JP3698670B2 - Apparatus and method for supplying nickel ions to plating solution - Google Patents

Apparatus and method for supplying nickel ions to plating solution Download PDF

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Publication number
JP3698670B2
JP3698670B2 JP2001360261A JP2001360261A JP3698670B2 JP 3698670 B2 JP3698670 B2 JP 3698670B2 JP 2001360261 A JP2001360261 A JP 2001360261A JP 2001360261 A JP2001360261 A JP 2001360261A JP 3698670 B2 JP3698670 B2 JP 3698670B2
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Japan
Prior art keywords
tank
plating solution
nickel
alloy
dissolution
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JP2003160900A (en
Inventor
隆公 村井
大輔 伊藤
直和 熊谷
清人 久能
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Nippon Steel Corp
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Nippon Steel Corp
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Description

【発明の属する技術分野】
【0001】
本発明は、金属ニッケルを電解してメッキ液にニッケルイオンを供給する装置および方法に関する。具体的には、鋼帯へのニッケル合金メッキの進行に伴い消費されるニッケルイオンを補給するために、金属ニッケルを電解したニッケルイオンをメッキ液に供給する装置および供給する方法に関する。
【0002】
【従来の技術】
合金メッキ浴に消費された金属イオンを供給する方法および装置に関する従来技術は、特開平11−222700公報に開示されている。
この従来技術は、電解槽中に、陰極としてドラム状またはディスク状のものを回転可能に設け、陽極としてチタンメッシュの篭を用い、その中にイオウ含有金属ニッケルを充填し、合金メッキの使用ずみメッキ液を電解液として電解を行ない、電解により陽極から溶出したニッケルの一部を合金として陰極に析出させ、陰極を回転させて析出した金属を剥離して陰極面から除き、電解槽の外へ導く方法である。
【0003】
しかし、この方法は、析出したニッケル合金を、フィルターなどを通して回収し、粉砕などの前処理を行った後にメッキ液にて溶解する必要があり、電解装置以外に合金を回収、粉砕する特殊な装置を付帯設備として設置する必要があった。
【0004】
【発明が解決しようとする課題】
本発明は、前記のような従来技術の問題点を解決し、金属ニッケルをメッキ液中で電解後に剥離したニッケル合金を溶解槽にて連続的に溶解することにより、従来のような粉砕などの前処理が不要な簡便な手段および工程によりメッキ液にニッケルイオンを供給する装置および方法を提供することを課題とする。
【0005】
【課題を解決するための手段】
本発明は、電解により析出したニッケル合金がメッキ液にて溶解する際に水素気泡の発生を伴うため液面に浮遊する特性を利用し溶解槽にて合金を連続的に溶解する装置および方法を確立したものであり、その要旨とするところは、特許請求の範囲に記載した通りの下記内容である。
(1)金属ニッケルを電解してメッキ液にニッケルイオンを供給する装置であって、回転可能に設けた金属製の陰極と金属ニッケルを入れる篭型の陽極とを有する電解槽と、該金属製の陰極に析出したニッケル合金を剥離する手段と、剥離したニッケル合金をメッキ液中に溶解する溶解槽とを有し、前記ニッケル合金を剥離する手段として用いるメッキ液のスプレーと、前記陰極から剥離したニッケル合金を前記電解槽から溶解槽に強制的に搬送するメッキ液のスプレーとを有し、前記溶解槽は二槽以上に別れており、一槽目から二槽目へは遮蔽板の下に設けられたスリットに電解液を通過させることにより移液を行うことを特徴とするメッキ液にニッケルイオンを供給する装置。
ここに、回転可能に設けた金属製の陰極はドラムまたはディスク形状のものを採用し、メッキ液との接触面積を広くするためには、ディスク形状のものが好ましい。
また、陰極の材質は析出したニッケル合金が剥離し易いチタン製が好ましい。
【0006】
(2)前記溶解槽は一槽とし、該溶解槽から液送り槽へは遮蔽板の下に設けられたスリットに電解液を通過させることにより移液を行うことを特徴とする(1)に記載のメッキ液にニッケルイオンを供給する装置。
(3)前記溶解槽の一槽目の液面直下に合金受けメッシュを有し、該合金受けメッシュの上部に合金溶解促進スプレーを設けることを特徴とする(1)または(2)に記載のメッキ液にニッケルイオンを供給する装置。
【0007】
【発明の実施の形態】
本発明の実施の形態を図1乃至図4の実施例を用いて詳細に説明する。
図4は、本発明のニッケルイオン供給装置を用いて鋼帯にメッキ処理を施すラインの全体構成を示すフローチャートである。
まず、本発明のニッケルイオン供給装置21にてニッケルイオンを供給されたメッキ液は、メッキ液循環タンク12に送られる。
【0008】
また、必要に応じて亜鉛イオン供給装置22にて亜鉛イオンが供給されたメッキ液もこのメッキ液循環タンク12に送られ、このメッキ液循環タンク12にてニッケルイオンを含むメッキ液と混合される。
メッキ液循環タンク12にて混合されたメッキ液はメッキライン24に送られ、鋼帯にメッキ処理が施され、残ったメッキ液はメッキ液循環タンク12に戻される。
【0009】
本発明は、図4のニッケルイオン供給装置21に関する発明である。
図1は、本発明のニッケルイオン供給装置の全体図である。
