JP3527223B2 - Reflector for LCD projector - Google Patents
Reflector for LCD projectorInfo
- Publication number
- JP3527223B2 JP3527223B2 JP2001287249A JP2001287249A JP3527223B2 JP 3527223 B2 JP3527223 B2 JP 3527223B2 JP 2001287249 A JP2001287249 A JP 2001287249A JP 2001287249 A JP2001287249 A JP 2001287249A JP 3527223 B2 JP3527223 B2 JP 3527223B2
- Authority
- JP
- Japan
- Prior art keywords
- reflecting mirror
- less
- weight
- glass
- liquid crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Projection Apparatus (AREA)
- Optical Elements Other Than Lenses (AREA)
Description
【０００１】[0001]
【発明の属する技術分野】この発明は、液晶プロジェク
ターの光源ランプの反射鏡に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reflector for a light source lamp of a liquid crystal projector.
【０００２】[0002]
【従来の技術とその課題】従来、この種の反射鏡は、光
源ランプの可視光線を反射し、赤外線や紫外線を透過す
る薄膜多層反射膜を、ガラス基材の表面に蒸着すること
により形成されている。2. Description of the Related Art Conventionally, this type of reflecting mirror is formed by depositing a thin film multilayer reflective film that reflects visible light of a light source lamp and transmits infrared rays and ultraviolet rays on the surface of a glass substrate. ing.
【０００３】ところで、光源ランプが高輝度になると、
発熱も激しいので、反射鏡を構成するガラス基材は当然
のことながら、耐熱性が要求される。その一般的な耐熱
性の条件は５５０度に加熱し、自然冷却によって常温ま
で冷却するということを８回繰り返すという耐熱試験に
よって、割れや蒸着膜が剥離しないことである。By the way, when the light source lamp has high brightness,
Since the heat generation is intense, the glass substrate forming the reflecting mirror is naturally required to have heat resistance. The general condition of heat resistance is that cracks and vapor-deposited films do not peel off by a heat resistance test in which heating to 550 ° C. and cooling to room temperature by natural cooling are repeated eight times.
【０００４】特に、最近の液晶プロジェクターは、小型
化し、ランプの電力も高くなりつつあるので、反射鏡の
内面温度は６００度付近にまで上がっている。In particular, recent liquid crystal projectors have been downsized and the power of lamps has been increasing. Therefore, the inner temperature of the reflecting mirror has risen to around 600 degrees.
【０００５】また、最近の液晶プロジェクターのランプ
は、超高圧水銀灯が使用されているので、万一の爆発に
備えて機械的強度も要求されている。その機械的強度の
条件としては、反射鏡にランプを組み込み、点灯中に過
電流を流して故意にランプを破裂させ、その際における
反射鏡の割れがないことである。Further, since a lamp of a recent liquid crystal projector uses an ultra-high pressure mercury lamp, mechanical strength is required in case of an explosion. The condition of the mechanical strength is that the lamp is built in the reflecting mirror and an overcurrent is caused to flow during lighting to intentionally rupture the lamp, and the reflecting mirror is not cracked at that time.
【０００６】さらに、ガラス基材をプレス成形して反射
鏡にする場合には、十分な機械的強度を得るために、肉
厚部分が必要となる。ところが、成形の際には、肉厚部
分は最後に凝固するため、肉厚部分にいわゆる「ヒケ」
が発生し易く、成形精度の悪化により、照度のばらつき
が生じるという問題がある。このため、ガラス基材をプ
レス成形して反射鏡を形成する場合には、プレス後の成
形精度が良好であることが重要である。Further, when the glass base material is press-molded into a reflecting mirror, a thick portion is required to obtain sufficient mechanical strength. However, at the time of molding, the thick part solidifies last, so the so-called "sink"
Is likely to occur, and there is a problem that variations in illuminance occur due to deterioration in molding accuracy. Therefore, when the glass substrate is press-molded to form the reflecting mirror, it is important that the molding accuracy after pressing is good.
