いて形成した硬化膜

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JP2003238140A (ja) 2003-08-27

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