JP3736610B2 - Treatment method of waste copper containing hydrochloric acid - Google Patents

Treatment method of waste copper containing hydrochloric acid Download PDF

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JP3736610B2
JP3736610B2 JP2000239348A JP2000239348A JP3736610B2 JP 3736610 B2 JP3736610 B2 JP 3736610B2 JP 2000239348 A JP2000239348 A JP 2000239348A JP 2000239348 A JP2000239348 A JP 2000239348A JP 3736610 B2 JP3736610 B2 JP 3736610B2
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Prior art keywords
copper
hydrochloric acid
sulfuric acid
chloride
cathode
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JP2002060986A (en
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八州家 三上
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八州家 三上
有限会社テクノス
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling

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  • Electrolytic Production Of Metals (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は、プリント基板の製造工程などにおいて、塩化第2銅を用いた銅エッチング法(塩銅法)にて銅をエッチングする際に排出される含銅廃塩酸の処理方法に関する。
【0002】
【従来の技術及び発明が解決しようとする課題】
従来、エッチング廃液の含銅廃塩酸は、塩化銅及び塩酸が含まれており、これを処理する方法としては、
(1)炭酸ソーダで中和し、硫酸で抽出して硫酸銅で回収する方法、
(2)消石灰で中和し、硫酸処理して硫酸銅で回収する方法、
(3)鉄粉又は鉄スクラップを添加して銅粉と塩化鉄で回収する方法、
(4)隔膜電解法
などが知られている。
【0003】
しかしながら、(1)の方法は、炭酸ソーダによる中和時に多量の塩化ナトリウムが発生し、生成する炭酸銅中に塩素イオンが多量に残留し、得られた硫酸銅の精製が必要であること、更に中和により塩酸が無駄になり、その上炭酸銅より硫酸銅を製造する工程が必要となり、作業上も複雑になり、経済的にも高くつく、という欠点がある。(2)の方法は、消石灰で中和するので、(1)の方法と同様に硫酸銅への塩素イオンの混入が多く、経済的な面でも問題があった。
【0004】
また、(3)の方法は、使用する鉄粉又は鉄スクラップの品質により得られる塩化鉄の品位が悪く、再利用が困難である。特に最近では塩化鉄の用途がなくなり、これを更に中和するために多くのアルカリが必要となり、その上発生するスラッジの処理も問題となっている。
【0005】
(4)の方法はこれらの欠点をなくするものとして本発明者らが先に提案したもの(特開平7−70784号公報)であり、これは塩銅法による銅エッチング工程より排出される含銅廃塩酸を電解処理し、陰極に銅を電析させて銅を回収し、陽極で塩化第2銅を含むエッチング液を再生するもので、(1)、(2)、(3)の方法に比べて合理的なものである。しかしながら、この方法は陽極から塩素ガスが発生するため、陰極での銅の電析効率が悪くなる。その上、塩素ガスの発生による作業環境の悪化が問題となるために、陽極と陰極を隔膜を用いて仕切り、塩素イオンを陽極室に移行させて塩素の発生を陽極室に局限する必要があり、これは隔膜の材質を選ぶと共に構造を検討することによって解決できるが、陰極に析出する銅は針状又はデンドライト状で、これを粉末として得るためにはワイパー又はこれに類する掻き取り材で掻き取らなければならない。もしこれを行わないと、隔膜を突き破るし、しかもこの掻き取り材の材質は高価なものを使う必要があり、実用的には高価であるため、より実用が容易な方法が望まれていた。
【0006】
本発明は上記事情を改善するためになされたもので、塩銅法による銅エッチング工程より排出される含銅廃塩酸を効率よく処理することができると共に、リサイクル性に優れ、かつ板状の高品位銅を得ることができる含銅廃塩酸の処理方法を提供することを目的とする。
【0007】
【課題を解決するための手段及び発明の実施の形態】
本発明者は、上記目的を達成するため鋭意検討を行った結果、本発明に到達したもので、本発明は、塩化第2銅を用いる銅のエッチング工程より排出される含銅廃塩酸に硫酸を添加して、硫酸濃度40〜70重量%の濃度下において200Torr以下の減圧下、60〜120℃で、この廃塩酸中に含まれる塩化銅を硫酸銅と塩酸とに分解すると共に前記塩酸を系内から除去・回収する第1工程と、この第1工程で得られた硫酸銅の溶液を電解して陰極で板状の金属銅として回収する第2工程と、この第2工程で銅が電解回収された後の残液を第1工程に硫酸溶液として戻す第3工程とを有することを特徴とする含銅廃塩酸の処理方法を提供する。