【０００７】ところで、より耐熱性の高いガラス材料と
しては石英ガラスがあるが、石英ガラスではプレス成形
により液晶プロジェクター用反射鏡を形成することがで
きない。By the way, there is quartz glass as a glass material having higher heat resistance, but it is impossible to form a reflecting mirror for a liquid crystal projector by press molding with quartz glass.
【０００８】また、従来、耐熱、耐機械的強度の条件を
満足する反射鏡のガラス基材として、結晶化ガラスが知
られている（特公平７−９２５２７号公報）。Further, conventionally, crystallized glass has been known as a glass base material of a reflecting mirror which satisfies the conditions of heat resistance and mechanical strength (Japanese Patent Publication No. 7-92527).
【０００９】ところが、結晶化ガラスは、結晶化させる
ために少なくとも２段階の熱処理が必要であると共に、
反射鏡を蒸着する際に、表面を研磨しなければならず、
製造コストが高いという問題がある。However, crystallized glass requires at least two stages of heat treatment for crystallization, and
When depositing the reflector, the surface must be polished,
There is a problem that the manufacturing cost is high.
【００１０】さらに、結晶化ガラスには、製造コスト以
外にも照度の点で次のような問題がある。即ち、結晶化
ガラスの場合には熱処理を行うと、成形後のガラスが結
晶化されて若干ガラスが収縮するといった変形が起こ
る。そのために、ランプの光が乱反射され照度のばらつ
きが生じる問題がある。Further, the crystallized glass has the following problems in terms of illuminance in addition to the manufacturing cost. That is, in the case of crystallized glass, when heat treatment is performed, the glass after molding is crystallized and the glass slightly contracts. Therefore, there is a problem that the light of the lamp is irregularly reflected and the illuminance varies.
【００１１】そこで、この発明は、結晶化ガラスを使用
することなく、反射鏡の内面が６００度という高温に耐
え、また、ランプのオン、オフ時における熱衝撃にも耐
え、プレス後の成形精度が良好で、照度のばらつきがな
い液晶プロジェクター用反射鏡を提供しようとするもの
である。Therefore, according to the present invention, the inner surface of the reflecting mirror can withstand a high temperature of 600 ° C. without using crystallized glass, and it can withstand the thermal shock when the lamp is turned on and off. The present invention aims to provide a reflecting mirror for a liquid crystal projector, which has good illuminance and has no illuminance variation.
【００１２】[0012]
【課題を解決するための手段】上記の課題を解決するた
めに、この発明は、平均膨張係数が３８以下でひずみ点
が６５０度以上である結晶化ガラスではないアルミノシ
リケート系ガラス基材をプレス成形した後、その表面に
薄膜多層反射膜を形成することにより、液晶プロジェク
ター用反射鏡を得たものである。In order to solve the above problems, the present invention presses an aluminosilicate glass base material which is not a crystallized glass and has an average expansion coefficient of 38 or less and a strain point of 650 degrees or more. After molding, a thin film multilayer reflective film is formed on the surface of the molded product to obtain a reflective mirror for a liquid crystal projector.
【００１３】ここで、平均膨張係数は、ＪＩＳ Ｒ ３
１０２、ひずみ点はＡＳＴＭ−Ｃ５９８によって測定し
た値である。Here, the average expansion coefficient is JIS R 3
102 and strain points are values measured by ASTM-C598.
【００１４】上記アルミノシリケート系ガラス基材のガ
ラス成分の酸化物組成には、少なくともＳｉＯ2５０〜
６４重量％、Ａｌ2Ｏ3８〜２５重量％、ＴｉＯ2１５重
量％以下、ＲＯ２５重量％以下（但しＲはマグネシウ
ム、カルシウム、亜鉛、鉛、バナジウムからなる群から選
ばれた金属原子）、Ｒ2Ｏ５重量％以下(但しＲはカリウ
ム、リチウム、ナトリウムからなる群から選ばれた金属
原子)を含んでいる。The oxide composition of the glass component of the aluminosilicate glass base material should be at least SiO 2 50-.
