JPH0433741B2 - - Google Patents
Info
- Publication number
- JPH0433741B2 JPH0433741B2 JP24557587A JP24557587A JPH0433741B2 JP H0433741 B2 JPH0433741 B2 JP H0433741B2 JP 24557587 A JP24557587 A JP 24557587A JP 24557587 A JP24557587 A JP 24557587A JP H0433741 B2 JPH0433741 B2 JP H0433741B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- temperature
- thermal shock
- shock resistance
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 claims description 27
- 229910052736 halogen Inorganic materials 0.000 claims description 8
- 150000002367 halogens Chemical class 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- 230000035939 shock Effects 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 5
- 238000000137 annealing Methods 0.000 claims description 4
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 2
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 2
- 239000005357 flat glass Substances 0.000 claims description 2
- 239000000203 mixture Substances 0.000 description 7
- 239000005388 borosilicate glass Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 206010040925 Skin striae Diseases 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000004031 devitrification Methods 0.000 description 1
- 239000006025 fining agent Substances 0.000 description 1
- 239000006066 glass batch Substances 0.000 description 1
- 238000007496 glass forming Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000006903 response to temperature Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/11—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen
- C03C3/112—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen containing fluorine
- C03C3/115—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen containing fluorine containing boron
- C03C3/118—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen containing fluorine containing boron containing aluminium
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Description
〔発明の目的〕
（産業上の利用分野）
本発明は、すぐれた耐熱性および押圧成形性を
有するハロゲンランプ反射鏡用ガラスに関する。
（従来の技術）
従来、ハロゲンランプに適用される反射鏡は、
一面を拡開させた回転放物状または回転楕円状の
凹部を有する反射基体と、この凹部の内面に被着
された多層膜とからなり、凹部の中心位置にハロ
ゲンランプを装着するように構成されている。前
記反射基体は耐熱性および押圧成形性を考慮して
適当なガラス組成と熱的特性を有する硼珪酸ガラ
スで形成されている。
（発明が解決しようとする問題点）
しかるに反射鏡を形成する硼珪酸ガラスの組成
を適当に選定しても、適正な熱的特性範囲に含ま
れないものは、ランプ点灯中にクラツクを生じて
破損したり、軟化点および作業温度の高過ぎるも
のは、押圧成形性がわるく、ガラス表面に微小ク
ラツクが生じやすく、また押圧金型の表面形状と
異なつた反射鏡面となり、所望の配光特性が得ら
れないという問題がある。
本発明は上記事情を考慮してなされたもので、
耐熱性および押圧成形性にすぐれ、所望の配光特
性が得られるハロゲンランプ反射鏡用ガラスを提
供することを目的とする。
〔発明の構成〕
（問題点を解決するための手段および作用）
本発明は上記の目的を達成するために種々実験
研究した結果、所定のガラス組成において耐熱性
および押圧成形性に最適の熱的特性範囲を見出し
たものである。すなわち本発明は、重量百分率で
SiO268〜82％，ＡO30.5〜５％，B2O310〜18
％，Na2Ｏ＋K2Ｏ＋Li2O3.5〜８％，CaO＋
MgO0〜３％，NaC＋CaF（またはNaF）＋As2
O3＋Sb2O30.05〜１％を含有し、線膨張係数35〜
50×10-7／℃（温度範囲０〜300℃），徐冷点530
〜570℃，軟化点750〜820℃，作業温度1100〜
1200℃、および所定の耐熱衝撃性を有するハロゲ
ンランプ反射鏡用ガラスである。前記耐熱衝撃性
は150mm方角、厚さ３mmの板ガラスを加熱炉内で
15分間保持した後、水中で急冷して、炉温と水温
との温度差が140〜170℃においてクラツクが発生
しないものである。
次に本発明のガラスの組成および熱的特性を上
記の範囲に限定した理由について説明する。
SiO2はガラスを形成する主成分であるが、82
％を超えるとガラスの溶融性が悪化し、68％より
少ないと線膨張係数が大きくなり耐熱性が低下す
る。Ａ2O3は５％を超えると溶融性がわるくな
つてガラス中に脈理が生じ易くなり、0.5％より
少ないと分相傾向が強くなつてガラスが失透し易
くなる。B2O3は18％を超えると耐水性が悪化し、
10％より少ないと低膨張率の維持が困難となる。
Na2Ｏ，K2Ｏ，Li2Ｏは合量が８％を超えると
線膨張係数が大きくなり、3.5％より少ないと溶
融性がわるくなる。CaO，MgOは合量が３％を
超えると失透傾向が強くなる。NaC＋CaFま
たはNaF，As2O3，Sb2O3は清澄剤としていずれ
も１％以内でガラスバツチに添加されるが、それ
ぞれ揮発率が異なりガラス中の残留合量は0.05〜
１％である。
線膨張係数が35×10-7／℃より小さいと、押圧
成形時のガラスゴブの温度が高くなつて、成形用
金型の型面に被着されたニツケル−クロム鍍金が