【0008】
本発明によれば、含銅廃塩酸に硫酸を添加して塩化銅を分解し、硫酸銅と塩酸を得、塩酸は塩化水素ガスとして除去し、冷却し、コンデンサで回収する一方、硫酸銅についてはこれを電解し、板状の金属銅として回収することができ、しかも電解後の残液はこれを第1工程において塩化銅を分解する硫酸溶液として使用することができる。従って、含銅廃塩酸を有価物質に再生、回収して、有効にリサイクルすることができるものである。
【0009】
またこの場合、硫酸銅の電解は、塩化銅の電解と異なり、塩素発生の問題がないので、隔膜の必要がなく、簡便な電解装置が使用し得、電析される金属銅も、板状又は皮膜状であるので、回収し易いばかりでなく、塩素の混入もなく、高品位の99.90%以上のものである。
【0010】
それ故、本発明の方法は、工業的有利に含銅廃塩酸の処理を行うことができるものである。
【0011】
以下、本発明につき更に詳しく説明する。
本発明の含銅廃塩酸の処理方法において、この含銅廃塩酸は、例えばプリント配線基板の製造工程において、銅張積層板等を塩化第2銅を用いた銅エッチング液でエッチングする際に排出される銅エッチング廃液を用いることができ、これは塩化銅及び塩酸を含有するものである。
【0012】
本発明においては、第1工程としてこのような含銅廃塩酸溶液に硫酸を添加し、塩化銅を硫酸銅と塩酸とに分解する。この場合、硫酸は、添加後の濃度が40〜70重量%濃度になるように減圧蒸留することが好ましいので、添加する硫酸の濃度は自由であるが、30〜98重量%濃度が好ましい。更に好ましくは50〜98重量%濃度である。その添加量は塩化銅を硫酸銅と塩酸とに分解する反応時の硫酸濃度が好ましくは40〜70重量%濃度になるように決めればよい。また、この硫酸添加による反応は、減圧下、好ましくは200Torr以下、特に50〜200Torrにおいて60〜120℃で行うことが好ましく、これにより上記分解反応が効率よく行われると共に、塩酸を塩化水素ガスとして揮発除去し、これを冷却することによって回収することができる。
この第1工程により、上記含銅廃塩酸溶液を塩素分を殆ど含有しない硫酸銅溶液とすることができる。なお、上記塩素ガスは回収し、銅エッチング液の原料等として用いることができる。
【0013】
本発明の第2工程は、第1工程で得られた硫酸銅溶液を電解する工程である。この電解は、公知の方法で行うことができるが、本発明においては隔膜は必要がなく、陽極と陰極とを隔膜により仕切る必要がない。この場合、陽極としては、カーボン、チタン、鉛、ステンレススチール、白金、表面にチタン膜が形成された白金などの不溶性陽極が使用され、また陰極としてはステンレススチール、銅板(種板)の表面にニカワ等を塗布したものなど、銅皮膜を容易に剥離し得る材質のものが用いられる。電解に際し、陰極電流密度は0.1〜30A/dm2の範囲とし得、また温度は室温でよいが、必要により例えば70℃程度まで加熱することができる。なお、陰極に析出した金属銅は、これを陰極板より剥離するなどして回収する。
【0014】
以上のように硫酸銅溶液(電解液)を電解し、陰極に金属銅を電析することにより、実質的に銅が除去された電解液残液は、実質的に硫酸溶液になっているので、これを第1工程における塩化銅分解のための硫酸溶液として利用できる。
【0015】
【発明の効果】
本発明によれば、含銅廃塩酸を優れたリサイクル性を持って効率よく処理することができる。一方、得られた金属銅は、高品位で、そのまま金属銅として使用できる。
【0016】
【実施例】
以下、実施例を示し、本発明を具体的に説明するが、本発明は下記の実施例に制限されるものではない。
【0017】
[実施例]
塩銅法による銅エッチング工程より排出された含銅廃塩酸溶液(塩化第1銅5g/L、塩化第2銅140g/L、塩酸(塩化水素)200g/L含有)1,000gに、98重量%濃度の硫酸溶液1,000gを添加し、100Torr、60℃において30分間反応させた。これにより上記廃塩酸溶液中の塩酸は殆ど塩化水素ガスとして除去された。
【0018】
次に、得られた硫酸銅溶液を、陽極として鉛、陰極としてステンレススチール板を用い、Dk20A/dm2、50℃の条件で12時間電解した。その結果、上記硫酸銅溶液中の銅分は殆ど電析処理された。得られた銅の品位は99.98%であった。
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a method for treating copper-containing waste hydrochloric acid discharged when copper is etched by a copper etching method (salt copper method) using cupric chloride in a manufacturing process of a printed circuit board or the like.
[0002]
[Prior art and problems to be solved by the invention]
Conventionally, copper-containing waste hydrochloric acid as an etching waste liquid contains copper chloride and hydrochloric acid.
