JP3645747B2 - Board alignment device - Google Patents

Description

[0001]
[Industrial application fields]
The present invention relates to a substrate alignment apparatus for aligning a disk-shaped substrate such as a wafer having a notch.
[0002]
[Prior art]
A conventional substrate alignment apparatus 100 is shown in FIG.
As shown in FIGS. 9A and 9B, the substrate aligning apparatus 100 is engaged with an engaging roller 101 extending in a horizontal direction (a direction perpendicular to the paper surface in FIG. 9) and below the engaging roller 101. A driving roller 102 is in contact with the roller 101 and extends in parallel with the engaging roller 101. The driving roller 102 is rotated by a driving mechanism (not shown).
In the substrate alignment apparatus 100, the substrates W are supported on the engagement rollers 101 in a state where a plurality of substrates W are arranged in a direction perpendicular to the paper surface. The plurality of substrates W are provided with notches N and can be engaged with the engagement roller 101.
The operation of the substrate alignment apparatus 100 will be described.
[0003]
First, as shown in FIG. 9 (a), the driving roller 102 is rotated clockwise, the engaging roller 101 is rotated counterclockwise. As a result, the substrate W rotates clockwise. When the rotation proceeds, the notch N provided in the substrate W and the engagement roller 101 are engaged with each other as shown in FIG. 9B, and the substrate W does not rotate any more. In the substrate aligning apparatus 100, a time during which all the cutouts N of the plurality of substrates W will be engaged with the engaging roller 101, specifically, a time during which the substrate W rotates one or more times is determined in advance as a driving time. The engagement roller 101 is rotated for the driving time. If the notch N is engaged with the engaging roller 101 before the driving time is reached, the engaging roller 101 is idled while being engaged with the notch N.
[0004]
In this way, the plurality of substrates W are aligned in a state where the position of the notch N included in each of the substrates W is arranged at the position of the engagement roller 101.
[0005]
[Problems to be solved by the invention]
In the substrate alignment apparatus 100, the portion of the engagement roller 101 that comes into contact with the substrate W wears out as the operation time passes. When the engagement roller 101 is worn out and the diameter is reduced, the notch N of the rotating substrate W jumps over the engagement roller 101, and the notch N can be stopped at the position of the engagement roller 101. As a result, alignment of the substrates becomes impossible.
For this reason, the engagement roller 101 needs to be replaced as soon as it wears out. As a result, parts replacement occurs frequently and the running cost cannot be suppressed.
[0006]
An object of the present invention is to reduce the running cost of the substrate alignment apparatus.
[0007]
[Means for Solving the Problems]
The substrate alignment apparatus according to claim 1 has a notch in the peripheral portion, supports a plurality of disk-like substrates that are erected in a substantially vertical direction and are arranged in a direction perpendicular to the main surface, and each of the substrates is cut. A substrate aligning device for aligning the positions of the notches at predetermined positions, wherein a pair of first holding blocks and second holding blocks provided at a distance longer than a distance occupied by the plurality of substrates in the arrangement direction of the substrates; A supporting member that is held between the first holding block and the second holding block so as to be movable in the arrangement direction of the substrates and that supports the edge of the substrate from below, and a direction parallel to the arrangement direction of the substrates An urging means for urging the support member in an urging direction from the second holding block toward the first holding block, and restricting movement of the support member in the urging direction by the urging force of the urging means. To The member is stopped at two positions: a predetermined pre-movement position where the support member supports the substrate, and a post-movement position shifted by a predetermined distance in a direction parallel to the alignment direction of the substrates with respect to the pre-movement position. and a regulating means, said first holding block and the second holding block said supporting member is a substrate alignment apparatus that holds between the post-movement position and the pre-movement position.