剥離し易くなり、これを防ぐためにガラスゴブの
温度を低くすると、成形品に潜傷が発生し耐熱性
が低下する。またガラスゴブを作成するとき、カ
ツターに接触した部分が冷却され剪断傷が生じる
ので、製品の歩留がわるくなる。線膨張係数が50
×10-7／℃を超えると製品の耐熱性が低下する。
徐冷点が530℃より低いと、反射鏡として使用
中にガラス温度が約500℃以上になる場合がある
ので、反射鏡をコンパクトに形成することができ
ない。徐冷点が570℃を超えると、ガラスゴブの
温度が高くなるか、またはガラスの温度変化に対
して粘度が急激に変わり、押圧成形性がわるくな
り歩留が低下し、潜傷も増加して製品の耐熱性が
わるくなる。
軟化点が750℃未満または820℃を超えると、ガ
ラスの温度変化に対して粘度が急激に変わり押圧
成形性がわるくなる。
作業温度が1100℃未満では、ガラスの温度変化
に対して粘度が急激に変わり押圧成形性がわるく
なり、1200℃を超えるとガラスゴブの温度も高く
なる。
耐熱衝撃性の炉温と水温との温度差が140℃未
満であると、反射鏡にランプを装着して点灯した
場合にクラツクの発生率が大となり、170℃を超
えるとガラスゴブ温度が高くなる。
（実施例）
本発明の実施例を表−１に示す。No.３〜No.５は
比較例である。表中、ガラス組成が重量百分率で
示し、耐熱衝撃性は150mm方角、厚さ３mmのガラ
ス板を加熱炉に15分間保持した後、水中に投入し
急冷してクラツクが発生しない温度差（炉温と水
温との差）で示す。製品耐熱性試験は、図示のよ
うに回転放物状の凹部(1)を有する反射基体(2)を押
圧成形し、この反射基体(2)を加熱炉で15分
[Object of the Invention] (Industrial Application Field) The present invention relates to a glass for a halogen lamp reflector having excellent heat resistance and press moldability. (Prior art) Conventionally, the reflector used for halogen lamps is
It consists of a reflective base having a recess in the shape of a parabola of revolution or an ellipsoid of revolution with one side expanded, and a multilayer film coated on the inner surface of this recess, and is configured so that a halogen lamp is mounted at the center of the recess. has been done. The reflective substrate is formed of borosilicate glass having an appropriate glass composition and thermal properties in consideration of heat resistance and press moldability. (Problem to be Solved by the Invention) However, even if the composition of the borosilicate glass forming the reflecting mirror is selected appropriately, if the composition does not fall within the appropriate thermal characteristic range, cracks may occur during lamp lighting. If it is damaged or has a softening point or working temperature that is too high, it will have poor press moldability, will easily cause micro-cracks on the glass surface, and will have a reflective mirror surface that differs from the surface shape of the press mold, making it difficult to achieve the desired light distribution characteristics. The problem is that you can't get it. The present invention was made in consideration of the above circumstances, and
An object of the present invention is to provide a glass for a halogen lamp reflector that has excellent heat resistance and press moldability and can provide desired light distribution characteristics. [Structure of the Invention] (Means and Effects for Solving the Problems) In order to achieve the above-mentioned objects, the present invention has been made based on various experimental studies and has developed a method for achieving the optimum thermal properties for heat resistance and press moldability in a given glass composition. The characteristic range was found. That is, the present invention provides
SiO2 68-82%, AO3 0.5-5%, B2O3 10-18
%, Na 2 O + K 2 O + Li 2 O3.5-8%, CaO +
MgO0~3%, NaC + CaF (or NaF) + As 2
Contains O 3 + Sb 2 O 3 0.05~1%, linear expansion coefficient 35~
50×10 -7 /℃ (temperature range 0 to 300℃), annealing point 530
~570℃, softening point 750~820℃, working temperature 1100~
This is glass for halogen lamp reflectors that has a temperature of 1200°C and a specified thermal shock resistance. The above thermal shock resistance is obtained by heating a 150mm square, 3mm thick plate glass in a heating furnace.