(1) A method of neutralizing with sodium carbonate, extracting with sulfuric acid and recovering with copper sulfate,
(2) A method of neutralizing with slaked lime, treating with sulfuric acid and recovering with copper sulfate,
(3) Method of adding iron powder or iron scrap and recovering with copper powder and iron chloride,
(4) A diaphragm electrolysis method is known.
[0003]
However, in the method of (1), a large amount of sodium chloride is generated during neutralization with sodium carbonate, a large amount of chlorine ions remain in the produced copper carbonate, and the resulting copper sulfate needs to be purified. Further, there is a disadvantage that hydrochloric acid is wasted due to neutralization, and a process for producing copper sulfate from copper carbonate is required, which complicates the operation and is expensive. Since the method (2) is neutralized with slaked lime, as in the method (1), many chlorine ions are mixed into the copper sulfate, and there is a problem in terms of economy.
[0004]
In addition, the method (3) is poor in the quality of iron chloride obtained due to the quality of the iron powder or iron scrap used, and is difficult to reuse. In particular, the use of iron chloride has recently disappeared, and in order to further neutralize this, a large amount of alkali is required, and the treatment of sludge generated is also a problem.
[0005]
The method (4) was previously proposed by the present inventors to eliminate these disadvantages (Japanese Patent Application Laid-Open No. 7-70784), and this includes the waste discharged from the copper etching process by the salt copper method. The method of (1), (2), (3), wherein copper waste hydrochloric acid is electrolyzed, copper is electrodeposited on the cathode to recover copper, and the etching solution containing cupric chloride is regenerated at the anode. It is reasonable compared to However, since this method generates chlorine gas from the anode, the electrodeposition efficiency of copper at the cathode is deteriorated. In addition, since the working environment deteriorates due to the generation of chlorine gas, it is necessary to partition the anode and cathode with a diaphragm and transfer chlorine ions to the anode chamber to localize the generation of chlorine to the anode chamber. This can be solved by selecting the material of the diaphragm and examining the structure, but the copper deposited on the cathode is in the form of needles or dendrites, and in order to obtain this as powder, it is scraped with a wiper or similar scraping material. Must be taken. If this is not done, the diaphragm will be pierced, and the scraper material must be expensive, and is practically expensive. Therefore, a more practical method has been desired.
[0006]
The present invention has been made to improve the above circumstances, and can efficiently treat copper-containing waste hydrochloric acid discharged from the copper etching process by the salt copper method, is excellent in recyclability, and has a high plate shape. It aims at providing the processing method of the copper containing waste hydrochloric acid which can obtain quality copper.
[0007]
Means for Solving the Problem and Embodiment of the Invention
The present inventor has reached the present invention as a result of intensive studies to achieve the above object, and the present invention provides sulfuric acid to copper-containing waste hydrochloric acid discharged from a copper etching process using cupric chloride. It was added, under a reduced pressure of not more than 200Torr under a concentration of 40 to 70 wt% sulfuric acid concentration, at 60 to 120 ° C., the hydrochloride with decomposing copper chloride contained in the waste hydrochloric acid and copper sulfate and hydrochloric acid A first step of removing and recovering from the system, a second step of electrolyzing the copper sulfate solution obtained in the first step and recovering it as plate-like metallic copper at the cathode, and copper in the second step There is provided a method for treating copper-containing waste hydrochloric acid, comprising a third step of returning the residual liquid after electrolytic recovery to a first step as a sulfuric acid solution.
[0008]
According to the present invention, sulfuric acid is added to copper-containing waste hydrochloric acid to decompose copper chloride to obtain copper sulfate and hydrochloric acid. The hydrochloric acid is removed as hydrogen chloride gas, cooled, and recovered with a capacitor. Can be electrolyzed and recovered as plate-like metallic copper, and the remaining liquid after electrolysis can be used as a sulfuric acid solution for decomposing copper chloride in the first step. Accordingly, the copper-containing waste hydrochloric acid can be regenerated and recovered as a valuable material and can be effectively recycled.
[0009]
Also, in this case, copper sulfate electrolysis, unlike copper chloride electrolysis, has no problem of chlorine generation, so there is no need for a diaphragm, and a simple electrolyzer can be used. Or since it is a film form, it is not only easy to collect, but also contains no chlorine, and has a high quality of 99.90% or more.
[0010]
Therefore, the method of the present invention can industrially treat copper-containing waste hydrochloric acid.
[0011]
Hereinafter, the present invention will be described in more detail.
In the copper-containing waste hydrochloric acid treatment method of the present invention, this copper-containing waste hydrochloric acid is discharged when, for example, a copper-clad laminate is etched with a copper etchant using cupric chloride in the manufacturing process of a printed wiring board. Copper etch effluent, which contains copper chloride and hydrochloric acid.