[0008]
The substrate alignment apparatus according to claim 2 is the substrate alignment apparatus according to claim 1 , wherein each of the first holding block and the second holding block has a first through hole and a second through hole through which a support member passes, The support member is held between the first holding block and the second holding block in a state where the first end protrudes from the first through hole and the second end protrudes from the second through hole. A spring provided between the first holding block and the first end of the support member to urge the support member in the urging direction; and the restricting means is provided at a second end of the support member. A substrate having a stopper that prevents the end portion from coming out of the second through hole, and a spacer that is detachably provided between the stopper and the second holding block and has a length of the predetermined distance in the direction in which the substrates are arranged. Alignment device.
[0009]
A substrate alignment apparatus according to a third aspect of the present invention is the substrate alignment apparatus according to the first or second aspect , wherein the support member is a substantially cylindrical member having a longitudinal direction in the alignment direction of the substrates and engaging with a notch of the substrate. A substrate alignment apparatus.
[0010]
The substrate alignment apparatus according to claim 4 has a notch in the peripheral portion, supports a plurality of disk-like substrates that are erected in a substantially vertical direction and are arranged in a direction orthogonal to the main surface, A substrate alignment apparatus for aligning notch positions at predetermined positions, wherein a pair of first holding block and second holding block provided at a distance longer than a distance occupied by the plurality of substrates in the arrangement direction of the substrates, the between the first holding block and the second holding block is held in a movable state in the direction of arrangement of the substrate, and a support member for supporting the edge of the substrate from below, the first holding block And the second holding block has a distance that is half the distance between the plurality of substrates in a direction parallel to the alignment direction of the substrates with respect to the predetermined position before the movement where the supporting member supports the substrate and the position before the movement. In the shifted position after moving A substrate alignment device for lifting.
[0011]
DETAILED DESCRIPTION OF THE INVENTION
<Outline of substrate alignment device>
[0012]
FIG. 1 is a perspective view of a substrate alignment apparatus 1 according to the present invention. The surface indicated by the arrow F is the front surface of the substrate alignment apparatus 1.
The substrate alignment apparatus 1 aligns the substrates W. As shown in the figure, the substrate W has a substantially disk shape having a notch N in the peripheral portion, and a plurality of substrates W are standing in a substantially vertical direction and arranged in a direction perpendicular to the main surface. The substrate alignment apparatus 1 rotates the substrates W in the circumferential direction to align the positions of the cutouts N of the substrates W at predetermined positions.
The plurality of substrates W are arranged at intervals P, and are arranged over a distance WL in a direction orthogonal to the main surface. Further, the arrangement direction of the plurality of substrates W is hereinafter referred to as a substrate arrangement direction.
[0013]
The substrate alignment apparatus 1 has an air cylinder 61. A base plate 10 is fixed in a horizontal state on the air cylinder 61, and the base plate 10 can be moved up and down below the substrate W by the air cylinder 61.
On the base plate 10, a first holding block 13a and a second holding block 13b are provided at a distance longer than a distance WL occupied by the plurality of substrates W in the substrate arrangement direction. Between the two holding blocks 13b, a first drive roller 21, a second drive roller 22, a support rod 23, an engagement roller 24, and a free roller 25 are supported.
[0014]
One shaft end of the first drive roller 21 protrudes outside the first holding block 13a, and a first driven sprocket 21a is fixed to the shaft end. One shaft end of the second drive roller 22 also protrudes outside the first holding block 13a, and a second driven sprocket 22a is fixed to the shaft end. The outer periphery of the second driving roller 22 is in contact with the outer periphery of the engaging roller 24, and when the second driving roller 22 rotates, the engaging roller 24 is rotated and the engaging roller 24 rotates. .
[0015]
A motor 30 is fixed to the base plate 10. A shaft 31 is coupled to the motor 30, and a drive gear 32 is provided in the space between the first holding block 13a and the second holding block 13b. The shaft 31 is provided outside the first holding block 13a. A one-drive sprocket 33 is fixed.
A first belt 34 that is an endless belt is wound between the first sprocket 33 and the first driven sprocket 21a.
[0016]
A reversing gear 35 meshes with the driving gear 32, and a shaft 36 coupled to the reversing gear 35 projects outside the first holding block 13a, and a younger brother 2 driving sprocket 37 is fixed to the end of the shaft 36. .