電解槽1の中に、回転可能に設けられた陰極2と金属ニッケル4を入れる篭状の陽極3とが設置されている。この陰極2は、回転可能とし、且つ、メッキ液との接触面積を大きくするため、ディスクまたはドラム形状が好ましい。陰極2と陽極3との間に電解用整流器13を介して電流が流されると、金属ニッケルが電気分解されて、陰極2の表面にニッケル合金が析出する。
【0010】
図3は、本発明に用いる電解槽1の縦断面図である。
陰極2にはチタンなどの合金を剥離することが比較的容易な金属のドラムまたはディスクを用い、合金剥離手段5により剥離を行う。陽極3は金属ニッケル4を入れる篭状の構造となっている。合金剥離手段5は機械的に剥離させるドクターブレードやスクレバーでもよいが、メッキ液を強制的にスプレーする方法が陰極を疵付けず、容易に剥離できるので好ましい。
また、このスプレーにはメッキ液を用い溶解層(二槽目)低部よりポンプによって吸い出したものを用いている。
【0011】
剥離されたニッケル合金は確実に溶解した後にメッキ液循環タンクに送る必要があるため、合金がメッキ液中にて溶解する際に水素気泡の発生を伴うため液面に浮遊する特性を利用して、溶解槽8,9にて合金を連続的に溶解する方法を確立した。
陰極から剥離した合金は電解槽1から溶解槽8,9にメッキ液の合金運搬用スプレー7により強制的には運ばれる。
【0012】
図2は、本発明に用いる溶解槽8,9の構造を示す図である。溶解槽8,9はニ槽以上に別れており、一槽目8から二槽目9へは遮蔽板10の下に設けたスリットを通過することにより移液を行う。この構造により、合金は溶解時に発生する水素気泡により一槽目の液面にとどまり、遮蔽板10の働きにより、二槽目9に移動することはない。
なお、図1および図2では溶解槽として二槽を設けているが、合金は一槽目の溶解槽にて溶解するため、溶解槽は一槽にしてもよい。この場合、メッキ液のスプレーの源を一槽目の溶解槽にする必要がある。
【0013】
以上のうように、合金は確実に溶解した後イオンとなって二槽目9へと移動する。また、一槽目液面直下に数ミリのメッシュからなる合金受けメッシュ15を設置することにより剥離された合金14がメッキ液中への沈み込みを防ぐとともに、その上部より合金の溶解を促進するため合金溶解促進スプレー6によりメッキ液を吹きかけることにより、溶解の促進と、ニッケル合金の二槽目9への移動を防止することができる。
遮蔽板10の下方のスリットを通って溶解槽(二槽目)9に移動したメッキ液には合金は含まれておらず、液送り槽11を経てメッキ液循環タンク12に送液される。
【0014】
なお、ニッケル合金がメッキ液中で溶解するメカニズムは以下のように推定される。まず、メッキ液中に含まれる亜鉛イオンと金属ニッケルから電解したニッケルイオンが結びついて、陰極2の表面には亜鉛−ニッケル合金が析出する。このうち亜鉛はメッキ液中で容易に溶解するため、亜鉛−ニッケル合金は亜鉛が溶解すると多孔質になり、メッキ液との接触面積が大きくなることからニッケル合金も溶解し易くなると考えられる。
【0015】
(実施例)
本発明のニッケルイオン供給装置を用いて、鋼帯表面に亜鉛−ニッケル合金メッキを実施した。
ニッケルイオン供給装置におけるメッキ液の流量は6m3/hとし、メッキ液の温度は65℃、メッキ液中の硫酸濃度は18g/lとした。
このプロセス条件にて金属ニッケルを30A/dm2の電流密度にて電気分解し、メッキ液のスプレーにより剥離したニッケル合金を溶解槽にて連続的に溶解することができた。
【0016】
【発明の効果】
本発明によれば、従来の方法では、析出合金溶解のためにフィルターや粉砕機などの付帯設備が必要であり、さらに連続処理するための運搬装置なども必要であった。しかしながら、今回の方法は合金の溶解を溶解槽にて連続的に行うことができるため、付帯設備、運搬設備は必要なくまた、メンテナンスも必要のない優れた点が特徴である。など、産業上有用な、顕著な効果を奏する。
【図面の簡単な説明】
【図1】 本発明のニッケルイオン供給装置の全体図である。
【図2】 本発明の用いる溶解槽の構造を示す図である。
【図3】 本発明に用いる電解槽1の縦断面図である
【図4】 本発明のニッケルイオン供給装置を用いて鋼帯にメッキ処理を施すラインの全体構成を示すフローチャートである。
【符号の説明】
1 電解槽
2 陰極(ディスク、ドラム)
3 陽極(篭)
4 金属ニッケル
5 合金剥離手段(スプレー、スクレバー)
6 合金溶解促進スプレー
7 合金運搬用スプレー
8 溶解槽(一槽目)
9 溶解槽(二槽目)
10 遮蔽板
11 液送り槽
12 メッキ液循環タンク
13 電解用整流器
14 剥離された合金
15 合金受けメッシュ
21 ニッケルイオン供給装置
22 亜鉛イオン供給装置
24 メッキライン
BACKGROUND OF THE INVENTION
[0001]
The present invention relates to an apparatus and a method for supplying nickel ions to a plating solution by electrolyzing metallic nickel. Specifically, the present invention relates to an apparatus and a method for supplying nickel ions obtained by electrolyzing metal nickel to a plating solution in order to replenish nickel ions consumed as nickel alloy plating progresses on a steel strip.
[0002]
[Prior art]
Prior art relating to a method and apparatus for supplying metal ions consumed in an alloy plating bath is disclosed in Japanese Patent Laid-Open No. 11-222700.
In this prior art, a drum-shaped or disk-shaped cathode is rotatably provided in an electrolytic cell, a titanium mesh ridge is used as an anode, sulfur-containing metallic nickel is filled therein, and alloy plating is used. Electrolysis is carried out using the plating solution as the electrolytic solution, and a part of nickel eluted from the anode by electrolysis is deposited on the cathode as an alloy. It is a way to guide.