After being held for 15 minutes, it is rapidly cooled in water and no cracks occur when the temperature difference between the furnace temperature and the water temperature is 140 to 170°C. Next, the reason why the composition and thermal properties of the glass of the present invention are limited to the above ranges will be explained. SiO 2 is the main component forming glass, but 82
If it exceeds 68%, the meltability of the glass will deteriorate, and if it is less than 68%, the coefficient of linear expansion will increase and the heat resistance will decrease. When A 2 O 3 exceeds 5%, the meltability deteriorates and striae are likely to occur in the glass, and when it is less than 0.5%, the phase separation tendency becomes strong and the glass becomes prone to devitrification. Water resistance deteriorates when B2O3 exceeds 18%,
If it is less than 10%, it will be difficult to maintain a low expansion rate. When the total amount of Na 2 O, K 2 O, and Li 2 O exceeds 8%, the coefficient of linear expansion becomes large, and when it is less than 3.5%, the meltability deteriorates. When the total amount of CaO and MgO exceeds 3%, the tendency to devitrify becomes stronger. NaC + CaF or NaF, As 2 O 3 , and Sb 2 O 3 are all added to the glass batch as fining agents within 1%, but each has a different volatility rate and the total amount remaining in the glass is 0.05~
It is 1%. If the coefficient of linear expansion is less than 35×10 -7 /℃, the temperature of the glass gob during press molding will become high, and the nickel-chromium plating applied to the mold surface of the molding die will easily peel off. If the temperature of the glass gob is lowered to prevent this, latent scratches will occur in the molded product and the heat resistance will decrease. Furthermore, when making glass gobs, the parts that come into contact with the cutter are cooled and shear scratches occur, which reduces the yield of the product. Linear expansion coefficient is 50
If it exceeds ×10 -7 /℃, the heat resistance of the product will decrease. If the annealing point is lower than 530°C, the glass temperature may reach approximately 500°C or higher during use as a reflecting mirror, making it impossible to form a compact reflecting mirror. If the annealing point exceeds 570°C, the temperature of the glass gob will increase or the viscosity will change rapidly in response to changes in the temperature of the glass, resulting in poor press moldability, lower yields, and increased latent scratches, resulting in poor product quality. heat resistance deteriorates. If the softening point is lower than 750°C or higher than 820°C, the viscosity changes rapidly with changes in glass temperature, resulting in poor press moldability. If the working temperature is less than 1,100°C, the viscosity of the glass will change rapidly in response to temperature changes, resulting in poor press moldability, and if it exceeds 1,200°C, the temperature of the glass gob will also increase. If the temperature difference between the furnace temperature and the water temperature for thermal shock resistance is less than 140℃, there is a high chance of cracks occurring when a lamp is attached to the reflector and turned on, and if it exceeds 170℃, the glass gob temperature will increase. . (Example) Examples of the present invention are shown in Table-1. No. 3 to No. 5 are comparative examples. In the table, the glass composition is shown in weight percentage, and the thermal shock resistance is determined by holding a glass plate of 150 mm square and 3 mm thick in a heating furnace for 15 minutes, then placing it in water and rapidly cooling it to determine the temperature difference (furnace temperature) that does not cause cracks. and the water temperature). In the product heat resistance test, a reflective base (2) having a paraboloid-shaped recess (1) is press-molded as shown in the figure, and this reflective base (2) is heated in a heating furnace for 15 minutes.