[0017]
A second belt 38 that is an endless belt is wound between the second drive sprocket 37 and the second driven sprocket 22a.
[0018]
The free roller 25 is rotatably provided with respect to the first holding block 13a and the second holding block 13b. The support bar 23 is fixed to the first holding block 13a and the second holding block 13b.
[0019]
With this configuration, when the motor 30 is driven counterclockwise when viewed from the front, the substrate W rotates clockwise when viewed from the front.
[0020]
On the other hand, a light projecting element 41 and a light receiving element 42 are fixed to a machine frame (not shown), and a light beam R emitted from the light projecting element 41 reaches the light receiving element 42.
[0021]
The light ray R is set in parallel with the substrate alignment direction. The place where the light ray R is arranged will be described later.
[0022]
FIG. 2 is a block diagram relating to the control of the substrate alignment apparatus 1.
[0023]
A start switch 51, a light projecting element 41, a light receiving element 42, a motor 30, and an air cylinder 61 are connected to a control unit 50 having a CPU, RAM, ROM, and timer.
[0024]
The substrate alignment apparatus 1 as described above aligns the substrates W held by the two pairs of guides 55a and 55b as shown in FIG.
[0025]
The guides 55a and 55b are longitudinal members extending in the substrate alignment direction as shown in FIG. 1, and have a plurality of grooves 56a and 56b extending in the vertical direction, and the substrate W is held by the plurality of grooves 56a and 56b. . The grooves 56a and 56b are formed at intervals P in the substrate alignment direction. In FIG. 1, only one guide 55a, 55b is shown in the pair of guides 55a, 55b, and the other is omitted.
[0026]
Such guides 55a and 55b restrict the movement of the substrates W in the substrate alignment direction, and hold the substrates W in a state where they are erected in a substantially vertical direction and are arranged in a plurality with intervals P.
[0027]
Next, the operation of the substrate alignment apparatus 1 will be described with reference to FIGS. 3 (a) and 3 (b) and FIGS. 4 (a) and 4 (b). FIGS. 3A, 3B and 4A, 4B are front views of the main part of the substrate alignment apparatus 1. FIG.
[0028]
First, as shown in FIG. 3A, the substrate alignment apparatus 1 is disposed below the substrate W held by the guides 55a and 55b. When the start switch 51 is turned on, the control unit 50 drives the air cylinder 61 to raise the base plate 10. Thereby, as shown in FIG. 3B, the substrate alignment apparatus 1 pushes up and supports the substrate W held by the guides 55a and 55b. At this time, the substrate W is supported by the first drive roller 21 and the engagement roller 24.
[0029]
Next, the control unit 50 emits the light beam R from the light projecting element 41, starts monitoring whether the light beam R has reached the light receiving element 42, and drives the motor 30 as shown in FIG. 4A. The substrate W is rotated clockwise.
[0030]
Then, when the substrate W rotates and the notch N engages with the engagement roller 24, the substrate W becomes as shown in FIG.
It rides on the engagement roller 24 and is supported by the support rod 23, the engagement roller 24, and the free roller 25. At this time, the support rod 23 and the free roller 25 do not apply rotational force to the substrate W, and the engagement roller 24 idles while being engaged with the notch N. Accordingly, the substrate W stops rotating.
[0032]
When the notch N engages with the engagement roller 24, the substrate W is displaced as shown in FIG. 4B within the plane including the main surface. That is, it is displaced from the pre-alignment position WA to the post-alignment position WB.
[0033]
Here, the position where the light beam R is arranged will be described. As shown in FIG. 4B, the light beam R is arranged at a position where the substrate W exists before the substrate W is displaced and after the displacement, the substrate W does not exist. ing. Note that the light ray R may be placed anywhere as long as the substrate W exists before the displacement of the substrate W and the substrate W does not exist after the displacement. Specifically, the presence or absence of the substrate indicated by hatching in FIG. It may be anywhere within the area WR.
