JP3874011B2 - 微小試料加工観察方法及び装置 - Google Patents

微小試料加工観察方法及び装置 Download PDF

Info

Publication number
JP3874011B2
JP3874011B2 JP2005107008A JP2005107008A JP3874011B2 JP 3874011 B2 JP3874011 B2 JP 3874011B2 JP 2005107008 A JP2005107008 A JP 2005107008A JP 2005107008 A JP2005107008 A JP 2005107008A JP 3874011 B2 JP3874011 B2 JP 3874011B2
Authority
JP
Japan
Prior art keywords
sample
micro
observation
processing
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2005107008A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005259707A5 (enExample
JP2005259707A (ja
Inventor
光雄 徳田
宗行 福田
康裕 三井
英巳 小池
聡 富松
広康 志知
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2005107008A priority Critical patent/JP3874011B2/ja
Publication of JP2005259707A publication Critical patent/JP2005259707A/ja
Publication of JP2005259707A5 publication Critical patent/JP2005259707A5/ja
Application granted granted Critical
Publication of JP3874011B2 publication Critical patent/JP3874011B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Landscapes

  • Sampling And Sample Adjustment (AREA)
JP2005107008A 2005-04-04 2005-04-04 微小試料加工観察方法及び装置 Expired - Lifetime JP3874011B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005107008A JP3874011B2 (ja) 2005-04-04 2005-04-04 微小試料加工観察方法及び装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005107008A JP3874011B2 (ja) 2005-04-04 2005-04-04 微小試料加工観察方法及び装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2004317452A Division JP4259454B2 (ja) 2004-11-01 2004-11-01 微小試料加工観察装置

Publications (3)

Publication Number Publication Date
JP2005259707A JP2005259707A (ja) 2005-09-22
JP2005259707A5 JP2005259707A5 (enExample) 2006-03-09
JP3874011B2 true JP3874011B2 (ja) 2007-01-31

Family

ID=35085184

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005107008A Expired - Lifetime JP3874011B2 (ja) 2005-04-04 2005-04-04 微小試料加工観察方法及び装置

Country Status (1)

Country Link
JP (1) JP3874011B2 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006194907A (ja) * 2006-03-31 2006-07-27 Hitachi Ltd 電子線を用いた試料観察装置および方法
JP2007123289A (ja) * 2007-01-31 2007-05-17 Hitachi Ltd 微小試料加工観察方法及び装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5825797B2 (ja) * 2011-02-08 2015-12-02 株式会社ブリヂストン 高分子材料の評価方法
DE102020203580B4 (de) 2020-03-20 2021-10-07 Carl Zeiss Microscopy Gmbh Verfahren zum Ändern der Raum-Orientierung einer Mikroprobe in einem Mikroskop-System, sowie Computerprogrammprodukt

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2811073B2 (ja) * 1988-11-01 1998-10-15 セイコーインスツルメンツ株式会社 断面加工観察装置
JP3216881B2 (ja) * 1990-09-07 2001-10-09 株式会社日立製作所 試料断面観察方法
JP3119959B2 (ja) * 1993-02-05 2000-12-25 セイコーインスツルメンツ株式会社 集束イオンビーム装置および加工観察装置
JP2972535B2 (ja) * 1993-12-08 1999-11-08 株式会社東芝 基板断面観察装置
JP3805547B2 (ja) * 1999-01-21 2006-08-02 株式会社日立製作所 試料作製装置
JP4534273B2 (ja) * 1999-08-31 2010-09-01 株式会社日立製作所 試料作成装置
JP2004343131A (ja) * 2004-06-07 2004-12-02 Hitachi Ltd 試料解析方法および装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006194907A (ja) * 2006-03-31 2006-07-27 Hitachi Ltd 電子線を用いた試料観察装置および方法
JP2007123289A (ja) * 2007-01-31 2007-05-17 Hitachi Ltd 微小試料加工観察方法及び装置

Also Published As

Publication number Publication date
JP2005259707A (ja) 2005-09-22

Similar Documents

Publication Publication Date Title
JP3736333B2 (ja) 微小試料加工観察装置
US7297965B2 (en) Method and apparatus for sample formation and microanalysis in a vacuum chamber
JP4259454B2 (ja) 微小試料加工観察装置
JP5125123B2 (ja) 微小試料加工観察方法及び装置
JP5125174B2 (ja) 微小試料加工観察方法及び装置
JP4259604B2 (ja) 微小試料加工観察方法及び装置
JP3874011B2 (ja) 微小試料加工観察方法及び装置
JP2010232195A (ja) 微小試料加工観察方法及び装置
JP4100450B2 (ja) 微小試料加工観察方法及び装置
JP5125184B2 (ja) 微小試料加工観察方法及び装置
JP3695181B2 (ja) 基板抽出方法及びそれを用いた電子部品製造方法
JP3904019B2 (ja) 微小試料加工観察方法及び装置
JP3941816B2 (ja) 微小試料加工観察方法及び装置
JP4507952B2 (ja) 微小試料加工観察方法及び装置
JP4046144B2 (ja) 微小試料加工観察方法及び装置
JP4208031B2 (ja) 微小試料加工観察方法及び装置
JP3904018B2 (ja) 微小試料加工観察方法及び装置
JP3904020B2 (ja) 微小試料加工観察方法及び装置
JP5125143B2 (ja) 微小試料加工観察方法及び装置
JP5316626B2 (ja) 微小試料加工観察方法及び装置
JP5126031B2 (ja) 微小試料加工観察方法及び装置
JP2004328003A (ja) 基板抽出方法及びそれを用いた電子部品製造方法
JP4729390B2 (ja) 試料作製装置
JP4740032B2 (ja) 電子部品製造プロセスの検査解析システム及びウェーハの検査解析方法
JP4811448B2 (ja) イオンビーム装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060120

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20060120

A975 Report on accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A971005

Effective date: 20060127

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20060307

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060425

RD01 Notification of change of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7421

Effective date: 20060425

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20061003

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20061016

R151 Written notification of patent or utility model registration

Ref document number: 3874011

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20101102

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20101102

Year of fee payment: 4

S201 Request for registration of exclusive licence

Free format text: JAPANESE INTERMEDIATE CODE: R314201

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20101102

Year of fee payment: 4

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131102

Year of fee payment: 7

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131102

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131102

Year of fee payment: 7

EXPY Cancellation because of completion of term