[0003]
However, this method needs to collect the deposited nickel alloy through a filter, etc., and perform pretreatment such as pulverization and then dissolve in the plating solution. Needed to be installed as ancillary equipment.
[0004]
[Problems to be solved by the invention]
The present invention solves the problems of the prior art as described above, and continuously dissolves nickel alloy that has been peeled after electrolysis in a plating solution after electrolysis in a plating solution. It is an object of the present invention to provide an apparatus and method for supplying nickel ions to a plating solution by simple means and processes that do not require pretreatment.
[0005]
[Means for Solving the Problems]
The present invention relates to an apparatus and method for continuously melting an alloy in a dissolution tank by utilizing the characteristics of floating on the liquid surface because the nickel alloy deposited by electrolysis is dissolved in the plating solution, accompanied by the generation of hydrogen bubbles. What has been established and has the gist thereof is the following contents as described in the claims.
(1) An apparatus for electrolyzing metallic nickel and supplying nickel ions to a plating solution, comprising an electrolytic cell having a metal cathode rotatably provided and a bowl-shaped anode into which metal nickel is placed; A plating solution having means for peeling the nickel alloy deposited on the cathode and a dissolution tank for dissolving the peeled nickel alloy in the plating solution, and a plating solution spray used as a means for peeling the nickel alloy, and peeling from the cathode A plating solution that forcibly conveys the nickel alloy from the electrolytic bath to the melting bath, and the melting bath is divided into two or more baths, from the first bath to the second bath under the shielding plate. An apparatus for supplying nickel ions to a plating solution, wherein the electrolyte solution is transferred by passing the electrolyte solution through a slit provided in the plate.
Here, the metal cathode provided in a rotatable manner employs a drum or disk shape, and in order to increase the contact area with the plating solution, a disk cathode is preferable.
The cathode is preferably made of titanium, from which the deposited nickel alloy is easy to peel off.
[0006]
(2) In the above (1), the dissolution tank is a single tank, and the solution is transferred from the dissolution tank to the liquid feed tank by passing the electrolyte through a slit provided under the shielding plate. An apparatus for supplying nickel ions to the plating solution.