[0034]
When all the substrates W are displaced, the light ray R blocked by the substrate W can reach the light receiving element 42. When the control unit 50 confirms that the light receiving element 42 receives the light ray R, the control unit 50 starts counting the timer. Then, after a predetermined time has elapsed, the control unit 50 once again confirms whether or not the light beam R has reached the light receiving element 42, and if it has reached, determines that the alignment of all the substrates W has been completed and the motor 50 30 is stopped, and the emission of the light beam R from the light projecting element 41 is stopped. Then, the control unit 50 drives the air cylinder 61 to lower the base plate 10 to transfer the substrate W supported by the substrate alignment apparatus 1 to the guides 55a and 55b.
[0035]
Further, when it is confirmed whether or not the light beam R has arrived at the light receiving element 42 again after the predetermined time has elapsed, if the light beam R has not reached the light receiving element 42, it happens to be all of the light on the optical axis of the light beam R. Since the notches N of the substrate W are now aligned, the emission of the light beam R from the light projecting element 41 and the driving of the motor 30 are continued, and the presence or absence of the light beam R reaching the light receiving element 42 is monitored again. Return to.
[0036]
Here, the predetermined time will be described.
[0037]
When the substrate alignment apparatus 1 supports only one substrate W, and the substrate W starts to rotate with the light ray R blocked, the notch N arrives at the portion through which the light ray R passes. The time when the light ray R passes through the notch N is t0, and the substrate W is further rotated so that the notch N passes through the portion where the light ray R passes, and the light ray R is blocked by the substrate W again. Tl, and the substrate W is further rotated so that the notch N arrives again at the part through which the light ray R passes, and the time when the light ray R passes through the notch N is given as t3. In this case, the predetermined time is equal to or longer than (tl−t0) and shorter than (t3−tl).
[0038]
Next, a structure for moving the engagement roller 24 will be described.
5 is a cross-sectional view taken along the line VV in FIG. As shown in the drawing, the first holding block 13 a and the second holding block 13 b are provided with bearings 78 and 79, respectively, and the bearings 78 and 79 hold the second drive roller 22.
[0039]
The first holding block 13a and the second holding block 13b are provided with bearings 71 and 72, respectively, and hold the engaging roller 24.
The bearings 71 and 72 have a first through hole 71A and a second through hole 72A, respectively, and the engagement roller 24 is held in a state of being inserted through the first through hole 71A and the second through hole 72A. The engagement roller 24 is held so as to be movable in the substrate alignment direction with respect to the bearings 71 and 72.
[0040]
The engagement roller 24 is a ceramic rod-shaped member that is coated with tetrafluoroethylene-perfluoroalkoxy polymer (hereinafter referred to as PFA) over the region that supports the substrate W.
[0041]
The first shaft end 24A and the second shaft end 24B, which are the two ends of the engagement roller 24, are held in a state of protruding from the first holding block 13a and the second holding block 13b, respectively.
[0042]
A first stopper 73, which is a ring-shaped member larger than the diameter of the first through hole 71A, is fixed to the first shaft end 24A protruding from the first holding block 13a of the two ends of the engagement roller 24. In addition, a compression spring 74 is disposed between the first stopper 73 and the first holding block 13a.
The compression spring 74 is a spirally wound spring, and is provided so that the engagement roller 24 passes through the inside. The extension spring 24 is extended between the first holding block 13a and the first stopper 73 so that the engagement roller 24 is moved. The second holding block 13b is biased in the biasing direction T toward the first holding block 13a.
[0043]
On the other hand, of the two ends of the engaging roller 24, the second shaft end 24B protruding from the second holding block 13b has a second stopper 75 that is a ring-shaped member larger than the diameter of the second through hole 72A. Is fixed.
A spacer 76 is disposed between the second stopper 75 and the second holding block 13b.