64% by weight, Al 2 O 3 8 to 25% by weight, TiO 2 15% by weight or less, RO 25% by weight or less (where R is a metal atom selected from the group consisting of magnesium, calcium, zinc, lead and vanadium), R 2 O 5% by weight or less (where R is a metal atom selected from the group consisting of potassium, lithium and sodium).
【００１５】ＳｉＯ2の量は、５０重量％以下では、ガ
ラス化できないし、６４重量％以上であると、溶融が困
難となる。また、Ａｌ2Ｏ3の量は、８重量％以下である
と、強度が弱くなり、２５重量％以上であると、溶融が
困難になる。また、ＴｉＯ2は、１５重量％以下の量を
含ませることにより、ガラスの膨張係数を下げることが
できると共に、成形の際の作業温度を低くすることがで
きるので、重要な成分である。また、ＲＯ、Ｒ2Ｏは、
いずれもガラス化に必要な成分である。If the amount of SiO 2 is 50% by weight or less, vitrification cannot be performed, and if it is 64% by weight or more, melting becomes difficult. When the amount of Al 2 O 3 is 8% by weight or less, the strength becomes weak, and when it is 25% by weight or more, melting becomes difficult. Further, TiO 2 is an important component because it can lower the expansion coefficient of glass and lower the working temperature during molding by including 15% by weight or less. RO and R 2 O are
Both are components necessary for vitrification.
【００１６】上記のように、この発明に係る液晶プロジ
ェクター用反射鏡は、平均膨張係数が３８以下でひずみ
点が６５０度以上であるアルミノシリケート系ガラス基
材をプレス成形し、その表面に薄膜多層反射膜を形成し
たものである。As described above, the reflector for a liquid crystal projector according to the present invention is obtained by press-molding an aluminosilicate glass base material having an average expansion coefficient of 38 or less and a strain point of 650 degrees or more, and forming a thin film multilayer on the surface thereof. A reflective film is formed.
【００１７】平均膨張係数が３８以下のアルミノシリケ
ート系ガラス基材を使用することにより、ランプ点灯時
の反射鏡の６００度という内面温度から消灯時の４００
度という内面温度が下がっても、即ち、反射鏡に２００
度付近の熱衝撃温度差が生じても、反射鏡へのクラック
の発生を防止することができる。By using an aluminosilicate glass base material having an average expansion coefficient of 38 or less, the inner surface temperature of 600 ° of the reflecting mirror when the lamp is turned on to 400 when the lamp is turned off.
Even if the internal temperature of degrees decreases, that is, 200
Even if there is a thermal shock temperature difference of about 100 degrees, it is possible to prevent the occurrence of cracks in the reflecting mirror.
【００１８】また、ひずみ点が６５０度以上であるアル
ミノシリケート系ガラス基材を使用することにより、肉
厚部分が凝固する際の「ひけ」が起こり難く、成形金型
の曲面に沿った精度の高いプレス成形が可能となる。ま
た、プレス成形の際に、プレス保持時間を延ばすことに
より、成形精度のばらつきを最小限に抑制することがで
きる。Further, by using an aluminosilicate glass base material having a strain point of 650 degrees or more, "sink" is unlikely to occur when the thick portion is solidified, and the accuracy along the curved surface of the molding die is improved. High press molding is possible. In addition, by extending the press holding time during press molding, it is possible to minimize variations in molding accuracy.
【００１９】[0019]
【発明の実施の形態】ガラス成分が、表１に示す酸化物
組成となるように、原料鉱物を用意し、これを粉砕、混
合して溶融し、ガラス化した。BEST MODE FOR CARRYING OUT THE INVENTION Raw material minerals were prepared so that the glass component had the oxide composition shown in Table 1, and the raw material minerals were crushed, mixed, melted and vitrified.
【００２０】そして、上記溶融状態のガラスを一定重量
とり、成形金型の中で反射鏡をプレス成形した。Then, a certain weight of the molten glass was taken, and a reflecting mirror was press-molded in a molding die.