(3) The alloy receiving mesh is provided immediately below the liquid level in the first tank of the melting tank, and an alloy dissolution promoting spray is provided on the upper part of the alloy receiving mesh. (1) or (2) A device that supplies nickel ions to the plating solution.
[0007]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described in detail with reference to the embodiments shown in FIGS.
FIG. 4 is a flowchart showing the overall configuration of a line for plating a steel strip using the nickel ion supply apparatus of the present invention.
First, the plating solution supplied with nickel ions by the nickel ion supply device 21 of the present invention is sent to the plating solution circulation tank 12.
[0008]
Further, if necessary, the plating solution supplied with zinc ions by the zinc ion supply device 22 is also sent to the plating solution circulation tank 12 and mixed with the plating solution containing nickel ions in the plating solution circulation tank 12. .
The plating solution mixed in the plating solution circulation tank 12 is sent to the plating line 24, the steel strip is plated, and the remaining plating solution is returned to the plating solution circulation tank 12.
[0009]
The present invention relates to the nickel ion supply device 21 of FIG.
FIG. 1 is an overall view of a nickel ion supply apparatus according to the present invention.
In the electrolytic cell 1, a cathode 2 provided rotatably and a bowl-like anode 3 into which metal nickel 4 is placed are installed. The cathode 2 is preferably disk-shaped or drum-shaped in order to be rotatable and to increase the contact area with the plating solution. When a current is passed between the cathode 2 and the anode 3 via the electrolysis rectifier 13, metallic nickel is electrolyzed and a nickel alloy is deposited on the surface of the cathode 2.
[0010]
FIG. 3 is a longitudinal sectional view of the electrolytic cell 1 used in the present invention.
The cathode 2 is a metal drum or disk that is relatively easy to peel off an alloy such as titanium, and is peeled off by the alloy peeling means 5. The anode 3 has a bowl-like structure into which metallic nickel 4 is placed. The alloy stripping means 5 may be a doctor blade or a scrubber that is mechanically stripped, but a method of forcibly spraying a plating solution is preferable because it can be easily stripped without scratching the cathode.
In addition, this spray uses a plating solution which is sucked out by a pump from the lower part of the dissolved layer (second tank).
[0011]
Since the peeled nickel alloy must be surely melted and then sent to the plating solution circulation tank, hydrogen bubbles are generated when the alloy dissolves in the plating solution. A method for continuously melting the alloy in the melting tanks 8 and 9 was established.
The alloy peeled from the cathode is forcibly transported from the electrolytic cell 1 to the dissolution baths 8 and 9 by the alloy solution spray 7 for plating solution.
[0012]
FIG. 2 is a diagram showing the structure of the dissolution tanks 8 and 9 used in the present invention. Dissolution tanks 8 and 9 are separated into two or more tanks, and liquid transfer is performed from the first tank 8 to the second tank 9 by passing through a slit provided under the shielding plate 10. With this structure, the alloy stays at the liquid level in the first tank due to hydrogen bubbles generated during melting, and does not move to the second tank 9 due to the action of the shielding plate 10.
In FIG. 1 and FIG. 2, two tanks are provided as dissolution tanks, but the alloy is dissolved in the first dissolution tank, so the dissolution tank may be a single tank. In this case, it is necessary to use the plating solution spray source as the first dissolution tank.
[0013]
As described above, the alloy is surely dissolved and then becomes ions, and moves to the second tank 9. Further, by installing an alloy receiving mesh 15 made of several millimeters of mesh just below the first tank liquid surface, the peeled alloy 14 is prevented from sinking into the plating solution and promotes dissolution of the alloy from the upper part. Therefore, by spraying the plating solution with the alloy dissolution accelerating spray 6, it is possible to prevent the dissolution from being promoted and the nickel alloy from moving to the second tank 9.
The plating solution moved to the dissolution tank (second tank) 9 through the slit below the shielding plate 10 contains no alloy, and is sent to the plating solution circulation tank 12 through the solution feeding tank 11.
[0014]
The mechanism by which the nickel alloy dissolves in the plating solution is estimated as follows. First, zinc ions contained in the plating solution are combined with nickel ions electrolyzed from metallic nickel, and a zinc-nickel alloy is deposited on the surface of the cathode 2. Among these, since zinc easily dissolves in the plating solution, the zinc-nickel alloy becomes porous when zinc is dissolved, and the contact area with the plating solution increases, so it is considered that the nickel alloy is easily dissolved.
[0015]
(Example)
Zinc-nickel alloy plating was performed on the steel strip surface using the nickel ion supply apparatus of the present invention.