[0012]
In the present invention, as the first step, sulfuric acid is added to such a copper-containing waste hydrochloric acid solution to decompose the copper chloride into copper sulfate and hydrochloric acid. In this case, since sulfuric acid is preferably distilled under reduced pressure so that the concentration after addition is 40 to 70% by weight, the concentration of sulfuric acid to be added is arbitrary, but is preferably 30 to 98% by weight. More preferably, the concentration is 50 to 98% by weight. The amount of addition may be determined so that the sulfuric acid concentration during the reaction of decomposing copper chloride into copper sulfate and hydrochloric acid is preferably 40 to 70% by weight. The reaction by addition of sulfuric acid is preferably carried out under reduced pressure, preferably 200 Torr or less, particularly 50 to 200 Torr at 60 to 120 ° C. This allows the above decomposition reaction to be carried out efficiently and hydrochloric acid as hydrogen chloride gas. It can be recovered by volatilization and cooling.
By this first step, the copper-containing waste hydrochloric acid solution can be made into a copper sulfate solution containing almost no chlorine. The chlorine gas can be recovered and used as a raw material for a copper etching solution.
[0013]
The second step of the present invention is a step of electrolyzing the copper sulfate solution obtained in the first step. This electrolysis can be carried out by a known method, but in the present invention, no diaphragm is required, and it is not necessary to partition the anode and the cathode by the diaphragm. In this case, an insoluble anode such as carbon, titanium, lead, stainless steel, platinum, platinum having a titanium film formed on the surface is used as the anode, and a stainless steel, copper plate (seed plate) is used as the cathode. The thing of the material which can peel a copper film easily, such as what applied glue etc., is used. In electrolysis, the cathode current density can be in the range of 0.1 to 30 A / dm 2 , and the temperature can be room temperature, but can be heated to, for example, about 70 ° C. if necessary. The copper metal deposited on the cathode is recovered by peeling it from the cathode plate.
[0014]
As described above, by electrolyzing the copper sulfate solution (electrolytic solution) and electrodepositing metallic copper on the cathode, the electrolytic solution remaining solution from which copper has been substantially removed is substantially a sulfuric acid solution. This can be used as a sulfuric acid solution for copper chloride decomposition in the first step.
[0015]
【The invention's effect】
According to the present invention, copper-containing waste hydrochloric acid can be efficiently processed with excellent recyclability. On the other hand, the obtained metallic copper is high quality and can be used as metallic copper as it is.
[0016]
【Example】
EXAMPLES Hereinafter, although an Example is shown and this invention is demonstrated concretely, this invention is not restrict | limited to the following Example.
[0017]
[Example]
Copper weight waste hydrochloric acid solution discharged from the copper etching process by the copper salt method (containing cupric chloride 5 g / L, cupric chloride 140 g / L, hydrochloric acid (hydrogen chloride) 200 g / L), 1,000 g, 98 wt. 1,000 g of a 1% strength sulfuric acid solution was added and reacted at 100 Torr and 60 ° C. for 30 minutes. As a result, most of the hydrochloric acid in the waste hydrochloric acid solution was removed as hydrogen chloride gas.
[0018]
Next, the obtained copper sulfate solution was electrolyzed for 12 hours under conditions of D k 20 A / dm 2 and 50 ° C. using lead as an anode and a stainless steel plate as a cathode. As a result, the copper content in the copper sulfate solution was almost electrodeposited. The quality of the obtained copper was 99.98%.

Claims (1)

塩化第2銅を用いる銅のエッチング工程より排出される含銅廃塩酸に硫酸を添加して、硫酸濃度40〜70重量%の濃度下において200Torr以下の減圧下、60〜120℃で、この廃塩酸中に含まれる塩化銅を硫酸銅と塩酸とに分解すると共に前記塩酸を系内から除去・回収する第1工程と、この第1工程で得られた硫酸銅の溶液を電解して陰極で板状の金属銅として回収する第2工程と、この第2工程で銅が電解回収された後の残液を第1工程に硫酸溶液として戻す第3工程とを有することを特徴とする含銅廃塩酸の処理方法。Sulfuric acid is added to the copper-containing waste hydrochloric acid discharged from the copper etching process using cupric chloride , and this waste is removed at 60 to 120 ° C. under a reduced pressure of 200 Torr or less at a sulfuric acid concentration of 40 to 70% by weight. A first step of decomposing copper chloride contained in hydrochloric acid into copper sulfate and hydrochloric acid and removing and recovering the hydrochloric acid from the system, and electrolyzing the copper sulfate solution obtained in the first step at the cathode A copper-containing process comprising: a second step of recovering as plate-like metallic copper; and a third step of returning the remaining liquid after electrolytic recovery of copper in the second step as a sulfuric acid solution to the first step Treatment method of waste hydrochloric acid.
JP2000239348A 2000-08-08 2000-08-08 Treatment method of waste copper containing hydrochloric acid Expired - Fee Related JP3736610B2 (en)

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