[0044]
The spacer 76 is a substantially ring-shaped elastic member made of PFA as shown in FIG. 6, and has an insertion hole 76A through which the engagement roller 24 is inserted and a slit 76B that communicates with the insertion hole 76A, and opens the slit 76B. Thus, it can be attached to and detached from the engaging roller 24.
[0045]
The spacer 76 has a length of P / 2, which is half of the interval P between the substrates W in the substrate alignment direction.
In the substrate alignment apparatus 1 as described above, the maintenance related to the engagement roller 24 will be described. Here, maintenance is performed by moving the worn engagement roller 24 in the urging direction T. This will be described with reference to FIGS.
[0046]
7 and 8 are partially enlarged views of FIG. 5, but the second drive roller 22 and the like are not shown for convenience.
[0047]
When the substrate alignment apparatus 1 is used over a long period of time, the portion of the engagement roller 24 that contacts the substrate W is worn and dented as shown in FIG. 7, and the diameter of the portion becomes small. Then, when the substrate alignment apparatus 1 is operated, the notch N of the substrate W jumps over the engagement roller 24, and normal substrate alignment cannot be performed. In such a case, the spacer 76 is removed from the engagement roller 24. Here, since the engagement roller 24 is urged in the urging direction T by the compression spring 74 via the first stopper 73, it moves by a distance P / 2 in the urging direction T as shown in FIG.
Since the second stopper 75 is provided at the end of the second shaft of the engagement roller 24, the engagement roller 24 moves by a distance P / 2 without dropping from the second through hole 72A and stops.
[0048]
When the engagement roller 24 is moved, the portion where the engagement roller 24 newly supports the substrate W is not worn at all, so that the substrates can be aligned normally.
[0049]
As described above, if the engagement roller 24 is moved, the replacement frequency of the engagement roller 24 can be reduced, so that the running cost of the substrate alignment apparatus 1 can be suppressed.
In the above embodiment, since the moving distance d of the engaging roller 24 is P / 2, the substrate W can be reliably supported by the unused portion of the engaging roller 24.
[0050]
Note that the movement distance d may not be P / 2 as long as the substrate W can be supported by the portion where the engagement roller 24 maintains a predetermined diameter. Specifically, if the thickness of the substrate W is t, the movement distance d will be described. May satisfy t ≦ d ≦ (P−t). Accordingly, the length l of the spacers 76 defining the moving distance d of the engagement roller 24 in the substrate alignment direction may be t ≦ l ≦ (P−t).
[0051]
In the above embodiment, only one spacer 76 having a length P / 2 in the substrate arrangement direction is used. However, a plurality of spacers 76 having a length in the substrate arrangement direction smaller than P / 2 are provided for each maintenance. You may remove one by one sequentially. Then, the replacement frequency of the engagement roller 24 can be reduced.
[0052]
【The invention's effect】
According to the substrate alignment apparatus of the first aspect, the support member is held at the pre-movement position and the post-movement position. For this reason, the part in which the support member was in contact with the substrate at the position before movement and the part in contact with the substrate at the position after movement can be made different. Therefore, the support member can be used at the pre-movement position and the post-movement position, and the replacement frequency of the support member can be suppressed. Therefore, the running cost of the substrate alignment apparatus can be suppressed.
[0053]
Further , the support member is urged by the urging means, and the position is regulated to the pre-movement position and the post-movement position by the regulation means. Therefore, if the restricting means is operated, the support member at the pre-movement position can be easily moved to the post-movement position.
[0054]
According to the substrate alignment apparatus of claim 2, when the spacer is between the stopper and the second holding block support member is restricted at a position before the movement. When the spacer is removed, the support member moves in the urging direction and is restricted to the post-movement position by the stopper. In this way, the support member can be easily moved to the pre-movement position and the post-movement position simply by removing the spacer.
[0055]
According to the substrate alignment apparatus of claim 3 , since the support member is a member that engages with the notch, the wear due to contact with the substrate is severe, but the support member is replaced by moving the support member to the pre-movement position and the post-movement position. The frequency can be suppressed.