The flow rate of the plating solution in the nickel ion supply device was 6 m 3 / h, the temperature of the plating solution was 65 ° C., and the sulfuric acid concentration in the plating solution was 18 g / l.
Under these process conditions, metallic nickel was electrolyzed at a current density of 30 A / dm 2 , and the nickel alloy peeled off by spraying the plating solution could be continuously dissolved in the melting tank.
[0016]
【The invention's effect】
According to the present invention, in the conventional method, incidental equipment such as a filter and a pulverizer is required for dissolving the precipitated alloy, and further, a transport device for continuous processing is required. However, this method is characterized by the fact that the alloy can be continuously melted in a melting tank, and therefore, there is no need for ancillary equipment and transport equipment and no maintenance. It has a remarkable effect that is industrially useful.
[Brief description of the drawings]
FIG. 1 is an overall view of a nickel ion supply apparatus of the present invention.
FIG. 2 is a view showing the structure of a dissolution tank used in the present invention.
FIG. 3 is a longitudinal sectional view of an electrolytic cell 1 used in the present invention. FIG. 4 is a flowchart showing an overall configuration of a line for plating a steel strip using the nickel ion supply apparatus of the present invention.
[Explanation of symbols]
1 Electrolysis cell 2 Cathode (disk, drum)
3 Anode (篭)
4 Metal nickel 5 Alloy stripping means (spray, scrubber)
6 Alloy dissolution promotion spray 7 Alloy transport spray 8 Dissolution tank (first tank)
9 Dissolution tank (second tank)
DESCRIPTION OF SYMBOLS 10 Shielding plate 11 Liquid feeding tank 12 Plating liquid circulation tank 13 Electrolytic rectifier 14 Peeled alloy 15 Alloy receiving mesh 21 Nickel ion supply device 22 Zinc ion supply device 24 Plating line

Claims (3)

金属ニッケルを電解してメッキ液にニッケルイオンを供給する装置であって、回転可能に設けた金属製の陰極と金属ニッケルを入れる篭型の陽極とを有する電解槽と、該金属製の陰極に析出したニッケル合金を剥離する手段と、剥離したニッケル合金をメッキ液中に溶解する溶解槽とを有し、
前記ニッケル合金を剥離する手段として用いるメッキ液のスプレーと
前記陰極から剥離したニッケル合金を前記電解槽から溶解槽に強制的に搬送するメッキ液のスプレーとを有し、
前記溶解槽は二槽以上に別れており、一槽目から二槽目へは遮蔽板の下に設けられたスリットに電解液を通過させることにより移液を行うことを特徴とするメッキ液にニッケルイオンを供給する装置。
An apparatus for electrolyzing nickel and supplying nickel ions to a plating solution, comprising an electrolytic cell having a metal cathode rotatably provided and a bowl-shaped anode into which metal nickel is placed, and the metal cathode A means for peeling the deposited nickel alloy, and a dissolution tank for dissolving the peeled nickel alloy in the plating solution,
A spray of plating solution used as a means for peeling the nickel alloy ;
A plating solution forcibly conveying the nickel alloy peeled from the cathode from the electrolytic bath to the dissolution bath, and
The dissolution tank is divided into two or more tanks, and from the first tank to the second tank , the plating solution is transferred by passing the electrolyte through a slit provided under the shielding plate. A device that supplies nickel ions.
前記溶解槽は一槽とし、該溶解槽から液送り槽へは遮蔽板の下に設けられたスリットに電解液を通過させることにより移液を行うことを特徴とする請求項1に記載のメッキ液にニッケルイオンを供給する装置。2. The plating according to claim 1, wherein the dissolution tank is a single tank, and the solution is transferred from the dissolution tank to the liquid feeding tank by passing an electrolytic solution through a slit provided under the shielding plate. A device that supplies nickel ions to the liquid. 前記溶解槽の一槽目の液面直下に合金受けメッシュを有し、該合金受けメッシュの上部に合金溶解促進スプレーを設けることを特徴とする請求項1または請求項2に記載のメッキ液にニッケルイオンを供給する装置。3. The plating solution according to claim 1, wherein an alloy receiving mesh is provided immediately below the liquid level in the first tank of the melting tank, and an alloy dissolution promoting spray is provided on the upper part of the alloy receiving mesh. A device that supplies nickel ions.
JP2001360261A 2001-11-27 2001-11-27 Apparatus and method for supplying nickel ions to plating solution Expired - Fee Related JP3698670B2 (en)

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