【００２１】プレス成形の後、徐冷処理を行い、反射面
にＳｉＯ2−ＴｉＯ2交互多層膜を蒸着して、反射鏡とし
た。After press molding, a slow cooling treatment was performed, and an SiO 2 —TiO 2 alternating multilayer film was vapor-deposited on the reflecting surface to obtain a reflecting mirror.
【００２２】プレス成形する際の作業温度域が高いと、
成形金型がすぐに酸化し、反射鏡の内面精度や表面粗さ
が悪くなるし、金型寿命も短くなるが、実施例１及び実
施例２のガラス成分の場合は、１４００℃以下の比較的
低い作業温度域でのプレス成形が可能であった。When the working temperature range during press molding is high,
The molding die is oxidized immediately, the inner surface accuracy and surface roughness of the reflecting mirror are deteriorated, and the die life is shortened. However, in the case of the glass components of Example 1 and Example 2, the comparison is 1400 ° C. or lower. It was possible to perform press molding in the extremely low working temperature range.
【００２３】[0023]
【表１】 [Table 1]
【００２４】平均膨張係数が３８以下でひずみ点が６５
０度以上である実施例１、２の液晶プロジェクター用反
射鏡について、６００度にまで加熱後、自然冷却で常温
まで冷却するということを８回繰り返す耐熱試験を行っ
たところ、いずれの反射鏡も割れやクラックが発生せ
ず、蒸着によって形成された薄膜多層膜の剥離もなかっ
た。The average expansion coefficient is 38 or less and the strain point is 65.
With respect to the reflecting mirrors for liquid crystal projectors of Examples 1 and 2 having a temperature of 0 ° or more, a heat resistance test was repeated eight times by heating to 600 ° and then cooling to room temperature by natural cooling. Neither cracks nor cracks occurred, nor did the thin film multilayer film formed by vapor deposition peel off.
【００２５】また、平均膨張係数が３８以上で、ひずみ
点が６５０度以下であるガラス基材によって形成された
比較例１の液晶プロジェクター用反射鏡は、２００度の
熱衝撃温度差により、クラックが生じた。The reflecting mirror for a liquid crystal projector of Comparative Example 1 formed of a glass substrate having an average expansion coefficient of 38 or more and a strain point of 650 ° or less has cracks due to a thermal shock temperature difference of 200 °. occured.
【００２６】また、比較例２は、平均膨張係数が３８以
下であるが、ひずみ点が６５０度以下であるため、熱衝
撃性は良好であったが、形状精度が悪かった。In Comparative Example 2, the average expansion coefficient was 38 or less, but the strain point was 650 degrees or less, so the thermal shock resistance was good, but the shape accuracy was poor.
【００２７】なお、形状精度は、ある基準点からの理想
形状値から実測値を差し引いた誤差がいくらかにより判
断し、実施例１、２の場合は、誤差がほとんどなかった
のに比し、比較例２と、ガラス基材が比較例３のもの
は、約６０ミクロンメートルの誤差があった。測定は、
３次元測定器を用いて行った。It should be noted that the shape accuracy is judged based on some error obtained by subtracting the measured value from the ideal shape value from a certain reference point. In the cases of Examples 1 and 2, there was almost no error, and comparison was made. There was an error of about 60 μm between Example 2 and the glass substrate of Comparative Example 3. The measurement is
The measurement was performed using a three-dimensional measuring device.
【００２８】また、反射鏡としての照度を比較するため
に、同一の液晶プロジェクターに反射鏡を装着し、３ｍ
離れたスクリーン上の明るさを照度計によって測定した
ところ、結晶化ガラスで作製した比較例３の反射鏡の照
度を１００とした場合の照度比（％）は、比較例２のも
のが１０１％で、比較例３のものとほとんど差がなかっ
たが、実施例１、２の反射鏡の場合は、それぞれ、１０
６％、１０８％と照度の向上が見られた。In order to compare the illuminance as a reflecting mirror, the reflecting mirror is attached to the same liquid crystal projector and the
When the brightness on the screen away from the screen was measured by an illuminometer, the illuminance ratio (%) when the illuminance of the reflecting mirror of Comparative Example 3 made of crystallized glass was 100 was 101% in Comparative Example 2. There was almost no difference from that of Comparative Example 3, but in the case of the reflecting mirrors of Examples 1 and 2, each was 10
The illuminance was improved by 6% and 108%.