[0056]
According to the substrate alignment apparatus of claim 4 , since the predetermined distance is half the distance between the plurality of substrates, when the support member is moved to the post-movement position, the substrate is surely used at an unused portion of the support member. Can be supported.
[Brief description of the drawings]
FIG. 1 is a perspective view showing an embodiment of a substrate alignment apparatus according to the present invention.
FIG. 2 is a block diagram relating to control of the substrate alignment apparatus.
FIG. 3 is a front view of an essential part of the substrate alignment apparatus.
FIG. 4 is a front view of a main part of the substrate alignment apparatus.
FIG. 5 is a cross-sectional view of a main part of the substrate alignment apparatus.
FIG. 6 is a perspective view of a spacer.
FIG. 7 is a partially enlarged view of FIG. 5;
8 is a partially enlarged view of FIG.
FIG. 9 is a diagram of a conventional substrate alignment apparatus.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Board | substrate alignment apparatus 13a 1st holding block 13b 2nd holding block 21 1st drive roller 22 2nd drive roller 24 Engagement roller 30 Motor 41 Light emitting element 42 Light receiving element 50 Control part 61 Air cylinder 73 1st stopper 74 Compression spring 75 Second stopper 76 Spacer N Notch R Ray W Substrate

Claims (4)

Supports a disk-shaped substrate that has a notch in the periphery, stands in a substantially vertical direction, and is aligned in a direction perpendicular to the main surface, and aligns the position of the notch on each substrate at a predetermined position. A substrate aligning device,
A pair of first holding block and second holding block provided at a distance longer than the distance occupied by the plurality of substrates in the direction of arrangement of the substrates;
A supporting member that is held in a movable state in the direction in which the substrates are arranged between the first holding block and the second holding block, and supports an end of the substrate from below ;
A biasing means for biasing the support member in a biasing direction from the second holding block toward the first holding block in a direction parallel to the arrangement direction of the substrates;
By restricting the movement of the support member in the urging direction by the urging force of the urging means, the support member is moved to a predetermined pre-movement position where the support member supports the substrate, and the pre-movement position. And a restricting means for stopping at two positions, a post-movement position shifted by a predetermined distance in a direction parallel to the alignment direction of the substrates ,
Wherein the first holding block and the second holding block the support member, a substrate alignment apparatus that holds between the post-movement position and the pre-movement position. The substrate alignment apparatus according to claim 1 , wherein
Each of the first holding block and the second holding block has a first through hole and a second through hole through which the support member passes,
The support member is held between the first holding block and the second holding block with a first end protruding from the first through hole and a second end protruding from the second through hole,
The biasing means is a spring provided between the first holding block and the first end of the support member to bias the support member in the biasing direction,
The restricting means is provided at the second end of the support member and prevents the second end from coming out of the second through hole;
A substrate alignment apparatus comprising: a spacer which is detachably provided between the stopper and the second holding block and has a length of the predetermined distance in the substrate alignment direction. The substrate alignment apparatus according to claim 1 or 2 ,
The substrate alignment apparatus is a substantially columnar member having a longitudinal direction in a direction in which the substrates are arranged and engaging with a notch of the substrate. Supports a disk-shaped substrate that has a notch in the periphery, stands up in a substantially vertical direction, and is aligned in a direction perpendicular to the main surface, and aligns the notch position of each substrate at a predetermined position A substrate aligning device,
A pair of first substrates provided at a distance longer than the distance occupied by the plurality of substrates in the direction in which the substrates are arranged. 1 A holding block and a second holding block;
Said 1 Between the holding block and the second holding block, it is held in a movable state in the direction in which the substrates are arranged, and has a support member that supports the edge of the substrate from below,
Said 1 The holding block and the second holding block are configured to support the supporting member at a predetermined pre-movement position where the supporting member supports the substrate and a half of the interval between the substrates in a direction parallel to the alignment direction of the substrates. A substrate alignment apparatus that holds the position after movement shifted by a distance of.

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