【表】【table】
以上のように本発明は、所定の組成を有する硼
珪酸ガラスにおいて、熱的特性を前記範囲に特定
したハロゲンランプ反射鏡用ガラスであり、耐熱
性と押圧成形性にすぐれているので、ハロゲンラ
ンプ反射鏡を形成した場合、クラツクの発生が少
なく、良好な製品歩留が得られる利点がある。
As described above, the present invention is a borosilicate glass having a predetermined composition and a glass for a halogen lamp reflector whose thermal properties are specified within the above range, and which has excellent heat resistance and press moldability. When a reflecting mirror is formed, there are advantages in that fewer cracks occur and a good product yield can be obtained.
図面は本発明ガラスを用いたハロゲンランプ反
射鏡を示す断面図である。
１……凹部、２……反射基体、３……多層膜。
The drawing is a sectional view showing a halogen lamp reflector using the glass of the present invention. 1... Concavity, 2... Reflective base, 3... Multilayer film.
Claims (1)
％，B2O310〜18％，Na2Ｏ＋K2Ｏ＋Li2O3.5〜８
％，CaO＋MgO0〜３％，NaC＋CaF（または
NaF）＋As2O3＋Sb2O30.05〜１％を含有し、線膨
張係数35〜50×10-7／℃，徐冷点530〜570℃，軟
化点750〜820℃，作業温度1100〜1200℃および所
定の耐熱衝撃性を有するハロゲンランプ反射鏡用
ガラス。ただし、所定の耐熱衝撃性は150mm方角、
厚さ３mmの板ガラスを加熱炉内で15分間保持した
後、水中で急冷して、炉温と水温との温度差が
140〜170℃においてクラツクが発生しないもの。1 SiO 2 68-82%, A 2 O 3 0.5-5 in weight percentage
%, B 2 O 3 10-18%, Na 2 O + K 2 O + Li 2 O 3.5-8
%, CaO + MgO0~3%, NaC + CaF (or
Contains NaF) + As 2 O 3 + Sb 2 O 3 0.05-1%, linear expansion coefficient 35-50×10 -7 /℃, annealing point 530-570℃, softening point 750-820℃, working temperature 1100- Glass for halogen lamp reflectors with 1200℃ and specified thermal shock resistance. However, the specified thermal shock resistance is 150mm direction.
After holding a 3 mm thick plate glass in a heating furnace for 15 minutes, it is rapidly cooled in water to reduce the temperature difference between the furnace temperature and the water temperature.
No cracks occur at 140-170℃.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24557587A JPS6487529A (en) | 1987-09-29 | 1987-09-29 | Glass for halogen lamp reflector |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24557587A JPS6487529A (en) | 1987-09-29 | 1987-09-29 | Glass for halogen lamp reflector |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6487529A JPS6487529A (en) | 1989-03-31 |
| JPH0433741B2 true JPH0433741B2 (en) | 1992-06-03 |
Family
ID=17135761
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24557587A Granted JPS6487529A (en) | 1987-09-29 | 1987-09-29 | Glass for halogen lamp reflector |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6487529A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4338128C1 (en) * | 1993-11-08 | 1995-05-18 | Jenaer Glaswerk Gmbh | Borosilicate glass with high transmission in the UV range, low thermal expansion and high chemical resistance, process for its preparation and its use |
| DE19913227C1 (en) | 1999-03-23 | 2000-07-27 | Schott Glas | Borosilicate glass of specified composition is used for production of thermal cycling resistant beverage containers, especially coffee machine jugs, tea-pots and baby milk bottles |
| JP4815688B2 (en) * | 2000-10-31 | 2011-11-16 | 旭硝子株式会社 | Aluminoborosilicate glass for LCD |
| JP4953156B2 (en) * | 2005-06-29 | 2012-06-13 | 日本電気硝子株式会社 | Optical glass |
| SG11201909084SA (en) | 2017-03-31 | 2019-10-30 | Corning Inc | High transmission glasses |
-
1987
- 1987-09-29 JP JP24557587A patent/JPS6487529A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6487529A (en) | 1989-03-31 |
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