【００２９】[0029]
【発明の効果】以上のように、この発明によれば、結晶
化ガラスを使用することなく、反射鏡の内面が６００度
という高温に耐え、また、ランプのオン、オフ時におけ
る熱衝撃にも耐え、プレス後の成形精度が良好で、照度
のばらつきがない液晶プロジェクター用反射鏡を得るこ
とができる。As described above, according to the present invention, the inner surface of the reflecting mirror can withstand a high temperature of 600 ° C. without using crystallized glass, and it is also resistant to thermal shock when the lamp is turned on and off. It is possible to obtain a reflecting mirror for a liquid crystal projector which endures, has good molding accuracy after pressing, and has no variation in illuminance.
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7，ＤＢ名) G02B 5/08 G03B 21/00 G03B 21/20 ─────────────────────────────────────────────────── ─── Continuation of the front page (58) Fields surveyed (Int.Cl. 7 , DB name) G02B 5/08 G03B 21/00 G03B 21/20
Claims (3)
５０度以上である結晶化ガラスではないアルミノシリケ
ート系ガラス基材をプレス成形し、その表面に薄膜多層
反射膜を形成した液晶プロジェクター用反射鏡。1. An average expansion coefficient of 38 or less and a strain point of 6
A reflecting mirror for a liquid crystal projector, which is formed by press-molding an aluminosilicate glass substrate which is not crystallized glass and has a temperature of 50 degrees or more, and a thin-film multilayer reflective film is formed on the surface thereof.
成に、少なくともＳｉＯ2５０〜６４重量％、Ａｌ2Ｏ3
８〜２５重量％、ＴｉＯ2１５重量％以下、ＲＯ２５重
量％以下（但しＲはマグネシウム、カルシウム、亜鉛、
鉛、バナジウムからなる群から選ばれた金属原子）、Ｒ
2Ｏ５重量％以下(但しＲはカリウム、リチウム、ナトリ
ウムからなる群から選ばれた金属原子)を含む請求項１
記載の液晶プロジェクター用反射鏡。2. The oxide composition of the glass component of the glass substrate comprises at least 50 to 64% by weight of SiO 2 and Al 2 O 3.
8-25% by weight, TiO 2 15% by weight or less, RO 25% by weight or less (where R is magnesium, calcium, zinc,
Metal atom selected from the group consisting of lead and vanadium), R
2 O 5 wt% or less (where R is a metal atom selected from the group consisting of potassium, lithium and sodium).
A reflecting mirror for the liquid crystal projector described.
５０度以上であるガラス基材をプレス成形した後、その
表面に薄膜多層反射膜を形成する液晶プロジェクター用
反射鏡の製造方法。3. The average expansion coefficient is 38 or less and the strain point is 6
A method for manufacturing a reflecting mirror for a liquid crystal projector, comprising press-molding a glass substrate having a temperature of 50 degrees or more and then forming a thin-film multilayer reflective film on the surface thereof.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001287249A JP3527223B2 (en) | 2001-09-20 | 2001-09-20 | Reflector for LCD projector |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001287249A JP3527223B2 (en) | 2001-09-20 | 2001-09-20 | Reflector for LCD projector |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003098326A JP2003098326A (en) | 2003-04-03 |
| JP3527223B2 true JP3527223B2 (en) | 2004-05-17 |
Family
ID=19110093
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001287249A Expired - Fee Related JP3527223B2 (en) | 2001-09-20 | 2001-09-20 | Reflector for LCD projector |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3527223B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7018076B2 (en) * | 2003-08-14 | 2006-03-28 | Christie Digital Systems, Inc. | High performance reflector cooling system for projectors |
-
2001
- 2001-09-20 JP JP2001287249A patent/JP3527223B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2003098326A (en) | 2003-04-03 |
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